WO2008099449A1 - 断熱構造体、加熱装置、加熱システム、基板処理装置および半導体装置の製造方法 - Google Patents
断熱構造体、加熱装置、加熱システム、基板処理装置および半導体装置の製造方法 Download PDFInfo
- Publication number
- WO2008099449A1 WO2008099449A1 PCT/JP2007/052335 JP2007052335W WO2008099449A1 WO 2008099449 A1 WO2008099449 A1 WO 2008099449A1 JP 2007052335 W JP2007052335 W JP 2007052335W WO 2008099449 A1 WO2008099449 A1 WO 2008099449A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- side wall
- heat insulating
- insulating structure
- cooling gas
- heater
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4411—Cooling of the reaction chamber walls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020087001047A KR100932965B1 (ko) | 2007-02-09 | 2007-02-09 | 단열 구조체, 가열 장치, 가열 시스템, 기판 처리 장치 및반도체 장치의 제조 방법 |
JP2007553401A JP5089401B2 (ja) | 2007-02-09 | 2007-02-09 | 断熱構造体、加熱装置、加熱システム、基板処理装置および半導体装置の製造方法 |
PCT/JP2007/052335 WO2008099449A1 (ja) | 2007-02-09 | 2007-02-09 | 断熱構造体、加熱装置、加熱システム、基板処理装置および半導体装置の製造方法 |
CN2007800007193A CN101395705B (zh) | 2007-02-09 | 2007-02-09 | 隔热构造体、加热装置、基板处理设备以及半导体器件的制造方法 |
TW096105963A TWI328831B (en) | 2007-02-09 | 2007-02-16 | Heat insulation structure, heating device, heating system, substrate processing apparatus, and manufacturing method for a semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/052335 WO2008099449A1 (ja) | 2007-02-09 | 2007-02-09 | 断熱構造体、加熱装置、加熱システム、基板処理装置および半導体装置の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008099449A1 true WO2008099449A1 (ja) | 2008-08-21 |
Family
ID=39689710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/052335 WO2008099449A1 (ja) | 2007-02-09 | 2007-02-09 | 断熱構造体、加熱装置、加熱システム、基板処理装置および半導体装置の製造方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5089401B2 (zh) |
KR (1) | KR100932965B1 (zh) |
CN (1) | CN101395705B (zh) |
TW (1) | TWI328831B (zh) |
WO (1) | WO2008099449A1 (zh) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010056287A (ja) * | 2008-08-28 | 2010-03-11 | Tokyo Ohka Kogyo Co Ltd | 熱処理装置 |
WO2011098295A1 (de) * | 2010-02-15 | 2011-08-18 | Leybold Optics Gmbh | Vorrichtung zur thermischen behandlung von substraten |
JP2012009484A (ja) * | 2010-06-22 | 2012-01-12 | Hitachi Kokusai Electric Inc | 加熱装置 |
JP2012033871A (ja) * | 2010-07-09 | 2012-02-16 | Hitachi Kokusai Electric Inc | 基板処理装置、半導体装置の製造方法及び加熱装置 |
JP2012080080A (ja) * | 2010-09-07 | 2012-04-19 | Tokyo Electron Ltd | 縦型熱処理装置及びその制御方法 |
JP2014209569A (ja) * | 2013-03-25 | 2014-11-06 | 株式会社日立国際電気 | 断熱構造体及び半導体装置の製造方法 |
WO2015141792A1 (ja) * | 2014-03-20 | 2015-09-24 | 株式会社日立国際電気 | 基板処理装置、天井部及び半導体装置の製造方法 |
WO2018105113A1 (ja) * | 2016-12-09 | 2018-06-14 | 株式会社日立国際電気 | 基板処理装置、クーリングユニット及び断熱構造体 |
US11043402B2 (en) | 2017-09-12 | 2021-06-22 | Kokusai Electric Corporation | Cooling unit, heat insulating structure, and substrate processing apparatus |
CN115540341A (zh) * | 2022-03-12 | 2022-12-30 | 无锡恒业电热电器有限公司 | 高温高压空气蓄能电加热器 |
CN117116814A (zh) * | 2023-10-23 | 2023-11-24 | 芯恺半导体设备(徐州)有限责任公司 | 基板处理设备 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5504793B2 (ja) * | 2009-09-26 | 2014-05-28 | 東京エレクトロン株式会社 | 熱処理装置及び冷却方法 |
KR101375742B1 (ko) * | 2012-12-18 | 2014-03-19 | 주식회사 유진테크 | 기판처리장치 |
CN106756879A (zh) * | 2015-11-23 | 2017-05-31 | 中国科学院沈阳科学仪器股份有限公司 | 一种半导体严苛工艺环境下的真空干泵氮气加热装置 |
JP6735686B2 (ja) * | 2017-01-20 | 2020-08-05 | 東京エレクトロン株式会社 | 基板処理装置及び基板の冷却方法 |
JP6752851B2 (ja) * | 2017-09-12 | 2020-09-09 | 株式会社Kokusai Electric | クーリングユニット、基板処理装置、および半導体装置の製造方法 |
JP7023147B2 (ja) * | 2018-03-13 | 2022-02-21 | 東京エレクトロン株式会社 | 断熱構造体及び縦型熱処理装置 |
CN110736345B (zh) * | 2018-07-18 | 2021-01-29 | 北京北方华创微电子装备有限公司 | 用于SiC高温氧化工艺的工艺腔室及热处理炉 |
JP7055075B2 (ja) * | 2018-07-20 | 2022-04-15 | 東京エレクトロン株式会社 | 熱処理装置及び熱処理方法 |
JP7262194B2 (ja) * | 2018-09-18 | 2023-04-21 | 東京エレクトロン株式会社 | 載置台及び基板処理装置 |
CN111128785A (zh) * | 2018-10-30 | 2020-05-08 | 北京北方华创微电子装备有限公司 | 一种热处理装置 |
WO2020241489A1 (ja) * | 2019-05-31 | 2020-12-03 | 株式会社九州日昌 | 加熱装置および加熱方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04369215A (ja) * | 1991-06-17 | 1992-12-22 | Riken Corp | 縦型電気炉 |
JP2005183823A (ja) * | 2003-12-22 | 2005-07-07 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2005286051A (ja) * | 2004-03-29 | 2005-10-13 | Hitachi Kokusai Electric Inc | 基板処理装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE8801785U1 (de) * | 1988-02-11 | 1988-11-10 | Söhlbrand, Heinrich, Dr. Dipl.-Chem., 8027 Neuried | Vorrichtung zur Temperaturbehandlung von Halbleitermaterialien |
JP3184000B2 (ja) * | 1993-05-10 | 2001-07-09 | 株式会社東芝 | 薄膜の形成方法およびその装置 |
-
2007
- 2007-02-09 KR KR1020087001047A patent/KR100932965B1/ko active IP Right Grant
- 2007-02-09 JP JP2007553401A patent/JP5089401B2/ja active Active
- 2007-02-09 WO PCT/JP2007/052335 patent/WO2008099449A1/ja active Application Filing
- 2007-02-09 CN CN2007800007193A patent/CN101395705B/zh active Active
- 2007-02-16 TW TW096105963A patent/TWI328831B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04369215A (ja) * | 1991-06-17 | 1992-12-22 | Riken Corp | 縦型電気炉 |
JP2005183823A (ja) * | 2003-12-22 | 2005-07-07 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2005286051A (ja) * | 2004-03-29 | 2005-10-13 | Hitachi Kokusai Electric Inc | 基板処理装置 |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010056287A (ja) * | 2008-08-28 | 2010-03-11 | Tokyo Ohka Kogyo Co Ltd | 熱処理装置 |
WO2011098295A1 (de) * | 2010-02-15 | 2011-08-18 | Leybold Optics Gmbh | Vorrichtung zur thermischen behandlung von substraten |
JP2012009484A (ja) * | 2010-06-22 | 2012-01-12 | Hitachi Kokusai Electric Inc | 加熱装置 |
JP2012033871A (ja) * | 2010-07-09 | 2012-02-16 | Hitachi Kokusai Electric Inc | 基板処理装置、半導体装置の製造方法及び加熱装置 |
JP2012080080A (ja) * | 2010-09-07 | 2012-04-19 | Tokyo Electron Ltd | 縦型熱処理装置及びその制御方法 |
US9587884B2 (en) | 2013-03-25 | 2017-03-07 | Hitachi Kokusai Electric Inc. | Insulation structure and method of manufacturing semiconductor device |
JP2014209569A (ja) * | 2013-03-25 | 2014-11-06 | 株式会社日立国際電気 | 断熱構造体及び半導体装置の製造方法 |
JPWO2015141792A1 (ja) * | 2014-03-20 | 2017-04-13 | 株式会社日立国際電気 | 基板処理装置、天井部及び半導体装置の製造方法 |
WO2015141792A1 (ja) * | 2014-03-20 | 2015-09-24 | 株式会社日立国際電気 | 基板処理装置、天井部及び半導体装置の製造方法 |
US10415136B2 (en) | 2014-03-20 | 2019-09-17 | Kokusai Electric Corporation | Substrate processing apparatus including heating and cooling device, and ceiling part included in the same |
WO2018105113A1 (ja) * | 2016-12-09 | 2018-06-14 | 株式会社日立国際電気 | 基板処理装置、クーリングユニット及び断熱構造体 |
JPWO2018105113A1 (ja) * | 2016-12-09 | 2019-10-24 | 株式会社Kokusai Electric | 基板処理装置、クーリングユニット及び断熱構造体 |
US11043402B2 (en) | 2017-09-12 | 2021-06-22 | Kokusai Electric Corporation | Cooling unit, heat insulating structure, and substrate processing apparatus |
CN115540341A (zh) * | 2022-03-12 | 2022-12-30 | 无锡恒业电热电器有限公司 | 高温高压空气蓄能电加热器 |
CN115540341B (zh) * | 2022-03-12 | 2023-09-08 | 无锡恒业电热电器有限公司 | 高温高压空气蓄能电加热器 |
CN117116814A (zh) * | 2023-10-23 | 2023-11-24 | 芯恺半导体设备(徐州)有限责任公司 | 基板处理设备 |
CN117116814B (zh) * | 2023-10-23 | 2024-04-05 | 芯恺半导体设备(徐州)有限责任公司 | 基板处理设备 |
Also Published As
Publication number | Publication date |
---|---|
KR20080091423A (ko) | 2008-10-13 |
CN101395705A (zh) | 2009-03-25 |
KR100932965B1 (ko) | 2009-12-21 |
JPWO2008099449A1 (ja) | 2010-05-27 |
JP5089401B2 (ja) | 2012-12-05 |
TW200834650A (en) | 2008-08-16 |
CN101395705B (zh) | 2011-08-10 |
TWI328831B (en) | 2010-08-11 |
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