WO2008117652A1 - Anti-reflection film, method for production of anti-reflection film, polarizing plate using the anti-reflection film, and display device - Google Patents

Anti-reflection film, method for production of anti-reflection film, polarizing plate using the anti-reflection film, and display device Download PDF

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Publication number
WO2008117652A1
WO2008117652A1 PCT/JP2008/054287 JP2008054287W WO2008117652A1 WO 2008117652 A1 WO2008117652 A1 WO 2008117652A1 JP 2008054287 W JP2008054287 W JP 2008054287W WO 2008117652 A1 WO2008117652 A1 WO 2008117652A1
Authority
WO
WIPO (PCT)
Prior art keywords
reflection film
low
refractive
film
index layer
Prior art date
Application number
PCT/JP2008/054287
Other languages
French (fr)
Japanese (ja)
Inventor
Satoshi Okano
Original Assignee
Konica Minolta Opto, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Opto, Inc. filed Critical Konica Minolta Opto, Inc.
Priority to JP2009506275A priority Critical patent/JP5158075B2/en
Publication of WO2008117652A1 publication Critical patent/WO2008117652A1/en

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/107—Porous materials, e.g. for reducing the refractive index

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Polarising Elements (AREA)
  • Laminated Bodies (AREA)

Abstract

Disclosed are: an anti-reflection film which can achieve the improvement in chemical resistance, close adhesion property and film strength (scratch resistance) after a duration test under high temperature/high humidity conditions by employing an anti-reflection layer comprising one low-refractive-index layer, and which can be produced at low cost; a polarizing plate using the anti-reflection film; and a display device. In the anti-reflection film, the low-refractive-index layer comprises at least one hollow silica microparticle whose inside is porous or hollow, and has a pH value of 2.0 to 7.5, preferably 2.0 to 4.0, at its surface (film surface). Preferably, the pH value at the surface (film surface) of the low-refractive-index layer is measured after immersing for two hours in a 50°C hot bath. The low-refractive-index layer preferably comprises a reactive modified silicone resin or an imidazole or a derivative thereof.
PCT/JP2008/054287 2007-03-28 2008-03-10 Anti-reflection film, method for production of anti-reflection film, polarizing plate using the anti-reflection film, and display device WO2008117652A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009506275A JP5158075B2 (en) 2007-03-28 2008-03-10 Antireflection film, polarizing plate using the same, and display device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-084414 2007-03-28
JP2007084414 2007-03-28

Publications (1)

Publication Number Publication Date
WO2008117652A1 true WO2008117652A1 (en) 2008-10-02

Family

ID=39788388

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/054287 WO2008117652A1 (en) 2007-03-28 2008-03-10 Anti-reflection film, method for production of anti-reflection film, polarizing plate using the anti-reflection film, and display device

Country Status (3)

Country Link
JP (1) JP5158075B2 (en)
TW (1) TWI448719B (en)
WO (1) WO2008117652A1 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009066965A (en) * 2007-09-14 2009-04-02 Jgc Catalysts & Chemicals Ltd Transparent coat applied base material, and transparent coat forming paint
JP2010111756A (en) * 2008-11-05 2010-05-20 Yokohama Rubber Co Ltd:The Heat-curable resin composition for sealing optical semiconductor and sealed body of optical semiconductor using the same
JP2012185342A (en) * 2011-03-07 2012-09-27 Konica Minolta Holdings Inc Near-infrared reflection film, manufacturing method of near-infrared reflection film, and near-infrared reflection body
JP2013006157A (en) * 2011-06-24 2013-01-10 Seiko Epson Corp Coating film
JP2013195864A (en) * 2012-03-22 2013-09-30 Nippon Zeon Co Ltd Antireflection film, display device, and touch panel integrated display device
CN106526715A (en) * 2015-09-11 2017-03-22 佳能株式会社 Optical member and method for manufacturing the same
TWI701456B (en) * 2014-09-30 2020-08-11 日商日本板硝子股份有限公司 Low reflection coating, glass plate, glass substrate, and photoelectric conversion device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113885103B (en) * 2021-09-26 2023-03-10 中国人民解放军国防科技大学 Novel infrared stealth material, preparation method and application

Citations (6)

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Publication number Priority date Publication date Assignee Title
JP2001343502A (en) * 2000-05-30 2001-12-14 Teijin Ltd Antireflection film
JP2004354740A (en) * 2003-05-29 2004-12-16 Fuji Photo Film Co Ltd Antireflection coating, antireflection film and image display device
JP2006139259A (en) * 2004-10-13 2006-06-01 Shin Etsu Chem Co Ltd Antireflection film, coating agent composition for forming the antireflection film, and article provided with the antireflection film
JP2006212987A (en) * 2005-02-04 2006-08-17 Kuraray Co Ltd Transfer material
JP2006301126A (en) * 2005-04-18 2006-11-02 Hitachi Chem Co Ltd Low refractive index film
JP2006330397A (en) * 2005-05-26 2006-12-07 Nippon Zeon Co Ltd Anti-reflection laminated body and its manufacturing method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
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JP2006293329A (en) * 2005-03-14 2006-10-26 Fuji Photo Film Co Ltd Anti-reflection film, manufacturing method thereof, polarizing plate using the anti-reflection film, and image display device using the anti-reflection film or polarizing plate
JP4952047B2 (en) * 2005-05-02 2012-06-13 Ｊｓｒ株式会社 Curable resin composition, cured film and antireflection film laminate
JP5057199B2 (en) * 2005-06-02 2012-10-24 旭硝子株式会社 Method for producing hollow SiO2 fine particle dispersion, coating composition, and substrate with antireflection coating
JP2007011033A (en) * 2005-06-30 2007-01-18 Fujifilm Holdings Corp Antireflection film, polarizing plate using the same and display device
KR20080031010A (en) * 2005-07-15 2008-04-07 코니카 미놀타 옵토 인코포레이티드 Method and device for treating optical film and method of manufacturing optical film

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001343502A (en) * 2000-05-30 2001-12-14 Teijin Ltd Antireflection film
JP2004354740A (en) * 2003-05-29 2004-12-16 Fuji Photo Film Co Ltd Antireflection coating, antireflection film and image display device
JP2006139259A (en) * 2004-10-13 2006-06-01 Shin Etsu Chem Co Ltd Antireflection film, coating agent composition for forming the antireflection film, and article provided with the antireflection film
JP2006212987A (en) * 2005-02-04 2006-08-17 Kuraray Co Ltd Transfer material
JP2006301126A (en) * 2005-04-18 2006-11-02 Hitachi Chem Co Ltd Low refractive index film
JP2006330397A (en) * 2005-05-26 2006-12-07 Nippon Zeon Co Ltd Anti-reflection laminated body and its manufacturing method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009066965A (en) * 2007-09-14 2009-04-02 Jgc Catalysts & Chemicals Ltd Transparent coat applied base material, and transparent coat forming paint
JP2010111756A (en) * 2008-11-05 2010-05-20 Yokohama Rubber Co Ltd:The Heat-curable resin composition for sealing optical semiconductor and sealed body of optical semiconductor using the same
JP2012185342A (en) * 2011-03-07 2012-09-27 Konica Minolta Holdings Inc Near-infrared reflection film, manufacturing method of near-infrared reflection film, and near-infrared reflection body
JP2013006157A (en) * 2011-06-24 2013-01-10 Seiko Epson Corp Coating film
JP2013195864A (en) * 2012-03-22 2013-09-30 Nippon Zeon Co Ltd Antireflection film, display device, and touch panel integrated display device
TWI701456B (en) * 2014-09-30 2020-08-11 日商日本板硝子股份有限公司 Low reflection coating, glass plate, glass substrate, and photoelectric conversion device
CN106526715A (en) * 2015-09-11 2017-03-22 佳能株式会社 Optical member and method for manufacturing the same
US10738197B2 (en) 2015-09-11 2020-08-11 Canon Kabushiki Kaisha Optical member and method for manufacturing the same
CN106526715B (en) * 2015-09-11 2020-08-18 佳能株式会社 Optical component and method for manufacturing the same

Also Published As

Publication number Publication date
JPWO2008117652A1 (en) 2010-07-15
TWI448719B (en) 2014-08-11
JP5158075B2 (en) 2013-03-06
TW200907400A (en) 2009-02-16

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