WO2009041439A1 - 光導波路及びその製造方法 - Google Patents

光導波路及びその製造方法 Download PDF

Info

Publication number
WO2009041439A1
WO2009041439A1 PCT/JP2008/067192 JP2008067192W WO2009041439A1 WO 2009041439 A1 WO2009041439 A1 WO 2009041439A1 JP 2008067192 W JP2008067192 W JP 2008067192W WO 2009041439 A1 WO2009041439 A1 WO 2009041439A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical waveguide
producing
same
cladding layer
layer
Prior art date
Application number
PCT/JP2008/067192
Other languages
English (en)
French (fr)
Inventor
Masatoshi Yamaguchi
Toshihiko Takasaki
Tokutarou Komatsu
Atsushi Takahashi
Original Assignee
Hitachi Chemical Company, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Company, Ltd. filed Critical Hitachi Chemical Company, Ltd.
Priority to US12/680,372 priority Critical patent/US20100278496A1/en
Priority to JP2009534330A priority patent/JPWO2009041439A1/ja
Publication of WO2009041439A1 publication Critical patent/WO2009041439A1/ja

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation

Abstract

　基材上に第１のクラッド層、パターニングされたコア層、及び第２のクラッド層がこの順に積層されてなる光導波路であって、コア層の高さが２０μｍ以上であり、第２のクラッド層におけるコア層の外周から１０μｍの範囲の硬化率が９５％以上である光導波路である。 　光導波路形成用樹脂を用い、均一なコアとクラッドを有し、透明性及び耐熱性に優れた光導波路、及び生産性に優れた該光導波路の製造方法を提供することができる。
PCT/JP2008/067192 2007-09-26 2008-09-24 光導波路及びその製造方法 WO2009041439A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/680,372 US20100278496A1 (en) 2007-09-26 2008-09-24 Optical waveguide and method for producing the same
JP2009534330A JPWO2009041439A1 (ja) 2007-09-26 2008-09-24 光導波路及びその製造方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007249063 2007-09-26
JP2007-249063 2007-09-26
JP2008-096361 2008-04-02
JP2008096361 2008-04-02

Publications (1)

Publication Number Publication Date
WO2009041439A1 true WO2009041439A1 (ja) 2009-04-02

Family

ID=40511322

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/067192 WO2009041439A1 (ja) 2007-09-26 2008-09-24 光導波路及びその製造方法

Country Status (4)

Country Link
US (1) US20100278496A1 (ja)
JP (1) JPWO2009041439A1 (ja)
TW (1) TW200925685A (ja)
WO (1) WO2009041439A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106646736B (zh) * 2016-11-18 2018-11-16 华为机器有限公司 光波导

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63182889A (ja) * 1987-01-26 1988-07-28 関西ペイント株式会社 プリント配線板の製造方法
JPH0235457A (ja) * 1988-07-26 1990-02-06 Sony Corp 露光方法及び露光装置
JPH1145455A (ja) * 1997-01-29 1999-02-16 Ricoh Co Ltd 光ピックアップ用光学素子および光ピックアップ用光学素子の製造方法および光ピックアップ
JP2003066615A (ja) * 2001-08-30 2003-03-05 Nec Toppan Circuit Solutions Inc パターン露光方法
JP2006162886A (ja) * 2004-12-06 2006-06-22 Fujikura Ltd 永久レジスト層の形成方法
JP2006308960A (ja) * 2005-04-28 2006-11-09 Hitachi Chem Co Ltd マイクロレンズアレイの製造方法、マイクロレンズアレイ用感光性樹脂組成物及びマイクロレンズアレイ用感光性エレメント

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5026135A (en) * 1990-04-20 1991-06-25 E. I. Du Pont De Nemours And Company Moisture sealing of optical waveguide devices with doped silicon dioxide
US6306563B1 (en) * 1999-06-21 2001-10-23 Corning Inc. Optical devices made from radiation curable fluorinated compositions
EP2392619A1 (en) * 2004-10-07 2011-12-07 Hitachi Chemical Company, Ltd. Resin composition for optical material, resin film for optical material, and optical waveguide using same

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63182889A (ja) * 1987-01-26 1988-07-28 関西ペイント株式会社 プリント配線板の製造方法
JPH0235457A (ja) * 1988-07-26 1990-02-06 Sony Corp 露光方法及び露光装置
JPH1145455A (ja) * 1997-01-29 1999-02-16 Ricoh Co Ltd 光ピックアップ用光学素子および光ピックアップ用光学素子の製造方法および光ピックアップ
JP2003066615A (ja) * 2001-08-30 2003-03-05 Nec Toppan Circuit Solutions Inc パターン露光方法
JP2006162886A (ja) * 2004-12-06 2006-06-22 Fujikura Ltd 永久レジスト層の形成方法
JP2006308960A (ja) * 2005-04-28 2006-11-09 Hitachi Chem Co Ltd マイクロレンズアレイの製造方法、マイクロレンズアレイ用感光性樹脂組成物及びマイクロレンズアレイ用感光性エレメント

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
TAKASAKI T. ET AL.: "Film-gata Hikari Doharo Zairyo", HITACHI KASEI TECHNICAL REPORT, no. 48, January 2007 (2007-01-01), pages 17 - 22 *

Also Published As

Publication number Publication date
US20100278496A1 (en) 2010-11-04
JPWO2009041439A1 (ja) 2011-01-27
TW200925685A (en) 2009-06-16

Similar Documents

Publication Publication Date Title
WO2009066429A1 (ja) 光ファイバ及びその製造方法
WO2010110496A3 (en) Method of manufacturing optical waveguide having mirror face, and optoelectronic composite wiring board
DK1749229T3 (da) Fremgangsmåde og anordning til fremstilling af et optisk kabel
JP2008310034A (ja) ホーリーファイバの製造方法およびホーリーファイバ
CN101533114A (zh) 一种逆向反光材料的制造方法
CA2239276A1 (en) Optical fiber grating and manufacturing method therefor
MY159204A (en) Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern
CA2482724A1 (en) Stress-induced control of polarization dependent properties in photonic devices
WO2008139570A1 (ja) 光ファイバの製造方法および光ファイバの製造装置
WO2009002125A3 (en) Method for manufacturing transparent plastic film and transparent plastic film manufactured by the method
WO2008108459A1 (ja) 光ファイバ心線
AU2001285792A1 (en) Method for producing composite elements and composite element
WO2005052641A3 (en) Optical waveguides and methods thereof
EP2133716A3 (en) Optical waveguide manufacturing method
JP2010286690A5 (ja)
DK1771293T3 (da) Fremgangsmåde og apparat til fremstilling af et hovedsageligt cylindrisk formet objekt
CN101446664B (zh) 中空石英塑料特种光纤
WO2009041439A1 (ja) 光導波路及びその製造方法
WO2009078341A1 (ja) 光導波路及びその製造方法
TW200951520A (en) Method for forming light waveguide and the same
ATE407918T1 (de) Verfahren und vorrichtung zur herstellung einer beschichtung mit niedriger oh-gruppenanzahl
JP2006263975A (ja) 光学素子の製造方法
ATE497184T1 (de) Verfahren zur herstellung eines optischen wellenleiters
JP5140561B2 (ja) 光ファイバテープ心線の製造方法
WO2008129836A1 (ja) 光ファイバ、それを用いた照明装置及びそれらの製造方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08834350

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2009534330

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 12680372

Country of ref document: US

122 Ep: pct application non-entry in european phase

Ref document number: 08834350

Country of ref document: EP

Kind code of ref document: A1