WO2008145102A2 - Procédé de revêtement d'un substrat - Google Patents

Procédé de revêtement d'un substrat Download PDF

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Publication number
WO2008145102A2
WO2008145102A2 PCT/DE2008/000886 DE2008000886W WO2008145102A2 WO 2008145102 A2 WO2008145102 A2 WO 2008145102A2 DE 2008000886 W DE2008000886 W DE 2008000886W WO 2008145102 A2 WO2008145102 A2 WO 2008145102A2
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
behavior
plasma
deposited
layer
Prior art date
Application number
PCT/DE2008/000886
Other languages
German (de)
English (en)
Other versions
WO2008145102A3 (fr
WO2008145102A4 (fr
Inventor
Andreas Heft
Andreas Pfuch
Arnd Schimanski
Bernd Grünler
Martin Polster
Original Assignee
Innovent E.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Innovent E.V. filed Critical Innovent E.V.
Priority to EP08758126.0A priority Critical patent/EP2150633B1/fr
Publication of WO2008145102A2 publication Critical patent/WO2008145102A2/fr
Publication of WO2008145102A3 publication Critical patent/WO2008145102A3/fr
Publication of WO2008145102A4 publication Critical patent/WO2008145102A4/fr
Priority to US12/627,690 priority patent/US20100143602A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd

Definitions

  • the erf ⁇ ndungswele method is characterized in that in a plasma coating process, the plasma on the one hand provides the reaction energy and on the other hand, the surface is not additionally heated.
  • An exclusion of air and water vapor or reaction products thereof are easily possible in a plasma coating process, in contrast to a flame, for example by a suitable choice of the working gas. In this way, for example, air or oxygen can be kept away from the layers to be formed and from the surface.
  • the deposited layer preferably comprises at least one of silicon, silver, gold, copper, iron, nickel, cobalt, selenium, tin, aluminum, titanium, zinc, zirconium, tantalum, chromium, manganese, molybdenum, tungsten, bismuth, germanium, niobium , Vanadium, gallium, indium, magnesium, calcium, strontium, barium, lithium, lanthanides, carbon, oxygen, nitrogen, sulfur, boron, phosphorus, fluorine, halogens and hydrogen.
  • the layers contain oxidic or / and nitridic compounds of silicon, titanium, tin, aluminum, zinc, tungsten and zirconium.
  • the precursor used is preferably an organosilicon and / or an organo-titanium compound, for example hexamethyldisioxane, tetramethylsilane, tetramethoxysilane, tetraethoxysilane, titanium tetraisopropylate or titanium tetraisobutylate.
  • organosilicon and / or an organo-titanium compound for example hexamethyldisioxane, tetramethylsilane, tetramethoxysilane, tetraethoxysilane, titanium tetraisopropylate or titanium tetraisobutylate.
  • FIG. 2 shows transmission spectra of flat glass substrates in the untreated state and coated with layers of different layer thickness by means of a free-jet plasma source at atmospheric pressure
  • the transmission spectra S2, S3, S4 show characteristics of substrates having layers with a layer thickness of 47 nm, 77 nm and 90 ⁇ m, respectively, deposited by the described method. It is clear from the figure that the transmission ⁇ of the coated substrates characterized by the transmission spectra S2, S3, S4 is markedly improved compared to the uncoated substrate at a wavelength ⁇ of approximately 550 nm.
  • the coating process may be performed subsequent to a manufacturing process of the substrate on the still hot surface of the substrate.
  • a manufacturing process of the substrate on the still hot surface of the substrate In a glass substrate produced in a float tank, its coating can take place immediately afterwards.
  • the temperature of the surface is in a range of 100 ° C to 800 0 C 5, especially in a range of 300 ° C to 800 ° C.
  • the precursors are chosen in particular such that the deposited layer comprises at least one of the components silicon, silver, gold, copper, iron, nickel, cobalt, selenium, tin, aluminum, titanium, zinc, zirconium, tantalum, chromium, manganese, molybdenum, tungsten , Bismuth, germanium, niobium, vanadium, gallium, indium, magnesium, calcium, strontium, barium, lithium, lanthanides, carbon, oxygen, nitrogen, sulfur, boron, phosphorus, fluorine, halogens and hydrogen.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

La présente invention concerne un procédé de revêtement d'un substrat. Selon l'invention, un jet de plasma est produit à partir d'un gaz de travail, au moins un précurseur est ajouté au gaz de travail et/ou au jet de plasma et mis en réaction dans le jet de plasma, et au moins un produit réactionnel d'au moins l'un des précurseurs est déposé sur au moins une surface du substrat et/ou sur au moins une couche recouvrant la surface, au moins l'une des couches déposées améliorant les propriétés de transmission optique du substrat.
PCT/DE2008/000886 2007-05-29 2008-05-28 Procédé de revêtement d'un substrat WO2008145102A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP08758126.0A EP2150633B1 (fr) 2007-05-29 2008-05-28 Procédé de revêtement d'un substrat
US12/627,690 US20100143602A1 (en) 2007-05-29 2009-11-30 Method for coating a substrate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007025152.3 2007-05-29
DE102007025152A DE102007025152B4 (de) 2007-05-29 2007-05-29 Verfahren zum Beschichten eines Substrats

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/627,690 Continuation US20100143602A1 (en) 2007-05-29 2009-11-30 Method for coating a substrate

Publications (3)

Publication Number Publication Date
WO2008145102A2 true WO2008145102A2 (fr) 2008-12-04
WO2008145102A3 WO2008145102A3 (fr) 2009-02-12
WO2008145102A4 WO2008145102A4 (fr) 2009-04-09

Family

ID=39917295

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2008/000886 WO2008145102A2 (fr) 2007-05-29 2008-05-28 Procédé de revêtement d'un substrat

Country Status (4)

Country Link
US (1) US20100143602A1 (fr)
EP (1) EP2150633B1 (fr)
DE (1) DE102007025152B4 (fr)
WO (1) WO2008145102A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011028527A2 (fr) * 2009-08-24 2011-03-10 Applied Materials, Inc. Dépôt in situ de matériaux actifs à base de lithium pour batterie par pulvérisation par plasma

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI20061014A0 (fi) * 2006-11-17 2006-11-17 Beneq Oy Diffuusiopinnoitusmenetelmä
DE102008029681A1 (de) * 2008-06-23 2009-12-24 Plasma Treat Gmbh Verfahren und Vorrichtung zum Aufbringen einer Schicht, insbesondere einer selbstreinigend und/oder antimikrobiell wirkenden photokatalytischen Schicht, auf eine Oberfläche
DE102008060923B4 (de) * 2008-12-06 2012-09-27 Innovent E.V. Verwendung einer Schicht
DE102008060924A1 (de) * 2008-12-06 2010-06-10 Innovent E.V. Verfahren zur Abscheidung einer Schicht auf einem Substrat
RU2467963C1 (ru) * 2011-03-25 2012-11-27 Государственное образовательное учреждение высшего профессионального образования "Белгородский государственный технологический университет им. В.Г. Шухова" Способ получения покрытий на блочном пеностекле
DE102013201388A1 (de) 2013-01-29 2014-07-31 Evonik Industries Ag Verfahren zur Herstellung eines Metall-Kunststoff-Hybridbauteils
FR3008295B1 (fr) * 2013-07-10 2015-09-04 Arc Int France Recipient a action effervescente

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3674453A (en) * 1968-08-16 1972-07-04 Pilkington Brothers Ltd Production of float glass having an oxidized metal-modified surface
EP1394283A1 (fr) * 2002-08-29 2004-03-03 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Procédé et dispositif pour le revêtement de substrats de grande surface à pression atmospherique
FR2887872A1 (fr) * 2005-07-01 2007-01-05 Saint Gobain Procede et installation pour le traitement d'un substrat verrier chaud par un plasma a pression atmospherique

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DE3328777A1 (de) * 1983-08-10 1985-02-28 Fried. Krupp Gmbh, 4300 Essen Plasmabrenner und verfahren zu dessen betreiben
US5508368A (en) * 1994-03-03 1996-04-16 Diamonex, Incorporated Ion beam process for deposition of highly abrasion-resistant coatings
DE19607086A1 (de) * 1996-02-24 1997-08-28 Telefunken Microelectron Neigungssensor
DE19807086A1 (de) * 1998-02-20 1999-08-26 Fraunhofer Ges Forschung Verfahren zum Beschichten von Oberflächen eines Substrates, Vorrichtung zur Durchführung des Verfahrens, Schichtsystem sowie beschichtetes Substrat
US20020172775A1 (en) * 2000-10-24 2002-11-21 Harry Buhay Method of making coated articles and coated articles made thereby
US6454912B1 (en) * 2001-03-15 2002-09-24 Micron Technology, Inc. Method and apparatus for the fabrication of ferroelectric films
TWI273143B (en) * 2002-06-10 2007-02-11 Konica Corp Layer formation method, and substrate with a layer formed by the method
GB0217553D0 (en) * 2002-07-30 2002-09-11 Sheel David W Titania coatings by CVD at atmospheric pressure
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DE102004015217B4 (de) * 2004-03-23 2006-04-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Ausbildung dünner Schichten aus Siliziumnitrid auf Substratoberflächen
DE102005029360B4 (de) * 2005-06-24 2011-11-10 Softal Corona & Plasma Gmbh Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen
TWI341872B (en) * 2006-08-07 2011-05-11 Ind Tech Res Inst Plasma deposition apparatus and depositing method thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3674453A (en) * 1968-08-16 1972-07-04 Pilkington Brothers Ltd Production of float glass having an oxidized metal-modified surface
EP1394283A1 (fr) * 2002-08-29 2004-03-03 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Procédé et dispositif pour le revêtement de substrats de grande surface à pression atmospherique
FR2887872A1 (fr) * 2005-07-01 2007-01-05 Saint Gobain Procede et installation pour le traitement d'un substrat verrier chaud par un plasma a pression atmospherique

Non-Patent Citations (1)

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HOPFE V ET AL: "LINEAR EXTENDED ARCJET-CVS - A NEW PECVD APPROACH FOR CONTINUOUS WIDE AREA COATING UNDER ATMOSPHERIC PRESSURE" CHEMICAL VAPOR DEPOSITION, WILEY-VCH VERLAG, WEINHEIM, DE, Bd. 11, 1. Januar 2005 (2005-01-01), Seiten 510-522, XP001501983 ISSN: 0948-1907 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011028527A2 (fr) * 2009-08-24 2011-03-10 Applied Materials, Inc. Dépôt in situ de matériaux actifs à base de lithium pour batterie par pulvérisation par plasma
WO2011028527A3 (fr) * 2009-08-24 2011-06-30 Applied Materials, Inc. Dépôt in situ de matériaux actifs à base de lithium pour batterie par pulvérisation par plasma

Also Published As

Publication number Publication date
WO2008145102A3 (fr) 2009-02-12
DE102007025152A1 (de) 2008-12-04
EP2150633B1 (fr) 2014-09-17
EP2150633A2 (fr) 2010-02-10
DE102007025152B4 (de) 2012-02-09
WO2008145102A4 (fr) 2009-04-09
US20100143602A1 (en) 2010-06-10

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