WO2007058355A1 - Materiau de transfert photosensible, paroi de separation et son procede de formation, dispositif optique et son procede de production, et presentation - Google Patents

Materiau de transfert photosensible, paroi de separation et son procede de formation, dispositif optique et son procede de production, et presentation Download PDF

Info

Publication number
WO2007058355A1
WO2007058355A1 PCT/JP2006/323175 JP2006323175W WO2007058355A1 WO 2007058355 A1 WO2007058355 A1 WO 2007058355A1 JP 2006323175 W JP2006323175 W JP 2006323175W WO 2007058355 A1 WO2007058355 A1 WO 2007058355A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
resin layer
photosensitive resin
layer
substrate
Prior art date
Application number
PCT/JP2006/323175
Other languages
English (en)
Japanese (ja)
Inventor
Takeshi Ando
Naotaka Wachi
Koichi Kawamura
Yuichi Wakata
Original Assignee
Fujifilm Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Priority to JP2007545337A priority Critical patent/JP4913750B2/ja
Priority to CN2006800432085A priority patent/CN101313249B/zh
Publication of WO2007058355A1 publication Critical patent/WO2007058355A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Definitions

  • Photosensitive transfer material partition wall and method for forming the same, optical element and method for manufacturing the same, and display device
  • the present invention relates to a display device such as a liquid crystal display and a liquid crystal color television, an optical element used in the display device, a manufacturing method thereof, a partition provided in the optical element, a method of forming the partition, and a method of forming the partition.
  • the present invention relates to a photosensitive transfer material.
  • a water-soluble polymer material layer which is a dyeing material
  • a transparent substrate is patterned into a desired shape by a photolithographic process, and then the resulting pattern is dyed.
  • Immerse in a bath to obtain a colored pattern.
  • a colored layer having three colored coloring forces of R (red), G (green), and B (blue) is formed.
  • the pigment dispersion method has been actively performed in recent years, and a monochromatic pattern is obtained by forming a photosensitive resin layer in which a pigment is dispersed on a transparent substrate and patterning it. By repeating this process three times while changing the color, a colored layer having the coloring strength of the three colors R, G, and B is formed.
  • a transparent electrode is patterned on a transparent substrate, and the transparent substrate is immersed in an electrodeposition coating solution containing a pigment, a resin, an electrolytic solution, and the first color is electrodeposited. . This process is repeated three times while changing the color to form a colored layer having three colored R, G, B colors, and finally fired.
  • pigments are dispersed in a thermosetting resin, and printing using the resulting dispersion is performed in color.
  • the colored layer is formed by thermosetting the resin.
  • a protective layer is generally formed on the obtained colored layer.
  • the inkjet method is not limited to the manufacture of color filters, but can also be applied to the manufacture of other optical elements such as an electret luminescence element.
  • An electoluminescence device has a configuration in which a thin film containing a fluorescent inorganic and organic compound is sandwiched between a negative electrode and an anode, and electrons and holes (holes) are injected into the thin film for recombination. It is an element that generates excitons by combining them, and emits light by using emission of fluorescence or phosphorescence when the excitons are deactivated.
  • Each color fluorescent material used for such an electroluminescent device can be applied by an ink jet method on a substrate on which an element such as a TFT is formed to form a light emitting layer to constitute the element.
  • the method of applying droplets such as the ink jet method can simplify the manufacturing process and reduce the cost, and thus manufacture of optical elements such as a color filter and an electroluminescent element. Has been applied to.
  • specific problems such as “white spots”, “extruding ink” and “color mixing” as shown in FIG. There is.
  • the above problem will be described by taking a case of producing a color filter as an example.
  • Ink protrusion means that a black matrix is used as a partition 51, and black matrix is used as a partition when a colored portion is formed by applying ink to the opening (pixel portion) of the black matrix. Ink overflows beyond the status and color mixing is a phenomenon in which overflowed ink mixes between adjacent colored parts.
  • White spots mean that the ink is sufficiently spread to the openings where the wettability between the glass surface of the opening and the side walls of the partition and the ink is poor, or a gap is formed between the sidewall and the filled ink. This is a phenomenon.
  • the thickness unevenness in the pixels 53A to 53C is a phenomenon in which the thickness of the ink is different in one pixel, and is caused when the ink is raised and applied to the opening (pixel portion) of the black matrix.
  • an ink-repellent treatment is applied to the partition wall to prevent color mixing, it often occurs at the four corners of the pixel and immediately becomes thin.
  • a silicone rubber layer having water and oil repellency acts as a partition wall for preventing color mixing (for example, see Patent Document 1).
  • a method of forming a silicone rubber layer on a black matrix serving as a light shielding layer and using it as a partition wall for preventing color mixing has been proposed. In these methods, the ink repellency exhibited by the surface layer of the partition wall is insufficient, and a sufficient effect cannot be obtained.
  • ink repellent treatment was performed by this method, ink mixing between adjacent pixels could be effectively prevented, but there was a drawback that white spots were likely to occur. This is a problem that arises because the ink repellent treatment is not limited to the upper surface of the partition walls but extends to the substrate surface and the side surfaces of the partition walls. In addition, a large capital investment is required to perform plasma treatment.
  • a method using a wettability adjusting agent having a reactive group there is a method using a wettability adjusting agent having a reactive group.
  • an ink repellent treatment example using a fluorine-containing silane coupling agent as a wettability adjusting agent having a reactive group is disclosed (for example, refer to Patent Document 5). 0
  • ink repellent treatment is performed by this method, Ink mixing between adjacent pixels can be effectively prevented, and the side wall of the partition is not processed, so that bubbles near the partition are not generated.
  • any of these methods requires a dedicated process for the ink repellent treatment, which is a cost burden.
  • Patent Document 1 Japanese Patent Laid-Open No. 4-123005
  • Patent Document 2 Japanese Patent Laid-Open No. 5-241011
  • Patent Document 3 Japanese Patent Laid-Open No. 5-241012
  • Patent Document 4 Japanese Patent Laid-Open No. 2003-344640
  • Patent Document 5 JP-A-9-127327
  • Patent Document 6 Japanese Patent Laid-Open No. 2002-139612
  • a photosensitive transfer material capable of forming a photosensitive resin layer imparted with ink repellency only on a desired surface, mixed colors, white spots, protrusions, and the like generated when pixels are formed.
  • a partition that can effectively prevent unevenness in thickness a method for forming the partition that can easily form the partition, an optical element that does not have color mixing, white spots or protrusion, and unevenness in thickness within a pixel, and the optical element There is a need for a method of manufacturing an optical element that can stably obtain a display device, and a display device free from display defects.
  • the present inventor has reached the present invention in view of the above situation.
  • the first aspect of the present invention is a photosensitive having a temporary support, a surface treatment layer containing a fluorine compound having a polymerizable group, and a photosensitive resin layer in contact with the surface treatment layer in this order.
  • a transfer material is provided.
  • a second aspect of the present invention uses the photosensitive transfer material having a photosensitive resin layer and a surface treatment layer, and the photosensitive transfer layer is in contact with a substrate so that the photosensitive resin layer is in contact with the substrate.
  • a method for forming a partition wall comprising pressing a material onto a substrate, pattern-exposing the photosensitive resin layer through the surface treatment layer, and developing the photosensitive resin layer in this order.
  • a third aspect of the present invention provides a partition formed by the above method.
  • a fourth aspect of the present invention provides a method of manufacturing an optical element, characterized in that a pixel is formed by applying droplets to the recesses defined by the partition walls by an inkjet method.
  • a fifth aspect of the present invention includes at least a plurality of pixels and a partition formed so as to partition the pixels on a substrate, and is manufactured by the manufacturing method of the fourth aspect.
  • An optical element characterized by the above is provided.
  • a sixth aspect of the present invention provides a display device comprising the optical element of the fifth aspect.
  • the photosensitive transfer material of the present invention has at least a surface treatment layer and a photosensitive resin layer on a temporary support, and the surface treatment layer has a polymerizable group (hereinafter referred to as “ It may also be referred to as a “polymerizable group-containing fluorine compound”.
  • the photosensitive resin layer and the partition formed on the substrate using the photosensitive transfer material are repellent only on the upper surface (the opposite surface of the substrate). Ink properties can be imparted.
  • the said surface treatment layer refers to the layer for processing the temporary support body side surface of a photosensitive resin layer formed so that the temporary support body surface of a photosensitive resin layer may be touched. Specifically, for example,
  • thermoplastic resin layer 40 As shown in FIG. 2B, the thermoplastic resin layer 40, the intermediate layer 20, and the photosensitive layer on the temporary support 30.
  • the photosensitive resin layer 10 is formed on the photosensitive transfer material formed so that they are in contact with each other in this order.
  • the intermediate layer 20 is formed. Point to. Also,
  • thermoplastic resin layer and the photosensitive resin layer are formed on the temporary support so that they are in contact with each other in this order.
  • the photosensitive transfer material is pressure-bonded to a substrate for forming a partition wall, etc., it is excellent in prevention of mixing of each layer, oxygen barrier property, adhesion at the time of pressure-bonding, and economical efficiency. It is particularly preferable that the photosensitive transfer material is in the embodiment (1).
  • the polymerizable group-containing fluorine compound is concentrated on the air interface side. Further, by forming a photosensitive resin layer thereon (on the air interface side), a polymerizable group-containing fluorine compound is concentrated on the interface of the surface-treated layer on the photosensitive resin layer side. Become. Next, in this state, the photosensitive resin layer is exposed from the surface treatment layer side. Then, a polymerization reaction is caused by the initiator in the photosensitive resin layer, and the photosensitive resin layer is cured.
  • the polymerizable group-containing fluorine compound in the surface treatment layer interacts with the photosensitive resin layer, such as chemical bonding or physical adsorption, and is fixed to the surface treatment layer side interface. Is done. In this way, ink repellency can be imparted only to the surface treatment layer side interface of the photosensitive resin layer. Further, after the exposure, by removing the surface treatment layer by c) development described later, a partition wall having ink repellency can be produced only on the upper surface (surface opposite to the substrate). Heating the surface treatment layer and the photosensitive resin layer before a) pressing, or between a) pressing and b) exposure is also preferable because the interaction can be further strengthened.
  • the surface treatment layer can achieve its purpose if it has a film thickness of about one molecule, so the film thickness of the surface treatment layer is not particularly limited. However, it is preferably 15. ⁇ m or less from the viewpoint of economical efficiency and developability, more preferably 3.0 m or less.
  • a layer of a fluorine-containing compound containing a polymerizable group of 0.1 ⁇ m or less exists on the surface of the photosensitive resin layer after exposure and development.
  • the fluorine compound does not cry out in the liquid crystal when the panel is turned on.
  • the film thickness of the partition wall does not become thicker than a desired film thickness. In this case, the cell gap can be easily set to a desired value, and problems such as unevenness do not occur.
  • the number of fluorine atoms on the top surface measured by ESCA is preferably 0.10 or more, more preferably 0.30 or more.
  • ESCA measurement was performed by preparing a solid sample for measurement with a solid exposure at a predetermined exposure amount, and the atomic ratio of the surface was determined by ESCA (manufactured by ULVAC-FAI, PHI-5300, detection angle). 45 °).
  • the partition wall produced by the above method has ink repellency only on the top surface and no ink repellency site on the side surface. For this reason, there is an advantage that white-out failure hardly occurs.
  • the thickness of the partition wall can be made the same as the thickness of the photosensitive resin layer, and there is an advantage that no problem due to film thickness variation occurs.
  • the surface treatment layer does not contain a photopolymerization initiator or a photopolymerization initiator system.
  • does not contain means that no photopolymerization initiator or photopolymerization initiator system is added when the surface treatment layer coating solution is prepared.
  • the film thickness of the partition wall that does not cause the surface treatment layer to harden during exposure does not become larger than the desired film thickness. If this happens, the cell gap can be set to the desired value and problems such as unevenness will not occur!
  • the surface treatment layer may be formed from a coating solution in which an aqueous layer (25% by mass or more (more preferably 40% by mass or more) of the solvent) is water from the viewpoint of separate coating with the photosensitive resin layer. It is preferable that the formed layer).
  • an aqueous layer (25% by mass or more (more preferably 40% by mass or more) of the solvent) is water from the viewpoint of separate coating with the photosensitive resin layer. It is preferable that the formed layer).
  • the polymerizable group-containing fluorine compound used in the present invention may be, for example, a polymer compound having a fluorine atom and a polymerizable unsaturated double bond (hereinafter referred to as “polymerizable group-containing fluorine-containing polymer”). ). Furthermore, it is preferable that this polymer compound is soluble in an alkaline aqueous solution. In this case, it is possible to remove the unreacted polymer compound by development, and the process is excellent in environmental compatibility with less labor. Can be provided. Further, from the viewpoint of dissolution in the coating solution for the surface treatment layer, the polymer compound preferably contains a water-soluble group.
  • a copolymer of a fluorine-containing monomer part and a double bond-containing monomer part is preferably used, and further preferably includes a hydrophilic monomer part.
  • an oil- and water-repellent monomer such as a fluorine-containing monomer
  • a method of copolymerizing a fluorine-containing monomer, a hydrophilic monomer, and a monomer having an ethylene addition polymerizable unsaturated group in the side chain (b) A method in which a fluorine-containing monomer, a hydrophilic monomer and a monomer having a double bond precursor are copolymerized, and then a double bond is introduced into a polymer obtained by treatment with a base or the like; (c) a carboxylic acid or the like And a method of reacting a fluorine-containing polymer having a hydrophilic functional group with a compound having an ethylene addition polymerizable unsaturated group.
  • Examples of the monomer having an ethylene addition polymerizable unsaturated group in the side chain used in the method (a) include an aryl group-containing monomer, specifically, aryl (meth) acrylate, 2- Aryloxetyl metatalylate is mentioned.
  • the monomer having a double bond precursor used in the method (b) is, for example, 2- (3 chloro-1oxopropoxy) ethyl methacrylate, 2- (2 bromo-2-methyl). 1 oxoproboxy) ethinoremethacrylate.
  • a base act By making a base act, a fluorine-containing monomer, a hydrophilic monomer, and a double bond precursor are converted. This is a method of promoting the deoxidation reaction of the copolymer of the monomer having the double bond precursor to a double bond.
  • inorganic bases such as inorganic bases can be used as the base, and tertiary bases such as triethylamine, diisopropylethylamine, diazabicycloundecene and diazabicyclononene are preferred. It is preferable to use etc.
  • an unsaturated group is introduced by utilizing a reaction between a carboxyl group, an amino group or a salt thereof in the fluorine-containing polymer and a functional group such as a hydroxyl group or an epoxy group.
  • a functional group such as a hydroxyl group or an epoxy group.
  • the compound having an ethylenically polymerizable unsaturated group used to enter are (meth) acrylic acid, glycidyl (meth) acrylate, allyl glycidyl ether, 2-isocyanatoethyl (meth) acrylate, and the like. It is done.
  • the monomer having an ethylene addition polymerizable unsaturated group is a monomer having a highly reactive ethylene addition polymerizable unsaturated group from the viewpoint of increasing the sensitivity of the water repellent (ink repellent) reaction! It is preferable that the length of the main chain is a monomer (main chain carbon atom number is 5 or more, more preferably 8 or more).
  • fluorine-containing monomer for example, at least one fluorine-containing monomer selected from the group force consisting of the following general formulas (1), ( ⁇ ), (III), (IV) and (V) can be mentioned.
  • R 1 is a hydrogen atom or a methyl group
  • R 2 is CH —, —C (CH 2) H—, —CH
  • R g represents a fluoroalkyl group having 1 to 20 carbon atoms.
  • CH CHR g ⁇ ⁇ ⁇ ⁇ ( ⁇ )
  • R 3 and R 4 are hydrogen atoms or methyl groups
  • R 5 and R 6 are —CH—, —C (C q 2q q
  • R j represents —CF—.
  • q is an integer from 1 to 10
  • t is an integer from 1 to 16.
  • CH CR 7 COOCH CH (CH R k )
  • OCOCR 8 CH (V)
  • R 7 and R 8 are a hydrogen atom or a methyl group
  • R k represents —CF, where y is 1 to 16 y 2y + l.
  • the number of main chain carbon atoms of the perfluoro group is larger. Specifically, CF (C
  • the terminal of the perfluoro group is a fluorine atom.
  • CF fluorine atom
  • H OCOCH CH and the like can be mentioned.
  • hydrophilic monomer that is used in the methods (a) and (b) and also serves as a raw material for the fluorine-containing polymer having a hydrophilic functional group in the method (c) will be described.
  • the hydrophilic monomer useful in the present invention is a monomer having a positive charge such as ammonia or phosphonium, or a negative charge such as sulfonic acid group, carboxyl group, phosphoric acid group or phosphonic acid group. Or a monomer having an acidic group that can be dissociated into a negative charge.
  • a hydrophilic monomer having a nonionic group such as a hydroxyl group, an amide group, a sulfonamide group, an alkoxy group, a cyano group, or an ethylene oxide group.
  • hydrophilic monomers in the present invention include the following monomers.
  • 2-hydroxyethyl (meth) acrylate, (meth) acrylamide, N monomethylol (meth) acrylamide, N dimethylol (meth) acrylamide, N bulupyrrolidone, N-bilacetamide, polyoxyethylene glycol mono (meth) Atarilate is also useful.
  • non-ionic ones are more preferable because they are less likely to contain impurities in the liquid crystal layer.
  • Specific examples include 2-hydroxyethyl (meth) acrylate, (meth) acrylamide, N —Monomethylol (meth) acrylamide, N-dimethylol (meth) acrylamide, N —Buylpyrrolidone, N-vinylacetamide, polyoxyethylene glycol mono (meth) acrylate.
  • the polymerizable group-containing fluoropolymer in the present invention may be copolymerized with other monomers in addition to the monomer having a fluorine atom and a polymerizable unsaturated double bond group as its constituent elements. These monomers are used to improve the solvent solubility of the polymer compound of the present invention. Monomers used for such purposes are not particularly limited, but acrylic esters such as (meth) acrylic acid methyl ester, (meth) acrylic acid butyl ester, and (meth) acrylic acid methoxyethyl ester. Can be used.
  • the polymerizable group-containing fluorine-containing polymer of the present invention has a lower Tg, so that the repellent property is more likely to proceed. Therefore, it is also preferable that such a monomer is copolymerized. Specifically, an alkyl acrylate having an alkyl group having 3 or more carbon atoms can be used. [0050]
  • the polymerizable group-containing fluorine compound obtained as a monomer power is preferably a resin represented by the following structural formula (1).
  • R u , R 12 , R 13 , R ′′, and R 16 independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
  • Examples of the alkyl group having 1 to 5 carbon atoms in total represented by R U to R 14 and R 16 include a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group.
  • An alkyl group of 1 to 3 is preferred, and a methyl group is particularly preferred! /.
  • R U , R 12 , R 13 , R W , and R 16 are preferably a hydrogen atom or a methyl group.
  • R 15 represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms in total, or an aryl group having 6 to 20 carbon atoms in total.
  • the alkyl group having 1 to 12 carbon atoms represented by R 15 has, for example, a functional group such as a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, and a dodecyl group.
  • a functional group such as a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, and a dodecyl group.
  • Preferred is an alkyl group having a functional group such as an alkyl group, hydroxyethyl group, hydroxybutyl group, hydroxypropyl group, dihydroxypropyl group, trimethylammonium group, dimethylbenzylammoethyl group, etc.
  • a methyl group and a propyl group are particularly preferred, where an alkyl group of 1 to 4 is preferred.
  • aryl group having 6 to 20 carbon atoms represented by R 15 for example, a phenyl group, a methoxyphenyl group, a methylphenol group, an oxyphenyl group, a dimethylaminophenol group, and the like are preferable. A phenyl group and a methoxyphenyl group are particularly preferred.
  • R 15 is preferably a hydrogen atom, a methyl group, a propyl group, or a hydroxyethyl group.
  • L and L each independently represent a single bond or a divalent linking group.
  • the divalent linking group represented by L and L is preferably an alkylene group or an arylene group.
  • It may have a hydroxy group, an ester group, a monoether bond, an ester bond, or a urethane bond which may be unsubstituted or have a substituent.
  • Y is more preferably a single bond and a substituent having the following structure.
  • n represents an integer of 1 to 6.
  • X represents an ester group, an amide group, or an alkyl group that may have a substituent.
  • the arylene group represented by X, X and X is an arylene group having 6 to 20 carbon atoms in total.
  • Preferred examples include phenylene, naphthylene, anthracene, biphenylene.
  • phenylene and biphenylene are particularly preferable, in which an arylene group having 6 to 12 carbon atoms is more preferable.
  • Examples of the heterocyclic residue represented by X and X include a nitrogen atom or an oxygen atom.
  • An imidazole ring, a quinoline ring, a thiadiazole ring, a force prolatatam ring, a pyrrolidone ring and the like are preferable, and a pyridine ring, a thiadiazole ring, a force prolatatam ring and a pyrrolidone ring are more preferable.
  • X is preferably the following linking group or a linking group having the following structure.
  • [0064] represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 20 carbon atoms.
  • alkyl group having 1 to 12 carbon atoms in total and the aryl group having 6 to 20 carbon atoms in total are synonymous with those in R 15 , and preferred embodiments thereof are also the same.
  • X and X are preferably the following linking groups or linking groups having the following structure.
  • Rf 2 represents a substituent containing fluorine.
  • the substituent containing fluorine the following fluorine-containing groups or fluorine-containing groups having the following structures are suitable.
  • m in the fluorine group represents an integer of 1 to 20
  • 1 represents an integer of 1 to 10
  • n represents an integer of 1 to 20.
  • the molecular weight (Mw) of the polymerizable group-containing fluoropolymer that can be used in the present invention is preferably in the range of 1,000 to 1,000,000, more preferably in the range of 2000 to 100,000, more preferably in the range of 2000 to 40,000. Most preferred. Within this molecular weight range, an excellent water repellency effect and solubility in a solution can be achieved. A molecular weight of 1000 or more is preferable because it is easy to achieve both ink repellency and solubility. Moreover, it is preferable that it is 1 million or less because the solubility is not inferior.
  • the proportion of the polymerizable group-containing fluorine compound in the solid content of the surface treatment layer is preferably 1 to 50% by mass, more preferably 5 to 30% by mass.
  • examples of the surface treatment layer in the present invention include an intermediate layer, a thermoplastic resin layer, and other layers. Next, the intermediate layer and the thermoplastic resin layer will be described.
  • the photosensitive transfer material of the present invention preferably has an intermediate layer for preventing mixing of components during application of a plurality of application layers and during storage after application.
  • the intermediate layer corresponds to the surface treatment layer, it is essential to contain a polymerizable group-containing fluorine compound, and from the viewpoint of separate coating from the photosensitive resin layer.
  • the aqueous layer solvent 2 It is preferred that the layer is formed by a coating solution in which 5% by mass or more is water.
  • an intermediate layer having an oxygen-blocking function described as “separation layer” in paragraphs [0014] to [0015] of JP-A-5-72724 is preferable.
  • the oxygen-blocking film a known medium force that exhibits low oxygen permeability and is preferably dispersed or dissolved in water or an aqueous alkali solution can be appropriately selected. Of these, especially preferred! , Is a combination of polybulal alcohol and polybulurpyrrolidone.
  • the dry thickness of the intermediate layer is generally from 0.2 to 5 / ⁇ ⁇ , preferably from 0.5 to 3 / ⁇ ⁇ , particularly preferably from 1 to 2.
  • the photosensitive transfer material of the present invention may have a thermoplastic resin layer as necessary. As described above, when the thermoplastic resin layer corresponds to the surface treatment layer, it is essential to contain a polymerizable group-containing fluorine compound.
  • the coverable thermoplastic resin layer is alkali-soluble and contains at least a resin component, and the resin component preferably has a substantial soft point of 80 ° C. or less.
  • alkali-soluble thermoplastic resins having a softness point of 80 ° C or lower examples include styrene and (meth) acrylate copolymer cans. , Compounds of butyltoluene and (meth) acrylic acid ester copolymers, poly (meth) acrylic acid esters, (meth) acrylic acid ester copolymers such as butyl (meth) acrylate and butyl acetate A saponification thing etc. are mentioned.
  • thermoplastic resin layer at least one of the above-mentioned thermoplastic resins can be appropriately selected and used.
  • thermoplastic resins can be appropriately selected and used.
  • “Plastic Performance Handbook” Japan Plastic Industry Federation, All Japan Plastic Molding Industry Association) Edited by the Industrial Research Council, published on October 25, 1968
  • organic polymers that are soluble in an alkaline solution among organic polymers with a soft spot of about 80 ° C or less.
  • an organic polymer substance having a soft spot of 80 ° C or higher various plasticizers compatible with the polymer substance can be substantially added to the organic polymer substance.
  • Softening point 8 It can also be used by lowering below o ° c.
  • these organic polymer substances have various polymers, supercooled substances, and adhesion improvements as long as the actual soft spot does not exceed 80 ° C in order to adjust the adhesive strength with the temporary support.
  • An agent, a surfactant, a release agent or the like can also be added.
  • plasticizers include polypropylene glycol, polyethylene glycol, dioctyl phthalate, diheptyl phthalate, dibutyl phthalate, tricresyl phosphate, cresyl diphenyl phosphate biphenyl diphosphate. Can do.
  • a force that is chemically and thermally stable and is composed of a flexible substance can be appropriately selected.
  • a biaxially stretched polyethylene terephthalate film is particularly preferable among thin sheets or laminates thereof such as Teflon (registered trademark), polyethylene terephthalate, polycarbonate, polyethylene, and polypropylene.
  • the temporary support has a thickness of 5 to 300 ⁇ 111, preferably 20 to 150 ⁇ m.
  • the photosensitive resin layer in the present invention comprises at least (1) an alkali-soluble binder, (2) a monomer or oligomer, and (3) a photopolymerization initiator or a photopolymerization initiator system. It is preferable to form by coating. In addition, from the viewpoint of obtaining light-shielding properties, the composition preferably further includes (4) a colorant. It is more preferable that the photosensitive resin layer has a light shielding property because it has a function of a partition black matrix.
  • binder As the alkali-soluble binder (hereinafter sometimes simply referred to as “binder”) in the present invention, a polymer having a polar group such as a carboxylic acid group or a carboxylic acid group in the side chain is preferable. Examples thereof include JP-A-59-44615, JP-B-54-34327, JP-B-58-12577, JP-B-54-25957, JP-A-59-53836 and JP-A-59-53836.
  • Methacrylic acid copolymer as described in Sho 59-71048 , Acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, and partially esterified maleic acid copolymer.
  • the cellulose derivative which has a carboxylic acid group in a side chain can also be mentioned,
  • the cyclic acid anhydride to the polymer which has a hydroxyl group can also be used preferably.
  • Particularly preferred examples include copolymers of benzyl (meth) acrylate and (meth) acrylic acid described in US Pat. No. 4,139,391, benzyl (meth) acrylate and (meth) acrylate.
  • the binder polymer having these polar groups may be used alone or in the form of a composition used in combination with a normal film-forming polymer.
  • the content with respect to the content is generally 20 to 50% by mass, preferably 25 to 45% by mass.
  • the monomer or oligomer in the present invention is preferably a monomer or oligomer that has two or more ethylenically unsaturated double bonds and undergoes addition polymerization upon irradiation with light.
  • Examples of such monomers and oligomers include compounds having at least one ethylenically unsaturated group capable of addition polymerization in the molecule and having a boiling point of 100 ° C. or higher at normal pressure.
  • Examples thereof include monofunctional acrylates and monofunctional methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate and phenoxychetyl (meth) acrylate; polyethylene glycol di (meth) acrylate, Polypropylene glycol di (meth) acrylate, trimethylol ethane triacrylate, trimethylol propane tri (meth) acrylate, trimethylol propane diathalate, neopentyl dallicol di (meth) acrylate, pentaerythritol tetra (meta) ) Atalylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, hexane All-di (meth) tarylate, trimethylolpropane tri (
  • urethane acrylates described in JP-B-48-41708, JP-B-50-6034 and JP-A-51-37193; JP-A-48-64183, JP-B-49-43191 Polyester atalylates, such as epoxy acrylates, which are the reaction products of epoxy resin and (meth) acrylic acid, and metatalylates are described in be able to.
  • trimethylolpropane tri (meth) acrylate pentaerythritol tetra (meth) acrylate, dipentaerythritol hex (meth) acrylate, and dipentaerythritol penta (meth) acrylate are preferred.
  • polymerizable compound B described in JP-A-11-133600 can also be mentioned as a preferable example.
  • the content of the photosensitive resin composition with respect to the total solid content is generally 5 to 50% by mass, 10 to 40% by mass is preferred!
  • the photopolymerization initiator or photopolymerization initiator system in the present invention is disclosed in U.S. Pat. No. 2367660, vicinal polyketaldo-louis compound, U.S. Pat.
  • trihalomethyl s-triazine, trihalomethyloxadiazole, and triarylimidazole dimer are preferable.
  • polymerization initiator C described in JP-A-11-133600 can also be mentioned as a suitable one, and further, paragraph numbers 0028-0 of JP-A-2000-310707.
  • the photopolymerization initiator described in 042 can also be used as a suitable one.
  • photopolymerization initiators or photopolymerization initiator systems may be used singly or as a mixture of two or more types, but it is particularly preferable to use two or more types.
  • display characteristics particularly display unevenness, can be reduced.
  • the content of the photopolymerization initiator or the photopolymerization initiator system with respect to the total solid content of the photosensitive resin composition is generally 0.5 to 20% by mass, and preferably 1 to 15% by mass.
  • the said photosensitive resin composition contains a coloring agent as needed.
  • a coloring agent organic pigments, inorganic pigments, dyes, and the like can be suitably used.
  • metal acids such as carbon black, titanium oxide, and iron tetroxide are used.
  • light-shielding agents such as chemical powder, metal sulfide powder, and metal powder, a mixture of pigments such as red, blue, and green can be used.
  • carbon black is particularly preferable because of its excellent light shielding properties.
  • a solvent, a surfactant, a thermal polymerization inhibitor, an ultraviolet absorber, and the like can be added to the photosensitive resin composition.
  • the photosensitive resin composition in the present invention may further contain an organic solvent in addition to the above components.
  • organic solvents include methyl ethyl ketone, propylene glycol monomethyl ether, propylene glycol monomethino ethenore acetate, cyclohexanone, cyclohexanol, methyl isobutyl ketone, ethyl lactate, methyl lactate, strength prolatatam. Etc. can be mentioned.
  • the photosensitive transfer material of the present invention it can be controlled to a uniform film thickness, and from the viewpoint of effectively preventing coating unevenness (color unevenness due to film thickness change), it is suitable for the photosensitive resin composition. It is preferable to contain a surfactant.
  • surfactant examples include those disclosed in JP-A-2003-337424 and JP-A-11-133600.
  • the photosensitive resin composition in the present invention preferably contains a thermal polymerization inhibitor.
  • the thermal polymerization inhibitor include hydroquinone, hydroquinone monomethyl ether, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol). ), 2,2'-methylenebis (4-methyl-6t-butylphenol), 2 mercaptobenzimidazole, phenothiazine and the like.
  • the photosensitive resin composition in the present invention can contain a known colorant in addition to the colorant (pigment) as necessary for the purpose of obtaining higher light-shielding properties.
  • a pigment among the known colorants it is desirable that the pigment is uniformly dispersed in the photosensitive resin composition, so that the particle size is 0.1 ⁇ m or less, particularly 0. It is preferably less than 08 ⁇ m.
  • the known colorant include the coloring materials described in JP-A-2005-17716 [0038] to [0040] [JP-A-2005-361447 [0068] to [0072]
  • the pigments described here and the colorants described in JP-A-2005-17521 [0080] to [0088] can be suitably used.
  • the photosensitive resin composition in the present invention can contain an ultraviolet absorber as necessary.
  • the ultraviolet absorber include salicylate-based, benzophenone-based, benzotriazole-based, cyanoacrylate-based, -chelate-chelated, and hindered amine-based compounds in addition to the compounds described in JP-A-5-72724.
  • phenol salicylate 4 t-butyl phenol salicylate, 2,4-di-t-butyl phenol 3 ', 5'-di-t- 4'-hydroxybenzoate, 4 t-butyl phenol Salicylate, 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxy Benzophenone, 2-Hydroxy mono 4-— n-Otoxybenzophenone, 2-— (2′-hydroxy 5′-methylphenyl) benzotriazole, 2-— (2′-hydroxy 3′— t-butyl — 5′— methyl phenol 1) Black mouth benzotriazole, ethyl 2 cyano 3, 3—diphenyl acrylate, 2, 2 'hydroxy-4-methoxybenzophenone, nickel dibutyl dithiocarbamate, bis (2, 2, 6, 6-tetramethyl) 4 Pyridine) -sebacate, 4 t-butylphenol salicylate, salicylic acid phenol, 4-
  • the photosensitive resin composition of the present invention may contain “adhesion aid” described in JP-A-11 13 3600, other additives, and the like. it can.
  • the photosensitive resin composition for forming a partition wall of the present invention is (a) a non-hyortho type obtained by reacting phenols containing at least p-taresole with aldehydes in the presence of an acid catalyst. It may be a positive photoresist composition containing a crezo novolac rosin or (b) a quinonediazide group-containing compound. Further, in the positive photoresist composition, it is preferable that the dinuclear content of p-taresol in the component (a) is less than 2.0% in the GPC (gel permeation 'chromatography) method. . Examples of the positive photoresist composition include those described in paragraph Nos.
  • the resin composition of the present invention may contain a thermoplastic resin having a mass reduction rate of 2% by mass or less when heated at 230 ° C for 1 hour.
  • a thermoplastic resin having a mass reduction rate of 2% by mass or less when heated at 230 ° C for 1 hour.
  • the color characteristics of optical elements deteriorate due to discoloration due to deterioration of the resin even in heating processes exceeding 200 ° C, such as ITO film preparation and alignment film preparation.
  • a display device for example, a liquid crystal display
  • Examples of the resin include those described in paragraph Nos. 0013 to 0016 of JP-A-11-194214.
  • the resin composition of the present invention may contain inorganic fine particles having an average particle size (for example, about 1 to: LOOnm) smaller than the exposure wavelength.
  • the inorganic fine particles can be composed of colloidal silica or the like which may have a functional group (for example, a photosensitive group).
  • the photosensitive resin composition may be either negative-type or positive-type, and may be water or alkali developable.
  • oxygen plasma resistance, heat resistance, dry etching resistance, sensitivity and resolution can be greatly improved.
  • Examples of the inorganic fine particles include the force S described in paragraph Nos. 0036 to 0047 of JP-A-11-327125.
  • the resin composition of the present invention may contain retardation-reducing particles.
  • the absolute value of the retardation can be reduced to 15 nm or less. Accordingly, the color filter using this resin composition is excellent in viewing angle dependence, and the color filter is By using it, a liquid crystal display device capable of obtaining a high-quality image can be provided.
  • Specific examples of the retardation-reducing particles include those described in paragraph Nos. 0014 to 0035 of JP-A No. 2000-187114.
  • the resin composition of the present invention may contain a light stabilizer.
  • a light stabilizer at least one compound selected from phosphites, benzotriazoles, benzophenones, hindered amines, salicylic acid esters, triazines, hindered phenols and thioethers is also preferred.
  • Specific examples of the light stabilizer include those described in paragraphs 0007 to 0014 of JP-A No. 2000-214580.
  • the resin composition containing the light stabilizer has both excellent light resistance and curability of the composition, and is excellent in image forming property. It is possible to realize a high-reliability force filter at low cost.
  • the resin composition of the present invention contains a green organic pigment
  • the amounts of tetrachlorophthalic acid, tetrachlorophthalic anhydride and tetrachlorophthalimide in the green organic pigment are analyzed, and the total of them is It is preferably 500 ppm or less.
  • the method for obtaining a pigment within the preferable range include the methods described in paragraph Nos. 0005 to 0020 of JP-A No. 2000-321417.
  • the resin composition using the organic pigment may cause display defects such as burn-in when the pattern is not developed or peeled off during development and the display force is also applied to the display panel.
  • the pigment used in the resin composition of the present invention is preferably a pigment that has not been selected or treated so that the voltage holding ratio is 80% or more.
  • the pigment within the preferable range include pigment strength S described in paragraph Nos. 0005 to 0026 of JP-A No. 2000-329929.
  • the resin composition of the present invention has a glass transition temperature Tg in the range of 60 to 120 ° C and a weight average molecular weight power of OOOO to 100000, a viscosity at 25 ° C of 10 to 8000 cps. It is preferable to contain the polyfunctional monomer which is the range of this, and a coloring agent. Examples of the preferred resin composition include combinations described in paragraph Nos. 0016 to 0033 of JP-A-10-115917. Since the resin layer formed from the resin composition has an appropriate viscosity in the range of 20 to 30 ° C., the use efficiency of the material is excellent.
  • the content of free copper contained in the pigment is preferably 200 ppm or less.
  • the pigment include those described in paragraph Nos. 0011 to 0020 of JP-A-2004-189852.
  • carbon black having a primary particle diameter of 20 to 50 nm, a DBP absorption of 140 mlZl00 g or less, and a pH of 2.5 to 4 is preferable.
  • examples of the carbon black include those described in JP-A-2004-292672, paragraph numbers 0010 to 0014.
  • the specific gravity of the resin composition is preferably 2.5 or more.
  • the resin composition those described in JP-A 2004-352890, paragraphs 0007 to 0013 are preferred.
  • a pattern partition wall Etc.
  • the resin composition of the present invention has a pencil pattern hardness of 3H or more and 9H or less, and the resin layer obtained after the exposure is stirred at lOOrpm. It is a resin composition having a transmittance (average of 400 to 780 nm) of 98% or more and 100% or less of the part where the non-exposed part of the resin layer is dissolved after 120 seconds of immersion in an alkaline aqueous solution at 120 ° C. It is preferable. Examples thereof include the resin composition described in paragraph Nos. 0007 to 0075 of JP-A-2005-10763. When a pattern is formed using the resin composition, both high surface hardness and good developability can be achieved.
  • the residual ratio of the total amount of nitrogen when the dispersant is heated at 230 ° C for 30 minutes is preferably 60% by mass or less.
  • the dispersant include those described in paragraph Nos. 0043 to 0047 of JP-A No. 2004-325968.
  • a color filter (such as a partition wall or a colored pixel) using the dispersant has very little influence on the voltage holding ratio of the liquid crystal, so that a display device with extremely high quality is obtained in which display defects such as display unevenness and image sticking are difficult to occur. be able to.
  • the indentation hardness of the overcoat is preferably within the range of the following formula (1). Moreover, it is preferable that the indentation hardness of the color filter is within the range represented by the formula (2) regardless of whether the overcoat layer is provided or not. Within the above range, display unevenness of the liquid crystal display device due to non-uniform cell gap is unlikely to occur. Examples of means for achieving the preferred range of hardness include the method described in paragraph Nos. 0012-0061 of JP-A-11-271525.
  • the color filter preferably also has a colored layer force having an average refractive index of 1.60 or more and 1.90 or less and an absolute value of birefringence of 0.01 or less. Since the retardation of the color filter using the colored layer (including the partition wall) within the preferable range is reduced, a liquid crystal display device having excellent display characteristics can be provided. Examples of means for creating a color filter within the preferable range include the methods described in JP-A-2000-136253, paragraphs 0007 to 04-2.
  • the specific surface area of the pigment used in the color filter is preferably in the range of 35 m 2 'g- 1 to 120 m 2 ' g- 1 .
  • means for obtaining a pigment having a preferable specific surface area range include the method described in paragraph Nos. 0015 to 0022 of JP-A No. 20 01-42117.
  • a composition (ink) using the pigment can obtain a colored film having both high transmittance and high color purity while maintaining good flow characteristics. As a result, a color filter with improved color characteristics can be obtained, and further, the color characteristics of the display device can be improved.
  • the protective film may be made of the same or similar material as the temporary support, but it must be easily separated from the photosensitive resin layer.
  • silicone paper, polyolefin, or polytetrafluoroethylene sheet is suitable as the protective film material.
  • the photosensitive transfer material of the present invention must have the surface treatment layer and the photosensitive resin layer on the temporary support, and as described above, the thermoplastic resin layer and the intermediate layer on the temporary support. It is preferable to have the layer and the photosensitive resin layer in contact with each other in this order.
  • thermoplastic resin layer coating solution in which the additive of the thermoplastic resin layer is dissolved on the temporary support, and then dry it to provide a thermoplastic resin layer.
  • a layer of a solvent that does not dissolve the thermoplastic resin layer is applied onto the layer, and a solution of the intermediate layer material (including the polymerizable group-containing fluorine compound) is applied and dried, and then the photosensitive resin layer is applied to the intermediate layer. It can be prepared by coating with a solvent that does not dissolve and drying.
  • thermoplastic resin layer and the intermediate layer on the temporary support and a sheet provided with the photosensitive resin layer on the protective film are prepared, and the intermediate layer and the photosensitive resin layer are in contact with each other. It can also be produced by sticking together.
  • the thickness of the photosensitive resin layer is preferably 1.0 to 5. ⁇ m force, more preferably 1.0 to 4. O / zm force. 0 ⁇ 3.0 m force ⁇ Especially preferred! / ⁇ .
  • the preferred film thickness of each of the other layers is as follows: Temporary support 15 to: ⁇ / ⁇ ⁇ The layer is 0.5 to 3. O / zm, and the protective film is 4 to 40 / ⁇ ⁇ force.
  • Application in the above production method can be performed by a known application apparatus or the like.
  • application can be performed by a slit-like nozzle having a slit-like hole in a portion from which the liquid is discharged.
  • a slit-like nozzle having a slit-like hole in a portion from which the liquid is discharged.
  • the slit-shaped nozzle and slit coater described in JP-A-79163 and JP-A-2001-310147 are preferably used.
  • the partition wall of the present invention is at least a) using the photosensitive transfer material, and is pressure-bonded to the substrate so that the photosensitive resin layer side of the transfer material is in contact with the substrate, and b) the photosensitive layer through the surface treatment layer. It is preferable to form the photosensitive resin layer by pattern exposure and c) developing the photosensitive resin layer in this order. c) By removing the surface treatment layer by development, a partition wall having ink repellency can be produced only on the upper surface (surface opposite to the substrate). In addition, as described above, it is also preferable to heat the surface treatment layer and the photosensitive resin layer a) before pressure bonding or between a) pressure bonding and b) exposure because the interaction can be further strengthened. Furthermore, it is also preferred that after c) development, d) the resulting partition is beta.
  • the partition wall of the present invention thus obtained can selectively impart ink repellency (oil repellency and water repellency) only to the upper surface 4 (the surface on the opposite side of the substrate).
  • the side surfaces (for example, in FIGS. 3 and 4, the recesses 3 and the side surfaces 5 of the partition walls) are not fluorinated and do not have ink repellency.
  • the substrate on which the partition wall is formed for example, a transparent substrate is used, and a known soda glass plate, low expansion glass, non-alkali glass, quartz glass plate and the like having an acid-silicone film on the surface thereof.
  • a glass plate, a plastic film, etc. can be mentioned.
  • substrate can make favorable adhesion
  • the coupling treatment a method described in JP 2000-39033 A is preferably used.
  • the thickness of the substrate is generally preferably 700 to 1200 m.
  • the pressure bonding is to bring pressure into contact, for example, like a laminate, and the photosensitive resin layer formed into a film using the photosensitive resin transfer material of the present invention is heated and Z or pressed.
  • the transfer material of the present invention can be attached to the substrate by pressure bonding or thermocompression bonding with a roller or a flat plate.
  • Specific examples include laminators and laminating methods described in JP-A-7-110575, JP-A-11-77942, JP-A-2000-334836, JP-A-2002-148794, From the viewpoint of a low foreign matter amount, it is preferable to use the method described in JP-A-7-110575.
  • a multi-cutter laminator may be used as the laminator.
  • a multi-cutter laminator there is a force S described in paragraph Nos. 0007 to 0039 of JP-A-2004-333616.
  • Laminator multi-catch laminator
  • Laminator with a wide width that does not depend on the application width of the resin transfer material. Can be realized.
  • the partition wall of the present invention can be obtained.
  • the light source for the exposure can be appropriately selected and used as long as it can irradiate light in a wavelength region capable of curing the photosensitive resin layer (for example, 365 nm, 405 nm, etc.).
  • a wavelength region capable of curing the photosensitive resin layer for example, 365 nm, 405 nm, etc.
  • an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp, etc. are mentioned.
  • the amount of light is usually 5 to 300 mjZcm 2 , preferably 10 to 200 mjZcm 2 .
  • the pattern exposure may be exposure using a laser light source described in paragraph Nos. [0061] to [0205] of JP-A-2004-240216 other than exposure using the mask! /.
  • the developer a known developer such as that described in JP-A-5-72724, which is not particularly limited, can be used.
  • the developer has a developing behavior in which the photosensitive resin layer is dissolved.
  • a developer containing 1 ⁇ & 7 to 13 in a concentration of 0.05 to 5mo 1ZL.
  • it may further contain a small amount of an organic solvent miscible with water.
  • organic solvents that are miscible with water include methanol, ethanol, 2-propanol, 1 propanol, butanol, diacetone alcohol, ethylene glycol monomethino ethenole, ethylene glycol monomethino enotenole, and ethylene glycol monomethanol.
  • concentration of the organic solvent is preferably 0.1% by mass to 30% by mass.
  • the developer may further contain a known surfactant.
  • concentration of the surfactant in the developer is preferably 0.01% by mass to 10% by mass.
  • a development method a known method such as paddle development, shower development, shower & spin development, dip development or the like can be used.
  • the uncured portion can be removed by spraying a developer onto the photosensitive resin layer after exposure.
  • a developer onto the photosensitive resin layer after exposure.
  • the developer temperature is preferably 20 ° C to 40 ° C, and the developer pH is preferably 8 to 13. [0123] One by one
  • the image formed by the pattern exposure and development is cured by heating to obtain the partition wall of the present invention.
  • beta treatment method a method of storing a plurality of substrates in a cassette and processing them in a competition oven, a method of processing one by one with a hot plate, a method of processing with an infrared heater, and the like.
  • beta temperature it is 150-280 degreeC normally, Preferably it is 180-250 degreeC.
  • the heating time varies depending on the beta temperature, but when the beta temperature is 220 ° C, it is preferably 5 to 30 minutes for the intermediate beta treatment and 60 to 200 minutes for the final beta treatment.
  • the partition wall formed by the pattern exposure and development prevents uneven film thickness reduction, and includes components such as a UV absorber contained in the photosensitive resin layer.
  • post-exposure may be performed before beta. If post-exposure is performed before the baking (heating) treatment, it is possible to effectively prevent the minute foreign matter swollen during lamination from causing defects.
  • any light source capable of irradiating light in a wavelength region capable of curing the photosensitive resin layer can be appropriately selected and used.
  • Specific examples include ultra high pressure mercury lamps, high pressure mercury lamps, and metal halide lamps.
  • the exposure amount is usually 50 to 5000 miZcm 2 , preferably 200 to 2000 mjZcm 2 , more preferably 500 to 1000 mJ, as long as the exposure amount supplements the pattern exposure.
  • glass cleaner liquid adjusted to 25 ° C (trade name: T-SD1, T-SD2 Fuji Photo Film Co., Ltd.) was sprayed with a rotating brush with nylon hair while spraying for 20 seconds in a shower. Further, pure water shower cleaning is performed.
  • silane coupling agent those having a functional group that interacts with the photosensitive resin are preferable.
  • a silane coupling solution N- ⁇ (aminoethyl) ⁇ -aminopropyltrimethoxysilane 0.3 mass% aqueous solution, trade name: ⁇ 603, Shin-Etsu Chemical
  • N- ⁇ (aminoethyl) ⁇ -aminopropyltrimethoxysilane 0.3 mass% aqueous solution, trade name: ⁇ 603, Shin-Etsu Chemical is sprayed for 20 seconds with a shower, and washed with pure water. Thereafter, the reaction is carried out by heating. Although a heating tank may be used, the reaction can also proceed by preheating the substrate in the laminator.
  • This substrate is heated with a substrate preheating device at 100 ° C for 2 minutes and sent to the next laminator. As a result, the lamination can be performed uniformly.
  • a laminator is used to laminate the substrate at a temperature of 100 ° C. with a rubber roller temperature of 130 ° C., a linear pressure of 100 NZcm, and a conveyance speed of 2.2 mZ. .
  • the rubber roller temperature is preferably 70 to 150 ° C, more preferably 80 to 130 ° C.
  • the temporary support may be peeled off by exposure (in this case, the photosensitive resin layer is exposed through the temporary support and the surface treatment layer), or the temporary support is peeled off. (In this case, the photosensitive resin layer is exposed through the surface treatment layer).
  • the surface treatment layer must adhere to the photosensitive resin layer at the time of exposure.
  • the substrate size is 50 centimeters or more, it is preferable to expose the substrate and the mask (quartz exposure mask with an image pattern) in a vertical position from the viewpoint of preventing the stagnation of the mask.
  • Exposure amount is 10 ⁇ 300mjZcm 2. As a result, the pattern is exposed.
  • a triethanolamine developer (2.5% triethanolamine-containing, non-ionic surfactant-containing, polypropylene-based antifoaming agent, trade name: TPD1, Fuji Photo) Remove the thermoplastic resin layer and intermediate layer with Film Co., Ltd. At this time, ideally, conditions and the like are set so that the photosensitive resin layer is not developed at all. For example, the developer is supplied in a shower at 30 ° C for 50 seconds and a flat nozzle pressure of 0.04 MPa.
  • thermoplastic resin layer or intermediate layer does not correspond to the surface treatment layer in the present invention, it may be removed together with the temporary support.
  • the photosensitive resin layer is developed with an alkaline solution to form an image.
  • an alkaline solution for example, sodium carbonate developer (0.06 mol Z liter of sodium bicarbonate, sodium carbonate of the same concentration, 1% by weight of sodium dibutylnaphthalene sulfonate, ER surfactant, antifoaming agent, stabilizer, Name: T-CD1, Fuji Photo Film Co., Ltd.) is used.
  • shower development is performed at 35 ° C for 35 seconds and a cone type nozzle pressure of 0.15 MPa.
  • KOH or TMAH may be used as the developer.
  • detergent phosphate, silicate, non-ionic surfactant, antifoaming agent, stabilizer included, trade name: T—SD1, Fuji Photo Film Co., Ltd., or sodium carbonate, phenoxypolyoxyethylene series Contains surfactant, trade name: T-SD2, Fuji Photo Film Co., Ltd.
  • the conditions are: 33 ° C for 20 seconds, cone type nozzle pressure of 0.02 MPa, and the residue is removed with a rotating brush with shower and nylon bristles. Thereby, the residual component of the photosensitive resin layer in the unexposed area is removed.
  • LOOOmiZcm 2 about the side force ⁇ fat layer in ultra-high pressure mercury lamp to the substrate is post exposure. It may be selected in the range of Yogumata 100 ⁇ 5000MiZcm 2 be performed from both sides. Post-exposure enhances the subsequent polymerization effect in beta, and the post-beta partition wall cross-sectional shape can be adjusted by the amount of post-exposure. [0133] ix) Beta
  • Beta is performed to react with the monomer or oligomer to form a hard film.
  • Beta is preferably heat treated at 200-240 ° C for 30-180 minutes. These temperature and time are more preferably set to a higher temperature and a shorter time so as not to drop the production tact.
  • the partition wall that separates the pixels is the partition wall according to the present invention in which ink repellency is selectively given only to the upper surface (the surface opposite to the substrate). It is possible to prevent the applied ink from flowing into or bleeding into other pixels without causing white spots, mixed colors, ink oozing, and uneven thickness within the pixels.
  • a light-shielding layer that shields between adjacent pixels. In that case, it is possible to use a black matrix or a black stripe.
  • the optical element of the present invention provided with the partition walls will be described using a color filter as an example.
  • FIG. 3 or 4 is a cross-sectional view schematically showing the color filter of the present invention. In FIG. 3 or 4, only the rightmost concave portion 3 is shown without a colored layer for easy explanation.
  • FIG. 3 or 4 only five partition walls 1 and four recesses 3 are shown to make it easy to stiffen, but this is provided as many as necessary.
  • a striped color filter if 640 pixels are required, three color filters of RGB per pixel are required, so 1921 for partition wall 1 and 1920 for recess 3 .
  • the color filter pattern may be formed even around the display pixels where display is not performed, and the accuracy of the gap between the substrates is increased.
  • the partition wall 1 may not be formed in the longitudinal direction.
  • the pixel 2 may be completely surrounded by the partition wall 1.
  • the periphery of the pixel 2 is surrounded by a partition wall 1.
  • the partition wall 1 for separating the pixel (colored layer) 2 is formed on the substrate 6 in a linear shape or a lattice shape.
  • the shape of this partition wall 1 is such that the recess 3 partitioned by it corresponds to the pixel 2. It only has to be done. For example, when a striped color filter is formed, it is formed in a linear shape, and in order to correspond to the square pixel 2, it is formed in a lattice shape. Since this is appropriately determined depending on the shape of the pixel 2, various shapes such as a radial shape and a circumferential shape are also conceivable. In FIG. 4, 7 indicates a non-colored pixel.
  • the partition wall 1 is advantageously used as a black mask in a liquid crystal display element or the like. For this reason, in the following description, the partition 1 will be described based on an example in which the partition 1 is also used as a black mask. However, in the case where the partition 1 is not used, a black material or the like may not be used.
  • the partition wall according to the present invention plays a role of preventing the sprayed ink from flowing into or bleeding into other pixels when coloring by the inkjet method. Therefore, the height of the partition walls is preferably high to some extent. However, since the flatness of the color filter is also required to be high, the height is close to the thickness of the colored layer.
  • the ink remains on the upper surface of the partition wall (upper surface 4 in FIG. 3 or 4), the flatness and the color uniformity between the pixels are impaired. As a result, the defect is effectively suppressed.
  • the side wall (side surface 5 in FIG. 3 or 4) of the partition wall of the present invention is not subjected to ink repellent treatment, that is, the top surface of the partition wall has a property of repelling ink, and the side surface has a property of hardly repelling ink. have.
  • the pixel portion (the concave portion 3 in FIG. 3 or 4) is not subjected to fluorination treatment, and the pixel portion has a property of hardly repelling ink. Therefore, in the optical element using the partition wall in the present invention, whitening is unlikely to occur, and color mixing and ink stick out, and thickness unevenness in the pixel can be effectively prevented.
  • the degree of ink repellency on the upper surface of the partition wall is such that the water contact angle is 90 to 140 °. Is preferred. If this is less than 90 °, ink tends to remain on the upper surface of the partition wall, and if it exceeds 140 °, the coloration of the pixels tends to be hindered or the smoothness of the upper surface of the partition wall may be lost. Further, it is more preferably 100 to 125 °.
  • the contact angle of water can be measured by a contact angle meter DM300 manufactured by Kyowa Interface Science Co., Ltd., and the contact angle of ink can be determined in the same manner.
  • the degree of ink repellency can be controlled by the content of the polymerizable group-containing fluorine compound in the surface treatment layer, the pattern exposure amount to the photosensitive resin layer, and the like.
  • the black mask according to the present invention is, for example, a partition wall having a light shielding property, which is formed in a linear shape when forming a striped color filter and formed in a lattice shape so as to correspond to a square pixel. is there. Since this is appropriately determined depending on the shape of the pixel, various shapes such as a radial shape and a circumferential shape are also conceivable.
  • the optical element of the present invention can be produced by forming a colored layer (pixel) by an inkjet method between the partition walls formed on the substrate using the photosensitive transfer material of the present invention.
  • Examples of the optical element of the present invention include optical elements such as a color filter and an electoluminescence element.
  • Examples of the color filter include a mode in which rectangular images such as red, green, and blue are arranged in a matrix on a substrate such as glass, and a partition such as a black mask is arranged at the boundary.
  • an electoric luminescence element a thin film containing a fluorescent inorganic and organic compound is sandwiched between a cathode and an anode, and electrons and holes are injected into the thin film. Examples include an element that generates excitons by bonding and emits light by using emission of fluorescence or phosphorescence when the excitons are deactivated.
  • a light emitting layer is formed by applying a fluorescent material used for such an electoluminescence device to the substrate on which an element such as a TFT is formed by an ink jet method. Can be configured.
  • the method of applying ink droplets such as an ink jet method can simplify the manufacturing process and reduce the cost, so it can be applied to the manufacture of color filters, electoluminescence elements, and / or optical elements. Has been.
  • an inkjet method is used to form pixels.
  • an ink jet method a method in which charged ink is continuously ejected and controlled by an electric field, a method in which ink is intermittently ejected using a piezoelectric element, and an ink is heated and intermittently ejected using its foam.
  • Various methods such as a method can be adopted.
  • the ink used can be oily or water-based.
  • the coloring material contained in the ink can be used for both dyes and pigments, and the use of pigments is more preferable from the viewpoint of durability. It is also possible to use an oil-based colored ink (colored resin composition) used for producing a known color filter.
  • the ink according to the present invention may include a component that is cured by heating or is cured by an energy ray such as an ultraviolet ray in consideration of a step after coloring.
  • Various thermosetting resins are widely used as components that are cured by heating, and examples of components that are cured by energy rays are those obtained by adding a photoreaction initiator to an attalylate derivative or a metatalylate derivative. It can be illustrated.
  • those having a plurality of attalyloyl groups and methacryloyl groups in the molecule are more preferable.
  • These acrylate derivatives and methacrylate derivatives are preferably water-soluble, and even those that are sparingly soluble in water can be used after being emulsified.
  • the photosensitive resin composition containing a coloring material such as a pigment as mentioned in the above section ⁇ Photosensitive resin layer> can be used as a suitable one.
  • the color filter (colored pixel) that also has at least three chromatic powers has white display coordinates (, V) and black display calculated based on the tristimulus values “X, Y, ZJ” Coordinates (u
  • a display device using the color filter can appropriately balance the pixels, and the display color can be easily adjusted. In particular, it can be preferably used as a color filter for television.
  • the contrast of the colored pixels formed by the ink is preferably 2000 or more.
  • As a method for increasing the contrast there is a means described in paragraph No. 0025 of JP-A-2005-25206.
  • a display device using a color filter with high contrast can be used as an EBU standard TV liquid crystal display device having excellent color reproducibility.
  • an RGB three-color ink is usually blown by an inkjet method to form a three-color filter.
  • a multicolor filter with four or more colors, not limited to the three RGB colors.
  • This power color filter is used as a display element in combination with a liquid crystal display element, an electrophoretic display element, an electochromic display element, PLZT, or the like. It can also be used for applications using color cameras and other color filters.
  • optical element of the present invention including the color filter, defects such as bleeding of each color ink, protrusion, and color mixture with adjacent pixels are effectively suppressed.
  • the optical element of the present invention is used in various display devices as described above, and is also preferably used as a liquid crystal display element in which a liquid crystal material is sealed between a pair of opposed substrates.
  • the color filter according to the present invention is formed on the counter substrate of the liquid crystal display device (the substrate on the side without the active elements such as TFT), the COA method formed on the TFT substrate side, and only black on the TFT substrate side.
  • the BOA method that forms the substrate or the HA method that has a high aperture structure on the TFT substrate can also be targeted.
  • the liquid crystal display method is appropriately selected according to the purpose for which there is no particular restriction.
  • ECB Electrically Controlled Birefringence
  • TN Transmission Nematic
  • OCB Onticallv Compensatory Bend
  • VA Vertica lly Aligned
  • HAN Hybrid Aligned Nematic
  • STN Supper Twisted Nematic
  • IPS In-Plane Switching
  • GH Guest Host
  • FLC ferroelectric liquid crystal
  • AFLC antiferroelectric liquid crystal
  • Polymer a is synthesized through the following two steps.
  • DMAc N, N-dimethylacetamide
  • HEMA methacrylic acid 2-hydroxyethyl ester
  • F MAC 2- (perfluorooctyl) ethyl acetate
  • Copolymer 3.0g obtained in Stepl and hydroquinone (Wako Pure Chemical Industries) 0.0325g were placed in a 300ml three-necked flask equipped with a condenser, and DMAc 40g was added and stirred at room temperature to obtain a homogeneous solution. . While stirring the solution, 1.53 g (0. 00983 mol) of 2-metatalyloyloxychetyl isocyanate (Power Lens M OI, Showa Denko) was added dropwise. Subsequently, 1 drop of di-n-butyltin dilaurate (Tokyo Kasei Kogyo Co., Ltd.) was added and heated with a water nose at 65 ° C. with stirring.
  • 2-metatalyloyloxychetyl isocyanate Power Lens M OI, Showa Denko
  • the reaction solution was heated in an oil bath to bring the internal temperature to 70 ° C. 2, 2 'dissolved Azobisu the (isobutyrate) (manufactured by Wako Pure Chemical Industries, Ltd.) 0. 35 9g (l. 56 X 10- 3 mol) in n- propanol 2. Og, was added dropwise to the reaction solution. After the dropwise addition of 2,2′-azobis (isobutyrate) dimethyl (manufactured by Wako Pure Chemical Industries, Ltd.), the temperature of the reaction solution reached 96 ° C. The three-necked flask containing the reaction solution was once pulled up from the oil nose and cooled in air to stabilize at 70 ° C.
  • reaction solution was returned to room temperature, and 2,5 ziamyl hydroquinone 0.059 g (glycidyl metatalylate dissolved in 2.0 g of n-propanol (Tokyo Kasei Co., Ltd.) 59.2 g (0.42 mol) ), N-propanol 100 g, n-propanol 12.4 g dissolved in 2-ethyl-4-methyl ester Midazole (manufactured by Wako Pure Chemical Industries, Ltd.) 0.92 g (8. 32 X 10-ol) was added and stirred to obtain a uniform solution.
  • This reaction solution was heated in an oil bath to adjust the internal temperature to 70 ° C. After 14 hours, the heating was stopped and the temperature was returned to room temperature to complete the reaction.
  • Polymer c is synthesized through the following two steps.
  • MFG400g acrylic acid (AA, Tokyo Chemical Industry) 125g (l. 73mol) and 2- (perfluorooctyl) -ethyl acrylate (FAAC, manufactured by Ryutech Co., Ltd.) 200g (0.39 mol) ) And dimethylacrylamide (DMAAm, Tokyo Chemical Industry) 175g (l. 77mol), 2,2'-azobis (isobutyric acid) (V601, Wako Pure Chemical Industries, Ltd.) 2.6 8g (0.
  • Polymer d is synthesized through the following two steps.
  • MFG propylene glycol monomethyl ether
  • the molecular weight (GPC, THF, polystyrene equivalent) was Mwl 1000.
  • Polymer e is synthesized through the following two steps.
  • MFG150g acrylic acid (AA, Tokyo Kasei Kogyo) 25g (0.335mol), 2 (perfluorooctyl) -ethyl acrylate (FAAC-Mutech Co., Ltd.) 125g (0.24mol) and dimethyl Solution of acrylamide (DMAAm, Tokyo Chemical Industry) 100g (l. Olmol), 2,2'-azobis (isobutyric acid) (V601, Wako Pure Chemical Industries) 3.97g (0. Olmol) dissolved in 130g of MFG
  • DMAAm dimethyl Solution of acrylamide
  • V601 Wako Pure Chemical Industries
  • the molecular weight (GPC, THF, polystyrene equivalent) was Mwl4000.
  • thermoplastic resin layer having the following formula C force On a 75 ⁇ m thick polyethylene terephthalate film temporary support, a coating solution for a thermoplastic resin layer having the following formula C force was applied and dried using a slit nozzle. Next, a coating solution for a surface treatment layer having the following formulation P1 was applied and dried. Further, a photosensitive resin composition K1 listed in Table 1 below was applied and dried. In this way, a thermoplastic resin layer having a dry film thickness of 6.0 m, a surface treatment layer having a dry film thickness of 1. and a photosensitive layer having a dry film thickness of 2. are provided on the temporary support. Finally, a protective film (thickness 12 / zm polypropylene film) was pressure-bonded.
  • a photosensitive transfer material K1 comprising a temporary support, a thermoplastic resin layer, a surface treatment layer (oxygen barrier film), and a black (K) photosensitive layer was produced.
  • thermoplastic resin layer Formulation C> • methanol
  • Methylethenoleketone 53 34 Dioxygen hexanone 0 8. 6 Binder 1 9. 1 14
  • Photosensitive rosin composition K1 was prepared by first pulverizing pigment dispersion 1 and propylene glycol monomethyl ether acetate in the amounts shown in Table 1 and mixing at a temperature of 24 ° C ( ⁇ 2 ° C). Stir for a minute, then methylethyl ketone, binder 1, DP HA solution, 2, 4-bis (trichloromethyl) mono 6- [4'- (N, N-bisethoxycarbo- Lumetylamino) 1'-bromophenol] — s-triazine, hydroquinone monomethyl ether and surfactant 1 are removed and added in this order at a temperature of 25 ° C ( ⁇ 2 ° C). It was obtained by stirring for 30 minutes at 150 rpm at a temperature of 40 ° C (2 ° C).
  • composition of the pigment dispersion 1, the binder 1, the DPHA liquid, and the surfactant 1 is as follows.
  • Copolymer 3030 parts by weight average molecular weight
  • a non-alkali glass substrate is cleaned with a rotating brush with nylon bristles while spraying a glass detergent solution adjusted to 25 ° C for 20 seconds with a shower.
  • the silane coupling solution N- ⁇ (amino Ethyl))-aminopropyltrimethoxysilane 0.3 mass% aqueous solution, trade name: KBM603, manufactured by Shin-Etsu Chemical Co., Ltd.
  • KBM603 manufactured by Shin-Etsu Chemical Co., Ltd.
  • the protective film of the photosensitive transfer material K1 is peeled off, the remainder is laminated with a laminator (manufactured by Hitachi Industries (Lamidl type)) and heated at 100 ° C. for 2 minutes, with a rubber roller temperature of 130 ° C. Lamination was performed at a linear pressure of 100 NZcm and a conveyance speed of 2. 2 mZ.
  • the substrate and mask are used with a proximity-type exposure machine (manufactured by Hitachi, Ltd., Techtech Engineering Co., Ltd.) having an ultra-high pressure mercury lamp. With the UK exposure mask standing vertically, the distance between the exposure mask surface and the photosensitive resin layer was set to 200 ⁇ m, and pattern exposure was performed at an exposure amount of 200 mjZcm 2 .
  • KOH KOH, containing a nonionic surfactant, trade name: CDK-1 (Fujifilm Elect Kokuku Materials Co., Ltd.) diluted 100 times with pure water 23 23 ° C 80 seconds, flat nozzle pressure 0.04 MPa shower developed pattern image Got.
  • ultrapure water was sprayed at a pressure of 9.8 MPa with an ultrahigh pressure washing nozzle to remove the residue, and an image of matrix-like black (K) was obtained.
  • the side force of the resin layer is post-exposed with lOOOmiZcm 2 light with an ultra high pressure mercury lamp against the substrate, and the side force opposite to the resin layer with respect to the substrate is also lOOOmjZcm 2 with an ultra high pressure mercury lamp.
  • the film was post-exposed with light and then heat-treated at 220 ° C. for 30 minutes.
  • the contact angle with pure water was measured by the method described above.
  • the black matrix surface is measured on a frame with a width of 5 mm provided around the fine pattern, and the glass substrate surface is measured at a location where the black matrix pattern outside the frame is not provided. It was.
  • the results are shown in Table 3.
  • a solid sample for measurement was prepared in which no exposure was performed with the same exposure and a solid exposure, and the ratio of the number of fluorine atoms to the number of carbon atoms (number of fluorine atoms / number of carbon atoms) on the surface was measured.
  • PHI-5300 detection angle: 45 °
  • ULVAC-FIA detection angle: 45 °
  • each of R, G, and B inks was prepared with the following composition using an acrylic copolymer having the following composition as a thermosetting component.
  • an R prepared was prepared by the method described above in the opening (concave) of the black matrix (partition) on the glass substrate.
  • G, and B pigment dispersion inks were applied to a desired concentration.
  • the ink was cured by heat treatment at 230 ° C for 1 hour to form a color filter having R, G, and B colored portions.
  • the obtained color filter was evaluated for ink protrusion and color mixture. Evaluation of ink protrusion and color mixture should be performed using an optical microscope, and any color filter 3000 The pixels were observed for ink overflow and color mixing. Ink overflow and color mixing refer to the phenomenon shown in Fig. 1.
  • the surface shape of an arbitrary pixel was measured with a surface roughness meter P-10 manufactured by Tencor, and the difference in height between the highest raised part and the lowest part of the pixel was determined. Allowable level difference «0.2 ⁇ m or less.
  • the color filter on which the pixels are formed is cleaned with a clean-tech low-pressure mercury lamp UV cleaning device to remove residues and foreign matters, and then the transparent overcoat agent is applied to a film thickness of 1.5 / zm.
  • beta was performed at 230 ° C for 40 minutes.
  • a polyamic acid represented by the following chemical formula (A) and an epoxy compound represented by the chemical formula (B) were mixed at a mass ratio of 3: 1.
  • the glass substrate on which the overcoat layer is formed is placed in a sputtering apparatus, and 1300 A thick ITO (indium stannate) is vacuum-deposited on the entire surface at 100 ° C, and then annealed at 240 ° C for 90 minutes.
  • ITO indium stannate
  • the ITO was crystallized, and an ITO pattern was created by the photo process, and unnecessary ITO was etched with aqua regia to complete the pattern formation.
  • the formulation of the photosensitive resin composition 1 in the partition wall prepared above was changed to the following coating solution formulation S 1 for the photosensitive resin layer, and the surface treatment layer was formulated as follows: A spacer was produced using the same method except that the PC 1 was changed.
  • the gate patterns 200 and 210 and the common patterns 300 and 310 are formed by depositing and patterning a metal film on the substrate 100.
  • the gate insulating film 400, the amorphous silicon layer 800, and the doped amorphous silicon layer 900 are sequentially deposited, and the amorphous silicon layer 800 and the doped amorphous silicon layer 900 are patterned together. -Take it.
  • a chromium layer and an aluminum layer are sequentially deposited to a thickness of about 500 mm and 2000 mm, respectively.
  • the chromium film 501 is patterned.
  • the data line 500, the source electrode 510, the drain electrode 620, and the pixel patterns 600 and 610 are formed.
  • the amorphous silicon layer 900 that is not covered with the source electrode 510 and the drain electrode 620 is etched to complete the resistive contact layers 910 and 920.
  • a protective film 700 is deposited on the entire surface of the substrate.
  • Coating liquid for surface treatment layer of Example 1 A liquid crystal display device was prepared and evaluated in the same manner as in Example 1 except that 59 parts of polymer aO. In formula P1 was changed to 4.66 parts of polymer a4.
  • Coating liquid for surface treatment layer of Example 1 A liquid crystal display device was prepared and evaluated in the same manner as in Example 1 except that 59 parts of polymer aO. In formulation P1 was changed to 3 parts of polymer alO.
  • Example 3 a liquid crystal display device was prepared in the same manner as in Example 3 except that the film thickness of the thermoplastic resin layer was changed to 14. Further, the partition formation method was changed as follows. Evaluation was performed.
  • a non-alkali glass substrate is cleaned with a rotating brush with nylon bristles while spraying a glass detergent solution adjusted to 25 ° C for 20 seconds with a shower.
  • the silane coupling solution N- ⁇ (amino Ethyl))-aminopropyltrimethoxysilane 0.3 mass% aqueous solution, trade name: KBM603, manufactured by Shin-Etsu Chemical Co., Ltd.
  • KBM603 manufactured by Shin-Etsu Chemical Co., Ltd.
  • the protective film of the photosensitive transfer material K1 is peeled off, the remainder is laminated with a laminator (manufactured by Hitachi Industries, Ltd. (Lamidl type)) and heated to 100 ° C for 2 minutes on a substrate heated to a rubber roller temperature. Lamination was performed at 130 ° C, linear pressure 100 NZcm, conveyance speed 2. 2 mZ min.
  • the substrate and mask Stone British exposure mask with image pattern
  • a proximity type exposure machine Haitachino, manufactured by Techtech Electronics Engineering Co., Ltd. having an ultra-high pressure mercury lamp.
  • the distance between the exposure mask surface and the photosensitive resin layer was set to 200 m, and pattern exposure was performed with an exposure amount of 200 mjZcm 2 .
  • triethanolamine developer containing 30% triethanolamine, trade name: T-PD2, manufactured by Fuji Photo Film Co., Ltd.
  • T-PD2 triethanolamine, trade name: T-PD2, manufactured by Fuji Photo Film Co., Ltd.
  • the thermoplastic resin layer and the surface treatment layer were removed by shower development with a flat nozzle pressure of 0.04 MPa.
  • Coating liquid for surface treatment layer of Example 1 A liquid crystal display device was prepared and evaluated in the same manner as in Example 1 except that 59 parts of polymer aO. In formula P1 was changed to 4.66 parts of polymer b. o
  • a liquid crystal display device was prepared and evaluated in the same manner as in Example 5 except that the thickness of the thermoplastic resin layer was changed to 14.6 m and the partition wall formation method was changed as follows. It was.
  • a non-alkali glass substrate is cleaned with a rotating brush with nylon bristles while spraying a glass detergent solution adjusted to 25 ° C for 20 seconds with a shower.
  • the silane coupling solution N- ⁇ (amino Ethyl))-aminopropyltrimethoxysilane 0.3 mass% aqueous solution, trade name: KBM603, manufactured by Shin-Etsu Chemical Co., Ltd.
  • KBM603 manufactured by Shin-Etsu Chemical Co., Ltd.
  • a transparent electrode film was formed by sputtering ITO on a color filter on which RGB pixels had been formed.
  • a liquid crystal display device was produced in the same manner as in Example 1 except that liquid crystal alignment control protrusions were formed on the ITO-formed substrate by the following method.
  • the formulation of the photosensitive resin composition K1 was changed to the following coating solution formulation T1 for the photosensitive resin layer, the surface treatment layer was changed to the formulation PC 1, and heat was applied. Except for the plastic resin layer, the liquid crystal alignment control protrusions were formed using the same method as in Example 1. Produced.
  • Proximity exposure machine is placed so that the prescribed photomask is at a distance of 100 m from the surface of the photosensitive resin layer, and the exposure is performed with an ultrahigh pressure mercury lamp through the photomask at an irradiation energy of 150 mi / cm 2. did.
  • a solution obtained by diluting a triethanolamine developer (trade name: T-PD1, manufactured by Fuji Photo Film Co., Ltd.) 12 times with pure water is sprayed onto the substrate at 30 ° C for 60 seconds with a set of developing devices. Then, the thermoplastic resin layer and the surface treatment layer were dissolved and removed.
  • the photosensitive resin layer was substantially undeveloped, and then 2.38% tetramethylammonium hydroxide aqueous solution was sprayed onto the substrate for 30 seconds at 33 ° C in a shower type developing device. Then, development was performed to remove unnecessary portions (exposed portions) of the photosensitive resin layer.
  • a liquid crystal alignment control protrusion made of a photosensitive resin layer patterned in a desired shape was formed.
  • liquid crystal display device substrate on which the liquid crystal alignment control protrusions were formed was beta-treated at 230 ° C. for 30 minutes to form liquid crystal alignment control protrusions on the liquid crystal display device substrate.
  • Example 7 Coating solution for surface treatment layer: Same as Example 1 except that 59 parts of polymer aO. In formula PI was changed to 3 parts of polymer al2. And the method for preparing the substrate for the liquid crystal display device was changed as follows. A liquid crystal display device was prepared and evaluated.
  • the above color filter on which the pixels are formed is cleaned with a clean-tech low-pressure mercury lamp (effective wavelength: 2 54 nm) with a UV cleaning device to remove residues and foreign matters, and then the transparent overcoat agent is added to a film thickness of 1.5 After coating the entire surface to m, beta was performed at 230 ° C for 40 minutes. At this time, the polyamic acid represented by the chemical formula (A) and the epoxy compound represented by the chemical formula (B) were mixed at a mass ratio of 3: 1 to form a transparent overcoat layer.
  • Example 1 In the partition wall prepared in Example 1, the formulation of the photosensitive resin composition K1 was changed to the photosensitive resin layer coating liquid formulation T1, and the surface treatment layer was changed to the formulation PC 1. A liquid crystal alignment control protrusion was produced using the same method as in Example 1 except that the thermoplastic resin layer was changed to 14.6 m.
  • Proximity exposure machine is placed so that the prescribed photomask is at a distance of 100 m from the surface of the photosensitive resin layer, and the exposure is performed with an ultrahigh pressure mercury lamp through the photomask at an irradiation energy of 150 mi / cm 2. did.
  • a solution obtained by diluting a triethanolamine developer (trade name: T-PD2, manufactured by Fuji Photo Film Co., Ltd.) 12 times with pure water is sprayed onto the substrate at 30 ° C for 60 seconds with a set of developing devices. Then, the thermoplastic resin layer and the surface treatment layer were dissolved and removed.
  • the photosensitive resin layer was substantially undeveloped, and then 2.38% tetramethylammonium hydroxide aqueous solution was sprayed onto the substrate for 30 seconds at 33 ° C in a shower type developing device. Then, development was performed to remove unnecessary portions (exposed portions) of the photosensitive resin layer.
  • a liquid crystal alignment control protrusion made of a photosensitive resin layer patterned in a desired shape was formed.
  • the substrate for a liquid crystal display device on which the liquid crystal alignment control protrusions are formed is heated at 230 ° C.
  • liquid crystal alignment control protrusions were formed on the liquid crystal display substrate.
  • Example 6 In the method for producing a substrate for a liquid crystal display device of Example 6, an overcoat layer is provided in the same manner as in Example 1, and the pattern exposure to the photosensitive resin layer is set to 250 mjZcm 2 as in Example 6. A liquid crystal display device was prepared and evaluated.
  • Example 5 is the same as Example 5 except that the development time in the KOH-based developer was set to 40 seconds and the pattern exposure on the photosensitive resin layer was set to 250 mj / cm 2 when the partition walls were formed. Thus, a liquid crystal display device was produced and evaluated.
  • thermoplastic resin layer was not provided, the coating solution formulation P1 for the surface treatment layer was changed to the following formulation EV 1, and the dry film thickness of the surface treatment layer was 16 ⁇ m.
  • a liquid crystal display device was prepared and evaluated in the same manner as in Example 1 except that the photosensitive transfer material EV1 was formed by changing to m, and the method for forming the partition walls was changed as follows.
  • the rest is a laminator (manufactured by Hitachi Industries, Ltd. (Lamidl type)).
  • the substrate is heated at 100 ° C. for 2 minutes to a rubber roller temperature of 100 ° C.
  • Lamination was performed at a linear pressure of 100 NZcm and a conveying speed of 1.2 mZ.
  • a proximity-type exposure machine manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd. having an ultra-high pressure mercury lamp, the exposure mask surface and the photosensitive film are exposed with the substrate and mask (quartz exposure mask having an image pattern) standing vertically. Set the distance between the active oil-repellent layers to 200 m and the exposure amount And pattern exposure in 200miZcm 2.
  • the temporary support was peeled off together with the surface treatment layer, leaving only the photosensitive resin layer on the substrate.
  • KOH developer KOH, containing a nonionic surfactant, trade name: CDK— 1, Fujifilm Elect Mouth-Kux Materials Co., Ltd.
  • KOH developer KOH, containing a nonionic surfactant, trade name: CDK— 1, Fujifilm Elect Mouth-Kux Materials Co., Ltd.
  • ultrapure water was sprayed at a pressure of 9.8 MPa with an ultrahigh pressure washing nozzle to remove the residue, and an image of matrix-like black (K) was obtained.
  • the side force of the resin layer with respect to the substrate is also post-exposed with lOOOmiZcm 2 light with an ultra-high pressure mercury lamp, and the side force with respect to the substrate is also lOOOmjZcm 2 with an ultra-high pressure mercury lamp.
  • the film was post-exposed with light, and then heat-treated at 220 ° C. for 30 minutes.
  • Example 8 the coating solution for the surface treatment layer: the polymer b4 in the formula P1 was changed to 66 parts by polymer b 10.3 parts, and the RGB ink was changed to the one prepared by the following method. In the same manner as in Example 8, a liquid crystal display device was produced and evaluated.
  • a pigment a polymer dispersant, and a solvent were mixed, and a pigment dispersion was obtained using a three roll and bead mill. While sufficiently stirring the pigment dispersion with a dissolver or the like, other materials were added little by little to prepare a colored ink composition for R (red) pixels.
  • G (green) colored ink composition for G pixels in the same manner as the colored ink composition for R pixels, except that the same amount of CI pigment drain 36 is used instead of CI pigment red 254 in the R ink composition. was prepared.
  • a liquid crystal display device was prepared and evaluated in the same manner as in Example 8 except that the formulation of the photosensitive resin composition for black matrix in Example 8 was changed to K2 below.
  • Photosensitive rosin composition K2 was first prepared by weighing out pigment dispersions 2-6 in the amount shown in Table 2 and propylene glycol monomethyl ether acetate and mixing them at a temperature of 24 ° C ( ⁇ 2.C). Stir for 2 minutes, then remove the remaining ingredients listed in Table 2 and add at the temperature of 25 ° C ( ⁇ 2 ° C) in the order shown in Table 2. ) At 150 rpm for 30 minutes.
  • compositions of the composition described in the photosensitive resin composition K2 are as follows.
  • Coating liquid for surface treatment layer A liquid crystal display device was prepared and evaluated in the same manner as in Example 1 except that 59 parts of polymer aO. In formulation P1 was changed to 3 parts of polymer clO.
  • Coating liquid for surface treatment layer A liquid crystal display device was prepared and evaluated in the same manner as in Example 1 except that 59 parts of polymer aO. In formulation P1 was changed to 3 parts of polymer dl8.3.
  • Coating liquid for surface treatment layer A liquid crystal display device was prepared and evaluated in the same manner as in Example 1 except that 59 parts of polymer aO. In formula P1 was changed to 7 parts of polymer d36.
  • Coating liquid for surface treatment layer A liquid crystal display device was prepared and evaluated in the same manner as in Example 1 except that 59 parts of polymer aO. In formula P1 was changed to 7 parts of polymer e36.
  • a liquid crystal display device was prepared and evaluated in the same manner as in Example 8 except that the formulation of the photosensitive resin composition for black matrix in Example 8 was changed to K3.
  • the surface treatment layer coating solution P1 of Example 1 was changed to the surface treatment layer coating solution PC1 used in the formation of the spacer 1 of Example 1, and the RGB ink was the ink shown in Example 11.
  • a liquid crystal display device was prepared and evaluated in the same manner as in Example 1 except that the change was made.
  • Plasma treatment was performed under the following conditions using a plasma treatment apparatus (apparatus described in FIG. 12 of JP-A-2003-344640).
  • plasma processing was further performed under the following conditions: o
  • a liquid crystal display device was prepared in the same manner as in Comparative Example 1 except that the photosensitive transfer material K1 in Comparative Example 1 was changed to the following one consisting of the first and second layers, and the exposure and development method was changed to the following. Created and evaluated.
  • the first layer had a thickness of 0.5 / ⁇ ⁇
  • the second layer had a thickness of 1.5 m.
  • Base resin Methyl metatalylate Z Hydroxyethyl metatalylate copolymer 30 parts
  • Photopolymerizable monomer Trimethylolpropane tritalylate 25 parts
  • Photopolymerization initiator “Irgacure 907” manufactured by Ciba Geigy Co., Ltd. 10 parts
  • Fluorine compounds Sumitomo 3M "Florard FC-430" 5 parts
  • V-259BK resist manufactured by Nippon Steel Chemical Co., Ltd.
  • FIG. 1 is a plan view schematically showing a conventional color filter in which ink overflows, mixed colors, and white spots are generated.
  • FIG. 2A is a schematic cross-sectional view showing a three-layer photosensitive transfer material of the present invention.
  • FIG. 2B is a schematic cross-sectional view showing a four-layer photosensitive transfer material of the present invention.
  • FIG. 3 is a schematic cross-sectional view of a color filter (for white light display device (LCD)) according to the present invention.
  • LCD white light display device
  • FIG. 4 is a schematic cross-sectional view of a color filter (for blue light display device (EL)) according to the present invention.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)

Abstract

La présente invention concerne un matériau de transfert photosensible comprenant, dans l’ordre suivant, un support temporaire, une couche à traitement de surface contenant un composé fluoré ayant un groupe polymérisable et une couche de résine photosensible, cette dernière étant en contact avec la couche à traitement de surface.
PCT/JP2006/323175 2005-11-21 2006-11-21 Materiau de transfert photosensible, paroi de separation et son procede de formation, dispositif optique et son procede de production, et presentation WO2007058355A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2007545337A JP4913750B2 (ja) 2005-11-21 2006-11-21 感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置
CN2006800432085A CN101313249B (zh) 2005-11-21 2006-11-21 感光性转印材料、隔壁及其形成方法、光学元件及其制造方法以及显示装置

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2005-336349 2005-11-21
JP2005336349 2005-11-21
JP2006162702 2006-06-12
JP2006-162702 2006-06-12

Publications (1)

Publication Number Publication Date
WO2007058355A1 true WO2007058355A1 (fr) 2007-05-24

Family

ID=38048734

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2006/323175 WO2007058355A1 (fr) 2005-11-21 2006-11-21 Materiau de transfert photosensible, paroi de separation et son procede de formation, dispositif optique et son procede de production, et presentation

Country Status (5)

Country Link
JP (1) JP4913750B2 (fr)
KR (1) KR20080070809A (fr)
CN (1) CN101313249B (fr)
TW (1) TW200739267A (fr)
WO (1) WO2007058355A1 (fr)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008149776A1 (fr) * 2007-05-30 2008-12-11 Asahi Glass Company, Limited Procédé de production d'un substrat ayant une paroi de séparation et un pixel formés dessus
JP2009048073A (ja) * 2007-08-22 2009-03-05 Fujifilm Corp 感光性転写材料、隔壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
EP2042336A1 (fr) 2007-09-26 2009-04-01 FUJIFILM Corporation Composition de revêtement photodurcissable, surimpression et son procédé de production
JP2009096977A (ja) * 2007-09-26 2009-05-07 Fujifilm Corp 顔料分散組成物、光硬化性組成物、およびカラーフィルタ
KR101057604B1 (ko) 2008-01-11 2011-08-18 도오꾜오까고오교 가부시끼가이샤 착색 감광성 수지 조성물
JP2012226146A (ja) * 2011-04-20 2012-11-15 Dainippon Printing Co Ltd タッチパネル付カラーフィルタ用保護層形成用組成物
WO2016021501A1 (fr) * 2014-08-05 2016-02-11 旭硝子株式会社 Solution de résine photosensible, procédé de formation d'un film à motifs, et procédé pour le traitement fin d'un film de résine contenant du fluor
WO2017038587A1 (fr) * 2015-08-31 2017-03-09 富士フイルム株式会社 Composition durcissable, procédé de fabrication de film durci, filtre couleur, film de protection contre la lumière, élément d'imagerie à semi-conducteur, et dispositif d'affichage d'image
WO2021014759A1 (fr) * 2019-07-22 2021-01-28 三菱ケミカル株式会社 Composition de résine photosensible colorée, objet durci, banque, et dispositif d'affichage d'image

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080078645A (ko) 2005-12-15 2008-08-27 아사히 가라스 가부시키가이샤 함불소 중합체, 네거티브형 감광성 조성물 및 격벽
KR102047231B1 (ko) * 2012-12-10 2019-11-21 엘지디스플레이 주식회사 전기영동 표시소자 및 그 제조방법
TWI507775B (zh) * 2013-10-24 2015-11-11 Chunghwa Picture Tubes Ltd 透明顯示裝置
KR102567855B1 (ko) * 2017-05-31 2023-08-16 니폰 제온 가부시키가이샤 터치 센서 기재 및 그 제조 방법, 터치 센서 부재 및 그 제조 방법, 그리고, 표시 장치

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0283546A (ja) * 1988-09-20 1990-03-23 Toray Ind Inc フォトレジストフィルム
JP2001013682A (ja) * 1999-06-30 2001-01-19 Hitachi Chem Co Ltd 感光性エレメント及びこれを用いたカラーフィルタの製造法
JP2002025432A (ja) * 2000-07-04 2002-01-25 Hitachi Chem Co Ltd 誘電体層及び障壁形成用樹脂組成物エレメント及びこれを用いたプラズマディスプレイパネル用基板の製造法
JP2004020897A (ja) * 2002-06-17 2004-01-22 Toppan Printing Co Ltd カラーフィルターの製造方法
JP2004066697A (ja) * 2002-08-08 2004-03-04 Mitsubishi Polyester Film Copp ドライフィルムレジスト用保護フィルム

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0762761B2 (ja) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 画像形成材料
US4963471A (en) * 1989-07-14 1990-10-16 E. I. Du Pont De Nemours And Company Holographic photopolymer compositions and elements for refractive index imaging
US6740470B2 (en) * 2001-02-08 2004-05-25 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
CN1278183C (zh) * 2001-12-13 2006-10-04 富士胶片株式会社 图像形成材料
JP2003345026A (ja) * 2002-05-24 2003-12-03 Tokyo Ohka Kogyo Co Ltd 反射防止膜形成用塗布液組成物およびこれを用いたホトレジスト積層体、並びにホトレジストパターンの形成方法
JP3851594B2 (ja) * 2002-07-04 2006-11-29 Ａｚエレクトロニックマテリアルズ株式会社 反射防止コーティング用組成物およびパターン形成方法
JP2005064143A (ja) * 2003-08-08 2005-03-10 Seiko Epson Corp レジストパターンの形成方法、配線パターンの形成方法、半導体装置の製造方法、電気光学装置及び電子機器

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0283546A (ja) * 1988-09-20 1990-03-23 Toray Ind Inc フォトレジストフィルム
JP2001013682A (ja) * 1999-06-30 2001-01-19 Hitachi Chem Co Ltd 感光性エレメント及びこれを用いたカラーフィルタの製造法
JP2002025432A (ja) * 2000-07-04 2002-01-25 Hitachi Chem Co Ltd 誘電体層及び障壁形成用樹脂組成物エレメント及びこれを用いたプラズマディスプレイパネル用基板の製造法
JP2004020897A (ja) * 2002-06-17 2004-01-22 Toppan Printing Co Ltd カラーフィルターの製造方法
JP2004066697A (ja) * 2002-08-08 2004-03-04 Mitsubishi Polyester Film Copp ドライフィルムレジスト用保護フィルム

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008149776A1 (fr) * 2007-05-30 2008-12-11 Asahi Glass Company, Limited Procédé de production d'un substrat ayant une paroi de séparation et un pixel formés dessus
JP2009048073A (ja) * 2007-08-22 2009-03-05 Fujifilm Corp 感光性転写材料、隔壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
EP2042336A1 (fr) 2007-09-26 2009-04-01 FUJIFILM Corporation Composition de revêtement photodurcissable, surimpression et son procédé de production
JP2009096977A (ja) * 2007-09-26 2009-05-07 Fujifilm Corp 顔料分散組成物、光硬化性組成物、およびカラーフィルタ
US8192802B2 (en) 2007-09-26 2012-06-05 Fujifilm Corporation Photocurable coating composition, and overprint and process for producing same
KR101057604B1 (ko) 2008-01-11 2011-08-18 도오꾜오까고오교 가부시끼가이샤 착색 감광성 수지 조성물
JP2012226146A (ja) * 2011-04-20 2012-11-15 Dainippon Printing Co Ltd タッチパネル付カラーフィルタ用保護層形成用組成物
WO2016021501A1 (fr) * 2014-08-05 2016-02-11 旭硝子株式会社 Solution de résine photosensible, procédé de formation d'un film à motifs, et procédé pour le traitement fin d'un film de résine contenant du fluor
WO2017038587A1 (fr) * 2015-08-31 2017-03-09 富士フイルム株式会社 Composition durcissable, procédé de fabrication de film durci, filtre couleur, film de protection contre la lumière, élément d'imagerie à semi-conducteur, et dispositif d'affichage d'image
JPWO2017038587A1 (ja) * 2015-08-31 2018-07-05 富士フイルム株式会社 硬化性組成物、硬化膜の製造方法、カラーフィルタ、遮光膜、固体撮像素子及び画像表示装置
US10795260B2 (en) 2015-08-31 2020-10-06 Fujifilm Corporation Curable composition, method for producing cured film, color filter, light-shielding film, solid-state imaging element, and image display device
WO2021014759A1 (fr) * 2019-07-22 2021-01-28 三菱ケミカル株式会社 Composition de résine photosensible colorée, objet durci, banque, et dispositif d'affichage d'image
JP6885518B1 (ja) * 2019-07-22 2021-06-16 三菱ケミカル株式会社 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置

Also Published As

Publication number Publication date
TW200739267A (en) 2007-10-16
JP4913750B2 (ja) 2012-04-11
KR20080070809A (ko) 2008-07-31
CN101313249B (zh) 2012-07-11
JPWO2007058355A1 (ja) 2009-05-07
CN101313249A (zh) 2008-11-26

Similar Documents

Publication Publication Date Title
JP4913750B2 (ja) 感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置
US8040470B2 (en) Method for producing partition wall for color filter, substrate with partition wall for color filter, color filter for display element, and display device
JP2008249867A (ja) 感光性樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
WO2007072682A1 (fr) Materiau de transfert photosensible, element pour dispositif d'affichage, procede de production de l'element, matrice noire, filtre colore, procede de production du filtre colore, substrat pour dispositif d'affichage, et dispositif d'affichage
JP5159608B2 (ja) 感光性樹脂組成物、感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置
JP2008266414A (ja) 樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP2008202006A (ja) 含フッ素化合物、樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP2008033229A (ja) 感光性樹脂組成物、感光性転写材料、離画壁及びその製造方法、カラーフィルタ及びその製造方法、並びに表示装置
JP2007304534A (ja) 感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置
JP5013913B2 (ja) 離画壁用感光性樹脂膜の形成方法、感光性転写材料、離画壁付基板、カラーフィルタ及びその製造方法、並びに表示装置
JP2009069589A (ja) 画像形成方法
JP2008107779A (ja) 感光性転写材料、隔壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP2006247581A (ja) パターン形成方法及びそれを用いて得られたパターン材料並びにカラーフィルタ
WO2007113958A1 (fr) Encre pour jet d'encre destinée à un filtre couleur, filtre couleur, procédé de fabrication d'un filtre couleur, et dispositif d'affichage
JP5073239B2 (ja) カラーフィルタ用インクジェットインク、並びにこれを用いたカラーフィルタ及びその製造方法、並びに表示装置
JP2006276789A (ja) 液晶配向制御用突起、その製造方法、感光性樹脂組成物、液晶表示素子、及び液晶表示装置。
JP2007293231A (ja) 感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置
WO2007105381A1 (fr) Composition de resine photosensible pour espaceurs photograves, procede de production d'espaceurs photograves, substrat pour affichage a cristaux liquides, element d'affichage a cristaux liquides et affichage a cristaux liquides
JP2008208253A (ja) 樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP2010186175A (ja) カラーフィルター用着色組成物、カラーフィルター及びその用途
JP2008203786A (ja) カラーフィルタ用感光性組成物、並びに感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、表示装置
JP2009132782A (ja) 高分子化合物及びその製造方法、樹脂組成物、感光性転写材料、離画壁及びその製造方法、カラーフィルタ及びその製造方法、並びに表示装置
JP5068603B2 (ja) 感光性転写材料、隔壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP2008216497A (ja) 感光性樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP2010186174A (ja) カラーフィルターの製造方法、カラーフィルター及びその用途

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200680043208.5

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 1020087008179

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 2007545337

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 06833025

Country of ref document: EP

Kind code of ref document: A1