WO2008117652A1 - 反射防止フィルム、及び反射防止フィルムの製造方法、それを用いた偏光板、及び表示装置 - Google Patents

反射防止フィルム、及び反射防止フィルムの製造方法、それを用いた偏光板、及び表示装置 Download PDF

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Publication number
WO2008117652A1
WO2008117652A1 PCT/JP2008/054287 JP2008054287W WO2008117652A1 WO 2008117652 A1 WO2008117652 A1 WO 2008117652A1 JP 2008054287 W JP2008054287 W JP 2008054287W WO 2008117652 A1 WO2008117652 A1 WO 2008117652A1
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WIPO (PCT)
Prior art keywords
reflection film
low
refractive
film
index layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
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PCT/JP2008/054287
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English (en)
French (fr)
Inventor
Satoshi Okano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Opto Inc
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Konica Minolta Opto Inc
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Publication date
Application filed by Konica Minolta Opto Inc filed Critical Konica Minolta Opto Inc
Priority to JP2009506275A priority Critical patent/JP5158075B2/ja
Publication of WO2008117652A1 publication Critical patent/WO2008117652A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/107—Porous materials, e.g. for reducing the refractive index

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Polarising Elements (AREA)
  • Laminated Bodies (AREA)

Abstract

　本発明は、高温高湿下による耐久試験後の耐薬品性、密着性、及び膜強度（耐擦傷性）アップを、１層の低屈折率層よりなる反射防止層で達成でき、低コスト性にも優れる反射防止フィルム、それを用いた偏光板、及び表示装置を提供する。この反射防止フィルムは、低屈折率層が、内部が多孔質または空洞である少なくとも１種の中空シリカ微粒子を含有し、かつ低屈折率層の表面（膜面）ｐＨが２．０～７．５、好ましくは２．０～４．０である。好ましくは低屈折率層の表面（膜面）ｐＨの測定条件が、５０°C温浴における２時間浸漬後である。低屈折率層が反応性変性シリコーン樹脂、またはイミダゾールもしくはその誘導体を含有することが好ましい。
PCT/JP2008/054287 2007-03-28 2008-03-10 反射防止フィルム、及び反射防止フィルムの製造方法、それを用いた偏光板、及び表示装置 Ceased WO2008117652A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009506275A JP5158075B2 (ja) 2007-03-28 2008-03-10 反射防止フィルム、それを用いた偏光板、及び表示装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007084414 2007-03-28
JP2007-084414 2007-03-28

Publications (1)

Publication Number Publication Date
WO2008117652A1 true WO2008117652A1 (ja) 2008-10-02

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ID=39788388

Family Applications (1)

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PCT/JP2008/054287 Ceased WO2008117652A1 (ja) 2007-03-28 2008-03-10 反射防止フィルム、及び反射防止フィルムの製造方法、それを用いた偏光板、及び表示装置

Country Status (3)

Country Link
JP (1) JP5158075B2 (ja)
TW (1) TWI448719B (ja)
WO (1) WO2008117652A1 (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009066965A (ja) * 2007-09-14 2009-04-02 Jgc Catalysts & Chemicals Ltd 透明被膜付基材および透明被膜形成用塗料
JP2010111756A (ja) * 2008-11-05 2010-05-20 Yokohama Rubber Co Ltd:The 加熱硬化性光半導体封止用樹脂組成物およびこれを用いる光半導体封止体
JP2012185342A (ja) * 2011-03-07 2012-09-27 Konica Minolta Holdings Inc 近赤外反射フィルム、近赤外反射フィルムの製造方法及び近赤外反射体
JP2013006157A (ja) * 2011-06-24 2013-01-10 Seiko Epson Corp 塗膜
JP2013195864A (ja) * 2012-03-22 2013-09-30 Nippon Zeon Co Ltd 反射防止フィルム、表示装置、及びタッチパネル一体型表示装置
CN106526715A (zh) * 2015-09-11 2017-03-22 佳能株式会社 光学部件及其制造方法
TWI701456B (zh) * 2014-09-30 2020-08-11 日商日本板硝子股份有限公司 低反射塗層、玻璃板、玻璃基板、及光電轉換裝置
TWI852525B (zh) * 2023-05-03 2024-08-11 澤米科技股份有限公司 紅外光波段的抗反射膜結構及光學元件

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113885103B (zh) * 2021-09-26 2023-03-10 中国人民解放军国防科技大学 一种新型红外隐身材料、制备方法及应用

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001343502A (ja) * 2000-05-30 2001-12-14 Teijin Ltd 反射防止フィルム
JP2004354740A (ja) * 2003-05-29 2004-12-16 Fuji Photo Film Co Ltd 反射防止膜、反射防止フィルムおよび画像表示装置
JP2006139259A (ja) * 2004-10-13 2006-06-01 Shin Etsu Chem Co Ltd 反射防止膜、反射防止膜形成用コーティング剤組成物及び反射防止膜を備えた物品
JP2006212987A (ja) * 2005-02-04 2006-08-17 Kuraray Co Ltd 転写材
JP2006301126A (ja) * 2005-04-18 2006-11-02 Hitachi Chem Co Ltd 低屈折率膜
JP2006330397A (ja) * 2005-05-26 2006-12-07 Nippon Zeon Co Ltd 反射防止積層体及びその製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006293329A (ja) * 2005-03-14 2006-10-26 Fuji Photo Film Co Ltd 反射防止フィルム及びその製造方法、並びにそのような反射防止フィルムを用いた偏光板、及びそのような反射防止フィルム又は偏光板を用いた画像表示装置。
JP4952047B2 (ja) * 2005-05-02 2012-06-13 Ｊｓｒ株式会社 硬化性樹脂組成物、硬化膜及び反射防止膜積層体
JP5057199B2 (ja) * 2005-06-02 2012-10-24 旭硝子株式会社 中空状ＳｉＯ２微粒子分散液の製造方法、塗料組成物及び反射防止塗膜付き基材
JP2007011033A (ja) * 2005-06-30 2007-01-18 Fujifilm Holdings Corp 反射防止フィルム、それを用いた偏光板及びディスプレイ装置
JP5167812B2 (ja) * 2005-07-15 2013-03-21 コニカミノルタアドバンストレイヤー株式会社 光学フィルムの処理方法、光学フィルムの処理装置及び光学フィルムの製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001343502A (ja) * 2000-05-30 2001-12-14 Teijin Ltd 反射防止フィルム
JP2004354740A (ja) * 2003-05-29 2004-12-16 Fuji Photo Film Co Ltd 反射防止膜、反射防止フィルムおよび画像表示装置
JP2006139259A (ja) * 2004-10-13 2006-06-01 Shin Etsu Chem Co Ltd 反射防止膜、反射防止膜形成用コーティング剤組成物及び反射防止膜を備えた物品
JP2006212987A (ja) * 2005-02-04 2006-08-17 Kuraray Co Ltd 転写材
JP2006301126A (ja) * 2005-04-18 2006-11-02 Hitachi Chem Co Ltd 低屈折率膜
JP2006330397A (ja) * 2005-05-26 2006-12-07 Nippon Zeon Co Ltd 反射防止積層体及びその製造方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009066965A (ja) * 2007-09-14 2009-04-02 Jgc Catalysts & Chemicals Ltd 透明被膜付基材および透明被膜形成用塗料
JP2010111756A (ja) * 2008-11-05 2010-05-20 Yokohama Rubber Co Ltd:The 加熱硬化性光半導体封止用樹脂組成物およびこれを用いる光半導体封止体
JP2012185342A (ja) * 2011-03-07 2012-09-27 Konica Minolta Holdings Inc 近赤外反射フィルム、近赤外反射フィルムの製造方法及び近赤外反射体
JP2013006157A (ja) * 2011-06-24 2013-01-10 Seiko Epson Corp 塗膜
JP2013195864A (ja) * 2012-03-22 2013-09-30 Nippon Zeon Co Ltd 反射防止フィルム、表示装置、及びタッチパネル一体型表示装置
TWI701456B (zh) * 2014-09-30 2020-08-11 日商日本板硝子股份有限公司 低反射塗層、玻璃板、玻璃基板、及光電轉換裝置
CN106526715A (zh) * 2015-09-11 2017-03-22 佳能株式会社 光学部件及其制造方法
US10738197B2 (en) 2015-09-11 2020-08-11 Canon Kabushiki Kaisha Optical member and method for manufacturing the same
CN106526715B (zh) * 2015-09-11 2020-08-18 佳能株式会社 光学部件及其制造方法
TWI852525B (zh) * 2023-05-03 2024-08-11 澤米科技股份有限公司 紅外光波段的抗反射膜結構及光學元件

Also Published As

Publication number Publication date
TWI448719B (zh) 2014-08-11
JP5158075B2 (ja) 2013-03-06
JPWO2008117652A1 (ja) 2010-07-15
TW200907400A (en) 2009-02-16

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