WO2008142923A1 - 基板処理装置および基板処理方法 - Google Patents
基板処理装置および基板処理方法 Download PDFInfo
- Publication number
- WO2008142923A1 WO2008142923A1 PCT/JP2008/057034 JP2008057034W WO2008142923A1 WO 2008142923 A1 WO2008142923 A1 WO 2008142923A1 JP 2008057034 W JP2008057034 W JP 2008057034W WO 2008142923 A1 WO2008142923 A1 WO 2008142923A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate processing
- substrate
- coating liquid
- removing liquid
- liquid
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Weting (AREA)
Abstract
塗布ユニット(COV)は、基板(W)の上面に塗布された塗布液の液面から光干渉縞(I)が消失する前に、基板(W)の回転数を低下させるとともに除去液の供給を開始する。このため、レジストカバー膜(CVT)として基板(W)の上面に徐々に定着しつつも流動性が残る塗布液の周縁部分を、除去液の物理的な浸食により除去することができる。したがって、塗布液の周縁部分を短時間に精度よく除去することができる。また、物理的な浸食作用を利用するため、反射防止膜(CVB)やレジスト膜(CVR)用の除去液と同一の除去液を使用することができる。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-133878 | 2007-05-21 | ||
JP2007133878A JP2008288488A (ja) | 2007-05-21 | 2007-05-21 | 基板処理装置および基板処理方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008142923A1 true WO2008142923A1 (ja) | 2008-11-27 |
Family
ID=40031639
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/057034 WO2008142923A1 (ja) | 2007-05-21 | 2008-04-09 | 基板処理装置および基板処理方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2008288488A (ja) |
TW (1) | TW200903601A (ja) |
WO (1) | WO2008142923A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013041129A1 (de) * | 2011-09-20 | 2013-03-28 | Ev Group E. Thallner Gmbh | Vorrichtung und verfahren zur beschichtung eines trägerwafers |
CN109791883A (zh) * | 2016-09-16 | 2019-05-21 | 株式会社斯库林集团 | 基板处理方法、基板处理装置 |
CN109904093A (zh) * | 2017-12-11 | 2019-06-18 | 株式会社斯库林集团 | 基板处理方法和基板处理装置 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105993061A (zh) * | 2014-02-13 | 2016-10-05 | 三菱电机株式会社 | 半导体装置的制造方法 |
JP6363249B2 (ja) * | 2017-04-17 | 2018-07-25 | 東京エレクトロン株式会社 | 基板処理方法および基板処理装置 |
JP2019067894A (ja) * | 2017-09-29 | 2019-04-25 | エイブリック株式会社 | 半導体装置の製造方法 |
JP7202960B2 (ja) * | 2019-04-16 | 2023-01-12 | 東京エレクトロン株式会社 | 塗布膜形成方法及び塗布膜形成装置 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5819350B2 (ja) * | 1976-04-08 | 1983-04-18 | 富士写真フイルム株式会社 | スピンコ−テイング方法 |
JPH08264412A (ja) * | 1995-03-20 | 1996-10-11 | Nittetsu Semiconductor Kk | 半導体装置製造工程における塗布液の塗布方法 |
JPH08281184A (ja) * | 1995-04-12 | 1996-10-29 | Tokyo Electron Ltd | 処理装置及び処理方法 |
JP2003324052A (ja) * | 2002-04-30 | 2003-11-14 | Tokyo Electron Ltd | 塗布膜除去方法および塗布膜形成除去装置 |
JP2006093409A (ja) * | 2004-09-24 | 2006-04-06 | Tokyo Electron Ltd | 塗布処理装置及び塗布処理方法 |
JP2007036121A (ja) * | 2005-07-29 | 2007-02-08 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2007134671A (ja) * | 2005-10-11 | 2007-05-31 | Tokyo Electron Ltd | 基板処理方法及び基板処理装置 |
JP2007220989A (ja) * | 2006-02-17 | 2007-08-30 | Tokyo Electron Ltd | 基板処理方法、基板処理装置、その制御プログラム及びコンピュータ読取可能な記憶媒体 |
-
2007
- 2007-05-21 JP JP2007133878A patent/JP2008288488A/ja active Pending
-
2008
- 2008-04-09 WO PCT/JP2008/057034 patent/WO2008142923A1/ja active Application Filing
- 2008-05-12 TW TW97117381A patent/TW200903601A/zh unknown
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5819350B2 (ja) * | 1976-04-08 | 1983-04-18 | 富士写真フイルム株式会社 | スピンコ−テイング方法 |
JPH08264412A (ja) * | 1995-03-20 | 1996-10-11 | Nittetsu Semiconductor Kk | 半導体装置製造工程における塗布液の塗布方法 |
JPH08281184A (ja) * | 1995-04-12 | 1996-10-29 | Tokyo Electron Ltd | 処理装置及び処理方法 |
JP2003324052A (ja) * | 2002-04-30 | 2003-11-14 | Tokyo Electron Ltd | 塗布膜除去方法および塗布膜形成除去装置 |
JP2006093409A (ja) * | 2004-09-24 | 2006-04-06 | Tokyo Electron Ltd | 塗布処理装置及び塗布処理方法 |
JP2007036121A (ja) * | 2005-07-29 | 2007-02-08 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2007134671A (ja) * | 2005-10-11 | 2007-05-31 | Tokyo Electron Ltd | 基板処理方法及び基板処理装置 |
JP2007220989A (ja) * | 2006-02-17 | 2007-08-30 | Tokyo Electron Ltd | 基板処理方法、基板処理装置、その制御プログラム及びコンピュータ読取可能な記憶媒体 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013041129A1 (de) * | 2011-09-20 | 2013-03-28 | Ev Group E. Thallner Gmbh | Vorrichtung und verfahren zur beschichtung eines trägerwafers |
US20140227440A1 (en) * | 2011-09-20 | 2014-08-14 | Ev Group E. Thallner Gmbh | Device and method for coating of a carrier wafer |
US10497601B2 (en) | 2011-09-20 | 2019-12-03 | Ev Group E. Thallner Gmbh | Device and method for coating of a carrier wafer |
CN109791883A (zh) * | 2016-09-16 | 2019-05-21 | 株式会社斯库林集团 | 基板处理方法、基板处理装置 |
CN109791883B (zh) * | 2016-09-16 | 2023-02-28 | 株式会社斯库林集团 | 基板处理方法、基板处理装置 |
CN109904093A (zh) * | 2017-12-11 | 2019-06-18 | 株式会社斯库林集团 | 基板处理方法和基板处理装置 |
CN109904093B (zh) * | 2017-12-11 | 2023-08-29 | 株式会社斯库林集团 | 基板处理方法和基板处理装置 |
Also Published As
Publication number | Publication date |
---|---|
TW200903601A (en) | 2009-01-16 |
JP2008288488A (ja) | 2008-11-27 |
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