WO2008078498A1 - 排水処理システム及び排水処理方法 - Google Patents
排水処理システム及び排水処理方法 Download PDFInfo
- Publication number
- WO2008078498A1 WO2008078498A1 PCT/JP2007/072958 JP2007072958W WO2008078498A1 WO 2008078498 A1 WO2008078498 A1 WO 2008078498A1 JP 2007072958 W JP2007072958 W JP 2007072958W WO 2008078498 A1 WO2008078498 A1 WO 2008078498A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- wastewater
- wastewater treatment
- raw
- filter membrane
- tank
- Prior art date
Links
- 238000004065 wastewater treatment Methods 0.000 title abstract 3
- 238000000034 method Methods 0.000 title 1
- 239000002351 wastewater Substances 0.000 abstract 10
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract 4
- 239000012528 membrane Substances 0.000 abstract 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 3
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract 2
- 239000001569 carbon dioxide Substances 0.000 abstract 2
- 239000007788 liquid Substances 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/12—Devices for exhausting mist of oil or coolant; Devices for collecting or recovering materials resulting from grinding or polishing, e.g. of precious metals, precious stones, diamonds or the like
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2311/00—Details relating to membrane separation process operations and control
- B01D2311/18—Details relating to membrane separation process operations and control pH control
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/06—Controlling or monitoring parameters in water treatment pH
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2007800481847A CN101573298B (zh) | 2006-12-25 | 2007-11-28 | 废水处理系统和废水处理方法 |
JP2008551005A JP5563765B2 (ja) | 2006-12-25 | 2007-11-28 | 排水処理システム及び排水処理方法 |
US12/477,380 US7922915B2 (en) | 2006-12-25 | 2009-06-03 | Wastewater treatment system and method of wastewater treatment |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006-348049 | 2006-12-25 | ||
JP2006348049 | 2006-12-25 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/477,380 Continuation US7922915B2 (en) | 2006-12-25 | 2009-06-03 | Wastewater treatment system and method of wastewater treatment |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008078498A1 true WO2008078498A1 (ja) | 2008-07-03 |
Family
ID=39562291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/072958 WO2008078498A1 (ja) | 2006-12-25 | 2007-11-28 | 排水処理システム及び排水処理方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7922915B2 (ja) |
JP (1) | JP5563765B2 (ja) |
CN (1) | CN101573298B (ja) |
MY (1) | MY146285A (ja) |
WO (1) | WO2008078498A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013119050A (ja) * | 2011-12-06 | 2013-06-17 | Disco Corp | 廃液処理装置 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101426723B (zh) * | 2006-02-24 | 2011-12-14 | Ihi压缩和机器株式会社 | 硅粒的处理方法和装置 |
KR100985861B1 (ko) * | 2008-09-24 | 2010-10-08 | 씨앤지하이테크 주식회사 | 반도체용 슬러리 공급장치 및 슬러리 공급방법 |
EP2489641A1 (en) * | 2011-02-15 | 2012-08-22 | Ostara Nutrient Recovery Technologies Inc. | Methods and apparatus for struvite recovery using upstream CO2 injection |
JP2012178418A (ja) * | 2011-02-25 | 2012-09-13 | Nomura Micro Sci Co Ltd | 研磨剤の回収方法および研磨剤の回収装置 |
CN102233539A (zh) * | 2011-07-05 | 2011-11-09 | 大连隆正光饰机制造有限公司 | 光饰机水循环系统 |
WO2013091129A1 (en) * | 2011-12-19 | 2013-06-27 | General Electric Company | Membrane filtration process for industrial process water treatment and recovery |
US20180186670A1 (en) * | 2015-02-03 | 2018-07-05 | Chelan, Inc. | Fluid treatment apparatus and processes |
CN109704342A (zh) * | 2018-12-26 | 2019-05-03 | 山东辰宇稀有材料科技有限公司 | 一种硅粉废液回收设备 |
JP2021094674A (ja) * | 2019-12-19 | 2021-06-24 | 株式会社ディスコ | 廃液処理装置及び加工水再生システム |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6261691A (ja) * | 1985-09-12 | 1987-03-18 | Japan Organo Co Ltd | 濾過膜による濾過方法 |
JPS6283086A (ja) * | 1985-10-07 | 1987-04-16 | Nec Kyushu Ltd | 研削排水回収装置 |
JPH08115892A (ja) * | 1994-10-14 | 1996-05-07 | Kurita Water Ind Ltd | 研磨剤粒子の回収方法 |
JPH11156164A (ja) * | 1997-11-26 | 1999-06-15 | Mitsubishi Heavy Ind Ltd | 酢酸セルロース膜の保管方法及びホウ酸廃液処理装置 |
JP2001198825A (ja) * | 2000-01-14 | 2001-07-24 | Kurita Water Ind Ltd | 研磨材の回収装置 |
JP2002050596A (ja) * | 2000-08-02 | 2002-02-15 | Sanyo Electric Co Ltd | 半導体結晶物の処理システムおよび半導体ウェハの処理システム |
JP2005021805A (ja) * | 2003-07-02 | 2005-01-27 | Sumitomo Mitsubishi Silicon Corp | 排水処理方法及び排水処理システム |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH074224B2 (ja) | 1989-10-30 | 1995-01-25 | 三菱電機株式会社 | 膜分離型リアクタの制御装置 |
JPH07316846A (ja) * | 1994-05-27 | 1995-12-05 | Asahi Chem Ind Co Ltd | ケミカルメカニカルポリッシング液の再生方法 |
JPH1066971A (ja) * | 1996-08-28 | 1998-03-10 | Toray Ind Inc | 純水製造装置および純水製造方法 |
JP3341601B2 (ja) * | 1996-10-18 | 2002-11-05 | 日本電気株式会社 | 研磨剤の回収再利用方法および装置 |
JP3569605B2 (ja) | 1997-02-25 | 2004-09-22 | 日本碍子株式会社 | コロイダルシリカ含有廃水からの水回収方法 |
JP3315971B2 (ja) * | 1999-05-27 | 2002-08-19 | 三洋電機株式会社 | 排水の再生システム |
JP3420202B2 (ja) * | 2000-10-26 | 2003-06-23 | 株式会社寺岡精工 | 浄水装置 |
JP4654526B2 (ja) * | 2001-03-30 | 2011-03-23 | 栗田工業株式会社 | 比抵抗調整水製造装置 |
JP4034668B2 (ja) * | 2003-03-04 | 2008-01-16 | オルガノ株式会社 | 超純水製造システムおよびその運転方法 |
-
2007
- 2007-11-28 CN CN2007800481847A patent/CN101573298B/zh active Active
- 2007-11-28 WO PCT/JP2007/072958 patent/WO2008078498A1/ja active Application Filing
- 2007-11-28 JP JP2008551005A patent/JP5563765B2/ja active Active
- 2007-11-28 MY MYPI20092475A patent/MY146285A/en unknown
-
2009
- 2009-06-03 US US12/477,380 patent/US7922915B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6261691A (ja) * | 1985-09-12 | 1987-03-18 | Japan Organo Co Ltd | 濾過膜による濾過方法 |
JPS6283086A (ja) * | 1985-10-07 | 1987-04-16 | Nec Kyushu Ltd | 研削排水回収装置 |
JPH08115892A (ja) * | 1994-10-14 | 1996-05-07 | Kurita Water Ind Ltd | 研磨剤粒子の回収方法 |
JPH11156164A (ja) * | 1997-11-26 | 1999-06-15 | Mitsubishi Heavy Ind Ltd | 酢酸セルロース膜の保管方法及びホウ酸廃液処理装置 |
JP2001198825A (ja) * | 2000-01-14 | 2001-07-24 | Kurita Water Ind Ltd | 研磨材の回収装置 |
JP2002050596A (ja) * | 2000-08-02 | 2002-02-15 | Sanyo Electric Co Ltd | 半導体結晶物の処理システムおよび半導体ウェハの処理システム |
JP2005021805A (ja) * | 2003-07-02 | 2005-01-27 | Sumitomo Mitsubishi Silicon Corp | 排水処理方法及び排水処理システム |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013119050A (ja) * | 2011-12-06 | 2013-06-17 | Disco Corp | 廃液処理装置 |
Also Published As
Publication number | Publication date |
---|---|
CN101573298A (zh) | 2009-11-04 |
MY146285A (en) | 2012-07-31 |
JP5563765B2 (ja) | 2014-07-30 |
US20090236292A1 (en) | 2009-09-24 |
CN101573298B (zh) | 2012-11-14 |
US7922915B2 (en) | 2011-04-12 |
JPWO2008078498A1 (ja) | 2010-04-22 |
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