WO2009048104A1 - 薄膜太陽電池の製造装置 - Google Patents

薄膜太陽電池の製造装置 Download PDF

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Publication number
WO2009048104A1
WO2009048104A1 PCT/JP2008/068373 JP2008068373W WO2009048104A1 WO 2009048104 A1 WO2009048104 A1 WO 2009048104A1 JP 2008068373 W JP2008068373 W JP 2008068373W WO 2009048104 A1 WO2009048104 A1 WO 2009048104A1
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WO
WIPO (PCT)
Prior art keywords
thin film
film substrate
film
solar battery
production system
Prior art date
Application number
PCT/JP2008/068373
Other languages
English (en)
French (fr)
Inventor
Ryouhei Sakai
Original Assignee
Fuji Electric Systems Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Systems Co., Ltd. filed Critical Fuji Electric Systems Co., Ltd.
Priority to AT08837228T priority Critical patent/ATE537563T1/de
Priority to US12/734,046 priority patent/US20120067278A1/en
Priority to ES08837228T priority patent/ES2378262T3/es
Priority to EP08837228A priority patent/EP2200098B1/en
Priority to CN200880110943A priority patent/CN101821860A/zh
Publication of WO2009048104A1 publication Critical patent/WO2009048104A1/ja

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
    • H01L31/206—Particular processes or apparatus for continuous treatment of the devices, e.g. roll-to roll processes, multi-chamber deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0224—Electrodes
    • H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0224—Electrodes
    • H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042—PV modules or arrays of single PV cells
    • H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
    • H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876—Particular processes or apparatus for batch treatment of the devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Photovoltaic Devices (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

　フィルム基板を搬送する駆動ロールによる搬送シワの発生を防止し、作業性の向上を図りうる薄膜太陽電池の製造装置を提供する。 　巻き出しロールに巻かれた帯状可撓性のフィルム基板を略真空状態に維持された成膜室に送り、前記成膜室に互いに対向して配置された接地電極と、ターゲット材を有する印加電極との間で放電させて、フィルム基板の面上に電極となる金属薄膜を、一定の加熱下で形成し、金属薄膜が形成されたフィルム基板を巻き取り室に設けられた巻取りロールで巻き取るようにした薄膜太陽電池の製造装置において、前記巻取り室５に、金属薄膜２２が形成されたフィルム基板１を一定の張力で搬送する一対の駆動ロール１４，１５を設け、前記フィルム基板の幅方向両端部に対応する前記少なくとも一方の駆動ロール１５の両端部周面にそれぞれ弾性部材の層２１を形成した装置。
PCT/JP2008/068373 2007-10-11 2008-10-09 薄膜太陽電池の製造装置 WO2009048104A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
AT08837228T ATE537563T1 (de) 2007-10-11 2008-10-09 System zur herstellung einer dünnschichtsolarbatterie
US12/734,046 US20120067278A1 (en) 2007-10-11 2008-10-09 Thin film solar cell manufacturing apparatus
ES08837228T ES2378262T3 (es) 2007-10-11 2008-10-09 Sistema de producción de batería solar de película delgada
EP08837228A EP2200098B1 (en) 2007-10-11 2008-10-09 Production system of thin film solar battery
CN200880110943A CN101821860A (zh) 2007-10-11 2008-10-09 薄膜太阳电池制造装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007265537A JP5182610B2 (ja) 2007-10-11 2007-10-11 薄膜太陽電池の製造装置
JP2007-265537 2007-10-11

Publications (1)

Publication Number Publication Date
WO2009048104A1 true WO2009048104A1 (ja) 2009-04-16

Family

ID=40549247

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/068373 WO2009048104A1 (ja) 2007-10-11 2008-10-09 薄膜太陽電池の製造装置

Country Status (7)

Country Link
US (1) US20120067278A1 (ja)
EP (1) EP2200098B1 (ja)
JP (1) JP5182610B2 (ja)
CN (1) CN101821860A (ja)
AT (1) ATE537563T1 (ja)
ES (1) ES2378262T3 (ja)
WO (1) WO2009048104A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013103609A1 (en) * 2012-01-03 2013-07-11 Applied Materials, Inc. Advanced platform for passivating crystalline silicon solar cells

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100988760B1 (ko) * 2009-12-30 2010-10-20 백산철강(주) 태양전지 기판의 전극 제조 장치
JP2012043983A (ja) * 2010-08-19 2012-03-01 Fuji Electric Co Ltd 多層膜形成方法およびそれに用いる成膜装置
CN102163644B (zh) * 2010-10-09 2013-06-12 浙江哈氟龙新能源有限公司 宽幅太阳能电池组背板的制造方法及制造装置
KR101512132B1 (ko) * 2010-10-27 2015-04-15 한국전자통신연구원 박막 증착 장치
CN102654196A (zh) * 2011-03-04 2012-09-05 无锡尚德太阳能电力有限公司 动力传递装置及具备该装置的太阳电池湿制程设备
KR101837917B1 (ko) * 2011-04-25 2018-03-12 가부시키가이샤 니콘 기판처리장치
JP5831759B2 (ja) * 2011-04-28 2015-12-09 日東電工株式会社 真空成膜方法、及び該方法によって得られる積層体
US8697582B2 (en) * 2011-11-22 2014-04-15 Panasonic Corporation Substrate conveying roller, thin film manufacturing device, and thin film manufacturing method
SE536952C2 (sv) * 2012-06-25 2014-11-11 Impact Coatings Ab Kontinuerlig rulle-till-rulle-anordning
CN102983216B (zh) * 2012-11-22 2015-11-25 深圳首创光伏有限公司 制造cigs薄膜太阳能电池的吸收层的反应装置及方法
WO2017082438A1 (ko) * 2015-11-10 2017-05-18 주식회사 제우스 태빙장치
JP6950506B2 (ja) * 2017-12-11 2021-10-13 住友金属鉱山株式会社 長尺基板の処理装置と処理方法

Citations (6)

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Publication number Priority date Publication date Assignee Title
US4476636A (en) * 1980-10-27 1984-10-16 Gross Frank R Boundary air layer modification structure for heat transfer roll
JPH0188662U (ja) * 1987-12-04 1989-06-12
JP2001072291A (ja) 1999-09-03 2001-03-21 Toppan Printing Co Ltd 搬送ロールおよびそれを用いた長尺物の搬送方法
JP2001114461A (ja) * 1999-10-14 2001-04-24 Sony Corp ガイドロール装置および磁気テープ製造装置
JP2001230430A (ja) * 2000-02-18 2001-08-24 Fuji Electric Co Ltd 薄膜太陽電池モジュールの製造装置
JP2003258280A (ja) 2002-03-05 2003-09-12 Fuji Electric Co Ltd 薄膜太陽電池の製造装置

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LV13253B (en) * 2003-06-30 2005-03-20 Sidrabe As Device and method for coating roll substrates in vacuum

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4476636A (en) * 1980-10-27 1984-10-16 Gross Frank R Boundary air layer modification structure for heat transfer roll
JPH0188662U (ja) * 1987-12-04 1989-06-12
JP2001072291A (ja) 1999-09-03 2001-03-21 Toppan Printing Co Ltd 搬送ロールおよびそれを用いた長尺物の搬送方法
JP2001114461A (ja) * 1999-10-14 2001-04-24 Sony Corp ガイドロール装置および磁気テープ製造装置
JP2001230430A (ja) * 2000-02-18 2001-08-24 Fuji Electric Co Ltd 薄膜太陽電池モジュールの製造装置
JP2003258280A (ja) 2002-03-05 2003-09-12 Fuji Electric Co Ltd 薄膜太陽電池の製造装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013103609A1 (en) * 2012-01-03 2013-07-11 Applied Materials, Inc. Advanced platform for passivating crystalline silicon solar cells

Also Published As

Publication number Publication date
US20120067278A1 (en) 2012-03-22
EP2200098A4 (en) 2010-11-10
ATE537563T1 (de) 2011-12-15
JP5182610B2 (ja) 2013-04-17
EP2200098A1 (en) 2010-06-23
ES2378262T3 (es) 2012-04-10
JP2009094399A (ja) 2009-04-30
CN101821860A (zh) 2010-09-01
EP2200098B1 (en) 2011-12-14

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