WO2008126699A1 - 紫外線吸収性ポリマー、セルロースエステル光学フィルム、セルロースエステル光学フィルムの製造方法、偏光板、及び液晶表示装置 - Google Patents

紫外線吸収性ポリマー、セルロースエステル光学フィルム、セルロースエステル光学フィルムの製造方法、偏光板、及び液晶表示装置 Download PDF

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Publication number
WO2008126699A1
WO2008126699A1 PCT/JP2008/056089 JP2008056089W WO2008126699A1 WO 2008126699 A1 WO2008126699 A1 WO 2008126699A1 JP 2008056089 W JP2008056089 W JP 2008056089W WO 2008126699 A1 WO2008126699 A1 WO 2008126699A1
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WO
WIPO (PCT)
Prior art keywords
optical film
cellulose ester
ester optical
absorbing polymer
ultraviolet absorbing
Prior art date
Application number
PCT/JP2008/056089
Other languages
English (en)
French (fr)
Inventor
Takayuki Suzuki
Issei Nakahara
Takatugu Suzuki
Ryohei Iwamoto
Satomi Kawabe
Original Assignee
Konica Minolta Opto, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Opto, Inc. filed Critical Konica Minolta Opto, Inc.
Priority to US12/450,493 priority Critical patent/US20100104775A1/en
Priority to JP2009509211A priority patent/JP5387405B2/ja
Publication of WO2008126699A1 publication Critical patent/WO2008126699A1/ja

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C08F220/365—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate containing further carboxylic moieties
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/28—Treatment by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0016—Plasticisers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/005—Stabilisers against oxidation, heat, light, ozone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/13—Phenols; Phenolates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L1/00—Compositions of cellulose, modified cellulose or cellulose derivatives
    • C08L1/08—Cellulose derivatives
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1808—C8-(meth)acrylate, e.g. isooctyl (meth)acrylate or 2-ethylhexyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/52—Amides or imides
    • C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F220/58—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing oxygen in addition to the carbonamido oxygen, e.g. N-methylolacrylamide, N-(meth)acryloylmorpholine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • C08F226/08—N-Vinyl-pyrrolidine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2301/00—Characterised by the use of cellulose, modified cellulose or cellulose derivatives
    • C08J2301/08—Cellulose derivatives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/03—Viewing layer characterised by chemical composition
    • C09K2323/031—Polarizer or dye
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polarising Elements (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

　分子内に下記一般式（Ａ）で表される部分構造を有するエチレン性不飽和モノマーと下記一般式（Ｂ）で表されるモノマーから誘導されることを特徴とする紫外線吸収性ポリマー。
PCT/JP2008/056089 2007-04-10 2008-03-28 紫外線吸収性ポリマー、セルロースエステル光学フィルム、セルロースエステル光学フィルムの製造方法、偏光板、及び液晶表示装置 WO2008126699A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/450,493 US20100104775A1 (en) 2007-04-10 2008-03-28 Ultraviolet absorbing polymer, cellulose ester optical film, method of producing cellulose ester optical film, polarizing plate and liquid crystal display
JP2009509211A JP5387405B2 (ja) 2007-04-10 2008-03-28 紫外線吸収性ポリマー、セルロースエステル光学フィルム、セルロースエステル光学フィルムの製造方法、偏光板、及び液晶表示装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-102536 2007-04-10
JP2007102536 2007-04-10

Publications (1)

Publication Number Publication Date
WO2008126699A1 true WO2008126699A1 (ja) 2008-10-23

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Country Status (4)

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US (1) US20100104775A1 (ja)
JP (1) JP5387405B2 (ja)
TW (1) TWI441838B (ja)
WO (1) WO2008126699A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009269944A (ja) * 2008-04-30 2009-11-19 Fujifilm Corp セルロースアシレートフィルムおよび偏光板
JP2011148985A (ja) * 2009-12-21 2011-08-04 Sumitomo Chemical Co Ltd 樹脂、フォトレジスト組成物及びレジストパターンの製造方法
JP2011148983A (ja) * 2009-12-21 2011-08-04 Sumitomo Chemical Co Ltd 樹脂、フォトレジスト組成物及びレジストパターンの製造方法
KR20190132534A (ko) * 2017-04-13 2019-11-27 신나카무라 가가꾸 고교 가부시키가이샤 자외선 흡수성 도료 및 상기 도료가 코팅된 필름
WO2024074814A1 (en) 2022-10-04 2024-04-11 Sublino Limited Composition comprising a functionalised dye and a diallylamine comonomer and use

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008120596A1 (ja) * 2007-04-03 2008-10-09 Konica Minolta Opto, Inc. セルロースエステル光学フィルム、該セルロースエステル光学フィルムを用いた偏光板及び液晶表示装置、セルロースエステル光学フィルムの製造方法、及び共重合ポリマー
WO2014068802A1 (ja) * 2012-11-02 2014-05-08 コニカミノルタ株式会社 光学フィルムおよび光学フィルムの製造方法、偏光板および液晶表示装置
WO2020162259A1 (ja) * 2019-02-08 2020-08-13 Dic株式会社 光学材料用樹脂組成物、光学フィルム及び表示装置
CN116856022B (zh) * 2023-07-05 2024-02-20 诺博环保科技(中山)有限公司 一种电镀用合金添加剂及其制备方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53107835A (en) * 1976-10-19 1978-09-20 Konishiroku Photo Ind Co Ltd Color difusion transfer method
JPH05178870A (ja) * 1991-05-27 1993-07-20 Yoshitomi Pharmaceut Ind Ltd ４，４’ −ビフェニレンジホスホナイト化合物およびその用途
JP2000109523A (ja) * 1998-10-07 2000-04-18 Nippon Shokubai Co Ltd 重合性アクリルポリマー及びその製法
JP2000355656A (ja) * 1999-04-14 2000-12-26 Yoshitomi Fine Chemicals Ltd ６−ヒドロキシクロマン化合物と３−アリールベンゾフラノン化合物を含有する有機高分子材料用安定剤
JP2002226521A (ja) * 2001-02-02 2002-08-14 Otsuka Chem Co Ltd 紫外線吸収性共重合体
JP2003113317A (ja) * 2001-10-04 2003-04-18 Konica Corp 光学フィルム及びそれを用いた偏光板と表示装置と紫外線吸収性ポリマー
JP2004143344A (ja) * 2002-10-25 2004-05-20 Toagosei Co Ltd 紫外線吸収能を有する架橋性樹脂組成物
JP2007041280A (ja) * 2005-08-03 2007-02-15 Konica Minolta Opto Inc 位相差フィルム、偏光板およびこれらを用いた液晶表示装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2683007B2 (ja) * 1987-03-03 1997-11-26 アイオーラブ・コーポレーシヨン ベンゾトリアゾール化合物、その共重合体および紫外線吸収用組成物
JP2002169020A (ja) * 2000-12-04 2002-06-14 Konica Corp 光学フィルム、偏光板及びこれを用いた表示装置
JP2002284819A (ja) * 2001-03-23 2002-10-03 Fukuvi Chem Ind Co Ltd 紫外線吸収セグメントを有する含フッ素重合体
JP4993421B2 (ja) * 2001-06-07 2012-08-08 株式会社Ａｄｅｋａ 合成樹脂組成物
JP2004277581A (ja) * 2003-03-17 2004-10-07 Konica Minolta Holdings Inc セルロースエステルフィルム、偏光板、液晶表示装置、セルロースエステルフィルムの製造方法、偏光板の製造方法
JP2006064803A (ja) * 2004-08-25 2006-03-09 Konica Minolta Opto Inc 延伸セルロースエステルフィルム、それを用いた偏光板及び液晶表示装置
JP2009096955A (ja) * 2007-10-19 2009-05-07 Konica Minolta Opto Inc 光学フィルム、偏光板、液晶表示装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53107835A (en) * 1976-10-19 1978-09-20 Konishiroku Photo Ind Co Ltd Color difusion transfer method
JPH05178870A (ja) * 1991-05-27 1993-07-20 Yoshitomi Pharmaceut Ind Ltd ４，４’ −ビフェニレンジホスホナイト化合物およびその用途
JP2000109523A (ja) * 1998-10-07 2000-04-18 Nippon Shokubai Co Ltd 重合性アクリルポリマー及びその製法
JP2000355656A (ja) * 1999-04-14 2000-12-26 Yoshitomi Fine Chemicals Ltd ６−ヒドロキシクロマン化合物と３−アリールベンゾフラノン化合物を含有する有機高分子材料用安定剤
JP2002226521A (ja) * 2001-02-02 2002-08-14 Otsuka Chem Co Ltd 紫外線吸収性共重合体
JP2003113317A (ja) * 2001-10-04 2003-04-18 Konica Corp 光学フィルム及びそれを用いた偏光板と表示装置と紫外線吸収性ポリマー
JP2004143344A (ja) * 2002-10-25 2004-05-20 Toagosei Co Ltd 紫外線吸収能を有する架橋性樹脂組成物
JP2007041280A (ja) * 2005-08-03 2007-02-15 Konica Minolta Opto Inc 位相差フィルム、偏光板およびこれらを用いた液晶表示装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009269944A (ja) * 2008-04-30 2009-11-19 Fujifilm Corp セルロースアシレートフィルムおよび偏光板
JP2011148985A (ja) * 2009-12-21 2011-08-04 Sumitomo Chemical Co Ltd 樹脂、フォトレジスト組成物及びレジストパターンの製造方法
JP2011148983A (ja) * 2009-12-21 2011-08-04 Sumitomo Chemical Co Ltd 樹脂、フォトレジスト組成物及びレジストパターンの製造方法
KR20190132534A (ko) * 2017-04-13 2019-11-27 신나카무라 가가꾸 고교 가부시키가이샤 자외선 흡수성 도료 및 상기 도료가 코팅된 필름
KR102345990B1 (ko) * 2017-04-13 2021-12-30 신나카무라 가가꾸 고교 가부시키가이샤 자외선 흡수성 도료 및 상기 도료가 코팅된 필름
WO2024074814A1 (en) 2022-10-04 2024-04-11 Sublino Limited Composition comprising a functionalised dye and a diallylamine comonomer and use

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TWI441838B (zh) 2014-06-21
US20100104775A1 (en) 2010-04-29
TW200909454A (en) 2009-03-01
JPWO2008126699A1 (ja) 2010-07-22
JP5387405B2 (ja) 2014-01-15

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