WO2008090701A1 - マイクロチップの製造方法、及びマイクロチップ基板の接合装置 - Google Patents
マイクロチップの製造方法、及びマイクロチップ基板の接合装置 Download PDFInfo
- Publication number
- WO2008090701A1 WO2008090701A1 PCT/JP2007/074513 JP2007074513W WO2008090701A1 WO 2008090701 A1 WO2008090701 A1 WO 2008090701A1 JP 2007074513 W JP2007074513 W JP 2007074513W WO 2008090701 A1 WO2008090701 A1 WO 2008090701A1
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- WO
- WIPO (PCT)
- Prior art keywords
- microchip
- joining
- face
- sio2
- substrate
- Prior art date
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- 239000000758 substrate Substances 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 10
- 229910052681 coesite Inorganic materials 0.000 abstract 5
- 229910052906 cristobalite Inorganic materials 0.000 abstract 5
- 239000000377 silicon dioxide Substances 0.000 abstract 5
- 235000012239 silicon dioxide Nutrition 0.000 abstract 5
- 229910052682 stishovite Inorganic materials 0.000 abstract 5
- 229910052905 tridymite Inorganic materials 0.000 abstract 5
- 230000004913 activation Effects 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
- B01L3/502707—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the manufacture of the container or its components
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Abstract
流路の内面を親水化処理し、流路内への異物の混入を抑えて、基板同士の接合強度に優れたマイクロチップの製造方法、及びマイクロチップ基板の接合装置を提供する。そのために、真空減圧下又は置換ガスによる大気圧下において、マイクロチップ基板10の微細流路11が形成されている面にSiO2膜12を形成し、マイクロチップ基板20の表面にSiO2膜21を形成する。その後、SiO2膜12、21に対して活性化処理を施し、SiO2膜12、21が形成されている面を内側にして、マイクロチップ基板10、20を重ねて接合する。SiO2膜の形成、活性化処理、及び接合を真空減圧下又は置換ガスによる大気圧下で行うことにより、流路内及び接合面への異物の混入を防止することができ、基板同士を強固に接合できる。
Priority Applications (1)
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JP2008554986A JPWO2008090701A1 (ja) | 2007-01-24 | 2007-12-20 | マイクロチップの製造方法、及びマイクロチップ基板の接合装置 |
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JP2007013912 | 2007-01-24 | ||
JP2007-013912 | 2007-01-24 |
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WO2008090701A1 true WO2008090701A1 (ja) | 2008-07-31 |
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PCT/JP2007/074513 WO2008090701A1 (ja) | 2007-01-24 | 2007-12-20 | マイクロチップの製造方法、及びマイクロチップ基板の接合装置 |
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WO (1) | WO2008090701A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012066096A1 (de) * | 2010-11-18 | 2012-05-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum verbinden von substraten und damit erhältliche verbundstruktur |
JP2012524894A (ja) * | 2009-04-23 | 2012-10-18 | ダブリン シティ ユニバーシティ | 凝固をモニタするための側方流動分析装置及びその方法 |
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JP2012524894A (ja) * | 2009-04-23 | 2012-10-18 | ダブリン シティ ユニバーシティ | 凝固をモニタするための側方流動分析装置及びその方法 |
WO2012066096A1 (de) * | 2010-11-18 | 2012-05-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum verbinden von substraten und damit erhältliche verbundstruktur |
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JP2014503683A (ja) * | 2010-11-18 | 2014-02-13 | フラウンホッファー−ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー.ファオ | 基材の接合方法およびそれにより得られる複合構造体 |
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KR20150003243A (ko) * | 2012-04-10 | 2015-01-08 | 랜 테크니컬 서비스 가부시키가이샤 | 고분자 필름과 고분자 필름을 접합하는 방법, 고분자 필름과 무기재료 기판을 접합하는 방법, 고분자 필름 적층체 및 고분자 필름과 무기재료 기판의 적층체 |
CN104245280A (zh) * | 2012-04-10 | 2014-12-24 | 须贺唯知 | 接合高分子薄膜与高分子薄膜的方法、接合高分子薄膜与无机材料基板的方法、高分子薄膜层叠体及高分子薄膜与无机材料基板的层叠体 |
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CN104245280B (zh) * | 2012-04-10 | 2017-03-29 | 须贺唯知 | 接合高分子薄膜与高分子薄膜的方法、接合高分子薄膜与无机材料基板的方法、高分子薄膜层叠体及高分子薄膜与无机材料基板的层叠体 |
TWI583536B (zh) * | 2012-04-10 | 2017-05-21 | 須賀唯知 | 接合高分子薄膜與高分子薄膜之方法、接合高分子薄膜與無機材料基板之方法、高分子薄膜積層體及高分子薄膜與無機材料基板之積層體 |
US9962908B2 (en) | 2012-04-10 | 2018-05-08 | Lan Technical Service Co., Ltd. | Method for bonding polymer film and polymer film, method for bonding polymer film and inorganic material substrate, polymer film laminate, and laminate of polymer film and inorganic material substrate |
KR102092737B1 (ko) * | 2012-04-10 | 2020-05-27 | 랜 테크니컬 서비스 가부시키가이샤 | 고분자 필름과 고분자 필름을 접합하는 방법, 고분자 필름과 무기재료 기판을 접합하는 방법, 고분자 필름 적층체 및 고분자 필름과 무기재료 기판의 적층체 |
WO2013154107A1 (ja) * | 2012-04-10 | 2013-10-17 | ランテクニカルサービス株式会社 | 高分子フィルムと高分子フィルムとを接合する方法、高分子フィルムと無機材料基板とを接合する方法、高分子フィルム積層体及び高分子フィルムと無機材料基板との積層体 |
JP2015530734A (ja) * | 2012-07-24 | 2015-10-15 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | ウェハを持続的に結合する方法及び装置 |
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