WO2009057211A1 - 半導体装置及びその製造方法 - Google Patents

半導体装置及びその製造方法 Download PDF

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Publication number
WO2009057211A1
WO2009057211A1 PCT/JP2007/071235 JP2007071235W WO2009057211A1 WO 2009057211 A1 WO2009057211 A1 WO 2009057211A1 JP 2007071235 W JP2007071235 W JP 2007071235W WO 2009057211 A1 WO2009057211 A1 WO 2009057211A1
Authority
WO
WIPO (PCT)
Prior art keywords
conductive film
memory layer
forming
mask
semiconductor device
Prior art date
Application number
PCT/JP2007/071235
Other languages
English (en)
French (fr)
Inventor
Taiji Ema
Original Assignee
Fujitsu Microelectronics Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Microelectronics Limited filed Critical Fujitsu Microelectronics Limited
Priority to PCT/JP2007/071235 priority Critical patent/WO2009057211A1/ja
Publication of WO2009057211A1 publication Critical patent/WO2009057211A1/ja

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/101—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including resistors or capacitors only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8221—Three dimensional integrated circuits stacked in different levels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0688—Integrated circuits having a three-dimensional layout
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Non-Volatile Memory (AREA)
  • Semiconductor Memories (AREA)

Abstract

　第１の導電膜２８ａと第１の記憶層３６と第２の導電膜３８とを形成する工程と、第１の方向に延在する線状のパターンを有する第１のマスクを形成する工程と、第１のマスクを用いて、第２の導電膜、第１の記憶層及び第１の導電膜をエッチングする工程と、第１の導電膜、第１の記憶層及び第２の導電膜を埋め込むように、第１の絶縁層４２を形成する工程と、第３の導電膜３２と第２の記憶層４８と第４の導電膜５６とを形成する工程と、第１の方向と交差する第２の方向に延在する線状のパターンを有する第２のマスクを形成する工程と、第２のマスクを用いて、第４の導電膜、第２の記憶層、第３の導電膜、第２の導電膜及び第１の記憶層をエッチングする工程とを有し、第１の導電膜と第３の導電膜とが交差する箇所に、第１の導電膜の一部である第１の下部電極と、第１の記憶層と、第２の導電膜より成る第１の上部電極とを有する第１の記憶素子３０を形成する。
PCT/JP2007/071235 2007-10-31 2007-10-31 半導体装置及びその製造方法 WO2009057211A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/071235 WO2009057211A1 (ja) 2007-10-31 2007-10-31 半導体装置及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/071235 WO2009057211A1 (ja) 2007-10-31 2007-10-31 半導体装置及びその製造方法

Publications (1)

Publication Number Publication Date
WO2009057211A1 true WO2009057211A1 (ja) 2009-05-07

Family

ID=40590621

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/071235 WO2009057211A1 (ja) 2007-10-31 2007-10-31 半導体装置及びその製造方法

Country Status (1)

Country Link
WO (1) WO2009057211A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009283486A (ja) * 2008-05-19 2009-12-03 Toshiba Corp 不揮発性記憶装置及びその製造方法
JP2011520265A (ja) * 2008-05-01 2011-07-14 インターモレキュラー，インク． 不揮発性抵抗スイッチングメモリ

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003197877A (ja) * 2001-09-26 2003-07-11 Sharp Corp 共有ビット線クロスポイントメモリアレイ
JP2003243623A (ja) * 2002-02-19 2003-08-29 Seiko Epson Corp 強誘電体キャパシタを有するメモリセルアレイおよびその製造方法ならびに強誘電体メモリ装置
JP2005317787A (ja) * 2004-04-28 2005-11-10 Matsushita Electric Ind Co Ltd スイッチング素子およびそれを用いたアレイ型機能素子
JP2007027537A (ja) * 2005-07-20 2007-02-01 Sharp Corp 可変抵抗素子を備えた半導体記憶装置
JP2007165873A (ja) * 2005-12-12 2007-06-28 Hitachi Global Storage Technologies Netherlands Bv 単極抵抗ランダムアクセスメモリ（ｒｒａｍ）デバイス、および垂直スタックアーキテクチャ

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003197877A (ja) * 2001-09-26 2003-07-11 Sharp Corp 共有ビット線クロスポイントメモリアレイ
JP2003243623A (ja) * 2002-02-19 2003-08-29 Seiko Epson Corp 強誘電体キャパシタを有するメモリセルアレイおよびその製造方法ならびに強誘電体メモリ装置
JP2005317787A (ja) * 2004-04-28 2005-11-10 Matsushita Electric Ind Co Ltd スイッチング素子およびそれを用いたアレイ型機能素子
JP2007027537A (ja) * 2005-07-20 2007-02-01 Sharp Corp 可変抵抗素子を備えた半導体記憶装置
JP2007165873A (ja) * 2005-12-12 2007-06-28 Hitachi Global Storage Technologies Netherlands Bv 単極抵抗ランダムアクセスメモリ（ｒｒａｍ）デバイス、および垂直スタックアーキテクチャ

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011520265A (ja) * 2008-05-01 2011-07-14 インターモレキュラー，インク． 不揮発性抵抗スイッチングメモリ
JP2009283486A (ja) * 2008-05-19 2009-12-03 Toshiba Corp 不揮発性記憶装置及びその製造方法

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