WO2007099974A1 - Enveloppe d'ecran a emission de champ - Google Patents

Enveloppe d'ecran a emission de champ Download PDF

Info

Publication number
WO2007099974A1
WO2007099974A1 PCT/JP2007/053686 JP2007053686W WO2007099974A1 WO 2007099974 A1 WO2007099974 A1 WO 2007099974A1 JP 2007053686 W JP2007053686 W JP 2007053686W WO 2007099974 A1 WO2007099974 A1 WO 2007099974A1
Authority
WO
WIPO (PCT)
Prior art keywords
glass
envelope
front glass
glass part
strain point
Prior art date
Application number
PCT/JP2007/053686
Other languages
English (en)
Japanese (ja)
Inventor
Tsunehiko Sugawara
Yuichi Kuroki
Mikio Ueki
Hiroshi Kaneko
Original Assignee
Asahi Glass Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co., Ltd. filed Critical Asahi Glass Co., Ltd.
Priority to JP2008502807A priority Critical patent/JPWO2007099974A1/ja
Publication of WO2007099974A1 publication Critical patent/WO2007099974A1/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/86—Vessels; Containers; Vacuum locks
    • H01J29/863—Vessels or containers characterised by the material thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J31/00—Cathode ray tubes; Electron beam tubes
    • H01J31/08—Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
    • H01J31/10—Image or pattern display tubes, i.e. having electrical input and optical output; Flying-spot tubes for scanning purposes
    • H01J31/12—Image or pattern display tubes, i.e. having electrical input and optical output; Flying-spot tubes for scanning purposes with luminescent screen
    • H01J31/123—Flat display tubes

Definitions

  • the present invention relates to an envelope made of a plurality of glass members used for a field emission display (hereinafter referred to as “FED”) using electron field emission.
  • FED field emission display
  • TV television broadcasting receiver
  • CRT cathode ray tube
  • LCD liquid crystal display
  • FPDs flat panel displays
  • PDPs display panels
  • FEDs are known as FPDs other than the LCD and PDP.
  • SED surface-conduction electron-emission display
  • FED using the principle of electron emission is characterized by low power consumption compared to PDP, CRT and LCD, high brightness and high definition compared with LCD, etc., and wide viewing angle, making it easy to see Is expected.
  • the FED is a phosphor pixel formed on the surface of the front glass part (front substrate), a minute emitter (electron emission source) formed on the surface of the rear glass part (back substrate), or a plurality of them. It has a structure in which the arranged emitter arrays are paired and arranged opposite to each other in a matrix form with a substantially constant distance. And the back glass portion front glass portion, the inside is maintained in a vacuum (10_ 4 ⁇ 10_ 7 Pa) is sealed in a state having a airtight. Many emitters such as Spindt type and carbon nanotube type have been proposed.
  • the front glass portion is required to suppress browning due to the electron beam (electron beam browning characteristics).
  • an anode voltage of about several kV to 10 kV is applied as described above, high electrical resistance is required for the front glass portion and the rear glass portion so as not to cause voltage breakdown.
  • a general FED envelope is composed of a flat front glass portion and a flat rear glass portion facing each other, and a substantially rectangular outer frame forming a side wall.
  • the member is hermetically sealed using a sealing material.
  • a shallow box structure in which the front glass part and the outer frame are integrated, and a structure in which the rear glass part and the outer frame are integrated have been proposed.
  • the back glass portion is repeatedly heated to a temperature of about 500 to 580 ° C. Therefore, it is necessary to prevent thermal deformation, thermal shrinkage and thermal damage of the glass due to the high temperature.
  • heat treatment is performed to thermally decompose the organic solvent used in forming the phosphor. It is about 0 ° C.
  • the front glass part and the rear glass part, or the front glass part and the outer frame are generally sealed at a temperature of 450 ° C or lower.
  • the temperature in the exhaust process after sealing ranges from about 300 ° C to 380 ° C.
  • the front glass part is treated at a temperature lower than the maximum temperature in the heat treatment of the back glass part.
  • the rear glass part that is repeatedly heat-treated at a higher temperature causes a larger thermal shrinkage than the front glass part. Therefore, after assembling the envelope by sealing the front glass part on which the pixels are formed and the rear glass part on which the emitters are formed, they face each other due to the difference in thermal shrinkage between the two glasses. The relative positional relationship between the pixel and the emitter Deviation occurs.
  • positional displacement simply refers to a relative positional displacement between the opposing pixel and the emitter, which is caused by a difference in thermal shrinkage between the front glass portion and the rear glass portion. .
  • positional deviation there is a concern that the electron beam emitted from the emitter collides with a position other than the predetermined pixel, causing a color purity defect and causing a fatal problem in image quality.
  • strain point of glass the viscosity of the glass? It is defined as the temperature indicating i-force 10 14 ⁇ 6 dPa 'S. Below the strain point, it is defined as a state in which the glass does not substantially cause viscous flow. That is, when the heat treatment is performed at a high temperature above the strain point of the glass, the heat shrinkage rate of the glass cannot be ignored.
  • glass used in simple matrix LCD and CRT has a strain point that is significantly lower than the heat treatment temperature (500 to 580 ° C) in the CVD method described above, so the shrinkage of the glass after heat treatment is large. It is inappropriate to use it for the back glass part.
  • the high strain point glass has an advantage that the amount of heat shrinkage is small as compared with the low strain point glass even after the high temperature treatment as described above.
  • the back glass has a strain point in the same temperature range (500 to 580 ° C) as that of the heat treatment temperature in the CVD method, or a slightly higher temperature range (570 to 600 ° C). Some high strain point glass is used. In consideration of heat shrinkage, convenience, and consistency of linear thermal expansion coefficient, the same high strain point glass as that of the back glass has been used for the front glass.
  • the processing temperature in the pixel forming process in the front glass part and the subsequent heat treatment process is low, so the heat shrinkage of the front glass part.
  • the rate is relatively small. Therefore, even if a low strain point glass is used as the front glass part, there is a possibility that the difference in heat shrinkage between the front glass part and the rear glass part may fall within the allowable range. It was not done.
  • the melting temperature of glass compared to low strain point glass (the melting temperature of glass generally indicates the viscosity of glass ⁇ force Sl0 2 dPa 'S of
  • the press molding method is more suitable for the production method of the front glass part than the conventional flat glass production method such as the float method.
  • the press molding method is a method in which several types of molds are used to press and mold a high-temperature glass lump (gob) filled in the mold.
  • the press molding method is a method in which the glass is cooled from the start of molding to the end of molding, and the viscosity at the start of molding is generally about 10 2 ' 5 to 10 7 dPa' S.
  • the viscosity at the end of molding is about lC ⁇ l oUdPa'S. That is, the essence of the molding process is to fix the shape of the glass by increasing the viscosity in the process of cooling and solidifying the glass.
  • an alkali oxide essentially contains only a sodium oxide.
  • potassium oxide is generally used, but the content of potassium oxide is extremely small compared to the content of sodium oxide.
  • the front substrate has a strain point of 510 ° C. and contains 13.0% (mass percentage) of sodium oxide as an alkali oxide.
  • An organic EL display using soda lime glass containing 1.0% (mass percentage) of potassium is disclosed.
  • Soda-lime glass has a low volume resistivity (10 8 ⁇ 5 ⁇ 'cm) at 150 ° C, so there is also a problem of inducing dielectric breakdown when used in an FED driven with an anode voltage of several kV or more.
  • glass that does not or does not exhibit the mixed alkali effect such as soda lime glass, is suitable for FED.
  • the mixed alkali effect is a phenomenon in which physical properties such as ionic conductivity, dielectric properties, and mechanical properties are greatly changed when alkali ions in a single alkali glass are replaced with other alkaliions.
  • the characteristic that the mixed alkali effect is most prominent is electrical resistance.
  • a glass containing two or more elements of alkali and exhibiting the above-described mixed strength effect is referred to as mixed alkali glass.
  • Glass having a sufficiently enhanced mixed alkali effect is advantageous in that it has a high electric resistance and good electron beam browning characteristics.
  • the glass (panel glass) used for the image display part (glass panel) of CRT binary mixed alkali glass containing sodium and potassium is used for direct view type CRT.
  • ternary mixed alkali glass containing sodium, potassium and lithium is used for projection cathode ray tubes.
  • the composition of the glass for the glass funnel (funnel glass), which is located on the back side of the CRT and on which the electron gun and the deflection yoke coil are mounted, is used for the panel used for the image display portion.
  • Panel glass used in black and white televisions and panel glass used in early color televisions contained lead in the same way as funnel glass to prevent X-ray leakage.
  • CRT panel glass does not contain lead at all, which has been used to secure X-ray absorption, as a measure to prevent electron beam browning and thermal deformation.
  • glass compositions that contain strontium and barium and have a high strain point while ensuring practical X-ray absorption ability have been used.
  • the strain point of the panel glass is about 470 ° C to 480 ° C, which is about 20 ° C to 40 ° C higher than the strain point of the funnel glass containing lead.
  • the CRT bundles thermoelectrons emitted from at most three force swords into an electron beam with an electron gun, scans them with a deflection yoke coil, and accelerates them to generate hundreds of thousands to millions of pixels.
  • the principle of exciting and emitting phosphors is used. That is, there is no need for a structure in which force swords and phosphor pixels are arranged in a matrix like PDP and FED, which are flat light emitting displays. In addition, it differs from the FED manufacturing method in that it does not require a high-temperature treatment process when forming a force sword on the glass funnel corresponding to the back glass part of the FED.
  • Patent Document 1 discloses an inorganic EL display using soda lime glass for the front substrate and glass having a strain point of 520 ° C or higher for the back substrate.
  • the invention according to Patent Document 1 is intended to prevent thermal deformation of the back substrate itself even when baked at 650 to 700 ° C.
  • it does not provide a specific measure for solving the problems related to the production of the front glass as described above while ensuring the excellent electron beam browning characteristics required for the front glass part for FED. .
  • the invention according to Patent Document 1 has practically used a relative positional shift between the opposing pixel and the emitter, which is caused by a difference in thermal shrinkage between the front glass portion and the rear glass portion, which is a problem unique to FED. It does not provide a glass vacuum envelope that ensures good electron beam browning characteristics while keeping it within a certain range. In addition, the invention according to Patent Document 1 improves the solubility of the front glass part, which is a problem in the production technology of an FED envelope, or the moldability of glass required when the front glass part has a three-dimensional shape. It is not intended to disclose any solution to facilitate the enhancement, in addition to improving the system.
  • Patent Document 1 Japanese Patent Laid-Open No. 2002-025761
  • the present invention provides a practical function as an FED envelope and provides optimum glass properties and glass composition so that glass members constituting the envelope can be easily manufactured. Furthermore, it aims at providing the envelope lightened.
  • the present invention aims to solve the following problems imposed on the FED envelope.
  • the first problem is to reduce the above-mentioned “positional deviation” to a practical range.
  • the second issue is to satisfy the electron beam browning characteristics required for FED.
  • the third issue is to improve the melting property of the front glass part and prolong the life of the melting furnace.
  • the fourth problem is to facilitate press molding when the front glass part has a three-dimensional shape. The goal is to provide an FED envelope that is lighter by using these means for solving problems.
  • the present invention provides the following solution.
  • the first invention is an FED envelope having a front glass part for displaying an image and a rear glass part for forming an emitter, wherein the front glass part and the rear glass part are provided.
  • the glass part is made of mixed alkali glass.
  • a'S is T 77 (° C), and the back glass part has a strain point of T
  • FED envelope characterized by satisfying ⁇ ⁇ 1500.
  • the content of the oxide standard of each component constituting the front glass portion is substantially 60 ⁇ Si0 ⁇ 73, 0 ⁇ in terms of mass percentage. A1 ⁇
  • the content of the alkali metal oxide constituting the front glass portion is substantially 2.0 ⁇ 0.21 Na O + O. 065K O + O. 726Li in terms of mass percentage. 0 ⁇ 2.
  • the envelope for FED of the present invention is composed of a front glass portion having a low strain point and a rear glass portion having a high strain point, but ensures consistency of expansion coefficients with each other. It's going to Therefore, the “positional deviation” described above can be reduced. At the same time, while satisfying the electron beam browning characteristics required for the FED front glass part, the melting property of the front glass part is improved and the melting temperature is lowered, thereby extending the life of the melting furnace. When the front glass part has a three-dimensional shape, press molding can be facilitated. In addition, a significant weight reduction can be achieved by optimizing the density of the front glass.
  • FIG. 1 is a schematic cross-sectional view of a field emission display envelope showing an embodiment of the present invention.
  • FIG. 2 Outline of field emission display envelope showing another embodiment of the present invention.
  • FIG. 1 and 2 are cross-sectional views of an FED envelope showing a typical embodiment of the present invention.
  • an example of an FED envelope according to the present invention includes a front glass portion 1 having phosphor pixels (not shown) formed on the inner surface, and an emitter (not shown) for emitting electrons. And a rear glass portion 2 having a surface arranged on the surface, and a substantially rectangular glass outer frame 3 that forms a side wall.
  • Each member is made of a sealing material. It is hermetically sealed.
  • the FED envelope of the present invention may have a structure in which the front glass portion and the outer frame are integrated as shown in FIG. Further, a reinforcing member may be used so as to cover the peripheral portion of the front glass portion and the outer surface of Z or the back glass portion. In addition, a spacer for keeping a constant distance between the force sword and the anode may be interposed inside the envelope.
  • Alkali-containing glass is used for the front glass part 1, the back glass part 2 and the outer frame 3 constituting the present invention.
  • the melting temperature of the glass becomes high, resulting in a significant reduction in productivity and loss of economy.
  • the envelope Under the high-voltage and high-current driving conditions applied in FED or the like, the envelope exhibits good dielectric breakdown characteristics. That is, mixed alkali glass is used for all of the front glass part, the back glass part, and the outer frame constituting the envelope of the present invention. Specifically, the front glass part, the rear glass part, and the outer frame constituting the envelope of the present invention use glass having a volume resistivity of 150 ⁇ cm or more at 150 ° C.
  • the front glass part constituting the present invention has good electron beam browning characteristics, and the substance amount ratio of the alkali oxide contained is essentially mixed in terms of the characteristics. It is in a range where the potash effect can be expressed. In other words, the substance amount ratio of the alkali oxide contained in the front glass portion constituting the present invention is excellent in volume resistivity that can ensure high insulation. Therefore, it is limited to the range where both the electron beam anti-browning characteristics are compatible.
  • the material amount ratio of the alkali oxide contained in the back glass part is 10 ⁇ ⁇ 'as a volume resistivity. It may be in a range indicating cm or more.
  • the front glass portion and the back glass portion constituting the present invention have different strain points.
  • the front glass part has a strain point of 460 ° C or higher and 505 ° C or lower.
  • the sealing step refers to a step of sealing the front glass portion and the rear glass portion, or a step of sealing with an outer frame interposed between the front glass portion and the rear glass portion.
  • the rear glass portion constituting the present invention has a strain point of 550 ° C or higher and 600 ° C or lower.
  • the strain point of the back glass is less than 550 ° C, the amount of thermal shrinkage increases when heat treatment is performed in a high-temperature process such as emitter formation, which impairs practicality. If the strain point of the back glass exceeds 600 ° C, the good solubility of the glass will be impaired.
  • of the number ⁇ is less than 5 X 10_ 7 / ° C. This allows thermal expansion and heat
  • Consistency during shrinkage is maintained, and thermal cracking (cracking due to thermal expansion and contraction) in a series of heat treatment steps when assembling the FED can be suppressed.
  • the temperature of the glass at the front glass portion is set to 1500 ° C or lower when the viscosity ⁇ of the glass is 10 2 dPa'S.
  • the density of the front glass portion is 2.45 gZcm 3 or more and 2.6 g / cm 3 or less.
  • the viscosity of the glass is 10 2 dPa '.
  • the density of the back glass part may be larger than that of the front glass part.
  • the glass used for the front glass is composed of SiO, CaO, MgO, Li0, Na
  • the glass composition of the front glass portion in the envelope of the present invention is intended to facilitate lightening of the envelope at a low density.
  • the glass composition of the front glass part makes it easy to adjust the linear thermal expansion coefficient, strain point and other high-temperature viscosities, and at the same time exhibits the mixed alkali effect in terms of electric resistance and electron beam browning characteristics. This is also the purpose.
  • SiO is a network former that is important for vitrification.
  • the SiO content is more than 73%, the viscosity of the glass becomes high and melt molding becomes difficult.
  • the content of SiO is preferably 60 to 73%.
  • the viscosity of the mold becomes too high, making melt molding difficult. Therefore, the Al O content is 2.5.
  • MgO and CaO are mainly used to adjust the viscosity curve of glass. If the total content of MgO and CaO is less than 8%, the viscosity becomes too high and it becomes difficult to maintain the strain point at 460 ° C or more and 505 ° C or less. If the total content of MgO and CaO exceeds 12%, the glass tends to devitrify and the liquidus temperature rises. In addition, to the CaO content If the MgO content ratio, that is, the MgO / CaO value is less than 0 ⁇ 15 or more than 2.3, the glass tends to devitrify. Therefore, the total content of MgO and CaO is preferably 8-12%.
  • Both SrO and BaO may be contained to increase the linear thermal expansion coefficient of the glass.
  • the content of Sr ⁇ or Ba ⁇ is 3. If it exceeds / 0 , the density of the glass becomes high and the remarkable lightening effect cannot be obtained.
  • the content of SrO or BaO is more than 3%, BaO-SrO-SiO-based crystals are likely to precipitate. Therefore, the content of SrO and BaO is
  • Both are preferably 3% or less.
  • ZnO is mainly effective in adjusting the viscosity curve of glass and suppressing electron beam browning.
  • the ZnO content is preferably 6% or less.
  • LiO suppresses electron beam browning of the glass and the viscosity of the glass at high temperatures.
  • Li O raw material If the content of LiO is more than 3.0%, the glass tends to devitrify. Li O raw material
  • the content of Li 2 O is preferably 1 to 3%.
  • Na 0 is a component that adjusts the linear thermal expansion coefficient and viscosity of glass, but the content is 0.5%.
  • the NaO content is preferably 0.5-5%.
  • ⁇ is a component that adjusts the linear thermal expansion coefficient and viscosity of glass in the same manner as Na O, but contains
  • the percentage is less than 4%, the viscosity of the glass becomes too high, making melting and forming difficult. If the K ⁇ content is higher than 12%, the linear thermal expansion coefficient of the glass will increase.
  • ZrO has a force content that can be added to adjust the viscosity curve of glass.
  • the surface devitrification temperature increases between the glass and the refractory, and devitrification occurs on the surface. It becomes easy. Further, when the surface devitrification temperature is high, it is not preferable because it becomes difficult to form the glass as in the case where the liquidus temperature inside the glass is high. Therefore, the ZrO content is 2.5.
  • Wrinkles include a force that can be added to prevent glass coloring due to ultraviolet rays and X-rays.
  • the content of TiO is preferably 2% or less.
  • CeO is excellent in the effect of preventing the coloring of the glass by X-rays and is used as a clarifier.
  • the content of 2 is preferably 1% or less.
  • SbO is a force that can be added as a glass refining agent. If the content is more than 0.5%,
  • the SbO content should be 0.5% or less.
  • coloring components such as NiO, CoO, and FeO can be added to reduce the transmittance of the glass or adjust the color of the glass.
  • Pb ⁇ is
  • RO is 1 mole 0/0 or less than 14 mole
  • Molar ratio of sodium oxide to total alkali oxide, Na O / R 0 is 0.12 or more
  • the present invention has been made with the following knowledge about the effect of each alkali oxide to lower the strain point. That is, to lower the strain point, Li O
  • Na 0, K ⁇ and Li ⁇ in the above formula are preferable to be in the following range.
  • Na 0, K ⁇ and Li ⁇ in the above formula are preferable to be in the following range.
  • the envelope of the present invention will be described in detail based on examples and comparative examples.
  • the envelopes in the examples and comparative examples have a structure in which the front glass part and the outer frame are integrated as shown in FIG.
  • the glass composition used for the front glass part and the back glass part in the following Examples and Comparative Examples is prepared by adjusting as follows.
  • a raw material batch prepared so as to have a predetermined composition was put in a platinum crucible, and the raw material was charged at about 1400 ° C, and then heated to a temperature sufficient to melt and melted for about 4 hours.
  • defoaming was carried out by stirring for 30 minutes using a platinum stirring rod during the temperature rise and fall of the molten glass.
  • the molten glass is formed into a predetermined shape and then slowly cooled.
  • the density, linear thermal expansion coefficient, strain point, viscosity, thermal contraction rate, volume resistivity, electron beam browning amount, etc. of each glass thus obtained were measured. Tables 1 to 3 show the measurement results.
  • the heat shrinkage rate is calculated by comparing the distance between the impressions before and after the heat treatment.
  • the heat shrinkage rate of each sample calculated in this way is compared, and if the heat shrinkage rate is about the same as Example 1 (Example) or lower than Example 1 (the amount of heat shrinkage is small)
  • the heat shrinkage characteristics were evaluated by setting “small”, the heat shrinkage rate being higher than that of Example 1, and “large” for (large heat shrinkage).
  • Example 4 On the basis of the decrease in light transmittance in Example 4 (Example), if it is the same as that, it is judged as good, if it is clearly lower than that, it is bad, and it is clearly lower than that. Those that did not were considered excellent, and these evaluations were regarded as electron beam browning characteristics.
  • the back glass part that forms the emitter on the surface is assumed to undergo a high-temperature process in the range of 550 ° C force 600 ° C, and heat shrinkage rate and thermal deformation of the back glass part caused by heat treatment High strain point glass with a strain point of 570 ° C was used so that the amount was within the practical range. Table:! To 2 ⁇ Sf, 0.21 Na O + O. 065K O + O. 726Li O
  • FRI may break the thermal process that produces the envelope.
  • Example values of FRI is 5X 10_ 7 (/ ° C) less than 1 (Example), Example 2 (Example), Example 3 the envelope Cracking (Example) and Example 4 (Example)
  • 6X 1
  • Example 8 (Comparative Example) has a high strain point (strain point T> 505 ° C).
  • the front glass part of (Comparative Example) has a high melting temperature ( ⁇ ⁇ > 1500 ° C).
  • Example 11 (Comparative Example) is an example in which the total amount of CaO and MgO is small (CaO + MgO ⁇ 8%), the melting temperature is high, and (T 77> 1500 ° C).
  • Example 12 (comparative example) is CaO and Mg.
  • Example 13 (comparative example) has a high alkali oxide content (R 0> 14%) and a large S value.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)

Abstract

La présente invention concerne une enveloppe d'écran à émission de champ permettant une réduction d'une enveloppe tout en éliminant un défaut de superposition relatif entre un pixel et un émetteur. L'enveloppe permet également d'améliorer des propriétés de résistance au brunissement de faisceau électronique d'une partie de verre avant et des propriétés de solubilité et de moulage de verre. L'enveloppe d'écran à émission de champ comprend un mélange de verre alcalin, et satisfait aux conditions représentées par les formules 460 = TSF = 505, 550 = TSR < 600, |αF - αR| = 5 × 10-7, 2,45 = dF = 2,6, dF = dR et Tη2 = 1500, où TSF représente le point de distorsion de la partie de verre avant (ºC), αF représente le coefficient de dilatation thermique linéaire de ladite partie (/ºC), dF représente la densité de la partie de verre avant (g/cm3), Tη2 représente la température à laquelle la viscosité de verre de ladite partie, ηF, est 102 dPa/s (ºC), TSR représente le point de distorsion de la partie de verre arrière (ºC), dR représente la densité de ladite partie (g/cm3) et αR représente le coefficient de dilatation thermique linéaire de ladite partie (/ºC).
PCT/JP2007/053686 2006-03-02 2007-02-27 Enveloppe d'ecran a emission de champ WO2007099974A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008502807A JPWO2007099974A1 (ja) 2006-03-02 2007-02-27 フィールドエミッションディスプレイ用外囲器

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-056322 2006-03-02
JP2006056322 2006-03-02

Publications (1)

Publication Number Publication Date
WO2007099974A1 true WO2007099974A1 (fr) 2007-09-07

Family

ID=38459077

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/053686 WO2007099974A1 (fr) 2006-03-02 2007-02-27 Enveloppe d'ecran a emission de champ

Country Status (2)

Country Link
JP (1) JPWO2007099974A1 (fr)
WO (1) WO2007099974A1 (fr)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002025761A (ja) * 2000-07-04 2002-01-25 Nippon Electric Glass Co Ltd 無機ｅｌディスプレイ
WO2004099096A2 (fr) * 2003-05-07 2004-11-18 Saint-Gobain Glass France Composition de verre silico-sodo-calcique, notamment pour la realisation de substrats.
JP2006188406A (ja) * 2005-01-07 2006-07-20 Asahi Glass Co Ltd 平板ディスプレイ用真空外囲器およびそれを用いた平板ディスプレイ

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002025761A (ja) * 2000-07-04 2002-01-25 Nippon Electric Glass Co Ltd 無機ｅｌディスプレイ
WO2004099096A2 (fr) * 2003-05-07 2004-11-18 Saint-Gobain Glass France Composition de verre silico-sodo-calcique, notamment pour la realisation de substrats.
JP2006188406A (ja) * 2005-01-07 2006-07-20 Asahi Glass Co Ltd 平板ディスプレイ用真空外囲器およびそれを用いた平板ディスプレイ

Also Published As

Publication number Publication date
JPWO2007099974A1 (ja) 2009-07-23

Similar Documents

Publication Publication Date Title
US20090105061A1 (en) Glass Composition and Glass Spacer Using the Same
US7977262B2 (en) Glass composition for lamp, lamp, backlight unit and method for producing glass composition for lamp
US7365036B2 (en) Crystallized glass spacer for field emission display and method its production
JP2006188406A (ja) 平板ディスプレイ用真空外囲器およびそれを用いた平板ディスプレイ
US20090141478A1 (en) Glass composition for lamp, lamp, backlight unit and method for producing glass composition for lamp
JP4692915B2 (ja) プラズマディスプレイ装置用前面ガラス基板。
KR20080055969A (ko) 디스플레이 패널
KR100408456B1 (ko) 디스플레이판넬용유리
JP4974046B2 (ja) 平面表示装置用ガラススペーサー及びこれを用いたスペーサー
JP3882489B2 (ja) 電子線励起ディスプレイ素子用ガラススペーサ及び電子線励起ディスプレイ素子
JPWO2006106781A1 (ja) イットリウムを含むガラス組成物を含む電子線励起型ディスプレイ用ガラススペーサおよび電子線励起型ディスプレイ
JP4947486B2 (ja) 平面画像表示装置用ガラスおよびそれを用いたガラス基板並びにその製造方法
JP5299834B2 (ja) 支持枠形成用ガラス粉末、支持枠形成材料、支持枠および支持枠の製造方法
JP2006182637A (ja) フィールドエミッションディスプレイ用結晶化ガラススペーサーおよびその製造方法、ならびにフィールドエミッションディスプレイ
US7755269B2 (en) Spacer and image display panel using the same
JP4953169B2 (ja) 支持枠形成材料
JPH11310432A (ja) 基板用ガラス組成物
US20080203894A1 (en) Display device
WO2007099974A1 (fr) Enveloppe d&#39;ecran a emission de champ
JP2007001831A (ja) 画像表示装置用スペーサと画像表示装置
JP4600061B2 (ja) ガラススペーサーおよびその製造方法、ならびにフィールドエミッションディスプレイ
JP5365976B2 (ja) 支持枠形成用ガラス組成物および支持枠形成材料
JP2005347171A (ja) フィールドエミッションディスプレイ用ガラススペーサーおよびその製造方法、ならびにフィールドエミッションディスプレイ
WO2010134414A1 (fr) Tuyau d&#39;échappement pour dispositif d&#39;affichage
CN102424525A (zh) 一种fed平板显示器

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application
ENP Entry into the national phase

Ref document number: 2008502807

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 07715021

Country of ref document: EP

Kind code of ref document: A1