WO2008114613A1 - 有機物除去方法及び装置 - Google Patents

有機物除去方法及び装置 Download PDF

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Publication number
WO2008114613A1
WO2008114613A1 PCT/JP2008/053974 JP2008053974W WO2008114613A1 WO 2008114613 A1 WO2008114613 A1 WO 2008114613A1 JP 2008053974 W JP2008053974 W JP 2008053974W WO 2008114613 A1 WO2008114613 A1 WO 2008114613A1
Authority
WO
WIPO (PCT)
Prior art keywords
water
organic matters
subjected
necessary
sulfur compound
Prior art date
Application number
PCT/JP2008/053974
Other languages
English (en)
French (fr)
Inventor
Nozomu Ikuno
Original Assignee
Kurita Water Industries Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurita Water Industries Ltd. filed Critical Kurita Water Industries Ltd.
Publication of WO2008114613A1 publication Critical patent/WO2008114613A1/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/722—Oxidation by peroxides
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/30—Organic compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/06—Controlling or monitoring parameters in water treatment pH
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/20—Total organic carbon [TOC]
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/22—O2

Abstract

　電子デバイス製造工程から排出されるリンス排水等の有機物を含有する水の回収再利用に好適に用いることができる、水中の有機物除去方法及び装置。有機物含有排水にペルオキシド基を含む硫黄化合物及び必要に応じてｐＨ調整剤を添加した後紫外線酸化処理を行い、紫外線酸化処理水を必要に応じてｐＨ調整した後、残存する酸化剤を除去し、その酸化剤除去処理水を脱イオン処理する。原水にペルオキシド基を含む硫黄化合物を添加して紫外線酸化処理を行うことにより、酸化力が非常に高い硫酸ラジカルを発生させ、この硫酸ラジカルにより、原水中に存在する有機物をイオン性有機物に形態変化させ、これを脱イオン処理で除去する。
PCT/JP2008/053974 2007-03-16 2008-03-05 有機物除去方法及び装置 WO2008114613A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007068881A JP5211518B2 (ja) 2007-03-16 2007-03-16 有機物除去方法及び装置
JP2007-068881 2007-03-16

Publications (1)

Publication Number Publication Date
WO2008114613A1 true WO2008114613A1 (ja) 2008-09-25

Family

ID=39765723

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/053974 WO2008114613A1 (ja) 2007-03-16 2008-03-05 有機物除去方法及び装置

Country Status (4)

Country Link
JP (1) JP5211518B2 (ja)
KR (1) KR101476864B1 (ja)
TW (1) TWI444338B (ja)
WO (1) WO2008114613A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2334968A1 (es) * 2009-10-08 2010-03-17 Universidad Politecnica De Madrid Cerramiento protector para fachadas de edificaciones.
CN104445576A (zh) * 2014-12-18 2015-03-25 武汉大学 一种基于硫氧自由基的有机污染物氧化处理方法
CN113860553A (zh) * 2021-10-12 2021-12-31 江苏中电创新环境科技有限公司 一种再生水中痕量小分子有机物的去除方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103827040B (zh) * 2011-01-17 2016-01-27 伊沃夸水处理技术有限责任公司 用于提供超纯水的方法和系统
CN104773786A (zh) * 2015-03-24 2015-07-15 大连理工齐旺达化工科技有限公司 一种降低沸石分子筛生产废水的总有机碳含量的方法
CN104773787A (zh) * 2015-03-24 2015-07-15 大连理工齐旺达化工科技有限公司 一种降低沸石分子筛生产废水的化学耗氧量的方法
CA2979867C (en) * 2015-05-07 2023-09-05 Evoqua Water Technologies Llc Advanced oxidation process methods for degasification of reactor vessel
TWI683698B (zh) * 2019-01-15 2020-02-01 兆聯實業股份有限公司 複合型填充材料的填充塔
CN110282694A (zh) * 2019-07-31 2019-09-27 上海应用技术大学 一种紫外/过硫酸盐组合工艺去除水中苯脲类除草剂异丙隆的方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07956A (ja) * 1993-03-05 1995-01-06 Miura Co Ltd 汚水浄化方法
JPH09253638A (ja) * 1996-03-26 1997-09-30 Nomura Micro Sci Co Ltd 超純水製造装置
JPH1199395A (ja) * 1997-07-29 1999-04-13 Japan Organo Co Ltd 有機物含有水の処理方法
JP2001113290A (ja) * 1999-10-19 2001-04-24 Kurita Water Ind Ltd 有機物含有水の処理装置
JP2004033976A (ja) * 2002-07-05 2004-02-05 Kurita Water Ind Ltd 脱イオン水の製造方法及び装置
JP2004050019A (ja) * 2002-07-18 2004-02-19 Kurita Water Ind Ltd 超純水供給設備

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07956A (ja) * 1993-03-05 1995-01-06 Miura Co Ltd 汚水浄化方法
JPH09253638A (ja) * 1996-03-26 1997-09-30 Nomura Micro Sci Co Ltd 超純水製造装置
JPH1199395A (ja) * 1997-07-29 1999-04-13 Japan Organo Co Ltd 有機物含有水の処理方法
JP2001113290A (ja) * 1999-10-19 2001-04-24 Kurita Water Ind Ltd 有機物含有水の処理装置
JP2004033976A (ja) * 2002-07-05 2004-02-05 Kurita Water Ind Ltd 脱イオン水の製造方法及び装置
JP2004050019A (ja) * 2002-07-18 2004-02-19 Kurita Water Ind Ltd 超純水供給設備

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2334968A1 (es) * 2009-10-08 2010-03-17 Universidad Politecnica De Madrid Cerramiento protector para fachadas de edificaciones.
CN104445576A (zh) * 2014-12-18 2015-03-25 武汉大学 一种基于硫氧自由基的有机污染物氧化处理方法
CN113860553A (zh) * 2021-10-12 2021-12-31 江苏中电创新环境科技有限公司 一种再生水中痕量小分子有机物的去除方法
CN113860553B (zh) * 2021-10-12 2022-07-19 江苏中电创新环境科技有限公司 一种再生水中痕量小分子有机物的去除方法

Also Published As

Publication number Publication date
KR101476864B1 (ko) 2014-12-26
TW200902454A (en) 2009-01-16
JP2008229417A (ja) 2008-10-02
KR20090127131A (ko) 2009-12-09
TWI444338B (zh) 2014-07-11
JP5211518B2 (ja) 2013-06-12

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