WO2009057411A1 - 液晶配向用突起形成用ネガ型レジスト - Google Patents

液晶配向用突起形成用ネガ型レジスト Download PDF

Info

Publication number
WO2009057411A1
WO2009057411A1 PCT/JP2008/067833 JP2008067833W WO2009057411A1 WO 2009057411 A1 WO2009057411 A1 WO 2009057411A1 JP 2008067833 W JP2008067833 W JP 2008067833W WO 2009057411 A1 WO2009057411 A1 WO 2009057411A1
Authority
WO
WIPO (PCT)
Prior art keywords
liquid crystal
protrusions
formation
negative
crystal alignment
Prior art date
Application number
PCT/JP2008/067833
Other languages
English (en)
French (fr)
Inventor
Hiroshi Kobayashi
Hiroji Fukui
Original Assignee
Sekisui Chemical Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co., Ltd. filed Critical Sekisui Chemical Co., Ltd.
Publication of WO2009057411A1 publication Critical patent/WO2009057411A1/ja

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)

Abstract

　本発明は、液晶表示装置の液晶配向を制御するための突起を形成することができ、製造した液晶表示装置に液晶焼き付き現象が生じることを防止できる液晶配向用突起形成用ネガ型レジストを提供することを目的とする。 　本発明は、アルカリ可溶性樹脂、重合性単量体及び光重合開始剤を含有する、ＭＶＡ方式の液晶表示装置の液晶配向用の突起の形成に用いるネガ型レジストであって、前記重合性単量体は、ノボラックエポキシ（メタ）アクリレートを含有する液晶配向突起形成用ネガ型レジストである。
PCT/JP2008/067833 2007-10-31 2008-10-01 液晶配向用突起形成用ネガ型レジスト WO2009057411A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-283893 2007-10-31
JP2007283893A JP2009109879A (ja) 2007-10-31 2007-10-31 液晶配向用突起形成用ネガ型レジスト、液晶配向用突起、カラーフィルター、及び、液晶表示装置

Publications (1)

Publication Number Publication Date
WO2009057411A1 true WO2009057411A1 (ja) 2009-05-07

Family

ID=40590807

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/067833 WO2009057411A1 (ja) 2007-10-31 2008-10-01 液晶配向用突起形成用ネガ型レジスト

Country Status (3)

Country Link
JP (1) JP2009109879A (ja)
TW (1) TW200921278A (ja)
WO (1) WO2009057411A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6038498B2 (ja) * 2011-06-28 2016-12-07 株式会社日本触媒 フォトスペーサー用硬化性樹脂組成物、柱状スペーサーおよび液晶ディスプレイ
JP6001877B2 (ja) * 2012-02-28 2016-10-05 株式会社日本触媒 フォトスペーサー用硬化性樹脂組成物および柱状スペーサー
JP6404557B2 (ja) * 2013-10-04 2018-10-10 株式会社日本触媒 硬化性樹脂組成物
KR101636178B1 (ko) * 2014-12-30 2016-07-04 동우 화인켐 주식회사 스페이서 형성용 감광성 수지 조성물 및 이로부터 제조되는 스페이서
TWI643901B (zh) 2015-12-16 2018-12-11 財團法人工業技術研究院 光壓印樹脂組成物、光壓印樹脂膜以及圖案化製程
JP7052222B2 (ja) * 2017-05-24 2022-04-12 三菱ケミカル株式会社 硬化性組成物、硬化物及び積層体

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04318816A (ja) * 1991-04-18 1992-11-10 Dainippon Printing Co Ltd 液晶表示装置およびカラーフィルター
JP2004109752A (ja) * 2002-09-20 2004-04-08 Taiyo Ink Mfg Ltd 感光性樹脂組成物、及びそれらを用いたスペーサー又はカラーフィルターの形成方法
JP2005062620A (ja) * 2003-08-18 2005-03-10 Sekisui Chem Co Ltd 光硬化性樹脂組成物、柱状スペーサ、微粒子スペーサ固定剤及び液晶表示素子
JP2005140993A (ja) * 2003-11-06 2005-06-02 Sekisui Chem Co Ltd 光硬化性樹脂組成物、柱状スペーサ、微粒子スペーサ固定剤及び液晶表示素子

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04318816A (ja) * 1991-04-18 1992-11-10 Dainippon Printing Co Ltd 液晶表示装置およびカラーフィルター
JP2004109752A (ja) * 2002-09-20 2004-04-08 Taiyo Ink Mfg Ltd 感光性樹脂組成物、及びそれらを用いたスペーサー又はカラーフィルターの形成方法
JP2005062620A (ja) * 2003-08-18 2005-03-10 Sekisui Chem Co Ltd 光硬化性樹脂組成物、柱状スペーサ、微粒子スペーサ固定剤及び液晶表示素子
JP2005140993A (ja) * 2003-11-06 2005-06-02 Sekisui Chem Co Ltd 光硬化性樹脂組成物、柱状スペーサ、微粒子スペーサ固定剤及び液晶表示素子

Also Published As

Publication number Publication date
JP2009109879A (ja) 2009-05-21
TW200921278A (en) 2009-05-16

Similar Documents

Publication Publication Date Title
WO2009057411A1 (ja) 液晶配向用突起形成用ネガ型レジスト
WO2008126700A1 (ja) 光学フィルム、偏光板、液晶表示装置、及び紫外線吸収性ポリマー
WO2009022644A1 (ja) ネガ型感光性樹脂組成物、スペーサー及び液晶表示装置
WO2008057926A3 (en) Emulsion adhesive for washable film
WO2007100569A3 (en) Self etch all purpose dental composition
WO2008146723A1 (ja) 樹脂組成物、樹脂スペーサ用フィルムおよび半導体装置
WO2008102705A1 (ja) 光学フィルム
WO2008045724A3 (en) Port structures for non-rigid bone plates
TW200613898A (en) Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
TW200745297A (en) UV B-stageable, moisture curable composition useful for rapid electronic device assembly
TW200720298A (en) Copolymer for liquid crystal alignment, liquid crystal aligning layer including copolymer for liquid crystal alignment, and liquid crystal display including liquid crystal aligning layer
WO2012022391A3 (de) Polymerisierbare mischungen und ihre verwendung in flüssigkristallanzeigen
WO2007038059A3 (en) Infusion pump with a drive having a ratchet and pawl combination
TW200630466A (en) Polymerizable liquid crystal formulation and polarizer
DE60330765D1 (de) Flüssigkeit abgebende vorrichtung
WO2006017109A3 (en) Adhesive containing wound closure device and method
TW200745168A (en) Polarizer protective film, polarizing plate and VA mode liquid crystal display
TW200636385A (en) Photosensitive resin composition for display panel, its hardened material, and spacer for display panel
WO2008093643A1 (ja) 感光性エレメント
WO2006000369A3 (en) Non-intrusive trusted user interface
TW200739259A (en) Radiation-sensitive resin composition, spacer for liquid crystal display panel, method for forming spacer for liquid crystal display panel, and liquid crystal display panel
EP1835333A8 (en) Liquid crystal sealing material and liquid crystal display cells made by using the same
WO2008126699A1 (ja) 紫外線吸収性ポリマー、セルロースエステル光学フィルム、セルロースエステル光学フィルムの製造方法、偏光板、及び液晶表示装置
WO2008140018A1 (ja) カラムスペーサ用硬化性樹脂組成物、カラムスペーサ、及び、液晶表示素子
EP3564222A4 (en) POLYMERIZABLE COMPOUND, MIXED PRODUCT OF POLYMERISABLE LIQUID CRYSTALS, POLYMER, OPTICAL FILM, OPTICALLY ANISOTROPIC BODY, POLARIZATION PLATE, DISPLAY DEVICE, ANTI-REFLECTIVE FILM AND COMPOUND

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08845453

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08845453

Country of ref document: EP

Kind code of ref document: A1