WO2008129590A1 - 半導体用接着フィルム及びこれを用いた半導体装置 - Google Patents

半導体用接着フィルム及びこれを用いた半導体装置 Download PDF

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Publication number
WO2008129590A1
WO2008129590A1 PCT/JP2007/000379 JP2007000379W WO2008129590A1 WO 2008129590 A1 WO2008129590 A1 WO 2008129590A1 JP 2007000379 W JP2007000379 W JP 2007000379W WO 2008129590 A1 WO2008129590 A1 WO 2008129590A1
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WIPO (PCT)
Prior art keywords
adhesive film
semiconductor
semiconductor device
same
device made
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PCT/JP2007/000379
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English (en)
French (fr)
Inventor
Hiroyuki Yasuda
Masato Yoshida
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Sumitomo Bakelite Co., Ltd.
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Publication date
Application filed by Sumitomo Bakelite Co., Ltd. filed Critical Sumitomo Bakelite Co., Ltd.
Priority to CN2007800525332A priority Critical patent/CN101641773B/zh
Priority to KR1020097022227A priority patent/KR101125762B1/ko
Priority to PCT/JP2007/000379 priority patent/WO2008129590A1/ja
Priority to US11/886,463 priority patent/US20090230568A1/en
Priority to EP07737036A priority patent/EP2136393A4/en
Publication of WO2008129590A1 publication Critical patent/WO2008129590A1/ja

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Abstract

(A)熱可塑性樹脂、(B)エポキシ樹脂、及び、(C)硬化剤を含む半導体用接着フィルムであって、前記半導体用接着フィルムの室温から10℃/分の昇温速度で昇温したときの50℃以上180℃以下の範囲における最低溶融粘度が0.1Pa・s以上500Pa・s以下であり、かつ、揮発分が5.0%以下であることを特徴とする半導体用接着フィルムにより、半導体素子と半導体素子搭載用支持部材をより間隙なく、ボイド発生を抑制しつつ接着することができ、信頼性の高い半導体装置を提供可能にする。
PCT/JP2007/000379 2007-04-10 2007-04-10 半導体用接着フィルム及びこれを用いた半導体装置 WO2008129590A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CN2007800525332A CN101641773B (zh) 2007-04-10 2007-04-10 用于半导体的粘合膜和使用该粘合膜的半导体器件
KR1020097022227A KR101125762B1 (ko) 2007-04-10 2007-04-10 반도체용 접착필름 및 이를 이용한 반도체 장치
PCT/JP2007/000379 WO2008129590A1 (ja) 2007-04-10 2007-04-10 半導体用接着フィルム及びこれを用いた半導体装置
US11/886,463 US20090230568A1 (en) 2007-04-10 2007-04-10 Adhesive Film for Semiconductor and Semiconductor Device Therewith
EP07737036A EP2136393A4 (en) 2007-04-10 2007-04-10 HAFTFILM FOR SEMICONDUCTORS AND SEMI-FINISHED SEMICONDUCTOR ARRANGEMENT

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011103307A (ja) * 2011-01-19 2011-05-26 Sony Chemical & Information Device Corp 異方性導電フィルム
US20120114934A1 (en) * 2009-05-13 2012-05-10 Megumi Kodama Bonding sheet
JP2023505277A (ja) * 2019-12-05 2023-02-08 ドゥーサン コーポレイション 半導体パッケージ用アンダーフィルフィルム及びこれを用いた半導体パッケージの製造方法

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009126544A1 (en) * 2008-04-08 2009-10-15 Arizona Board Of Regents, A Body Corporate Of The State Of Arizona Acting For And On Behalf Of Arizona State University Assemblies and methods for reducing warp and bow of a flexible substrate during semiconductor processing
JP4939574B2 (ja) * 2008-08-28 2012-05-30 日東電工株式会社 熱硬化型ダイボンドフィルム
JPWO2010058727A1 (ja) * 2008-11-19 2012-04-19 電気化学工業株式会社 電子部品の製造方法
KR101232409B1 (ko) * 2009-02-27 2013-02-12 데쿠세리아루즈 가부시키가이샤 반도체 장치의 제조 방법
JP4816750B2 (ja) * 2009-03-13 2011-11-16 住友電気工業株式会社 プリント配線基板の接続方法
JP2012049388A (ja) * 2010-08-27 2012-03-08 Shin Etsu Chem Co Ltd 半導体ウエハ保護膜形成用シート
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JP6193663B2 (ja) * 2013-07-26 2017-09-06 日東電工株式会社 ダイシングテープ付きダイボンドフィルム、及び、半導体装置の製造方法
WO2015152037A1 (ja) * 2014-03-31 2015-10-08 明和化成株式会社 フェノール樹脂、該フェノール樹脂を含むエポキシ樹脂組成物、該エポキシ樹脂組成物の硬化物、及び該硬化物を有する半導体装置
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KR102012789B1 (ko) * 2016-03-28 2019-08-21 주식회사 엘지화학 반도체 장치
WO2019013040A1 (ja) * 2017-07-10 2019-01-17 Dic株式会社 積層体、それを用いたプリント配線板、フレキシブルプリント配線板及び成形品
EP3524462A1 (en) * 2018-02-13 2019-08-14 D. Swarovski KG Decorative composite body
TWI695453B (zh) * 2019-01-04 2020-06-01 台灣愛司帝科技股份有限公司 半導體晶片修補方法以及半導體晶片修補裝置
JP2023521068A (ja) * 2020-04-24 2023-05-23 エルジー・ケム・リミテッド 硬化剤、これを含む半導体接着用組成物、半導体接着用フィルムおよびこれを用いた半導体パッケージ

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06264035A (ja) 1993-03-16 1994-09-20 Hitachi Chem Co Ltd 接着フィルム、その製造法及び接着法
JP2003096426A (ja) 2001-09-26 2003-04-03 Hitachi Chem Co Ltd 接着部材
JP2007059787A (ja) * 2005-08-26 2007-03-08 Sumitomo Bakelite Co Ltd 半導体用接着フィルム及びこれを用いた半導体装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100815314B1 (ko) * 2000-03-31 2008-03-19 히다치 가세고교 가부시끼가이샤 접착제 조성물, 그의 제조 방법, 이것을 사용한 접착필름, 반도체 탑재용 기판 및 반도체 장치
JP4238124B2 (ja) * 2003-01-07 2009-03-11 積水化学工業株式会社 硬化性樹脂組成物、接着性エポキシ樹脂ペースト、接着性エポキシ樹脂シート、導電接続ペースト、導電接続シート及び電子部品接合体
US20040265540A1 (en) * 2003-06-24 2004-12-30 Gary Balakoff Masking film for textured surfaces
JP2005327789A (ja) * 2004-05-12 2005-11-24 Sharp Corp ダイシング・ダイボンド兼用粘接着シートおよびこれを用いた半導体装置の製造方法
JP3754700B1 (ja) * 2004-09-02 2006-03-15 住友ベークライト株式会社 半導体用接着フィルム及びこれを用いた半導体装置
US7560821B2 (en) * 2005-03-24 2009-07-14 Sumitomo Bakelite Company, Ltd Area mount type semiconductor device, and die bonding resin composition and encapsulating resin composition used for the same
US20070073008A1 (en) * 2005-09-28 2007-03-29 Cookson Singapore Pte, Ltd. Compositions effective to suppress void formation

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06264035A (ja) 1993-03-16 1994-09-20 Hitachi Chem Co Ltd 接着フィルム、その製造法及び接着法
JP2003096426A (ja) 2001-09-26 2003-04-03 Hitachi Chem Co Ltd 接着部材
JP2007059787A (ja) * 2005-08-26 2007-03-08 Sumitomo Bakelite Co Ltd 半導体用接着フィルム及びこれを用いた半導体装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2136393A4

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120114934A1 (en) * 2009-05-13 2012-05-10 Megumi Kodama Bonding sheet
JP2011103307A (ja) * 2011-01-19 2011-05-26 Sony Chemical & Information Device Corp 異方性導電フィルム
JP2023505277A (ja) * 2019-12-05 2023-02-08 ドゥーサン コーポレイション 半導体パッケージ用アンダーフィルフィルム及びこれを用いた半導体パッケージの製造方法
JP7373073B2 (ja) 2019-12-05 2023-11-01 ドゥーサン コーポレイション 半導体パッケージ用アンダーフィルフィルム及びこれを用いた半導体パッケージの製造方法

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US20090230568A1 (en) 2009-09-17
CN101641773A (zh) 2010-02-03
EP2136393A1 (en) 2009-12-23
EP2136393A4 (en) 2012-10-24
KR20100009555A (ko) 2010-01-27
KR101125762B1 (ko) 2012-03-20
CN101641773B (zh) 2011-08-17

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