WO2008143095A1 - 感光性樹脂及びマイクロレンズの製造方法 - Google Patents

感光性樹脂及びマイクロレンズの製造方法 Download PDF

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Publication number
WO2008143095A1
WO2008143095A1 PCT/JP2008/058860 JP2008058860W WO2008143095A1 WO 2008143095 A1 WO2008143095 A1 WO 2008143095A1 JP 2008058860 W JP2008058860 W JP 2008058860W WO 2008143095 A1 WO2008143095 A1 WO 2008143095A1
Authority
WO
WIPO (PCT)
Prior art keywords
positive resist
resist composition
alkali
wavelength
measured
Prior art date
Application number
PCT/JP2008/058860
Other languages
English (en)
French (fr)
Inventor
Takayuki Negi
Takahiro Sakaguchi
Takahiro Kishioka
Original Assignee
Nissan Chemical Industries, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Industries, Ltd. filed Critical Nissan Chemical Industries, Ltd.
Priority to US12/451,474 priority Critical patent/US8940470B2/en
Priority to JP2009515173A priority patent/JP5093525B2/ja
Priority to CN2008800138476A priority patent/CN101669069B/zh
Priority to KR1020157013792A priority patent/KR101547949B1/ko
Priority to EP08752731A priority patent/EP2154569A4/en
Publication of WO2008143095A1 publication Critical patent/WO2008143095A1/ja

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

【課題】耐熱性、高解像度、高い光取り出し効率を有するマイクロレンズ用材料を提供する。 【解決手段】芳香族縮合環又はその誘導体を有する単位構造を含むアルカリ可溶性ポリマー（Ａ）と、光分解しアルカリ可溶性基を生ずる有機基を有する化合物（Ｂ）とを含むポジ型レジスト組成物である。該ポジ型レジスト組成物は、波長６３３ｎｍで屈折率１．６以上であり、波長４００ないし７３０ｎｍにおいて透過率８０％以上の塗膜物性を有する。ポジ型レジスト組成物を基板上に塗布し、乾燥し、露光し、そして現像する工程を含むマイクロレンズの製造方法である。
PCT/JP2008/058860 2007-05-17 2008-05-14 感光性樹脂及びマイクロレンズの製造方法 WO2008143095A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US12/451,474 US8940470B2 (en) 2007-05-17 2008-05-14 Photosensitive resin and process for producing microlens
JP2009515173A JP5093525B2 (ja) 2007-05-17 2008-05-14 感光性樹脂及びマイクロレンズの製造方法
CN2008800138476A CN101669069B (zh) 2007-05-17 2008-05-14 感光性树脂和微透镜的制造方法
KR1020157013792A KR101547949B1 (ko) 2007-05-17 2008-05-14 감광성 수지 및 마이크로 렌즈의 제조 방법
EP08752731A EP2154569A4 (en) 2007-05-17 2008-05-14 PHOTOSENSITIVE RESIN AND METHOD FOR MANUFACTURING MICROLENSES

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-131444 2007-05-17
JP2007131444 2007-05-17

Publications (1)

Publication Number Publication Date
WO2008143095A1 true WO2008143095A1 (ja) 2008-11-27

Family

ID=40031804

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/058860 WO2008143095A1 (ja) 2007-05-17 2008-05-14 感光性樹脂及びマイクロレンズの製造方法

Country Status (7)

Country Link
US (1) US8940470B2 (ja)
EP (2) EP2154569A4 (ja)
JP (2) JP5093525B2 (ja)
KR (2) KR101547949B1 (ja)
CN (1) CN101669069B (ja)
TW (1) TWI439810B (ja)
WO (1) WO2008143095A1 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011059425A (ja) * 2009-09-10 2011-03-24 Fujifilm Corp 感光性樹脂組成物、硬化膜及びその形成方法、有機ｅｌ表示装置、並びに、液晶表示装置
CN102483570A (zh) * 2009-09-14 2012-05-30 日产化学工业株式会社 含有共聚物的感光性树脂组合物
WO2012073742A1 (ja) * 2010-11-30 2012-06-07 日産化学工業株式会社 マイクロレンズ用感光性樹脂組成物
US20120156598A1 (en) * 2009-08-24 2012-06-21 Nissan Chemical Industries, Ltd. Photosensitive resin composition for microlens
WO2012105288A1 (ja) * 2011-01-31 2012-08-09 日産化学工業株式会社 マイクロレンズ形成用感光性樹脂組成物
KR20210092732A (ko) 2018-11-21 2021-07-26 닛산 가가쿠 가부시키가이샤 열경화성 수지조성물

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5922013B2 (ja) * 2011-12-28 2016-05-24 富士フイルム株式会社 光学部材セット及びこれを用いた固体撮像素子
KR102247349B1 (ko) * 2019-11-18 2021-05-03 한국화학연구원 색변환 광결정 구조체 및 이의 용도

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JPH0475384A (ja) * 1990-07-17 1992-03-10 Sharp Corp 固体撮像素子
JPH04352101A (ja) * 1991-05-30 1992-12-07 Japan Synthetic Rubber Co Ltd マイクロレンズ用感放射線性樹脂組成物
JPH0853517A (ja) 1994-08-11 1996-02-27 Nippon Steel Chem Co Ltd 耐熱性に優れた光学材料用高屈折率樹脂
JPH10142799A (ja) * 1996-09-13 1998-05-29 Toshiba Corp 感光性材料、パターン形成方法、および電子部品の製造方法
JPH1184663A (ja) * 1996-12-24 1999-03-26 Toshiba Corp 感光性組成物、およびこれを用いたパターン形成方法ならびに電子部品の製造方法
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JP2006113136A (ja) * 2004-10-12 2006-04-27 Sumitomo Bakelite Co Ltd フォトレジスト用ノボラック型フェノール樹脂組成物
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JP2007086479A (ja) * 2005-09-22 2007-04-05 Fujifilm Corp レジスト組成物及びそれを用いたパターン形成方法
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TWI424270B (zh) * 2004-05-26 2014-01-21 Nissan Chemical Ind Ltd 正型感光性樹脂組成物及所得層間絕緣膜以及微透鏡
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KR101254349B1 (ko) * 2004-10-29 2013-04-12 제이에스알 가부시끼가이샤 포지티브형 감광성 절연 수지 조성물 및 그의 경화물
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JPH0475384A (ja) * 1990-07-17 1992-03-10 Sharp Corp 固体撮像素子
JPH04352101A (ja) * 1991-05-30 1992-12-07 Japan Synthetic Rubber Co Ltd マイクロレンズ用感放射線性樹脂組成物
JPH0853517A (ja) 1994-08-11 1996-02-27 Nippon Steel Chem Co Ltd 耐熱性に優れた光学材料用高屈折率樹脂
JPH10142799A (ja) * 1996-09-13 1998-05-29 Toshiba Corp 感光性材料、パターン形成方法、および電子部品の製造方法
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JP2006113136A (ja) * 2004-10-12 2006-04-27 Sumitomo Bakelite Co Ltd フォトレジスト用ノボラック型フェノール樹脂組成物
JP2006154403A (ja) * 2004-11-30 2006-06-15 Nippon Zeon Co Ltd パターン形成方法
JP2007086479A (ja) * 2005-09-22 2007-04-05 Fujifilm Corp レジスト組成物及びそれを用いたパターン形成方法
JP2008115148A (ja) * 2006-01-06 2008-05-22 Mitsubishi Rayon Co Ltd 重合性モノマー及びその製造方法
JP2007254495A (ja) * 2006-03-20 2007-10-04 Shin Etsu Chem Co Ltd 高分子化合物及びポジ型レジスト材料並びにこれを用いたパターン形成方法

Non-Patent Citations (1)

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See also references of EP2154569A4 *

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120156598A1 (en) * 2009-08-24 2012-06-21 Nissan Chemical Industries, Ltd. Photosensitive resin composition for microlens
US8993699B2 (en) * 2009-08-24 2015-03-31 Nissan Chemical Industries, Ltd. Photosensitive resin composition for microlens
JP2011059425A (ja) * 2009-09-10 2011-03-24 Fujifilm Corp 感光性樹脂組成物、硬化膜及びその形成方法、有機ｅｌ表示装置、並びに、液晶表示装置
CN102483570A (zh) * 2009-09-14 2012-05-30 日产化学工业株式会社 含有共聚物的感光性树脂组合物
CN102483570B (zh) * 2009-09-14 2013-10-23 日产化学工业株式会社 含有共聚物的感光性树脂组合物以及固化膜、微透镜
US8674043B2 (en) 2009-09-14 2014-03-18 Nissan Chemical Industries, Ltd. Photosensitive resin composition containing copolymer
KR101723165B1 (ko) 2010-11-30 2017-04-05 닛산 가가쿠 고교 가부시키 가이샤 마이크로 렌즈용 감광성 수지 조성물
WO2012073742A1 (ja) * 2010-11-30 2012-06-07 日産化学工業株式会社 マイクロレンズ用感光性樹脂組成物
US20130245152A1 (en) * 2010-11-30 2013-09-19 Nissan Chemical Industries, Ltd. Photosensitive resin composition for microlenses
KR20130123406A (ko) * 2010-11-30 2013-11-12 닛산 가가쿠 고교 가부시키 가이샤 마이크로 렌즈용 감광성 수지 조성물
US8796349B2 (en) 2010-11-30 2014-08-05 Nissan Chemical Industries, Ltd. Photosensitive resin composition for microlenses
JP5696858B2 (ja) * 2010-11-30 2015-04-08 日産化学工業株式会社 マイクロレンズ用感光性樹脂組成物
WO2012105288A1 (ja) * 2011-01-31 2012-08-09 日産化学工業株式会社 マイクロレンズ形成用感光性樹脂組成物
JP5867735B2 (ja) * 2011-01-31 2016-02-24 日産化学工業株式会社 マイクロレンズ形成用感光性樹脂組成物
KR101740473B1 (ko) 2011-01-31 2017-05-26 닛산 가가쿠 고교 가부시키 가이샤 마이크로 렌즈 형성용 감광성 수지 조성물
KR20210092732A (ko) 2018-11-21 2021-07-26 닛산 가가쿠 가부시키가이샤 열경화성 수지조성물

Also Published As

Publication number Publication date
EP2154569A1 (en) 2010-02-17
CN101669069B (zh) 2013-03-20
EP2154569A4 (en) 2011-12-28
JP2012247801A (ja) 2012-12-13
KR101547949B1 (ko) 2015-08-28
KR20100017758A (ko) 2010-02-16
TWI439810B (zh) 2014-06-01
TW200912541A (en) 2009-03-16
EP2674815B1 (en) 2016-08-24
CN101669069A (zh) 2010-03-10
KR20150067384A (ko) 2015-06-17
JPWO2008143095A1 (ja) 2010-08-05
US20100096663A1 (en) 2010-04-22
EP2674815A1 (en) 2013-12-18
US8940470B2 (en) 2015-01-27
JP5093525B2 (ja) 2012-12-12

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