WO2008108331A1 - 低温プラズマ発生体 - Google Patents

低温プラズマ発生体 Download PDF

Info

Publication number
WO2008108331A1
WO2008108331A1 PCT/JP2008/053756 JP2008053756W WO2008108331A1 WO 2008108331 A1 WO2008108331 A1 WO 2008108331A1 JP 2008053756 W JP2008053756 W JP 2008053756W WO 2008108331 A1 WO2008108331 A1 WO 2008108331A1
Authority
WO
WIPO (PCT)
Prior art keywords
low temperature
plasma generator
temperature plasma
electrode
conductive paste
Prior art date
Application number
PCT/JP2008/053756
Other languages
English (en)
French (fr)
Inventor
Masaru Nakanishi
Masaki Nieda
Original Assignee
Ohnit Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ohnit Co., Ltd. filed Critical Ohnit Co., Ltd.
Priority to CN200880007335.9A priority Critical patent/CN101627514B/zh
Priority to JP2009502571A priority patent/JP5405296B2/ja
Publication of WO2008108331A1 publication Critical patent/WO2008108331A1/ja

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10Preparation of ozone
    • C01B13/11Preparation of ozone by electric discharge
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10Preparation of ozone
    • C01B13/11Preparation of ozone by electric discharge
    • C01B13/115Preparation of ozone by electric discharge characterised by the electrical circuits producing the electrical discharge
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00Preparation of ozone by electrical discharge
    • C01B2201/10Dischargers used for production of ozone
    • C01B2201/14Concentric/tubular dischargers
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00Preparation of ozone by electrical discharge
    • C01B2201/20Electrodes used for obtaining electrical discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)

Abstract

 オゾン生成効率の向上や生産性の向上を目的として、放電極の形成が容易で、より実用的な低温プラズマ発生体を開発し、例えばオゾン殺菌装置のオゾン生成源として利用する。  本発明の低温プラズマ発生体1は、対となる電極要素11,11を対向させてなる低温プラズマ発生体1であって、電極要素11は、絶縁体12の内部に設けた空間の少なくとも内面に密着させて導電ペーストを前記空間に封入し、前記導電ペーストの連続する部分を放電極13とする。
PCT/JP2008/053756 2007-03-05 2008-03-03 低温プラズマ発生体 WO2008108331A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN200880007335.9A CN101627514B (zh) 2007-03-05 2008-03-03 低温等离子体发生器
JP2009502571A JP5405296B2 (ja) 2007-03-05 2008-03-03 低温プラズマ発生体

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007054665 2007-03-05
JP2007-054665 2007-03-05

Publications (1)

Publication Number Publication Date
WO2008108331A1 true WO2008108331A1 (ja) 2008-09-12

Family

ID=39738208

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/053756 WO2008108331A1 (ja) 2007-03-05 2008-03-03 低温プラズマ発生体

Country Status (3)

Country Link
JP (1) JP5405296B2 (ja)
CN (1) CN101627514B (ja)
WO (1) WO2008108331A1 (ja)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102020386A (zh) * 2010-12-09 2011-04-20 浙江米利空气制水科技有限公司 一种多功能制饮用水设备及水处理工艺
JP2013184072A (ja) * 2012-03-05 2013-09-19 Ohnit Co Ltd 気体溶解方法及び気体溶解装置
WO2013150899A1 (ja) * 2012-04-05 2013-10-10 シャープ株式会社 イオン発生装置
DE102015104114A1 (de) 2014-03-20 2015-09-24 Ngk Insulators, Ltd. Elektrode und Elektrodenbaukörper
CN105555000A (zh) * 2014-10-28 2016-05-04 南京苏曼等离子科技有限公司 大放电间距下常温辉光放电低温等离子体材料处理装置
DE102015120301A1 (de) 2014-11-26 2016-06-02 Ngk Insulators, Ltd. Elektrodenstrukturkörper
CN112520702A (zh) * 2020-12-18 2021-03-19 吴庆洲 电极单元、等离子发生器及臭氧杀菌装置
CN113104815A (zh) * 2021-04-06 2021-07-13 上海置中环保科技股份有限公司 一种低温等离子体消毒发生器
CN113925083A (zh) * 2021-11-02 2022-01-14 南京林业大学 一种去壳雷竹笋贮藏保鲜方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4891384B2 (ja) * 2009-12-10 2012-03-07 株式会社新川 プラズマ発生装置
CN103861143A (zh) * 2014-03-12 2014-06-18 张超 新型低温等离子体发生装置
KR101605070B1 (ko) * 2015-05-04 2016-03-24 김정일 저온 수중 플라즈마 발생 장치
CN105536989B (zh) * 2015-12-10 2018-06-15 国网上海市电力公司 一种用于无人值守电站、仓库的小型静电集尘器
CN111908427A (zh) * 2020-07-12 2020-11-10 上海置中环保科技股份有限公司 一种石英毛细管低温等离子体臭氧发生器
CN111840628A (zh) * 2020-07-12 2020-10-30 上海置中环保科技股份有限公司 一种新型低温等离子体空气消毒装置

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5329755U (ja) * 1976-08-20 1978-03-14
JPH0421525U (ja) * 1990-06-13 1992-02-24
JPH04149005A (ja) * 1990-10-12 1992-05-22 Akebono:Kk オゾン発生装置
JPH05155606A (ja) * 1991-12-04 1993-06-22 Yamanashi Hightech Kk オゾン発生装置
JP3015268B2 (ja) * 1994-12-27 2000-03-06 オーニット株式会社 低温プラズマ発生体
JP2004311071A (ja) * 2003-04-02 2004-11-04 Ulvac Japan Ltd 酸素マイナスイオン発生装置
JP2005251458A (ja) * 2004-03-02 2005-09-15 Mitsubishi Materials Corp チップ型サージアブソーバ及びその製造方法
JP2006100031A (ja) * 2004-09-28 2006-04-13 Nittetsu Mining Co Ltd 絶縁体被膜層担持電極を有する気体励起装置、及び気体励起方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0730656Y2 (ja) * 1988-08-09 1995-07-12 京セラ株式会社 オゾン発生用放電体
JPH0763032B2 (ja) * 1989-11-10 1995-07-05 閃一 増田 物体の静電的処理装置
JPH07197806A (ja) * 1993-12-29 1995-08-01 Aqueous Res:Kk 排気ガス処理用のプラズマ放電管
JP3341179B2 (ja) * 1994-01-31 2002-11-05 イーシー化学株式会社 大気圧グロ−放電用電極及び該電極を使用したプラズマ処理方法
JPH0831548A (ja) * 1994-07-18 1996-02-02 Tamura Kinzoku Seisakusho:Kk 脱臭・殺菌用放電管
JP4015210B2 (ja) * 1996-05-30 2007-11-28 富士電機システムズ株式会社 オゾン発生装置
CN101128964B (zh) * 2005-03-28 2012-05-09 三菱电机株式会社 无声放电式等离子体装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5329755U (ja) * 1976-08-20 1978-03-14
JPH0421525U (ja) * 1990-06-13 1992-02-24
JPH04149005A (ja) * 1990-10-12 1992-05-22 Akebono:Kk オゾン発生装置
JPH05155606A (ja) * 1991-12-04 1993-06-22 Yamanashi Hightech Kk オゾン発生装置
JP3015268B2 (ja) * 1994-12-27 2000-03-06 オーニット株式会社 低温プラズマ発生体
JP2004311071A (ja) * 2003-04-02 2004-11-04 Ulvac Japan Ltd 酸素マイナスイオン発生装置
JP2005251458A (ja) * 2004-03-02 2005-09-15 Mitsubishi Materials Corp チップ型サージアブソーバ及びその製造方法
JP2006100031A (ja) * 2004-09-28 2006-04-13 Nittetsu Mining Co Ltd 絶縁体被膜層担持電極を有する気体励起装置、及び気体励起方法

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102020386A (zh) * 2010-12-09 2011-04-20 浙江米利空气制水科技有限公司 一种多功能制饮用水设备及水处理工艺
JP2013184072A (ja) * 2012-03-05 2013-09-19 Ohnit Co Ltd 気体溶解方法及び気体溶解装置
WO2013150899A1 (ja) * 2012-04-05 2013-10-10 シャープ株式会社 イオン発生装置
JP2013218807A (ja) * 2012-04-05 2013-10-24 Sharp Corp イオン発生装置
CN104115351A (zh) * 2012-04-05 2014-10-22 夏普株式会社 离子发生装置
US9117618B2 (en) 2012-04-05 2015-08-25 Sharp Kabushiki Kaisha Ion generating apparatus
DE102015104114A1 (de) 2014-03-20 2015-09-24 Ngk Insulators, Ltd. Elektrode und Elektrodenbaukörper
CN105555000A (zh) * 2014-10-28 2016-05-04 南京苏曼等离子科技有限公司 大放电间距下常温辉光放电低温等离子体材料处理装置
DE102015120301A1 (de) 2014-11-26 2016-06-02 Ngk Insulators, Ltd. Elektrodenstrukturkörper
CN112520702A (zh) * 2020-12-18 2021-03-19 吴庆洲 电极单元、等离子发生器及臭氧杀菌装置
CN113104815A (zh) * 2021-04-06 2021-07-13 上海置中环保科技股份有限公司 一种低温等离子体消毒发生器
CN113925083A (zh) * 2021-11-02 2022-01-14 南京林业大学 一种去壳雷竹笋贮藏保鲜方法

Also Published As

Publication number Publication date
JPWO2008108331A1 (ja) 2010-06-17
CN101627514A (zh) 2010-01-13
JP5405296B2 (ja) 2014-02-05
CN101627514B (zh) 2012-12-05

Similar Documents

Publication Publication Date Title
WO2008108331A1 (ja) 低温プラズマ発生体
WO2009003613A8 (de) Vorrichtung zur behandlung von oberflächen mit einem mittels einer elektrode über ein feststoff-dielektrikum durch eine dielektrisch behinderte gasentladung erzeugten plasma
ATE478456T1 (de) Plasmaerzeugender stecker
EP1498389A4 (en) PROCESS FOR PRODUCING ACTIVE CHARCOAL, POLARIZABLE ELECTRODE AND CAPACITOR WITH DOUBLE ELECTRIC LAYER
WO2006031886A3 (en) Power semiconductor package
MX2011006865A (es) Ensamblado ionizador de electrodos de aire.
WO2005057613A3 (en) Corona discharge electrode and method of operating the same
WO2007127947A3 (en) Substrate processing chamber with dielectric barrier discharge lamp assembly
WO2012153134A3 (en) Disinfection of packaged articles
DK1868243T3 (da) Effekthalvledermodul med fra hinanden elektrisk isolerede tilslutningselementer
WO2006017340A3 (en) Plasma enhanced chemical vapor deposition system for forming carbon nanotubes
DE602007010782D1 (de) Gasentladungslampe
TW200638505A (en) Method of making comb-teeth electrode pair
EP1905057A4 (en) MICROCAVITY PLASMA DEVICE ARRAYS COMPRISING ELECTRODES ENCAPSULATED IN A DIELECTRIC
WO2010074464A3 (ko) 고전압 회로부 삽입형 방전소자
WO2008102679A1 (ja) プラズマ処理装置
WO2008123357A1 (ja) プラズマ発生体及び反応装置
SG178616A1 (en) Liquid medium plasma discharge generating apparatus
WO2013022306A3 (ko) 플라즈마 발생장치, 플라즈마 발생장치용 회전 전극의 제조방법, 기판의 플라즈마 처리방법, 및 플라즈마를 이용한 혼합 구조의 박막 형성방법
ATE551882T1 (de) Drehradelektrodenvorrichtung für gasentladungsquellen mit radabdeckung für hochleistungsbetrieb
WO2006119753A3 (de) Elektrisches durchführungsbauelement mit vielschichtstruktur und verfahren zu dessen herstellung
WO2011065816A3 (en) Electrical plug for charging an electric vehicle
TW200728836A (en) Fluorescent lamp with external electrodes and backlight module using the same
PL2208476T3 (pl) Elektroda płaska
WO2009008399A1 (ja) 電子源

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880007335.9

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08721176

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2009502571

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08721176

Country of ref document: EP

Kind code of ref document: A1