TWI448719B - Anti-reflection film, and anti-reflection film, and a polarizing plate using the same, and a display device - Google Patents

Anti-reflection film, and anti-reflection film, and a polarizing plate using the same, and a display device Download PDF

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TWI448719B
TWI448719B TW097109659A TW97109659A TWI448719B TW I448719 B TWI448719 B TW I448719B TW 097109659 A TW097109659 A TW 097109659A TW 97109659 A TW97109659 A TW 97109659A TW I448719 B TWI448719 B TW I448719B
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film
group
refractive index
acid
index layer
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TW200907400A (en
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Satoshi Okano
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Konica Minolta Opto Inc
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/107Porous materials, e.g. for reducing the refractive index

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  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
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Description

防反射薄膜,及防反射薄膜之製造方法,使用其之偏光板,及顯示裝置Antireflection film, and manufacturing method of antireflection film, polarizing plate using the same, and display device

本發明係關於防反射薄膜、及防反射薄膜之製造方法、使用其之偏光板、及顯示裝置。The present invention relates to an antireflection film, a method for producing the antireflection film, a polarizing plate using the same, and a display device.

一般防反射薄膜為,如陰極管顯示裝置(CRT)、電漿顯示器(PDP)、電致發光顯示器(ELD)或液晶顯示裝置(LCD)之影像顯示裝置中,因可防止外光反射所引起的對比降低或像之雜影攝入,藉由多層薄膜之光干渉,具有減低反射率之功能,而配置於顯示器之最表面。Generally, the anti-reflection film is used in an image display device such as a cathode tube display device (CRT), a plasma display (PDP), an electroluminescence display (ELD), or a liquid crystal display device (LCD), because it can prevent external light reflection. The contrast is reduced or the image is taken up by the light of the multilayer film, which has the function of reducing the reflectivity and is disposed on the outermost surface of the display.

近年來,對於防反射薄膜之使用環境有室外或室內等種種形式。特別要求室外使用的大畫面用途下可使用之優良膜強度,且對於環境變化具有優良防反射薄膜。In recent years, the use environment of the antireflection film has various forms such as outdoor or indoor. It is particularly required to have excellent film strength which can be used under large-screen use for outdoor use, and has an excellent anti-reflection film for environmental changes.

過去,防反射薄膜中,維持反射率減低功能(折射率降低)下,欲提高膜強度或耐藥品性,使用二氧化矽系所成之膜。一方面,由二氧化矽系所成之膜具有鹼性時,會進行縮聚合反應,形成膜之基本骨架會變大。一般隨著縮聚合反應之進行,可見到膜之機械強度提高(參照非專利文獻1)。In the past, in the antireflection film, a film made of cerium oxide was used in order to improve the film strength or chemical resistance under the function of reducing the reflectance (reduced refractive index). On the other hand, when the film formed of the cerium oxide system is alkaline, the polycondensation reaction proceeds, and the basic skeleton of the formed film becomes large. Generally, as the polycondensation reaction proceeds, the mechanical strength of the film is improved (see Non-Patent Document 1).

然而,光學用途之防反射薄膜中,使用具有鹼性之二氧化矽系膜時,膜的反應難以控制,與基材之密著性變充分,難得到令人滿意的強度,特別對於環境變化(高溫高濕下),膜強度或耐藥品性之劣化變大。However, in the antireflection film for optical use, when an alkaline cerium oxide film is used, the reaction of the film is difficult to control, and the adhesion to the substrate becomes sufficient, and it is difficult to obtain satisfactory strength, particularly for environmental changes. (Under high temperature and high humidity), deterioration of film strength or chemical resistance becomes large.

專利文獻1中記載,例如使用具有外殻層且內部為多孔質或空洞之中空二氧化矽微粒子的技術。該專利文獻可維持反射率減低功能(折射率降低)下,可提高膜強度或耐藥品性。Patent Document 1 describes, for example, a technique in which hollow ceria particles having a shell layer and having a porous or hollow interior are used. This patent document can improve the film strength or chemical resistance under the function of reducing the reflectance (reduced refractive index).

專利文獻2中揭示,於彈性率為3500~5500Mpa之範圍的透明薄膜上,設有(a)含有活性能量線硬化樹脂之硬塗佈層、(b)含有導電性金屬氧化物微粒子之中折射率層、(c)含有氧化鈦微粒子之高折射率層、(d)含有具有外殻層且內部為多孔質或空洞的中空二氧化矽系微粒子之低折射率層的防反射薄膜。Patent Document 2 discloses that (a) a hard coat layer containing an active energy ray-curable resin and (b) a refraction containing a conductive metal oxide fine particle are provided on a transparent film having an elastic modulus of 3,500 to 5,500 MPa. The rate layer, (c) a high refractive index layer containing titanium oxide fine particles, and (d) an antireflection film containing a low refractive index layer of hollow ceria-based fine particles having an outer shell layer and having a porous or void inside.

[專利文獻1]特開2002-79616號公報[專利文獻2]特開2005-266051號公報[Patent Document 1] JP-A-2002-79616 [Patent Document 2] JP-A-2005-266051

[非專利文獻1]S.Shibata,F.Hanawa and M.Nakahara,Electron.Ltt,21,24(1985)1145。[Non-Patent Document 1] S. Shibata, F. Hanawa and M. Nakahara, Electron. Ltt, 21, 24 (1985) 1145.

然而,專利文獻1所製作之含有中空二氧化矽微粒子之薄膜為表面(膜面)之pH為鹼性,將該薄膜使用於光學用途之防反射薄膜上時,膜強度並未充分,特別於預測室外之使用時,對於高溫高濕下的膜強度耐擦傷性、耐藥品性、以及密著性有著實用上之問題。However, the film containing the hollow cerium oxide microparticles produced in Patent Document 1 has a pH at the surface (film surface) which is alkaline, and when the film is used for an antireflection film for optical use, the film strength is not sufficient, particularly When it is predicted to be used outdoors, there is a practical problem in film strength, scratch resistance, chemical resistance, and adhesion under high temperature and high humidity.

又,專利文獻2所記載的防反射薄膜確實為提高強制劣化試驗後之膜強度(耐擦傷性)者,但因防反射層係為 3層構成者,故有著高成本之問題。Moreover, the antireflection film described in Patent Document 2 is actually a film strength (scratch resistance) after the forced deterioration test, but the antireflection layer is The three-layer constructor has a problem of high cost.

本發明之目的為提供一種可解決上述過去技術之問題,高溫高濕下之耐久試驗後的耐藥品性、密著性、及膜強度提高可由1層低折射率層所成之防反射層達成低成本性亦優良的防反射薄膜、使用其之偏光板、及顯示裝置。An object of the present invention is to provide a problem that can solve the above-mentioned problems of the prior art, and the chemical resistance, adhesion, and film strength after the endurance test under high temperature and high humidity can be achieved by the antireflection layer formed by one layer of the low refractive index layer. An antireflection film excellent in low cost, a polarizing plate using the same, and a display device.

本發明之上述目的可由以下構成而達成。The above object of the present invention can be achieved by the following constitution.

1.一種防反射薄膜,其為於透明薄膜基材的至少一方之最表面上具有低折射率層之防反射薄膜,其特徵為低折射率層含有內部為多孔質或空洞之至少1種中空二氧化矽微粒子,且低折射率層表面(膜面)pH為2.0~7.5。An antireflection film which is an antireflection film having a low refractive index layer on at least one of the outermost surfaces of a transparent film substrate, characterized in that the low refractive index layer contains at least one hollow having a porous or void inside. The cerium oxide microparticles have a pH of 2.0 to 7.5 on the surface (film surface) of the low refractive index layer.

2.如1.所記載之防反射薄膜,其中該低折射率層表面(膜面)pH為2.0~4.0。2. The antireflection film according to 1, wherein the surface of the low refractive index layer (film surface) has a pH of from 2.0 to 4.0.

3.如1.或2.所記載之防反射薄膜,其中該低折射率層表面(膜面)pH之測定條件為50℃溫浴中浸漬2小時後者。3. The antireflection film according to 1. or 2. wherein the surface of the low refractive index layer (film surface) is measured under the conditions of a temperature of 50 ° C in a bath for 2 hours.

4.如1.~3.中任1所記載之防反射薄膜,其中低折射率層含有反應性改性聚矽氧烷樹脂。4. The antireflection film according to any one of 1 to 3, wherein the low refractive index layer contains a reactive modified polyoxyalkylene resin.

5.如1.~4.中任1所記載之防反射薄膜,其中低折射率層含有下述一般式(1)所示咪唑或其衍生物; (R1)nA………(1) 式中,R1表示氫原子、可由胺基或羥基取代之碳數1~3的烷基、烯基及鹵素原子,R1為複數個時可互為相同或 相異;R1所示胺基中可由1或2個甲基或乙基進行取代;又,烷基及烯基中可由碳數1~3的烷基進行取代;n為1~3的整數;A表示咪唑基。5. The antireflection film according to any one of 1 to 4, wherein the low refractive index layer contains an imidazole or a derivative thereof represented by the following general formula (1); (R1)nA.........(1) In the formula, R1 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms which may be substituted by an amine group or a hydroxyl group, an alkenyl group and a halogen atom, and when R1 is plural, they may be the same or Different from each other; the amine group represented by R1 may be substituted by 1 or 2 methyl groups or ethyl groups; and the alkyl group and the alkenyl group may be substituted by an alkyl group having 1 to 3 carbon atoms; n is an integer of 1 to 3; A represents an imidazolyl group.

6.一種防反射薄膜之製造方法,其特徵為製造如1.~5.中任1所記載之防反射薄膜。A method for producing an antireflection film, which is characterized in that the antireflection film according to any one of 1. to 5.

7.一種偏光板,其特徵為使用如1.~5.中任1所記載之防反射薄膜於一面上。A polarizing plate characterized in that the antireflection film according to any one of 1. to 5. is used on one surface.

8.一種顯示裝置,其特徵為使用如1.~5.中任1所記載之防反射薄膜者。A display device, which is characterized in that the antireflection film according to any one of 1. to 5.

9.一種顯示裝置,其特徵為使用如7.所記載之偏光板者。A display device characterized by using a polarizing plate as described in 7.

本發明為可得到可達成高溫高濕下之耐久試驗後的耐藥品與密著性、及膜強度提高之優良低成本性的防反射薄膜。又,藉由使用本發明之防反射薄膜,可忽略光之雜影攝入,得到使用辨識性優良之偏光板及該偏光板的顯示裝置。The present invention provides an antireflection film which is excellent in low-cost resistance to chemicals and adhesion after the endurance test under high temperature and high humidity, and which has improved film strength. Moreover, by using the antireflection film of the present invention, it is possible to neglect the noise intrusion of light, and to obtain a display device using the polarizing plate excellent in visibility and the polarizing plate.

實施發明的較佳型態A preferred form of implementing the invention

繼續,說明本發明之實施形態,但本發明未受到這些限定。Continuing, the embodiments of the present invention will be described, but the present invention is not limited thereto.

本發明之防反射薄膜為,透明樹脂薄膜所成之透明薄膜基材的至少一方最表面上,具有比透明薄膜基材更低折 射率之下述說明的低折射率層。The antireflection film of the present invention has at least one of the outermost surfaces of the transparent film substrate formed of the transparent resin film, and has a lower fold than the transparent film substrate. The low refractive index layer of the rate of incidence described below.

又,本發明之防反射薄膜上,除低折射率層以外以外,低折射率層與透明薄膜基材之間設有比透明薄膜基材更高折射率之高折射率層,可減少因光學干渉所引起的反射率故較佳。且,本發明中,低折射率層之單層、或低折射率層或高折射率層等經層合之層亦稱為防反射層。Further, in the antireflection film of the present invention, in addition to the low refractive index layer, a high refractive index layer having a higher refractive index than the transparent film substrate is provided between the low refractive index layer and the transparent film substrate, thereby reducing the optical The reflectance caused by dryness is preferred. Further, in the present invention, a single layer of a low refractive index layer or a laminated layer such as a low refractive index layer or a high refractive index layer is also referred to as an antireflection layer.

防反射層係由透明薄膜基材側之折射率相異的3層以中折射率層/高折射率層/低折射率層之順序下層合者,由可減少反射率之觀點來看為佳。其中,所謂中折射率層為,比透明薄膜基材之折射率還高,比高折射率層之折射率還低的層。The antireflection layer is formed by laminating three layers having different refractive indices on the transparent film substrate side in the order of the medium refractive index layer/high refractive index layer/low refractive index layer, and is preferably from the viewpoint of reducing reflectance. . Here, the medium refractive index layer is a layer which is higher in refractive index than the transparent film substrate and lower in refractive index than the high refractive index layer.

繼續,對於本發明中之防反射薄膜的低折射率層做說明。Continuing, the low refractive index layer of the antireflection film of the present invention will be described.

本發明中之防反射薄膜的低折射率層為,比透明薄膜基材之折射率還低的層稱為低折射率層。作為具體折射率,以23℃、波長550nm下為1.30~1.45範圍者為佳。又,低折射率層之膜厚由作為光學干渉層之特性來客,以5nm~0.5μm為佳,10nm~0.3μm為較佳,30nm~0.2μm為更佳。The low refractive index layer of the antireflection film of the present invention is a layer having a lower refractive index than that of the transparent film substrate, and is referred to as a low refractive index layer. The specific refractive index is preferably in the range of 1.30 to 1.45 at 23 ° C and 550 nm. Further, the film thickness of the low refractive index layer is preferably from 5 nm to 0.5 μm, more preferably from 10 nm to 0.3 μm, even more preferably from 30 nm to 0.2 μm.

本發明之防反射薄膜的低折射率層為含有內部為多孔質或空洞之至少1種中空二氧化矽微粒子,且pH為2.0~7.5為特徵。The low refractive index layer of the antireflection film of the present invention is characterized in that it contains at least one type of hollow ceria particles having a porous or void inside, and has a pH of 2.0 to 7.5.

低折射率層之表面(膜面)pH控制為2.0~7.5時,發現可提供一種抑制低層折率層內之反應,與基材之密著 性亦優良,特別為高溫高濕下之耐藥品性及膜強度、密著性優良的防反射薄膜而完成本發明。When the surface of the low refractive index layer (film surface) is controlled to have a pH of 2.0 to 7.5, it is found that a reaction in the layer having a low layer folding ratio can be provided, and the substrate is adhered to the substrate. The present invention is also excellent in the properties of the antireflection film which is excellent in chemical resistance under high temperature and high humidity, and excellent in film strength and adhesion.

更佳為低折射率層之表面(膜面)pH為2.0~4.0,該範圍中可發揮特優之膜強度(耐擦傷性)效果。又,50℃溫浴中進行2小時浸漬後之表面(膜面)pH控制於上述範圍時,可穩定下得到本發明之目的效果,故特佳。More preferably, the surface (film surface) of the low refractive index layer has a pH of 2.0 to 4.0, and in this range, an excellent film strength (scratch resistance) effect can be exhibited. Further, when the pH of the surface (film surface) after immersion in a 50 ° C warm bath for 2 hours is controlled to the above range, the object of the present invention can be stably obtained, which is particularly preferable.

且,作為50℃溫浴之水,使用pH為6~8之離子交換水。Further, as the water of a 50 ° C warm bath, ion exchange water having a pH of 6 to 8 was used.

繼續,對於本發明中含於防反射薄膜之低折射率層的內部為多孔質或空洞之至少1種中空二氧化矽微粒子(以下僅稱為中空微粒子)做說明。In the present invention, at least one type of hollow cerium oxide fine particles (hereinafter simply referred to as hollow fine particles) which are porous or void inside the low refractive index layer of the antireflection film will be described.

中空微粒子為,(1)多孔質粒子與設置於該多孔質粒子表面之被覆層所成之複合粒子、或(2)內部具有空洞,且內容物由溶劑、氣體或多孔質物質所填充之空洞粒子。The hollow fine particles are (1) composite particles formed by a porous particle and a coating layer provided on the surface of the porous particle, or (2) voids having voids inside, and the contents are filled with a solvent, a gas or a porous substance. particle.

且,空洞粒子為內部具有空洞之粒子,空洞係由粒子壁所包圍。空洞內填充調製時所使用之溶劑、氣體或多孔質物質等內容物。如此中空微粒子之平均粒徑為5~200nm,較佳為10~70nm。中空微粒子之粒徑以變動係數為1~40%之單分散者為佳。Moreover, the hollow particles are particles having voids inside, and the voids are surrounded by the particle walls. The cavity is filled with contents such as a solvent, a gas, or a porous substance used in the preparation. The average particle diameter of the hollow fine particles is 5 to 200 nm, preferably 10 to 70 nm. The particle size of the hollow fine particles is preferably a monodisperse with a coefficient of variation of 1 to 40%.

本發明所使用的中空二氧化矽微粒子之平均粒徑可藉由掃描電子顯微鏡(SEM)等由電子顯微鏡照片測定。藉由利用動態散光法或靜態散光法等之粒度分佈計等進行測定。The average particle diameter of the hollow cerium oxide microparticles used in the present invention can be measured by an electron micrograph by a scanning electron microscope (SEM) or the like. The measurement is carried out by using a particle size distribution meter such as a dynamic astigmatism method or a static astigmatism method.

本發明所使用的空微粒子之平均粒徑可配合所形成之低折射率層的透明包膜厚度作適宜選擇,透明包膜之膜厚的3/2~1/10為佳,較佳為2/3~1/10。其中中空微粒子因低折射率層之形成,以分散於適當的媒體之狀態下為佳。The average particle diameter of the empty microparticles used in the present invention may be appropriately selected in accordance with the transparent coating thickness of the formed low refractive index layer, and the film thickness of the transparent envelope is preferably 3/2 to 1/10, preferably 2 /3~1/10. Among them, the hollow fine particles are preferably formed in a state of being dispersed in an appropriate medium due to the formation of a low refractive index layer.

作為分散媒,以水、醇類(例如甲醇、乙醇、異丙醇)、及酮(例如甲基乙基酮、甲基異丁基酮)、酮醇類(例如二丙酮醇類)、伸丙基單甲醚、丙二醇單甲醚乙酸酯等為佳。As the dispersing medium, water, alcohols (for example, methanol, ethanol, isopropanol), and ketones (for example, methyl ethyl ketone, methyl isobutyl ketone), ketone alcohols (for example, diacetone alcohols), and Propyl monomethyl ether, propylene glycol monomethyl ether acetate, and the like are preferred.

複合粒子的被覆層之厚度或空洞粒子之粒子壁厚度為1~40nm,較佳為1~20nm,更佳為2~15nm。複合粒子時,被覆層之厚度未達1nm時,有時無法完全包覆粒子,塗佈液成分容易進入複合粒子之內部,使內部之多孔性減少,無法得到低折射率化之充分效果。又,被覆層的厚度若超過20nm時,塗佈液成分不會進入內部,複合粒子之多孔性(細孔容積)降低,有時無法得到低折射率化之充分效果。The thickness of the coating layer of the composite particles or the particle wall thickness of the void particles is 1 to 40 nm, preferably 1 to 20 nm, more preferably 2 to 15 nm. In the case of the composite particles, when the thickness of the coating layer is less than 1 nm, the particles may not be completely coated, and the coating liquid component may easily enter the inside of the composite particles, thereby reducing the internal porosity and achieving a sufficient effect of lowering the refractive index. When the thickness of the coating layer exceeds 20 nm, the coating liquid component does not enter the inside, and the porosity (pore volume) of the composite particles is lowered, and a sufficient effect of lowering the refractive index may not be obtained.

又,空洞粒子的情況,粒子壁之厚度未達1nm時,有時無法維持粒子形狀,又即使厚度超過20nm,亦無法實現低折射率化之充分效果。Further, in the case of the void particles, when the thickness of the particle wall is less than 1 nm, the particle shape may not be maintained, and even if the thickness exceeds 20 nm, the sufficient effect of lowering the refractive index cannot be achieved.

複合粒子的被覆層或空洞粒子之粒子壁以二氧化矽為主成分時為佳。又,亦可含有二氧化矽以外之成分,具體可舉出Al2 O3 、B2 O3 、TiO2 、ZrO2 、SnO2 、CeO2 、P2 O3 、Sb2 O3 、MoO3 、ZnO2 、WO3 等。作為構成複合粒子之多孔質粒子,可舉出二氧化矽所成者、二氧化矽與二氧化矽以 外之無機化合物所成者、CaF2 、NaF、NaAlF6 、MgF等所成者。其中係以二氧化矽與二氧化矽以外的無機化合物之複合氧化物所成之多孔質粒子為佳。It is preferred that the coating layer of the composite particles or the particle walls of the void particles have cerium oxide as a main component. Further, components other than cerium oxide may be contained, and specific examples thereof include Al 2 O 3 , B 2 O 3 , TiO 2 , ZrO 2 , SnO 2 , CeO 2 , P 2 O 3 , Sb 2 O 3 , and MoO 3 . , ZnO 2 , WO 3, and the like. Examples of the porous particles constituting the composite particles include those obtained by cerium oxide, inorganic compounds other than cerium oxide and cerium oxide, and CaF 2 , NaF, NaAlF 6 , MgF, and the like. Among them, a porous particle composed of a composite oxide of an inorganic compound other than cerium oxide and cerium oxide is preferred.

作為二氧化矽以外之無機化合物,可舉出Al2 O3 、B2 O3 、TiO2 、ZrO2 、SnO2 、CeO2 、P2 O3 、Sb2 O3 、MoO3 、ZnO2 、WO3 等1種或2種以上。如此多孔質粒子中,二氧化矽以SiO2 作代表,二氧化矽以外之無機化合物以氧化物換算(MOx)時的莫耳比MOx/SiO2 為0.0001~1.0,較佳為0.001~0.3之範圍。Examples of the inorganic compound other than cerium oxide include Al 2 O 3 , B 2 O 3 , TiO 2 , ZrO 2 , SnO 2 , CeO 2 , P 2 O 3 , Sb 2 O 3 , MoO 3 , ZnO 2 , One type or two or more types of WO 3 or the like. In such porous particles, silicon dioxide as a representative of SiO 2, an inorganic compound other than silicon dioxide molar ratio in terms of oxide when MOx (MOx) / SiO 2 of 0.0001 to 1.0, preferably from 0.001 to 0.3 of range.

難以得到多孔質粒子的莫耳比MOx/SiO2 未達0.0001者,即使得到其細孔容積亦較小,無法得到折射率較低的粒子。又,多孔質粒子的莫耳比MOx/SiO2 若超過1.0,二氧化矽之比率會變小,故細孔容積變大,且難以得到折射率較低者。When it is difficult to obtain a porous particle having a molar ratio of MOx/SiO 2 of less than 0.0001, even if the pore volume is small, a particle having a low refractive index cannot be obtained. Further, when the molar ratio MOx/SiO 2 of the porous particles exceeds 1.0, the ratio of cerium oxide becomes small, so that the pore volume becomes large, and it is difficult to obtain a refractive index lower.

如此多孔質粒子之細孔容積為為0.1~1.5ml/g,較佳為0.2~1.5ml/g之範圍。細孔容積未達0.1ml/g時,無法得到折射率充分降低的粒子,若超過1.5ml/g時,微粒子的強度會降低,所得之包膜的強度會減低。The pore volume of such a porous particle is in the range of 0.1 to 1.5 ml/g, preferably 0.2 to 1.5 ml/g. When the pore volume is less than 0.1 ml/g, particles having a sufficiently lowered refractive index cannot be obtained. When the pore volume exceeds 1.5 ml/g, the strength of the fine particles is lowered, and the strength of the obtained coating film is lowered.

且,如此多孔質粒子的細孔容積可藉由水銀壓入法求得。又,作為空洞粒子之內容物,可舉出使用於粒子調製時的溶劑、氣體、多孔質物質等。溶劑中可含有空洞粒子調製時所使用的粒子前驅體之未反應物、使用之觸媒等。Moreover, the pore volume of such a porous particle can be obtained by mercury intrusion. Moreover, as a content of the hollow particle, a solvent, a gas, a porous substance, etc. used at the time of particle preparation are mentioned. The solvent may contain an unreacted material of the particle precursor used in the preparation of the void particles, a catalyst to be used, and the like.

又,作為多孔質物質,可舉出多孔質粒子所例舉的化合物所成者。這些內容物可為單一成分所成者,亦可為複 數成分之混合物。Further, examples of the porous material include those exemplified as the porous particles. These contents can be made up of a single component or a complex A mixture of several ingredients.

作為如此中空微粒子的製造方法,例如可採用特開平7-133105號公報之段落號碼[0010]~[0033]所揭示的複合氧化物膠體粒子之調製方法。具體之複合粒子係由二氧化矽、二氧化矽以外的無機化合物所成時,藉由實施以下第1步驟~第3步驟,可製造出中空微粒子。As a method for producing the hollow fine particles, for example, a method of preparing composite oxide colloidal particles disclosed in paragraphs [0010] to [0033] of JP-A-7-133105 can be employed. When the specific composite particles are made of an inorganic compound other than cerium oxide or cerium oxide, hollow fine particles can be produced by performing the following first to third steps.

(第1步驟:多孔質粒子前驅體之調製)(Step 1: Modulation of porous particle precursor)

第1步驟中,預先各別調製出二氧化矽原料與二氧化矽以外的無機化合物原料之鹼水溶液、或調製出二氧化矽原料與二氧化矽以外的無機化合物原料之混合水溶液,配合將此水溶液作為目的的複合氧化物之複合比率,於pH10以上的鹼水溶液中一邊攪拌一邊徐徐添加調製出多孔質粒子前驅體。In the first step, an aqueous alkali solution of a raw material of an inorganic compound other than cerium oxide raw material and cerium oxide is prepared in advance, or a mixed aqueous solution of a raw material of an inorganic compound other than cerium oxide raw material and cerium oxide is prepared. The composite ratio of the aqueous solution as the intended composite oxide is gradually added to the aqueous alkali solution having a pH of 10 or more to prepare a porous particle precursor.

作為二氧化矽原料,可使用鹼金屬、銨或有機鹼之矽酸鹽。作為鹼金屬的矽酸鹽,可使用矽酸鈉(水玻璃)或矽酸鉀。作為有機鹼可舉出四乙基銨鹽等第4級銨鹽、單乙醇胺、二乙醇胺、三乙醇胺等胺類。且,銨之矽酸鹽或有機鹼之矽酸鹽中亦含有矽酸液中添加氨、第4級銨氫氧化物、胺化合物等之鹼性溶液。As the raw material of cerium oxide, an alkali metal, ammonium or an organic base citrate can be used. As the alkali metal citrate, sodium citrate (water glass) or potassium citrate can be used. Examples of the organic base include amines such as a fourth-order ammonium salt such as a tetraethylammonium salt, monoethanolamine, diethanolamine or triethanolamine. Further, the ammonium citrate or the organic acid citrate also contains an alkaline solution of ammonia, a fourth-order ammonium hydroxide, an amine compound or the like in the citric acid solution.

又,作為二氧化矽以外的無機化合物之原料,可使用鹼可溶之無機化合物。具體可舉出選自Al、B、Ti、Zr、Sn、Ce、P、Sb、Mo、Zn、W等的元素之氧化酸、該氧化酸之鹼金屬鹽或鹼土類金屬鹽、銨鹽、第4級銨鹽。更具 體為鋁酸鈉、四硼酸鈉、碳酸鋯銨、銻酸鉀、錫酸鉀、鋁矽酸鈉、鉬酸鈉、硝酸鈰銨、燐酸鈉。Further, as a raw material of an inorganic compound other than cerium oxide, an alkali-soluble inorganic compound can be used. Specific examples thereof include an oxidizing acid of an element selected from the group consisting of Al, B, Ti, Zr, Sn, Ce, P, Sb, Mo, Zn, and W, an alkali metal salt of the oxidizing acid, an alkaline earth metal salt, and an ammonium salt. Grade 4 ammonium salt. More The body is sodium aluminate, sodium tetraborate, ammonium zirconium carbonate, potassium citrate, potassium stannate, sodium aluminosilicate, sodium molybdate, ammonium cerium nitrate, sodium citrate.

雖與這些水溶液之添加的同時,混合水溶液之pH值會產生變化,將該pH值控制於所定範圍的操作並非特別必要。水溶液最終為依據無機氧化物之種類、及其混合比率而決定其pH值。此時水溶液之添加速度並無特別限定。又,於複合氧化物粒子之製造時,種粒子之分散液可作為出發原料使用。Although the pH of the mixed aqueous solution changes while the addition of these aqueous solutions, it is not particularly necessary to control the pH to a predetermined range. The aqueous solution ultimately determines its pH based on the type of inorganic oxide and its mixing ratio. The rate of addition of the aqueous solution at this time is not particularly limited. Further, in the production of the composite oxide particles, the dispersion of the seed particles can be used as a starting material.

作為該種粒子,雖無特別限定,可使用SiO2 、Al2 O3 、TiO2 或ZrO2 等無機氧化物或彼等複合氧化物之微粒子,一般可使用彼等溶膠。且藉由上述製造方法所得之多孔質粒子前驅體分散液亦可作為種粒子分散液使用。The particles are not particularly limited, and inorganic oxides such as SiO 2 , Al 2 O 3 , TiO 2 or ZrO 2 or fine particles of the composite oxides thereof can be used, and generally, they can be used. Further, the porous particle precursor dispersion obtained by the above production method can also be used as a seed particle dispersion.

使用種粒子分散液時,將種粒子分散液的pH調整為10以上後,於該種粒子分散液中將上述化合物之水溶液於鹼水溶液中攪拌下添加。此時,並非必須進行分散液pH控制。使用如此的種粒子時,容易控制所調製之多孔質粒子的粒徑,可得到粒度均一者。When the seed particle dispersion liquid is used, the pH of the seed particle dispersion liquid is adjusted to 10 or more, and then the aqueous solution of the above compound is added to the aqueous alkali solution with stirring in the particle dispersion liquid. At this time, it is not necessary to carry out dispersion pH control. When such a seed particle is used, it is easy to control the particle size of the prepared porous particle, and a uniform particle size can be obtained.

上述二氧化矽原料、及無機化合物原料具有於鹼較高的溶解度。然而,以該溶解度之較大pH區域混合兩者時,或降低矽酸離子、及鋁酸離子等氧化酸離子之溶解度,析出這些複合物而成長為微粒子、或引起種粒子上析出的粒子成長。因此,於微粒子之析出、成長時,無須進行如過去方法之pH控制。The above-mentioned ceria raw material and inorganic compound raw material have a high solubility in alkali. However, when the two are mixed in a large pH region of the solubility, the solubility of oxidized acid ions such as citrate ions and aluminate ions is lowered, and these complexes are precipitated to grow into fine particles or cause growth of particles precipitated on the seed particles. . Therefore, it is not necessary to perform pH control as in the past method when the fine particles are precipitated and grown.

第1步驟中之二氧化矽與二氧化矽以外的無機化合物 之複合比率,對於二氧化矽之無機化合物換算為氧化物(MOx ),其MOx /SiO2 之莫耳比為0.05~2.0,較佳為0.2~2.0之範圍內。該範圍內,二氧化矽的比率越小,多孔質粒子之細孔容積越增大。然而,莫耳比即使超過2.0,多孔質粒子的細孔容積幾乎不會增加。另一方面,莫耳比未達0.05時,細孔容積會變小。The composite ratio of the inorganic compound other than cerium oxide and cerium oxide in the first step is converted to an oxide (MO x ) for the inorganic compound of cerium oxide, and the molar ratio of MO x /SiO 2 is 0.05 to 2.0. Preferably, it is in the range of 0.2 to 2.0. Within this range, the smaller the ratio of cerium oxide, the larger the pore volume of the porous particles. However, even if the molar ratio exceeds 2.0, the pore volume of the porous particles hardly increases. On the other hand, when the molar ratio is less than 0.05, the pore volume becomes small.

調製空洞粒子時,MOx /SiO2 之莫耳比以0.25~2.0之範圍內為佳。When modulating the void particles, the molar ratio of MO x /SiO 2 is preferably in the range of 0.25 to 2.0.

(第2步驟:自多孔質粒子除去二氧化矽以外之無機化合物)(Step 2: removal of inorganic compounds other than cerium oxide from porous particles)

第2步驟中,自第1步驟所得之多孔質粒子前驅體,將二氧化矽以外的無機化合物(矽與氧以外之元素)之至少一部份經選擇地除去。作為具體之除去方法,將多孔質粒子前驅體中的無機化合物使用鉱酸或有機酸進行溶解除去、或與陽離子交換樹脂接觸後進行離子交換除去。In the second step, at least a part of the inorganic compound (an element other than cerium and oxygen) other than cerium oxide is selectively removed from the porous particle precursor obtained in the first step. As a specific removal method, the inorganic compound in the porous particle precursor is dissolved or removed by using a citric acid or an organic acid, or is contacted with a cation exchange resin, and then ion-exchange-removed.

且,第1步驟所得之多孔質粒子前驅體係為矽與無機化合物構成元素介著氧而結合之網目結構粒子。藉由如此自多孔質粒子前驅體除去無機化合物(矽與氧以外之元素),可得到一層多孔質中細孔容積較大的多孔質粒子。又,使自多孔質粒子前驅體除去無機氧化物(矽與氧以外之元素)之量變多,即可調製出空洞粒子。Further, the porous particle precursor system obtained in the first step is a mesh structure particle in which an element of an inorganic compound and an inorganic compound are bonded to each other via oxygen. By thus removing the inorganic compound (the element other than cerium and oxygen) from the porous particle precursor, a porous particle having a large pore volume in the porous body can be obtained. Further, by removing the amount of the inorganic oxide (the element other than cerium and oxygen) from the porous particle precursor, the void particles can be prepared.

又,自多孔質粒子前驅體除去二氧化矽以外的無機化合物之前,於由第1步驟所得之多孔質粒子前驅體分散液 中添加將含有二氧化矽之鹼金屬鹽經脫鹼所得之氟含有取代烷基之矽烷化合物的矽酸液或水解性有機矽化合物,形成二氧化矽保護膜者為佳。二氧化矽保護膜的厚度為0.5~40nm,較佳為0.5~15nm之厚度即可。且,即使形成二氧化矽保護膜,該步驟之保護膜為多孔質,厚度較為薄,故可將上述二氧化矽以外的無機化合物自多孔質粒子前驅體中除去。Further, before removing the inorganic compound other than cerium oxide from the porous particle precursor, the porous particle precursor dispersion obtained in the first step It is preferred to add a citric acid solution or a hydrolyzable organic ruthenium compound containing a decane compound of a substituted alkyl group to a fluorine-containing alkali metal salt containing an alkali metal salt of cerium oxide to form a cerium oxide protective film. The thickness of the ruthenium dioxide protective film may be 0.5 to 40 nm, preferably 0.5 to 15 nm. Further, even if the ruthenium dioxide protective film is formed, the protective film in this step is porous and has a small thickness, so that the inorganic compound other than the above cerium oxide can be removed from the porous particle precursor.

藉由形成如此二氧化矽保護膜,保持粒子形狀下,將上述之二氧化矽以外的無機化合物,可自多孔質粒子前驅體中除去。又,形成後述二氧化矽被覆層時,多孔質粒子之細孔不會因被覆層而被閉塞,因此不會降低細孔容積,可形成後述之二氧化矽被覆層。且,除去之無機化合物的量較少時,粒子不會被破壞,並非必須形成保護膜。By forming such a cerium oxide protective film, the inorganic compound other than the above-mentioned cerium oxide can be removed from the porous particle precursor while maintaining the particle shape. Further, when the ceria coating layer described later is formed, the pores of the porous particles are not blocked by the coating layer, so that the pore volume can be formed without forming a ceria coating layer to be described later. Further, when the amount of the inorganic compound to be removed is small, the particles are not destroyed, and it is not necessary to form a protective film.

又,調製空洞粒子時,形成該二氧化矽保護膜為佳。調製空洞粒子時,除去無機化合物時,可得到由二氧化矽保護膜、二氧化矽保護膜內之溶劑、與未溶解之多孔質固體成分所成之空洞粒子的前驅體,於空洞粒子之前驅體中形成後述之被覆層時,所形成之被覆層成為粒子壁而形成空洞粒子。Further, when the void particles are prepared, it is preferable to form the ceria protective film. When the void particles are prepared, when the inorganic compound is removed, a precursor of the void particles formed by the cerium oxide protective film, the solvent in the cerium oxide protective film, and the undissolved porous solid component can be obtained. When a coating layer to be described later is formed in the body, the formed coating layer becomes a particle wall to form void particles.

欲形成上述二氧化矽保護膜時所添加之二氧化矽源的量,於可保持粒子形狀之範圍內較少為佳。二氧化矽源的量過多時,二氧化矽保護膜會過厚,而難以自多孔質粒子前驅體除去二氧化矽以外的無機化合物。The amount of the ceria source to be added in order to form the above-mentioned ceria protective film is preferably less in the range in which the shape of the particles can be maintained. When the amount of the cerium oxide source is too large, the cerium oxide protective film is too thick, and it is difficult to remove the inorganic compound other than cerium oxide from the porous particle precursor.

作為使用於二氧化矽保護膜形成用之水解性有機矽化 合物,可使用下述一般式(2)所示烷氧基矽烷。Hydrolyzable organic deuteration for use in the formation of a cerium oxide protective film As the compound, the alkoxydecane represented by the following general formula (2) can be used.

Rn Si(OR’)4-n ………(2) 式中,R與R’表示烷基、芳基、乙烯基、丙烯基等烴基,n表示0、1、2或3。特別以使用經氟取代之四甲氧基矽烷、四乙氧基矽烷、四異丙氧基矽烷等四烷氧基矽烷為佳。R n Si(OR') 4-n (2) wherein R and R' represent a hydrocarbon group such as an alkyl group, an aryl group, a vinyl group or a propenyl group, and n represents 0, 1, 2 or 3. In particular, tetraalkoxy decane such as tetramethoxy decane, tetraethoxy decane or tetraisopropoxy decane which is substituted by fluorine is preferably used.

作為添加方法,將於這些烷氧基矽烷、純水、及醇類之混合溶液中添加作為觸媒之少量鹼或酸的溶液,添加於多孔質粒子之分散液中,將於烷氧基矽烷、純水、及醇類之混合溶液中添加作為觸媒之少量鹼或酸的溶液,添加於多孔質粒子之分散液中,將烷氧基矽烷經水解所生成之矽酸聚合物附著於無機氧化物粒子之表面上。As a method of addition, a solution of a small amount of a base or an acid as a catalyst is added to a mixed solution of alkoxysilane, pure water, and an alcohol, and added to a dispersion of porous particles, which will be alkoxydecane. a solution of a small amount of a base or an acid as a catalyst added to a mixed solution of pure water and an alcohol, added to a dispersion of porous particles, and a citric acid polymer formed by hydrolysis of alkoxydecane is attached to the inorganic On the surface of the oxide particles.

此時,可將烷氧基矽烷、醇類、觸媒同時添加於分散液中。作為鹼觸媒,可使用氨、鹼金屬之氫氧化物、胺類。又,作為酸觸媒,可使用各種無機酸與有機酸。At this time, an alkoxysilane, an alcohol, and a catalyst can be simultaneously added to the dispersion. As the base catalyst, ammonia, an alkali metal hydroxide or an amine can be used. Further, as the acid catalyst, various inorganic acids and organic acids can be used.

多孔質粒子前驅體之分散媒為單獨水、或對於有機溶劑而言水之比率較高時,可使用矽酸液而形成二氧化矽保護膜。使用矽酸液時,分散液中添加所定量的矽酸液,同時加入鹼使矽酸液附著於多孔質粒子表面上。且,亦可併用矽酸液與上述烷氧基矽烷製作出二氧化矽保護膜。When the dispersion medium of the porous particle precursor is water alone or when the ratio of water to the organic solvent is high, a cerium oxide protective film can be formed using a citric acid solution. When a citric acid solution is used, a predetermined amount of citric acid solution is added to the dispersion, and a base is added to attach the citric acid solution to the surface of the porous particle. Further, a cerium oxide protective film may be prepared by using a citric acid solution together with the above alkoxy decane.

(第3步驟:二氧化矽被覆層之形成) 第3步驟中,於第2步驟所調製之多孔質粒子分散液(空洞粒子時為空洞粒子前驅體分散液)中,藉由添加具有含有氟取代烷基之矽烷化合物的水解性有機矽化合物或矽酸液等,將粒子表面以水解性有機矽化合物或矽酸液等聚合物進行包覆而形成二氧化矽被覆層。(Step 3: Formation of a cerium oxide coating layer) In the third step, in the porous particle dispersion (the cavity particle precursor dispersion in the case of void particles) prepared in the second step, a hydrolyzable organic ruthenium compound having a fluorene-containing alkyl group-containing decane compound or The surface of the particles is coated with a polymer such as a hydrolyzable organic hydrazine compound or a citric acid solution to form a cerium oxide coating layer.

且,所謂矽酸液為,將水玻璃等鹼金屬矽酸鹽之水溶液經離子交換處理後成為脫鹼的矽酸之低聚合物水溶液。Further, the citric acid solution is obtained by subjecting an aqueous solution of an alkali metal ruthenate such as water glass to an alkali-removed low-polymer aqueous solution of citric acid.

使用於被覆層形成用的有機矽化合物或矽酸液之添加量僅為可將膠體粒子表面充分包覆程度即可,最後所得之二氧化矽被覆層的厚度為1~40nm,較佳為可成為1~20nm之量,添加於多孔質粒子(空洞粒子實為空洞粒子前驅體)分散液中。又,形成二氧化矽保護膜時,二氧化矽保護膜與二氧化矽被覆層的合計厚度為1~40nm,較佳為成為1~20nm之範圍的量下添加有機矽化合物或矽酸液。The amount of the organic cerium compound or the ceric acid solution used for forming the coating layer is only sufficient to coat the surface of the colloidal particles, and the thickness of the cerium oxide coating layer finally obtained is 1 to 40 nm, preferably It is added in an amount of 1 to 20 nm, and is added to a dispersion of porous particles (the void particles are actually hollow particle precursors). Moreover, when the ceria protective film is formed, the total thickness of the ceria protective film and the ceria coating layer is 1 to 40 nm, and it is preferable to add an organic antimony compound or a tannic acid solution in an amount of 1 to 20 nm.

接者,黏著加熱處理形成被覆層之粒子的分散液。藉由加熱處理,多孔質粒子的情況為,包覆多孔質粒子表面的二氧化矽被覆層經緻密化,得到多孔質粒子藉由二氧化矽被覆層包覆的複合粒子之分散液。又,空洞粒子前驅體時,所形成之被覆層經緻密化而成為空洞粒子壁,得到具有內部經溶劑、氣體或多孔質固體成分填充的空洞之空洞粒子的分散液。Then, the dispersion of the particles forming the coating layer is heat-treated by adhesion. By the heat treatment, in the case of the porous particles, the ceria coating layer covering the surface of the porous particles is densified to obtain a dispersion of the composite particles in which the porous particles are coated with the ceria coating layer. Further, in the case of the void particle precursor, the formed coating layer is densified to become a void particle wall, and a dispersion liquid having void particles having voids filled with a solvent, a gas or a porous solid component is obtained.

此時的加熱處理溫度僅為可堵塞二氧化矽被覆層之微細孔的程度即可,並無特別限定,以80~300℃之範圍為 佳。加熱處理溫度未達80℃時,有時完全堵塞二氧化矽被覆層的微細孔而無法進行緻密化,又處理時間必須較長。且加熱處理溫度超過300℃下進行長時間處理時,會成為緻密粒子,而無法得到低折射率化之效果。The heat treatment temperature at this time is only to the extent that the fine pores of the ceria coating layer can be blocked, and is not particularly limited, and is in the range of 80 to 300 ° C. good. When the heat treatment temperature is less than 80 ° C, the fine pores of the ceria coating layer may be completely blocked, and densification may not be performed, and the treatment time must be long. When the heat treatment temperature exceeds 300 ° C for a long period of time, it becomes a dense particle, and the effect of lowering the refractive index cannot be obtained.

如此所得之無機微粒子的折射率於未達1.42時較低。可推測為如此無機微粒子雖保持多孔質粒子內部之多孔性,但因內部為空洞,故使得折射率變低。The refractive index of the inorganic fine particles thus obtained is lower at less than 1.42. It is presumed that the inorganic fine particles maintain the porosity inside the porous particles, but the inside is void, so that the refractive index is lowered.

又,作為由添加於塗佈組成物時的穩定性之觀點的中空微粒子,表面具有烴主鏈的聚合物以共價鍵方式結合的中空微粒子為佳。Further, as the hollow fine particles from the viewpoint of the stability at the time of application of the coating composition, it is preferred that the polymer having a hydrocarbon main chain on the surface thereof is covalently bonded to the hollow fine particles.

繼續,對於具有烴主鏈之聚合物易共價鍵方式結合的中空微粒子作說明。所謂具有烴主鏈之聚合物為,直接共價鍵、或中空二氧化矽微粒子表面的二氧化矽與具有烴主鏈的聚合物之間介著結合劑,將二氧化矽與結合劑以共價鍵方式結合,亦可言為結合劑與聚合物以共價鍵方式結合。作為結合劑使用偶合劑為較佳。Continuing, the hollow microparticles in which the polymer having a hydrocarbon main chain is easily covalently bonded will be described. The polymer having a hydrocarbon main chain is a direct covalent bond, or a cerium oxide on the surface of the hollow cerium oxide microparticles and a polymer having a hydrocarbon main chain, and a coupling agent is interposed between the cerium oxide and the binder. In combination with the valence bond, it can also be said that the binding agent and the polymer are covalently bonded. It is preferred to use a coupling agent as a binder.

具有烴主鏈之聚合物易共價鍵方式結合的中空微粒子可藉由(1)將中空二氧化矽粒子表面以未處理、或偶合劑等進行處理之狀態下,使中空二氧化矽微粒子表面與具有可形成共價鍵的官能基之聚合物進行反應,於中空二氧化矽粒子表面使聚合物進行接枝的方法、或(2)將中空二氧化矽粒子表面以未處理、或偶合劑等進行處理之狀態下,自中空二氧化矽微粒子表面聚合單體而使聚合物鏈生長,使其進行表面接枝之方法等而製造。作為具體之製造 方法,可使用特開2006-257308號公報所記載的方法。The hollow fine particles in which the polymer having a hydrocarbon main chain is easily covalently bonded can be surface-treated with the surface of the hollow cerium oxide particles by treating the surface of the hollow cerium oxide particles with an untreated or a coupling agent or the like. a method of reacting a polymer having a functional group capable of forming a covalent bond, grafting the polymer on the surface of the hollow ceria particle, or (2) treating the surface of the hollow ceria particle with an untreated or coupling agent In the state of being treated, a monomer is polymerized from the surface of the hollow ceria microparticles to grow a polymer chain, and the surface is grafted. As a specific manufacturing As a method, the method described in JP-A-2006-257308 can be used.

上述製造方法中,由提高表面修飾率之觀點來看,自中空二氧化矽微粒子表面聚合單體而使聚合物鏈生長,使其表面接枝的方法為佳。以含有具有聚合啟始能、或連鎖移動能的官能基之偶合劑使中空二氧化矽微粒子進行表面處理後,聚合單體,使聚合物鏈生長的使其表面接枝之方法更佳。將具有聚合啟始能或連鎖移動能之官能基,作為導入中空二氧化矽微粒子所使用的表面處理劑(偶合劑),使用烷氧基金屬化合物(例如鈦偶合劑、烷氧基矽烷化合物(矽烷偶合劑))為佳。In the above production method, from the viewpoint of improving the surface modification ratio, a method of polymerizing a monomer from the surface of the hollow ceria particles to grow a polymer chain and grafting the surface thereof is preferred. The surface treatment of the hollow ceria particles by a coupling agent containing a functional group having a polymerization initiation energy or a chain shifting energy, and a method of polymerizing a monomer to grow a polymer chain to graft the surface thereof is more preferable. A functional group having a polymerization initiation energy or a chain shifting energy, as a surface treatment agent (coupling agent) used for introducing hollow cerium oxide microparticles, an alkoxy metal compound (for example, a titanium coupling agent, an alkoxy decane compound ( A decane coupling agent)) is preferred.

又,中空二氧化矽微粒子可使用具有導電性金屬氧化物被覆層之中空二氧化矽系粒子。作為導電性金屬氧化物被覆層以氧化銻被覆層為佳。Further, as the hollow ceria particles, hollow ceria-based particles having a conductive metal oxide coating layer can be used. It is preferable that the conductive metal oxide coating layer is a ruthenium oxide coating layer.

中空二氧化矽微粒子可含有平均粒徑相異的2種以上中空二氧化矽微粒子。The hollow ceria particles may contain two or more kinds of hollow ceria particles having different average particle diameters.

繼續,對於形成內部為多孔質或空洞之至少為中空二氧化矽微粒子以外的低折射率層時所使用的塗佈組成物做說明。Continuing, a coating composition used when a low refractive index layer other than hollow ceria particles is formed which is porous or void inside is described.

將低折射率層之表面(膜面)pH控制於2.0~7.5時,可抑制低層折率層內之反應,發揮本發明之效果。較佳為低折射率層之表面(膜面)pH為2.0~4.0。形成低折射率層之組成物中,欲控制低折射率層之表面(膜面)pH,添加至少一種具有pKa2~7範圍之pKa值的化合物為佳。When the pH of the surface (film surface) of the low refractive index layer is controlled to 2.0 to 7.5, the reaction in the low layer folding layer can be suppressed, and the effects of the present invention can be exhibited. Preferably, the surface (film surface) of the low refractive index layer has a pH of from 2.0 to 4.0. In the composition for forming the low refractive index layer, it is preferred to add at least one compound having a pKa value in the range of pKa2 to 7 to control the pH of the surface (film surface) of the low refractive index layer.

且,pKa為下述酸解離反應中之酸解離定數,其為Ka之對數值,pKa=-log10Ka所示數值。Further, pKa is an acid-dissociation number in the acid dissociation reaction described below, which is a logarithm of Ka and a value represented by pKa = -log10Ka.

HA ← → [H ][A ] Ka=[H ][A ]/[HA]其中,H 表示酸性種,A 表示共軛鹼。HA ← → [H + ][A - ] Ka=[H + ][A - ]/[HA] wherein H + represents an acid species and A - represents a conjugate base.

作為具有至少1種pKa2~7之範圍的pKa值之具體化合物,可舉出脂肪族二元酸、或下述一般式(1)所示咪唑、或其衍生物。特別為將下述一般式(1)所示咪唑或其衍生物含於低折射率層形成組成物時,即使於過度嚴苛之耐久試驗後,亦可發揮本發明之目的效果故較佳。Specific examples of the specific compound having at least one pKa value in the range of pKa 2 to 7 include an aliphatic dibasic acid or an imidazole represented by the following general formula (1) or a derivative thereof. In particular, when the imidazole or the derivative thereof represented by the following general formula (1) is contained in the low refractive index layer-forming composition, it is preferable to exhibit the object of the present invention even after an excessively severe endurance test.

(R1 )nA………(1)(R 1 )nA.........(1)

R1 表示氫原子、可由胺基或羥基進行取代之碳數1~3的烷基、烯基及鹵素原子,R1 為複數個時可互為相同或相異。R1 所示胺基可由1或2個甲基或乙基進行取代。又,烷基及烯基中可由碳數1~3的烷基進行取代。n為1~3的整數。A表示咪唑基。R 1 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms which may be substituted with an amine group or a hydroxyl group, an alkenyl group and a halogen atom, and when R 1 is plural, they may be the same or different from each other. The amine group represented by R 1 may be substituted by 1 or 2 methyl groups or ethyl groups. Further, the alkyl group and the alkenyl group may be substituted by an alkyl group having 1 to 3 carbon atoms. n is an integer from 1 to 3. A represents an imidazolyl group.

繼續,以下為上述一般式(1)所示咪唑、或其衍生物之具體例,但未限定於彼等。又,咪唑或其衍生物可使用購得之販賣品。The following are specific examples of the imidazole or the derivative thereof represented by the above general formula (1), but are not limited thereto. Further, commercially available products can be used as the imidazole or a derivative thereof.

1-甲基咪唑 2-甲基咪唑4-甲基咪唑4-(2-羥基乙基)咪唑4-(2-胺基乙基)咪唑2-(2-羥基乙基)咪唑2-乙基咪唑2-乙烯咪唑4-丙基咪唑2,4-二甲基咪唑2-氯咪唑4,5-二(2-羥基乙基)咪唑咪唑1-methylimidazole 2-methylimidazole 4-methylimidazolium 4-(2-hydroxyethyl)imidazole 4-(2-aminoethyl)imidazole 2-(2-hydroxyethyl)imidazole 2-ethylimidazole 2-vinylimidazole 4-propylimidazole 2,4-dimethylimidazole 2-chloroimidazole 4,5-bis(2-hydroxyethyl)imidazolium

作為脂肪族二元酸,可舉出甲酸、丙酸、丙二酸、琥珀酸、酒石酸、蘋果酸、馬來酸、富馬酸、戊二酸、己二酸、乙酸等,彼等中以乙酸為佳。Examples of the aliphatic dibasic acid include formic acid, propionic acid, malonic acid, succinic acid, tartaric acid, malic acid, maleic acid, fumaric acid, glutaric acid, adipic acid, acetic acid, and the like. Acetic acid is preferred.

脂肪族二元酸或下述一般式(1)所示咪唑或其衍生物為低折射率層塗佈組成物中含0.05~10.0質量%,但由塗佈組成物之安定性等點來看較佳。The aliphatic dibasic acid or the imidazole or the derivative thereof represented by the following general formula (1) is 0.05 to 10.0% by mass in the coating composition of the low refractive index layer, but from the viewpoint of the stability of the coating composition and the like Preferably.

形成低折射率層之塗佈組成物中,含有有機溶劑為佳。作為具體有機溶劑之例子,可舉出醇類(例如,甲醇、乙醇、異丙醇、丁醇、苯甲醇類)、酮(例如,丙酮、甲基乙基酮、甲基異丁基酮、環己酮)、酯(例如,乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸丁酯、甲酸甲酯、甲酸乙酯、甲酸丙酯、甲酸丁酯)、脂肪族烴(例如,己烷、環 己烷)、鹵化烴(例如,二氯甲烷、氯仿、四氯化碳)、芳香族烴(例如,苯、甲苯、二甲苯)、醯胺(例如,二甲基甲醯胺、二甲基乙醯胺、n-甲基吡咯烷酮)、醚(例如,二乙醚、二噁烷、四氫呋喃)、醚醇類(例如,1-甲氧基-2-丙醇)、丙二醇單甲醚、丙二醇單甲醚乙酸酯。其中以甲苯、二甲苯、甲基乙基酮、甲基異丁基酮、環己酮、及丁醇為特佳。The coating composition forming the low refractive index layer preferably contains an organic solvent. Examples of specific organic solvents include alcohols (for example, methanol, ethanol, isopropanol, butanol, benzyl alcohol) and ketones (for example, acetone, methyl ethyl ketone, methyl isobutyl ketone, Cyclohexanone), ester (eg, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, methyl formate, ethyl formate, propyl formate, butyl formate), aliphatic hydrocarbons (eg, hexane) ,ring Hexane), halogenated hydrocarbons (eg, dichloromethane, chloroform, carbon tetrachloride), aromatic hydrocarbons (eg, benzene, toluene, xylene), decylamine (eg, dimethylformamide, dimethyl Acetamide, n-methylpyrrolidone), ether (eg, diethyl ether, dioxane, tetrahydrofuran), ether alcohols (eg, 1-methoxy-2-propanol), propylene glycol monomethyl ether, propylene glycol Methyl ether acetate. Among them, toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and butanol are particularly preferred.

形成低折射率層之塗佈組成物中的固體成分濃度以1~4質量%為佳,固體成分濃度為4質量%以下時,難產生塗佈不均,1質量%以上時可減輕乾燥負荷。The solid content concentration in the coating composition forming the low refractive index layer is preferably from 1 to 4% by mass, and when the solid content concentration is 4% by mass or less, coating unevenness is less likely to occur, and when it is 1% by mass or more, the drying load can be reduced. .

形成低折射率層之塗佈組成物中含有氟系或聚矽氧烷系界面活性劑為佳。含有上述界面活性劑時,於減低塗佈不均或提高膜表面之防污性上有效。It is preferred that the coating composition forming the low refractive index layer contains a fluorine-based or polyoxyalkylene-based surfactant. When the above surfactant is contained, it is effective in reducing coating unevenness or improving the antifouling property of the film surface.

作為氟系界面活性劑可舉出含有全氟烷基之單體、寡聚物、聚合物為母核者之聚環氧乙烷烷醚、聚環氧乙烷烷基烯丙基醚、聚環氧乙烷等衍生物等。Examples of the fluorine-based surfactant include a monomer containing a perfluoroalkyl group, an oligomer, a polyethylene oxide alkyl ether having a polymer core, a polyethylene oxide alkyl allyl ether, and a polycondensation. Derivatives such as ethylene oxide.

氟系界面活性劑使用販賣品時,例如可舉出Surflon「S-381」、「S-382」、「SC-101」、「SC-102」、「SC-103」、「SC-104」(皆為旭硝子股份有限公司製)Fluorad「FC-430」、「FC-431」、「FC-173」(皆為Fluorochemicals住友3M製)、EFTOP「EF352」、「EF301」、「EF303」(皆為新秋田化成股份有限公司製)、修貝格夫亞「8035」、「8036」(皆為修貝格滿公司製)、「BM1000」、「BM1100」(皆為BM.亥米公司製) 、Megaface「F-171」、「F-470」(皆為大日本墨水化學工業股份有限公司製)等。When a fluorine-based surfactant is used, for example, Surflon "S-381", "S-382", "SC-101", "SC-102", "SC-103", and "SC-104" are mentioned. (all are manufactured by Asahi Glass Co., Ltd.) Fluorad "FC-430", "FC-431", "FC-173" (all are Fluorochemicals Sumitomo 3M), EFTOP "EF352", "EF301", "EF303" (all For the new Akita Chemical Co., Ltd.), repairing Begofya "8035", "8036" (all manufactured by Beckman), "BM1000", "BM1100" (both BM. Hemi) , Megaface "F-171", "F-470" (all manufactured by Dainippon Ink Chemical Industry Co., Ltd.).

氟系界面活性劑之含氟比率為0.05~2質量%,較佳為0.1~1質量%。上述氟系界面活性劑使用1種或併用2種以上。The fluorine-based surfactant has a fluorine content of 0.05 to 2% by mass, preferably 0.1 to 1% by mass. One type of the above-mentioned fluorine-based surfactants may be used alone or two or more types may be used in combination.

繼續,對於聚矽氧烷界面活性劑做說明。Continue with the description of polyoxyalkylene surfactants.

聚矽氧烷界面活性劑,依據結合於矽原子之有機基的種類,而大概分為純聚矽氧烷油與改性聚矽氧烷油。The polyoxyalkylene surfactant is roughly classified into a pure polyoxane oil and a modified polyoxane oil depending on the kind of the organic group bonded to the ruthenium atom.

其中,所謂純聚矽氧烷油為,將甲基、苯基、氫原子作為取代基而結合者。所謂改性聚矽氧烷油為具有由純聚矽氧烷油以二次衍生的構成部分者。一方面,亦可由聚矽氧烷油之反應性來分類。綜合上述如以下。Here, the pure polysiloxane oil is a combination of a methyl group, a phenyl group, and a hydrogen atom as a substituent. The modified polyoxyalkylene oil is a component having a secondary derivatization from pure polysiloxane oil. On the one hand, it can also be classified by the reactivity of polyoxyalkylene oil. The above is summarized as follows.

(聚矽氧烷油)(polyoxane oil) 1.純聚矽氧烷油Pure polyoxyalkylene oil

1-1.非反應性聚矽氧烷油:二甲基、甲基苯基取代等1-1. Non-reactive polyoxane oil: dimethyl, methylphenyl substitution, etc.

1-2.反應性聚矽氧烷油:甲基氫取代等1-2. Reactive polyoxane oil: methyl hydrogen substitution, etc.

2.改性聚矽氧烷油2. Modified polyoxyalkylene oil

於二甲基聚矽氧烷油中導入各式各樣有機基所產生的改性聚矽氧烷油。A modified polyoxane oil produced by introducing various organic groups into dimethyl polysiloxane oil.

2-1.非反應性聚矽氧烷油:烷基、烷基/芳烷基、烷基/聚醚、聚醚、高級脂肪酸酯取代等。2-1. Non-reactive polyoxyalkylene oil: alkyl, alkyl/aralkyl, alkyl/polyether, polyether, higher fatty acid ester substitution, and the like.

烷基/芳烷基改性聚矽氧烷油為,將二甲基聚矽氧烷油之甲基一部份由長鏈烷基或苯基烷基取代之聚矽氧烷油。The alkyl/aralkyl modified polyoxyalkylene oil is a polyoxyalkylene oil in which a part of the methyl group of the dimethyl polysiloxane oil is replaced by a long-chain alkyl group or a phenylalkyl group.

聚醚改性聚矽氧烷油為,將親水性聚氧伸烷基導入於疏水性二甲基聚矽氧烷之聚矽氧烷系高分子界面活性劑。The polyether-modified polyoxyalkylene oil is a polyoxyalkylene-based polymer surfactant in which a hydrophilic polyoxyalkylene group is introduced into a hydrophobic dimethylpolysiloxane.

高級脂肪酸改性聚矽氧烷油為,將二甲基聚矽氧烷油之甲基一部份由高級脂肪酸酯取代的聚矽氧烷油。The higher fatty acid modified polyoxyalkylene oil is a polyoxyalkylene oil in which a methyl group of a dimethylpolysiloxane oil is partially substituted with a higher fatty acid ester.

胺基改性聚矽氧烷油為,具有將聚矽氧烷油之甲基一部份由胺基烷基取代之結構的聚矽氧烷油。The amine-modified polyoxyalkylene oil is a polyoxyalkylene oil having a structure in which a part of a methyl group of a polysiloxane oil is substituted with an aminoalkyl group.

環氧基改性聚矽氧烷油為,具有將聚矽氧烷油之甲基一部份由含有環氧基之烷基取代之結構的聚矽氧烷油。The epoxy-modified polyoxyalkylene oil is a polyoxyalkylene oil having a structure in which a part of a methyl group of a polyoxyalkylene oil is substituted with an alkyl group containing an epoxy group.

羧基改性或醇類改性聚矽氧烷油為,具有將聚矽氧烷油之甲基一部份由含有羧基或羥基之烷基取代之結構的聚矽氧烷油。The carboxyl group-modified or alcohol-modified polyoxyalkylene oil is a polyoxyalkylene oil having a structure in which a part of a methyl group of a polysiloxane oil is substituted with an alkyl group having a carboxyl group or a hydroxyl group.

其中,可添加聚醚改性聚矽氧烷油。聚醚改性聚矽氧烷油之數平均分子量,例如為1,000~100,000,較佳為2,000~50,000,數平均分子量未達1,000時,塗膜之乾燥性會降低,相反地數平均分子量若超過100,000時,於塗膜表面不容易外滲。Among them, polyether modified polyoxyalkylene oil can be added. The number average molecular weight of the polyether modified polyoxyalkylene oil is, for example, 1,000 to 100,000, preferably 2,000 to 50,000, and when the number average molecular weight is less than 1,000, the drying property of the coating film is lowered, and if the number average molecular weight is more than At 100,000, it is not easy to extravasate on the surface of the coating film.

作為具體商品,可舉出日本unicar股份有限公司的L-45、L-9300、FZ-3704、FZ-3703、FZ-3720、FZ-3786、FZ-3501、FZ-3504、FZ-3508、FZ-3705、FZ-3707、FZ-3710、FZ-3750、FZ-3760、FZ-3785、FZ-3785、Y-7499、信越化學公司的KF96L、KF96、KF96H、KF99、KF54、 KF965、KF968、KF56、KF995、KF351、KF351A、KF352、KF353、KF354、KF355、KF615、KF618、KF945、KF6004、FL100、BYK Japan公司製的界面活性劑BYK系列、BYK-300/302、BYK-306、BYK-307、BYK-310、BYK-315、BYK-320、BYK-322、BYK-323、BYK-325、BYK-330、BYK-331、BYK-333、BYK-337、BYK-340、BYK-344、BYK-370、BYK-375、BYK-377、BYK-352、BYK-354、BYK-355/356、BYK-358N/361N、BYK-357、BYK-390、BYK-392、BYK-UV3500、BYK-UV3510、BYK-UV3570、BYK-Silclean3700、GE東芝聚矽氧烷公司製之二甲基聚矽氧烷系列、XC96-723、YF3800、XF3905、YF3057、YF3807、YF3802、YF3897等。Specific products include L-45, L-9300, FZ-3704, FZ-3703, FZ-3720, FZ-3786, FZ-3501, FZ-3504, FZ-3508, FZ of Japan Unicar Co., Ltd. -3705, FZ-3707, FZ-3710, FZ-3750, FZ-3760, FZ-3785, FZ-3785, Y-7499, Shin-Etsu Chemical Co., Ltd. KF96L, KF96, KF96H, KF99, KF54, KF965, KF968, KF56, KF995, KF351, KF351A, KF352, KF353, KF354, KF355, KF615, KF618, KF945, KF6004, FL100, BYK Japan company's surfactant BYK series, BYK-300/302, BYK-306 , BYK-307, BYK-310, BYK-315, BYK-320, BYK-322, BYK-323, BYK-325, BYK-330, BYK-331, BYK-333, BYK-337, BYK-340, BYK -344, BYK-370, BYK-375, BYK-377, BYK-352, BYK-354, BYK-355/356, BYK-358N/361N, BYK-357, BYK-390, BYK-392, BYK-UV3500 , BYK-UV3510, BYK-UV3570, BYK-Silclean3700, GE Toshiba Polyoxane Co., Ltd. dimethyl polyoxane series, XC96-723, YF3800, XF3905, YF3057, YF3807, YF3802, YF3897 and so on.

又,聚矽氧烷界面活性劑為,將聚矽氧烷油的甲基一部份由親水性基取代之界面活性劑。取代位置為聚矽氧烷油之支鏈、兩末端、單方末端、兩末端支鏈等。作為親水性基可舉出聚醚、聚甘油、吡咯烷酮、甜菜鹼、硫酸鹽、磷酸鹽、4級鹽等。Further, the polyoxyalkylene surfactant is a surfactant in which a part of a methyl group of the polyoxyalkylene oil is substituted with a hydrophilic group. The substitution position is a branch of polyoxyalkylene oil, two ends, a single end, two end branches, and the like. Examples of the hydrophilic group include a polyether, polyglycerin, pyrrolidone, betaine, sulfate, phosphate, and a 4-stage salt.

作為聚矽氧烷界面活性劑,疏水基為由二甲基聚矽氧烷、親水基為聚氧伸烷基所構成之非離子界面活性劑為佳。As the polyoxyalkylene surfactant, a hydrophobic group is preferably a nonionic surfactant composed of dimethyl polyoxyalkylene and a hydrophilic group of a polyoxyalkylene group.

非離子界面活性劑為,不具有水溶液中解離成離子之基的界面活性劑之總稱,除具有疏水基以外,亦具有作為親水性基之多元醇類的羥基、又具有聚氧伸烷基鏈(聚環氧乙烷)等作為親水基者。親水性為隨著醇類性羥基數目 的增加,又隨著聚氧伸烷基鏈(聚環氧乙烷鏈)之加長而增強。使用疏水基為由二甲基聚矽氧烷、親水基為聚氧伸烷基所構成之非離子界面活性劑時,會提高上述低折射率層之不均或膜表面之防污性。可推測為由聚甲基矽氧烷所成之疏水基配向於表面時,可形成難被污染的膜表面。The nonionic surfactant is a general term for a surfactant which does not have a group which dissociates into an ion in an aqueous solution. In addition to having a hydrophobic group, it also has a hydroxyl group as a hydrophilic group and a polyoxyalkylene chain. (Polyethylene oxide) or the like as a hydrophilic group. Hydrophilicity is the number of hydroxyl groups with alcohol The increase is further enhanced by the lengthening of the polyoxyalkylene chain (polyethylene oxide chain). When a nonionic surfactant composed of a dimethylpolysiloxane and a hydrophilic group is a polyoxyalkylene group is used, the unevenness of the low refractive index layer or the antifouling property of the film surface is enhanced. It is presumed that when the hydrophobic group formed of polymethyl siloxane is aligned to the surface, a surface of the film which is difficult to be contaminated can be formed.

作為非離子界面活性劑之具體例,例如可舉出日本unicar股份有限公司製、聚矽氧烷界面活性劑SILWET L-77、L-720、L-7001、L-7002、L-7604、Y-7006、FZ-2101、FZ-2104、FZ-2105、FZ-2110、FZ-2118、FZ-2120、FZ-2122、FZ-2123、FZ-2130、FZ-2154、FZ-2161、FZ-2162、FZ-2163、FZ-2164、FZ-2166、FZ-2191、SUPERSILWET SS-2801、SS-2802、SS-2803、SS-2804、SS-2805等。Specific examples of the nonionic surfactant include, for example, a polyoxonane surfactant SILWET L-77, L-720, L-7001, L-7002, L-7604, Y manufactured by Nippon Unicar Co., Ltd. -7006, FZ-2101, FZ-2104, FZ-2105, FZ-2110, FZ-2118, FZ-2120, FZ-2122, FZ-2123, FZ-2130, FZ-2154, FZ-2161, FZ-2162 , FZ-2163, FZ-2164, FZ-2166, FZ-2191, SUPERSILWET SS-2801, SS-2802, SS-2803, SS-2804, SS-2805, etc.

這些作為疏水基係由二甲基聚矽氧烷所構成,親水基係由聚氧伸烷基所構成之非離子系界面活性劑的較佳結構,以二甲基聚矽氧烷結構部分與聚氧伸烷基鏈成交互重複結合之直鏈狀嵌段共聚物為佳。塗佈形成低屈折率層之塗布組成物時的不均抑制或塗平性較佳。作為這些具體例,例如可舉出日本unicar股份有限公司製、聚矽氧烷界面活性劑ABN SILWET FZ-2203、FZ-2207、FZ-2208、FZ-2222等。These are preferably a structure in which a hydrophobic group is composed of dimethyl polyoxane, and a hydrophilic group is a nonionic surfactant composed of a polyoxyalkylene group, and a dimethyl polyoxyalkylene moiety is used. Preferably, the polyoxyalkylene chain is a linear repeat block copolymer which is alternately and repeatedly bonded. The unevenness suppression or the leveling property when coating a coating composition having a low inflection rate layer is preferred. As such a specific example, a polyoxonane surfactant ABN SILWET FZ-2203, FZ-2207, FZ-2208, FZ-2222, etc., manufactured by Nippon Unicar Co., Ltd., may be mentioned.

形成低折射率層之塗佈組成物中,由更嚴苛條件下之耐久試驗後可容易發揮本發明目的效果之觀點來看,含有以下說明之反應性改性聚矽氧烷樹脂(亦稱為反應性改性 聚矽氧烷油)者為佳。The coating composition forming the low refractive index layer contains the reactive modified polyoxyalkylene resin (hereinafter also referred to as the following description) from the viewpoint that the object of the present invention can be easily exhibited after the endurance test under more severe conditions. Reactive modification Polyoxane oil is preferred.

2-2.反應性改性聚矽氧烷油:胺基、環氧基、羧基、醇類取代等。2-2. Reactive modified polyoxyalkylene oil: amine group, epoxy group, carboxyl group, alcohol substitution, and the like.

作為反應性改性聚矽氧烷樹脂,可舉出於聚矽氧烷之支鏈、片末端或兩末端上以胺基、環氧基、羧基、羥基、甲基丙烯基、氫硫基、酚等進行取代之反應性型改性聚矽氧烷樹脂。作為胺基改性聚矽氧烷樹脂,具體可舉出KF-860,KF-861,X-22-161A、X-22-161B(以上,信越化學工業股份有限公司製)、FM-3311,FM-3325(以上,chisso股份有限公司製),作為環氧基改性聚矽氧烷樹脂可舉出KF-105、X-22-163A、X-22-163B、KF-101、KF-1001(以上,信越化學工業股份有限公司製),作為聚醚改性聚矽氧烷樹脂,可舉出X-22-4272、X-22-4952,作為羧基改性聚矽氧烷樹脂,可舉出X-22-3701E、X-22-3710(以上,信越化學工業股份有限公司製),作為甲醇改性聚矽氧烷樹脂,可舉出KF-6001、KF-6003(以上,信越化學工業股份有限公司製),作為甲基丙烯酸改性聚矽氧烷樹脂可舉出X-22-164C(以上,信越化學工業股份有限公司製),作為氫硫基改性聚矽氧烷樹脂,可舉出KF-2001(以上,信越化學工業股份有限公司製),作為酚改性聚矽氧烷樹脂可舉出X-22-1821(以上,信越化學工業股份有限公司製)等。作為羥基改性聚矽氧烷樹脂可舉出FM-4411、FM-4421、FM-DA21,FM-DA26(以上,chisso股份有限公 司製)。其他亦含有單末端反應性聚矽氧烷樹脂之X-22-170DX、X-22-2426、X-22-176F(信越化學工業股份有限公司製)等。The reactive modified polyoxyalkylene resin may be an amine group, an epoxy group, a carboxyl group, a hydroxyl group, a methacryl group, a thiol group, or the like at the end or both ends of the polyoxyalkylene. A reactive type modified polyoxyalkylene resin substituted with a phenol or the like. Specific examples of the amine-modified polyoxyalkylene resin include KF-860, KF-861, X-22-161A, X-22-161B (above, Shin-Etsu Chemical Co., Ltd.), FM-3311, FM-3325 (above, chisso Co., Ltd.), as the epoxy-modified polyoxyalkylene resin, KF-105, X-22-163A, X-22-163B, KF-101, KF-1001 (The above, manufactured by Shin-Etsu Chemical Co., Ltd.), as the polyether-modified polyoxyalkylene resin, X-22-4272 and X-22-4952, and a carboxyl modified polyoxyalkylene resin can be mentioned. X-22-3701E, X-22-3710 (above, Shin-Etsu Chemical Co., Ltd.), as a methanol-modified polyoxyalkylene resin, KF-6001, KF-6003 (above, Shin-Etsu Chemical Industry) As a methacrylic acid-modified polyoxyalkylene resin, X-22-164C (above, Shin-Etsu Chemical Co., Ltd.) can be used as a hydrogen-sulfur-modified polyoxyalkylene resin. KF-2001 (above, Shin-Etsu Chemical Co., Ltd.), as a phenol-modified polyoxyalkylene resin, X-22-1821 (X-22-1821) Above, Shin-Etsu Chemical Co., Ltd.). Examples of the hydroxy-modified polyoxyalkylene resin include FM-4411, FM-4421, FM-DA21, and FM-DA26 (above, Chisso Co., Ltd.) System). Others include X-22-170DX, X-22-2426, and X-22-176F (manufactured by Shin-Etsu Chemical Co., Ltd.) which have a single-end reactive polyoxyalkylene resin.

上述界面活性劑可與其他界面活性劑併用,又例如可與適當的磺酸鹽系、硫酸酯鹽系、磷酸酯鹽系等陰離子界面活性劑併用,且亦可與具有聚環氧乙烷鏈親水基之醚型、醚酯型等非離子界面活性劑等併用。上述界面活性劑之添加量為,低折射率層塗佈組成物中為0.05~3.0質量%時,不僅可提高塗膜之撥水、撥油性、防污性,亦可發揮對於表面耐擦傷性之效果故較佳。The above surfactant may be used in combination with other surfactants, and may be used in combination with an anionic surfactant such as a suitable sulfonate, sulfate or phosphate ester, and may also have a polyethylene oxide chain. A nonionic surfactant such as an ether group or an ether ester type of a hydrophilic group is used in combination. When the amount of the surfactant added is 0.05 to 3.0% by mass in the low refractive index coating composition, not only the water repellency, oil repellency, and antifouling properties of the coating film can be improved, but also the surface scratch resistance can be exhibited. The effect is preferred.

形成低折射率層之塗佈組成物中可含有其他二氧化矽微粒子。其中作為其他二氧化矽微粒子,雖無特別限定,但可舉出膠體二氧化矽等。作為膠體二氧化矽之具體例,將二氧化矽以膠體狀分散於水或有機溶劑者,雖無特別限定可為球狀、針狀或珠子群狀。The coating composition forming the low refractive index layer may contain other cerium oxide microparticles. The other cerium oxide fine particles are not particularly limited, and examples thereof include colloidal cerium oxide. As a specific example of the colloidal cerium oxide, in the case where the cerium oxide is dispersed in a colloidal form in water or an organic solvent, it may be in the form of a spherical shape, a needle shape or a bead group.

膠體二氧化矽之平均粒徑以50~300nm之範圍為佳,變動係數以1~40%之單分散者為佳。平均粒徑可由掃描電子顯微鏡(SEM)等藉由電子顯微鏡照片測定。亦可利用動態散光法或靜態散光法等由粒度分佈計等測定。The average particle size of the colloidal ceria is preferably in the range of 50 to 300 nm, and the coefficient of variation is preferably from 1 to 40%. The average particle diameter can be measured by an electron micrograph using a scanning electron microscope (SEM) or the like. It can also be measured by a particle size distribution meter or the like using a dynamic astigmatism method or a static astigmatism method.

膠體二氧化矽可為被販賣者,例如可舉出日產化學工業公司的Snowtex系列、觸媒化成工業公司的Cataloid-S系列、Bayer公司的雷巴西爾系列等。又,以氧化鋁溶膠或氫氧化鋁進行陽離子改性之膠體二氧化矽或二氧化矽的一次粒子以2價以上的金屬離子進行粒子間之結合後,連 結成珠子群狀的珠子群狀膠體二氧化矽亦佳。珠子群狀膠體二氧化矽可舉出日產化學工業公司的SnowtexAK系列、SnowtexPS系列、SnowtexUP系列等,具體可舉出IPS-ST-L(異丙醇分散、粒子徑40~50nm、固體成分30%)、MEK-ST-MS(甲基乙基酮分散、粒子徑17~23nm、固體成分35)等。The colloidal cerium oxide may be a seller, and examples thereof include the Snowtex series of Nissan Chemical Industries Co., Ltd., the Cataloid-S series of Catalyst Chemical Industries, and the Rebala series of Bayer. Further, the primary particles of the colloidal ceria or cerium oxide which are cationically modified with alumina sol or aluminum hydroxide are bonded to each other by metal ions having a valence of 2 or more, and then It is also preferred that the bead group colloidal cerium oxide is formed into a bead group. Examples of the bead group colloidal cerium oxide include the Snowtex AK series, the Snowtex PS series, and the Snowtex UP series of Nissan Chemical Industries Co., Ltd., specifically, IPS-ST-L (isopropyl alcohol dispersion, particle diameter 40 to 50 nm, solid content 30%) ), MEK-ST-MS (methyl ethyl ketone dispersion, particle diameter 17 to 23 nm, solid content 35).

低折射率層形成塗佈組成物中含有膠體二氧化矽時,對於低折射率層中之固體成分為10~60質量%,且30~60質量%時由膜強度之觀點來看較佳。When the low refractive index layer-forming coating composition contains colloidal cerium oxide, the solid content in the low refractive index layer is preferably from 10 to 60% by mass, and from 30 to 60% by mass, from the viewpoint of film strength.

又,低折射率層形成塗佈組成物中對於低折射率層中之固體成分含有5~80質量%之膠黏劑為佳。膠黏劑為,黏著中空二氧化矽微粒子或膠體二氧化矽,具有維持含有空隙之低折射率層的結構之功能。膠黏劑的使用量不僅可填充空隙,亦可維持低折射率層之強度下進行調整。Further, it is preferable that the low refractive index layer is formed in the coating composition in an amount of 5 to 80% by mass based on the solid content in the low refractive index layer. The adhesive is a function of adhering hollow ceria particles or colloidal ceria to maintain a structure of a low refractive index layer containing voids. The amount of the adhesive can be used not only to fill the voids but also to maintain the strength of the low refractive index layer.

作為膠黏劑,可舉出烷氧基金屬化合物、及其水解物或其縮聚物,又可舉出聚乙烯醇、聚環氧乙烷、聚甲基甲基丙烯酸酯、聚甲基丙烯酸酯、二乙醯基纖維素、三乙醯基纖維素、硝基纖維素、聚酯、醇酸樹脂、氟丙烯酸酯、含氟聚合物等。作為氟聚合物,例如可舉出氟烯烴類(例如氟乙烯、亞乙烯氟化物、四氟乙烯、全氟辛基乙烯、六氟丙烯、全氟-2,2-二甲基-1,3-二氧雜環戊烯等(甲基)丙烯酸之部分或完全氟化烷酯衍生物類(例如VISCOAT6FM(大阪有機化學製)或M-2020(大金製)等)、完全或部分氟化乙烯醚類等。其中較佳為全氟烯烴類,由折射率 、溶解性、透明性、取得性等觀點來看以六氟丙烯為特佳。Examples of the adhesive include a metal alkoxide compound, a hydrolyzate thereof or a polycondensate thereof, and polyvinyl alcohol, polyethylene oxide, polymethyl methacrylate, and polymethacrylate. , diethyl acetyl cellulose, triethylene fluorenyl cellulose, nitro cellulose, polyester, alkyd resin, fluoroacrylate, fluoropolymer, and the like. Examples of the fluoropolymer include fluoroolefins (for example, fluoroethylene, vinylidene fluoride, tetrafluoroethylene, perfluorooctylethylene, hexafluoropropylene, perfluoro-2,2-dimethyl-1,3). - a partially or fully fluorinated alkyl ester derivative such as dioxetane (for example, VISCOAT6FM (made by Osaka Organic Chemical Co., Ltd.) or M-2020 (made by Daikin)), completely or partially fluorinated a vinyl ether or the like. Among them, perfluoroolefins are preferred, and the refractive index is From the viewpoints of solubility, transparency, and availability, hexafluoropropylene is particularly preferred.

又,作為烷氧基金屬化合物,特以矽烷偶合劑對於中空二氧化矽微粒子之膠黏劑的特性優良之觀點來看為較佳。以下對於矽烷偶合劑做說明。作為矽烷偶合劑以下述一般式(3)所示之矽烷偶合劑為佳。Further, as the alkoxide metal compound, a decane coupling agent is particularly preferable from the viewpoint of excellent properties of the binder of the hollow cerium oxide microparticles. The following describes the decane coupling agent. As the decane coupling agent, a decane coupling agent represented by the following general formula (3) is preferred.

(Z-L1 )m -Si-(R2 )n R3 4-m+n ………(3) 式中,Z為具有聚合啟始能、或連鎖移動能之官能基。L1 為碳原子數10以下之2價連結基。(Z-L 1 ) m -Si-(R 2 ) n R 3 4-m+n (3) wherein Z is a functional group having a polymerization initiation energy or a chain shifting energy. L 1 is a divalent linking group having 10 or less carbon atoms.

其中,L1 較佳為碳原子數1~10的伸烷基、或複數的伸烷基介著連結基(例如,醚、酯、醯胺)結合之基。伸烷基可具有支鏈。伸烷基可具有取代基。取代基的例子含有鹵素原子、羥基、氫硫基、羧基、環氧基、烷基、芳基。Among them, L 1 is preferably an alkylene group having 1 to 10 carbon atoms or a plurality of alkylene groups bonded via a linking group (for example, an ether, an ester or a decylamine). The alkylene group may have a branch. The alkylene group may have a substituent. Examples of the substituent include a halogen atom, a hydroxyl group, a hydrogenthio group, a carboxyl group, an epoxy group, an alkyl group, and an aryl group.

又,上述一般式(3)中,R2 為碳原子數1~10的烷基。R3 為羥基或可水解的基。R3 以碳原子數1~5的烷氧基或鹵素原子為佳,甲氧基、乙氧基或氯原子更佳。且1≦m≦3、0≦n≦2,且1≦m+n≦3。Further, in the above general formula (3), R 2 is an alkyl group having 1 to 10 carbon atoms. R 3 is a hydroxyl group or a hydrolyzable group. R 3 is preferably an alkoxy group having 1 to 5 carbon atoms or a halogen atom, and more preferably a methoxy group, an ethoxy group or a chlorine atom. And 1≦m≦3, 0≦n≦2, and 1≦m+n≦3.

作為具有上述一般式(3)所示之矽烷偶合劑之取代基例子,可含有羥基、鹵素原子(例如,Cl、Br、F、I)、氰基、硝基、接基、磺基、碳原子數1~8的烷基(例如,甲基、乙基、異丙基、丁基、己基、環丙基、環己基 、2-羥基乙基、4-羧基丁基、2-甲氧基乙基、2-二乙胺基乙基)、碳原子數2~8的烯基(例如,乙烯、烯丙基、2-己烯基)、碳原子數2~8的炔基(例如,乙炔基、1-丁炔基、3-己炔基)、碳原子數7~12的芳烷基(例如,苯甲基、苯乙基)、碳原子數6~10的芳基(例如,苯基、萘基、4-羧基苯基、4-乙醯胺苯基、3-甲烷磺醯胺苯基、4-甲氧基苯基、3-羧基苯基、3,5-二羧基苯基、4-甲烷磺醯胺苯基、4-丁磺醯胺苯基)、碳原子數1~10的醯基(例如,乙醯基、苯甲醯基、丙醯基、丁醯基)、碳原子數2~10的烷氧基羰基(例如,甲氧基羰基、乙氧基羰基)、碳原子數7~12的芳氧基羰基(例如,苯氧基羰基、萘氧基羰基)、碳原子數1~10的胺基甲醯基(例如,無取代的胺基甲醯基、甲胺基甲醯基、二乙胺基甲醯基、苯胺基甲醯基)、碳原子數1~8的烷氧基(例如,甲氧基、乙氧基、丁氧基、甲氧基乙氧基)、碳原子數6~12的芳氧基(例如,苯氧基、4-羧基苯氧基、3-甲基苯氧基、萘氧基)、碳原子數2~12的醯氧基(例如,乙酸基、苯甲醯氧基)、碳原子數1~12的磺醯氧基(例如,甲基磺醯氧基、苯基磺醯氧基)、胺基、碳原子數1~10的取代胺基(例如,二甲胺基、二乙胺基、2-羧基乙胺基)、碳原子數1~10的醯胺基(例如,乙醯胺、苯甲醯胺)、碳原子數1~8的磺醯胺基(例如,甲烷磺醯胺、苯磺醯胺、丁磺醯胺、辛磺醯胺)、碳原子數1~10的脲基(例如,脲基、甲基脲基)、碳原子數2~10的烷氧基羰胺基(例 如,甲氧基羰胺基、乙氧基羰胺基)、碳原子數1~12的烷基硫基(例如,甲基硫、乙基硫、辛基硫)、碳原子數6~12的芳基硫基(例如,苯基硫、萘基硫)、碳原子數1~8的烷基磺醯基(例如,甲基磺醯基、丁基磺醯基)、碳原子數7~12的芳基磺醯基(例如,苯基磺醯基、2-萘基磺醯基)、胺磺醯基、碳原子數1~8的取代胺磺醯基(例如,甲胺磺醯基)、雜環基(例如,4-吡啶、1-哌啶基、2-呋喃基、糠基、2-噻嗯基、2-吡咯基、2-喹啉嗎啉代基)。Examples of the substituent having the decane coupling agent represented by the above general formula (3) may contain a hydroxyl group, a halogen atom (for example, Cl, Br, F, I), a cyano group, a nitro group, a substituent group, a sulfo group, and a carbon. An alkyl group having 1 to 8 atoms (for example, methyl, ethyl, isopropyl, butyl, hexyl, cyclopropyl, cyclohexyl) , 2-hydroxyethyl, 4-carboxybutyl, 2-methoxyethyl, 2-diethylaminoethyl), an alkenyl group having 2 to 8 carbon atoms (for example, ethylene, allyl, 2 -hexenyl), an alkynyl group having 2 to 8 carbon atoms (for example, an ethynyl group, a 1-butynyl group, a 3-hexynyl group), an aralkyl group having 7 to 12 carbon atoms (for example, a benzyl group) , phenethyl), an aryl group having 6 to 10 carbon atoms (for example, phenyl, naphthyl, 4-carboxyphenyl, 4-ethylguanidinylphenyl, 3-methanesulfonamide phenyl, 4-methyl) An oxyphenyl group, a 3-carboxyphenyl group, a 3,5-dicarboxyphenyl group, a 4-methanesulfonamide phenyl group, a 4-butylsulfonylamine phenyl group, and a fluorenyl group having 1 to 10 carbon atoms (for example) , ethyl hydrazino, benzhydryl, propyl fluorenyl, butyl fluorenyl), alkoxycarbonyl group having 2 to 10 carbon atoms (for example, methoxycarbonyl group, ethoxycarbonyl group), aromatic group having 7 to 12 carbon atoms An oxycarbonyl group (for example, a phenoxycarbonyl group, a naphthyloxycarbonyl group), an aminomethylcarbenyl group having 1 to 10 carbon atoms (for example, an unsubstituted aminomethyl fluorenyl group, a methylaminomethyl fluorenyl group, a diethyl group) Aminomethyl fluorenyl, anilinomethyl fluorenyl), alkoxy group having 1 to 8 carbon atoms (for example, methoxy, ethoxy, butyl a group, a methoxyethoxy group, an aryloxy group having 6 to 12 carbon atoms (for example, a phenoxy group, a 4-carboxyphenoxy group, a 3-methylphenoxy group, a naphthyloxy group), and a carbon number 2 to 12 decyloxy groups (for example, acetoxy group, benzamethyleneoxy group), sulfonyloxy group having 1 to 12 carbon atoms (for example, methylsulfonyloxy group, phenylsulfonyloxy group), amine a substituted amino group having 1 to 10 carbon atoms (for example, dimethylamino group, diethylamino group, 2-carboxyethylamino group) or a decylamino group having 1 to 10 carbon atoms (for example, acetaminophen, Benzoylamine), a sulfonylamino group having 1 to 8 carbon atoms (for example, methanesulfonamide, benzenesulfonamide, butazone, octanesulfonamide), and a ureido group having 1 to 10 carbon atoms (for example, urea group, methylurea group), alkoxycarbonylamino group having 2 to 10 carbon atoms (for example) For example, methoxycarbonylamino group, ethoxycarbonylamino group), alkylthio group having 1 to 12 carbon atoms (for example, methyl sulfide, ethyl sulfur, octyl sulfide), carbon number 6 to 12 Arylthio group (for example, phenylsulfide, naphthylsulfide), alkylsulfonyl group having 1 to 8 carbon atoms (for example, methylsulfonyl group, butylsulfonyl group), carbon number 7~ An arylsulfonyl group of 12 (for example, phenylsulfonyl, 2-naphthylsulfonyl), an aminesulfonyl group, a substituted aminesulfonyl group having 1 to 8 carbon atoms (for example, methylaminesulfonyl) And a heterocyclic group (for example, 4-pyridine, 1-piperidinyl, 2-furyl, fluorenyl, 2-thiol, 2-pyrrolyl, 2-quinolinylmorpholino).

又,下述一般式(4)所示之矽烷偶合劑亦佳。Further, the decane coupling agent represented by the following general formula (4) is also preferable.

Z-(CH2 )n -Si-R4 3 ………(4) 式中,Z與上述一般式(3)之情況相同,n表示1~10的整數。 Z- (CH 2) n -Si- R 4 3 ......... (4) the formula, Z is the case of the above general formula (3) of the same, n represents an integer of 1 to 10.

R4 表示碳原子數1~5的烷氧基或鹵素原子,其中以甲氧基、乙氧基、及氯原子為佳。R 4 represents an alkoxy group having 1 to 5 carbon atoms or a halogen atom, and a methoxy group, an ethoxy group, and a chlorine atom are preferred.

繼續,舉出含有具有上述一般式(3)所示之聚合啟始能之官能基的矽烷偶合劑的較佳例。Continuing to mention a preferred example of a decane coupling agent containing a functional group having a polymerization initiation property represented by the above general formula (3).

XCH2 C(O)O(CH2 )3 Si(OCH3 )3 CH3 C(H)(X)C(O)O(CH2 )3 Si(OCH3 )3 (CH3 )2 C(X)C(O)O(CH2 )3 Si(OCH3 )3 XCH2 C(O)O(CH2 )6 Si(OCH3 )3 CH3 C(H)(X)C(O)O(CH2 )6 Si(OCH3 )3 (CH3 )2 C(X)C(O)O(CH2 )6 Si(OCH3 )3 XCH2 C(O)O(CH2 )3 Si(OC2 H5 )3 CH3 C(H)(X)C(O)O(CH2 )3 Si(OC2 H5 )3 (CH3 )2 C(X)C(O)O(CH2 )3 Si(OC2 H5 )3 XCH2 C(O)O(CH2 )6 Si(OC2 H5 )3 CH3 C(H)(X)C(O)O(CH2 )6 Si(OC2 H5 )3 (CH3 )2 C(X)C(O)O(CH2 )6 Si(OC2 H5 )3 XCH2 C(O)O(CH2 )3 SiCl3 CH3 C(H)(X)C(O)O(CH2 )3 SiCl3 (CH3 )2 C(X)C(O)O(CH2 )3 SiCl3 XCH 2 C(O)O(CH 2 ) 3 Si(OCH 3 ) 3 CH 3 C(H)(X)C(O)O(CH 2 ) 3 Si(OCH 3 ) 3 (CH 3 ) 2 C( X)C(O)O(CH 2 ) 3 Si(OCH 3 ) 3 XCH 2 C(O)O(CH 2 ) 6 Si(OCH 3 ) 3 CH 3 C(H)(X)C(O)O (CH 2 ) 6 Si(OCH 3 ) 3 (CH 3 ) 2 C(X)C(O)O(CH 2 ) 6 Si(OCH 3 ) 3 XCH 2 C(O)O(CH 2 ) 3 Si( OC 2 H 5 ) 3 CH 3 C(H)(X)C(O)O(CH 2 ) 3 Si(OC 2 H 5 ) 3 (CH 3 ) 2 C(X)C(O)O(CH 2 ) 3 Si (OC 2 H 5 ) 3 XCH 2 C (O) O (CH 2) 6 Si (OC 2 H 5) 3 CH 3 C (H) (X) C (O) O (CH 2) 6 Si (OC 2 H 5 ) 3 (CH 3 ) 2 C(X)C(O)O(CH 2 ) 6 Si(OC 2 H 5 ) 3 XCH 2 C(O)O(CH 2 ) 3 SiCl 3 CH 3 C(H)(X)C(O)O(CH 2 ) 3 SiCl 3 (CH 3 ) 2 C(X)C(O)O(CH 2 ) 3 SiCl 3

各式中,X為氯、溴或碘原子,特別以溴原子為佳。In the formula, X is a chlorine, bromine or iodine atom, and particularly preferably a bromine atom.

又,作為矽烷偶合劑之具體例,可舉出甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三甲氧基乙氧基矽烷、甲基三乙酸基矽烷、甲基三丁氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙烯三甲氧基矽烷、乙烯三乙氧基矽烷、乙烯三乙酸基矽烷、乙烯三甲氧基乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、苯基三乙酸基矽烷、γ-氯丙基三甲氧基矽烷、γ-氯丙基三乙氧基矽烷、γ-氯丙基三乙酸基矽烷、3,3,3-三氟丙基三甲氧基矽烷、γ-環氧丙氧基丙基三甲氧基矽烷、γ-環氧丙氧基丙基三乙氧基矽烷、γ-(β-環氧丙氧基乙氧基)丙基三甲氧基矽烷、β-(3,4-環氧基環己基)乙基三甲氧基矽烷、β-(3,4-環氧基環己基)乙基三乙氧基矽烷、γ-丙烯醯氧基丙基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷、γ-胺基丙 基三甲氧基矽烷、γ-胺基丙基三乙氧基矽烷、γ-氫硫基丙基三甲氧基矽烷、γ-氫硫基丙基三乙氧基矽烷、N-β-(胺基乙基)-γ-胺基丙基三甲氧基矽烷、及β-氰基乙基三乙氧基矽烷、二甲基二甲氧基矽烷、苯基甲基二甲氧基矽烷、二甲基二乙氧基矽烷、苯基甲基二甲氧基矽烷、二甲基二乙氧基矽烷、苯基甲基二乙氧基矽烷、γ-環氧丙氧基丙基甲基二乙氧基矽烷、γ-環氧丙氧基丙基甲基二甲氧基矽烷、γ-環氧丙氧基丙基苯基二乙氧基矽烷、γ-氯丙基甲基二乙氧基矽烷、二甲基二乙酸基矽烷、γ-丙烯醯氧基丙基甲基二甲氧基矽烷、γ-丙烯醯氧基丙基甲基二乙氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、γ-氫硫基丙基甲基二甲氧基矽烷、γ-氫硫基丙基甲基二乙氧基矽烷、γ-胺基丙基甲基二甲氧基矽烷、γ-胺基丙基甲基二乙氧基矽烷、甲基乙烯二甲氧基矽烷、及甲基乙烯二乙氧基矽烷等。Further, specific examples of the decane coupling agent include methyltrimethoxydecane, methyltriethoxydecane, methyltrimethoxyethoxydecane, methyltriacetoxydecane, and methyltributyloxide. Base decane, ethyl trimethoxy decane, ethyl triethoxy decane, ethylene trimethoxy decane, ethylene triethoxy decane, ethylene triacetoxy decane, ethylene trimethoxy ethoxy decane, phenyl trimethoxy Base decane, phenyl triethoxy decane, phenyl triacetoxy decane, γ-chloropropyl trimethoxy decane, γ-chloropropyl triethoxy decane, γ-chloropropyl triacetoxy decane, 3 , 3,3-trifluoropropyltrimethoxydecane, γ-glycidoxypropyltrimethoxydecane, γ-glycidoxypropyltriethoxydecane, γ-(β-epoxy Propoxyethoxy)propyltrimethoxydecane, β-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, β-(3,4-epoxycyclohexyl)ethyltri Ethoxy decane, γ-propylene methoxy propyl trimethoxy decane, γ-methyl propylene methoxy propyl trimethoxy decane, γ-amino propyl Trimethoxy decane, γ-aminopropyl triethoxy decane, γ-hydrothiopropyltrimethoxy decane, γ-hydrothiopropyltriethoxy decane, N-β-(amino group Ethyl)-γ-aminopropyltrimethoxydecane, and β-cyanoethyltriethoxydecane, dimethyldimethoxydecane, phenylmethyldimethoxydecane, dimethyl Diethoxydecane, phenylmethyldimethoxydecane, dimethyldiethoxydecane, phenylmethyldiethoxydecane, γ-glycidoxypropylmethyldiethoxy Decane, γ-glycidoxypropylmethyldimethoxydecane, γ-glycidoxypropylphenyldiethoxydecane, γ-chloropropylmethyldiethoxydecane, II Methyl diacetoxy decane, γ-propylene methoxy propyl methyl dimethoxy decane, γ-propylene methoxy propyl methyl diethoxy decane, γ-methyl propylene methoxy propyl group Dimethoxy decane, γ-methyl propylene methoxy propyl methyl diethoxy decane, γ-hydrothiopropyl methyl dimethoxy decane, γ-hydrothiopropyl methyl group Ethoxy decane, γ-aminopropyl Methyl dimethoxy decane, γ-aminopropyl methyl diethoxy decane, methyl ethylene dimethoxy decane, and methyl ethylene diethoxy decane.

其中,作為分子內具有雙鍵之乙烯三甲氧基矽烷、乙烯三乙氧基矽烷、乙烯三乙酸基矽烷、乙烯三甲氧基乙氧基矽烷、γ-丙烯醯氧基丙基三甲氧基矽烷、及γ-甲基丙烯醯氧基丙基三甲氧基矽烷、對於矽具有2取代的烷基者,可舉出γ-丙烯醯氧基丙基甲基二甲氧基矽烷、γ-丙烯醯氧基丙基甲基二乙氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、甲基乙烯二甲氧基矽烷、及甲基乙烯二乙氧基矽烷為佳,γ-丙烯醯氧基丙基三甲氧基矽烷、及γ-甲基丙烯醯氧基丙 基三甲氧基矽烷、γ-丙烯醯氧基丙基甲基二甲氧基矽烷、γ-丙烯醯氧基丙基甲基二乙氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、及γ-甲基丙烯醯氧基丙基甲基二乙氧基矽烷為特佳。Among them, ethylene trimethoxy decane, ethylene triethoxy decane, ethylene triacetoxy decane, ethylene trimethoxy ethoxy decane, γ-acryloxypropyl trimethoxy decane having a double bond in the molecule, And γ-methacryloxypropyltrimethoxydecane, and those having a 2-substituted alkyl group, γ-propylene methoxypropyl methyl dimethoxy decane, γ-propylene oxime Propyl methyl diethoxy decane, γ-methyl propylene methoxy propyl methyl dimethoxy decane, γ-methyl propylene methoxy propyl methyl diethoxy decane, methyl ethylene Dimethoxydecane, and methylethylene diethoxynonane, preferably γ-acryloxypropyltrimethoxydecane, and γ-methylpropenyloxypropane Trimethoxy decane, γ-propylene methoxy propyl methyl dimethoxy decane, γ-propylene methoxy propyl methyl diethoxy decane, γ-methyl propylene methoxy propyl methyl Dimethoxydecane and γ-methacryloxypropylmethyldiethoxydecane are particularly preferred.

低折射率層可使用凹版塗佈機、浸漬塗佈機、逆塗佈機、線圈棒塗佈機、塑模塗佈機、噴射法等公知方法,塗佈形成低折射率層之上述塗佈組成物,塗佈後經加熱乾燥,視必要進行硬化處理後形成。The low refractive index layer can be applied by coating a low refractive index layer by a known method such as a gravure coater, a dip coater, a reverse coater, a coil bar coater, a die coater, or a spray method. The composition is dried by heating after application, and is formed after hardening treatment as necessary.

塗佈量以濕膜厚度為0.05~100μm為恰當,較佳為0.1~50μm。又,塗佈組成物之固體成分濃度調整至乾膜厚為上述膜壓。The coating amount is suitably from 0.05 to 100 μm in wet film thickness, preferably from 0.1 to 50 μm. Further, the solid content concentration of the coating composition was adjusted to a dry film thickness of the above film pressure.

又,形成低折射率層後,亦可含有於溫度50~160℃下進行加熱處理之步驟。加熱處理之期間可藉由所設定之溫度而做適宜決定即可,例如僅為50℃,較佳為3天以上且未達30天之期間,僅為160℃下10分鐘以上1天以下範圍為佳。作為硬化方法,藉由加熱使其熱硬化之方法、藉由紫外線等光照射使其硬化之方法等。使其熱硬化時,加熱溫度以50~300℃為佳,較佳為60~250℃,更佳為80~150℃。藉由光照射使其硬化時,照射光之曝光量以10mJ/cm2 ~10J/cm2 為佳,以100mJ/cm2 ~500mJ/cm2 為較佳。Further, after the low refractive index layer is formed, it may be subjected to a heat treatment at a temperature of 50 to 160 °C. The heat treatment period may be appropriately determined by the set temperature, for example, only 50 ° C, preferably 3 days or more and less than 30 days, and only 160 ° C for 10 minutes or more and 1 day or less. It is better. As a curing method, a method of thermally hardening by heating, a method of curing by irradiation with light such as ultraviolet rays, or the like. When it is thermally hardened, the heating temperature is preferably from 50 to 300 ° C, preferably from 60 to 250 ° C, more preferably from 80 to 150 ° C. When it is cured by light irradiation, the exposure amount of the irradiation light is preferably 10 mJ/cm 2 to 10 J/cm 2 , and more preferably 100 mJ/cm 2 to 500 mJ/cm 2 .

其中作為經照射之光波長區,並無特別限定,但以具有紫外線區域之波長者為佳。具體可使用低壓水銀燈、中壓水銀燈、高壓水銀燈、超高壓水銀燈、碳極電弧燈、金 屬鹵素燈、氙氣燈等。照射條件依燈光而不同,但活性線之照射量,一般為5~500mJ/cm2 ,較佳為5~150mJ/cm2 ,特佳為20~100mJ/cm2The wavelength region of the light to be irradiated is not particularly limited, but it is preferably a wavelength having an ultraviolet region. Specifically, a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a carbon arc lamp, a metal halide lamp, a xenon lamp, or the like can be used. The irradiation conditions vary depending on the light, but the irradiation amount of the active line is generally 5 to 500 mJ/cm 2 , preferably 5 to 150 mJ/cm 2 , and particularly preferably 20 to 100 mJ/cm 2 .

繼續,對於設置於低折射率層與透明樹脂薄膜之間為佳之比支持體的折射率更高的高折射率層做說明。Continuing, a high refractive index layer having a higher refractive index than the support disposed between the low refractive index layer and the transparent resin film will be described.

(高折射率層)(high refractive index layer)

所謂高折射率層為,比透明薄膜基材之折射率還高之層。作為高折射率層之較佳折射率為,23℃中波長550nm下進行測定所得為1.5~2.2之範圍者為佳。作為調整高折射率層之折射率的手段,欲支配金屬氧化物微粒子之種類、添加量,使用以下說明之金屬氧化物微粒子的折射率為1.80~2.60者為佳,1.85~2.50為更佳。又,高折射率層之膜壓,由作為光學干渉層之特性來看,以5nm~1μm為佳,以10nm~0.2μm為更佳,以30nm~0.1μm為最佳。The high refractive index layer is a layer having a higher refractive index than the transparent film substrate. The preferred refractive index of the high refractive index layer is preferably in the range of 1.5 to 2.2 measured at a wavelength of 550 nm at 23 ° C. As a means for adjusting the refractive index of the high refractive index layer, the type and amount of the metal oxide fine particles to be used are preferably 1.80 to 2.60, and more preferably 1.85 to 2.50, of the metal oxide fine particles described below. Further, the film pressure of the high refractive index layer is preferably 5 nm to 1 μm, more preferably 10 nm to 0.2 μm, and most preferably 30 nm to 0.1 μm, as the characteristics of the optical dry layer.

繼續,對於使用於調整高折射率層之折射率的金屬氧化物微粒子做說明。金屬氧化物微粒子之種類並無特別限定,可使用具有至少1種選自Ti、Zr、Sn、Sb、Cu、Fe、Mn、Pb、Cd、As、Cr、Hg、Zn、Al、Mg、Si、P及S之元素的金屬氧化物,這些金屬氧化物微粒子可摻合Al、In、Sn、Sb、Nb、鹵元素、Ta等的微量原子。又,可為這些混合物。其中亦以至少1種選自氧化鋯、氧化銻、氧化錫、氧化鋅、氧化銦-錫(ITO)、銻摻合氧化錫(ATO)、及銻酸鋅之金屬氧化物微粒子作為主成分者為特佳。 特別以含有銻酸鋅粒子者為佳。Continuing, the metal oxide fine particles used for adjusting the refractive index of the high refractive index layer will be described. The type of the metal oxide fine particles is not particularly limited, and at least one selected from the group consisting of Ti, Zr, Sn, Sb, Cu, Fe, Mn, Pb, Cd, As, Cr, Hg, Zn, Al, Mg, Si can be used. Metal oxides of elements of P and S. These metal oxide fine particles may be doped with a trace atom of Al, In, Sn, Sb, Nb, a halogen element, Ta or the like. Also, these may be mixtures. Wherein at least one metal oxide fine particle selected from the group consisting of zirconium oxide, cerium oxide, tin oxide, zinc oxide, indium tin oxide (ITO), antimony-doped tin oxide (ATO), and zinc antimonate is used as a main component. It is especially good. It is especially preferred to contain zinc silicate particles.

這些金屬氧化物微粒子之一次粒子的平均粒子徑為10nm~200nm之範圍,10~150nm為特佳。金屬氧化物微粒子之平均粒子徑可藉由掃描電子顯微鏡(SEM)等電子顯微鏡照片進行測定,利用動態散光法或靜態散光法等藉由粒度分佈計等進行測定。粒徑過小時容易凝集,使得分散性惡化。粒徑過大時霧值會顯著提高而不佳。金屬氧化物微粒子之形狀以米粒狀、球形狀、立方體狀、紡錘形狀、針狀或不定形狀為佳。The average particle diameter of the primary particles of these metal oxide fine particles is in the range of 10 nm to 200 nm, and particularly preferably 10 to 150 nm. The average particle diameter of the metal oxide fine particles can be measured by an electron micrograph such as a scanning electron microscope (SEM), and can be measured by a particle size distribution meter or the like using a dynamic astigmatism method or a static astigmatism method. When the particle diameter is too small, aggregation tends to occur, and the dispersibility is deteriorated. When the particle size is too large, the fog value will be significantly improved. The shape of the metal oxide fine particles is preferably a rice grain shape, a spherical shape, a cubic shape, a spindle shape, a needle shape or an indefinite shape.

金屬氧化物微粒子可藉由有機化合物進行表面處理。金屬氧化物微粒子之表面藉由有機化合物進行表面修飾時,可提高有機溶劑中之分散安定性,容易控制分散粒徑的同時,亦可經時性地抑制凝集、沈澱。因此,較佳有機化合物之表面修飾量對於金屬氧化物粒子而言為0.1質量%~5質量%,較佳為0.5質量%~3質量%。使用於表面處理之有機化合物的例子,含有多元醇、烷醇胺、硬脂酸、矽烷偶合劑及鈦酸酯偶合劑。其中以後述矽烷偶合劑為佳。亦可組合2種以上之表面處理。The metal oxide fine particles can be surface-treated by an organic compound. When the surface of the metal oxide fine particles is surface-modified by an organic compound, the dispersion stability in the organic solvent can be improved, and the dispersed particle diameter can be easily controlled, and aggregation and precipitation can be suppressed over time. Therefore, the amount of surface modification of the organic compound is preferably 0.1% by mass to 5% by mass, and preferably 0.5% by mass to 3% by mass, based on the metal oxide particles. Examples of the organic compound used for the surface treatment include a polyhydric alcohol, an alkanolamine, a stearic acid, a decane coupling agent, and a titanate coupling agent. The decane coupling agent described later is preferred. It is also possible to combine two or more kinds of surface treatments.

所使用之金屬氧化物微粒子與後述之活性光線硬化型樹脂等膠黏劑的比率,依金屬氧化物微粒子之種類、粒子尺寸等而不同,但體積比為對前者1而言後者為2至對前者2而言後者為1之程度為佳。The ratio of the metal oxide fine particles to be used and the adhesive such as the active light-curing resin to be described later differs depending on the type of the metal oxide fine particles, the particle size, and the like, but the volume ratio is 2 to the latter for the former 1 The former 2 is preferably the latter.

金屬氧化物微粒子的使用量以高折射率層中5質量%~85質量%為佳,10質量%~80質量%為較佳,20~75 質量%為最佳。使用量若過少,無法得到所望折射率或本發明的效果,過多時,會產生膜強度之劣化等。The amount of the metal oxide fine particles used is preferably 5% by mass to 85% by mass in the high refractive index layer, and preferably 10% by mass to 80% by mass, and 20 to 75% by mass. The mass % is the best. If the amount used is too small, the desired refractive index or the effect of the present invention cannot be obtained, and when it is too large, deterioration of film strength or the like occurs.

上述金屬氧化物微粒子為,分散於媒體之分散體狀態下,以使用於形成高折射率層之塗佈液方式提供。作為金屬氧化物粒子之分散媒體,使用沸點為60~170℃之液體為佳。作為分散溶劑之具體例,可舉出水、醇類(例如,甲醇、乙醇、異丙醇、丁醇、苯甲醇類)、酮(例如,丙酮、甲基乙基酮、甲基異丁基酮、環己酮)、酮醇類(例如,二丙酮醇類)、酯(例如,乙酸甲酯、乙酸乙酯、乙酸丙基、乙酸丁基、甲酸甲基、甲酸乙酯、甲酸丙基、甲酸丁基)、脂肪族烴(例如,己烷、環己烷)、鹵化烴(例如,二氯甲烷、氯仿、四氯化碳)、芳香族烴(例如,苯、甲苯、二甲苯)、醯胺(例如,二甲基甲醯胺、二甲基乙醯胺、n-甲基吡咯烷酮)、醚(例如,二乙醚、二噁烷、四氫呋喃)、醚醇類(例如,1-甲氧基-2-丙醇)、丙二醇單甲醚、丙二醇單甲醚乙酸酯。其中亦以甲苯、二甲苯、甲基乙基酮、甲基異丁基酮、環己酮及丁醇為特佳。The metal oxide fine particles are provided in a dispersion state in a medium, and are provided in a coating liquid for forming a high refractive index layer. As the dispersion medium of the metal oxide particles, a liquid having a boiling point of 60 to 170 ° C is preferably used. Specific examples of the dispersion solvent include water, alcohols (for example, methanol, ethanol, isopropanol, butanol, benzyl alcohol), and ketones (for example, acetone, methyl ethyl ketone, and methyl isobutyl group). Ketones, cyclohexanone), keto alcohols (eg, diacetone alcohols), esters (eg, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, methyl formate, ethyl formate, propyl formate) , butyl formate), aliphatic hydrocarbons (eg, hexane, cyclohexane), halogenated hydrocarbons (eg, dichloromethane, chloroform, carbon tetrachloride), aromatic hydrocarbons (eg, benzene, toluene, xylene) , guanamine (eg, dimethylformamide, dimethylacetamide, n-methylpyrrolidone), ether (eg, diethyl ether, dioxane, tetrahydrofuran), ether alcohols (eg, 1-a Oxy-2-propanol), propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate. Among them, toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and butanol are particularly preferred.

又,金屬氧化物微粒子可使用分散機而分散於媒體中。作為分散機之例子,可舉出磨砂研磨機(例如,附針珠研磨機)、高速葉輪式研磨機、石英片研磨機、輥研磨機、攪拌球磨機及膠體研磨機。以磨砂研磨機及高速葉輪式研磨機為特佳。又,可實施預備分散處理。作為使用於預備分散處理之分散機例,可舉出球研磨機、三根輥研磨機、捏合機及擠壓機。含有分散劑較佳。Further, the metal oxide fine particles can be dispersed in the medium using a disperser. Examples of the dispersing machine include a sanding mill (for example, a bead mill), a high-speed impeller mill, a quartz disc grinder, a roll grinder, a stirring ball mill, and a colloid mill. It is especially good for scrub sanders and high speed impeller mills. Further, a preliminary dispersion treatment can be performed. Examples of the dispersing machine used in the preliminary dispersion treatment include a ball mill, a three-roll mill, a kneader, and an extruder. It is preferred to contain a dispersing agent.

進一步可含有具有核心/殼結構之金屬氧化物微粒子。殼可形成於核心周圍1層,欲進一步提高耐光性可形成複數層。核心為藉由殼完全覆蓋者為佳。Further, metal oxide fine particles having a core/shell structure may be contained. The shell can be formed in one layer around the core, and a plurality of layers can be formed to further improve light resistance. The core is preferably covered by the shell.

核心可使用氧化鈦(金紅石型、銳鈦礦型、不定型等)、氧化鋯、氧化鋅、氧化鈰、摻合錫之氧化銦、摻合銻之氧化錫等,但亦可將金紅石型之氧化鈦作為主成分。The core may use titanium oxide (rutile type, anatase type, amorphous type, etc.), zirconia, zinc oxide, cerium oxide, indium oxide doped tin oxide, tin oxide doped with antimony, etc., but rutile may also be used. The type of titanium oxide is used as a main component.

殼以氧化鈦以外之無機化合物作為主成分,由金屬之氧化物或硫化物所形成者為佳。例如可使用二氧化矽(二氧化矽)、氧化鋁(alumina)、氧化鋯、氧化鋅、氧化錫、氧化銻、氧化銦、氧化鐵、硫化鋅等作為主成分之無機化合物。其中以氧化鋁、二氧化矽、氧化鋯為佳。又,亦可為彼等之混合物。The shell is preferably composed of an inorganic compound other than titanium oxide as a main component, and is formed of an oxide or sulfide of a metal. For example, an inorganic compound containing ceria (ceria), alumina, zirconia, zinc oxide, tin oxide, cerium oxide, indium oxide, iron oxide, zinc sulfide or the like as a main component can be used. Among them, alumina, ceria, and zirconia are preferred. Also, it may be a mixture of them.

對於核心的殼之覆蓋量,平均覆蓋量為2~50質量%。較佳為3~40質量%,更佳為4~25質量%。殼之覆蓋量過多時,微粒子之折射率會降低,覆蓋量過少時,耐光性會劣化。可併用二種以上的金屬氧化物微粒子。For the coverage of the core shell, the average coverage is 2 to 50% by mass. It is preferably from 3 to 40% by mass, more preferably from 4 to 25% by mass. When the amount of coverage of the shell is too large, the refractive index of the fine particles is lowered, and when the amount of coverage is too small, the light resistance is deteriorated. Two or more kinds of metal oxide fine particles may be used in combination.

作為核心之氧化鈦可使用液相法或氣相法所製作者。又,作為將殼形成於核心周圍的手法,例如可使用美國專利第3,410,708號、特公昭58-47061號、美國專利第2,885,366號、同第3,437,502號、英國專利第1,134,249號、美國專利第3,383,231號、英國專利第2,629,953號、同第1,365,999號所記載之方法等。高折射率層或前述低折射率層中可含有下述一般式(5)所示化合物或其螯合化合物,可改善硬度等物性。As the core titanium oxide, it can be produced by a liquid phase method or a gas phase method. Further, as a method of forming a shell around a core, for example, U.S. Patent No. 3,410,708, Japanese Patent No. Sho 58-47061, U.S. Patent No. 2,885,366, the same as No. 3,437,502, British Patent No. 1,134,249, and U.S. Patent No. 3,383,231 The method described in British Patent No. 2,629,953 and the same as No. 1,365,999. The high refractive index layer or the low refractive index layer may contain a compound represented by the following general formula (5) or a chelate compound thereof, and the physical properties such as hardness can be improved.

AnMBx-n………(5) 式中,M表示金屬原子,A表示可水解之官能基或具有可水解官能基之烴基,B表示金屬原子M經共價鍵或離子鍵之原子團。x表示金屬原子M之原子價,n表示2以上,x以下的整數。AnMBx-n.........(5) In the formula, M represents a metal atom, A represents a hydrolyzable functional group or a hydrocarbyl group having a hydrolyzable functional group, and B represents an atomic group in which a metal atom M is covalently bonded or ionically bonded. x represents the valence of the metal atom M, and n represents an integer of 2 or more and x or less.

作為可水解之官能基A,例如可舉出烷氧基、氯原子等的鹵素、酯基、醯胺基等。Examples of the hydrolyzable functional group A include a halogen such as an alkoxy group or a chlorine atom, an ester group, and a guanamine group.

屬於與上述式(5)之金屬化合物中,含有具有2個以上具有直接鍵結於金屬原子的烷氧基的烷氧化物、或其螯合化合物。作為較佳金屬化合物,可舉出鈦烷氧化物、鋯烷氧化物或彼等螯合化合物。鈦烷氧化物為反應速度快,且折射率高而容易處理,但因具有光觸媒作用,若大量添加時會使耐光性劣化。鋯烷氧化物為折射率高但容易白濁,故必須注意塗佈時的曝光管理等。The metal compound belonging to the above formula (5) contains an alkoxide having two or more alkoxy groups directly bonded to a metal atom, or a chelating compound thereof. The preferred metal compound may, for example, be a titanium alkoxide, a zirconium alkoxide or a chelating compound thereof. Titanium alkoxide has a high reaction rate and a high refractive index and is easy to handle. However, it has a photocatalytic action and deteriorates light resistance when added in a large amount. Since zirconium alkoxide has a high refractive index but is easily cloudy, it is necessary to pay attention to exposure management at the time of coating.

又,鈦烷氧化物因具有促進紫外線硬化樹脂、金屬烷氧化物之反應的效果,僅少量添加即可提高塗膜之物理特性。Further, the titanium alkoxide has an effect of promoting the reaction of the ultraviolet curable resin and the metal alkoxide, and the physical properties of the coating film can be improved by adding only a small amount.

作為鈦烷氧化物,例如可舉出四甲氧基鈦、四乙氧基鈦、四-iso-丙氧基鈦、四-n-丙氧基鈦、四-n-丁氧基鈦、四-sec-丁氧基鈦、四-tert-丁氧基鈦等。Examples of the titanium alkoxide include tetramethoxytitanium, tetraethoxytitanium, tetra-iso-propoxytitanium, tetra-n-propoxytitanium, tetra-n-butoxytitanium, and tetra. -sec-butoxytitanium, tetra-tert-butoxytitanium, and the like.

作為鋯烷氧化物,例如可舉出四甲氧基鋯、四乙氧基鋯、四-iso-丙氧基鋯、四-n-丙氧基鋯、四-n-丁氧基鋯、 四-sec-丁氧基鋯、四-tert-丁氧基鋯等。Examples of the zirconium alkoxide include tetramethoxy zirconium, tetraethoxy zirconium, tetra-iso-propoxy zirconium, tetra-n-propoxy zirconium, and tetra-n-butoxy zirconium. Tetra-sec-butoxyzirconium, tetra-tert-butoxyzirconium, and the like.

作為形成配位於游離金屬化合物之螯合化合物的較佳螯合化劑,可舉出二乙醇胺、三乙醇胺等烷醇胺類、乙二醇、二乙二醇、丙二醇等二醇類、乙醯基丙酮、乙醯乙酸乙酯等分子量1萬以下者。藉由使用這些螯合化劑,對於水分之混入等亦安定,可形成塗膜的補強效果亦優良的螯合化合物。上述螯合化合物的添加量為,調整為高折射率層中0.3~5質量%者為佳。未達0.3質量%時,耐擦傷性會不足,超過5質量%時,會有耐光性劣化之傾向。Preferred examples of the chelating agent to form a chelating compound to be a free metal compound include alkanolamines such as diethanolamine and triethanolamine, glycols such as ethylene glycol, diethylene glycol and propylene glycol, and acetamidine. A molecular weight of 10,000 or less such as acetone or ethyl acetate. By using these chelating agents, it is also stable in the mixing of water and the like, and a chelate compound having an excellent reinforcing effect of the coating film can be formed. The addition amount of the above chelate compound is preferably adjusted to 0.3 to 5% by mass in the high refractive index layer. When the amount is less than 0.3% by mass, the scratch resistance may be insufficient, and when it exceeds 5% by mass, the light resistance tends to be deteriorated.

又,高折射率層中含有將電離放射線硬化型樹脂作為金屬氧化物微粒子之膠黏劑來提高塗膜之製膜性或物理特性為佳。作為電離放射線硬化型樹脂,可使用具有2個以上的官能基的單體或寡聚物,該官能基為藉由如紫外線或電子線之活性光線的照射,直接或接受光聚合啟始劑之作用而間接地進行聚合反應者。作為官能基,可舉出具有如(甲基)丙烯醯基氧基等不飽和雙鍵之基、環氧基、矽烷醇基等。其中亦可使用具有2個以上的不飽和雙鍵之自由基聚合性單體或寡聚物。視必要可組合光聚合啟始劑。作為如此電離放射線硬化型樹脂,可使用多元醇丙烯酸酯、環氧基丙烯酸酯、尿烷丙烯酸酯、聚酯丙烯酸酯或彼等混合物。例如可舉出多官能丙烯酸酯化合物等,以選自季戊四醇多官能丙烯酸酯、二季戊四醇多官能丙烯酸酯、季戊四醇多官能甲基丙烯酸酯、及二季戊四醇多官能甲基丙烯酸酯所成群之化合物為佳。其中多官能丙烯酸酯化合物為 ,分子中具有2個以上之丙烯醯氧基及/或甲基丙烯醯氧基之化合物。Further, it is preferable that the high refractive index layer contains an ionizing radiation-curable resin as an adhesive of metal oxide fine particles to improve the film forming property or physical properties of the coating film. As the ionizing radiation-curable resin, a monomer or oligomer having two or more functional groups which are directly or accepting a photopolymerization initiator by irradiation with active light such as ultraviolet rays or electron beams can be used. The polymerization reaction is carried out indirectly. Examples of the functional group include a group having an unsaturated double bond such as a (meth)acrylenyloxy group, an epoxy group, a decyl alcohol group, and the like. Among them, a radical polymerizable monomer or oligomer having two or more unsaturated double bonds can also be used. The photopolymerization initiator can be combined as necessary. As such an ionizing radiation-curable resin, a polyol acrylate, an epoxy acrylate, a urethane acrylate, a polyester acrylate, or a mixture thereof can be used. For example, a polyfunctional acrylate compound or the like is exemplified by a compound selected from the group consisting of pentaerythritol polyfunctional acrylate, dipentaerythritol polyfunctional acrylate, pentaerythritol polyfunctional methacrylate, and dipentaerythritol polyfunctional methacrylate. good. Among them, the multifunctional acrylate compound is A compound having two or more acryloxy groups and/or methacryloxy groups in the molecule.

作為多官能丙烯酸酯化合物之單體,例如可舉出乙二醇二丙烯酸酯、二乙二醇二丙烯酸酯、1,6-己二醇二丙烯酸酯、新戊基二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥甲基乙烷三丙烯酸酯、四羥甲基甲烷三丙烯酸酯、四羥甲基甲烷四丙烯酸酯、五甘油三丙烯酸酯、季戊四醇二丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、甘油三丙烯酸酯、二季戊四醇三丙烯酸酯、二季戊四醇四丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇六丙烯酸酯、參(丙烯醯氧基乙基)三聚異氰酸酯、乙二醇二甲基丙烯酸酯、二乙二醇二甲基丙烯酸酯、1,6-己二醇二甲基丙烯酸酯、新戊基二醇二甲基丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、三羥甲基乙烷三甲基丙烯酸酯、四羥甲基甲烷三甲基丙烯酸酯、四羥甲基甲烷四甲基丙烯酸酯、五甘油三甲基丙烯酸酯、季戊四醇二甲基丙烯酸酯、季戊四醇三甲基丙烯酸酯、季戊四醇四甲基丙烯酸酯、甘油三甲基丙烯酸酯、二季戊四醇三甲基丙烯酸酯、二季戊四醇四甲基丙烯酸酯、二季戊四醇五甲基丙烯酸酯、二季戊四醇六甲基丙烯酸酯為較佳。這些化合物可各單獨或混合2種以上使用。又,可為上述單體之2聚物、3聚物等寡聚物。Examples of the monomer of the polyfunctional acrylate compound include ethylene glycol diacrylate, diethylene glycol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, and three. Hydroxymethylpropane triacrylate, trimethylolethane triacrylate, tetramethylol methane triacrylate, tetramethylol methane tetraacrylate, pentaglycerol triacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate Ester, pentaerythritol tetraacrylate, glycerol triacrylate, dipentaerythritol triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, ginseng (propylene oxyethyl) trimeric isocyanate, B Diol dimethacrylate, diethylene glycol dimethacrylate, 1,6-hexanediol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethyl Acrylate, trimethylolethane trimethacrylate, tetramethylol methane trimethacrylate, tetramethylol methane tetramethacrylate, pentaglycerol trimethacrylate, Pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, glycerol trimethacrylate, dipentaerythritol trimethacrylate, dipentaerythritol tetramethacrylate, dipentaerythritol penta A acrylate or dipentaerythritol hexamethacrylate is preferred. These compounds may be used alone or in combination of two or more. Further, it may be an oligomer such as a dimer or a trimer of the above monomer.

電離放射線硬化型樹脂之添加量於高折射率組成物中固體成分的15質量%以上未達50質量%者為佳。The amount of the ionizing radiation-curable resin to be added is preferably 15% by mass or more and less than 50% by mass of the solid content in the high refractive index composition.

欲促進電離放射線硬化型樹脂之硬化,含有質量比為3:7~1:9的光聚合啟始劑與分子中具有2個以上可聚合之不飽和結合的丙烯基系化合物為佳。In order to promote the hardening of the ionizing radiation-curable resin, a photopolymerization initiator having a mass ratio of 3:7 to 1:9 and a propylene-based compound having two or more polymerizable unsaturated bonds in the molecule are preferred.

作為光聚合啟始劑,具體可舉出乙醯苯、二苯甲酮、羥基二苯甲酮、米希勒酮、α-胺肟酯、噻噸酮等及彼等之衍生物,但並未特別限定。Specific examples of the photopolymerization initiator include acetophenone, benzophenone, hydroxybenzophenone, michelone, α-amine oxime ester, thioxanthone, and the like, but It is not particularly limited.

塗佈高折射率層時使用有機溶劑為佳。作為有機溶劑,例如可舉出醇類(例如,甲醇、乙醇、丙醇、異丙醇、丁醇、異丁醇、第二丁醇、第三丁醇、戊醇、己醇、環己醇、苯甲醇類等)、多元醇類(例如,乙二醇、二乙二醇、三乙二醇、聚乙二醇、丙二醇、二丙二醇、聚丙二醇、丁二醇、己二醇、戊二醇、甘油、己三醇、硫撐二乙醇等)、多元醇類醚類(例如,乙二醇單甲醚、乙二醇單乙醚、乙二醇單丁醚、二乙二醇單甲醚、二乙二醇單甲醚、二乙二醇單丁醚、丙二醇單甲醚、丙二醇單丁醚、乙二醇單甲醚乙酸酯、三乙二醇單甲醚、三乙二醇單乙醚、乙二醇單苯醚、丙二醇單苯醚等)、胺類(例如,乙醇胺、二乙醇胺、三乙醇胺、N-甲基二乙醇胺、N-乙基二乙醇胺、嗎啉、N-乙基嗎啉、伸乙基二胺、二伸乙基二胺、三伸乙基四胺、四伸乙基五胺、聚乙烯亞胺、五甲基二伸乙基三胺、四甲基伸丙基二胺等)、醯胺類(例如,甲醯胺、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等)、雜環類(例如,2-吡咯烷酮、N-甲基-2-吡咯烷酮、環己基吡咯烷酮、2-噁唑酮、1,3-二甲基-2-咪唑二酮等)、亞碸類(例如,二甲 基亞碸等)、碸類(例如,環丁碸等)、尿素、乙腈、丙酮等,特別以醇類、多元醇類、多元醇類醚類為佳。It is preferred to use an organic solvent when coating the high refractive index layer. As the organic solvent, for example, an alcohol (for example, methanol, ethanol, propanol, isopropanol, butanol, isobutanol, second butanol, third butanol, pentanol, hexanol, cyclohexanol) may be mentioned. , benzyl alcohol, etc.), polyols (for example, ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, polypropylene glycol, butanediol, hexanediol, pentane Alcohols, glycerol, hexanetriol, thiodiethanol, etc.), polyol ethers (eg, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether) , diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monobutyl ether, ethylene glycol monomethyl ether acetate, triethylene glycol monomethyl ether, triethylene glycol single Ethyl ether, ethylene glycol monophenyl ether, propylene glycol monophenyl ether, etc., amines (for example, ethanolamine, diethanolamine, triethanolamine, N-methyldiethanolamine, N-ethyldiethanolamine, morpholine, N-ethyl Morpholine, Ethyldiamine, Diethyl Ethyldiamine, Tri-Extended Ethyltetramine, Tetraethylidene Ethylpentamine, Polyethylenimine, Pentamethyldiethylidene Triamine, Tetramethylextension a base diamine or the like), a guanamine (for example, formamide, N,N-dimethylformamide, N,N-dimethylacetamide, etc.), a heterocyclic ring (for example, 2-pyrrolidone, N-methyl-2-pyrrolidone, cyclohexyl pyrrolidone, 2-oxazolone, 1,3-dimethyl-2-imidazolidone, etc.), anthraquinones (eg, dimethyl It is preferable to use an alcohol, a polyhydric alcohol or a polyhydric alcohol ether in particular, such as hydrazine or the like (for example, cyclobutyl hydrazine), urea, acetonitrile or acetone.

高折射率層可使用上述組成物以凹版塗佈機、浸漬塗佈機、逆塗佈機、線圈棒塗佈機、塑模塗佈機、或噴霧塗佈、噴射塗佈等於透明樹脂薄膜、或硬塗佈層表面塗佈至濕膜厚0.1~100μm,塗佈後經加熱乾燥,視必要進行硬化而形成。硬化步驟可使用低折射率層所記載之內容。The high refractive index layer may be a gravure coater, a dip coater, a reverse coater, a coil bar coater, a die coater, or a spray coating or a spray coating using the above composition, which is equal to a transparent resin film, Or the surface of the hard coating layer is applied to a wet film thickness of 0.1 to 100 μm, and after drying, it is dried by heating and hardened as necessary. The hardening step can use the contents described in the low refractive index layer.

又,欲使乾膜厚成為上述膜壓,必須以塗佈組成物之固體成分濃度進行調整。Further, in order to make the dry film thickness the film pressure, it is necessary to adjust the solid content concentration of the coating composition.

(硬塗佈層:活性線硬化樹脂層)(hard coating layer: active wire hardening resin layer)

本發明之防反射薄膜中透明樹脂薄膜與防反射層之間設有作為硬塗佈層含有活性線硬化樹脂之層時,可於防反射薄膜之處理性或防反射薄膜成為後述偏光板時的步驟中,不容易受傷害而較佳。In the antireflection film of the present invention, when a layer containing a living line-curable resin as a hard coat layer is provided between the transparent resin film and the antireflection layer, the antireflection film can be used as a polarizing plate as described later. In the step, it is not easy to be hurt and is better.

所謂活性線硬化樹脂層為,藉由如紫外線或電子線之活性線(以下亦稱為活性能量線。)照射,經由交聯反應等而硬化之樹脂為主成分所成之層。作為活性線硬化樹脂,使用含有具有乙烯性不飽和雙鍵之單體的成分為佳,藉由照射如紫外線或電子線之活性線,使其硬化而形成活性線硬化樹脂層。作為活性線硬化樹脂可舉出以紫外線硬化性樹脂或電子線硬化性樹脂等作為代表者,但藉由紫外線照射後經硬化之樹脂為佳。The active-strand-hardened resin layer is a layer formed by a resin which is cured by a crosslinking reaction or the like by irradiation with an active line such as ultraviolet rays or electron beams (hereinafter also referred to as an active energy ray). As the active wire-curable resin, a component containing a monomer having an ethylenically unsaturated double bond is preferably used, and it is cured by irradiation with an active wire such as an ultraviolet ray or an electron beam to form an active ray-curable resin layer. The active-ray-curing resin is preferably represented by an ultraviolet curable resin or an electron-curable resin, but it is preferably a resin which is cured by ultraviolet irradiation.

作為紫外線硬化性樹脂,例如使用紫外線硬化型尿烷 丙烯酸酯系樹脂、紫外線硬化型聚酯丙烯酸酯系樹脂、紫外線硬化型環氧基丙烯酸酯系樹脂、紫外線硬化型多元醇丙烯酸酯系樹脂、或紫外線硬化型環氧基樹脂等為佳,其中亦以紫外線硬化型丙烯酸酯系樹脂為佳。As the ultraviolet curable resin, for example, ultraviolet curable urethane is used. Acrylic resin, ultraviolet curable polyester acrylate resin, ultraviolet curable epoxy acrylate resin, ultraviolet curable polyol acrylate resin, or ultraviolet curable epoxy resin, etc. An ultraviolet curable acrylate resin is preferred.

作為紫外線硬化型尿烷丙烯酸酯系樹脂,一般為聚酯多元醇與異氰酸酯單體、或預聚物進行反應所得之生成物,再進一步與具有2-羥基乙基丙烯酸酯、2-羥基乙基甲基丙烯酸酯(以下丙烯酸酯中含有甲基丙烯酸酯者係僅以丙烯酸酯表示)、2-羥基丙基丙烯酸酯等羥基之丙烯酸酯系單體進行反應後可容易得到。例如可使用特開昭59-151110號公報所記載者。The ultraviolet curable urethane acrylate resin is generally a product obtained by reacting a polyester polyol with an isocyanate monomer or a prepolymer, and further having 2-hydroxyethyl acrylate and 2-hydroxyethyl group. A methacrylate (hereinafter, a methacrylate containing methacrylate is represented only by acrylate) or a hydroxyl group acrylate monomer such as 2-hydroxypropyl acrylate can be easily obtained by a reaction. For example, those described in JP-A-59-151110 can be used.

例如,使用與優尼迪克17-806(大日本墨水股份有限公司製)100份與CORONET L(日本聚尿烷股份有限公司製)1份之混合物等為佳。For example, it is preferred to use a mixture with 100 parts of Unitek 17-806 (manufactured by Dainippon Ink Co., Ltd.) and 1 part of CORONET L (manufactured by Nippon Polyurethane Co., Ltd.).

作為紫外線硬化型聚酯丙烯酸酯系樹脂,一般可舉出將聚酯多元醇與2-羥基乙基丙烯酸酯、2-羥基丙烯酸酯系單體進行反應而容易形成者,可使用特開昭59-151112號公報所記載者。The ultraviolet curable polyester acrylate-based resin is generally formed by reacting a polyester polyol with a 2-hydroxyethyl acrylate or a 2-hydroxy acrylate monomer, and can be easily formed. - 151112.

作為紫外線硬化型環氧基丙烯酸酯系樹脂之具體例,可舉出將環氧基丙烯酸酯作為寡聚物,於此添加反應性稀釋劑、光聚合啟始劑,並使其反應後所生成者,可使用如特開平1-105738號公報所記載者。Specific examples of the ultraviolet curable epoxy acrylate-based resin include an epoxy acrylate as an oligomer, and a reactive diluent and a photopolymerization initiator are added thereto and reacted. For example, those described in Japanese Laid-Open Patent Publication No. Hei 1-105738 can be used.

作為紫外線硬化型多元醇丙烯酸酯系樹脂之具體例,可舉出三羥甲基丙烷三丙烯酸酯、二三羥甲基丙烷四丙烯 酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯、烷基改性二季戊四醇五丙烯酸酯等。Specific examples of the ultraviolet curable polyol acrylate resin include trimethylolpropane triacrylate and ditrimethylolpropane tetrapropene. An acid ester, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, alkyl-modified dipentaerythritol pentaacrylate, and the like.

作為這些紫外線硬化性樹脂之光聚合啟始劑,具體可舉出苯並異及其衍生物、乙醯苯、二苯甲酮、羥基二苯甲酮、米希勒酮、α-胺肟酯、噻噸酮等及彼等之衍生物。可同時使用光增感劑。上述光聚合啟始劑亦可作為光增感劑使用。又,環氧基丙烯酸酯系光聚合啟始劑之使用時,可使用n-丁胺、三乙胺、三-n-丁基膦等增感劑。使用於紫外線硬化樹脂組成物之光聚合啟始劑或光增感劑對於該組成物100質量份而言為0.1~15質量份,較佳為1~10質量份。Specific examples of the photopolymerization initiator of these ultraviolet curable resins include benzo and its derivatives, acetophenone, benzophenone, hydroxybenzophenone, michelone, and α-amine oxime ester. , thioxanthone, etc. and their derivatives. A photosensitizer can be used at the same time. The above photopolymerization initiator can also be used as a photosensitizer. Further, in the case of using an epoxy acrylate-based photopolymerization initiator, a sensitizer such as n-butylamine, triethylamine or tri-n-butylphosphine can be used. The photopolymerization initiator or the photosensitizer used in the ultraviolet curable resin composition is 0.1 to 15 parts by mass, preferably 1 to 10 parts by mass, per 100 parts by mass of the composition.

作為樹脂單體,例如作為不飽和雙鍵為其中一單體時,可舉出甲基丙烯酸酯、乙基丙烯酸酯、丁基丙烯酸酯、苯甲基丙烯酸酯、環己基丙烯酸酯、乙酸乙烯酯、苯乙烯等一般單體。又作為具有2個以上不飽和雙鍵之單體,可舉出乙二醇二丙烯酸酯、丙二醇二丙烯酸酯、二乙烯苯、1,4-環己烷二丙烯酸酯、1,4-環己基二甲基二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、季戊四醇四丙烯酯等。作為販賣品可利用AdekoptomerKR.BY系列:KR-400、KR-410、KR-550、KR-566、KR-567、BY-320B(旭電化股份有限公司製);KoeihardA-101-KK、A-101-WS、C-302、C-401-N、C-501、M-101、M-102、T-102、D-102、NS-101、FT-102Q8、MAG-1-P20、AG-106、M-101-C(廣榮化學股份有限公司製);SecabeamPHC2210(S)、PHC X-9( K-3)、PHC2213、DP-10、DP-20、DP-30、P1000、P1100、P1200、P1300、P1400、P1500、P1600、SCR900(大日精化工業股份有限公司製);KRM7033、KRM7039、KRM7130、KRM7131、UVECRYL29201、UVECRYL29202(DAICEL.UCB股份有限公司製);RC-5015、RC-5016、RC-5020、RC-5031、RC-5100、RC-5102、RC-5120、RC-5122、RC-5152、RC-5171、RC-5180、RC-5181(大日本墨水化學工業股份有限公司製);歐雷克斯No.340克力亞(中國塗料股份有限公司製);山拉多H-601、RC-750、RC-700、RC-600、RC-500、RC-611、RC-612(三洋化成工業股份有限公司製);SP-1509、SP-1507(昭和高分子股份有限公司製);RCC-15C(Graee Japan股份有限公司製)、亞羅尼克斯M-6100、M-8030、M-8060(東亞合成股份有限公司製)NK酯A-DOG、NK酯A-IBD-2E(新中村化學工業股份有限公司製)等適宜選擇者。又,作為具體化合物例子,可舉出三羥甲基丙烷三丙烯酸酯、二三羥甲基丙烷四丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯、二噁烷二醇丙烯酸酯、乙氧基化丙烯酸酯、烷基改性二季戊四醇五丙烯酸酯等。As the resin monomer, for example, when the unsaturated double bond is one of the monomers, methacrylate, ethacrylate, butyl acrylate, benzyl acrylate, cyclohexyl acrylate, vinyl acetate may be mentioned. , general monomers such as styrene. Further, examples of the monomer having two or more unsaturated double bonds include ethylene glycol diacrylate, propylene glycol diacrylate, divinylbenzene, 1,4-cyclohexane diacrylate, and 1,4-cyclohexyl group. Dimethyl diacrylate, trimethylolpropane triacrylate, pentaerythritol tetrapropenyl ester, and the like. AdekoptomerKR is available as a vending product. BY series: KR-400, KR-410, KR-550, KR-566, KR-567, BY-320B (made by Asahi Denki Co., Ltd.); Koeihard A-101-KK, A-101-WS, C-302 , C-401-N, C-501, M-101, M-102, T-102, D-102, NS-101, FT-102Q8, MAG-1-P20, AG-106, M-101-C (produced by Guangrong Chemical Co., Ltd.); SecabeamPHC2210(S), PHC X-9 ( K-3), PHC2213, DP-10, DP-20, DP-30, P1000, P1100, P1200, P1300, P1400, P1500, P1600, SCR900 (made by Dairi Seiki Co., Ltd.); KRM7033, KRM7039, KRM7130 , KRM7131, UVECRYL29201, UVECRYL29202 (manufactured by DAICEL.UCB Co., Ltd.); RC-5015, RC-5016, RC-5020, RC-5031, RC-5100, RC-5102, RC-5120, RC-5122, RC- 5152, RC-5171, RC-5180, RC-5181 (made by Dainippon Ink Chemical Industry Co., Ltd.); Orex No. 340 Kelly (manufactured by China National Paint Co., Ltd.); Shan Lado H-601 , RC-750, RC-700, RC-600, RC-500, RC-611, RC-612 (made by Sanyo Chemical Industry Co., Ltd.); SP-1509, SP-1507 (made by Showa Polymer Co., Ltd.) ; RCC-15C (manufactured by Graee Japan Co., Ltd.), Jalonix M-6100, M-8030, M-8060 (manufactured by Toagosei Co., Ltd.) NK ester A-DOG, NK ester A-IBD-2E ( New Nakamura Chemical Industry Co., Ltd.) and other suitable candidates. Further, examples of specific compounds include trimethylolpropane triacrylate, ditrimethylolpropane tetraacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, and dioxanediol. Acrylate, ethoxylated acrylate, alkyl-modified dipentaerythritol pentaacrylate, and the like.

又,硬化樹脂層中欲調整耐傷性、潤滑性或或折射率可含有無機化合物或有機化合物之微粒子。Further, in the cured resin layer, fine particles having an inorganic compound or an organic compound may be contained in order to adjust the scratch resistance, lubricity, or refractive index.

作為無機微粒子,可舉出氧化矽、氧化鈦、氧化鋁、氧化錫、氧化銦、ITO、氧化鋅、氧化鋯、氧化鎂、碳酸 鈣、碳酸鈣、滑石、黏土、燒成陶土、燒成矽酸鈣、水和矽酸鈣、矽酸鋁、矽酸鎂及磷酸鈣。特別使用氧化矽、氧化鈦、氧化鋁、氧化鋯、氧化鎂等為佳。作為有機粒子可添加聚甲基丙烯酸甲基丙烯酸酯樹脂粉末、丙烯基苯乙烯系樹脂粉末、聚甲基甲基丙烯酸酯樹脂粉末、矽系樹脂粉末、聚苯乙烯系樹脂粉末、聚碳酸酯樹脂粉末、苯並鳥糞胺系樹脂粉末、三聚氰胺系樹脂粉末、聚烯烴系樹脂粉末、聚酯系樹脂粉末、聚醯胺系樹脂粉末、聚醯亞胺系樹脂粉末、或聚氟化乙烯系樹脂粉末等。較佳微粒子可舉出交聯聚苯乙烯粒子(例如,綜研化學製SX-130H、SX-200H、SX-350H)、聚甲基甲基丙烯酸酯系粒子(例如,綜研化學製MX150、MX300)。Examples of the inorganic fine particles include cerium oxide, titanium oxide, aluminum oxide, tin oxide, indium oxide, ITO, zinc oxide, zirconium oxide, magnesium oxide, and carbonic acid. Calcium, calcium carbonate, talc, clay, fired clay, calcined calcium citrate, water and calcium citrate, aluminum citrate, magnesium citrate and calcium phosphate. In particular, cerium oxide, titanium oxide, aluminum oxide, zirconium oxide, magnesium oxide or the like is preferably used. Polymethacrylic acid methacrylate resin powder, acryl styrene resin powder, polymethyl methacrylate resin powder, oxime resin powder, polystyrene resin powder, polycarbonate resin may be added as the organic particles. Powder, benzoguanamine resin powder, melamine resin powder, polyolefin resin powder, polyester resin powder, polyamine resin powder, polyamidene resin powder, or polyvinyl fluoride resin Powder, etc. Preferred examples of the fine particles include crosslinked polystyrene particles (for example, SX-130H, SX-200H, and SX-350H manufactured by Soken Chemical Co., Ltd.) and polymethyl methacrylate-based particles (for example, MX150 and MX300 manufactured by Zaken Chemical Co., Ltd.). .

其他可使用含氟丙烯酸樹脂粒子。作為含氟丙烯酸樹脂粒子,例如由含氟之丙烯酸酯或甲基丙烯酸酯之單體或聚合物所形成之粒子。含氟之丙烯酸酯或甲基丙烯酸酯的具體例,可舉出1H,1H,3H-四氟丙基(甲基)丙烯酸酯、1H,1H,5H-八氟戊基(甲基)丙烯酸酯、1H,1H,7H-十二氟庚基(甲基)丙烯酸酯、1H,1H,9H-十六氟壬基(甲基)丙烯酸酯、2,2,2-三氟乙基(甲基)丙烯酸酯、2,2,3,3,3-五氟丙基(甲基)丙烯酸酯、2-(全氟丁基)乙基(甲基)丙烯酸酯、2-(全氟己基)乙基(甲基)丙烯酸酯、2-(全氟辛基)乙基(甲基)丙烯酸酯、2-全氟癸基乙基(甲基)丙烯酸酯、3-全氟丁基-2-羥基丙基(甲基)丙烯酸酯、3-全氟己基-2-羥基丙基(甲基)丙烯酸酯、3-全氟辛 基-2-羥基丙基(甲基)丙烯酸酯、2-(全氟-3-甲基丁基)乙基(甲基)丙烯酸酯、2-(全氟-5-甲基己基)乙基(甲基)丙烯酸酯、2-(全氟-7-甲基辛基)乙基(甲基)丙烯酸酯、3-(全氟-3-甲基丁基-2-羥基丙基(甲基)丙烯酸酯、3-(全氟-5-甲基己基)-2-羥基丙基(甲基)丙烯酸酯、3-(全氟-7-甲基辛基)-2-羥基丙基(甲基)丙烯酸酯、1H-1-(三氟甲基)三氟乙基(甲基)丙烯酸酯、1H,1H,3H-六氟丁基(甲基)丙烯酸酯、三氟乙基甲基丙烯酸酯、四氟丙基甲基丙烯酸酯、全氟辛基乙基丙烯酸酯、2-(全氟丁基)乙基-α-氟丙烯酸酯。又,含氟丙烯酸樹脂粒子之中亦以2-(全氟丁基)乙基-α-氟丙烯酸酯所成之粒子、含氟聚甲基甲基丙烯酸酯粒子、含氟甲基丙烯酸於交聯劑存在下與乙烯單體進行共聚合之粒子為佳,更佳為含氟聚甲基甲基丙烯酸酯粒子。Other fluorine-containing acrylic resin particles can be used. As the fluorine-containing acrylic resin particles, for example, particles formed of a monomer or polymer of a fluorine-containing acrylate or methacrylate. Specific examples of the fluorine-containing acrylate or methacrylate include 1H, 1H, 3H-tetrafluoropropyl (meth) acrylate, 1H, 1H, 5H-octafluoropentyl (meth) acrylate. ,1H,1H,7H-dodecafluoroheptyl (meth) acrylate, 1H, 1H, 9H-hexadecafluorodecyl (meth) acrylate, 2,2,2-trifluoroethyl (methyl Acrylate, 2,2,3,3,3-pentafluoropropyl (meth) acrylate, 2-(perfluorobutyl)ethyl (meth) acrylate, 2-(perfluorohexyl) (meth) acrylate, 2-(perfluorooctyl)ethyl (meth) acrylate, 2-perfluorodecylethyl (meth) acrylate, 3-perfluorobutyl-2-hydroxyl Propyl (meth) acrylate, 3-perfluorohexyl-2-hydroxypropyl (meth) acrylate, 3-perfluorooctyl 2-hydroxypropyl (meth) acrylate, 2-(perfluoro-3-methylbutyl)ethyl (meth) acrylate, 2-(perfluoro-5-methylhexyl)ethyl (Meth) acrylate, 2-(perfluoro-7-methyloctyl)ethyl (meth) acrylate, 3-(perfluoro-3-methylbutyl-2-hydroxypropyl (methyl) Acrylate, 3-(perfluoro-5-methylhexyl)-2-hydroxypropyl (meth) acrylate, 3-(perfluoro-7-methyloctyl)-2-hydroxypropyl (A) Acrylate, 1H-1-(trifluoromethyl)trifluoroethyl (meth) acrylate, 1H, 1H, 3H-hexafluorobutyl (meth) acrylate, trifluoroethyl methacrylate Ester, tetrafluoropropyl methacrylate, perfluorooctylethyl acrylate, 2-(perfluorobutyl)ethyl-α-fluoroacrylate. Also, the fluorine-containing acrylic resin particles are also 2- Particles formed of (perfluorobutyl)ethyl-α-fluoroacrylate, fluorine-containing polymethyl methacrylate particles, and fluorine-containing methacrylic acid copolymerized with ethylene monomer in the presence of a crosslinking agent More preferably, it is a fluorine-containing polymethyl methacrylate particle.

作為可與含氟(甲基)丙烯酸共聚合之乙烯單體,僅為具有乙烯基者即可,具體可舉出甲基丙烯酸甲酯、甲基丙烯酸丁酯等甲基丙烯酸烷酯、丙烯酸甲酯、丙烯酸乙酯等丙烯酸烷酯、及苯乙烯、α-甲基苯乙烯等苯乙烯類等,這些可單獨或混合後使用。作為於聚合反應時所使用的交聯劑,並無特別限定,可使用具有2個以上之不飽和基者為佳,例如可舉出乙二醇二甲基丙烯酸酯、聚乙二醇二甲基丙烯酸酯等2官能性二甲基丙烯酸酯、或三羥甲基丙烷三甲基丙烯酸酯、二乙烯苯等。The vinyl monomer copolymerizable with the fluorine-containing (meth)acrylic acid may be a vinyl group alone, and specifically, an alkyl methacrylate such as methyl methacrylate or butyl methacrylate or an acrylic acid may be mentioned. An alkyl acrylate such as an ester or ethyl acrylate, or a styrene such as styrene or α-methyl styrene may be used singly or in combination. The crosslinking agent to be used in the polymerization reaction is not particularly limited, and those having two or more unsaturated groups are preferably used, and examples thereof include ethylene glycol dimethacrylate and polyethylene glycol. A bifunctional dimethacrylate such as a acrylate or trimethylolpropane trimethacrylate or divinylbenzene.

且,欲製造含氟聚甲基甲基丙烯酸酯粒子時的聚合反 應,可為隨機共聚合及嵌段共聚合之任一。具體可舉出例如特開2000-169658號公報所記載的方法等。Moreover, the polymerization reaction when producing fluorine-containing polymethyl methacrylate particles It should be any of random copolymerization and block copolymerization. Specifically, for example, the method described in JP-A-2000-169658 and the like can be mentioned.

作為販賣品,可舉出根上工業製:MF-0043等販賣品。且,這些含氟丙烯酸樹脂粒子可單獨使用,亦可組合2種以上使用。又,這些含氟丙烯酸樹脂粒子之狀態可為粉體或乳膠等任意狀態下添加。As a sales item, a commercial product such as MF-0043 can be cited. Further, these fluorine-containing acrylic resin particles may be used singly or in combination of two or more. Further, the state of these fluorine-containing acrylic resin particles may be added in any state such as a powder or a latex.

又,亦可使用特開2004-83707號公報之段落0028~0055所記載的含氟交聯粒子。Further, the fluorine-containing crosslinked particles described in paragraphs 0028 to 0055 of JP-A-2004-83707 can also be used.

又,粒子之折射率以1.45~1.70時為佳,較佳為1.45~1.65。且,粒子的折射率係由改變折射率相異的2種溶劑的混合比下使折射率產生變化之溶劑中將粒子做等量分散後測定其濁度,濁度變極小時之溶劑的折射率以阿貝折射計進行測定而測得。Further, the refractive index of the particles is preferably from 1.45 to 1.70, preferably from 1.45 to 1.65. Further, the refractive index of the particles is determined by dispersing the particles in a solvent having a change in refractive index at a mixing ratio of two kinds of solvents having different refractive indexes, and then measuring the turbidity of the particles, and refracting the solvent having a very small turbidity. The rate was measured by an Abbe refractometer.

上述粒子之含有量對於上述樹脂100質量份而言,以1質量份~30質量份為佳。The content of the above particles is preferably from 1 part by mass to 30 parts by mass per 100 parts by mass of the above resin.

作為這些微粒子之平均粒徑以0.01~5μm為佳,0.1~5.0μm為較佳,0.1~4.0μm為更佳,將此添加於形成硬塗佈層之塗佈組成物時由組成物安定性來看為佳。The average particle diameter of these fine particles is preferably 0.01 to 5 μm, more preferably 0.1 to 5.0 μm, still more preferably 0.1 to 4.0 μm, and the composition is stabilized by the composition added to the coating composition for forming the hard coating layer. It is better to look at it.

又,亦可含有粒徑相異的2種以上微粒子。紫外線硬化性樹脂與微粒子之比率對於樹脂100質量份而言,添加至0.1~30質量份時為佳。Further, two or more kinds of fine particles having different particle diameters may be contained. The ratio of the ultraviolet curable resin to the fine particles is preferably from 0.1 to 30 parts by mass based on 100 parts by mass of the resin.

又,硬塗佈層可使用凹版塗佈機、浸漬塗佈機、逆塗佈機、線圈棒塗佈機、塑模塗佈機、噴射法等公知方法,塗佈形成硬塗佈層之塗佈組成物,塗佈後進行加熱乾燥, 經UV硬化處理後而形成。塗佈量以濕膜厚為0.1~40μm者為佳,較佳為0.5~30μm。又,作為乾膜厚以平均膜厚為0.1~30μm,較佳為1~20μm。Further, the hard coat layer can be applied by coating a hard coat layer by a known method such as a gravure coater, a dip coater, a reverse coater, a coil bar coater, a die coater, or a spray method. The cloth composition is heated and dried after coating. It is formed by UV hardening treatment. The coating amount is preferably from 0.1 to 40 μm in wet film thickness, preferably from 0.5 to 30 μm. Further, the dry film thickness has an average film thickness of 0.1 to 30 μm, preferably 1 to 20 μm.

作為UV硬化處理之光源,僅可產生紫外線之光源即可並無限定。例如,可使用低壓水銀燈、中壓水銀燈、高壓水銀燈、超高壓水銀燈、碳極電弧燈、金屬鹵素燈、氙氣燈等。照射條件依各燈而相異,但活性線之照射量一般為5~500mJ/cm2 ,較佳為5~150mJ/cm2 ,特佳為20~100mJ/em2As a light source for the UV curing treatment, a light source that can generate only ultraviolet light is not limited. For example, a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a carbon arc lamp, a metal halide lamp, a xenon lamp, or the like can be used. The irradiation conditions differ depending on the respective lamps, but the irradiation amount of the active rays is generally 5 to 500 mJ/cm 2 , preferably 5 to 150 mJ/cm 2 , and particularly preferably 20 to 100 mJ/cm 2 .

又,照射活性線時,於薄膜之搬送方向賦予張力下進行為佳,更佳為於寬方向賦予張力下進行。所賦予之張力以30~300N/m為佳。賦予張力之方法並無特別限定,亦可於背輥上於搬送方向賦予張力,或以拉幅器於寬方向、或2軸方向上賦予張力。藉此可得到平面性更優良之薄膜。Further, when the active wire is irradiated, it is preferable to apply tension in the direction in which the film is conveyed, and it is more preferable to apply tension in the width direction. The tension imparted is preferably 30 to 300 N/m. The method of imparting the tension is not particularly limited, and the tension may be applied to the back roller in the conveying direction, or the tensioner may be applied in the width direction or the two-axis direction. Thereby, a film having better planarity can be obtained.

硬塗佈層所形成之塗佈組成物中可含有溶劑。作為含於塗佈組成物之有機溶劑,例如可舉出烴類(甲苯、二甲苯)、醇類(甲醇、乙醇、異丙醇、丁醇、環己醇)、酮類(丙酮、甲基乙基酮、甲基異丁基酮)、酯類(乙酸甲酯、乙酸乙酯、乳酸甲酯)、二醇醚類,亦可適宜地選自其他有機溶劑、或這些混合物。The coating composition formed of the hard coat layer may contain a solvent. Examples of the organic solvent to be contained in the coating composition include hydrocarbons (toluene, xylene), alcohols (methanol, ethanol, isopropanol, butanol, cyclohexanol), and ketones (acetone, methyl group). Ethyl ketone, methyl isobutyl ketone), esters (methyl acetate, ethyl acetate, methyl lactate), glycol ethers, may also be suitably selected from other organic solvents, or mixtures thereof.

作為有機溶劑,以丙二醇單烷醚(烷基之碳原子數為1~4)或丙二醇單烷醚乙酸酯(烷基之碳原子數為1~4)等為佳。又,作為有機溶劑之含有量為塗佈組成物中5~ 80質量%者為佳。The organic solvent is preferably propylene glycol monoalkyl ether (alkyl group having 1 to 4 carbon atoms) or propylene glycol monoalkyl ether acetate (alkyl group having 1 to 4 carbon atoms). Further, the content of the organic solvent is 5~ in the coating composition. 80% by mass is preferred.

硬塗佈層為JIS B 0601所規定之中心線平均粗度(Ra)為0.001~0.1μm之透明硬塗佈層、或添加微粒子等之Ra調整為0.1~1μm之防眩性硬塗佈層為佳。中心線平均粗度(Ra)係以光干渉式之表面粗度測定器進行測定為佳,例如可使用WYKO公司製非接觸表面微細形狀計測裝置「WYKO NT-2000」進行測定。The hard coat layer is a transparent hard coat layer having a center line average roughness (Ra) of 0.001 to 0.1 μm as defined in JIS B 0601, or an anti-glare hard coat layer having an Ra adjusted to 0.1 to 1 μm, such as fine particles. It is better. The center line average roughness (Ra) is preferably measured by a light dry type surface roughness measuring device, and can be measured, for example, by using a non-contact surface fine shape measuring device "WYKO NT-2000" manufactured by WYKO Co., Ltd.

且,硬塗佈層中可含有低折射率層所記載之上述聚矽氧烷系界面活性劑或聚氧醚化合物為佳。欲提高這些塗佈性,對於塗佈液中之固體成分成分而言,添加0.01~3質量%範圍之這些成分為佳。Further, the hard coat layer may preferably contain the above-mentioned polyoxyalkylene-based surfactant or polyoxyether compound described in the low refractive index layer. In order to improve the coating property, it is preferred to add the components in the range of 0.01 to 3% by mass to the solid component in the coating liquid.

作為聚氧醚化合物,例如可舉出聚環氧乙烷烷醚、聚環氧乙烷月桂基醚、聚環氧乙烷十六烷基醚、聚環氧乙烷硬脂醯醚等聚環氧乙烷烷醚化合物、聚環氧乙烷壬基苯醚、聚環氧乙烷辛基苯醚等聚氧烷基苯醚化合物、聚氧伸烷基烷醚、聚環氧乙烷高級醇類醚、聚環氧乙烷辛基月桂基醚等。作為聚環氧乙烷烷醚之販賣品,可舉出EMULGEN 1108、EMULGEN 1118S-70(以上,花王公司製),作為聚環氧乙烷月桂基醚之販賣品,可舉出EMULGEN 103、EMULGEN 104P、EMULGEN 105、EMULGEN 106、EMULGEN 108、EMULGEN 109P、EMULGEN 120、EMULGEN 123P、EMULGEN 147、EMULGEN 150、EMULGEN 130K(以上,花王公司製),作為聚環氧乙烷十六烷基醚之販賣品,可舉出EMULGEN 210P、 EMULGEN 220(以上,花王公司製),作為聚環氧乙烷硬脂醯醚之販賣品,可舉出EMULGEN 220、EMULGEN 306P(以上,花王公司製),作為聚氧伸烷基烷醚之販賣品,可舉出EMULGEN LS-106、EMULGEN LS-110、EMULGEN LS-114、EMULGEN MS-110(以上,花王公司製),作為聚環氧乙烷高級醇類醚之販賣品,可舉出EMULGEN 705,EMULGEN 707、EMULGEN 709等。Examples of the polyoxy ether compound include polyepoxides such as polyethylene oxide alkyl ether, polyethylene oxide lauryl ether, polyethylene oxide cetyl ether, and polyethylene oxide stearyl ether. a polyoxyalkyl phenyl ether compound such as an oxyethane alkyl ether compound, a polyethylene oxide nonyl phenyl ether or a polyethylene oxide octyl phenyl ether; a polyoxyalkylene alkyl ether; a polyethylene oxide higher alcohol Ethers, polyethylene oxide octyl lauryl ether, and the like. EMULGEN 1108, EMULGEN 1118S-70 (above, Kao Corporation), and as a commercial product of polyethylene oxide lauryl ether, EMULGEN 103, EMULGEN are mentioned as a commercial item of the polyethylene oxide alkyl ether. 104P, EMULGEN 105, EMULGEN 106, EMULGEN 108, EMULGEN 109P, EMULGEN 120, EMULGEN 123P, EMULGEN 147, EMULGEN 150, EMULGEN 130K (above, Kao Corporation), as a sale of polyethylene oxide cetyl ether , EMULGEN 210P, EMULGEN 220 (above, Kao Corporation), as a sales item of polyethylene oxide stearyl ether, EMULGEN 220, EMULGEN 306P (above, Kao Corporation), as a polyoxyalkylene ether EMULGEN LS-106, EMULGEN LS-110, EMULGEN LS-114, EMULGEN MS-110 (above, Kao Corporation), as a commercial product of polyethylene oxide higher alcohol ether, EMULGEN 705, EMULGEN 707, EMULGEN 709, and the like.

這些非離子性的聚氧醚化合物之中較佳者為聚環氧乙烷油基醚化合物,下述一般式(6)所示之化合物。Among these nonionic polyoxyether compounds, preferred are polyethylene oxide oleyl ether compounds, and compounds represented by the following general formula (6).

C18 H35 -O(C2 H4 O)nH………(6) 式中,n表示2~40。C 18 H 35 -O(C 2 H 4 O)nH (6) wherein n represents 2 to 40.

對於油基部分之環氧乙烷的平均加成個數(n)為2~40,較佳為2~10。又,一般式(6)之化合物係由環氧乙烷與油醇進行反應而得。The average number of additions (n) of the ethylene oxide in the oil-based portion is 2 to 40, preferably 2 to 10. Further, the compound of the general formula (6) is obtained by reacting ethylene oxide with oleyl alcohol.

作為具體商品,可舉出EMULGEN 404[聚環氧乙烷(4)油基醚]、EMULGEN 408[聚環氧乙烷(8)油基醚]、EMULGEN 409P[聚環氧乙烷(9)油基醚]、EMULGEN 420[聚環氧乙烷(13)油基醚]、EMULGEN 430[聚環氧乙烷(30)油基醚](以上,花王公司製)、日本油脂製NOFABLEEAO-9905(聚環氧乙烷(5)油基醚)等。Specific products include EMULGEN 404 [polyethylene oxide (4) oleyl ether], EMULGEN 408 [polyethylene oxide (8) oleyl ether], and EMULGEN 409P [polyethylene oxide (9). Oleic ether], EMULGEN 420 [polyethylene oxide (13) oleyl ether], EMULGEN 430 [polyethylene oxide (30) oleyl ether] (above, Kao Corporation), NOFABLEEAO-9905 (polyethylene oxide (5) oleyl ether) and the like.

且( )表示n之數字。非離子性的聚氧醚化合物可單獨或2種以上併用。And ( ) represents the number of n. The nonionic polyoxyether compound may be used alone or in combination of two or more.

聚矽氧烷界面活性劑與聚氧醚化合物之硬塗佈層中含有質量比為1.0:1.0~0.10:1.0,更佳為0.70:1.0~0.20:1.0,以前述質量比下含有係可得到本發明之效果故較佳。The mass ratio of the polyoxonane surfactant to the hard coat layer of the polyoxyether compound is 1.0:1.0 to 0.10:1.0, more preferably 0.70:1.0 to 0.20:1.0, and the system can be obtained by the above mass ratio. The effects of the present invention are preferred.

硬塗佈層中之非離子性的聚氧醚化合物與聚矽氧烷界面活性劑之較佳含有量為兩者總含有量下0.1質量%~8.0質量%為佳,更佳為、0.2質量%~4.0質量%,以該範圍下添加時可使硬塗佈層於安定下存在。The preferred content of the nonionic polyoxyether compound and the polyoxyalkylene surfactant in the hard coat layer is preferably 0.1% by mass to 8.0% by mass, more preferably 0.2% by mass. %~4.0% by mass, when added in this range, the hard coat layer can be present under stability.

又,亦可併用上述氟界面活性劑、丙烯酸系共聚合物、乙炔二醇系化合物或非離子性界面活性劑、自由基聚合性之非離子性界面活性劑等。Further, the above-mentioned fluorine surfactant, acrylic copolymer, acetylene glycol compound, nonionic surfactant, or radically polymerizable nonionic surfactant may be used in combination.

作為非離子性界面活性劑,可舉出聚環氧乙烷單月桂酸酯、聚環氧乙烷單硬脂酸酯、聚環氧乙烷單油脂酸酯等聚氧烷酯化合物、山梨醇酐單月桂酸酯、山梨醇酐單硬脂酸酯、山梨醇酐單油脂酸酯等山梨醇酐酯化合物等。Examples of the nonionic surfactant include polyoxyalkyl ester compounds such as polyethylene oxide monolaurate, polyethylene oxide monostearate, and polyethylene oxide monooleate, and sorbitol. A sorbitan ester compound such as anhydride monolaurate, sorbitan monostearate or sorbitan monooleate.

作為乙炔二醇系化合物,可舉出Surfynol 104E、Surfynol 104PA、Surfynol 420、Surfynol 440、Dinol 604(以上,日信化學工業股份有限公司製)等。Examples of the acetylene glycol-based compound include Surfynol 104E, Surfynol 104PA, Surfynol 420, Surfynol 440, Dinol 604 (above, manufactured by Nissin Chemical Industry Co., Ltd.), and the like.

作為自由基聚合性之非離子性界面活性劑,例如可舉出「RMA-564」、「RMA-568」、「RMA-1114」[以上,商品名、日本乳化劑股份有限公司製]等聚氧伸烷基烷基苯醚(甲基)丙烯酸酯系聚合性界面活性劑等。Examples of the radically polymerizable nonionic surfactant include "RMA-564", "RMA-568", and "RMA-1114" (above, trade name, manufactured by Japan Emulsifier Co., Ltd.). An alkylene alkyl phenyl ether (meth) acrylate-based polymerizable surfactant or the like.

其他亦可含有氟樹脂。作為氟樹脂,可使用將矽氧烷(含聚矽氧烷)及/或有機矽氧烷(含有機聚矽氧烷)藉 由接枝化等使其共聚合所得之聚合物為佳。具體可舉出富士化成工業股份有限公司製之ZX-022H、ZX-007C、ZX-049、ZX-047-D等。這些化合物可混合後使用。Others may also contain a fluororesin. As the fluororesin, a deuterium oxide (containing polyoxyalkylene oxide) and/or an organic germanium alkane (containing organic polyoxyalkylene) can be used. The polymer obtained by copolymerization by grafting or the like is preferred. Specific examples include ZX-022H, ZX-007C, ZX-049, and ZX-047-D manufactured by Fuji Chemical Industry Co., Ltd. These compounds can be used after mixing.

又,硬塗佈層可具有2層以上之重層結構。其中1層,例如為含有導電性微粒子、共軛系導電性聚合物、或離子性聚合物之所謂防靜電層,又作為對於種種之顯示元件的色補正用過濾器,可含有具有色調調整功能之色調調整劑(染料或顏料等),又亦可使其含有電磁波遮斷劑或紅外線吸收劑等而具有種種功能。Further, the hard coat layer may have a double layer structure of two or more layers. One of the layers is, for example, a so-called antistatic layer containing conductive fine particles, a conjugated conductive polymer, or an ionic polymer, and may be used as a color correction filter for various display elements, and may have a color tone adjustment function. The color tone adjusting agent (dye, pigment, etc.) may have various functions including an electromagnetic wave blocking agent or an infrared ray absorbing agent.

作為π共軛系導電性聚合物,僅使用主鏈為π共軛系所構成之有機高分子即可。例如可舉出,聚噻吩類、聚吡咯類、聚苯胺類、聚苯類、聚乙炔類、聚苯伸乙烯類、多並苯(polyacene)類、聚噻吩伸乙烯類、及這些共聚物。由聚合容易度、安定性點來看以聚噻吩類、聚苯胺類、聚乙炔類為佳。As the π-conjugated conductive polymer, only an organic polymer having a main chain of a π-conjugated system may be used. For example, polythiophenes, polypyrroles, polyanilines, polyphenylenes, polyacetylenes, polyphenylene vinyls, polyacenes, polythiophene ethylene, and these copolymers are mentioned. From the viewpoint of easiness of polymerization and stability, polythiophenes, polyanilines, and polyacetylenes are preferred.

作為離子性化合物,可舉出咪唑鎓系、吡啶鎓系、脂環式胺系、脂肪族胺系、脂肪族鏻系陽離子與BF4 、PF6 等無機離子系、CF3 SO2 、(CF3 SO2 )2 N 、CF3 CO2 等氟系陰離子所成之化合物等。Examples of the ionic compound include an imidazolium system, a pyridinium system, an alicyclic amine system, an aliphatic amine system, an aliphatic lanthanoid cation, an inorganic ion such as BF 4 - or PF 6 - , and CF 3 SO 2 - a compound of a fluorine-based anion such as (CF 3 SO 2 ) 2 N - or CF 3 CO 2 - .

上述之共軛系導電性聚合物、離子性化合物為,作為硬塗佈層形成用塗佈組成物之固體成分濃度為0.01質量%以上,未達50質量%時可於組成物中安定存在故較佳。又,上述共軛系導電性聚合物、離子性化合物可添加於前述高折射率層。The conjugated conductive polymer or the ionic compound is a solid content concentration of the coating composition for forming a hard coat layer of 0.01% by mass or more, and may be stabilized in the composition when it is less than 50% by mass. Preferably. Further, the conjugated conductive polymer or the ionic compound may be added to the high refractive index layer.

(背塗佈層)(back coating layer)

本發明的防反射薄膜中,設有成為透明基材之纖維素酯薄膜的活性能量線硬化樹脂層的反面上設有背塗佈層時為佳。背塗佈層為,欲矯正設有活性能量線硬化樹脂層或其他層所產生的捲曲而設置者。即,將設有背塗佈層之面成為內側並使其具有彎曲之性質下可平衡彎曲情況。且,背塗佈層較佳為塗佈設置成可兼具結塊防止層,此時,背塗佈層塗佈組成物中可添加具有結塊防止功能之微粒子為佳。In the antireflection film of the present invention, it is preferred to provide a back coat layer on the reverse side of the active energy ray-curable resin layer which is a cellulose ester film which is a transparent substrate. The back coating layer is provided to correct the curl generated by the active energy ray-curable resin layer or other layers. That is, the surface on which the back coating layer is provided is made to have an inner side and has a curved property to balance the bending. Further, the back coating layer is preferably coated so as to have an agglomeration preventing layer. In this case, fine particles having a blocking preventing function may be added to the back coating layer coating composition.

作為添加於背塗佈層之微粒子的無機化合物例子,可舉出二氧化矽、二氧化鈦、氧化鋁、氧化鋯、碳酸鈣、碳酸鈣、滑石、黏土、燒成陶土、燒成矽酸鈣、氧化錫、氧化銦、氧化鋅、ITO、水和矽酸鈣、矽酸鋁、矽酸鎂及磷酸鈣。微粒子為含有矽者因霧值較低而較佳,特別以二氧化矽為佳。Examples of the inorganic compound to be added to the fine particles of the back coating layer include ceria, titania, alumina, zirconia, calcium carbonate, calcium carbonate, talc, clay, calcined clay, calcined calcium citrate, and oxidation. Tin, indium oxide, zinc oxide, ITO, water and calcium citrate, aluminum citrate, magnesium citrate and calcium phosphate. The microparticles are preferred because they have a low haze value, especially cerium oxide.

這些微粒子,例如可使用AerosilR972、R972V、R974、R812、200、200V、300、R202、OX50、TT600(以上日本Aerosil(股)製)之商品名。氧化鋯之微粒子,例如可使用AerosilR976及R811(以上日本Aerosil(股)製)之商品名。As the fine particles, for example, trade names of Aerosil R972, R972V, R974, R812, 200, 200V, 300, R202, OX50, TT600 (manufactured by Japan Aerosil Co., Ltd.) can be used. As the fine particles of zirconia, for example, the trade names of Aerosil R976 and R811 (manufactured by Japan Aerosil Co., Ltd.) can be used.

作為聚合物之例子,可舉出聚矽氧烷樹脂、氟樹脂及丙烯基樹脂。以聚矽氧烷樹脂為佳,特別為具有三次元的網狀結構者為佳,例如可舉出Tospearl 103、同105、同 108、同120、同145、同3120及同240(以上東芝聚矽氧烷(股)製)之商品名。Examples of the polymer include a polyoxyalkylene resin, a fluororesin, and a propylene-based resin. Preferably, the polyoxyalkylene resin is used, and particularly preferably a network structure having a three-dimensional structure, for example, Tospearl 103, the same 105, and the same 108. Trade names of the same 120, the same 145, the same 3120 and the same 240 (above the Toshiba polyoxane (stock) system).

其中以Aerosil200V、AerosilR972V可保持較低霧值,而具有結塊防止效果,故為特佳。本發明所使用的防反射薄膜為,活性能量線硬化樹脂層之裏面側的動摩擦係數為0.9以下,特別以0.1~0.9者為佳。Among them, Aerosil 200V and Aerosil R972V are particularly preferable because they can maintain a low haze value and have a caking prevention effect. The antireflection film used in the present invention has a dynamic friction coefficient of 0.9 or less on the back side of the active energy ray-curable resin layer, and particularly preferably 0.1 to 0.9.

含於背塗佈層之微粒子,對於膠黏劑而言以0.1~50質量%為佳,0.1~10質量%為較佳。設有背塗佈層時的霧值之增加以1%以下為佳,0.5%以下為較佳,0.0~0.1%為特佳。The fine particles contained in the back coating layer are preferably 0.1 to 50% by mass, and preferably 0.1 to 10% by mass, based on the adhesive. The increase in the haze value when the back coating layer is provided is preferably 1% or less, preferably 0.5% or less, and particularly preferably 0.0 to 0.1%.

作為使用於背塗佈層之塗佈的溶劑,例如可舉出二噁烷、丙酮、甲基乙基酮、甲基異丁基酮、N,N-二甲基甲醯胺、乙酸甲酯、乙酸乙酯、三氯伸乙基、二氯甲烷、伸乙基氯化物、四氯乙烷、三氯乙烷、氯仿、水、甲醇、乙醇、n-丙醇、i-丙醇、n-丁醇、環己酮、環己醇、丙二醇單甲醚、丙二醇單乙醚、或烴類(甲苯、二甲苯)等,亦可適宜地組合彼等後使用。Examples of the solvent used for the coating of the back coating layer include dioxane, acetone, methyl ethyl ketone, methyl isobutyl ketone, N,N-dimethylformamide, and methyl acetate. , ethyl acetate, trichloroethylene, methylene chloride, ethyl chloride, tetrachloroethane, trichloroethane, chloroform, water, methanol, ethanol, n-propanol, i-propanol, n - Butanol, cyclohexanone, cyclohexanol, propylene glycol monomethyl ether, propylene glycol monoethyl ether, or hydrocarbons (toluene, xylene), etc., may be used in combination as appropriate.

作為背塗佈層之膠黏劑所使用的樹脂,例如可舉出氯化乙烯-乙酸乙烯酯共聚物、氯化乙烯樹脂、乙酸乙烯酯樹脂、乙酸乙烯酯與乙烯醇類的共聚物、部分水解的氯化乙烯-乙酸乙烯酯共聚物、氯化乙烯-氯化亞乙烯共聚物、氯化乙烯-丙烯醯基共聚物、乙烯乙烯醇類共聚物、氯化聚氯化乙烯、乙烯-氯化乙烯共聚物、乙烯-乙酸乙烯酯共聚物等乙烯系聚合體或共聚物、硝基纖維素、纖維素乙酸 酯丙酸酯(較佳為乙醯基取代度1.8~2.3、丙醯基取代度0.1~1.0)、二乙醯基纖維素、纖維素乙酸酯丁酸酯樹脂等纖維素衍生物、馬來酸及/或丙烯酸的共聚物、丙烯酸酯共聚物、丙烯醯基-苯乙烯共聚物、氯化聚乙烯、丙烯醯基-氯化聚乙烯苯乙烯共聚物、甲基甲基丙烯酸酯-丁二烯苯乙烯共聚物、丙烯酸樹脂、聚乙烯醇樹脂、聚乙烯縮醛樹脂、聚乙烯丁縮醛樹脂、尿烷樹脂、聚酯聚尿烷樹脂、聚醚聚尿烷樹脂、聚碳酸酯聚尿烷樹脂、聚酯樹脂、聚醚樹脂、聚醯胺樹脂、胺基樹脂、苯乙烯丁二烯樹脂、丁二烯丙烯醯基樹脂等橡膠系樹脂、聚矽氧烷系樹脂、氟系樹脂等,但未限定於此。Examples of the resin used as the adhesive of the back coating layer include a vinyl chloride-vinyl acetate copolymer, a vinyl chloride resin, a vinyl acetate resin, a copolymer of vinyl acetate and a vinyl alcohol, and a part. Hydrolyzed chlorinated ethylene-vinyl acetate copolymer, chlorinated ethylene-vinylidene copolymer, chlorinated ethylene-propylene fluorenyl copolymer, ethylene vinyl alcohol copolymer, chlorinated polyvinyl chloride, ethylene-chlorine Ethylene copolymer, ethylene-vinyl acetate copolymer, etc., ethylene-based polymer or copolymer, nitrocellulose, cellulose acetate Ester propionate (preferably having an acetyl group substitution degree of 1.8 to 2.3, a propyl ketone substitution degree of 0.1 to 1.0), a cellulose derivative such as a diacetyl cellulose or a cellulose acetate butyrate resin, or a horse Copolymer of acid and/or acrylic acid, acrylate copolymer, acrylonitrile-styrene copolymer, chlorinated polyethylene, acrylonitrile-chlorinated polyethylene styrene copolymer, methyl methacrylate-butyl Diene styrene copolymer, acrylic resin, polyvinyl alcohol resin, polyvinyl acetal resin, polyvinyl butyral resin, urethane resin, polyester polyurethane resin, polyether polyurethane resin, polycarbonate poly Rubber resin such as urethane resin, polyester resin, polyether resin, polyamide resin, amine resin, styrene butadiene resin, butadiene acryl resin, polyoxyalkylene resin, fluorine resin Etc., but not limited to this.

例如,作為丙烯酸樹脂可舉出ACRYPETMD、VH、MF、V(三菱Rayon股份有限公司製)、亥巴錄M-4003、M-4005、M-4006、M-4202、M-5000、M-5001、M-4501(根上工業股份有限公司製)、台亞那路BR-50、BR-52、BR-53、BR-60、BR-64、BR-73、BR-75、BR-77、BR-79、BR-80、BR-82、BR-83、BR-85、BR-87、BR-88、BR-90、BR-93、BR-95、BR-100、BR-101、BR-102、BR-105、BR-106、BR-107、BR-108、BR-112、BR-113、BR-115、BR-116、BR-117、BR-118等(三菱Rayon股份有限公司製)之丙烯基及甲基丙烯酸系單體作為原料所製造之各種均聚物以及共聚物等商品,可由此適宜地選出較佳者。For example, ACRYPETMD, VH, MF, V (manufactured by Mitsubishi Rayon Co., Ltd.), Hiba M-4003, M-4005, M-4006, M-4202, M-5000, and M-5001 can be cited as the acrylic resin. , M-4501 (made by Gensei Industrial Co., Ltd.), Taiana Road BR-50, BR-52, BR-53, BR-60, BR-64, BR-73, BR-75, BR-77, BR -79, BR-80, BR-82, BR-83, BR-85, BR-87, BR-88, BR-90, BR-93, BR-95, BR-100, BR-101, BR-102 , BR-105, BR-106, BR-107, BR-108, BR-112, BR-113, BR-115, BR-116, BR-117, BR-118, etc. (Mitsubishi Rayon Co., Ltd.) Commercially available products such as various homopolymers and copolymers produced by using a propylene group and a methacrylic monomer as a raw material can be suitably selected as appropriate.

例如,作為膠黏劑所使用的樹脂,以使用纖維素二乙 酸酯、纖維素乙酸酯丙烯酸酯等纖維素酯與丙烯酸樹脂之摻合物為佳,使用由丙烯酸樹脂所成之微粒子,使其成為微粒子與膠黏劑之折射率差為未達0~0.02之透明性高的背塗佈層。For example, the resin used as an adhesive to use cellulose 2 A blend of a cellulose ester such as an acid ester or a cellulose acetate acrylate and an acrylic resin is preferred, and a fine particle formed of an acrylic resin is used to make the refractive index difference between the fine particles and the adhesive less than 0~ 0.02 high back coating layer with high transparency.

將這些塗佈組成物使用凹版塗佈機、浸漬塗佈機、逆塗佈機、線圈棒-塗佈機、塑模塗佈機、或噴霧塗佈、噴射塗佈等,於透明樹脂薄膜的表面上塗佈至濕膜厚1~100μm為佳,特佳為5~30μm。These coating compositions are used in a transparent resin film using a gravure coater, a dip coater, a reverse coater, a coil bar-coater, a die coater, or a spray coating, a spray coating, or the like. The surface is applied to a wet film thickness of preferably 1 to 100 μm, particularly preferably 5 to 30 μm.

又,塗佈後進行加熱乾燥,視必要藉由硬化處理,可形成背塗佈層。硬化處理可使用低折射率層所記載之內容。Further, after coating, heat drying is performed, and if necessary, a back coating layer can be formed by a hardening treatment. The hardening treatment can use the contents described in the low refractive index layer.

背塗佈層可分為2次以上進行塗佈。背塗佈層因可改善與偏光子之黏著性而亦可兼具易黏著層。The back coating layer can be applied in two or more stages. The back coating layer may also have an easy adhesion layer because it can improve the adhesion to the polarizer.

如上述各層藉由塗佈而形成時,透明樹脂薄膜可於寬度1.4~4m下捲取成輥狀之狀態而重複進行,進行上述塗佈,並進行乾燥.硬化處理後,捲取成輥狀為佳。又,層合防反射層後,捲成輥狀之狀態下進行50~160℃之加熱處理的製造方法而製造,由將防反射薄膜進行長尺塗佈時的效率性或安定性來看較佳。加熱處理期間可藉由所設定之溫度做適宜決定,例如於50℃下,較佳為進行3天以上未達30天之期間,160℃下10分鐘以上,1天以下之範圍為佳。一般欲使捲外部、捲中央部、捲芯部的加熱處理效果不會偏差,設定於較低溫度為佳,於50~60℃附近進行7天程度者為佳。When the above layers are formed by coating, the transparent resin film can be repeatedly wound up in a roll shape at a width of 1.4 to 4 m, and the above coating is carried out and dried. After the hardening treatment, it is preferable to roll into a roll shape. Further, after the antireflection layer is laminated, it is produced by a production method in which a heat treatment at 50 to 160 ° C is performed in a roll form, and the efficiency or stability when the antireflection film is applied to a long length is compared. good. The heat treatment period can be appropriately determined by the set temperature. For example, at 50 ° C, it is preferable to carry out the period of 3 days or more and less than 30 days, and the temperature of 160 ° C for 10 minutes or more, preferably 1 day or less. Generally, it is preferable that the heat treatment effect of the outer portion of the roll, the center portion of the roll, and the core portion of the roll does not vary, and it is preferably set at a lower temperature, and it is preferably carried out at a temperature of about 50 to 60 ° C for 7 days.

欲使加熱處理於安定下進行,必須於溫濕度可調整之場所進行,於無灰塵之無塵等加熱處理室下進行為佳。In order to allow the heat treatment to be carried out under stability, it is preferably carried out in a place where the temperature and humidity can be adjusted, and it is preferably carried out in a heat treatment chamber such as dust-free and dust-free.

將防反射薄膜捲取成輥狀時,作為捲核心,僅為圓筒上之的核心即可,可為任種材質,但較佳為中空塑質核心,作為塑質材料以可耐住加熱處理溫度之耐熱性塑質即可,可舉出酚樹脂、二甲苯樹脂、三聚氰胺樹脂、聚酯樹脂、環氧基樹脂等樹脂。又,藉由玻璃纖維等填充材之經強化熱硬化性樹脂為佳。對於這些捲核心之捲數,以100捲以上為佳,500捲以上為更佳,捲厚以5cm以上為佳When the anti-reflection film is wound into a roll shape, the core of the roll may be only the core on the cylinder, and may be any material, but is preferably a hollow plastic core, which is resistant to heating as a plastic material. The heat-resistant plastic material of the treatment temperature may be a resin such as a phenol resin, a xylene resin, a melamine resin, a polyester resin or an epoxy resin. Further, it is preferred to use a reinforced thermosetting resin such as a glass fiber. For the number of volumes of these volume cores, preferably 100 rolls or more, more preferably 500 rolls or more, and the roll thickness is preferably 5 cm or more.

(防反射薄膜之反射率)(reflectance of anti-reflection film)

本發明的防眩性抗反射薄膜之反射率可藉由分光光度計進行測定。此時,試品測定側之裏面經粗面化處理後,使用黑色噴霧進行光吸收處理後,測定可見光區(400~700nm)之反射光。The reflectance of the anti-glare antireflection film of the present invention can be measured by a spectrophotometer. At this time, the inside of the sample measurement side was subjected to roughening treatment, and then light absorption treatment was performed using a black spray, and then the reflected light in the visible light region (400 to 700 nm) was measured.

由得到使用於LCD等影像顯示裝置最表面時的較佳外光反射防止功能之觀點來看,反射率越低越佳,可見光區之波長中的平均值反射率(以下僅稱為反射率)以2.5%以下為佳,最低反射率以1.5%以下較佳。又,更佳為反射率為1.5%以下,最低反射率為1.0%以下。且,反射率若為2.5%以下時可作為本發明之防反射薄膜。From the viewpoint of obtaining a preferable external light reflection preventing function for use on the outermost surface of an image display device such as an LCD, the lower the reflectance, the better the average reflectance in the wavelength of the visible light region (hereinafter simply referred to as reflectance). It is preferably 2.5% or less, and the lowest reflectance is preferably 1.5% or less. Further, it is more preferable that the reflectance is 1.5% or less and the minimum reflectance is 1.0% or less. Further, when the reflectance is 2.5% or less, it can be used as the antireflection film of the present invention.

可見光的波長區中,具有平坦形狀之反射光譜為佳。In the wavelength region of visible light, a reflection spectrum having a flat shape is preferred.

又,施予抗反射處理之顯示裝置表面的反射色相,因防反射膜之設計上可見光區中的短波長區或長波長區之反 射率較高,故多半染成紅或藍色,但反射光之色調依用途而有不同要求,使用於薄型電視等最表面時,被要求為自然色調。Moreover, the reflected hue of the surface of the display device subjected to the anti-reflection treatment is reversed by the design of the anti-reflection film in the short-wavelength region or the long-wavelength region in the visible region. The rate of incidence is high, so most of them are dyed red or blue, but the color of the reflected light has different requirements depending on the application. When used on the outermost surface of a thin TV, it is required to be a natural color.

此場合,一般較佳反射色相範圍為XYZ表色系(CIE1931表色系)上,0.17≦x≦0.27、0.07≦y≦0.17。In this case, it is generally preferred that the range of the reflected hue is on the XYZ color system (CIE 1931 color system), 0.17 ≦ x ≦ 0.27, 0.07 ≦ y ≦ 0.17.

高折射率層與低折射率層之膜厚為考慮到各層之折射率所造成的反射率、反射光之色調,可依據常法進行計算求得。The film thickness of the high refractive index layer and the low refractive index layer is a reflection ratio of the refractive index of each layer in consideration of the refractive index of each layer, and can be calculated by a usual method.

於塗佈各層前進行表面處理為佳。作為表面處理方法,可舉出洗淨法、鹼處理法、面電漿處理法、高頻率放電電漿法、電子束法、離子束法、濺射法、酸處理、電暈處理法、大氣壓發光放電電漿法等。It is preferred to carry out surface treatment before coating each layer. Examples of the surface treatment method include a washing method, an alkali treatment method, a surface plasma treatment method, a high frequency discharge plasma method, an electron beam method, an ion beam method, a sputtering method, an acid treatment, a corona treatment method, and an atmospheric pressure. Luminous discharge plasma method, etc.

所謂電暈處理為,大氣壓下,電極間外加1kV以上高電壓,使其放電下進行之處理,可使用春日電機股份有限公司或股份有限公司Toyo電機等販賣的裝置進行。電暈放電處理之強度為,取決於電極間距離、每單位面積之輸出、發生器之頻率數。In the corona treatment, a high voltage of 1 kV or more is applied between the electrodes under atmospheric pressure, and the treatment is performed under discharge, and it can be carried out using a device sold by Kasuga Electric Co., Ltd. or Toyo Electric Co., Ltd. The intensity of the corona discharge treatment is determined by the distance between the electrodes, the output per unit area, and the frequency of the generator.

電暈處理裝置的一方電極(A電極)可使用販賣品,但材質可選自鋁、不鏽鋼等。另一方為要包住塑質薄膜的電極(B電極),且欲使電暈處理可安定且均勻下實施的對於A電極之一定距離上所設置之輥電極。此亦可使用一般購得者,材質為鋁、不鏽鋼、及彼等金屬所製作之輥上可使陶瓷、聚矽氧烷、EPT橡膠、海普龍橡膠等作為裏襯(lining)之輥為佳。A commercially available product may be used for one electrode (A electrode) of the corona treatment device, but the material may be selected from aluminum, stainless steel, or the like. The other is an electrode (B electrode) to enclose the plastic film, and the roller electrode to be placed at a certain distance from the A electrode to be stabilized and uniformly performed by the corona treatment. This can also be used as a lining roller for ceramics, polyoxyalkylene, EPT rubber, Heplon rubber, etc., which are made of aluminum, stainless steel, and other metals. good.

使用於電暈處理之頻率數為20kHz以上100kHz以下之頻率數,以30~60kHz之頻率數為佳。頻率數降低時,電暈處理之均一性會劣化,而產生電暈處理不均。又,頻率數過大時,進行高輸出之電暈處理時,雖無特別問題,但實施低輸出之電暈處理時,難以進行安定之處理,結果會產生處理不均。The frequency used for the corona treatment is a frequency of 20 kHz or more and 100 kHz or less, and preferably a frequency of 30 to 60 kHz. When the frequency is lowered, the uniformity of the corona treatment is deteriorated, and corona treatment is uneven. Further, when the number of frequencies is too large, there is no particular problem in performing corona treatment with high output. However, when corona treatment with low output is performed, it is difficult to perform stable treatment, and as a result, processing unevenness occurs.

電暈處理的輸出為1~5W.min./m2 ,以2~4W.min./m2 之輸出為佳。電極與薄膜之距離為5~50mm,但較佳為10~35mm。間隙過開時,欲維持一定輸出而必須要高電壓,容易產生不均。又,間隙過於狹隘時,外加電壓會過低,而容易產生不均。且,搬運薄膜進行連續處理時,電極上會接觸到薄膜而產生擦傷。The output of corona treatment is 1~5W. Min./m 2 to 2~4W. min./m output 2 of the preferred. The distance between the electrode and the film is 5 to 50 mm, but preferably 10 to 35 mm. When the gap is too open, it is necessary to maintain a certain output and a high voltage is required, which tends to cause unevenness. Moreover, when the gap is too narrow, the applied voltage is too low, and unevenness is likely to occur. Further, when the film is continuously processed, the film is in contact with the film to cause scratches.

又,作為大氣壓電漿處理、常壓電漿處理等電漿處理,可參考例如特開2004-352777號公報、特開2004-352777號公報、特開2007-314707號公報等所揭示的電漿處理技術。Further, as a plasma treatment such as an atmospheric piezoelectric slurry treatment or a normal piezoelectric slurry treatment, for example, the plasma disclosed in JP-A-2004-352777, JP-A-2004-352777, JP-A-2007-314707, and the like can be referred to. Processing technology.

又,作為處理裝置,可使用積水化學工業公司製之常壓電漿處理裝置的AP-T系列等。Further, as the processing device, an AP-T series or the like of a normal piezoelectric slurry processing apparatus manufactured by Sekisui Chemical Co., Ltd. can be used.

作為鹼處理方法,將硬塗佈層經塗佈設置的薄膜浸漬於鹼水溶液之方法即可,並無特別限定。The alkali treatment method is not particularly limited as long as the film coated with the hard coat layer is immersed in an aqueous alkali solution.

作為鹼水溶液,可使用氫氧化鈉水溶液、氫氧化鉀水溶液、氨水溶液等,其中以氫氧化鈉水溶液為佳。As the aqueous alkali solution, an aqueous sodium hydroxide solution, an aqueous potassium hydroxide solution, an aqueous ammonia solution or the like can be used, and among them, an aqueous sodium hydroxide solution is preferred.

鹼水溶液之鹼濃度,例如氫氧化鈉濃度以0.1~25質量%為佳,0.5~15質量%為較佳。鹼處理溫度一般為10 ~80℃,較佳為20~60℃。The alkali concentration of the aqueous alkali solution, for example, the sodium hydroxide concentration is preferably 0.1 to 25% by mass, and preferably 0.5 to 15% by mass. The alkali treatment temperature is generally 10 ~80 ° C, preferably 20 to 60 ° C.

鹼處理時間為5秒~5分鐘,較佳為30秒~3分鐘。鹼處理後之薄膜以酸性水中和後,以水充分洗淨為佳。The alkali treatment time is from 5 seconds to 5 minutes, preferably from 30 seconds to 3 minutes. After the alkali-treated film is neutralized with acidic water, it is preferably washed with water.

(透明樹脂薄膜)(transparent resin film)

對於本發明所使用的透明樹脂薄膜所成之透明薄膜基材做說明。A transparent film substrate made of a transparent resin film used in the present invention will be described.

作為透明薄膜基材,可舉出製造容易、與活性線硬化型樹脂層之黏著性良好、其為光學各向同性、光學透明等較佳要件。Examples of the transparent film substrate include those which are easy to manufacture, have good adhesion to the active wire-curable resin layer, and are optically isotropic and optically transparent.

其中所謂透明為,可見光透過率60%以上者,較佳為80%以上,特佳為90%以上。The transparent portion is preferably a light transmittance of 60% or more, preferably 80% or more, and particularly preferably 90% or more.

僅具有上述性質者即可,並無特別限定,例如可舉出纖維素二乙酸酯薄膜、纖維素三乙酸酯薄膜、纖維素乙酸酯丙酸酯薄膜、纖維素乙酸酯丁酸酯薄膜等纖維素酯系薄膜、聚酯系薄膜、聚碳酸酯系薄膜、聚丙烯酸酯系薄膜、聚碸(亦含有聚醚碸)系薄膜、聚乙烯對苯二甲酸酯、聚乙烯萘酸酯等聚酯薄膜、聚乙烯薄膜、聚丙烯薄膜、玻璃紙、聚氯化亞乙烯薄膜、聚乙烯醇薄膜、伸乙基乙烯醇類薄膜、間規(syndiotactic)聚苯乙烯系薄膜、環烯烴聚合物薄膜(亞頓(JSR公司製)、ZEONEX、ZEONOA(以上,日本ZEON公司製))、聚乙烯縮醛、聚甲基戊烯薄膜、聚醚酮薄膜、聚醚酮亞胺薄膜、聚醯胺薄膜、氟樹脂薄膜、尼龍薄膜、聚甲基甲基丙烯酸酯薄膜、丙烯基薄膜 或玻璃板等。The above properties are not particularly limited, and examples thereof include a cellulose diacetate film, a cellulose triacetate film, a cellulose acetate propionate film, and cellulose acetate butyric acid. A cellulose ester film such as an ester film, a polyester film, a polycarbonate film, a polyacrylate film, a polyfluorene (also containing a polyether oxime) film, polyethylene terephthalate, and polyethylene naphthalene. Polyester film such as acid ester, polyethylene film, polypropylene film, cellophane, polyvinyl chloride film, polyvinyl alcohol film, ethyl vinyl alcohol film, syndiotactic polystyrene film, cycloolefin Polymer film (Alton (manufactured by JSR), ZEONEX, ZEONOA (above, manufactured by Zeon Corporation, Japan), polyvinyl acetal, polymethylpentene film, polyether ketone film, polyether ketimide film, poly Indole film, fluororesin film, nylon film, polymethyl methacrylate film, acryl film Or glass plates, etc.

其中,以纖維素酯系薄膜、聚碳酸酯系薄膜、聚碸(含聚醚碸)系薄膜、環烯烴聚合物薄膜為佳,本發明中,特別以纖維素酯系薄膜(例如,Konicaminolta tak、製品名KC8UX、KC4UX、KC5UX、KC8UCR3、KC8UCR4、KC8UCR5、KC8UY、KC4UY、KC4UE、KC12UR(以上,Konicaminolta opt股份有限公司製)由製造上、成本面、透明性、黏著性等觀點來看為佳。Among them, a cellulose ester-based film, a polycarbonate-based film, a polyfluorene-containing (polyether-containing) film, and a cycloolefin polymer film are preferred. In the present invention, a cellulose ester-based film (for example, Konicaminolta tak) is particularly preferable. Product name KC8UX, KC4UX, KC5UX, KC8UCR3, KC8UCR4, KC8UCR5, KC8UY, KC4UY, KC4UE, KC12UR (above, manufactured by Konicaminolta opt Co., Ltd.) is preferable from the viewpoints of manufacturing, cost, transparency, adhesion, etc. .

這些薄膜可為熔融流延製膜所製造之薄膜、或由溶液流延製膜所製造之薄膜。These films may be films produced by melt casting film formation or films produced by solution casting film formation.

作為透明薄膜基材,使用纖維素酯系薄膜(以下亦稱為纖維素酯薄膜)為佳。作為纖維素酯,以纖維素乙酸酯、纖維素乙酸酯丁酸酯、纖維素乙酸酯丙酸酯為佳,其中亦以纖維素乙酸酯丁酸酯、纖維素乙酸酯酞酸酯、纖維素乙酸酯丙酸酯為較佳。As the transparent film substrate, a cellulose ester film (hereinafter also referred to as a cellulose ester film) is preferably used. As the cellulose ester, cellulose acetate, cellulose acetate butyrate, cellulose acetate propionate is preferred, and cellulose acetate butyrate and cellulose acetate are also used. The acid ester, cellulose acetate propionate is preferred.

特別為,乙醯基的取代度以X表示,丙醯基或丁醯基的取代度以Y表示時,使用X與Y為下述範圍之纖維素酯薄膜為較佳。In particular, the degree of substitution of the acetyl group is represented by X, and when the degree of substitution of the propyl group or the butyl group is represented by Y, it is preferred to use a cellulose ester film having X and Y in the following ranges.

2.3≦X+Y≦3.0 0.1≦Y≦2.02.3≦X+Y≦3.0 0.1≦Y≦2.0

特別以2.5≦X+Y≦2.9 3≦Y≦1.2時為佳。Especially when 2.5≦X+Y≦2.9 3≦Y≦1.2 is preferred.

以下,對於較佳透明樹脂薄膜之纖維素酯薄膜做詳細說明。Hereinafter, a cellulose ester film of a preferred transparent resin film will be described in detail.

纖維素酯薄膜為,欲得到熱處理所引起的基材變形較少,平面性優良的防反射薄膜,藉由陽電子消滅壽命法(Positron annihilation lifetime)所求得之自由體積半徑以0.250~0.310nm為佳。且,全自由體積參數為1.0~2.0之纖維素酯薄膜者為較佳。The cellulose ester film is an antireflection film having less deformation of the substrate and having excellent planarity due to heat treatment, and the free volume radius obtained by the Positron annihilation lifetime is 0.250 to 0.310 nm. good. Further, a cellulose ester film having a total free volume parameter of 1.0 to 2.0 is preferred.

且,所謂上述自由體積表示未佔據透明樹脂薄膜之分子鏈的空隙部分。此可使用陽電子消滅壽命法進行測定。具體為測定將陽電子射入於試料後至消滅的時間,由該消滅壽命可非破壞性下觀察到原子空孔或自由體積之尺寸、數濃度等相關情報。Further, the above free volume means a void portion of a molecular chain which does not occupy the transparent resin film. This can be measured using the positive electron elimination life method. Specifically, the time during which the positron is injected into the sample to the extinction is measured, and the information on the size and number concentration of the atomic pore or the free volume can be observed nondestructively from the erasing life.

(藉由陽電子消滅壽命法之自由體積半徑與全自由體積參數之測定)(Measurement of the free volume radius and the full free volume parameter by the positive electron elimination life method)

於下述測定條件下測定陽電子消滅壽命與相對強度。The cation lifetime and relative intensity were measured under the following measurement conditions.

(測定條件) 陽電子線源:22NaCl(強度1.85MBq)γ線檢測器:塑質製閃爍器+光電子增倍管裝置時間分解能:290ps測定溫度:23℃總計數:100萬計試料尺寸:20mm×15mm(measurement conditions) Yang electronic line source: 22NaCl (strength 1.85MBq) γ line detector: plastic scintillator + photoelectron multiplier tube device time decomposition energy: 290ps measurement temperature: 23 ° C total count: 1 million sample size: 20mm × 15mm

將切成20mm×15mm之試料切片作成20片重疊,其約2mm厚度。試料於測定前進行24小時真空乾燥。The sample piece cut into 20 mm × 15 mm was formed into 20 pieces of overlap, which was about 2 mm thick. The sample was vacuum dried for 24 hours before the measurement.

照射面積:約10mm每1通道之時間:23.3ps/chIrradiation area: about 10mm Time per channel: 23.3ps/ch

依據上述測定條件,實施陽電子消滅壽命測定,藉由非線形最小二乘法進行3成分解析,由消滅壽命較小者作為τ1 、τ2 、τ3 ,對應此將強度者作為I1 ,I2 ,I3 (I1 +I2 +I3 =100%)。According to the above measurement conditions, the positive electron elimination life measurement is performed, and the three-component analysis is performed by the nonlinear least squares method, and the one with the smaller lifetime is used as τ 1 , τ 2 , and τ 3 , and the intensity is taken as I 1 , I 2 , I 3 (I 1 +I 2 +I 3 =100%).

由最長壽命之平均消滅壽命τ3 ,求得使用下述式之自由體積半徑R3 (nm)。對應τ3 於空孔之陽電子消滅,可推測τ3 越大空孔尺寸越大。From the average lifetime τ 3 of the longest life, the free volume radius R 3 (nm) of the following formula was obtained. Corresponding to the positron electron elimination of τ 3 in the void, it is presumed that the larger the τ 3 is, the larger the pore size is.

τ3 =(1/2)[1-{R3 /(R3 +0.166)}+(1/2π)sin{2πR3 /(R3 +0.166)}]-1 其中,0.166(nm)相當於自空孔壁所浸出之電子層厚度。τ 3 =(1/2)[1-{R 3 /(R 3 +0.166)}+(1/2π)sin{2πR 3 /(R 3 +0.166)}]-1 where 0.166(nm ) equivalent to the thickness of the electron layer leached from the wall of the void.

且,全自由體積參數Vp 藉由下述式求得。Moreover, the full free volume parameter V p is obtained by the following equation.

V3 ={(4/3)π(R3 )3}(nm3 ) Vp =I3 (%)×V3 (nm3 ) 其中,I3 (%)相當於空孔之相對數濃度,故Vp 相當於相對空孔量。V 3 ={(4/3)π(R 3 )3}(nm 3 ) V p =I 3 (%)×V 3 (nm 3 ) where I 3 (%) corresponds to the relative concentration of the pores , so that V p corresponds to the relative amount of voids.

將以上測定重複2次,求得其平均值。The above measurement was repeated twice, and the average value was obtained.

陽電子消滅壽命法,例如MATERIAL STAGE vol.4, No.5 2004 p21-25、Toray Research Center THE TRC NEWS No.80(Jul.2002)p20-22、「分析」(1988,pp.ll-20)中記載「藉由陽電子消滅法之高分子自由體積的評估」,可參考此。Yang Electronics eliminates life methods, such as MATERIAL STAGE vol.4, No.5 2004 p21-25, Toray Research Center THE TRC NEWS No. 80 (Jul. 2002) p20-22, "Analysis" (1988, pp. 11-20), "The Freedom of Polymers by the Method of Elimination of Positive Electrons" For the evaluation of the volume, please refer to this.

纖維素酯薄膜中之自由體積半徑為0.250~0.315nm,較佳為0.250~0.310nm,更佳範圍為0.285~0.305nm。自由體積半徑未達0.250nm。自由體積半徑為0.250~0.315nm時,對於熱處理之基材變形較小,可得到平面性優良的防反射薄膜。The free volume radius in the cellulose ester film is 0.250 to 0.315 nm, preferably 0.250 to 0.310 nm, and more preferably 0.285 to 0.305 nm. The free volume radius is less than 0.250 nm. When the free volume radius is 0.250 to 0.315 nm, the substrate for heat treatment is less deformed, and an antireflection film excellent in planarity can be obtained.

作為形成纖維素酯薄膜之纖維素酯的原料,並無特別限定,可舉出綿花棉絨、木材紙漿(來自針葉樹,來自闊葉樹)、洋麻等。又這些所得之纖維素酯可由任意比率下混合使用。這些纖維素酯為,醯基化劑作為酸酐(乙酸酐、丙酸酐、丁酸酐)時,使用如乙酸之有機酸或二氯甲烷等有機溶劑,使用如硫酸之質子性觸媒與纖維素原料進行反應而得到。The raw material of the cellulose ester forming the cellulose ester film is not particularly limited, and examples thereof include cotton linters, wood pulp (from conifers, from broadleaf trees), and kenaf. Further, these obtained cellulose esters can be used in combination at any ratio. When the cellulose ester is an acid anhydride (acetic anhydride, propionic anhydride, butyric anhydride), an organic solvent such as acetic acid or an organic solvent such as dichloromethane is used, and a protonic catalyst such as sulfuric acid and a cellulose raw material are used. It is obtained by carrying out a reaction.

醯基化劑為酸氯化物(CH3 COCl、C2 H5 COCl、C3 H7 COCl)之情況時,作為觸媒可使用如胺之鹼性化合物進行反應。具體可參考特開平10-45804號公報所記載的方法等進行合成。When the thiolating agent is an acid chloride (CH 3 COCl, C 2 H 5 COCl, C 3 H 7 COCl), the reaction can be carried out using a basic compound such as an amine as a catalyst. Specifically, the synthesis can be carried out by referring to the method described in JP-A-10-45804.

又,纖維素酯為,配合各取代度混合上述醯基化劑量而進行反應者,纖維素酯中這些醯基化劑與纖維素分子之羥基進行反應。纖維素分子為葡萄糖單位為多數連結者所成,葡萄糖單位上有3個羥基。於該3個羥基上醯基被衍 生之數目稱為取代度(莫耳%)。例如,例如纖維素三乙酸酯為,葡萄糖單位之3個羥基皆與乙醯基結合(實際上為2.6~3.0)。Further, the cellulose ester is reacted by mixing the above-mentioned thiolation amount with each degree of substitution, and the thiolation agent in the cellulose ester reacts with the hydroxyl group of the cellulose molecule. The cellulose molecule is formed by a majority of the glucose unit and has three hydroxyl groups on the glucose unit. The thiol group is derived from the three hydroxyl groups The number of births is called the degree of substitution (% of moles). For example, for example, cellulose triacetate is such that all three hydroxyl groups of the glucose unit are bound to the acetamidine group (actually 2.6 to 3.0).

醯基的取代度之測定方法可依據ASTM-D817-96之規定進行測定。The method for determining the degree of substitution of the thiol group can be determined in accordance with ASTM-D817-96.

纖維素酯之數平均分子量為50000~250000,成型時的機械性強度較強,且成為適度摻合黏度而較佳,更佳為80000~150000。The number average molecular weight of the cellulose ester is 50,000 to 250,000, and the mechanical strength at the time of molding is strong, and it is preferably a moderate blending viscosity, and more preferably 80,000 to 150,000.

纖維素酯薄膜為,可藉由一般稱為溶液流延製膜法,將纖維素酯溶解液(摻合),例如由無限地移送的無端金屬輸送帶或轉動的金屬轉筒之流延用支持體上,進行加壓塑模使摻合物流延(進行澆鑄)製膜的方法而製造。The cellulose ester film can be used for casting a cellulose ester solution (blending), for example, by an infinite metal transfer belt or a rotating metal drum, which is generally referred to as a solution casting film forming method. The support is produced by a method in which a compression molding is performed to cast a film by casting (casting).

作為使用於摻合調製的有機溶劑,可溶解纖維素酯,並具有適當沸點者為佳,例如可舉出二氯甲烷、乙酸甲酯、乙酸乙酯、乙酸戊基、乙醯乙酸甲酯、丙酮、四氫呋喃、1,3-二氧雜戊環、1,4-二噁烷、環己酮、甲酸乙酯、2,2,2-三氟乙醇、2,2,3,3-四氟-1-丙醇、1,3-二氟-2-丙醇、1,1,1,3,3,3-六氟-2-甲基-2-丙醇、1,1,1,3,3,3-六氟-2-丙醇、2,2,3,3,3-五氟-1-丙醇、硝基乙烷、1,3-二甲基-2-咪唑二酮等,但亦可舉出二氯甲烷等有機鹵化合物、二氧雜戊環衍生物、乙酸甲酯、乙酸乙酯、丙酮、乙醯乙酸甲酯等為佳有機溶劑(即,良溶劑)。As the organic solvent to be blended, it is preferred to dissolve the cellulose ester and have an appropriate boiling point, and examples thereof include dichloromethane, methyl acetate, ethyl acetate, amyl acetate, and ethyl acetate. Acetone, tetrahydrofuran, 1,3-dioxolane, 1,4-dioxane, cyclohexanone, ethyl formate, 2,2,2-trifluoroethanol, 2,2,3,3-tetrafluoro 1-propanol, 1,3-difluoro-2-propanol, 1,1,1,3,3,3-hexafluoro-2-methyl-2-propanol, 1,1,1,3 , 3,3-hexafluoro-2-propanol, 2,2,3,3,3-pentafluoro-1-propanol, nitroethane, 1,3-dimethyl-2-imidazolidone, etc. Further, an organic halogen compound such as dichloromethane, a dioxalane derivative, methyl acetate, ethyl acetate, acetone or methyl acetacetate may be mentioned as a preferred organic solvent (that is, a good solvent).

又,如下述製膜步驟所示,自溶劑蒸發步驟中於流延用支持體上所形成之織物(web)(摻合膜)乾燥溶劑時 ,由防止織物中之發泡的觀點來看,作為所使用的有機溶劑之沸點以30~80℃為佳,例如上述所記載的良溶劑之沸點為二氯甲烷(沸點40.4℃)、乙酸甲酯(沸點56.32℃)、丙酮(沸點56.3℃)、乙酸乙酯(沸點76.82℃)等。Further, as shown in the film forming step described below, when the solvent is dried from the web (blending film) formed on the casting support in the solvent evaporation step From the viewpoint of preventing foaming in the woven fabric, the boiling point of the organic solvent to be used is preferably from 30 to 80 ° C. For example, the boiling point of the good solvent described above is dichloromethane (boiling point: 40.4 ° C), and acetic acid Ester (boiling point 56.32 ° C), acetone (boiling point 56.3 ° C), ethyl acetate (boiling point 76.82 ° C) and the like.

上述良溶劑中,以具有優良溶解性之二氯甲烷或乙酸甲酯為佳。Among the above good solvents, dichloromethane or methyl acetate having excellent solubility is preferred.

上述有機溶劑以外,亦可含有0.1~40質量%之碳原子數1~4的醇類為佳。特佳為含有5~30質量%之上述醇類。In addition to the above organic solvent, it is preferred to contain 0.1 to 40% by mass of an alcohol having 1 to 4 carbon atoms. It is particularly preferred to contain 5 to 30% by mass of the above alcohol.

此為將摻合物於流延用支持體上進行流延後,溶劑開始蒸發的醇類比率變多時,織物(摻合膜)會凝膠化,織物可穩定地由流延用支持體進行剝離,作為凝膠化溶劑使用、或彼等比率較少時,可扮演促進非氯系有機溶劑的纖維素酯之溶解的角色。When the ratio of the alcohol in which the solvent starts to evaporate is increased after the blend is cast on the support for casting, the woven fabric (blend film) is gelated, and the fabric can be stably supported by the casting support. When peeling is carried out, it is used as a gelling solvent, or when the ratio is small, it can play a role which accelerates the dissolution of the cellulose ester of a non-chlorine-type organic solvent.

作為碳原子數1~4的醇類,可舉出甲醇、乙醇、n-丙醇、iso-丙醇、n-丁醇、sec-丁醇、tert-丁醇等。Examples of the alcohol having 1 to 4 carbon atoms include methanol, ethanol, n-propanol, iso-propanol, n-butanol, sec-butanol, and tert-butanol.

這些溶劑中,由摻合安定性佳、沸點亦較低、乾燥性亦佳、且無毒性等觀點來看,以乙醇為佳。較佳為使用對於二氯甲烷70~95質量%而言,含有乙醇5~30質量%之溶劑。取代二氯甲烷可使用乙酸甲酯。此時,可藉由冷卻溶解法調製出摻合物。Among these solvents, ethanol is preferred from the viewpoints of good blending stability, low boiling point, good drying property, and no toxicity. It is preferred to use a solvent containing 5 to 30% by mass of ethanol for 70 to 95% by mass of methylene chloride. Instead of dichloromethane, methyl acetate can be used. At this time, the blend can be prepared by a cooling dissolution method.

纖維素酯薄膜中可含有下述可塑劑者為佳。作為可塑劑,例如可使用磷酸酯系可塑劑、多元醇類酯系可塑劑、 鄰苯二甲酸酯系可塑劑、偏苯三酸酯系可塑劑、均苯四甲酸系可塑劑、乙醇酸酯系可塑劑、檸檬酸酯系可塑劑、聚酯系可塑劑、脂肪酸酯系可塑劑、多元羧酸酯系可塑劑等為佳。The cellulose ester film may preferably contain the following plasticizer. As the plasticizer, for example, a phosphate-based plasticizer, a polyol ester-based plasticizer, or the like can be used. Phthalate plasticizer, trimellitate plasticizer, pyromellitic plasticizer, glycolate plasticizer, citrate plasticizer, polyester plasticizer, fatty acid ester It is preferably a plasticizer, a polycarboxylic acid ester type plasticizer or the like.

其中,亦以多元醇類酯系可塑劑、鄰苯二甲酸酯系可塑劑、檸檬酸酯系可塑劑、脂肪酸酯系可塑劑、乙醇酸酯系可塑劑、多元羧酸酯系可塑劑等為佳。特別以使用多元醇類酯系可塑劑為佳,可安定地得到硬塗佈層之鉛筆硬度為4H以上者較佳。Among them, polyol ester-based plasticizers, phthalate-based plasticizers, citrate-based plasticizers, fatty acid ester-based plasticizers, glycolate-based plasticizers, and polycarboxylate-based plasticizers are also used. It is better. In particular, it is preferable to use a polyol ester-based plasticizer, and it is preferable to obtain a hard coating layer having a pencil hardness of 4H or more.

多元醇類酯系可塑劑為2價以上之脂肪族多元醇類與單羧酸之酯所成之可塑劑,分子內具有芳香環或環烷基環者為佳。較佳為2~20價之脂肪族多元醇類酯。The polyol ester-based plasticizer is a plasticizer composed of an ester of a divalent or higher aliphatic polyol and a monocarboxylic acid, and preferably has an aromatic ring or a cycloalkyl ring in the molecule. It is preferably an aliphatic polyol ester of 2 to 20 valence.

多元醇類如下一般式(7)所示。The polyols are represented by the following general formula (7).

R1 -(OH)n………(7) 式中,R1 表示n價有機基,n表示2以上之正整數,OH基表示醇類性、及/或酚性羥基。R 1 -(OH)n (7) wherein R 1 represents an n-valent organic group, n represents a positive integer of 2 or more, and OH group represents an alcoholic property and/or a phenolic hydroxyl group.

作為較佳多元醇類之例子,例如可舉出如以下者,但本發明並未限定於此。Examples of preferred polyhydric alcohols include, for example, the following, but the present invention is not limited thereto.

可舉出核糖醇、阿糖醇、乙二醇、二乙二醇、三乙二醇、四乙二醇、1,2-丙烷二醇、1,3-丙烷二醇、二丙二醇、三丙二醇、1,2-丁二醇、1,3-丁二醇、1,4-丁二醇、二丁二醇、1,2,4-丁三醇、1,5-戊二醇、1,6-己二醇、己三醇、 半乳糖醇、甘露糖醇、3-甲基戊烷-1,3,5-三醇、頻哪醇、山梨糖醇、三羥甲基丙烷、三羥甲基乙烷、木糖醇等。特別以三乙二醇、四乙二醇、二丙二醇、三丙二醇、山梨糖醇、三羥甲基丙烷、木糖醇為佳。Examples thereof include ribitol, arabitol, ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, 1,2-propanediol, 1,3-propanediol, dipropylene glycol, and tripropylene glycol. 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, dibutylene glycol, 1,2,4-butanetriol, 1,5-pentanediol, 1, 6-hexanediol, hexanetriol, Galactitol, mannitol, 3-methylpentane-1,3,5-triol, pinacol, sorbitol, trimethylolpropane, trimethylolethane, xylitol, and the like. Particularly preferred are triethylene glycol, tetraethylene glycol, dipropylene glycol, tripropylene glycol, sorbitol, trimethylolpropane, and xylitol.

作為使用於多元醇類酯之單羧酸,並無特別限定,可使用公知之脂肪族單羧酸、脂環族單羧酸、芳香族單羧酸等。使用脂環族單羧酸、芳香族單羧酸時可提高透濕性、保留性故較佳。The monocarboxylic acid to be used for the polyol ester is not particularly limited, and a known aliphatic monocarboxylic acid, alicyclic monocarboxylic acid, aromatic monocarboxylic acid or the like can be used. When an alicyclic monocarboxylic acid or an aromatic monocarboxylic acid is used, moisture permeability and retention are improved, which is preferable.

作為較佳單羧酸之例子,可舉出以下者,但本發明未限定於此。As an example of a preferable monocarboxylic acid, the following are mentioned, However, this invention is not limited to this.

作為脂肪族單羧酸,使用具有碳數1~32之直鏈或支鏈的脂肪酸為佳。碳數為1~20時為更佳,1~10時為為特佳。含有乙酸時,與纖維素酯之相溶性會增加而較佳,亦可混合乙酸與其他單羧酸後使用。As the aliphatic monocarboxylic acid, a linear or branched fatty acid having 1 to 32 carbon atoms is preferably used. It is better when the carbon number is 1 to 20, and it is particularly good when it is 1 to 10. When acetic acid is contained, the compatibility with the cellulose ester is increased, and it is preferable to use acetic acid and other monocarboxylic acids.

作為較佳脂肪族單羧酸,可舉出乙酸、丙酸、丁酸、戊酸、己酸、庚酸、辛酸、壬酸、癸酸、2-乙基-己烷酸、十一烷基酸、月桂酸、十三烷基酸、肉豆蔻酸、十五烷基酸、棕櫚酸、十七烷基酸、硬脂酸、十九烷基酸、花生酸、山萮酸、巴西棕櫚酸、蠟酸、二十七烷基酸、二十八烷基酸、三十烷基酸、三十二烷基酸等飽和脂肪酸、十一碳烯酸、油酸、山梨酸、亞油酸、亞麻酸、花生浸烯酸等不飽和脂肪酸等。Preferred examples of the aliphatic monocarboxylic acid include acetic acid, propionic acid, butyric acid, valeric acid, caproic acid, heptanoic acid, caprylic acid, capric acid, capric acid, 2-ethyl-hexane acid, and undecyl group. Acid, lauric acid, tridecyl acid, myristic acid, pentadecyl acid, palmitic acid, heptadecanoic acid, stearic acid, nonadecyl acid, arachidic acid, behenic acid, carnaubanic acid , waxy acid, heptadecyl acid, octadecanoic acid, tridecyl acid, tridecyl acid and other saturated fatty acids, undecylenic acid, oleic acid, sorbic acid, linoleic acid, Unsaturated fatty acids such as linolenic acid and arachidonic acid.

作為較佳脂環族單羧酸之例子,可舉出環戊烷羧酸、環己烷羧酸、環辛烷羧酸、或彼等衍生物。Examples of preferred alicyclic monocarboxylic acids include cyclopentanecarboxylic acid, cyclohexanecarboxylic acid, cyclooctanecarboxylic acid, and the like.

作為較佳芳香族單羧酸之例子,可舉出安息香酸、甲苯酸等安息香酸之苯環上導入1~3個的烷基、甲氧基或乙氧基等烷氧基者、具有2個以上的苯環之芳香族單羧酸、或彼等衍生物,特別以安息香酸為佳。Examples of the preferred aromatic monocarboxylic acid include those in which one to three alkyl groups such as benzoic acid and toluic acid are introduced into an alkyl group such as an alkyl group, a methoxy group or an ethoxy group. More than one aromatic monocarboxylic acid of the benzene ring, or a derivative thereof, particularly preferably benzoic acid.

多元醇類酯之分子量雖無特別限定,但以300~1500為佳,350~750為更佳。分子量越大,揮發越困難而不佳,由與透濕性、纖維素酯之相溶性的觀點來看以較小為佳。Although the molecular weight of the polyol ester is not particularly limited, it is preferably from 300 to 1,500, more preferably from 350 to 750. The larger the molecular weight, the more difficult it is to volatilize, and it is preferably smaller from the viewpoint of compatibility with moisture permeability and cellulose ester.

使用於多元醇類酯之羧酸可為1種類、或2種以上之混合亦可。又,多元醇類中之OH基可全部酯化、或一部份維持OH基。The carboxylic acid to be used in the polyol ester may be one type or a mixture of two or more types. Further, the OH groups in the polyols may be all esterified or partially maintained in the OH group.

以下例舉出多元醇類酯之具體化合物。Specific compounds of the polyol esters are exemplified below.

乙醇酸酯系可塑劑雖無特別限定,但以使用烷基鄰苯二醯基烷基乙醇酸酯類為佳。作為烷基鄰苯二醯基烷基乙醇酸酯類,例如可舉出甲基鄰苯二醯基甲基乙醇酸酯、乙基鄰苯二醯基乙基乙醇酸酯、丙基鄰苯二醯基丙基乙醇酸酯、丁基鄰苯二醯基丁基乙醇酸酯、辛基鄰苯二醯基辛基乙醇酸酯、甲基鄰苯二醯基乙基乙醇酸酯、乙基鄰苯二醯基甲基乙醇酸酯、乙基鄰苯二醯基丙基乙醇酸酯、甲基鄰苯二醯基丁基乙醇酸酯、乙基鄰苯二醯基丁基乙醇酸酯、丁基鄰苯二醯基甲基乙醇酸酯、丁基鄰苯二醯基乙基乙醇酸酯、丙基鄰苯二醯基丁基乙醇酸酯、丁基鄰苯二醯基丙基乙醇酸酯、甲基鄰苯二醯基辛基乙醇酸酯、乙基鄰苯二 醯基辛基乙醇酸酯、辛基鄰苯二醯基甲基乙醇酸酯、辛基鄰苯二醯基乙基乙醇酸酯等。The glycolate plasticizer is not particularly limited, but an alkylphthalic acid alkyl glycolate is preferably used. Examples of the alkylphthalic acid alkyl glycolate include methyl phthalyl methyl glycolate, ethyl phthalic acid ethyl glycolate, and propyl phthalate. Mercaptopropyl glycolate, butyl phthalyl butyl glycolate, octyl phthalyl octyl glycolate, methyl phthalyl ethyl glycolate, ethyl Benzoyl methyl glycolate, ethyl phthalyl propyl glycolate, methyl phthalyl butyl glycolate, ethyl phthalate butyl glycolate, butyl O-phthalyl methyl glycolate, butyl phthalyl ethyl glycolate, propyl phthalyl butyl glycolate, butyl phthalyl propyl glycolate Methylphthalic acid octyl glycolate, ethyl phthalate Mercaptooctyl glycolate, octyl phthalyl methyl glycolate, octyl phthalyl ethyl glycolate, and the like.

作為鄰苯二甲酸酯系可塑劑可舉出二乙基酞酸酯、二甲氧基乙基酞酸酯、二甲基酞酸酯、二辛基酞酸酯、二丁基酞酸酯、二-2-乙基己基酞酸酯、二辛基酞酸酯、二環己基酞酸酯、二環己基對苯二甲酸酯等。Examples of the phthalate-based plasticizer include diethyl phthalate, dimethoxyethyl phthalate, dimethyl phthalate, dioctyl phthalate, and dibutyl phthalate. , di-2-ethylhexyl phthalate, dioctyl phthalate, dicyclohexyl phthalate, dicyclohexyl terephthalate, and the like.

作為檸檬酸酯系可塑劑,可舉出檸檬酸乙醯基三甲基、檸檬酸乙醯基三乙基、檸檬酸乙醯基三丁基等。Examples of the citrate-based plasticizer include etidinyltrimethyl citrate, ethionyltriethyl citrate, and ethyltributyl citrate.

作為脂肪酸酯系可塑劑,可舉出油酸丁基、蓖麻醇酸甲基乙醯基、癸二酸二丁基等。Examples of the fatty acid ester-based plasticizer include oleic acid butyl group, ricinoleic acid methyl ethyl sulfonate group, and dibutyl sebacate.

亦可使用多元羧酸酯系可塑劑。具體為將特開2002-265639號公報之段落號碼[0015]~[0020]所記載的多元羧酸酯作為可塑劑之一而添加為佳。A polycarboxylic acid ester type plasticizer can also be used. Specifically, it is preferred to add the polyvalent carboxylate described in paragraphs [0015] to [0020] of JP-A-2002-265639 as one of plasticizers.

又,作為其他可塑劑,可使用磷酸酯系可塑劑,並可舉出三苯基磷酸酯、三甲酚磷酸酯、甲酚二苯基磷酸酯、辛基二苯基磷酸酯、二苯基聯苯基磷酸酯、三辛基磷酸酯、三丁基磷酸酯等。Further, as other plasticizers, a phosphate-based plasticizer can be used, and triphenyl phosphate, tricresol phosphate, cresol diphenyl phosphate, octyl diphenyl phosphate, and diphenyl linkage can be used. Phenyl phosphate, trioctyl phosphate, tributyl phosphate, and the like.

其他亦可含有特開2003-12859號所記載的丙烯基聚合物等佳。Others may preferably contain a propylene-based polymer described in JP-A-2003-12859.

<丙烯基聚合物><propylene-based polymer>

纖維素酯薄膜為含有對於延伸方向顯示負配向複折射性之重量平均分子量500以上30000以下的丙烯基聚合物者為佳。The cellulose ester film is preferably a propylene-based polymer containing a weight average molecular weight of 500 or more and 30,000 or less which exhibits a negative complex birefringence in the extending direction.

以該聚合物之重量平均分子量為500以上30000以下者控制該聚合物之組成時,可使纖維素酯與該聚合物之相溶性良好。When the composition of the polymer is controlled so that the weight average molecular weight of the polymer is 500 or more and 30,000 or less, the compatibility between the cellulose ester and the polymer can be improved.

特別對於丙烯基聚合物、於支鏈具有芳香環之丙烯基聚合物或於支鏈具有環己基之丙烯基聚合物,較佳為重量平均分子量為500以上10000以下者即可,除上述以外,製膜後之纖維素酯薄膜的透明性優良,透濕度亦極低,可顯示作為防反射薄膜之優良性能。In particular, the propylene-based polymer, the propylene-based polymer having an aromatic ring in a branched chain or the propylene-based polymer having a cyclohexyl group in a branched chain may preferably have a weight average molecular weight of 500 or more and 10,000 or less, in addition to the above, The cellulose ester film after film formation is excellent in transparency and extremely low in moisture permeability, and can exhibit excellent properties as an antireflection film.

該聚合物因重量平均分子量為500以上30000以下,可考慮為寡聚物至低分子量聚合物之間者。合成如此聚合物,於一般聚合中難以控制分子量,可望使用一種不會使分子量過大之方法下儘可能控制分子量之方法。The polymer has a weight average molecular weight of 500 or more and 30,000 or less, and can be considered as an oligomer to a low molecular weight polymer. The synthesis of such a polymer makes it difficult to control the molecular weight in general polymerization, and it is expected to use a method of controlling the molecular weight as much as possible without excessive molecular weight.

作為相關聚合方法,可使用如過氧化枯烯或氫過氧化第三丁基之過氧化物聚合啟始劑的方法、使用比一般聚合還多量的聚合啟始劑之方法、使用聚合啟始劑以外的氫硫基化合物或四氯化碳等連鎖移動劑之方法、使用聚合啟始劑以外如苯並喹啉或二硝基苯之聚合停止劑的方法、具有特開2000-128911號公報或同2000-344823號公報所記載的1個硫醇基與2級羥基之化合物、或使用併用該化合物與有機金屬化合物之聚合觸媒之嵌段聚合方法等。上述皆可適用,但特別以該公報所記載的方法為佳。As a related polymerization method, a method of using a peroxide polymerization initiator such as cumene peroxide or a third butyl hydroperoxide, a method of using a polymerization initiator other than a general polymerization, and a polymerization initiator are used. a method of using a chain shifting agent such as a hydrosulfide compound or carbon tetrachloride, or a method of using a polymerization stopper such as benzoquinoline or dinitrobenzene other than a polymerization initiator, and having the publication No. 2000-128911 or A compound of a thiol group and a hydroxy group described in JP-A-2000-344823, or a block polymerization method using a polymerization catalyst of the compound and an organometallic compound. The above is applicable, but it is particularly preferable to use the method described in the publication.

且,所謂丙烯基聚合物為,不具有含芳香環或環己基之單體單位的丙烯酸或甲基丙烯酸烷酯之均聚物或共聚物。所謂支鏈上具有芳香環之丙烯基聚合物為,必須含有具 有芳香環之丙烯酸或甲基丙烯酸酯單體單位之丙烯基聚合物。Further, the propylene-based polymer is a homopolymer or copolymer of acrylic acid or alkyl methacrylate which does not have a monomer unit containing an aromatic ring or a cyclohexyl group. The so-called propylene-based polymer having an aromatic ring on the branch must contain A propylene-based polymer having an aromatic ring of acrylic or methacrylic monomer units.

又,所謂支鏈上具有環己基之丙烯基聚合物為,含有具有環己基之丙烯酸或甲基丙烯酸酯單體單位的丙烯基聚合物。Further, the propylene-based polymer having a cyclohexyl group on the branched chain is a propylene-based polymer containing a monomer unit of an acrylic acid or a methacrylate having a cyclohexyl group.

作為不具有芳香環及環己基之丙烯酸酯單體,例如可舉出丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙基(i-、n-)、丙烯酸丁酯(n-、i-、s-、t-)、丙烯酸戊基(n-、i-、s-)、丙烯酸己基(n-、i-)、丙烯酸庚基(n-、i-)、丙烯酸辛基(n-、i-)、丙烯酸壬基(n-、i-)、丙烯酸肉豆蔻基(n-、i-)、丙烯酸(2-乙基己基)、丙烯酸(ε-己內酯)、丙烯酸(2-羥基乙基)、丙烯酸(2-羥基丙基)、丙烯酸(3-羥基丙基)、丙烯酸(4-羥基丁基)、丙烯酸(2-羥基丁基)、丙烯酸(2-甲氧基乙基)、丙烯酸(2-乙氧基乙基)等、或將上述丙烯酸酯改為甲基丙烯酸酯者。Examples of the acrylate monomer having no aromatic ring or cyclohexyl group include methyl acrylate, ethyl acrylate, propyl acrylate (i-, n-), and butyl acrylate (n-, i-, s-, T-), pentyl acrylate (n-, i-, s-), hexyl acrylate (n-, i-), heptyl acrylate (n-, i-), octyl acrylate (n-, i-), Acyl acrylate (n-, i-), acrylonitrile myristate (n-, i-), acrylic acid (2-ethylhexyl), acrylic acid (ε-caprolactone), acrylic acid (2-hydroxyethyl), Acrylic acid (2-hydroxypropyl), acrylic acid (3-hydroxypropyl), acrylic acid (4-hydroxybutyl), acrylic acid (2-hydroxybutyl), acrylic acid (2-methoxyethyl), acrylic acid (2 -Ethoxyethyl) or the like, or the above acrylate is changed to methacrylate.

丙烯基聚合物為上述單體之均聚物或共聚物,具有丙烯酸甲酯單體單位30質量%以上者為佳,又,具有甲基丙烯酸甲酯單體單位40質量%以上者為更佳。特別以丙烯酸甲酯或甲基丙烯酸甲酯之均聚物為佳。The propylene-based polymer is a homopolymer or a copolymer of the above monomers, preferably having a methyl acrylate monomer unit of 30% by mass or more, and further preferably having a methyl methacrylate monomer unit of 40% by mass or more. . In particular, a homopolymer of methyl acrylate or methyl methacrylate is preferred.

作為具有芳香環之丙烯酸或甲基丙烯酸酯單體,例如可舉出丙烯酸苯基、甲基丙烯酸苯基、丙烯酸(2或4-氯苯基)、甲基丙烯酸(2或4-氯苯基)、丙烯酸(2或3或4-乙氧基羰基苯基)、甲基丙烯酸(2或3或4-乙氧基 羰基苯基)、丙烯酸(o或m或p-甲苯基)、甲基丙烯酸(o或m或p-甲苯基)、丙烯酸苯甲酯、甲基丙烯酸苯甲酯、丙烯酸苯乙酯、甲基丙烯酸苯乙酯、丙烯酸(2-萘基)等,使用丙烯酸苯甲酯、甲基丙烯酸苯甲酯、丙烯酸苯乙酯、甲基丙烯酸苯乙基為佳。Examples of the acrylic or methacrylic ester monomer having an aromatic ring include phenyl acrylate, phenyl methacrylate, acrylic acid (2 or 4-chlorophenyl), and methacrylic acid (2 or 4-chlorophenyl). ), acrylic acid (2 or 3 or 4-ethoxycarbonylphenyl), methacrylic acid (2 or 3 or 4-ethoxyl) Carbonyl phenyl), acrylic acid (o or m or p-tolyl), methacrylic acid (o or m or p-tolyl), benzyl acrylate, benzyl methacrylate, phenylethyl acrylate, methyl As the phenylethyl acrylate or the acrylic acid (2-naphthyl group), benzyl acrylate, benzyl methacrylate, phenylethyl acrylate or phenethyl methacrylate is preferred.

支鏈上具有芳香環之丙烯基聚合物中,含具有芳香環之丙烯酸或甲基丙烯酸酯單體單位為20~40質量%,且具有丙烯酸或甲基丙烯酸甲酯單體單位50~80質量%為佳。該聚合物中,含具有羥基之丙烯酸或甲基丙烯酸酯單體單位2~20質量%為佳。In the propylene-based polymer having an aromatic ring on the branch, the monomer having acrylic or methacrylic ester having an aromatic ring is 20 to 40% by mass, and has an acrylic or methyl methacrylate monomer unit of 50 to 80 mass. % is better. The polymer preferably contains 2 to 20% by mass of the acrylic acid or methacrylic acid monomer unit having a hydroxyl group.

作為具有環己基之丙烯酸酯單體,例如可舉出丙烯酸環己酯、甲基丙烯酸環己酯、丙烯酸(4-甲基環己基)、甲基丙烯酸(4-甲基環己基)、丙烯酸(4-乙基環己基)、甲基丙烯酸(4-乙基環己基)等,以使用丙烯酸環己酯及甲基丙烯酸環己酯為佳。Examples of the acrylate monomer having a cyclohexyl group include cyclohexyl acrylate, cyclohexyl methacrylate, acrylic acid (4-methylcyclohexyl), methacrylic acid (4-methylcyclohexyl), and acrylic acid ( 4-ethylcyclohexyl), methacrylic acid (4-ethylcyclohexyl), etc., preferably cyclohexyl acrylate and cyclohexyl methacrylate are used.

支鏈上具有環己基之丙烯基聚合物中,含具有環己基之丙烯酸或甲基丙烯酸酯單體單位20~40質量%,且以50~80質量%為佳。又,該聚合物中含具有羥基之丙烯酸或甲基丙烯酸酯單體單位2~20質量%為佳。The propylene-based polymer having a cyclohexyl group in the branched chain contains 20 to 40% by mass of the monomer having acrylic acid or methacrylic acid ester having a cyclohexyl group, and preferably 50 to 80% by mass. Further, the polymer preferably contains 2 to 20% by mass of the acrylic acid or methacrylic acid monomer unit having a hydroxyl group.

聚合上述乙烯性不飽和單體所得之聚合物、丙烯基聚合物、支鏈上具有芳香環之丙烯基聚合物及支鏈上具有環己基之丙烯基聚合物皆與纖維素樹脂之相溶性優良。The polymer obtained by polymerizing the above ethylenically unsaturated monomer, the propylene-based polymer, the propylene-based polymer having an aromatic ring on the branch, and the propylene-based polymer having a cyclohexyl group on the branch are excellent in compatibility with the cellulose resin. .

這些具有羥基之丙烯酸或甲基丙烯酸酯單體並非均聚物,係為共聚物之構成單位。此時,較佳為具有羥基之丙 烯酸或甲基丙烯酸酯單體單位於丙烯基聚合物中之含有量為2~20質量%為佳。These acrylic or methacrylic acid ester monomers having a hydroxyl group are not homopolymers and are constituent units of the copolymer. At this time, it is preferred to have a hydroxyl group C The content of the olefinic acid or methacrylic acid ester monomer unit in the propylene-based polymer is preferably 2 to 20% by mass.

又,亦可使用於支鏈具有羥基之聚合物。作為具有羥基之單體單位,與前述之單體同様,但以丙烯酸或甲基丙烯酸酯為佳,例如可舉出丙烯酸(2-羥基乙基)、丙烯酸(2-羥基丙基)、丙烯酸(3-羥基丙基)、丙烯酸(4-羥基丁基)、丙烯酸(2-羥基丁基)、丙烯酸-p-羥基甲基苯基、丙烯酸-p-(2-羥基乙基)苯基、或這些丙烯酸取代為甲基丙烯酸者,較佳為丙烯酸-2-羥基乙基及甲基丙烯酸-2-羥基乙基。聚合物中具有羥基之丙烯酸酯或甲基丙烯酸酯單體單位於聚合物中之含有量為2~20質量%時為佳,較佳為2~10質量%。Further, it can also be used for a polymer having a hydroxyl group in a branched chain. The monomer unit having a hydroxyl group is the same as the above-mentioned monomer, but preferably acrylic acid or methacrylic acid ester, and examples thereof include acrylic acid (2-hydroxyethyl), acrylic acid (2-hydroxypropyl), and acrylic acid ( 3-hydroxypropyl), (4-hydroxybutyl) acrylate, (2-hydroxybutyl) acrylate, p-hydroxymethylphenyl acrylate, p-(2-hydroxyethyl) phenyl acrylate, or These acrylic acid are substituted by methacrylic acid, preferably 2-hydroxyethyl acrylate and 2-hydroxyethyl methacrylate. The content of the acrylate or methacrylate monomer having a hydroxyl group in the polymer is preferably from 2 to 20% by mass, preferably from 2 to 10% by mass.

如前述,聚合物為含有具有上述羥基之單體單位2~20質量%者,必然與纖維素酯之相溶性、保留性、尺寸安定性優良,透濕度不僅小,且作為偏光板保護薄膜與偏光子之黏著性特優,具有提高偏光板之耐久性的效果。As described above, the polymer is 2 to 20% by mass of the monomer unit having the above-mentioned hydroxyl group, and is inevitably excellent in compatibility, retention, and dimensional stability with the cellulose ester, and the moisture permeability is not only small, but also acts as a protective film for the polarizing plate. The polarizer has excellent adhesion and has the effect of improving the durability of the polarizing plate.

使丙烯基聚合物之主鏈的至少一方末端上具有羥基之方法,特別為使主鏈末端上具有羥基之方法即可,並無特別限定,可舉出使用具有如偶氮雙(2-羥基乙基丁酸酯)之羥基的自由基聚合啟始劑之方法、使用具有如2-氫硫基乙醇之羥基的連鎖移動劑之方法、使用具有羥基之聚合停止劑的方法、藉由活性離子聚合使末端具有羥基之方法、如特開2000-128911號公報或特開2000-344823號公報之具有一個硫醇基與2級之羥基之化合物、或使用併用該化 合物與有機金屬化合物之聚合觸媒的嵌段聚合方法等而得到,特別以該公報所記載的方法為佳。The method of providing a hydroxyl group in at least one terminal of the main chain of the propylene-based polymer is not particularly limited, and a method of providing a hydroxyl group at the terminal of the main chain is not particularly limited, and examples thereof include using azobis(2-hydroxyl group). A method of radical polymerization initiator of a hydroxyl group of ethyl butyrate, a method of using a chain shifting agent having a hydroxyl group such as 2-hydrothioethanol, a method of using a polymerization stopper having a hydroxyl group, and a reactive ion A method of polymerizing a terminal having a hydroxyl group, or a compound having a thiol group and a hydroxyl group of a second order, or a combination thereof, as disclosed in JP-A-2000-128911 or JP-A-2000-344823 It is obtained by a block polymerization method of a polymerization catalyst of an organometallic compound, etc., and it is especially preferable to use the method as described in this publication.

有關該公報記載之方法所製作之聚合物作為綜研化學公司製之ACTFLOW.系列被販賣,且適用於本發明。上述之於末端具有羥基之聚合物及/或於支鏈具有羥基之聚合物,於本發明中,對於纖維素酯之聚合物相溶性、透明性有顯著提高之效果。The polymer produced by the method described in this publication is ACTFLOW manufactured by Ivy Research Chemical Co., Ltd. The series is sold and is suitable for use in the present invention. The polymer having a hydroxyl group at the terminal and/or a polymer having a hydroxyl group in the branched group has an effect of remarkably improving the compatibility and transparency of the polymer of the cellulose ester in the present invention.

且,作為對於延伸方向顯示負配向複折射性之乙烯性不飽和單體,使用苯乙烯類之聚合物時可表現負折射性故較佳。作為苯乙烯類,例如,苯乙烯、甲基苯乙烯、二甲基苯乙烯、三甲基苯乙烯、乙基苯乙烯、異丙基苯乙烯、氯甲基苯乙烯、甲氧基苯乙烯、乙酸基苯乙烯、氯苯乙烯、二氯苯乙烯、溴苯乙烯、乙烯安息香酸甲酯等,但並限定於此。Further, as the ethylenically unsaturated monomer exhibiting a negative alignment birefringence in the extending direction, it is preferred to use a styrene-based polymer to exhibit negative refractive properties. As the styrene, for example, styrene, methyl styrene, dimethyl styrene, trimethyl styrene, ethyl styrene, isopropyl styrene, chloromethyl styrene, methoxy styrene, Acetyl styrene, chlorostyrene, dichlorostyrene, bromostyrene, methyl benzoic acid methyl ester, etc., but are not limited thereto.

可與作為前述不飽和乙烯性單體所舉例之單體進行共聚合,且以控制複折射性之目的下,可使用2種以上之上述聚合物溶解於纖維素酯中而使用。It is possible to copolymerize with a monomer exemplified as the unsaturated ethylenic monomer, and to use two or more kinds of the above polymers to be dissolved in a cellulose ester for the purpose of controlling birefringence.

且,纖維素酯薄膜為含有將分子內不具有芳香環與親水性基之乙烯性不飽和單體Xa與分子內不具有芳香環,而具有親水性基之乙烯性不飽和單體Xb經共聚合所得之重量平均分子量5000以上30000以下的聚合物X,與較佳為不具有芳香環之乙烯性不飽和單體Ya經聚合所得之重量平均分子量500以上3000以下的聚合物Y。Further, the cellulose ester film contains an ethylenically unsaturated monomer Xa having no aromatic ring and a hydrophilic group in the molecule, and an ethylenically unsaturated monomer Xb having a hydrophilic group in the molecule and having a hydrophilic group. The polymer X obtained by polymerization and having a weight average molecular weight of 5,000 or more and 30,000 or less is preferably a polymer Y having a weight average molecular weight of 500 or more and 3000 or less obtained by polymerization of the ethylenically unsaturated monomer Ya having no aromatic ring.

(聚合物X、聚合物Y)(Polymer X, Polymer Y)

本發明所使用的聚合物X為,將分子內不具有芳香環與親水性基之乙烯性不飽和單體Xa、與分子內不具有芳香環而具有親水性基之乙烯性不飽和單體Xb經共聚合後所得之重量平均分子量5000以上,30000以下的聚合物。The polymer X used in the present invention is an ethylenically unsaturated monomer Xa having no aromatic ring and hydrophilic group in the molecule, and an ethylenically unsaturated monomer Xb having a hydrophilic group in the molecule and having a hydrophilic group. A polymer having a weight average molecular weight of 5,000 or more and 30,000 or less obtained by copolymerization.

較佳為,Xa為分子內不具有芳香環與親水性基之丙烯基或甲基丙烯酸單體,Xb為分子內不具有芳香環,而具有親水性基之丙烯基或甲基丙烯酸單體。Preferably, Xa is a propylene group or a methacrylic monomer having no aromatic ring and a hydrophilic group in the molecule, and Xb is a propylene group or a methacrylic monomer having a hydrophilic group in the molecule and having a hydrophilic group.

聚合物X如下述一般式(8)所示。The polymer X is represented by the following general formula (8).

-(Xa)m-(Xb)n-(Xc)p-………(8)-(Xa)m-(Xb)n-(Xc)p-.........(8)

更佳為下述一般式(9)所示之聚合物。More preferably, it is a polymer represented by the following general formula (9).

-[CH2 -C(-R1 )(-CO2 R2 )]m-[CH2 -C(-R3 )(-CO2 R4 -OH)-]n-[Xc]p-………(9) (式中,R1 、R3 表示H或CH3 。R2 表示碳數1~12的烷基、環烷基。R4 表示-CH2 -、-C2 H4 -或-C3 H6 -。Xc表示於Xa、Xb可聚合之單體單位。m、n及p表示莫耳組成比。但,m≠0、n≠0、k≠0、m+n+p=100)。-[CH 2 -C(-R 1 )(-CO 2 R 2 )]m-[CH 2 -C(-R 3 )(-CO 2 R 4 -OH)-]n-[Xc]p-... (9) (wherein R 1 and R 3 represent H or CH 3 . R 2 represents an alkyl group having 1 to 12 carbon atoms or a cycloalkyl group. R 4 represents -CH 2 -, -C 2 H 4 - Or -C 3 H 6 -. Xc represents a monomer unit in which Xa and Xb are polymerizable. m, n and p represent a molar composition ratio. However, m≠0, n≠0, k≠0, m+n+p=100) .

本發明中,作為構成丙烯酸系聚合物X之單體單位的單體可舉出下述,但不限定於此。In the present invention, the monomer constituting the monomer unit of the acrylic polymer X is as follows, but is not limited thereto.

丙烯酸系聚合物X中,所謂親水性基為具有羥基、環 氧乙烷連鎖之基。In the acrylic polymer X, the hydrophilic group has a hydroxyl group and a ring. Oxygen ethane linkage base.

分子內不具有芳香環與親水性基之乙烯性不飽和單體Xa,例如可舉出丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙基(i-、n-)、丙烯酸丁酯(n-、i-、s-、t-)、丙烯酸戊基(n-、i-、s-)、丙烯酸己基(n-、i-)、丙烯酸庚基(n-、i-)、丙烯酸辛基(n-、i-)、丙烯酸壬基(n-、i-)、丙烯酸肉豆蔻基(n-、i-)、丙烯酸(2-乙基己基)、丙烯酸(ε-己內酯)等、或將上述丙烯酸酯改為甲基丙烯酸酯者。Examples of the ethylenically unsaturated monomer Xa having no aromatic ring and hydrophilic group in the molecule include methyl acrylate, ethyl acrylate, propyl acrylate (i-, n-), and butyl acrylate (n-, i). -, s-, t-), pentyl acrylate (n-, i-, s-), hexyl acrylate (n-, i-), heptyl acrylate (n-, i-), octyl acrylate (n- , i-), fluorenyl acrylate (n-, i-), acrylic acid myristyl (n-, i-), acrylic acid (2-ethylhexyl), acrylic acid (ε-caprolactone), etc., or The acrylate is changed to methacrylate.

其中,以丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙基(i-、n-)為佳。Among them, methyl acrylate, ethyl acrylate, methyl methacrylate, ethyl methacrylate, and propyl methacrylate (i-, n-) are preferred.

分子內不具有芳香環,具有親水性基之乙烯性不飽和單體Xb,作為具有羥基之單體單位,以丙烯酸或甲基丙烯酸酯為佳,例如可舉出丙烯酸(2-羥基乙基)、丙烯酸(2-羥基丙基)、丙烯酸(3-羥基丙基)、丙烯酸(4-羥基丁基)、丙烯酸(2-羥基丁基)、或將這些丙烯酸取代為甲基丙烯酸者,較佳為丙烯酸(2-羥基乙基)、及甲基丙烯酸(2-羥基乙基)、丙烯酸(2-羥基丙基)、丙烯酸(3-羥基丙基)。The ethylenically unsaturated monomer Xb having no aromatic ring and having a hydrophilic group in the molecule, and the monomer unit having a hydroxyl group is preferably acrylic acid or methacrylic acid ester, and examples thereof include acrylic acid (2-hydroxyethyl). Acrylic acid (2-hydroxypropyl), acrylic acid (3-hydroxypropyl), acrylic acid (4-hydroxybutyl), acrylic acid (2-hydroxybutyl), or those obtained by substituting these acrylic acids with methacrylic acid, preferably It is acrylic acid (2-hydroxyethyl), and methacrylic acid (2-hydroxyethyl), acrylic acid (2-hydroxypropyl), acrylic acid (3-hydroxypropyl).

作為Xc,僅為Xa、Xb以外者,且可共聚合之乙烯性不飽和單體即可,並無特別限定,但具有芳香環者為佳。Xc is not particularly limited as long as it is a copolymerizable ethylenic unsaturated monomer other than Xa or Xb, and is preferably an aromatic ring.

Xa、Xb及Xc之莫耳組成比m:n以99:1~65:35之範圍為佳,更佳為95:5~75:25之範圍。Xc的p為0~10。Xc為複數單體單位即可。The moir composition ratio of Xa, Xb and Xc is preferably in the range of 99:1 to 65:35, more preferably in the range of 95:5 to 75:25. The p of Xc is 0~10. Xc is a plural monomer unit.

Xa之莫耳組成比過多時,與纖維素酯之相溶性會改善,但會使薄膜厚度方向滯留值(Rt)值變大。Xb之莫耳組成比過多時,上述相溶性變差使厚度方向滯留值(Rt)減低之效果會提高。又,Xb之莫耳組成比若超過上述範圍時,製膜時會有出現霧之傾向,由Xa、Xb之莫耳組成比之設定來達到這些最適化。When the molar composition ratio of Xa is too large, the compatibility with the cellulose ester is improved, but the value of the film thickness retention value (Rt) is increased. When the molar composition ratio of Xb is too large, the above-described compatibility is deteriorated, and the effect of reducing the thickness direction retention value (Rt) is improved. Further, when the molar composition ratio of Xb exceeds the above range, fogging tends to occur during film formation, and these are optimized by setting the molar composition ratio of Xa and Xb.

聚合物X之分子量為重量平均分子量5000以上30000以下,更佳為8000以上25000以下。The molecular weight of the polymer X is a weight average molecular weight of 5,000 or more and 30,000 or less, more preferably 8,000 or more and 25,000 or less.

重量平均分子量若為5000以上時,可得到纖維素酯薄膜於高溫高濕下的尺寸變化較少,作為偏光板保護薄膜之彎曲較少等利點故較佳。重量平均分子量為30000以內時,與纖維素酯之相溶性會更提高,可抑制高溫高濕下之外滲,以及製膜之後之霧產生。When the weight average molecular weight is 5,000 or more, the cellulose ester film can be obtained with less dimensional change under high temperature and high humidity, and it is preferable because the polarizing plate protective film has less bending. When the weight average molecular weight is 30,000 or less, the compatibility with the cellulose ester is further improved, and the extravasation under high temperature and high humidity and the generation of mist after film formation can be suppressed.

聚合物X之重量平均分子量可由公知分子量調節方法進行調整。作為如此分子量調節方法,例如可舉出添加四氯化碳、月桂基硫醇、硫代二醇酸辛基等連鎖移動劑之方法等。又,聚合溫度一般為室溫至130℃,較佳為50℃至100℃下進行,但可調整該溫度或聚合反應時間。The weight average molecular weight of the polymer X can be adjusted by a known molecular weight adjustment method. As such a molecular weight adjustment method, for example, a method of adding a chain shifting agent such as carbon tetrachloride, lauryl mercaptan or octyl thioglycolate may be mentioned. Further, the polymerization temperature is usually from room temperature to 130 ° C, preferably from 50 ° C to 100 ° C, but the temperature or the polymerization reaction time can be adjusted.

繼續,聚合物Y為,將不具有芳香環之乙烯性不飽和單體Ya經聚合所得之重量平均分子量500以上,3000以下的聚合物。The polymer Y is a polymer having a weight average molecular weight of 500 or more and 3,000 or less obtained by polymerizing the ethylenically unsaturated monomer Ya having no aromatic ring.

其中,聚合物Y之重量平均分子量為500以上時,會減少聚合物之殘存單體,故較佳。又,聚合物Y之重量平均分子量為3000以下時,可維持厚度方向滯留值(Rt) 值之降低性能故較佳。Among them, when the weight average molecular weight of the polymer Y is 500 or more, the residual monomer of the polymer is reduced, which is preferable. Further, when the weight average molecular weight of the polymer Y is 3,000 or less, the thickness direction retention value (Rt) can be maintained. The lowering of the value is better.

Ya較佳為不具有芳香環的丙烯基或甲基丙烯酸單體。Ya is preferably a propylene or methacrylic monomer having no aromatic ring.

聚合物Y為下述一般式(10)所示。The polymer Y is represented by the following general formula (10).

-(Ya)k-(Yb)q-………(10)-(Ya)k-(Yb)q-.........(10)

更佳為為下述一般式(11)所示聚合物。More preferably, it is a polymer represented by the following general formula (11).

-[CH2 -C(-R5 )(-CO2 R6 )]k-[Yb]q-………(11) (式中,R5 表示H或CH3 。R6 表示碳數1~12的烷基或環烷基。Yb表示可與Ya共聚合之單體單位。k及q表示莫耳組成比。但,k≠0、k+q=100)。-[CH 2 -C(-R 5 )(-CO 2 R 6 )]k-[Yb]q-... (11) (wherein R 5 represents H or CH 3 . R 6 represents a carbon number of 1 Alkyl or cycloalkyl of ~12. Yb represents a monomer unit copolymerizable with Ya. k and q represent a molar composition ratio. However, k≠0, k+q=100).

Yb僅為可與Ya進行共聚合之乙烯性不飽和單體即可,並無特別限定。Yb可為複數。k+q=100,q較佳為0~30。Yb is only an ethylenically unsaturated monomer copolymerizable with Ya, and is not particularly limited. Yb can be plural. k+q=100, q is preferably 0~30.

構成將不具有芳香環之乙烯性不飽和單體經聚合所得之聚合物Y之乙烯性不飽和單體Ya,作為丙烯酸酯,例如可舉出丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙基(i-、n-)、丙烯酸丁酯(n-、i-、s-、t-)、丙烯酸戊基(n-、i-、s-)、丙烯酸己基(n-、i-)、丙烯酸庚基(n-、i-)、丙烯酸辛基(n-、i-)、丙烯酸壬基(n-、i-)、丙烯酸肉豆蔻基(n-、i-)、丙烯酸環己酯、丙烯酸(2-乙基己基 )、丙烯酸(ε-己內酯)、丙烯酸(2-羥基乙基)、丙烯酸(2-羥基丙基)、丙烯酸(3-羥基丙基)、丙烯酸(4-羥基丁基)、丙烯酸(2-羥基丁基),作為甲基丙烯酸酯可舉出將上述丙烯酸酯改變為甲基丙烯酸酯者;作為不飽和酸,例如可舉出丙烯酸、甲基丙烯酸、馬來酸酐、巴豆酸、衣康酸等。The ethylenically unsaturated monomer Ya of the polymer Y obtained by polymerizing an ethylenically unsaturated monomer having no aromatic ring, and examples of the acrylate include methyl acrylate, ethyl acrylate, and propyl acrylate (i). -, n-), butyl acrylate (n-, i-, s-, t-), pentyl acrylate (n-, i-, s-), hexyl acrylate (n-, i-), heptyl acrylate (n-, i-), octyl acrylate (n-, i-), fluorenyl acrylate (n-, i-), acrylic myristyl (n-, i-), cyclohexyl acrylate, acrylic acid (2 -ethylhexyl ), acrylic acid (ε-caprolactone), acrylic acid (2-hydroxyethyl), acrylic acid (2-hydroxypropyl), acrylic acid (3-hydroxypropyl), acrylic acid (4-hydroxybutyl), acrylic acid (2) - hydroxybutyl), the methacrylate is exemplified by changing the above acrylate to methacrylate; examples of the unsaturated acid include acrylic acid, methacrylic acid, maleic anhydride, crotonic acid, and itacon. Acid, etc.

Yb僅為與Ya可共聚合之乙烯性不飽和單體即可,並無特別限定,作為乙烯酯,例如可舉出乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯、戊酸乙烯酯、三甲基乙酸乙烯酯、己酸乙烯酯、癸酸乙烯酯、月桂酸乙烯酯、肉豆蔻酸乙烯酯、棕櫚酸乙烯酯、硬脂酸乙烯酯、環己烷羧酸乙烯酯、辛基酸乙烯酯、甲基丙烯酸乙烯酯、巴豆酸乙烯酯、山梨酸乙烯酯、桂皮酸乙烯酯等為佳。Yb可為複數。Yb is not particularly limited as long as it is an ethylenically unsaturated monomer copolymerizable with Ya, and examples of the vinyl ester include vinyl acetate, vinyl propionate, vinyl butyrate, and vinyl valerate. Trimethyl vinyl acetate, vinyl hexanoate, vinyl decanoate, vinyl laurate, vinyl myristate, vinyl palmitate, vinyl stearate, vinyl cyclohexanecarboxylate, octyl acid Vinyl ester, vinyl methacrylate, vinyl crotonate, vinyl sorbate, vinyl cinnamate, etc. are preferred. Yb can be plural.

合成聚合物X、及聚合物Y時,一般聚合中難以控制分子量,可望使用不會使分子量過大之方法下,儘可能控制分子量之方法。When synthesizing the polymer X and the polymer Y, it is difficult to control the molecular weight in the polymerization, and it is expected to use a method of controlling the molecular weight as much as possible without excessive molecular weight.

作為聚合物X、及聚合物Y的聚合方法,可使用如過氧化枯烯或氫過氧化第三丁基之過氧化物聚合啟始劑的方法、使用比一般聚合還多量的聚合啟始劑之方法、聚合啟始劑以外使用其他氫硫基化合物或四氯化碳等連鎖移動劑之方法、使用除聚合啟始劑以外如苯並喹啉或二硝基苯之聚合停止劑的方法、更如特開2000-128911號公報或特開2000-344823號公報之具有一個硫醇基與2級之羥基之化合物、或使用併用該化合物與有機金屬化合物之聚合觸媒 的嵌段聚合方法等。As the polymerization method of the polymer X and the polymer Y, a method of using a peroxide polymerization initiator such as cumene peroxide or a third butyl hydroperoxide, and using a polymerization initiator other than the general polymerization can be used. a method of using a chain shifting agent such as another hydrosulfide compound or carbon tetrachloride other than a polymerization initiator, and a method of using a polymerization stopper such as benzoquinoline or dinitrobenzene other than a polymerization initiator, Further, a compound having a thiol group and a hydroxyl group of the second order or a polymerization catalyst using the compound and the organometallic compound in combination with JP-A-2000-128911 or JP-A-2000-344823 Block polymerization methods, etc.

聚合物Y為,將分子中具有硫醇基與2級羥基之化合物作為連鎖移動劑使用的聚合方法為佳。此時,聚合物Y的末端上會具有聚合觸媒及連鎖移動劑所引起的羥基、硫醚。藉由該末端殘基,可調整聚合物Y與纖維素酯之相溶性。The polymer Y is preferably a polymerization method in which a compound having a thiol group and a secondary hydroxyl group in the molecule is used as a chain shifting agent. At this time, the terminal of the polymer Y has a hydroxyl group or a thioether caused by a polymerization catalyst and a chain shifting agent. The compatibility of the polymer Y with the cellulose ester can be adjusted by the terminal residue.

聚合物X及聚合物Y之羥基價為30~150[mgKOH/g]為佳。The hydroxyl group of the polymer X and the polymer Y is preferably 30 to 150 [mgKOH/g].

其中,羥基價之測定可依據JIS K 0070(1992)進行。該羥基價定義為,將試料1g進行乙醯基化時,欲中和與羥基結合之乙酸所需的氫氧化鉀mg數。具體為將試料xg(約1g)以燒瓶精準稱取後,於此正確地加入乙醯基化試藥(於乙酸酐20ml中加入吡啶使其成為400ml者)20ml。於燒瓶口裝上空氣冷卻管,於95~100℃之甘油浴中進行加熱。經1小時30分鐘後冷卻,由空氣冷卻管加入純水1ml,將乙酸酐分解成乙酸。其次使用電位差滴定裝置以0.5mol/L氫氧化鉀乙醇溶液進行滴定,所得之滴定曲線的變曲點作為終點。且作為空白試驗為未放入試料下進行滴定,求得滴定曲線之變曲點。羥基價如以下式子算出。Among them, the measurement of the hydroxyl value can be carried out in accordance with JIS K 0070 (1992). The hydroxyl value is defined as the number of mg of potassium hydroxide required to neutralize acetic acid bound to a hydroxyl group when 1 g of the sample is subjected to acetylation. Specifically, after the sample xg (about 1 g) was accurately weighed in a flask, 20 ml of an acetamidine reagent (a pyridine was added to 20 ml of acetic anhydride to make it into a 400 ml) was correctly added thereto. An air cooling tube was placed at the mouth of the flask and heated in a glycerin bath at 95 to 100 °C. After cooling for 1 hour and 30 minutes, 1 ml of pure water was added from an air cooling tube to decompose acetic anhydride into acetic acid. Next, titration was carried out using a potentiometric titration apparatus in a 0.5 mol/L potassium hydroxide ethanol solution, and the obtained curve of the titration curve was used as an end point. Further, as a blank test, titration was carried out without placing the sample, and the inflection point of the titration curve was obtained. The hydroxyl value was calculated by the following formula.

羥基價={(B-C)×f×28.05/x}+D(式中,B表示使用於空白試驗之0.5mol/L氫氧化鉀乙醇 溶液的量(ml)、C表示使用於滴定之0.5mol/L的氫氧化鉀乙醇溶液量(ml)、f表示0.5mol/L氫氧化鉀乙醇溶液之因數、D表示酸價、又28.05表示氫氧化鉀之1mol量56.11的1/2)。Hydroxyl value = {(B-C) × f × 28.05 / x} + D (wherein B represents 0.5 mol / L of potassium hydroxide ethanol used in the blank test The amount of the solution (ml), C represents the amount of potassium hydroxide solution (ml) used for titration of 0.5 mol/L, f represents the factor of 0.5 mol/L potassium hydroxide ethanol solution, D represents the acid value, and 28.05 represents The amount of 1 mol of potassium hydroxide is 1/2 of 56.11.

聚合物X與聚合物Y之纖維素酯薄膜中的含有量以滿足下述式(i)、式(ii)之範圍者為佳。聚合物X之含有量作為xg(質量%=聚合物X之質量/纖維素酯之質量×100)、聚合物Y的含有量作為yg(質量%), 式(i)5≦xg+yg≦35(質量%) 式(ii)0.05≦yg/(xg+yg)≦0.4 式(i)之較佳範圍為10~25質量%。The content of the cellulose X film of the polymer X and the polymer Y is preferably such that it satisfies the following formula (i) or formula (ii). The content of the polymer X is yg (% by mass) as xg (% by mass = mass of the polymer X / mass of the cellulose ester × 100), and the content of the polymer Y is yg (% by mass). Formula (i) 5 ≦ xg + yg ≦ 35 (% by mass) Formula (ii) 0.05 ≦ yg / (xg + yg) ≦ 0.4 The preferred range of the formula (i) is 10 to 25% by mass.

且,聚合物之重量平均分子量Mw可使用凝膠滲透層析法進行測定。Further, the weight average molecular weight Mw of the polymer can be measured by gel permeation chromatography.

測定條件如以下所示。The measurement conditions are as follows.

溶劑:二氯甲烷管柱:Shodex K806、K805、K803G(使用連接3根昭和電工股份有限公司製)管柱溫度:25℃試料濃度:0.1質量%檢測器:RI Model 504(GLScience公司製)幫浦:L6000(日立製作所股份有限公司製)流量:1.0ml/min 校對曲線:標準聚苯乙烯STKSolvent: Dichloromethane column: Shodex K806, K805, K803G (used by connecting 3 Showa Denko Co., Ltd.) Column temperature: 25 °C Sample concentration: 0.1% by mass Detector: RI Model 504 (manufactured by GLS Science) Ur: L6000 (made by Hitachi, Ltd.) Flow: 1.0ml/min Proofreading curve: standard polystyrene STK

使用standard聚苯乙烯(Tosoh股份有限公司製)Mw=1,000,000~500之13個試品所得之校對曲線。13個試品幾乎使用相等間隔。A calibration curve obtained from 13 samples of standard polystyrene (manufactured by Tosoh Co., Ltd.) Mw = 1,000,000 to 500 was used. The 13 samples used almost equal intervals.

聚合物X與聚合物Y的總量僅為5質量%以上,即可對厚度方向的滯留值(Rt)的降低發揮充分作用。又,總量為35質量%以下時與偏光子PVA的黏著性良好。The total amount of the polymer X and the polymer Y is only 5% by mass or more, and it is sufficient to sufficiently reduce the retention value (Rt) in the thickness direction. Moreover, when the total amount is 35% by mass or less, the adhesion to the polarizer PVA is good.

聚合物X與聚合物Y可作為構成如後述之摻合液的素材而直接添加、溶解、或溶解於預先溶解纖維素酯之有機溶劑後添加於摻合液。The polymer X and the polymer Y can be directly added, dissolved, or dissolved in an organic solvent in which a cellulose ester is dissolved in advance as a material constituting a blending liquid to be described later, and then added to the blending liquid.

纖維素酯薄膜中之上述可塑劑的總含有量,對於固體成分總量而言,以5~20質量%為佳,6~16質量%為更佳,特佳為8~13質量%。又,2種可塑劑之含有量各至少為1質量%以上,較佳為各含有2質量%以上。The total content of the above-mentioned plasticizer in the cellulose ester film is preferably 5 to 20% by mass, more preferably 6 to 16% by mass, even more preferably 8 to 13% by mass, based on the total amount of the solid content. Further, the content of the two kinds of plasticizers is at least 1% by mass or more, and preferably 2% by mass or more.

含有多元醇類酯系可塑劑1~15質量%為佳,特別以3~11質量%為佳。多元醇類酯系可塑劑之含有量若過少會產生平面性劣化,若過多時容易外滲。多元醇類酯系可塑劑與其他可塑劑之質量比率以1:4~4:1之範圍為佳,以1:3~3:1為更佳。可塑劑之添加量過多或過少亦容易使薄膜變形而不佳。The polyol ester-based plasticizer is preferably 1 to 15% by mass, particularly preferably 3 to 11% by mass. When the content of the polyol ester-based plasticizer is too small, planarity is deteriorated, and when it is too large, it is easy to be extravasated. The mass ratio of the polyol ester-based plasticizer to other plasticizers is preferably in the range of 1:4 to 4:1, more preferably 1:3 to 3:1. If the amount of the plasticizer added is too large or too small, the film may be easily deformed.

(溶液流延製膜法)(solution casting film forming method)

纖維素酯薄膜之藉由溶液流延製膜法的製造為,藉由將纖維素酯、及添加劑溶解於溶劑中調製出摻合物的步驟 、將摻合物於輸送帶狀或滾筒狀之金屬支持體上進行流延之步驟、將經流延之摻合物作為織物(web)進行乾燥之步驟、由金屬支持體進行剝離之步驟、進行延伸或寬保持之步驟、進一步進行乾燥之步驟、捲取經加工後的薄膜之步驟而進行。The cellulose ester film is produced by a solution casting film forming method in which a blend is prepared by dissolving a cellulose ester and an additive in a solvent. a step of casting the blend on a conveyor belt-shaped or roll-shaped metal support, a step of drying the cast blend as a web, a step of peeling off from the metal support, The step of stretching or widening is carried out, the step of further drying, and the step of winding up the processed film are carried out.

首先,對於調製摻合物的步驟做說明。摻合物中的纖維素酯濃度為,濃度較高時於金屬支持體上流延後之乾燥負荷可減低故較佳,但纖維素酯之濃度若過高時過濾時的負荷會增加,使過濾純度變差。作為可使其兩立之濃度,以10~35質量%為佳,更佳為15~25質量%。First, the steps for preparing the blend are explained. The concentration of the cellulose ester in the blend is preferably such that the drying load after casting on the metal support can be reduced when the concentration is high, but if the concentration of the cellulose ester is too high, the load during filtration increases, so that the filtration is performed. The purity is deteriorated. The concentration which can be made two is preferably 10 to 35 mass%, more preferably 15 to 25 mass%.

摻合所使用的溶劑可單獨使用或併用2種以上,但纖維素酯之良溶劑與弱溶劑經混合後使用時由生產效率的觀點來看較佳,良溶劑較多時,由纖維素酯的溶解性之觀點來看較佳。良溶劑與弱溶劑之混合比率的較佳範圍為,良溶劑70~98質量%,弱溶劑2~30質量%。所謂良溶劑、弱溶劑為,可單獨溶解所使用之纖維素酯者定義為良溶劑、單獨下可膨潤或無法溶解者定義為弱溶劑。因此,藉由纖維素酯的醯基取代度,可改變為良溶劑或弱溶劑,例如將丙酮作為溶劑使用時,纖維素酯之乙酸酯(乙醯基取代度2.4)、纖維素乙酸酯丙酸酯成為良溶劑,纖維素之乙酸酯(乙醯基取代度2.8)成為弱溶劑。The solvent to be used for the blending may be used singly or in combination of two or more. However, when a good solvent of a cellulose ester is mixed with a weak solvent, it is preferably from the viewpoint of production efficiency, and when the good solvent is large, the cellulose ester is used. The solubility is preferred. A preferred range of the mixing ratio of the good solvent to the weak solvent is 70 to 98% by mass of the good solvent and 2 to 30% by mass of the weak solvent. The term "good solvent" or "weak solvent" is defined as a good solvent in which the cellulose ester to be used alone is dissolved, and a weak solvent in the case where it is swellable or insoluble. Therefore, by the degree of substitution of the thiol group of the cellulose ester, it can be changed to a good solvent or a weak solvent. For example, when acetone is used as a solvent, the cellulose ester acetate (acetylation degree of 2.4), cellulose acetate The ester propionate becomes a good solvent, and the cellulose acetate (the degree of substitution of acetonitrile is 2.8) becomes a weak solvent.

良溶劑雖無特別限定,可舉出二氯甲烷等有機鹵化合物或二氧雜戊環類、丙酮、乙酸甲酯、乙醯乙酸甲酯等。特佳可舉出二氯甲烷或乙酸甲酯。The good solvent is not particularly limited, and examples thereof include an organic halogen compound such as dichloromethane, a dioxapentane group, acetone, methyl acetate, and ethyl acetacetate. Particularly preferred are dichloromethane or methyl acetate.

又,弱溶劑雖無特別限定,例如可使用甲醇、乙醇、n-丁醇、環己烷、環己酮等。又,摻合物中含有水0.01~2質量%者為佳。Further, the weak solvent is not particularly limited, and for example, methanol, ethanol, n-butanol, cyclohexane, cyclohexanone or the like can be used. Further, it is preferred that the blend contains 0.01 to 2% by mass of water.

調製上述摻合物時,作為纖維素酯之溶解方法,可使用一般方法。組合加熱與加壓時,可於常壓下於沸點以上進行加熱。以溶劑於常壓下的沸點以上且加壓下不會使溶劑沸騰之溫度範圍內一邊加熱,一邊攪拌溶解時,可防止凝膠或稱為mamaco(結塊)之塊狀未溶解物的發生,故較佳。又,將纖維素酯與弱溶劑混合成為濕潤或膨潤後,可再添加良溶劑進行溶解之方法亦佳。When the above blend is prepared, a general method can be used as a method of dissolving the cellulose ester. When heating and pressurizing are combined, heating can be performed at a boiling point or higher at normal pressure. When the solvent is heated at a temperature higher than the boiling point of normal pressure and does not boil the solvent under pressure, it can prevent the occurrence of gel or blocky undissolved matter called mamaco (caking) while stirring and dissolving. Therefore, it is better. Further, it is also preferred to mix the cellulose ester with a weak solvent to form a wet or swell, and then add a good solvent to dissolve.

加壓可藉由壓入氮氣等惰性氣體的方法、或藉由加熱使溶劑之蒸氣壓上昇的方法進行。加熱由外部進行者為佳,例如外套型者因容易控制溫度故較佳。The pressurization can be carried out by a method of pressurizing an inert gas such as nitrogen or a method of increasing the vapor pressure of the solvent by heating. It is preferable that the heating is performed by the outside, and for example, the jacket type is preferable because it is easy to control the temperature.

添加溶劑之加熱溫度,較高時由纖維素酯之溶解性的觀點來看較佳,加熱溫度若過高時,因必須的壓力過大而使生產性變差。較佳加熱溫度為45~120℃,以60~110℃為佳,70℃~105℃為較佳。又,壓力可調整至設定溫度下溶劑不會沸騰之程度。The heating temperature at which the solvent is added is preferably from the viewpoint of solubility of the cellulose ester, and when the heating temperature is too high, the productivity is deteriorated because the necessary pressure is excessive. The preferred heating temperature is 45 to 120 ° C, preferably 60 to 110 ° C, and 70 ° C to 105 ° C is preferred. Also, the pressure can be adjusted to the extent that the solvent does not boil at the set temperature.

又,亦可使用冷卻溶解法,藉此乙酸甲酯等溶劑中可溶解纖維素酯。Further, a cooling dissolution method can also be used, whereby a cellulose ester can be dissolved in a solvent such as methyl acetate.

繼續,將該纖維素酯溶液使用濾紙等適當過濾材進行過濾。作為過濾材,欲除去不溶物等以絶對過濾精度較小者為佳,但絶對過濾精度過小時,容易產生過濾材阻塞的問題。因此以絶對過濾精度為0.008mm以下的濾材為佳, 0.001~0.008mm之濾材者為較佳,0.003~0.006mm之濾材者為更佳。Further, the cellulose ester solution is filtered using a suitable filter material such as filter paper. As the filter material, it is preferable to remove the insoluble matter or the like with a small absolute filtration accuracy. However, if the absolute filtration accuracy is too small, the filter material is likely to be clogged. Therefore, it is preferable to use a filter material having an absolute filtration accuracy of 0.008 mm or less. 0.001~0.008mm filter material is preferred, and 0.003~0.006mm filter material is better.

濾材之材質並無特別限定,可使用一般的濾材,聚丙烯、鐵氟龍(註冊商標)等塑質製之濾材、或不鏽鋼等金屬製濾材因無纖維脫落等而較佳。藉由過濾,含於原料之纖維素酯的雜質,特別為除去、減低亮點異物而較佳。The material of the filter medium is not particularly limited, and a general filter medium can be used. A plastic filter material such as polypropylene or Teflon (registered trademark) or a metal filter material such as stainless steel is preferable because no fiber is detached. By filtering, the impurities contained in the cellulose ester of the raw material are particularly preferably used for removing and reducing bright foreign matter.

本說明書中,所謂亮點異物為使片偏光板配置成正交尼科耳狀態,其間設置纖維素酯薄膜,自一方偏光板側照射光,由另一方偏光板側進行觀察時,見到自反對側的光漏的點(異物),徑為0.01mm以上之亮點數以200個/cm2 以下為佳。較佳為100個/cm2 以下,更佳為50個/m2 以下,特佳為0~10個/cm2 以下。又,0.01mm以下之亮點亦少為佳。In the present specification, the bright spot foreign matter is such that the sheet polarizing plate is placed in a crossed Nicols state, and a cellulose ester film is provided therebetween, and light is irradiated from one polarizing plate side and viewed from the other polarizing plate side. side light leak points (foreign matter), of diameter less than 0.01mm or less in order to highlight the number 2 200 / cm is preferred. It is preferably 100 pieces/cm 2 or less, more preferably 50 pieces/m 2 or less, and particularly preferably 0 to 10 pieces/cm 2 or less. Also, the highlights below 0.01 mm are also less preferred.

摻合物的過濾可藉由一般方法進行,於溶劑之常壓下的沸點以上,且加壓下溶劑不會沸騰之溫度範圍內一邊加熱一邊過濾之方法,可減低過濾前後之濾壓差(稱為差壓)的上昇而較佳。較佳溫度為45~120℃,以45~70℃為較佳,45~55℃更佳。The filtration of the blend can be carried out by a general method, and the method of filtering while heating at a temperature above the boiling point of the solvent under normal pressure and under the pressure of boiling under the pressure can reduce the filtration pressure difference before and after the filtration ( It is better to refer to the rise of the differential pressure. The preferred temperature is 45 to 120 ° C, preferably 45 to 70 ° C, and more preferably 45 to 55 ° C.

濾壓較小為佳。濾壓以1.6MPa以下時為佳,1.2MPa以下時為較佳,1.0MPa以下時為更佳。A smaller filter pressure is preferred. The filtration pressure is preferably 1.6 MPa or less, more preferably 1.2 MPa or less, and even more preferably 1.0 MPa or less.

繼續對於摻合物的流延做說明。Continue to explain the casting of the blend.

流延(澆鑄)步驟中的金屬支持體以可對表面進行鏡面加工者為佳,作為金屬支持體,使用以不鏽鋼輸送帶或鑄物進行表面鍍敷加工的轉筒為佳。The metal support in the casting (casting) step is preferably one which can be mirror-finished on the surface, and as the metal support, a roll which is surface-plated with a stainless steel conveyor belt or a cast is preferably used.

澆鑄寬度可為1~4m。流延步驟之金屬支持體的表面溫度設定為-50℃~溶劑沸騰不發泡之溫度以下。溫度較高時可使織物之乾燥速度加快故較佳,若過高時,織物會發泡、或會使平面性劣化。作為較佳金屬支持體溫度以0~100℃為適宜,以5~30℃為更佳。又,藉由冷卻可使織物(web)凝膠化,以含有大量殘留溶劑之狀態下自金屬支持體剝離亦為較佳方法。The casting width can be 1~4m. The surface temperature of the metal support in the casting step is set to be -50 ° C to a temperature at which the solvent does not foam. When the temperature is high, the drying speed of the fabric can be increased, so that the fabric is foamed or the flatness is deteriorated. The temperature of the preferred metal support is preferably from 0 to 100 ° C, more preferably from 5 to 30 ° C. Further, it is also preferable to gel the web by cooling and peeling from the metal support in a state containing a large amount of residual solvent.

控制金屬支持體之溫度的方法,雖無特別限定,但可使用吹入溫風或冷風之方法、或將溫水與金屬支持體裏側接觸之方法。使用溫水時,可有效率地進行熱之傳達,故金屬支持體的溫度到達一定之時間較短而較佳。使用溫風時,考慮到溶劑之蒸發潛熱會使織物之溫度降低,使用溶劑沸點以上之溫風可防止發泡下,亦可使用比目的溫度還高之風。The method of controlling the temperature of the metal support is not particularly limited, but a method of blowing warm air or cold air or a method of bringing warm water into contact with the back side of the metal support can be used. When warm water is used, heat can be efficiently transmitted, so that the temperature of the metal support reaches a certain period of time and is preferable. When using warm air, the temperature of the fabric is lowered in consideration of the latent heat of evaporation of the solvent, and the warm air above the boiling point of the solvent can be used to prevent foaming, and a wind higher than the target temperature can also be used.

特別為自流延至剝離之間,改變金屬支持體之溫度、及乾燥風之溫度,而有效率地進行乾燥為佳。In particular, it is preferable to carry out drying efficiently from the time of self-casting to peeling, changing the temperature of the metal support, and the temperature of the dry wind.

欲使纖維素酯薄膜顯示良好平面性,自金屬支持體剝離織物時的殘留溶劑量以10~150質量%為佳,更佳為20~40質量%或60~130質量%,特佳為20~30質量%或70~120質量%。In order to make the cellulose ester film exhibit good planarity, the residual solvent amount when peeling the fabric from the metal support is preferably 10 to 150% by mass, more preferably 20 to 40% by mass or 60 to 130% by mass, particularly preferably 20 ~30% by mass or 70~120% by mass.

殘留溶劑量定義如下述式。The amount of residual solvent is defined by the following formula.

殘留溶劑量(質量%)={(M-N)/N}×100Residual solvent amount (% by mass) = {(M - N) / N} × 100

其中,M為織物或薄膜於製造中或製造後的任意時點所採取之試料質量,N為M於115℃下進行1小時加熱後之質量。Wherein M is the mass of the sample taken at any point during or after manufacture of the woven fabric or film, and N is the mass of M after heating at 115 ° C for 1 hour.

又,纖維素酯薄膜之乾燥步驟中,將織物自金屬支持體剝離後進行乾燥,使殘留溶劑量為1質量%以下者為佳,更佳為01質量%以下,特佳為0~0.01質量%以下。Further, in the drying step of the cellulose ester film, the woven fabric is peeled off from the metal support and then dried, and the residual solvent amount is preferably 1% by mass or less, more preferably 01% by mass or less, and particularly preferably 0 to 0.01% by mass. %the following.

薄膜乾燥步驟中,一般採用以輥乾燥方式(將配置於上下的多數輥使織物(web)交互通過並乾燥之方式)或拉幅器方式搬送織物下進行乾燥之方式。In the film drying step, drying is generally carried out by a roll drying method (a method in which a plurality of rolls disposed on the upper and lower sides are passed through a web and dried) or a tenter method to carry the fabric under drying.

欲製造本發明之使用於防眩性薄膜的纖維素酯薄膜時,自金屬支持體剝離後之織物殘留溶劑量較多處馬上於搬送方向進行延伸,且以將織物之兩端以壓板等夾住之拉幅器方式於寬方向進行延伸為特佳。於縱方向、橫方向之兩者的較佳延伸倍率為1.01~1.3倍,更佳為1.05~1.15倍為更佳。藉由縱方向及橫方向延伸,使面積成為1.12~1.44倍時為佳,成為1.15~1.32倍為更佳。此可藉由縱方向之延伸倍率×橫方向的的延伸倍率求得。縱方向與橫方向之延伸倍率皆為未達1.01倍下形成硬塗佈層時的紫外線照射會引起平面性劣化。When the cellulose ester film used in the anti-glare film of the present invention is to be produced, the amount of residual solvent of the fabric after peeling from the metal support is immediately extended in the conveying direction, and the ends of the fabric are sandwiched by a press plate or the like. It is particularly good to extend the stenter in the width direction. The preferred stretching ratio in both the longitudinal direction and the lateral direction is preferably 1.01 to 1.3 times, more preferably 1.05 to 1.15 times. By extending in the longitudinal direction and the lateral direction, it is preferable that the area is 1.12 to 1.44 times, and it is more preferably 1.15 to 1.32 times. This can be obtained by the stretching ratio in the longitudinal direction × the stretching ratio in the lateral direction. When the stretching ratio in the longitudinal direction and the lateral direction is less than 1.01 times, ultraviolet irradiation at the time of forming the hard coating layer causes deterioration in planarity.

欲於剝離後馬上於縱方向延伸,藉由剝離張力及其後之搬送張力進行延伸為佳。例如剝離張力為210N/m以上下進行剝離為佳,特佳為220~300N/m。It is preferable to extend in the longitudinal direction immediately after peeling, and it is preferable to extend by the peeling tension and the conveyance tension thereafter. For example, the peeling tension is preferably 210 N/m or more, and particularly preferably 220 to 300 N/m.

乾燥織物(web)之手段並無特別限定,一般可藉由熱風、紅外線、加熱輥、微波等進行,但由簡便之觀點來 看,進行熱風者為佳。The means for drying the web is not particularly limited, and generally can be carried out by hot air, infrared rays, heating rolls, microwaves, etc., but from the viewpoint of simplicity. Look, it is better to carry out hot air.

織物的乾燥步驟中之乾燥溫度為30~200℃以段階性提高方式進行為佳,50~180℃之範圍下進行時,可使尺寸安定性良好而更佳。The drying temperature in the drying step of the fabric is preferably from 30 to 200 ° C in a stepwise manner, and the dimensional stability is better and better when carried out in the range of from 50 to 180 ° C.

纖維素酯薄膜的膜厚並無特別限定以10~200μm為佳。特別為10~70μm之薄膜薄膜中,難得到平面性與耐擦傷性優良的防反射薄膜,而本發明可得到平面性與耐擦傷性皆優良的薄膜之防反射薄膜,且生產性亦優良,故纖維素酯薄膜之膜厚以10~70μm為特佳。更佳為20~60μm。最佳為35~60μm。又,又亦可使用藉由共流延法之多層構成的纖維素酯薄膜。纖維素酯為多層構成的情況下亦具有含紫外線吸收劑與可塑劑之層,此可為核心層、表面層、或其雙方。The film thickness of the cellulose ester film is not particularly limited to 10 to 200 μm. In particular, in the film film of 10 to 70 μm, it is difficult to obtain an antireflection film excellent in planarity and scratch resistance, and the present invention can provide an antireflection film of a film excellent in both planarity and scratch resistance, and is excellent in productivity. Therefore, the film thickness of the cellulose ester film is particularly preferably 10 to 70 μm. More preferably 20 to 60 μm. The best is 35~60μm. Further, a cellulose ester film composed of a plurality of layers of a co-casting method may also be used. When the cellulose ester has a multilayer structure, it also has a layer containing a UV absorber and a plasticizer, which may be a core layer, a surface layer, or both.

本發明的防反射薄膜為寬度1m以上,以使用寬度1.4~4m者為佳。特佳為1.4~3m。超過4m時則搬送困難。又,可使用設有纖維素酯薄膜之硬塗佈層的面中心線平均粗度(Ra)為0.001~1μm者。The antireflection film of the present invention has a width of 1 m or more, and preferably has a width of 1.4 to 4 m. Very good is 1.4~3m. When it exceeds 4m, it is difficult to transport. Further, the surface center line average roughness (Ra) of the hard coat layer provided with the cellulose ester film can be 0.001 to 1 μm.

(熔融流延製膜法)(melt casting film forming method)

纖維素酯薄膜亦可藉由熔融流延製膜法而形成較佳。The cellulose ester film can also be preferably formed by a melt casting film forming method.

未使用溶液流延製膜法中所使用的溶劑(例如二氯甲烷等),藉由加熱熔融的熔融流延之成形法,更詳細可分類為熔融壓出成形法、加壓成形法、吹塑法、射出成形法、吹氣成形法、延伸成形法等。彼等中,欲得到具有優良 的機械性強度及表面精度等之纖維素酯薄膜,以熔融壓出法為佳。The solvent used in the solution casting film forming method (for example, methylene chloride or the like) is not specifically classified into a melt extrusion molding method, a pressure molding method, or a blowing method by a melt-melt casting method by heating and melting. Plastic method, injection molding method, air blowing method, extension molding method, and the like. Among them, want to get excellent A cellulose ester film such as mechanical strength and surface precision is preferably a melt extrusion method.

將纖維素酯及添加劑之混合物進行熱風乾燥或真空乾燥後進行熔融壓出,經T型塑模壓出成薄膜狀,藉由靜電外加法等使其密著於冷卻轉筒,並使其冷卻固化,得到未延伸薄膜。冷卻轉筒之溫度維持於90~150℃為佳。The mixture of the cellulose ester and the additive is subjected to hot air drying or vacuum drying, followed by melt extrusion, and is extruded into a film shape by a T-die, and is adhered to the cooling drum by electrostatic external addition or the like, and is cooled and solidified. , an unstretched film is obtained. The temperature of the cooling drum is preferably maintained at 90 to 150 ° C.

纖維素樹脂與其他視必要所添加的安定化劑等添加劑,可於熔融前進行混合為佳。纖維素樹脂與安定化劑於最初混合更佳。混合可使用混合機等進行,又亦可於纖維素樹脂調製過程中混合。使用混合機時,可使用V型混合機、圓錐螺旋型混合機、水平圓筒型混合機等、亨舍爾攪拌機、螺帶式混合機等一般混合機。The cellulose resin and other additives such as stabilizers to be added as needed may be preferably mixed before melting. It is preferred that the cellulose resin and the stabilizer are initially mixed. The mixing can be carried out using a mixer or the like, or can be mixed in the cellulose resin preparation process. When a mixer is used, a general mixer such as a V-type mixer, a conical spiral type mixer, a horizontal cylinder type mixer, a Henschel mixer, or a ribbon mixer can be used.

如上述將薄膜構成材料混合後,將該混合物可使用壓出機經直接熔融而製膜,但一旦將薄膜構成材料進行顆粒化後,可將該顆粒以壓出機經熔融後製膜。又,薄膜構成材料為含有熔點相異的複數材料時,僅於可熔融熔點較低的材料的溫度下,一旦製作成所謂的米通半熔融物,再將半熔融物投入於壓出機中而製膜。於薄膜構成材料若含有容易熱分解之材料時,以減少熔融次數為目的下,未製造顆粒下進行直接製膜的方法、或如上述作成如米通之半熔融物後再製膜之方法為佳。After the film constituting material is mixed as described above, the mixture can be directly melted by an extruder to form a film. However, once the film constituting material is granulated, the granules can be melted by an extruder to form a film. Further, when the film constituent material contains a plurality of materials having different melting points, the so-called rice pass semi-molten is produced only at the temperature of the material having a lower melt melting point, and the semi-melt is introduced into the extruder. And film making. When the film constituting material contains a material which is easily thermally decomposed, it is preferably a method of directly forming a film without granules for the purpose of reducing the number of times of melting, or a method of forming a film such as a semi-melt of rice tong as described above. .

壓出機可使用可購得之種種壓出機,但以熔融混煉壓出機為佳,單軸壓出機或2軸壓出機皆可。由薄膜構成材料未製造顆粒下進行直接製膜時,因適當的混煉度為必要 ,故使用2軸壓出機為佳,亦可為單軸壓出機、或將螺旋形狀變更為Maddock型、Unimelt型、Dulmage等混煉型之螺旋可得到適度混煉,故可使用。作為薄膜構成材料,一旦使用顆粒或米通半熔融物時,可使用單軸壓出機,亦可使用2軸壓出機。As the extruder, various types of extruders can be used, but a melt-kneading extruder is preferred, and a single-axis extruder or a 2-axis extruder can be used. When the film is made directly from the film, the film is directly formed, and the proper kneading degree is necessary. Therefore, it is preferable to use a two-axis extruder, or a single-axis extruder, or a spiral shape that is changed to a mixed type of Maddock type, Unimelt type, or Dulmage, and can be appropriately kneaded, so that it can be used. As the film constituent material, when a pellet or a rice pass semi-molten is used, a uniaxial extruder or a 2-axis extruder can be used.

壓出機內、及壓出後之冷卻步驟可由氮氣等惰性氣體取代、或藉由減壓可降低氧濃度為佳。The cooling step in the extruder and after the extrusion may be replaced by an inert gas such as nitrogen or the pressure may be lowered to reduce the oxygen concentration.

壓出機內的薄膜構成材料之熔融溫度,依據薄膜構成材料之黏度或吐出量、製造之薄片厚度等其較佳條件相異,但一般而言對於薄膜之玻璃轉移溫度(Tg),以Tg以上,Tg+100℃以下,較佳為Tg+10℃以上,Tg+90℃以下。具體為熔融壓出時之溫度以150~300℃為佳,特佳為180~270℃之範圍。更佳為200~250℃之範圍。The melting temperature of the film constituent material in the extruder varies depending on the viscosity or the amount of the film constituent material, the thickness of the sheet to be produced, and the like, but generally, the glass transition temperature (Tg) of the film is Tg. The above is Tg + 100 ° C or less, preferably Tg + 10 ° C or more, and Tg + 90 ° C or less. Specifically, the temperature at the time of melt extrusion is preferably 150 to 300 ° C, and particularly preferably 180 to 270 ° C. More preferably in the range of 200 to 250 ° C.

壓出時之熔融黏度為10~100000泊,較佳為100~10000泊。The melt viscosity at the time of extrusion is 10 to 100,000 poise, preferably 100 to 10,000 poise.

又,壓出機內之薄膜構成材料的滯留時間較短為佳,5分鐘以內為佳,較佳為3分鐘以內,更佳為2分鐘以內。滯留時間易受控於壓出機1之種類、壓出條件,但藉由調整材料之供給量或L/D、螺旋轉動數、螺旋溝之深度等可縮短滯留時間。Further, the residence time of the film constituent material in the extruder is preferably shorter, preferably within 5 minutes, preferably within 3 minutes, more preferably within 2 minutes. The residence time is easily controlled by the type and extrusion condition of the extruder 1, but the residence time can be shortened by adjusting the supply amount of the material or the L/D, the number of spiral rotations, the depth of the spiral groove, and the like.

以上述壓出機壓出薄膜狀,藉由靜電外加法等密著於冷卻轉筒,並使其冷卻固化,得到未延伸薄膜。冷卻轉筒之溫度維持於90~150℃為佳。The film is extruded by the above-mentioned extruder, adhered to the cooling drum by electrostatic addition or the like, and cooled and solidified to obtain an unstretched film. The temperature of the cooling drum is preferably maintained at 90 to 150 ° C.

本發明所使用的纖維素酯薄膜係以於寬方向或製膜方 向進行延伸製膜之薄膜為特佳。The cellulose ester film used in the present invention is in the wide direction or the film forming side. It is particularly preferable to form a film for extending film formation.

將由前述冷卻轉筒剝離所得之未延伸薄膜介著複數輥群及/或紅外線加熱器等加熱裝置,於纖維素酯之玻璃轉移溫度(Tg)至Tg+100℃的範圍內進行加熱,進行一段或多段縱延伸為佳。The unstretched film obtained by peeling off the cooling drum is heated by a heating device such as a plurality of rolls and/or an infrared heater, and is heated in a range of a glass transition temperature (Tg) of the cellulose ester to a temperature of Tg + 100 ° C for one or more stages. Longitudinal extension is preferred.

繼續,將如上述所得之往縱方向延伸的纖維素酯薄膜進行橫延伸,且施予熱處理為佳。Continuing, the cellulose ester film extending in the longitudinal direction obtained as described above is transversely stretched, and heat treatment is preferably carried out.

熱處理為玻璃轉移溫度(Tg)-20℃~延伸溫度之範圍內,一般於搬運下進行0.5~300秒為佳。The heat treatment is in the range of glass transition temperature (Tg) -20 ° C - extension temperature, and it is generally carried out for 0.5 to 300 seconds under transportation.

經熱處理之薄膜,一般冷卻至玻璃轉移溫度(Tg)以下,切斷薄膜兩端之壓板把持部分後捲取。又,冷卻為每秒100℃以下之冷卻速度下徐徐自最終熱處理溫度冷卻至玻璃轉移溫度(Tg)為佳。The heat-treated film is generally cooled to a temperature below the glass transition temperature (Tg), and the plate holding portion at both ends of the film is cut and then taken up. Further, it is preferable that the cooling is performed at a cooling rate of 100 ° C or less per second from the final heat treatment temperature to the glass transition temperature (Tg).

冷卻之手段並無特別限定,可使用過去公知之手段進行,特別為以複數溫度區域中依序冷卻下,進行此處理時可使薄膜之尺寸安定性提高故較佳。且,冷卻速度為,最終熱處理溫度以T1表示,薄膜自最終熱處理溫度到達Tg之時間以t表示時,由(T1-Tg)/t所求之值。The means for cooling is not particularly limited, and it can be carried out by a conventionally known means, and in particular, it is preferably cooled in a plurality of temperature regions, and it is preferable to carry out the treatment to improve the dimensional stability of the film. Further, the cooling rate is such that the final heat treatment temperature is represented by T1, and the value obtained by (T1-Tg)/t when the film reaches the Tg from the final heat treatment temperature is represented by t.

纖維素酯薄膜使用紫外線吸收劑為佳。The cellulose ester film is preferably an ultraviolet absorber.

作為紫外線吸收劑,波長370nm以下的紫外線之吸收能優良,且由良好液晶顯示性之觀點來看,以波長400nm以上之可見光吸收較少者為佳。As the ultraviolet absorber, the absorption energy of ultraviolet rays having a wavelength of 370 nm or less is excellent, and from the viewpoint of good liquid crystal display properties, it is preferable that the visible light having a wavelength of 400 nm or more is less absorbed.

作為紫外線吸收劑之具體例,例如可舉出氧基二苯甲酮系化合物、苯並三唑系化合物、水楊酸酯系化合物、二 苯甲酮系化合物、氰基丙烯酸酯系化合物、三嗪系化合物、鎳鋯鹽系化合物等。但不限定於此。Specific examples of the ultraviolet absorber include an oxybenzophenone compound, a benzotriazole compound, a salicylate compound, and An benzophenone compound, a cyanoacrylate compound, a triazine compound, a nickel zirconium salt compound, or the like. However, it is not limited to this.

作為苯並三唑系紫外線吸收劑,例如可舉出下述之紫外線吸收劑的具體例,但本發明並未限定於此。Specific examples of the benzotriazole-based ultraviolet absorber include the following ultraviolet absorbers, but the present invention is not limited thereto.

UV-1:2-(2’-羥基-5’-甲基苯基)苯並三唑 UV-2:2-(2’-羥基-3’,5’-二-tert-丁基苯基)苯並三唑 UV-3:2-(2’-羥基-3’-tert-丁基-5’-甲基苯基)苯並三唑 UV-4:2-(2’-羥基-3’,5’-二-tert-丁基苯基)-5-氯苯並三唑 UV-5:2-(2’-羥基-3’-(3”,4”,5”,6”-四氫酞醯亞胺甲基)-5’-甲基苯基)苯並三唑 UV-6:2,2-伸甲基雙(4-(1,1,3,3-四甲基丁基)-6-(2H-苯並三唑-2-基)酚) UV-7:2-(2’-羥基-3’-tert-丁基-5’-甲基苯基)-5-氯苯並三唑 UV-8:2-(2H-苯並三唑-2-基)-6-(直鏈及支鏈月桂基)-4-甲基酚(TINUVIN171、Ciba製) UV-9:辛基-3-[3-tert-丁基-4-羥基-5-(氯-2H-苯並三唑-2-基)苯基]丙酸酯與2-乙基己基-3-[3-tert-丁基-4-羥基-5-(5-氯-2H-苯並三唑-2-基)苯基]丙酸酯之混合物(TINUVIN109、Ciba製)UV-1: 2-(2'-hydroxy-5'-methylphenyl)benzotriazole UV-2: 2-(2'-hydroxy-3',5'-di-tert-butylphenyl)benzotriazole UV-3: 2-(2'-hydroxy-3'-tert-butyl-5'-methylphenyl)benzotriazole UV-4: 2-(2'-hydroxy-3',5'-di-tert-butylphenyl)-5-chlorobenzotriazole UV-5: 2-(2'-hydroxy-3'-(3",4",5",6"-tetrahydroindeninemethyl)-5'-methylphenyl)benzotriazole UV-6: 2,2-extended methyl bis(4-(1,1,3,3-tetramethylbutyl)-6-(2H-benzotriazol-2-yl)phenol) UV-7: 2-(2'-hydroxy-3'-tert-butyl-5'-methylphenyl)-5-chlorobenzotriazole UV-8: 2-(2H-benzotriazol-2-yl)-6-(linear and branched lauryl)-4-methylphenol (TINUVIN171, manufactured by Ciba) UV-9: Octyl-3-[3-tert-butyl-4-hydroxy-5-(chloro-2H-benzotriazol-2-yl)phenyl]propionate and 2-ethylhexyl- Mixture of 3-[3-tert-butyl-4-hydroxy-5-(5-chloro-2H-benzotriazol-2-yl)phenyl]propionate (TINUVIN 109, manufactured by Ciba)

又,作為二苯甲酮系紫外線吸收劑可舉出下述具體例 ,但本發明並未限定於此。Further, examples of the benzophenone-based ultraviolet absorber include the following specific examples. However, the invention is not limited thereto.

UV-10:2,4-二羥基二苯甲酮 UV-11:2,2’-二羥基-4-甲氧基二苯甲酮 UV-12:2-羥基-4-甲氧基-5-磺基二苯甲酮 UV-13:雙(2-甲氧基-4-羥基-5-苯甲醯基苯基甲烷)UV-10: 2,4-dihydroxybenzophenone UV-11: 2,2'-dihydroxy-4-methoxybenzophenone UV-12: 2-hydroxy-4-methoxy-5-sulfobenzophenone UV-13: bis(2-methoxy-4-hydroxy-5-benzylidenephenylmethane)

作為較佳的紫外線吸收劑,以透明性高,具有防止偏光板或液晶劣化之效果的優良苯並三唑系紫外線吸收劑或二苯甲酮系紫外線吸收劑為佳,較少著色的苯並三唑系紫外線吸收劑為特佳。又,作為販賣品,可舉出TINUVIN 326、TINUVIN 109、TINUVIN 171、TINUVIN 900、TINUVIN 928、TINUVIN 360(皆為Ciba Specialty Chemicals公司製)、LA31(旭電化公司製)、Sumisorb250(住友化學公司製)、RUVA-100(大塚化學製)。A preferred benzotriazole-based ultraviolet absorber or benzophenone-based ultraviolet absorber having a high transparency and having an effect of preventing deterioration of a polarizing plate or a liquid crystal is preferable as a preferred ultraviolet absorber, and less colored benzoic acid is preferred. Triazole-based ultraviolet absorbers are particularly preferred. In addition, TINUVIN 326, TINUVIN 109, TINUVIN 171, TINUVIN 900, TINUVIN 928, TINUVIN 360 (all manufactured by Ciba Specialty Chemicals Co., Ltd.), LA31 (made by Asahi Kasei Co., Ltd.), and Sumisorb 250 (manufactured by Sumitomo Chemical Co., Ltd.) ), RUVA-100 (manufactured by Otsuka Chemical Co., Ltd.).

又,特開2001-187825號公報所記載之分配係數為9.2以上之紫外線吸收劑,可提高長尺薄膜之面品質,且亦具有優良塗佈性。特別使用分配係數為10.1以上之紫外線吸收劑時為佳。Further, the ultraviolet absorber having a partition coefficient of 9.2 or more as described in JP-A-2001-187825 can improve the surface quality of the long-length film and also has excellent coatability. In particular, it is preferred to use an ultraviolet absorber having a partition coefficient of 10.1 or more.

又,欲對於纖維素酯薄膜賦予潤滑性,可使用含前述活性線硬化型樹脂的塗佈層所記載之相同微粒子。Further, in order to impart lubricity to the cellulose ester film, the same fine particles described in the coating layer containing the active wire-curable resin can be used.

作為微粒子,其為無機化合物的例子,可舉出二氧化矽、二氧化鈦、氧化鋁、氧化鋯、碳酸鈣、碳酸鈣、滑石、黏土、燒成陶土、燒成矽酸鈣、水和矽酸鈣、矽酸鋁、矽酸鎂及磷酸鈣。微粒子以含有矽者之濁度較低而較佳, 特別以二氧化矽為佳。Examples of the fine particles, which are inorganic compounds, include ceria, titania, alumina, zirconia, calcium carbonate, calcium carbonate, talc, clay, calcined clay, calcined calcium citrate, water, and calcium citrate. , aluminum citrate, magnesium citrate and calcium phosphate. The microparticles have a lower turbidity and are better. In particular, cerium oxide is preferred.

微粒子的一次粒子之平均粒子徑以5~50nm為佳,更佳為7~20nm。其中含有作為主要粒子徑0.05~0.3μm之2次凝集體為佳。含有量以0.05~1質量%為佳,特佳為0.1~0.5質量%。The average particle diameter of the primary particles of the microparticles is preferably 5 to 50 nm, more preferably 7 to 20 nm. It is preferable to contain two secondary aggregates having a main particle diameter of 0.05 to 0.3 μm. The content is preferably 0.05 to 1% by mass, particularly preferably 0.1 to 0.5% by mass.

二氧化矽之微粒子,例如可使用以AerosilR972、R972V、R974、R812、200、200V、300、R202、OX50、TT600(以上日本Aerosil股份有限公司製)之商品名販賣之微粒子。For the fine particles of cerium oxide, for example, fine particles sold under the trade names of Aerosil R972, R972V, R974, R812, 200, 200V, 300, R202, OX50, TT600 (manufactured by Japan Aerosil Co., Ltd.) can be used.

氧化鋯之微粒子,例如可使用以AerosilR976及R811(以上,日本Aerosil股份有限公司製)之商品名販賣者。As the fine particles of zirconia, for example, a commercial name of Aerosil R976 and R811 (above, manufactured by Nippon Aerosil Co., Ltd.) can be used.

作為微粒子使用聚合物粒子時,作為聚合物的例子,可舉出聚矽氧烷樹脂、氟樹脂及丙烯酸樹脂。聚矽氧烷樹脂為佳,特別以具有三次元網狀結構者為佳,例如,可使用以Tospearl103、同105、同108、同120、同145、同3120及同240(以上東芝聚矽氧烷股份有限公司製)的商品名販賣者。When polymer particles are used as the fine particles, examples of the polymer include a polyoxyalkylene resin, a fluororesin, and an acrylic resin. Polyoxyalkylene resin is preferred, especially those having a three-dimensional network structure, for example, Tospearl 103, the same 105, the same 108, the same 120, the same 145, the same 3120 and the same 240 (above Toshiba polyoxyl Trade name vendor of alkane co., Ltd.).

其中亦以Aerosil200V、AerosilR972V可維持較低濁度下,具有降低摩擦係數之效果,故為特佳。Among them, Aerosil 200V and Aerosil R972V are particularly good at maintaining a low turbidity and having a friction coefficient lowering effect.

又,纖維素酯薄膜中亦可含有以下所說明之劣化防止劑為佳。繼續對劣化防止劑作說明。Further, the cellulose ester film may preferably contain a deterioration preventing agent described below. The deterioration preventing agent will be described.

(劣化防止劑)(deterioration inhibitor)

所謂劣化防止劑為,高分子因熱或氧、水分、酸等所造成的分解可藉由化學作用抑制之材料。本發明之光學薄膜特別為200℃以上高溫下成形,故其為容易產生高分子分解.劣化之系統,將劣化防止劑含於光學薄膜中者為佳。The deterioration preventing agent is a material which can be inhibited by chemical action due to decomposition of the polymer by heat, oxygen, moisture, acid or the like. The optical film of the invention is formed at a high temperature of 200 ° C or higher, so that it is easy to cause decomposition of the polymer. In the system of deterioration, it is preferred that the deterioration preventing agent is contained in the optical film.

使用光學薄膜之氧化防止、分解所產生的酸捕捉、抑制或禁止光或熱所引起的自由基種基因之分解反應等包含未解明之分解反應,且抑制著色或分子量降低為主的變質或材料分解所引起的揮發成分生成之劣化防止劑。Using an acid generated by oxidation prevention or decomposition of an optical film to capture, inhibit or inhibit decomposition reaction of a radical gene caused by light or heat, etc., and a deterioration or material containing an unresolved decomposition reaction and suppressing coloration or molecular weight reduction. Deterioration inhibitor which is formed by decomposition of volatile components.

作為劣化防止劑,例如可舉出抗氧化劑、受阻胺光安定劑、酸捕捉劑、金屬惰性化劑等,但並未限定於此。這些記載於特開平3-199201號公報、特開平5-1907073號公報、特開平5-194789號公報、特開平5-271471號公報、特開平6-107854號公報等。彼等中,欲達到本發明之目的,可於光學薄膜中含有作為劣化防止劑之抗氧化劑者為佳。Examples of the deterioration preventing agent include an antioxidant, a hindered amine light stabilizer, an acid scavenger, and a metal inerting agent, but are not limited thereto. These are described in Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Among them, in order to achieve the object of the present invention, it is preferred that the optical film contains an antioxidant as a deterioration preventing agent.

本發明之光學薄膜形成材料中的劣化防止劑可選擇至少1種以上,添加量對於本發明之纖維素酯100質量%而言,劣化防止劑之添加量以0.01質量%以上10質量%以下為佳,較佳為0.1質量%以上5.0質量%以下,更佳為0.2質量%以上2.0質量%以下。The amount of the deterioration preventing agent in the optical film forming material of the present invention may be at least one selected from the group consisting of the amount of the cellulose ester of the present invention, and the amount of the deterioration preventing agent added is 0.01% by mass or more and 10% by mass or less. Preferably, it is 0.1% by mass or more and 5.0% by mass or less, more preferably 0.2% by mass or more and 2.0% by mass or less.

薄膜形成材料以迴避材料之變質或吸濕性為目的,可將構成之材料分割為1種或複數種顆粒而保存。顆粒化可提高加熱時熔融物之混合性或相溶性、或可確保所得之薄 膜的光學均一性。The film forming material may be formed by dividing the constituent material into one or a plurality of kinds of particles for the purpose of avoiding deterioration or hygroscopicity of the material. Granulation improves the miscibility or compatibility of the melt during heating, or ensures that the resulting thin Optical uniformity of the film.

(抗氧化劑)(Antioxidants)

又,纖維素酯薄膜中含有以下所說明之抗氧化劑為佳。作為抗氧化劑,僅為可抑制氧所引起的薄膜形成材料劣化的化合物即可,並無特別限定,其中可舉出酚系抗氧化劑、磷系抗氧化劑、硫磺系抗氧化劑、烷基自由基捕捉劑、過氧化物分解劑、氧掃除劑等。其中亦以酚系抗氧化劑、磷系抗氧化劑、烷基自由基捕捉劑為佳,組合酚系抗氧化劑與磷系抗氧化劑之兩者為佳,組合酚系抗氧化劑與磷系抗氧化劑與烷基自由基捕捉劑之3者為最佳。藉由添加這些化合物,不僅不會降低透明性、耐熱性等,可防止熔融成型時之熱或熱氧化劣化等所造成的成形體著色或強度降低。這些抗氧化劑可各單獨、或組合2種以上使用,其添加量以不損害本發明之目的的範圍下適宜選擇,對於本發明之纖維素酯的質量而言,以0.01質量%以上10質量%以下為佳,較佳為0.1質量%以上5.0質量%以下,更佳為0.2質量%以上2.0質量%以下。Further, the cellulose ester film preferably contains the antioxidant described below. The antioxidant is not particularly limited as long as it can suppress deterioration of the thin film forming material by oxygen, and examples thereof include a phenolic antioxidant, a phosphorus antioxidant, a sulfur antioxidant, and an alkyl radical scavenging. Agent, peroxide decomposing agent, oxygen sweeping agent, and the like. Among them, a phenolic antioxidant, a phosphorus antioxidant, an alkyl radical scavenger is preferred, and a combination of a phenolic antioxidant and a phosphorus antioxidant is preferred, and a phenolic antioxidant and a phosphorus antioxidant and an alkane are combined. The three radical scavengers are the best. By adding these compounds, not only the transparency, heat resistance and the like are not lowered, but also the coloring or strength reduction of the molded body due to heat or thermal oxidative degradation during melt molding can be prevented. These antioxidants may be used singly or in combination of two or more kinds, and the amount thereof is appropriately selected insofar as the object of the present invention is not impaired, and the quality of the cellulose ester of the present invention is 0.01% by mass or more and 10% by mass. The following is preferable, and it is preferably 0.1% by mass or more and 5.0% by mass or less, more preferably 0.2% by mass or more and 2.0% by mass or less.

(酚系抗氧化劑)(phenolic antioxidants)

酚系化合物為已知化合物,對-t-丁基酚、對-(1,1,3,3-四甲基丁基)酚等的烷基取代酚以外,例如可舉出美國專利第4,839,405號說明書之第12~14欄所記載的2,6-二烷基酚衍生物化合物、所謂之受阻酚系化合物,其 中以受阻酚系化合物為佳。The phenolic compound is a known compound, and examples of the alkyl-substituted phenol such as p-t-butylphenol or p-(1,1,3,3-tetramethylbutyl)phenol include, for example, U.S. Patent No. 4,839,405. The 2,6-dialkylphenol derivative compound described in the columns 12 to 14 of the specification, the so-called hindered phenol compound, A hindered phenolic compound is preferred.

作為受阻酚酚系化合物之具體例,可舉出n-十八烷基3-(3,5-二-t-丁基-4-羥基苯基)-丙酸酯、n-十八烷基3-(3,5-二-t-丁基-4-羥基苯基)-乙酸酯、n-十八烷基3,5-二-t-丁基-4-羥基苯甲酸酯、n-己基3,5-二-t-丁基-4-羥基苯基苯甲酸酯、n-月桂基3,5-二-t-丁基-4-羥基苯基苯甲酸酯、新-月桂基3-(3,5-二-t-丁基-4-羥基苯基)乙酸酯、月桂基β(3,5-二-t-丁基-4-羥基苯基)丙酸酯、乙基α-(4-羥基-3,5-二-t-丁基苯基)異丁酸酯、十八烷基α-(4-羥基-3,5-二-t-丁基苯基)異丁酸酯、十八烷基α-(4-羥基-3,5-二-t-丁基-4-羥基苯基)丙酸酯、2-(n-辛基硫)乙基3,5-二-t-丁基-4-羥基-苯甲酸酯、2-(n-辛基硫)乙基3,5-二-t-丁基-4-羥基-苯基乙烯酸酯、2-(n-十八烷基硫)乙基3,5-二-t-丁基-4-羥基苯基乙酸酯、2-(n-十八烷基硫)乙基3,5-二-t-丁基-4-羥基-苯甲酸酯、2-(2-羥基乙基硫)乙基3,5-二-t-丁基-4-羥基苯甲酸酯、二乙基二醇雙-(3,5-二-t-丁基-4-羥基-苯基)丙酸酯、2-(n-十八烷基硫)乙基3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯、硬脂醯胺N,N-雙-[伸乙基3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、n-丁基亞胺N,N-雙-[伸乙基3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、2-(2-硬脂醯氧基乙基硫)乙基3,5-二-t-丁基-4-羥基苯甲酸酯、2-(2-硬脂醯氧基乙基硫)乙基7-(3-甲基-5-t-丁基-4-羥基苯基)庚酸酯、1,2-丙二醇雙-[3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、乙二醇雙-[3-( 3,5-二-t-丁基-4-羥基苯基)丙酸酯]、新戊基二醇雙-[3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、乙二醇雙-(3,5-二-t-丁基-4-羥基苯基乙酸酯)、甘油-l-n-十八烷酸酯-2,3-雙-(3,5-二-t-丁基-4-羥基苯基丙烯酸酯)、季戊四醇-肆-[3-(3’,5’-二-t-丁基-4’-羥基苯基)丙酸酯]、1,1,1-三羥甲基乙烷-參-[3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、山梨糖醇六-[3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯]、2-羥基乙基7-(3-甲基-5-t丁基-4-羥基苯基)丙酸酯、2-硬脂醯氧基乙基7-(3-甲基-5-t-丁基-4-羥基苯基)庚酸酯、1,6-n-己二醇-雙[(3’,5’-二-t-丁基-4-羥基苯基)丙酸酯]、季戊四醇-肆(3,5-二-t-丁基-4-羥基氫肉桂酸酯)。上述型式的酚化合物,例如可由Ciba Specialty Chemicals以「IRGANOX1076」及「IRGANOX1010」之商品名購得。Specific examples of the hindered phenol phenol-based compound include n-octadecyl 3-(3,5-di-t-butyl-4-hydroxyphenyl)-propionate and n-octadecyl group. 3-(3,5-di-t-butyl-4-hydroxyphenyl)-acetate, n-octadecyl 3,5-di-t-butyl-4-hydroxybenzoate, N-hexyl 3,5-di-t-butyl-4-hydroxyphenyl benzoate, n-lauryl 3,5-di-t-butyl-4-hydroxyphenyl benzoate, new - lauryl 3-(3,5-di-t-butyl-4-hydroxyphenyl)acetate, lauryl β(3,5-di-t-butyl-4-hydroxyphenyl)propionic acid Ester, ethyl α-(4-hydroxy-3,5-di-t-butylphenyl) isobutyrate, octadecyl α-(4-hydroxy-3,5-di-t-butyl Phenyl)isobutyrate, octadecyl α-(4-hydroxy-3,5-di-t-butyl-4-hydroxyphenyl)propionate, 2-(n-octylthio)B 3,5-di-t-butyl-4-hydroxy-benzoate, 2-(n-octylthio)ethyl 3,5-di-t-butyl-4-hydroxy-phenylethylene Acid ester, 2-(n-octadecylthio)ethyl 3,5-di-t-butyl-4 Hydroxyphenyl acetate, 2-(n-octadecylthio)ethyl 3,5-di-t-butyl-4-hydroxy-benzoate, 2-(2-hydroxyethylsulfide) Ethyl 3,5-di-t-butyl-4-hydroxybenzoate, diethyl bis-bis(3,5-di-t-butyl-4-hydroxy-phenyl)propionate , 2-(n-octadecylthio)ethyl 3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, stearylamine N,N-bis-[stretch Ethyl 3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], n-butylimine N,N-bis-[stretch ethyl 3-(3,5- Di-t-butyl-4-hydroxyphenyl)propionate], 2-(2-stearyloxyethylthio)ethyl 3,5-di-t-butyl-4-hydroxybenzoate Acid ester, 2-(2-stearyloxyethylthio)ethyl 7-(3-methyl-5-t-butyl-4-hydroxyphenyl)heptanoate, 1,2-propanediol double -[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], ethylene glycol bis-[3-( 3,5-di-t-butyl-4-hydroxyphenyl)propionate], neopentyl glycol bis-[3-(3,5-di-t-butyl-4-hydroxyphenyl) Propionate], ethylene glycol bis-(3,5-di-t-butyl-4-hydroxyphenyl acetate), glycerol-l-n-octadecanoate-2,3-bis- (3,5-di-t-butyl-4-hydroxyphenyl acrylate), pentaerythritol-indole-[3-(3',5'-di-t-butyl-4'-hydroxyphenyl)propane Acid ester], 1,1,1-trishydroxymethylethane-para-[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], sorbitol six- [3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 2-hydroxyethyl 7-(3-methyl-5-tbutyl-4-hydroxyphenyl) Propionate, 2-stearyloxyethyl 7-(3-methyl-5-t-butyl-4-hydroxyphenyl)heptanoate, 1,6-n-hexanediol-double [(3',5'-Di-t-butyl-4-hydroxyphenyl)propionate], pentaerythritol-indole (3,5-di-t-butyl-4-hydroxyhydrocinnamate). The phenolic compound of the above type is commercially available, for example, from Ciba Specialty Chemicals under the trade names "IRGANOX 1076" and "IRGANOX 1010".

(磷系抗氧化劑)(phosphorus antioxidants)

作為磷系抗氧化劑,可舉出亞磷酸酯系化合物、及亞膦酸酯系化合物。作為亞磷酸酯系化合物之具體例,可舉出三苯基亞磷酸酯、二苯基異癸基亞磷酸酯、苯基二-異癸基亞磷酸酯、參(壬基苯基)亞磷酸酯、參(二-壬基苯基)亞磷酸酯、參(2,4-二-t-丁基苯基)亞磷酸酯、參(2,4-二-t-丁基-5-甲基苯基)亞磷酸酯、10-(3,5-二-t-丁基-4-羥基苯甲基)-9,10-二-氫-9-噁-10-膦菲-10-氧化物、6-[3-(3-t-丁基-4-羥基-5-甲基苯基)丙氧基]-2,4,8,10- 四-t-丁基二-苯並[d,f][1.3.2]dioxaphosphepine、十三烷基亞磷酸酯等單亞磷酸酯系化合物;4,4’-亞丁基-雙(3-甲基-6-t-丁基苯基-二-十三烷基亞磷酸酯)、4,4’-異亞丙基-雙(苯基-二-烷基(C12~C15)亞磷酸酯)等二-亞磷酸酯系化合物等。上述型式的亞磷酸酯系化合物,例如可使用由住友化學股份有限公司購得之「SumilizerGP」、由旭電化工業股份有限公司購得之「ADK STAB PEP-24G」、「ADK STAB PEP-36」、「ADK STAB 3010」、「ADK STAB HP-10」及「ADK STAB 2112」之商品名。Examples of the phosphorus-based antioxidant include a phosphite-based compound and a phosphonite-based compound. Specific examples of the phosphite-based compound include triphenyl phosphite, diphenyl isononyl phosphite, phenyl di-isodecyl phosphite, and decyl (decylphenyl) phosphorous acid. Ester, ginseng (di-nonylphenyl) phosphite, ginseng (2,4-di-t-butylphenyl) phosphite, ginseng (2,4-di-t-butyl-5-methyl) Phenyl phosphite, 10-(3,5-di-t-butyl-4-hydroxybenzyl)-9,10-di-hydro-9-oxo-10-phosphaphenan-10-oxidation ,6-[3-(3-t-butyl-4-hydroxy-5-methylphenyl)propoxy]-2,4,8,10- a monophosphite compound such as tetra-t-butyldi-benzo[d,f][1.3.2]dioxaphosphepine or tridecylphosphite; 4,4'-butylene-bis(3-甲-6-t-butylphenyl-di-tridecyl phosphite), 4,4'-isopropylidene-bis(phenyl-di-alkyl (C12-C15) phosphite) A di-phosphite compound or the like. For the phosphite-based compound of the above type, for example, "Sumilizer GP" available from Sumitomo Chemical Co., Ltd., "ADK STAB PEP-24G" purchased from Asahi Kasei Kogyo Co., Ltd., and "ADK STAB PEP-36" can be used. The trade names of "ADK STAB 3010", "ADK STAB HP-10" and "ADK STAB 2112".

作為亞膦酸酯系化合物之具體例,可舉出二甲基-苯基亞膦酸酯、二-t-丁基-苯基亞膦酸酯、二苯基-苯基亞膦酸酯、二-(4-戊基-苯基)-苯基亞膦酸酯、二-(2-t-丁基-苯基)-苯基亞膦酸酯、二-(2-甲基-3-戊基-苯基)-苯基亞膦酸酯、二-(2-甲基-4-辛基-苯基)-苯基亞膦酸酯、二-(3-丁基-4-甲基-苯基)-苯基亞膦酸酯、二-(3-己基-4-乙基-苯基)-苯基亞膦酸酯、二-(2,4,6-三甲基苯基)-苯基亞膦酸酯、二-(2,3-二甲基-4-乙基-苯基)-苯基亞膦酸酯、二-(2,6-二乙基-3-丁基苯基)-苯基亞膦酸酯、二-(2,3-二丙基-5-丁基苯基)-苯基亞膦酸酯、二-(2,4,6-三-t-丁基苯基)-苯基亞膦酸酯、雙(2,4-二-t-丁基-5-甲基苯基)聯苯基-4-基-亞膦酸酯、雙(2,4-二-t-丁基-5-甲基苯基)-4’-(雙(2,4-二-t-丁基-5-甲基苯氧基)膦)聯苯基-4-基-亞膦酸酯、肆(2,4-二-t-丁基-苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二-t-丁基-苯基)- 4,4’-亞聯苯基二-亞膦酸酯、肆(3,5-二-t-丁基-苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3,4-三甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3-二甲基-5-乙基-苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3-二甲基-4-丙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3-二甲基-5-t-丁基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二甲基-4-t-丁基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3-二乙基-5-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二乙基-4-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4,5-三乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二乙基-4-丙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二乙基-6-丁基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3-二乙基-5-t-丁基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二乙基-6-t-丁基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3-二丙基-5-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二丙基-4-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二丙基-5-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3-二丙基-6-丁基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二丙基-5-丁基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3-二丁基-4-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二丁基-3-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二丁基-4-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4-二-t-丁基-3-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4-二-t-丁基-5-甲 基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4-二-t-丁基-6-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二-t-丁基-3-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二-t-丁基-4-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二-t-丁基-6-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二-t-丁基-3-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二-t-丁基-4-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二-t-丁基-5-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3-二丁基-4-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4-二丁基-3-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二丁基-4-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4-二-t-丁基-3-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4-二-t-丁基-5-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4-二-t-丁基-6-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二-t-丁基-3-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二-t-丁基-4-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二-t-丁基-6-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二-t-丁基-3-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二-t-丁基-4-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二-t-丁基-5-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3,4-三丁基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4,6-三-t-丁基苯基)-4,4’-亞聯苯基二-亞膦酸酯等。上述型式的磷系化合物,例如可使用由Ciba Specialty Chemicals股份有限公司購得之「IRGAFOSP-EPQ」、由堺化學工業股份有限公司購得之「GSY-P101」商品名。Specific examples of the phosphonite-based compound include dimethyl-phenylphosphinate, di-t-butyl-phenylphosphinate, and diphenyl-phenylphosphinate. Di-(4-pentyl-phenyl)-phenylphosphinate, bis-(2-t-butyl-phenyl)-phenylphosphinate, bis-(2-methyl-3- Amyl-phenyl)-phenylphosphinate, bis-(2-methyl-4-octyl-phenyl)-phenylphosphinate, bis-(3-butyl-4-methyl -phenyl)-phenylphosphinate, bis-(3-hexyl-4-ethyl-phenyl)-phenylphosphinate, bis-(2,4,6-trimethylphenyl) -phenylphosphonite, bis-(2,3-dimethyl-4-ethyl-phenyl)-phenylphosphinate, bis-(2,6-diethyl-3-butyl Phenyl)-phenylphosphinate, bis-(2,3-dipropyl-5-butylphenyl)-phenylphosphinate, di-(2,4,6-tri-t- Butylphenyl)-phenylphosphinate, bis(2,4-di-t-butyl-5-methylphenyl)biphenyl-4-yl-phosphinate, bis(2, 4-di-t-butyl-5-methylphenyl)-4'-(bis(2,4-di-t-) Butyl-5-methylphenoxy)phosphine)biphenyl-4-yl-phosphinate, bismuth(2,4-di-t-butyl-phenyl)-4,4'-subcontinent Phenyl di-phosphinate, bismuth (2,5-di-t-butyl-phenyl)- 4,4'-biphenylene di-phosphinate, bismuth (3,5-di-t-butyl-phenyl)-4,4'-biphenylene di-phosphinate, hydrazine (2,3,4-trimethylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,3-dimethyl-5-ethyl-phenyl)-4 , 4'-biphenylene di-phosphinate, bismuth (2,3-dimethyl-4-propylphenyl)-4,4'-biphenylene di-phosphinate, hydrazine (2,3-Dimethyl-5-t-butylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,5-dimethyl-4-t-butyl Phenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,3-diethyl-5-methylphenyl)-4,4'-biphenylene di- Phosphonate, bismuth (2,6-diethyl-4-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,4,5-triethyl) Phenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-diethyl-4-propylphenyl)-4,4'-biphenylene di-- Phosphonate, bismuth (2,5-diethyl-6-butylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,3-diethyl-5-) T-butylphenyl)-4, 4'-biphenylene di-phosphinate, bismuth (2,5-diethyl-6-t-butylphenyl)-4,4'-biphenylene di-phosphinate, Bis(2,3-dipropyl-5-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-dipropyl-4-methylphenyl) -4,4'-biphenylene di-phosphinate, bismuth (2,6-dipropyl-5-ethylphenyl)-4,4'-biphenylene di-phosphinic acid Ester, bismuth (2,3-dipropyl-6-butylphenyl)-4,4'-biphenylene di-phosphinate, hydrazine (2,6-dipropyl-5-butyl Phenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,3-dibutyl-4-methylphenyl)-4,4'-biphenylene di-- Phosphonate, bismuth (2,5-dibutyl-3-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-dibutyl-4- Methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,4-di-t-butyl-3-methylphenyl)-4,4'-Asian Phenyl di-phosphinate, bismuth (2,4-di-t-butyl-5-A Phenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,4-di-t-butyl-6-methylphenyl)-4,4'-biphenyl Di-phosphonite, bismuth (2,5-di-t-butyl-3-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,5 -di-t-butyl-4-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,5-di-t-butyl-6-methylbenzene -4,4'-biphenylene di-phosphinate, bismuth (2,6-di-t-butyl-3-methylphenyl)-4,4'-biphenylene - phosphonite, bismuth (2,6-di-t-butyl-4-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-di -t-butyl-5-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,3-dibutyl-4-ethylphenyl)-4, 4'-biphenylene di-phosphinate, bismuth (2,4-dibutyl-3-ethylphenyl)-4,4'-biphenylene di-phosphinate, hydrazine 2,5-Dibutyl-4-ethylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,4-di-t-butyl-3-ethylbenzene Base)-4,4' Biphenylene diphosphite, bismuth (2,4-di-t-butyl-5-ethylphenyl)-4,4'-biphenylene di-phosphinate, hydrazine 2,4-di-t-butyl-6-ethylphenyl)-4,4'-biphenylene di-phosphinate, hydrazine (2,5-di-t-butyl-3- Ethylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,5-di-t-butyl-4-ethylphenyl)-4,4'-Asian Phenyl di-phosphinate, bismuth (2,5-di-t-butyl-6-ethylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2, 6-di-t-butyl-3-ethylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-di-t-butyl-4-ethyl Phenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-di-t-butyl-5-ethylphenyl)-4,4'-biphenylene Di-phosphonite, bismuth (2,3,4-tributylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,4,6-tri-t- Butylphenyl)-4,4'-biphenylene di-phosphinate. Phosphorus compounds of the above type can be used, for example, by Ciba "IRGAFOSP-EPQ" purchased by Specialty Chemicals Co., Ltd., and "GSY-P101" trade name purchased by Daiei Chemical Industry Co., Ltd.

作為磷系抗氧化劑,以亞膦酸酯系化合物為佳,其中亦以肆(2,4-二-t-丁基-苯基)-4,4’-亞聯苯基二-亞膦酸酯等4,4’-亞聯苯基二-亞膦酸酯化合物為佳,特佳者為肆(2,4-二-t-丁基-5-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯。As the phosphorus-based antioxidant, a phosphonite-based compound is preferable, and bis(2,4-di-t-butyl-phenyl)-4,4'-biphenylene di-phosphinic acid is also used. 4,4'-biphenylene di-phosphonite compound such as ester is preferred, and bis(2,4-di-t-butyl-5-methylphenyl)-4,4' is particularly preferred. - a biphenylene di-phosphinate.

(烷基自由基捕捉劑)(alkyl radical scavenger)

纖維素酯薄膜中含有以下說明之烷基自由基捕捉劑為佳。其中所謂烷基自由基捕捉劑為,具有使烷基自由基快速反應之基,且與烷基自由基進行反應後不會引起後續反應之賦予安定生成物的化合物。The cellulose ester film preferably contains an alkyl radical scavenger described below. The alkyl radical scavenger is a compound having a group which rapidly reacts with an alkyl radical and which does not cause a subsequent reaction after reacting with an alkyl radical.

作為烷基自由基捕捉劑可使用由住友化學股份有限公司購得之「SumilizerGM」、「SumilizerGS」之商品名。As the alkyl radical scavenger, the trade names of "Sumilizer GM" and "Sumilizer GS" available from Sumitomo Chemical Co., Ltd. can be used.

(受阻胺光安定劑)(hindered amine light stabilizer)

纖維素酯薄膜中,作為薄膜形成材料的熱熔融時之劣化防止劑、又由對於製造後作為偏光子保護薄膜被曝曬的外光或液晶顯示器之背光的光而言之劣化防止劑,添加受阻胺光安定劑(HALS)化合物時為佳。作為受阻胺光安定劑,例如含有美國專利第4,619,956號說明書之第5~11欄及美國專利第4,839,405號說明書之第3~5欄所記載的2,2,6,6-四烷基哌啶化合物、或這些酸加成鹽或這些 與金屬化合物之錯合物。In the cellulose ester film, the deterioration preventing agent in the case of heat-melting of the film forming material, and the deterioration preventing agent for the light of the backlight which is exposed as a polarizer protective film after the production or the backlight of the liquid crystal display are hindered from being added. Amine light stabilizer (HALS) compounds are preferred. As the hindered amine light stabilizer, for example, the 2,2,6,6-tetraalkylpiperidines described in the columns 5 to 11 of the specification of U.S. Patent No. 4,619,956 and the third to fifth columns of the specification of U.S. Patent No. 4,839,405. a compound, or an acid addition salt or these A complex with a metal compound.

作為受阻胺光安定劑之具體例,例如可舉出雙(2,2,6,6-四甲基-4-哌啶)癸二酸酯、雙(2,2,6,6-四甲基-4-哌啶)琥珀酸酯、雙(1,2,2,6,6-五甲基-4-哌啶)癸二酸酯、雙(N-辛氧基-2,2,6,6-四甲基-4-哌啶)癸二酸酯、雙(N-苯甲氧基2,2,6,6-四甲基-4-哌啶)癸二酸酯、雙(N-環己氧基2,2,6,6-四甲基-4-哌啶)癸二酸酯、雙(1,2,2,6,6-五甲基-4-哌啶)2-(3,5-二-t-丁基-4-羥基苯甲基)-2-丁基丙二酸酯、雙(1-丙烯醯-2,2,6,6-四甲基-4-哌啶)2,2-雙(3,5-二-t-丁基-4-羥基苯甲基)-2-丁基丙二酸酯、雙(1,2,2,6,6-五甲基-4-哌啶)癸二酸酯、2,2,6,6-四甲基-4-哌啶甲基丙烯酸酯、4-[3-(3,5-二-t-丁基-4-羥基苯基)丙醯基氧基]-1-[2-(3-(3,5-二-t-丁基-4-羥基苯基)丙醯基氧基)乙基]-2,2,6,6-四甲基哌啶、2-甲基-2-(2,2,6,6-四甲基-4-哌啶)胺基-N-(2,2,6,6-四甲基-4-哌啶)丙醯胺、肆(2,2,6,6-四甲基-4-哌啶)1,2,3,4-丁四羧酸酯、肆(1,2,2,6,6-五甲基-4-哌啶)1,2,3,4-丁四羧酸酯等。Specific examples of the hindered amine light stabilizer include bis(2,2,6,6-tetramethyl-4-piperidine) sebacate and bis(2,2,6,6-tetramethyl). 4-piperidine) succinate, bis(1,2,2,6,6-pentamethyl-4-piperidine) sebacate, bis(N-octyloxy-2,2,6 ,6-tetramethyl-4-piperidine) sebacate, bis(N-benzyloxy 2,2,6,6-tetramethyl-4-piperidine) sebacate, double (N -cyclohexyloxy 2,2,6,6-tetramethyl-4-piperidine) sebacate, bis(1,2,2,6,6-pentamethyl-4-piperidine)2- (3,5-di-t-butyl-4-hydroxybenzyl)-2-butylmalonate, bis(1-propenyl-2,2,6,6-tetramethyl-4- Piperidine) 2,2-bis(3,5-di-t-butyl-4-hydroxybenzyl)-2-butylmalonate, bis(1,2,2,6,6-five Methyl-4-piperidine) sebacate, 2,2,6,6-tetramethyl-4-piperidine methacrylate, 4-[3-(3,5-di-t-butyl 4-hydroxyphenyl)propanyloxy]-1-[2-(3-(3,5-di-t-butyl-4-hydroxyphenyl)propanyloxy)ethyl]- 2,2,6,6-tetramethylpiperidine, 2-methyl-2-(2,2,6,6-tetramethyl 4-piperidinyl)amino-N-(2,2,6,6-tetramethyl-4-piperidine)propanamine, hydrazine (2,2,6,6-tetramethyl-4-piperidine ) 1,2,3,4-butanetetracarboxylate, hydrazine (1,2,2,6,6-pentamethyl-4-piperidine) 1,2,3,4-butanetetracarboxylate, etc. .

又,可為高分子型之化合物,作為具體例可舉出N,N’,N”,N”’-肆-[4,6-雙-[丁基-(N-甲基-2,2,6,6-四甲基哌啶4-基)胺基]-三嗪2-基]-4,7-二-氮雜癸烷基-1,10-二胺、二丁胺與1,3,5-三嗪N,N’-雙(2,2,6,6-四甲基-4-哌啶)-1,6-六伸甲基二胺與N-(2,2,6,6-四甲基-4-哌啶)丁胺之縮聚物、二丁胺與1,3,5-三嗪與N,N’-雙(2,2,6,6-四甲 基-4-哌啶)丁胺之縮聚物、聚[{(1,1,3,3-四甲基丁基)胺基-1,3,5-三嗪2,4-二-基}{(2,2,6,6-四甲基-4-哌啶)亞胺}六伸甲基{(2,2,6,6-四甲基-4-哌啶)亞胺}]、1,6-己烷二胺-N,N’-雙(2,2,6,6-四甲基-4-哌啶)與嗎啉-2,4,6-三氯-1,3,5-三嗪之縮聚物、聚[(6-嗎啉代-s-三嗪2,4-二-基)[(2,2,6,6-四甲基-4-哌啶)亞胺]-六伸甲基[(2,2,6,6-四甲基-4-哌啶)亞胺]]等哌啶環介著三嗪骨架以複數結合的高分子量HALS;琥珀酸二甲基與4-羥基-2,2,6,6-四甲基-1-哌啶乙醇的聚合物、1,2,3,4-丁四羧酸與1,2,2,6,6-五甲基-4-哌啶醇與3,9-雙(2-羥基-1,1-二甲基乙基)-2,4,8,10-四噁-螺-[5,5]十一烷之混合酯化物等哌啶環介著酯鍵結合之化合物等,但並未限定於此。Further, it may be a polymer type compound, and specific examples thereof include N,N',N",N"'-肆-[4,6-bis-[butyl-(N-methyl-2,2) ,6,6-tetramethylpiperidin-4-yl)amino]-triazine 2-yl]-4,7-di-azaindole-1,10-diamine, dibutylamine and 1, 3,5-triazine N,N'-bis(2,2,6,6-tetramethyl-4-piperidine)-1,6-hexamethyldiamine and N-(2,2,6 , 6-tetramethyl-4-piperidine) butylamine polycondensate, dibutylamine and 1,3,5-triazine with N,N'-bis(2,2,6,6-tetramethyl Polycondensate of benzyl-4-piperidine)butylamine, poly[{(1,1,3,3-tetramethylbutyl)amino-1,3,5-triazine 2,4-di-yl} {(2,2,6,6-tetramethyl-4-piperidine)imide}hexamethyl{(2,2,6,6-tetramethyl-4-piperidine)imine}], 1,6-hexanediamine-N,N'-bis(2,2,6,6-tetramethyl-4-piperidine) and morpholine-2,4,6-trichloro-1,3, Polycondensate of 5-triazine, poly[(6-morpholino-s-triazine 2,4-di-yl)[(2,2,6,6-tetramethyl-4-piperidine)imine a high molecular weight HALS with a plurality of piperidine rings via a triazine skeleton; a succinic acid dimethyl group; a polymer of 4-hydroxy-2,2,6,6-tetramethyl-1-piperidineethanol, 1,2,3,4-butanetetracarboxylic acid and 1,2,2,6,6- Pentamethyl-4-piperidinol and 3,9-bis(2-hydroxy-1,1-dimethylethyl)-2,4,8,10-tetraoxo-spiro-[5,5] A piperidine ring such as a mixed ester of monoalkane is a compound in which an ester bond is bonded, but is not limited thereto.

其中亦以二丁胺與1,3,5-三嗪與N,N’-雙(2,2,6,6-四甲基-4-哌啶)丁胺之縮聚物、聚[{(1,1,3,3-四甲基丁基)胺基-1,3,5-三嗪2,4-二-基}{(2,2,6,6-四甲基-4-哌啶)亞胺}六伸甲基{(2,2,6,6-四甲基-4-哌啶)亞胺}]、琥珀酸二甲基與4-羥基-2,2,6,6-四甲基-1-哌啶乙醇的聚合物等數平均分子量(Mn)為2,000~5,000者為佳。Among them, polycondensate of dibutylamine and 1,3,5-triazine with N,N'-bis(2,2,6,6-tetramethyl-4-piperidine)butylamine, poly[{( 1,1,3,3-tetramethylbutyl)amino-1,3,5-triazine 2,4-di-yl}{(2,2,6,6-tetramethyl-4-piperidin Acridine)imine}hexamethyl{(2,2,6,6-tetramethyl-4-piperidine)imine}], dimethyl succinate and 4-hydroxy-2,2,6,6 The polymer having a number average molecular weight (Mn) of tetramethyl-1-piperidineethanol is preferably 2,000 to 5,000.

上述型式的受阻胺化合物,例如可使用由Ciba Specialty Chemicals購得之「TINUVIN144」及「TINUVIN770」、由旭電化工業股份有限公司購得之「ADK STAB LA-52」之商品名。For the hindered amine compound of the above type, for example, "TINUVIN 144" and "TINUVIN 770" available from Ciba Specialty Chemicals, and "ADK STAB LA-52" available from Asahi Kasei Kogyo Co., Ltd. can be used.

受阻胺光安定劑對於本發明相關纖維素酯之質量而言,以添加0.1~10質量%時為佳,較佳為添加0.2~5質量 %,更佳為添加0.5~2質量%。這些可併用2種以上。The hindered amine light stabilizer is preferably added in an amount of 0.1 to 10% by mass, preferably 0.2 to 5 by mass, based on the mass of the cellulose ester of the present invention. %, more preferably 0.5 to 2% by mass. These can be used in combination of 2 or more types.

(酸捕捉劑)(acid scavenger)

纖維素酯亦可如熔融製膜所進行的高溫環境下藉由酸而促進分解,本發明之光學薄膜中作為劣化防止劑以含有酸捕捉劑者為佳。作為酸捕捉劑,僅為與酸進行反應後使酸成惰性化之化合物即可,其中亦以美國專利第4,137,201號說明書所記載之具有環氧基之化合物為佳。The cellulose ester can also be decomposed by an acid in a high-temperature environment by melt film formation, and it is preferable that the optical film of the present invention contains an acid scavenger as a deterioration preventing agent. The acid scavenger is preferably a compound which is inert to the acid after the reaction with the acid, and is preferably an epoxy group-containing compound described in the specification of U.S. Patent No. 4,137,201.

作為如此酸捕捉劑之環氧化合物於該技術分野中為已知物,含有種種聚二醇之二環氧丙醚,特別為每聚二醇1莫耳中約8~40莫耳之環氧乙烷等經縮合衍生之聚二醇、甘油之二環氧丙醚等金屬環氧化合物(例如,氯化乙烯聚合物組成物中,與氯化乙烯聚合物組成物同時自過去即被利用者)、環氧化醚縮合生成物、雙酚A之二環氧丙醚(即,4,4’-二羥基二苯基二甲基甲烷)、環氧化不飽和脂肪酸酯(特別為2~22個碳原子之脂肪酸的4~2個程度之碳原子的烷基酯(例如,丁基環氧基硬脂酸酯)等)、及種種環氧化長鏈脂肪酸甘油三酸酯等(例如,環氧化大豆油、環氧化亞麻仁油等)之組成物作為代表例之環氧化植物油及其他不飽和天然油(彼等有時稱為環氧化天然甘油酯或不飽和脂肪酸,這些脂肪酸為一般含有12~22個碳原子)。又,作為購得之含有環氧基的環氧化物樹脂化合物,亦可使用EPON 815C或其他環氧化醚寡聚物縮合生成物。The epoxy compound as such an acid scavenger is known in the art field and contains various polyglycol diglycidyl ethers, particularly about 8 to 40 moles of epoxy per 1 gram of polyglycol. A metal epoxy compound such as a condensation-derived polyglycol or a glycerol diglycidyl ether (for example, a vinyl chloride polymer composition, which is used simultaneously with a vinyl chloride polymer composition) ) an epoxidized ether condensation product, a diglycidyl ether of bisphenol A (ie, 4,4'-dihydroxydiphenyldimethylmethane), an epoxidized unsaturated fatty acid ester (especially 2 to 22) An alkyl ester of a carbon atom having 4 to 2 carbon atoms (for example, butyl epoxy stearate), and various epoxidized long-chain fatty acid triglycerides (for example, a ring) The composition of oxidized soybean oil, epoxidized linseed oil, etc., as representative examples of epoxidized vegetable oils and other unsaturated natural oils (sometimes referred to as epoxidized natural glycerides or unsaturated fatty acids, these fatty acids generally contain 12 ~22 carbon atoms). Further, as the commercially available epoxy group-containing epoxide resin compound, EPON 815C or another epoxidized ether oligomer condensation product can also be used.

且作為可使用於上述以外之酸捕捉劑,含有氧雜環丁烷化合物或噁唑啉化合物、或鹼土類金屬之有機酸鹽或乙醯丙酮鹽錯合物、特開平5-194788號公報之段落[0068]~[0105]所記載者。Further, as an acid scavenger other than the above, an oxetane compound or an oxazoline compound or an alkaline earth metal organic acid salt or an acetoacetate complex is used. The paragraphs [0068] to [0105] are described.

本發明中,酸捕捉劑對於本發明相關纖維素酯之質量而言以添加0.1~10質量%為佳,以添加0.2~5質量%較佳,以添加0.5~2質量%為更佳。這些可併用2種以上。In the present invention, the acid scavenger is preferably added in an amount of 0.1 to 10% by mass based on the mass of the cellulose ester of the present invention, preferably 0.2 to 5% by mass, more preferably 0.5 to 2% by mass. These can be used in combination of 2 or more types.

且,酸捕捉劑有時稱為酸掃去劑、酸捕獲劑、酸除去劑等,於本發明中皆可使用。Further, the acid scavenger may be referred to as an acid scavenger, an acid scavenger, an acid scavenger or the like, and may be used in the present invention.

(金屬惰性劑)(metal inert agent)

纖維素酯薄膜中含有金屬惰性劑亦佳。所謂金屬惰性劑,表示氧化反應中作為啟始劑或觸媒作用之金屬離子惰性化的化合物,可舉出醯肼系化合物、草酸二醯胺系化合物、三唑系化合物等,例如可舉出N,N’-雙[3-(3,5-二-t-丁基-4-羥基苯基)丙醯基]肼、2-羥基乙基草酸二醯胺、2-羥基-N-(1H-1,2,4-三唑-3-基)苯甲醯胺、N-(5-yert-丁基-2-乙氧基苯基)-N’-(2-乙基苯基)草酸醯胺等。It is also preferred that the cellulose ester film contains a metal inert agent. The metal inert agent is a compound which is inactivated by a metal ion which acts as a starter or a catalyst in the oxidation reaction, and examples thereof include an anthraquinone compound, a ruthenium oxalate compound, a triazole compound, and the like, and examples thereof include, for example, N,N'-bis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propanyl]anthracene, 2-hydroxyethyl oxalate diamine, 2-hydroxy-N-( 1H-1,2,4-triazol-3-yl)benzamide, N-(5-yert-butyl-2-ethoxyphenyl)-N'-(2-ethylphenyl) Oxalic acid amide and the like.

金屬惰性劑對於透明基材薄膜之樹脂100質量%而言,以0.0002~2質量%添加量為佳,較佳為0.0005~2質量%之添加量,更佳為0.001~1質量%之添加量。這些可併用2種以上。The metal inert agent is preferably added in an amount of 0.0002 to 2% by mass based on 100% by mass of the resin of the transparent base film, and is preferably added in an amount of 0.0005 to 2% by mass, more preferably 0.001 to 1% by mass. . These can be used in combination of 2 or more types.

(其他添加劑)(other additives)

纖維素酯薄膜中作為其他添加劑,例如添加染料、顏料、螢光體、二色性色素、滯溜值控制劑、折射率調整劑、氣體透過抑制劑、抗菌劑、生分解性賦予劑等。Examples of the cellulose ester film include a dye, a pigment, a phosphor, a dichroic dye, a slippage controlling agent, a refractive index adjusting agent, a gas permeation inhibitor, an antibacterial agent, and a biodegradability imparting agent.

而作為將這些添加劑含於纖維素酯之方法,可將各材料直接以固體或液體的形式混合,經加熱熔融後混煉成均一熔融物後,經流延後形成光學薄膜之方法、或預先將所有材料使用溶劑等溶解成均一溶液後,除去溶劑,以添加劑與纖維素酯薄膜之混合物下含有亦佳。As a method of containing these additives in a cellulose ester, each material may be directly mixed in the form of a solid or a liquid, heated and melted, and then kneaded into a uniform melt, followed by casting to form an optical film, or in advance. After all the materials are dissolved in a uniform solution using a solvent or the like, the solvent is removed, and it is also preferable to contain the mixture of the additive and the cellulose ester film.

(偏光板)(polarizer)

對於使用本發明之防反射薄膜的偏光板作說明。A polarizing plate using the antireflection film of the present invention will be described.

偏光板可由一般方法製作。本發明之偏光板為,例如將本發明之防眩性抗反射薄膜的裏面側進行鹼化處理,將經處理之防反射薄膜於碘溶液中浸漬延伸所製作之偏光膜的至少一面上,使用完全鹼化型聚乙烯醇水溶液進行貼合為佳。另一面,亦使用該防反射薄膜,亦可使用其他偏光板保護薄膜。The polarizing plate can be produced by a general method. In the polarizing plate of the present invention, for example, the back side of the anti-glare antireflection film of the present invention is alkalized, and at least one surface of the polarizing film produced by immersing the treated antireflection film in an iodine solution is used. It is preferred to carry out the lamination of a fully alkalized polyvinyl alcohol aqueous solution. On the other hand, the antireflection film is also used, and other polarizing plates can be used to protect the film.

對於本發明之防眩性抗反射薄膜,使用於另一面之偏光板保護薄膜為,具有面內方向滯留值(Ro)為20~70nm,厚度方向滯留值(Rt)為100~400nm之相位差的光學補償薄膜(相位差薄膜)者為佳。In the anti-glare antireflection film of the present invention, the polarizing plate protective film used on the other side has a phase difference in the in-plane direction (Ro) of 20 to 70 nm and a retardation value (Rt) in the thickness direction of 100 to 400 nm. The optical compensation film (phase difference film) is preferred.

且,滯留值Ro、Rt可使用自動複折射率計進行測定。例如,使用KOBRA-21ADH(王子計測機器股份有限公 司製),於溫度23℃,濕度55% RH之環境中,於波長為590nm下求得。Further, the retention values Ro and Rt can be measured using an automatic complex refractometer. For example, use KOBRA-21ADH (Prince Measurement Machine Co., Ltd. The system is obtained at a temperature of 23 ° C and a humidity of 55% RH at a wavelength of 590 nm.

這些可藉由例如特開2002-71957號公報、特願2002-155395號公報等所記載的方法來製作。又使用兼具具有將盤狀液晶等液晶化合物經配向所形成之光學異方層的光學補償薄膜之偏光板保護薄膜為佳。例如可藉由特開2003-98348號公報所記載的方法而形成光學異方性層。或面內方向滯留值(Ro)為0~5nm,厚度方向滯留值(Rt)為-20~+20nm之無配向薄膜亦可。For example, it can be produced by the method described in JP-A-2002-71957, and the like. Further, it is preferable to use a polarizing plate protective film having an optical compensation film having an optical heterogeneous layer formed by aligning a liquid crystal compound such as a discotic liquid crystal. For example, an optical anisotropic layer can be formed by the method described in JP-A-2003-98348. Or an in-plane retardation value (Ro) of 0 to 5 nm and a thickness-direction retention value (Rt) of -20 to +20 nm may be used.

藉由與本發明的防眩性薄膜或防眩性抗反射薄膜經組合使用,可得到平面性優且具有安定之視野角擴大效果的偏光板。By using in combination with the antiglare film or the antiglare antireflection film of the present invention, a polarizing plate having excellent planarity and a stable viewing angle expansion effect can be obtained.

作為使用於裏面側之偏光板保護薄膜,作為販賣品的纖維素酯薄膜,使用KC8UX2MW、KC4UX、KC5UX、KC4UY、KC8UY、KC12UR、KC4UEW、KC8UCR-3、KC8UCR-4、KC8UCR-5、KC4FR-1、KC4FR-2(Konicaminolta opt股份有限公司製)等為佳。As a polarizing plate protective film used for the inside side, as a cellulose ester film for sale, KC8UX2MW, KC4UX, KC5UX, KC4UY, KC8UY, KC12UR, KC4UEW, KC8UCR-3, KC8UCR-4, KC8UCR-5, KC4FR-1 are used. KC4FR-2 (manufactured by Konicaminolta opt Co., Ltd.) or the like is preferred.

偏光板之主要構成要素的偏光膜為,僅通過一定方向之偏波面的光之元件,現今已知的代表性偏光膜為聚乙烯醇系偏光薄膜,此有聚乙烯醇系薄膜中以碘染色所得者、與將二色性染料經染色所得者,但不限定於何者。偏光膜為,將聚乙烯醇水溶液進行製膜,將此進行一軸延伸並染色、或經染色後進行一軸延伸後,較佳為使用以硼化合物進行耐久性處理者。偏光膜之膜厚為5~30μm,較佳為8 ~15μm之偏光膜。該偏光膜面上貼合本發明之防眩性抗反射薄膜片面後形成偏光板。較佳為使用完全鹼化聚乙烯醇等作為主成分之水系黏著劑進行貼合。The polarizing film which is a main component of the polarizing plate is a light element which passes only a polarizing surface in a certain direction. A representative polarizing film which is known today is a polyvinyl alcohol-based polarizing film, and the polyvinyl alcohol-based film is dyed with iodine. The obtained one is obtained by dyeing a dichroic dye, but is not limited thereto. The polarizing film is formed by forming a film of a polyvinyl alcohol aqueous solution, stretching it by one axis, or dyeing it, and then performing one-axis stretching after dyeing, and it is preferable to use a boron compound for durability treatment. The film thickness of the polarizing film is 5 to 30 μm, preferably 8 ~15μm polarizing film. A polarizing plate is formed by laminating the surface of the anti-glare anti-reflective film of the present invention on the surface of the polarizing film. It is preferred to use a water-based adhesive which is a main component of fully alkalized polyvinyl alcohol or the like.

(顯示裝置)(display device)

藉由將使用本發明的防反射薄膜面裝於影像顯示裝置之鑑賞面側,可製造出種種辨識性優良的影像顯示裝置。By mounting the antireflection film surface of the present invention on the viewing surface side of the image display device, it is possible to manufacture various image display devices having excellent visibility.

本發明中之防反射薄膜為裝入偏光板中,以使用反射型、透過型、半透過型LCD或TN型、STN型、OCB型、HAN型、VA型(PVA型、MVA型)、IPS型等各種驅動方式之LCD為佳。又,本發明之防反射薄膜為耐久性及膜強度優良。可使用於電漿顯示器、場發射顯示器、有機EL顯示器、無機EL顯示器、電子紙等各種顯示裝置。The antireflection film of the present invention is incorporated in a polarizing plate to use a reflective, transmissive, semi-transmissive LCD or TN type, STN type, OCB type, HAN type, VA type (PVA type, MVA type), IPS. LCDs of various driving modes such as the type are preferred. Further, the antireflection film of the present invention is excellent in durability and film strength. It can be used in various display devices such as plasma displays, field emission displays, organic EL displays, inorganic EL displays, and electronic paper.

裝入本發明之防反射薄膜的液晶顯示裝置之具體例如圖1所示。本發明之液晶顯示裝置為鄰接於光反射板4、背光7、導光板5、光擴散板6。以本發明之偏光板10(作為本發明之防反射薄膜的偏光板保護薄膜1/二色性偏光膜2/偏光板保護薄膜3之構成)、液晶顯示板8、辨識側偏光板9之順序進行層合之構成為佳。A specific example of the liquid crystal display device incorporating the antireflection film of the present invention is shown in Fig. 1. The liquid crystal display device of the present invention is adjacent to the light reflecting plate 4, the backlight 7, the light guide plate 5, and the light diffusing plate 6. In the order of the polarizing plate 10 of the present invention (the polarizing plate protective film 1 / the dichroic polarizing film 2 / the polarizing plate protective film 3 as the antireflection film of the present invention), the liquid crystal display panel 8, and the identification side polarizing plate 9 The composition of the lamination is preferred.

[實施例][Examples]

以下說明本發明之實施例,但本發明未被限定於此。The embodiments of the present invention are described below, but the present invention is not limited thereto.

實施例1Example 1

(纖維素酯薄膜1之製造) (摻合液A之調製) 將下述材料依序投入於密閉容器中,將容器內溫度自20℃升溫至80℃後,將溫度保持於80℃下進行3小時攪拌,完全溶解纖維素酯。氧化矽微粒子為分散於預先添加的溶劑與少量纖維素酯溶液中而添加。將此摻合物使用濾紙(安積濾紙股份有限公司製之安積濾紙No.244)進行過濾,得到摻合液A。(Manufacture of cellulose ester film 1) (modulation of blending solution A) The following materials were sequentially placed in a closed vessel, and the temperature in the vessel was raised from 20 ° C to 80 ° C, and the temperature was maintained at 80 ° C for 3 hours to completely dissolve the cellulose ester. The cerium oxide microparticles are added by dispersing in a previously added solvent and a small amount of a cellulose ester solution. This blend was filtered using a filter paper (Augmentation Filter Paper No. 244, manufactured by Anji Paper Co., Ltd.) to obtain a blending liquid A.

繼續,將所得之摻合液A,通過保溫35℃之流延塑模,於不鏽鋼製無終點輸送帶所成之溫度35℃的支持體上流延,形成織物。繼續將織物於支持體上進行乾燥,於織物 之殘留溶劑量到達80質量%之段階下,自剝離輥將織物由支持體剝離。Subsequently, the obtained blending liquid A was cast by a casting mold which was kept at 35 ° C and cast at a temperature of 35 ° C which was formed by a stainless steel endless conveyor belt to form a woven fabric. Continue to dry the fabric on the support, on the fabric When the amount of the residual solvent reached 80% by mass, the fabric was peeled off from the support by the peeling roller.

將剝離後的織物,於藉由上下複數配置的輥的搬送乾燥步驟中以90℃乾燥風一邊進行乾燥,一邊搬送,再以拉幅器把持織物兩端部後,以溫度130℃下進行寬方向之延伸至延伸前的1.1倍。經拉幅器之延伸後,將織物藉由上下複數配置之輥進行搬送乾燥步驟,並以溫度135℃之乾燥風進行乾燥。乾燥步驟之環境氣體取代率為15(次/小時)之環境氣體內進行15分鐘熱處理後,冷卻至室溫並進行捲取,製作出寬度1.5m、膜厚80μm、長度4000m、折射率1.49之長尺纖維素酯薄膜1。由不鏽鋼輸送帶支持體之轉動速度與拉幅器之運轉速度所算出之剝離直後的織物搬送方向之延伸倍率為1.1倍。The woven fabric which has been peeled off is dried while being dried at a drying temperature of 90 ° C in a transfer drying step of a plurality of rolls arranged one above the other, and then the both ends of the fabric are gripped by a tenter, and then the width is made at a temperature of 130 ° C. The direction extends to 1.1 times before the extension. After the extension of the tenter, the fabric was subjected to a transport drying step by means of rolls arranged up and down, and dried by a dry air having a temperature of 135 °C. In the drying step, the ambient gas substitution rate was 15 (times/hour) in an ambient gas for 15 minutes, and then cooled to room temperature and coiled to prepare a width of 1.5 m, a film thickness of 80 μm, a length of 4000 m, and a refractive index of 1.49. Long-length cellulose ester film 1. The stretching ratio of the fabric conveying direction after the peeling straightness calculated from the rotation speed of the stainless steel conveyor belt support and the running speed of the tenter was 1.1 times.

(防反射薄膜的製作) 將上述製作之纖維素酯薄膜1藉由下述順序製作出防反射薄膜。(Production of anti-reflection film) The cellulose ester film 1 produced above was produced into an antireflection film by the following procedure.

(硬塗佈薄膜的製作) 於如此製作之纖維素酯薄膜1上,將下述硬塗佈層組成物1以孔徑0.4μm的聚丙烯製過濾器進行過濾,調製出硬塗佈層塗佈液,將此使用微凹版印刷塗佈機於纖維素酯薄膜1之表面進行塗佈,並以溫度90℃下進行乾燥後,使用紫外線燈以照射部照度為100mW/cm2 、照射量為 0.2J/cm2 下使塗佈層硬化,形成乾膜厚10μm之硬塗佈層而製作出硬塗佈薄膜。(Production of Hard Coating Film) The hard coating layer composition 1 described below was filtered through a polypropylene filter having a pore diameter of 0.4 μm to prepare a hard coating layer coating on the cellulose ester film 1 thus produced. This solution was applied to the surface of the cellulose ester film 1 by a micro gravure coating machine, and dried at a temperature of 90 ° C, and then an ultraviolet ray lamp was used, and the illuminance of the irradiation portion was 100 mW/cm 2 , and the irradiation amount was 0.2. The coating layer was cured at J/cm 2 to form a hard coating layer having a dry film thickness of 10 μm to prepare a hard coating film.

繼續,欲將下述背塗佈層組成物1成為濕膜厚14μm,與塗佈纖維素酯薄膜1之硬塗佈層的面為反對之面上以壓出塗佈機進行塗佈,並以溫度85℃進行乾燥。Continuing, the following back coating layer composition 1 is formed to have a wet film thickness of 14 μm, and coated on the surface of the hard coating layer on which the cellulose ester film 1 is applied, by an extrusion coater, and Drying was carried out at a temperature of 85 °C.

(硬塗佈層組成物1) 下述材料經攪拌、混合後作成硬塗佈層組成物1。(hard coating layer composition 1) The following materials were stirred and mixed to prepare a hard coating layer composition 1.

(日本Aerosil股份有限公司製Aerosil200V) 於如上述所製作之硬塗佈薄膜表面上,以下述高折射率層、低折射率層之順序塗佈設置防反射層,製作出防反射薄膜。(Aerosil 200V made by Aerosil Co., Ltd., Japan) On the surface of the hard coat film produced as described above, an antireflection film was applied in the order of the high refractive index layer and the low refractive index layer described below to prepare an antireflection film.

(粒子分散液A的製作) 首先於甲醇分散銻複氧化物膠體(固體成分60%、日產化學工業股份有限公司製、銻酸鋅溶膠、商品名:西路拿克斯CX-Z610M-F2)6.0kg,將異丙醇12.0kg一邊攪拌下一邊徐徐添加,調製出粒子分散液A。(Production of particle dispersion A) First, 6.0 kg of hydrazine complex oxide colloid (solid content 60%, manufactured by Nissan Chemical Industry Co., Ltd., zinc silicate sol, trade name: West Lukes CX-Z610M-F2), isopropanol 12.0 The kg was slowly added while stirring, and the particle dispersion A was prepared.

(高折射率層塗佈組成物1) (High refractive index layer coating composition 1)

(高折射率層) 於硬塗佈薄膜表面上,將上述高折射率層塗佈組成物1以壓出塗佈機進行塗佈,於溫度80℃下進行1分鐘乾燥,再將紫外線以0.15J/cm2 照射使其硬化,欲使厚度成為78nm,設置高折射率層1。該高折射率層之折射率為1.6。(High refractive index layer) The high refractive index coating composition 1 was applied onto the surface of the hard coating film by an extrusion coater, dried at a temperature of 80 ° C for 1 minute, and then ultraviolet light was 0.15. The J/cm 2 was irradiated to harden it, and the thickness was set to 78 nm, and the high refractive index layer 1 was provided. The high refractive index layer has a refractive index of 1.6.

(四乙氧基矽烷水解物A之調製) 首先混合四乙氧基矽烷230g與乙醇440g,於此添加2%乙酸水溶液120g後,於室溫(25℃)下進行18小時攪拌後調製出四乙氧基矽烷水解物A。(modulation of tetraethoxy decane hydrolysate A) First, 230 g of tetraethoxy decane and 440 g of ethanol were mixed, and 120 g of a 2% aqueous acetic acid solution was added thereto, and the mixture was stirred at room temperature (25 ° C) for 18 hours to prepare a tetraethoxy decane hydrolyzate A.

(低折射率層塗佈組成物1) (low refractive index layer coating composition 1)

(低折射率層) 於上述硬塗佈薄膜之高折射率層1的表面上,將上述低折射率層塗佈組成物1以壓出塗佈機進行塗佈,於100℃進行1分鐘乾燥後,以紫外線0.15J/cm2 進行照射並使其硬化,再以120℃下進行5分鐘熱硬化,欲成為厚度95nm而設置低折射率層,製作出本發明之防反射薄膜。(Low Refractive Index Layer) The low refractive index layer coating composition 1 was applied onto the surface of the high refractive index layer 1 of the hard coating film by an extrusion coater, and dried at 100 ° C for 1 minute. Thereafter, the film was irradiated with ultraviolet rays at 0.15 J/cm 2 and cured, and further thermally cured at 120 ° C for 5 minutes, and a low refractive index layer was formed to have a thickness of 95 nm to prepare an antireflection film of the present invention.

所得之防反射薄膜的低折射率層之折射率為1.37。又,將該防反射薄膜於使用50℃之離子交換水的溫浴中浸漬2小時,測定浸漬後之表面(膜面)pH後,其為3.8。該實施例1之防反射薄膜的低折射率層之含有微粒子種類、及表面(膜面)pH記載於下述表1。The refractive index of the low refractive index layer of the obtained antireflection film was 1.37. Further, the antireflection film was immersed in a warm bath using ion exchange water at 50 ° C for 2 hours, and the pH of the surface (film surface) after immersion was measured and found to be 3.8. The microparticle-containing type and the surface (film surface) pH of the low refractive index layer of the antireflection film of Example 1 are shown in Table 1 below.

且,作為pH測定器,使用HM-30G(東亞DKK股份有限公司製)、及pH電極使用GST-5723S(東亞DKK股 份有限公司製)。又,pH測定為,將防反射薄膜切成2cm×2cm,欲使防反射薄膜之低折射率層成為表面,且不是空氣進入,貼附於貼有無基材兩面帶(based substrate-free double-coated tape)之丙烯基板上而準備試料。Further, as a pH measuring device, HM-30G (manufactured by East Asia DKK Co., Ltd.) and pH electrode were used as GST-5723S (East Asian DKK shares) Co., Ltd.). Further, the pH was measured by cutting the antireflection film into 2 cm × 2 cm, and the low refractive index layer of the antireflection film was made to be a surface, and air was not introduced, and attached to a substrate-free double-sided tape (based substrate-free double- A sample was prepared on the acrylic substrate of the coated tape.

繼續,貼附於丙烯基板之試料的低折射率層面與pH電極接觸,由經接觸之隙間使用微滴定管(DIGIFIT)滴入10μL之離子交換水,測定滴下1分鐘後的值。且離子交換水之pH為6.5。Subsequently, the low refractive index layer of the sample attached to the acryl substrate was brought into contact with the pH electrode, and 10 μL of ion-exchanged water was dropped from the contact gap using a microtiter tube (DIGIFIT), and the value after dropping for 1 minute was measured. The pH of the ion-exchanged water was 6.5.

實施例2~9(防反射薄膜102~109)、及比較例1~4(防反射薄膜110~113)的製作Production of Examples 2 to 9 (antireflection films 102 to 109) and Comparative Examples 1 to 4 (antireflection films 110 to 113)

低折射率層塗佈組成物1之乙酸量的調整、及適宜地添加10%氫氧化鈉、10%鹽酸,使用50℃之離子交換水的溫浴中經2小時浸漬後的防反射薄膜表面(膜面)pH如表1所記載以外,與實施例1同様地,製作出實施例2~9之防反射薄膜102~109、及比較例1~4之防反射薄膜110~113。The amount of acetic acid in the low refractive index layer coating composition 1 is adjusted, and the surface of the antireflection film after being impregnated for 2 hours in a warm bath using ion exchange water at 50 ° C is suitably added with 10% sodium hydroxide and 10% hydrochloric acid. (Thickness) pH As shown in Table 1, the antireflection films 102 to 109 of Examples 2 to 9 and the antireflection films 110 to 113 of Comparative Examples 1 to 4 were produced in the same manner as in Example 1.

比較例5(防反射薄膜114)的製作Production of Comparative Example 5 (anti-reflection film 114)

將低折射率層塗佈組成物1之異丙醇分散中空二氧化矽微粒子溶膠改為膠體二氧化矽溶膠之IPS-ST-L(異丙醇分散、固體成分30%、日產化學工業股份有限公司製),添加量改為30質量份以外,同様地製作出比較例5之防反射薄膜114。於使用50℃之離子交換水的溫浴中進行2 小時浸漬後的防反射薄膜表面(膜面)pH為3.8。The isopropyl alcohol-dispersed hollow cerium oxide microparticle sol of the low refractive index coating composition 1 was changed to the IPS-ST-L of the colloidal cerium oxide sol (isopropyl alcohol dispersion, solid content 30%, Nissan Chemical Industry Co., Ltd. limited The antireflection film 114 of Comparative Example 5 was produced in the same manner as the amount of addition to 30 parts by mass. 2 in a warm bath using ion exchange water at 50 ° C The surface of the antireflection film (film surface) after the hour of immersion had a pH of 3.8.

比較例6(防反射薄膜115)的製作Production of Comparative Example 6 (antireflection film 115)

將低折射率層塗佈組成物1之異丙醇分散中空二氧化矽微粒子溶膠改為膠體二氧化矽溶膠之IPS-ST-L(異丙醇分散、固體成分30%、日產化學工業股份有限公司製),添加量改為30質量份,適宜地添加10%鹽酸後於使用50℃之離子交換水的溫浴中進行2小時浸漬後之防反射薄膜表面(膜面)pH成為2.1以外,同様地製作出比較例6之防反射薄膜115。The isopropyl alcohol-dispersed hollow cerium oxide microparticle sol of the low refractive index coating composition 1 was changed to the IPS-ST-L of the colloidal cerium oxide sol (isopropyl alcohol dispersion, solid content 30%, Nissan Chemical Industry Co., Ltd. limited The amount of the anti-reflection film surface (film surface) pH of the anti-reflection film after the immersion in 10 minutes of immersion in a warm bath using 50 ° C ion-exchanged water was changed to 30 parts by mass. The antireflection film 115 of Comparative Example 6 was produced in the same manner.

實施例10(防反射薄膜116)的製作Production of Example 10 (anti-reflection film 116)

將低折射率層塗佈組成物1改為下述低折射率層塗佈組成物2以外,同様地製作出實施例10之防反射薄膜116。於使用50℃之離子交換水的溫浴中進行2小時浸漬後的防反射薄膜表面(膜面)pH為4.2。The antireflection film 116 of Example 10 was produced in the same manner as the low refractive index layer coating composition 1 was changed to the following low refractive index layer coating composition 2. The surface (film surface) of the antireflection film after immersion in a warm bath using ion exchange water at 50 ° C for 2 hours had a pH of 4.2.

(低折射率層用塗佈組成物2) 調製含氟聚合物1、及溶膠液I後,調製出低折射率層用塗佈組成物2。(Coating composition 2 for low refractive index layer) After the fluoropolymer 1 and the sol liquid I were prepared, the coating composition 2 for a low refractive index layer was prepared.

(含氟聚合物1之調製) 於內容量100ml之不鏽鋼製攪拌機付高壓釜中,裝入乙酸乙酯40ml、羥基乙基乙烯醚14.7g、及過氧化二月桂 醯基0.55g,反應系內進行脫氣,以氮氣取代。再將六氟丙烯(HFP)25g導入高壓釜中,升溫至溫度65℃。高壓釜內之溫度到達65℃的時點壓力為5.4kg/cm2 。保持高壓釜內之溫度下,繼續反應8小時,壓力到達3.2kg/cm2 之時點停止加熱並放置冷卻。內溫降至室溫之時點,趕出未反應之單體,打開高壓釜並取出反應液。(Preparation of fluoropolymer 1) In an autoclave, a stainless steel stirrer having a content of 100 ml was charged with 40 ml of ethyl acetate, 14.7 g of hydroxyethyl vinyl ether, and 0.55 g of dilauroyl peroxide. Degassing was carried out and replaced with nitrogen. Further, 25 g of hexafluoropropylene (HFP) was introduced into the autoclave, and the temperature was raised to 65 °C. The pressure at the time when the temperature in the autoclave reached 65 ° C was 5.4 kg/cm 2 . The reaction was continued for 8 hours while maintaining the temperature in the autoclave, and the heating was stopped at the time when the pressure reached 3.2 kg/cm 2 and left to cool. When the internal temperature was lowered to room temperature, the unreacted monomer was driven out, the autoclave was opened, and the reaction liquid was taken out.

將所得之反應液,投入於超過剩己烷中,藉由傾析法將溶劑除去,取出沈澱之聚合物。且將該聚合物溶解於少量乙酸乙酯中,以己烷進行2次再沈澱,完全除去殘存單體後乾燥,得到聚合物28g。繼續,將該聚合物20g溶解於N,N-二甲基乙醯胺100ml,冰冷下滴入丙烯酸氯化物11.4g後,於室溫下進行10小時攪拌。反應液中加入乙酸乙酯後水洗,萃取有機層後濃縮,將所得之聚合物以己烷進行再沈澱而得到19g的含氟聚合物1。The obtained reaction liquid was poured over excess hexane, and the solvent was removed by a decantation method, and the precipitated polymer was taken out. The polymer was dissolved in a small amount of ethyl acetate, and reprecipitated twice with hexane. The residual monomer was completely removed and dried to obtain 28 g of a polymer. Then, 20 g of this polymer was dissolved in 100 ml of N,N-dimethylacetamide, and 11.4 g of acryl chloride was added dropwise thereto under ice cooling, followed by stirring at room temperature for 10 hours. Ethyl acetate was added to the reaction mixture, and the mixture was washed with water. The organic layer was concentrated and concentrated, and the obtained polymer was re-precipitated with hexane to obtain 19 g of fluoropolymer.

(溶膠液I之調製) 於具備攪拌機、迴流冷卻器之反應器中放入下述材料並混合。(modulation of sol liquid I) The following materials were placed in a reactor equipped with a stirrer and a reflux condenser and mixed.

其後於彼等混合物中加入離子交換水30質量份,於溫度60℃下進行4小時反應後,冷卻至室溫後得到溶膠液 I。Thereafter, 30 parts by mass of ion-exchanged water was added to the mixture, and the reaction was carried out at a temperature of 60 ° C for 4 hours, and then cooled to room temperature to obtain a sol solution. I.

溶膠液I中之反應生成物的質量平均分子量為1600,寡聚物成分以上之成分中,分子量為1000~20000之成分為100質量%。又由氣體層析分析來看,原料之丙烯醯氧基丙基三甲氧基矽烷已完全無殘存。The mass average molecular weight of the reaction product in the sol liquid I was 1,600, and among the components having an oligomer component or more, the component having a molecular weight of 1,000 to 20,000 was 100% by mass. Further, from the gas chromatographic analysis, the propylene methoxypropyltrimethoxy decane of the starting material was completely absent.

(低折射率層用塗佈組成物2) (Coating composition 2 for low refractive index layer)

上述低折射率層用塗佈組成物2中,對於甲基乙基酮、及環己酮,將預先調製之含氟聚合物1、甲基丙烯酸酯 基含有聚矽氧烷樹脂、光自由基產生劑、二季戊四醇五丙烯酸酯與二季戊四醇六丙烯酸酯之混合物,以上述添加比率下加入並溶解後,將溶膠液I、與異丙醇分散中空二氧化矽微粒子溶膠以上述添加比率下添加,最後添加乙酸。In the coating composition 2 for a low refractive index layer, a fluoropolymer 1 and a methacrylate prepared in advance for methyl ethyl ketone and cyclohexanone The base contains a polysiloxane catalyst, a photoradical generator, a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate, and after being added and dissolved at the above-mentioned addition ratio, the sol solution I and the isopropanol are dispersed. The cerium oxide microparticle sol was added at the above-mentioned addition ratio, and finally acetic acid was added.

(評估) 對於上述製作之實施例1~10及比較例1~6之防反射薄膜,藉由下述方法進行評估。所得之結果如表1所示。(assessment) The antireflection films of Examples 1 to 10 and Comparative Examples 1 to 6 prepared above were evaluated by the following methods. The results obtained are shown in Table 1.

(反射率測定) 將未進行溫浴浸漬之實施例1~10及比較例1~6之防反射薄膜,於溫度23℃、相對濕度60%之條件下進行2小時調濕後,與防止裏面反射,將試料於黑色丙烯基板上以無基材兩面帶(based substrate-free double-coated tape)貼附,以konicaminolta製分光測色計、CM-3700d測定反射率。且,反射率越低,性能越優良。(reflectance measurement) The antireflection films of Examples 1 to 10 and Comparative Examples 1 to 6 which were not subjected to the warm bath immersion were conditioned at a temperature of 23 ° C and a relative humidity of 60% for 2 hours, and then the inside reflection was prevented. The black acrylic substrate was attached to a substrate-free double-coated tape, and the reflectance was measured with a konicaminolta spectrophotometer and CM-3700d. Moreover, the lower the reflectance, the better the performance.

(藉由高溫高濕下之耐久試驗試品的製作) 將實施例1~10及比較例1~6之防反射薄膜,各切成A4尺寸,將防反射層作為表面,於溫度80℃,濕度90% RH之高溫高濕環境下保持250小時後,將防反射薄膜於溫度23℃,相對濕度60%之條件下進行2小時調濕,製作出濕熱耐久性試驗用之薄膜試料。對於這些濕熱耐久 性試驗用之薄膜試料,評估下述耐擦性(膜強度)、密著性、及耐藥品性,並進行濕熱耐久性試驗。(Manufactured by endurance test specimens under high temperature and high humidity) The antireflection films of Examples 1 to 10 and Comparative Examples 1 to 6 were each cut into an A4 size, and the antireflection layer was used as a surface, and maintained at a temperature of 80 ° C and a humidity of 90% RH for 250 hours in a high temperature and high humidity environment. The antireflection film was conditioned at a temperature of 23 ° C and a relative humidity of 60% for 2 hours to prepare a film sample for wet heat durability test. Durable for these damp heat The film samples for the test were evaluated for the following rub resistance (film strength), adhesion, and chemical resistance, and subjected to a damp heat durability test.

(膜強度) 對於實施例1~10、及比較例1~6之防反射薄膜的濕熱耐久性試驗用薄膜試料,各於日本鋼絲絨股份有限公司製之行號#0000之鋼絲絨(SW)上,負荷1000g/cm2 ,並測定進行20次往復時的每防反射薄膜1cm寬所產生的傷痕條數。防反射薄膜之傷痕條數,於實用之觀點來看,5條/cm寬以下為佳,3條/cm寬以下為較佳,更佳為1條/cm寬以下。且使鋼絲絨往復的裝置為使用新東科學股份有限公司摩擦摩耗試驗機(TRIBOSTATION TYPE:32、移動速度4000mm/min.)。所得結果歸納於下述表1所示。(Film Strength) The film samples for the wet heat durability test of the antireflection films of Examples 1 to 10 and Comparative Examples 1 to 6, each of which was made of Nippon Steel Wool Co., Ltd., line #0000, steel wool (SW) The load was 1000 g/cm 2 , and the number of scratches per 1 cm of the antireflection film at the time of 20 reciprocation was measured. The number of the scratches of the antireflection film is preferably 5 pieces/cm or less from the viewpoint of practical use, and preferably 3 pieces/cm width or less, more preferably 1 piece/cm width or less. The device for reciprocating the steel wool is a frictional wear tester (TRIBOSTATION TYPE: 32, moving speed 4000 mm/min.) using Xindong Science and Technology Co., Ltd. The results obtained are summarized in Table 1 below.

(密著性) 實施例1~10、及比較例1~6之防反射薄膜的濕熱耐久性試驗用薄膜試料之防反射層表面上,面對剃刀之刀刃以90∘角度切入並以1mm間隔下切入縱橫11條,製作出100個邊長1mm之方格子。於上貼附購得之玻璃紙製帶,將其一端以手握住,於垂直方向用力拉伸並使其剝開,薄膜經剝開的面積對於自切入線所貼之帶面積的比率以目視觀察,並以下述基準進行評估。所得之結果歸納於表1。(adhesiveness) The anti-reflection film of the anti-reflection film of Examples 1 to 10 and Comparative Examples 1 to 6 was cut on the surface of the anti-reflection layer of the film sample facing the razor at an angle of 90 并 and cut into 11 vertical and horizontal sections at intervals of 1 mm. , made 100 square squares with a side length of 1mm. Attach the purchased cellophane tape to the top, hold it at one end, and stretch and peel it in the vertical direction. The ratio of the peeled area of the film to the area of the tape attached to the cut line is visually observed. Observe and evaluate on the basis of the following criteria. The results obtained are summarized in Table 1.

密著性評估◎:完全未剝離○:經剝離之面積比率未達5%△:經剝離之面積比率未達10%×:經剝離之面積比率為10%以上Adhesion evaluation ◎: completely unpeeled ○: area ratio of peeled off was less than 5% Δ: area ratio of peeled area was less than 10% ×: area ratio of peeled area was 10% or more

(耐藥品性) 耐藥品性1:乙醇 將實施例1~10、及比較例1~6的防反射薄膜之濕熱耐久性試驗用薄膜試料的表面,使用染入乙醇(關東化學公司製)的bemcot(旭化成股份有限公司製、製品名M-3),於同一處進行20次來回擦拭,觀察經擦拭後的狀態,以以下基準進行評估。(drug resistance) Chemical resistance 1: ethanol The surface of the film sample for the wet heat durability test of the antireflection film of Examples 1 to 10 and Comparative Examples 1 to 6 was used in bemcot (product of Asahi Kasei Co., Ltd., product name M) which was dyed with ethanol (manufactured by Kanto Chemical Co., Ltd.). -3), rubbing back and forth 20 times in the same place, observing the state after wiping, and evaluating by the following criteria.

耐藥品性2:石腦油 將實施例1~10、及比較例1~6之防反射薄膜的濕熱耐久性試驗用薄膜試料的表面,使用染入石腦油(和光純藥公司製)之bemcot(旭化成股份有限公司製、製品名M-3),於同一處進行20次來回擦拭,觀察經擦拭後之狀態,以以下基準進行評估。Chemical resistance 2: naphtha The surface of the film sample for the wet heat durability test of the antireflection film of Examples 1 to 10 and Comparative Examples 1 to 6 was made of bemcot (made by Asahi Kasei Co., Ltd.), which was dyed with naphtha (manufactured by Wako Pure Chemical Industries, Ltd.). The product name M-3) was rubbed back and forth 20 times at the same place, and the state after wiping was observed, and the evaluation was performed based on the following criteria.

所得之結果歸納於表1。且,防反射薄膜表面之擦拭使用以下裝置。The results obtained are summarized in Table 1. Further, the surface of the antireflection film was wiped using the following device.

表面擦拭裝置:新東科學股份有限公司摩擦摩耗試驗機(TRIBOSTATION TYPE:32、移動速度4000mm/min.) 荷重1000g/cm2 、先端部接觸面積:1cm×1cmSurface wiping device: Xindong Science Co., Ltd. friction wear test machine (TRIBOSTATION TYPE: 32, moving speed 4000mm/min.) Load 1000g/cm 2 , tip contact area: 1cm × 1cm

耐藥品性1:乙醇、及耐藥品性2:石腦油之評估基準◎:未剝離○:見到稍有剝離之水準(無實用上之問題)△:見到剝離×:經擦拭處為全部剝離。Chemical resistance 1: Ethanol and chemical resistance 2: Evaluation criteria for naphtha ◎: Not peeled off ○: A slight peeling level was observed (no practical problem) △: Peeling was observed ×: After wiping All stripped.

由表1之結果得知,低折射率層含有內部為多孔質或空洞之中空二氧化矽微粒子,於50℃溫浴中進行2小時浸漬後之低折射率層表面(膜面)pH為2.0~7.5的本發明防反射薄膜為,與比較例之防反射薄膜相比,其反射率、濕熱耐久試驗後之密著性、膜強度(耐擦性)及耐藥品性(乙醇、石腦油)皆優良。其中得知亦以低折射率層表面(膜面)pH為2.0~4.0之本發明的防反射薄膜具有特優的濕熱耐久試驗後之膜強度(耐擦性)及耐藥品性(乙醇)。As is apparent from the results of Table 1, the low refractive index layer contains hollow cerium oxide microparticles which are porous or void inside, and the surface of the low refractive index layer (film surface) after immersion in a 50 ° C warm bath for 2 hours has a pH of 2.0. The antireflection film of the present invention of ~7.5 is reflectance, adhesion after wet heat endurance test, film strength (scratch resistance), and chemical resistance (ethanol, naphtha) as compared with the antireflection film of the comparative example. ) are all excellent. It was found that the antireflection film of the present invention having a low refractive index layer surface (film surface) pH of 2.0 to 4.0 has excellent film strength (scratch resistance) and chemical resistance (ethanol) after the wet heat endurance test.

實施例11~22(防反射薄膜117~128)的製作Production of Examples 11 to 22 (antireflection film 117 to 128)

實施例1之防反射薄膜的製作中,進一步添加低折射率層用塗佈組成物1於表2所記載的添加劑,及欲將使用50℃之離子交換水的溫浴中進行2小時浸漬後之防反射薄膜表面(膜面)pH為一定,進行乙酸量之調整、及適宜地添加10%氫氧化鈉、10%鹽酸以外,與實施例1同様地,製作出防反射薄膜117~128。且,使用上述製作之防反射薄膜的50℃之離子交換水,於溫浴進行2小時浸漬後之表面(膜面)pH記載於表2。In the production of the antireflection film of the first embodiment, the additive composition 1 for the low refractive index layer is further added to the additive described in Table 2, and after immersion in a warm bath using ion exchange water at 50 ° C for 2 hours. Antireflection films 117 to 128 were produced in the same manner as in Example 1 except that the pH of the antireflection film surface (film surface) was constant, the amount of acetic acid was adjusted, and 10% sodium hydroxide and 10% hydrochloric acid were appropriately added. Further, the surface (film surface) pH of the ion-exchanged water at 50 ° C of the antireflection film prepared above and immersed in a warm bath for 2 hours is shown in Table 2.

繼續,將上述製作之實施例11~22之防反射薄膜117~128、及實施例1之防反射薄膜101、及實施例8之防反射薄膜108切成A4尺寸,將防反射層作為表面,於溫度80℃、濕度90% RH之高溫高濕環境下保存500小時後,將防反射薄膜於溫度23℃,相對濕度60%之條件進行2 小時調濕,以上述方法對於密著性、耐擦性(膜強度)、及耐藥品性進行評估,進行濕熱耐久性試驗。所得之結果如下述表2所示。Continuing, the antireflection films 117 to 128 of the above-described 11th to 22nd embodiments, the antireflection film 101 of the first embodiment, and the antireflection film 108 of the eighth embodiment are cut into an A4 size, and the antireflection layer is used as a surface. After storage for 500 hours in a high temperature and high humidity environment at a temperature of 80 ° C and a humidity of 90% RH, the antireflection film was subjected to a temperature of 23 ° C and a relative humidity of 60%. The humidity was measured in the hour, and the adhesion, the scratch resistance (film strength), and the chemical resistance were evaluated by the above method, and the moist heat durability test was performed. The results obtained are shown in Table 2 below.

且,表2所記載的添加劑之詳細如以下所示。Further, the details of the additives described in Table 2 are as follows.

羥基改性聚矽氧烷樹脂:FM-DA26、chisso股份有限公司製 環氧基改性聚矽氧烷樹脂:X-22-163B、信越化學工業股份有限公司製 胺基改性聚矽氧烷樹脂:X-22-161A、信越化學工業股份有限公司製 甲醇改性聚矽氧烷樹脂:KF-6003、信越化學工業股份有限公司製 咪唑(日本合成化學股份有限公司製) 1-甲基咪唑(日本合成化學股份有限公司製)Hydroxy modified polyoxyalkylene resin: FM-DA26, manufactured by Chisso Co., Ltd. Epoxy modified polyoxyalkylene resin: X-22-163B, manufactured by Shin-Etsu Chemical Co., Ltd. Amine-modified polyoxyalkylene resin: X-22-161A, manufactured by Shin-Etsu Chemical Co., Ltd. Methanol modified polyoxyalkylene resin: KF-6003, manufactured by Shin-Etsu Chemical Co., Ltd. Imidazole (manufactured by JEOL Ltd.) 1-methylimidazole (manufactured by JEOL Ltd.)

由上述表2之結果得知,於過度嚴苛之濕熱耐久評估中,低折射率層中含有反應性改性聚矽氧烷樹脂或咪唑或其衍生物時,得知具有特優濕熱耐久試驗後之密著性、膜強度(耐擦性)及耐藥品性(乙醇、石腦油)。From the results of the above Table 2, it is known that in the excessively severe wet heat durability evaluation, when the low refractive index layer contains a reactive modified polyoxyalkylene resin or imidazole or a derivative thereof, it is known that it has a superior heat and humidity durability test. Post-adhesiveness, film strength (scratch resistance) and chemical resistance (ethanol, naphtha).

實施例23Example 23

使用實施例1~22、及比較例1~6所製作之防反射薄膜101~128,如下述製作出偏光板,將這些偏光板裝入液晶顯示板(影像顯示裝置)並評估辨識性。Using the antireflection films 101 to 128 produced in Examples 1 to 22 and Comparative Examples 1 to 6, polarizing plates were produced as follows, and these polarizing plates were placed in a liquid crystal display panel (image display device) to evaluate the visibility.

依據下述方法,使用上述實施例1~22及比較例1~6之防反射薄膜與纖維素酯系光學補償薄膜的KC8UCR5(Konicaminolta opt股份有限公司製)作成偏光板。即,將各防反射薄膜與上述光學補償薄膜之各1片,作為貼合於偏光膜表裏之偏光板保護薄膜使用,製作出偏光板201~228。The antireflection film of the above Examples 1 to 22 and Comparative Examples 1 to 6 and KC8UCR5 (manufactured by Konicaminolta opt Co., Ltd.) of the cellulose ester-based optical compensation film were used as polarizing plates. In other words, each of the antireflection film and the optical compensation film is used as a polarizing plate protective film bonded to the front and back of the polarizing film to form polarizing plates 201 to 228.

(a)偏光膜的製作 於鹼化度99.95莫耳%、聚合度2400的聚乙烯醇(以下簡稱為PVA)100質量份中,熔融混煉含浸甘油10質量份、及水170質量份者,經脫泡後由T塑模於金屬輥上進行熔融壓出而製膜。其後,進行乾燥.熱處理,得到PVA薄膜。所得之PVA薄膜之平均厚度為40μm,水分率為4.4%,薄膜幅為3m。(a) Production of polarizing film In 100 parts by mass of polyvinyl alcohol (hereinafter abbreviated as PVA) having a degree of alkalinity of 99.95 mol% and a degree of polymerization of 2400, 10 parts by mass of impregnated glycerin and 170 parts by mass of water are melt-kneaded, and T-plastic is obtained after defoaming. The mold was melted and extruded on a metal roll to form a film. Thereafter, it is dried. Heat treatment to obtain a PVA film. The obtained PVA film had an average thickness of 40 μm, a moisture content of 4.4%, and a film web of 3 m.

繼續,將所得之PVA薄膜藉由預備膨潤、染色、濕 式法後以一軸延伸、固定處理、乾燥、熱處理之順序進行連續性處理後製作出偏光膜。Continue, the resulting PVA film is prepared by swelling, dyeing, and damp After the method, the polarizing film is produced by performing continuous treatment in the order of one-axis stretching, fixing treatment, drying, and heat treatment.

即,將PVA薄膜於溫度30℃之水中進行30秒浸漬作為預備膨潤,再於碘濃度0.4g/公升、碘化鉀濃度40g/公升之溫度35℃的水溶液中進行3分鐘浸漬。繼續,於硼酸濃度4%的50℃水溶液中對薄膜施予張力700N/m之條件下,進行一軸延伸至6倍,於碘化鉀濃度40g/公升、硼酸濃度40g/公升、氯化鋅濃度10g/公升之溫度30℃水溶液中進行5分鐘浸漬而進行固定處理。其後,取出PVA薄膜,以溫度40℃進行熱風乾燥,再於溫度100℃下進行5分鐘熱處理。所得之偏光膜為平均厚度13μm,對於偏光性能之透過率為43.0%,偏光度為99.5%,2色性比為40.1。Specifically, the PVA film was immersed in water at a temperature of 30 ° C for 30 seconds as a preliminary swell, and immersed in an aqueous solution having an iodine concentration of 0.4 g / liter and a potassium iodide concentration of 40 g / liter at a temperature of 35 ° C for 3 minutes. Continue to apply a tension of 700 N/m to a film at a concentration of 700 N/m in a 50% aqueous solution having a boric acid concentration of 4%, and to carry out one-axis extension to 6 times, a potassium iodide concentration of 40 g/liter, a boric acid concentration of 40 g/liter, and a zinc chloride concentration of 10 g/ The temperature was raised in a 30 ° C aqueous solution at a temperature of 5 ° C for 5 minutes to carry out a fixing treatment. Thereafter, the PVA film was taken out, dried by hot air at a temperature of 40 ° C, and further heat-treated at a temperature of 100 ° C for 5 minutes. The obtained polarizing film had an average thickness of 13 μm, a transmittance for polarizing performance of 43.0%, a degree of polarization of 99.5%, and a 2-color ratio of 40.1.

(b)偏光板的製作 繼續,依據下述步驟1~5,將實施例1~22及比較例1~6之防反射薄膜101~128與纖維素酯系光學補償薄膜作為偏光板保護薄膜,貼合於上述偏光膜之表裏,製作出對應實施例1~22及比較例1~6之防反射薄膜101~128的偏光板201~228。(b) Production of polarizing plate Continuing, according to the following steps 1 to 5, the antireflection films 101 to 128 of Examples 1 to 22 and Comparative Examples 1 to 6 and the cellulose ester-based optical compensation film are used as a polarizing plate protective film, and are bonded to the above polarizing film. In the table, polarizing plates 201 to 228 corresponding to the antireflection films 101 to 128 of Examples 1 to 22 and Comparative Examples 1 to 6 were produced.

步驟1:作為偏光板保護薄膜,將實施例1~22及比較例1~6之防反射薄膜於60℃的2mol/L之氫氧化鈉溶液中浸漬90秒,繼續經水洗、乾燥後鹼化與偏光膜貼合之側。Step 1: As a polarizing plate protective film, the antireflection films of Examples 1 to 22 and Comparative Examples 1 to 6 were immersed in a 2 mol/L sodium hydroxide solution at 60 ° C for 90 seconds, and then subjected to water washing, drying, and alkalization. The side that is attached to the polarizing film.

同様地,作為偏光膜之反對側的偏光板保護薄膜,亦進行購得之纖維素酯薄膜KC8UCR5之鹼化。Similarly, as the polarizing plate protective film on the opposite side of the polarizing film, the alkalization of the commercially available cellulose ester film KC8UCR5 was also carried out.

步驟2:將前述偏光膜,於固體成分2質量%的聚乙烯醇黏著劑溶液之貯藏槽中中進行1~2秒浸漬。Step 2: The polarizing film was immersed in a storage tank of a polyvinyl alcohol adhesive solution having a solid content of 2% by mass for 1 to 2 seconds.

步驟3:輕輕拭去於步驟2附著於偏光膜之過剩黏著劑,將該偏光膜以步驟1中處理之纖維素酯薄膜KC8UCR5的鹼化面與防反射薄膜之鹼化面夾住並層合而作為偏光板。Step 3: Gently wipe off the excess adhesive attached to the polarizing film in step 2. The polarizing film is sandwiched between the alkalized surface of the cellulose ester film KC8UCR5 treated in the step 1 and the alkalized surface of the antireflection film. It is used as a polarizing plate.

步驟4:將於步驟3所作成之偏光板於2個轉動滾筒上,以20~30N/cm2 之壓力進行約2m/min速度之貼合。Step 4: The polarizing plate prepared in the step 3 is applied to the two rotating drums at a speed of about 20 m/min at a pressure of 20 to 30 N/cm 2 .

步驟5:將於步驟4所製作之偏光板,於溫度80℃的乾燥機中進行2分鐘乾燥處理,製作出偏光板201~228。Step 5: The polarizing plate prepared in the step 4 was dried in a dryer at a temperature of 80 ° C for 2 minutes to prepare polarizing plates 201 to 228.

繼續,使用上述作成之偏光板201~228實施以下評估。Continuing, the following evaluations were carried out using the polarizing plates 201 to 228 prepared as described above.

小心翼翼地剝離購得之液晶顯示板(VA型)的最表面偏光板,於此貼合配合偏光方向之各偏光板201~228,作成液晶面板301~328。The outermost polarizing plate of the commercially available liquid crystal display panel (VA type) was carefully peeled off, and the polarizing plates 201 to 228 which were combined with the polarizing direction were bonded to each other to form liquid crystal panels 301 to 328.

將如此所得之液晶面板301~328,配置於自地板為80cm之高度的桌子上,由地板3m高度之天井部,以白天顏色光直管螢光燈(FLR40S.D/M-X、松下電器產業股份有限公司製)40W×2根作為1組,於1.5m間隔下設置10組。此時評估者在於液晶面板顯示面正面,於天井部設置螢光燈使螢光可由評估者之頭上往後方照射。對於液晶面板,自對桌子為垂直之方向為25∘傾斜之方向攝入螢光燈 ,並對於畫面之易見度(辨識性)依據下述等級進行評估。。The liquid crystal panels 301 to 328 thus obtained are placed on a table having a height of 80 cm from the floor, and a fluorescent lamp with a daylight color straight tube (FLR40S.D/M-X, Matsushita Electric Co., Ltd.) Industrial Co., Ltd.) 40 W × 2 is used as one set, and 10 sets are placed at intervals of 1.5 m. At this time, the evaluator is on the front side of the display panel of the liquid crystal panel, and a fluorescent lamp is placed on the ceiling portion so that the fluorescent light can be irradiated from the head of the evaluator to the rear. For the LCD panel, infuse the fluorescent lamp from the direction in which the table is tilted in a vertical direction of 25 inches. And the visibility (identification) of the screen is evaluated according to the following levels. .

又,對於上述製作之液晶面板301~328的亮點異物亦以下述等級進行評估。Moreover, the bright spot foreign matter of the liquid crystal panels 301-328 produced above was also evaluated by the following grade.

(評估) (辨識性) A:最為接近的螢光燈之雜影攝入未令人在意,字形尺寸為8以下的文字亦可讀 B:附近的螢光燈之雜影攝入稍令人在意,但遠處則不會令人在意,字形尺寸為8以下之文字勉強可讀 C:遠處的螢光燈之雜影攝入令人在意,字形尺寸為8以下之文字難以閱讀。 D:螢光燈之雜影攝入非常令人在意,雜影攝入部分的字形尺寸為8以下之文字無法閱讀(assessment) (identification) A: The noise of the closest fluorescent light is not noticeable, and the text with a font size of 8 or less is also readable. B: The shadow of the nearby fluorescent light is slightly noticeable, but it is not noticeable in the distance. The font size is less than 8 and the text is barely readable. C: The ingestion of the fluorescent light in the distant place is noticeable, and the characters with a font size of 8 or less are difficult to read. D: The shadow of the fluorescent light is very interesting. The characters with a glyph size of 8 or less cannot be read.

(亮點異物) 將液晶面板301~328之顯示成為全面黑色顯示,以放大鏡計算其亮點異物的直徑及數目,並依據下述基準進行評估。且此時的放大鏡倍率為50倍。(bright spot foreign body) The display of the liquid crystal panels 301 to 328 was made into a full black display, and the diameter and number of the bright foreign matter were calculated by a magnifying glass, and evaluated according to the following criteria. At this time, the magnification of the magnifying glass is 50 times.

○:未見到100μm以上之異物×:見到100μm以上之異物。其為成為實用上問題之水準。○: No foreign matter of 100 μm or more was observed ×: Foreign matter of 100 μm or more was observed. It is a standard for practical problems.

評估結果如表3所示。The evaluation results are shown in Table 3.

由表3之評估結果得知,使用本發明之防反射薄膜 101~109及116~128、以及本發明之偏光板201~209及216~228的液晶面板301~309及316~328,皆為B以上之評估結果,比使用比較例之防反射薄膜110~115、及比較例之偏光板210~215的液晶面板310~315時其辨識性更良好。又,本發明之液晶面板亦為亮點異物非100μm以上的良好品。It is known from the evaluation results of Table 3 that the antireflection film of the present invention is used. 101 to 109 and 116 to 128, and the liquid crystal panels 301 to 309 and 316 to 328 of the polarizing plates 201 to 209 and 216 to 228 of the present invention are all evaluation results of B or more, and the antireflection film 110 of the comparative example is used. 115, and the liquid crystal panels 310 to 315 of the polarizing plates 210 to 215 of the comparative example have better visibility. Moreover, the liquid crystal panel of the present invention is also a good product having a bright foreign matter of not more than 100 μm.

1‧‧‧有關本發明之防反射薄膜(偏光板保護薄膜)1‧‧‧Anti-reflection film (polarizing plate protective film) relating to the present invention

2‧‧‧二色性偏光膜2‧‧‧ dichroic polarizing film

3‧‧‧偏光板保護薄膜3‧‧‧Polarizer protective film

4‧‧‧光擴散板4‧‧‧Light diffuser

5‧‧‧導光板5‧‧‧Light guide plate

6‧‧‧背光6‧‧‧ Backlight

7‧‧‧液晶顯示板7‧‧‧LCD panel

8‧‧‧辨識側偏光板8‧‧‧ Identification side polarizer

[圖1]表示本發明之較佳液晶顯示裝置構成的概略圖。Fig. 1 is a schematic view showing the configuration of a preferred liquid crystal display device of the present invention.

1‧‧‧有關本發明之防反射薄膜(偏光板保護薄膜)1‧‧‧Anti-reflection film (polarizing plate protective film) relating to the present invention

2‧‧‧二色性偏光膜2‧‧‧ dichroic polarizing film

3‧‧‧偏光板保護薄膜3‧‧‧Polarizer protective film

4‧‧‧光擴散板4‧‧‧Light diffuser

5‧‧‧導光板5‧‧‧Light guide plate

6‧‧‧背光6‧‧‧ Backlight

7‧‧‧液晶顯示板7‧‧‧LCD panel

8‧‧‧辨識側偏光板8‧‧‧ Identification side polarizer

Claims (5)

一種防反射薄膜,其為於透明薄膜基材的至少一方之最表面上具有低折射率層之防反射薄膜,其特徵為低折射率層含有內部為多孔質或空洞之至少1種中空二氧化矽微粒子及作為控制表面(膜面)pH的添加劑,含有下述一般式(1)所示咪唑或其衍生物,且將具有低折射率層的防反射薄膜切出2cm×2cm,作成以低折射率層為表面,又欲防止空氣進入,貼合於貼有無基材雙面帶的丙烯基板上之試料,使貼於丙烯基板的試料的低折射率層面與pH電極接觸,由接觸的隙間使用微滴定管滴入10μL之離子交換水,測定滴下1分鐘後的低折射率層表面(膜面)pH為2.0~7.5者;(R1)nA...(1)式中,R1 表示氫原子、可由胺基或羥基取代之碳數1~3的烷基、烯基及鹵素原子,R1 為複數個時可互為相同或相異;R1 所示胺基中可由1或2個甲基或乙基進行取代;又,烷基及烯基中可由碳數1~3的烷基進行取代;n為1~3的整數;A表示咪唑基。An antireflection film which is an antireflection film having a low refractive index layer on the outermost surface of at least one of the transparent film substrates, characterized in that the low refractive index layer contains at least one hollow dioxide which is porous or void inside. The fine particles and the additive as the pH of the control surface (film surface) contain the imidazole or the derivative thereof represented by the following general formula (1), and the antireflection film having the low refractive index layer is cut out by 2 cm × 2 cm, and is made low. The refractive index layer is a surface, and is intended to prevent air from entering, and is attached to a sample coated on a propylene substrate having no double-sided tape of the substrate, so that the low refractive index layer of the sample attached to the acryl substrate is in contact with the pH electrode, and the gap between the contacts is contacted. 10 μL of ion-exchanged water was dropped by using a microtiter tube, and the surface (film surface) of the low refractive index layer after dropping for 1 minute was measured to have a pH of 2.0 to 7.5; (R1) nA (1) where R 1 represents hydrogen. An atom, an alkyl group having 1 to 3 carbon atoms which may be substituted by an amine group or a hydroxyl group, an alkenyl group and a halogen atom. When R 1 is plural, they may be the same or different from each other; and 1 or 2 of the amine groups represented by R 1 may be Substituting a methyl group or an ethyl group; further, the alkyl group and the alkenyl group may be carried out by an alkyl group having 1 to 3 carbon atoms. Substituted; n is an integer from 1 to 3; A represents an imidazolyl group. 如申請專利範圍第1項之防反射薄膜,其中該低折射率層表面(膜面)pH為2.0~4.0。 The antireflection film of claim 1, wherein the surface of the low refractive index layer (film surface) has a pH of 2.0 to 4.0. 如申請專利範圍第1項之防反射薄膜,其中該低折射率層表面(膜面)pH之測定條件為50℃溫浴中浸漬2小時後者。 The antireflection film of claim 1, wherein the surface of the low refractive index layer (film surface) is measured under the conditions of a temperature of 50 ° C in a bath for 2 hours. 一種偏光板,其特徵為使用如申請專利範圍第1項~第3項中任1項之防反射薄膜於一面上。 A polarizing plate characterized in that an antireflection film according to any one of items 1 to 3 of the patent application is used on one side. 一種顯示裝置,其特徵為使用如申請專利範圍第1項~第3項中任1項之防反射薄膜者。 A display device characterized by using an antireflection film according to any one of items 1 to 3 of the patent application.
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