WO2006132007A1 - 半導体集積回路 - Google Patents
半導体集積回路 Download PDFInfo
- Publication number
- WO2006132007A1 WO2006132007A1 PCT/JP2006/302521 JP2006302521W WO2006132007A1 WO 2006132007 A1 WO2006132007 A1 WO 2006132007A1 JP 2006302521 W JP2006302521 W JP 2006302521W WO 2006132007 A1 WO2006132007 A1 WO 2006132007A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- circuit
- noise
- area
- region
- semiconductor integrated
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims description 112
- 230000006866 deterioration Effects 0.000 claims abstract description 17
- 230000015556 catabolic process Effects 0.000 claims description 3
- 238000006731 degradation reaction Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 description 25
- 230000000644 propagated effect Effects 0.000 description 8
- 230000001902 propagating effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823481—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type isolation region manufacturing related aspects, e.g. to avoid interaction of isolation region with adjacent structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/761—PN junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
Definitions
- the present invention relates to a semiconductor integrated circuit in which a circuit whose characteristics deteriorate due to the influence of noise and a circuit that becomes a noise source are mixedly mounted.
- a guard band is provided between the analog circuit and the digital circuit to reduce noise propagation.
- semiconductor integrated circuits that can be used (see, for example, Patent Document 1 and Patent Document 2).
- FIG. 12 is a plan view showing a configuration of a semiconductor integrated circuit 900 provided with the guard band.
- FIG. 13 is a cross-sectional view of the semiconductor integrated circuit 900 (cross-section along the cross-sectional line AA in FIG. 12).
- a semiconductor integrated circuit 900 includes a semiconductor substrate 910, an analog circuit area.
- Analog circuit region 920 is a region where an analog circuit is formed. Circuits in this area are circuits whose characteristics deteriorate due to noise propagated through a power supply that is vulnerable to noise.
- the digital circuit area 930 is a level that degrades the circuit characteristics of the analog circuit area 920. This is an area where digital circuit power that generates noise is also generated.
- the guard band region 940 includes a base contact 941, and the base contact 941 is connected to a digital circuit power source 960.
- the analog circuit power supply 950 supplies a power supply voltage to the circuits in the analog circuit region 920.
- the digital circuit power source 960 is configured to supply a power source voltage to the circuits in the digital circuit region 930.
- an analog circuit region 920 and a digital circuit region 930 are arranged on a semiconductor substrate 910, and a guard band region 940 is arranged between the analog circuit region 920 and the digital circuit region 930.
- noise generated in the digital circuit region 930 passes through the guard band region 940 before propagating to the analog circuit region 920.
- the noise passes through the substrate contact 941, passes through the digital power source 960, and is released to the outside of the semiconductor substrate 910. That is, the noise is absorbed by the guard band region 940 and released outside the semiconductor substrate 910. Therefore, the noise generated in the digital circuit area 930 can be prevented from deteriorating the characteristics of the analog circuit area 920 that does not propagate to the analog circuit area 920.
- Patent Document 1 Japanese Patent No. 3075892
- Patent Document 2 Japanese Patent Laid-Open No. 2002-246553
- the conventional semiconductor integrated circuit requires a guard band region as a physical region on the semiconductor integrated circuit, there is a problem that the area of the semiconductor integrated circuit increases. It was. In addition, noise absorption by the guard band region is more effective as the area of the guard band region is larger. Therefore, if a larger noise absorption effect is obtained, the increase in the area of the semiconductor integrated circuit becomes more remarkable. .
- an object of the present invention is to provide a semiconductor integrated circuit capable of preventing deterioration of characteristics of a circuit that is susceptible to noise without increasing the area of the semiconductor integrated circuit (semiconductor substrate).
- the circuit area to be protected whose characteristics deteriorate according to the level of the noise level, and the amount of deterioration given to the circuit in the circuit area to be protected are larger than those permitted for the circuit in the circuit area to be protected.
- a high-noise circuit area consisting of circuit modules that generate noise of a certain level
- a low-noise circuit region comprising circuit members that generate noise at a level that causes the amount of deterioration given to the circuit in the circuit region to be protected to be within the amount of deterioration allowed for the circuit in the circuit region to be protected;
- the low noise circuit area is configured to prevent the protection target circuit area and the high noise circuit area from contacting each other.
- the circuit in the circuit area to be protected, the circuit in the high noise circuit area, and the circuit in the low noise circuit area are mutually connected among the three or more types of individual power supplies. It is characterized in that each power supply voltage is supplied by different power sources.
- noise generated in the high noise circuit area is released to the outside of the semiconductor substrate through the low noise circuit area before propagating to the circuit area to be protected. , It does not propagate to the circuit area to be protected that is vulnerable to noise. Therefore, it is possible to prevent deterioration of circuit characteristics in the circuit area to be protected.
- the circuits in the high noise circuit region and the low noise circuit region are circuits that generate noise at a level corresponding to the magnitude of the frequency of a signal to be handled
- the maximum frequency of the signal handled in the low noise circuit area is the high noise circuit area. It is characterized by being lower than the frequency of the signal handled in the region.
- a high noise circuit region and a low noise circuit region are configured based on the frequency of the signal handled by the circuit.
- the circuit in the circuit area to be protected is an analog circuit
- the circuit in the high noise circuit region is a digital circuit.
- the circuit in the circuit area to be protected is an analog circuit
- the circuit in the high noise circuit region is a digital circuit.
- the present invention it is possible to prevent the circuit characteristics from being deteriorated due to the influence of noise without increasing the area of the semiconductor integrated circuit.
- FIG. 1 is a plan view showing a configuration of a semiconductor integrated circuit according to Embodiment 1 of the present invention.
- FIG. 2 is a cross-sectional view of the semiconductor integrated circuit according to Embodiment 1 of the present invention.
- FIG. 3 is a plan view showing a configuration of a semiconductor integrated circuit according to Embodiment 2 of the present invention.
- FIG. 4 is a plan view showing a modification of the semiconductor integrated circuit according to Embodiment 2 of the present invention.
- FIG. 5 is a plan view showing a configuration of a semiconductor integrated circuit according to Embodiment 3 of the present invention.
- FIG. 6 is a diagram showing a connection relationship between a semiconductor substrate and a lead frame.
- FIG. 7 is a plan view showing a configuration of a semiconductor integrated circuit according to Embodiment 4 of the present invention.
- FIG. 8 is a plan view showing a modification of the semiconductor integrated circuit according to Embodiment 4 of the present invention.
- FIG. 9 is a plan view showing another modification of the semiconductor integrated circuit according to Embodiment 4 of the present invention.
- FIG. 10 shows the spectral distribution of the noise generated in the digital circuit domain and the signal handled in the analog circuit domain.
- FIG. 11 is a plan view showing an example in which a guard band region is added to the semiconductor integrated circuit according to the first embodiment of the present invention.
- FIG. 12 is a plan view showing a configuration of a conventional semiconductor integrated circuit.
- FIG. 13 is a cross-sectional view of a conventional semiconductor integrated circuit.
- FIG. 1 is a plan view showing a configuration of a semiconductor integrated circuit 100 according to Embodiment 1 of the present invention.
- 2 is a sectional view of the semiconductor integrated circuit 100 (cross section AA in FIG. 1).
- the semiconductor integrated circuit 100 includes a semiconductor substrate 110, an analog circuit region 120, a digital circuit region 130, a digital circuit region 140, and power supplies 151 to 153.
- an analog semiconductor integrated circuit an analog semiconductor integrated circuit
- a digital semiconductor integrated circuit digital circuit
- the analog circuit area 120 is an area where an analog circuit is formed.
- the analog circuit formed in the analog circuit area 120 is a circuit such as a tuner, an AD converter, a DA converter, a PLL (Phase Locked Loop), a VCO (Voltage Controlled Oscillator), a filter, and an operational amplifier.
- the characteristics of these circuits generally deteriorate depending on the noise level contained in the signal that is handled weakly by noise and the noise level propagated through the semiconductor substrate. Therefore, the analog circuit region 120 is a! / ⁇ region (protection target circuit region) that prevents the propagation of noise generated in other circuit regions.
- the digital circuit area 130 is an area (high noise circuit area) composed of circuit members that generate noise at a level that degrades characteristics more than allowed for the circuit in the circuit area to be protected.
- the digital circuit region 130 is a region having a digital circuit power that generates noise at a level corresponding to the operating frequency, and the operating frequency of the circuit in the digital circuit region 130 is 60 MHz.
- the digital circuit area 140 does not deteriorate the characteristics of the circuit in the circuit area to be protected! /, (Or the allowable level of the circuit of the analog circuit area 120 in the degree of deterioration) is limited to circuits that generate noise. This is an area (low noise circuit area).
- the digital circuit region 140 is also a region having a digital circuit power that generates noise at a level corresponding to the operating frequency, and the operating frequency of the circuit in the digital circuit region 140 is 10 MHz. That is, the operating frequency of the circuit in the digital circuit area 130 is larger than the operating frequency of the digital circuit area 140. Therefore, the digital circuit region 130 is a region where the level of noise generated is larger than that of the digital circuit region 140.
- the analog circuit region 120, the digital circuit region 130, and the digital circuit region 140 are configured so that the analog circuit region 120 and the digital circuit region 130 are not in contact with each other.
- a digital circuit area 140 is physically disposed between the area 120 and the digital circuit area 130.
- the power source 151 supplies power to the analog circuit region 120
- the power source 152 supplies power to the digital circuit region 130
- the power source 153 supplies power to the digital circuit region 140.
- the power sources 151 to 153 are individual power sources, and the paths for supplying power without being connected to each other are independent.
- noise is generated in the digital circuit region 140 and the digital circuit region 130.
- the noise generated in the digital circuit area 130 tries to propagate through the semiconductor substrate 110 to the analog circuit area 120 that is vulnerable to noise.
- noise generated in the digital circuit area 130 passes through the digital circuit area 140 while propagating to the analog circuit area 120.
- the noise generated in the digital circuit area 130 passes through the power supply 153 that supplies the power supply voltage to the digital circuit area 140 before propagating to the analog circuit area 120, as shown in FIG. Escaped outside. That is, noise generated in the digital circuit area 130 does not propagate to the analog circuit area 120 that is vulnerable to noise.
- noise generated in the high noise circuit area is not propagated to the protection target circuit area, so that it is possible to prevent deterioration of circuit characteristics in the protection target circuit area.
- the guard band region is unnecessary, the area of the semiconductor substrate can be reduced.
- the area of the low noise circuit area is generally larger than that of the guard band area, the noise absorption effect is also increased.
- the operating frequencies of the digital circuit region 140 and the digital circuit region 130 are examples, and are not limited to these.
- Embodiment 2 of the Invention The type of circuit (analog circuit or digital circuit) constituting each area such as the protection target circuit area is not limited to the example of the first embodiment.
- the semiconductor integrated circuit according to the second embodiment is an example different from the first embodiment in the types of circuits constituting each region such as the protection target circuit region.
- the semiconductor integrated circuit 200 includes a semiconductor substrate 110, an analog circuit region 220, an analog circuit region 230, and an analog circuit region 240. It is an area consisting of analog circuit power.
- components having the same functions as those of the first embodiment are denoted by the same reference numerals and description thereof is omitted.
- the analog circuit area 220 (protection target circuit area) is an area that also has analog circuit power.
- the circuit of the analog circuit area 220 has characteristics that deteriorate depending on the noise level included in the signal to be handled or the noise level propagated through the semiconductor substrate.
- the circuit formed in the analog circuit region 220 is an analog circuit that is weak against noise such as a tuner LNA (Low Noise Amplifier) and a mixer.
- the analog circuit region 230 (high noise circuit region) is a region where a generated noise level is large and / or an analog circuit is provided.
- the noise generated by the circuit in the analog circuit area 230 has a level that degrades the characteristics of the analog circuit area 220 more than allowed.
- the circuit formed in the analog circuit region 230 is an analog circuit such as a PLL circuit of a tuner, for example.
- the analog circuit region 240 (low noise circuit region) is a region where the generated noise level is small and an analog circuit is provided.
- the noise generated by the circuit in the analog circuit area 240 does not have a level until the characteristics of the analog circuit area 220 are deteriorated more than allowed.
- the circuit formed in the analog circuit region 240 is an analog circuit such as a tuner filter or VGA.
- the entire circuit area may be an area composed of digital circuits.
- the digital circuit in the digital circuit area 320 (protection target circuit area) is a circuit that is vulnerable to noise, such as a high-speed interface. Circuits in digital circuit area 320 are propagated The characteristic deteriorates according to the level of noise.
- the digital circuit in the digital circuit region 330 (high noise circuit region) is a circuit that generates noise at a level corresponding to the operating frequency.
- the level of noise generated by the digital circuit in the digital circuit area 330 has a level that degrades the characteristics of the digital circuit area 320 more than allowed.
- the circuit in the digital circuit region 340 (low noise circuit region) is also a circuit that generates noise at a level corresponding to the operating frequency.
- the operating frequency of the circuit in the digital circuit area 340 is lower than the operating frequency of the circuit in the digital circuit area 330.
- the level of noise generated is such that the digital circuit area 320 can only degrade within the allowable range. is there.
- the number of power supplies that supply power supply voltage to the circuits in each of the protection target circuit area, the high noise circuit area, and the low noise circuit area is the number of power supplies that supply power supply voltage to the protection target circuit area and the low noise circuit area.
- the power supply that supplies the power supply voltage and the power supply that supplies the power supply voltage to the high-noise circuit region are independent from each other, they are not limited to the above examples.
- the semiconductor integrated circuit according to the third embodiment is an example in which the number of power supplies supplied to each region such as the protection target circuit region is different from that of the first embodiment.
- FIG. 6 is a diagram showing the connection between the semiconductor substrate 110 and the power supply terminal.
- the lead frame 160 (power supply terminal) is supplied with a power supply voltage also from an external force of the semiconductor integrated circuit.
- the bonding wire 170 connects the lead frame 160 and the bonding pad 180.
- the bonding pad 180 is bonded to a circuit in each of the protection target circuit area, the high noise circuit area, and the low noise circuit area via a power supply wiring (not shown).
- the power supply voltage supplied via the Yer 170 is supplied.
- one of the lead frames 160 is connected to a plurality of bonding pads 180. Therefore, the power supply is not independent as a product terminal, and the power supply voltage is supplied to a plurality of regions having the same power supply terminal force. However, on the semiconductor substrate 110, the power supply paths supplied to the protection target circuit region, the high noise circuit region, and the low noise circuit region are different, and noise passes through the semiconductor substrate 110. Can not propagate directly.
- the number of each of the protection target circuit area, the high noise circuit area, and the low noise circuit area is such that the protection target circuit area and the high noise circuit area do not contact each other. Is physically limited by the low-noise circuit area, it is not limited to the numbers and physical shapes described above! ,.
- the semiconductor integrated circuit according to the fourth embodiment is an example in which the number and shape of the protection target circuit regions are different from those of the first embodiment.
- the protection target circuit region, the high noise circuit region, and the low noise circuit region may be arranged.
- the semiconductor integrated circuit 500 includes a semiconductor substrate 110, an analog circuit area 520 (circuit area to be protected), a digital circuit area 531 to 532 (high noise circuit area), and a digital circuit area 541 to 542 ( Low noise circuit area).
- the analog circuit region 520 is a region where analog circuit power is also provided.
- the circuits in the analog circuit area 520 are analog circuits that are vulnerable to noise, such as tuners, AD converters, DA converters, PLL circuits, VCO circuits, filters, operational amplifiers, and the like.
- the digital circuit areas 531 to 532 and the digital circuit areas 541 to 542 are areas where the digital circuit power is also provided.
- the circuit operating frequencies in the digital circuit area 531 to 532 and the digital circuit area 541 to 542 are expressed as f531, f53 2, f541, and f542, respectively, and f541 ⁇ f542 ⁇ f531 ⁇ f532.
- the magnitudes of noise generated by the circuits in the digital circuit areas 531 to 532 and digital circuit areas 541 to 542 are expressed as n531, n532, n541, and n542, respectively, n541 ⁇ n54 2 ⁇ n531 ⁇ n532.
- the noise level force is 542 or less, and the characteristic deterioration of the analog circuit area 520 is acceptable.
- the noise level force is 531 or more, the analog circuit area 520 circuit characteristic is acceptable. It will be deteriorated more than expected.
- the digital circuit region 541 is physically disposed between the analog circuit region 520 and the digital circuit region 531 so that the analog circuit region 520 and the digital circuit region 531 do not contact each other.
- the digital circuit area 542 is physically disposed between the analog circuit area 520 and the digital circuit area 532 so that the analog circuit area 520 and the digital circuit area 532 do not contact each other.
- the power source that supplies the power source voltage to each of the above regions is independent.
- the semiconductor integrated circuit 500 configured as described above, as in the semiconductor integrated circuit 100, noise generated in the digital circuit area 531 and 532 propagates to the analog circuit area 520 (circuit area to be protected). There is nothing to do. Therefore, the semiconductor integrated circuit 500 can also prevent the deterioration of the characteristics of the analog circuit region 520.
- a power source that supplies a power source voltage to the digital circuit region 541 and a power source that supplies a power source voltage to the digital circuit region 542 are connected by wiring 592 as shown in FIG.
- the power source that supplies the power source voltage to the digital circuit area 531 and the power source that supplies the power source voltage to the digital circuit area 532 may be connected by the wiring 591. Even when the power is connected in this way, the power supplied to the high noise circuit area (digital circuit area 531 and 532) and low noise circuit area (digital circuit area 541 and 542) is independent of each other! / ⁇ Therefore, noise generated in the digital circuit area 531 ⁇ 532 (high noise circuit area) is absorbed by the digital circuit area 541 and the digital circuit area 542 and is not propagated to the analog circuit area 520.
- the protection target circuit region, the high noise circuit region, and the low noise circuit region may be arranged.
- the semiconductor integrated circuit 600 includes a semiconductor substrate 110, analog circuit areas 621 to 623 (circuit area to be protected), digital circuit area 630 (high noise circuit area), and digital circuit area 6 41 to 642 (low noise circuit area).
- the analog circuit areas 621 to 623 are areas in which analog circuit power is also provided.
- the circuits in the analog circuit area 621 to 623 are, for example, analog circuits that are vulnerable to noise such as tuners, AD converters, DA converters, PLL circuits, VCO circuits, filters, and operational amplifiers.
- the digital circuit area 630 and the digital circuit areas 641 to 642 are areas made up of digital circuits.
- the operating frequencies of the circuits in each of the digital circuit area 630 and the digital circuit areas 641 to 642 are represented as f630, f641, and f642, respectively, and f642 ⁇ f641 ⁇ f630.
- the magnitudes of noise generated by the circuits in the digital circuit area 630 and the digital circuit areas 641 to 642 are expressed as n630, n641, and ⁇ 642, respectively, ⁇ 642 ⁇ 641 ⁇ 630.
- the circuits in the analog circuit areas 621 to 623 are assumed to have a characteristic degradation within an allowable range when the noise level force is 641 or less.
- the noise level force is over 630 or more when the noise level force is over 630.
- the digital circuit area 641 is arranged between the analog circuit area 621 and the digital circuit area 630 so that the analog circuit area 621 and the digital circuit area 630 do not contact each other. Is physically located. Further, the digital circuit area 641 is physically disposed between the analog circuit area 622 and the digital circuit area 630 so that the analog circuit area 622 and the digital circuit area 630 do not contact each other. . The digital circuit area 642 is physically disposed between the analog circuit area 623 and the digital circuit area 630 so that the analog circuit area 623 and the digital circuit area 630 do not contact each other.
- the power supply for supplying the power supply voltage to each of the above regions is independent.
- the noise generated in the digital circuit region 630 may propagate to the analog circuit regions 621 to 623 that are vulnerable to noise, as in the semiconductor integrated circuit 100. Degradation of characteristics of analog circuit area 621 to 623 (circuit area to be protected) can be reduced.
- the power source for supplying the power source voltage to the digital circuit area 641 and the power source for supplying the power source voltage to the digital circuit area 642 are wired as shown in FIG. You may connect with 0. Even when power is connected in this way, the power supplied to the high noise circuit area (digital circuit area 630) and low noise circuit area (digital circuit area 641 and 642) is independent of each other! / Therefore, it is absorbed in the noise digital circuit area 641 and the digital circuit area 642 generated in the digital circuit area 630 (high noise circuit area) and is not propagated to the analog circuit areas 621 to 623.
- the protection target circuit region, the high noise circuit region, and the low noise circuit region may be arranged.
- the semiconductor integrated circuit 700 includes a semiconductor substrate 110, analog circuit areas 721 to 722 (circuit area to be protected), digital circuit area 730 (high noise circuit area), and digital circuit area 7 41 to 742. (Low noise circuit area).
- the analog circuit areas 721 to 722 are areas where analog circuit power is also provided.
- the circuits in the analog circuit areas 721 to 722 are analog circuits that are vulnerable to noise such as tuners, AD converters, DA converters, PLL circuits, VCO circuits, filters, and operational amplifiers.
- the digital circuit area 730 and the digital circuit areas 741 to 742 are areas composed of digital circuits.
- the operating frequencies of the circuits in each of the digital circuit region 730 and the digital circuit regions 741 to 742 are represented as f730, f741, and f742, respectively, and it is assumed that f741 ⁇ f742 ⁇ f730.
- the magnitudes of noises generated by the circuits in the digital circuit region 730 and the digital circuit regions 741 to 742 are expressed as n730, n741, and ⁇ 742, respectively, ⁇ 741 ⁇ 742 ⁇ 730.
- the lower limit frequency of the frequency band of the signal handled in the analog circuit region 721 is fl
- the upper limit frequency is fh
- the analog circuit area 721 is arranged so as not to contact the digital circuit area 741.
- the digital circuit area 741 is physically disposed between the analog circuit area 722 and the digital circuit area 730 so that the analog circuit area 722 and the digital circuit area 730 do not contact each other.
- the digital circuit area 742 is physically disposed between the analog circuit area 721 and the digital circuit area 730 so that the analog circuit area 721 and the digital circuit area 730 do not contact each other.
- the analog circuit area 721 and the digital circuit area 741 do not contact each other. Although the level of noise generated when the operating frequency of the digital circuit area 741 is low is small, the operating frequency of the digital circuit area 741 is within the frequency band of the signal handled by the analog circuit area 721. It is a force that is considered to be a direct noise component.
- the power supply for supplying the power supply voltage to each of the above regions is independent.
- FIG. 10 shows the spectral distribution of noise generated in the digital circuit area 730 ⁇ 741 to 742 and the signal handled in the analog circuit area 721.
- the noise generated in the digital circuit area 730 ⁇ 741 to 742 is propagated to the analog circuit area 721
- the noise generated in the digital circuit area 741 is the signal handled in the analog circuit area 721. It overlaps with the band (fl ⁇ fh) and becomes direct noise.
- the analog circuit region 721 and the digital circuit region 741 are arranged so as not to contact each other.
- the large noise generated in the digital circuit area 730 is weak against noise, cannot propagate to the analog circuit areas 721 to 722, and the noise generated in the digital circuit area 741 Do not propagate to 721.
- the deterioration of the circuit characteristics in the circuit area to be protected can be reduced.
- a guard band region 860 may be further added between the analog circuit region 120 and the digital circuit region 140 to the semiconductor integrated circuit 100 as in the semiconductor integrated circuit 800 shown in FIG.
- the guard band region 860 is the same as the guard band region provided in the conventional semiconductor integrated circuit. As a result, it is possible to more effectively prevent circuit characteristic deterioration in the circuit area to be protected.
- the circuit formed in the low noise circuit region is not limited to the analog circuit and the digital circuit exemplified above!
- circuit formed in the high noise circuit region an example of a large operating frequency and a digital circuit has been described.
- an analog that generates a large frequency such as a VCO or the like is described.
- Any circuit that generates noise that degrades the characteristics of the circuit in the circuit area to be protected such as a log circuit or a circuit that has a small peak and a high operating frequency, may be used.
- a circuit formed in the low noise circuit region is not limited to a digital circuit having a low operating frequency, such as a circuit having a low peak current. Any circuit of a level that does not deteriorate the characteristics may be used.
- the semiconductor integrated circuit according to the present invention has an effect that it is possible to prevent deterioration of circuit characteristics due to noise without increasing the area of the semiconductor integrated circuit, This is useful as a semiconductor integrated circuit in which a circuit whose characteristics deteriorate due to noise and a circuit that becomes a noise source are mixedly mounted.
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06713662A EP1890328A4 (en) | 2005-06-06 | 2006-02-14 | INTEGRATED SEMICONDUCTOR SWITCHING |
JP2006536975A JPWO2006132007A1 (ja) | 2005-06-06 | 2006-02-14 | 半導体集積回路 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005-165407 | 2005-06-06 | ||
JP2005165407 | 2005-06-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2006132007A1 true WO2006132007A1 (ja) | 2006-12-14 |
Family
ID=37498216
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2006/302521 WO2006132007A1 (ja) | 2005-06-06 | 2006-02-14 | 半導体集積回路 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20080094132A1 (ja) |
EP (1) | EP1890328A4 (ja) |
JP (1) | JPWO2006132007A1 (ja) |
KR (1) | KR20080009191A (ja) |
CN (1) | CN101019224A (ja) |
WO (1) | WO2006132007A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013205729A (ja) * | 2012-03-29 | 2013-10-07 | Seiko Epson Corp | 集積回路装置、電気光学装置及び電子機器 |
JP2015095606A (ja) * | 2013-11-13 | 2015-05-18 | セイコーエプソン株式会社 | 半導体装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07193189A (ja) * | 1993-12-27 | 1995-07-28 | Hitachi Ltd | アナログ/デジタル混在lsi |
JPH09181257A (ja) * | 1995-12-25 | 1997-07-11 | Hitachi Ltd | 半導体集積回路装置 |
JP2004179255A (ja) * | 2002-11-25 | 2004-06-24 | Sony Corp | 半導体集積回路 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3251735B2 (ja) * | 1992-09-25 | 2002-01-28 | 株式会社東芝 | 半導体集積回路装置 |
US6295572B1 (en) * | 1994-01-24 | 2001-09-25 | Advanced Micro Devices, Inc. | Integrated SCSI and ethernet controller on a PCI local bus |
US5475255A (en) * | 1994-06-30 | 1995-12-12 | Motorola Inc. | Circuit die having improved substrate noise isolation |
JPH0884061A (ja) * | 1994-09-14 | 1996-03-26 | Hitachi Ltd | 集積回路の雑音低減回路および雑音低減法 |
JPH11238846A (ja) * | 1998-02-20 | 1999-08-31 | Rohm Co Ltd | 半導体装置 |
JP3934261B2 (ja) * | 1998-09-18 | 2007-06-20 | 株式会社ルネサステクノロジ | 半導体集積回路 |
JP2001094050A (ja) * | 1999-09-21 | 2001-04-06 | Mitsubishi Electric Corp | 半導体装置 |
JP3719650B2 (ja) * | 2000-12-22 | 2005-11-24 | 松下電器産業株式会社 | 半導体装置 |
JP2002313935A (ja) * | 2001-04-16 | 2002-10-25 | Niigata Seimitsu Kk | 半導体装置 |
AU2003233604A1 (en) * | 2002-05-20 | 2003-12-12 | Imagerlabs | Forming a multi segment integrated circuit with isolated substrates |
US7052939B2 (en) * | 2002-11-26 | 2006-05-30 | Freescale Semiconductor, Inc. | Structure to reduce signal cross-talk through semiconductor substrate for system on chip applications |
JP4280672B2 (ja) * | 2004-05-07 | 2009-06-17 | 富士通株式会社 | 半導体集積回路 |
-
2006
- 2006-02-14 WO PCT/JP2006/302521 patent/WO2006132007A1/ja active Application Filing
- 2006-02-14 JP JP2006536975A patent/JPWO2006132007A1/ja not_active Withdrawn
- 2006-02-14 EP EP06713662A patent/EP1890328A4/en not_active Withdrawn
- 2006-02-14 KR KR1020077000989A patent/KR20080009191A/ko not_active Application Discontinuation
- 2006-02-14 CN CNA2006800007555A patent/CN101019224A/zh active Pending
- 2006-02-14 US US11/660,315 patent/US20080094132A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07193189A (ja) * | 1993-12-27 | 1995-07-28 | Hitachi Ltd | アナログ/デジタル混在lsi |
JPH09181257A (ja) * | 1995-12-25 | 1997-07-11 | Hitachi Ltd | 半導体集積回路装置 |
JP2004179255A (ja) * | 2002-11-25 | 2004-06-24 | Sony Corp | 半導体集積回路 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1890328A4 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013205729A (ja) * | 2012-03-29 | 2013-10-07 | Seiko Epson Corp | 集積回路装置、電気光学装置及び電子機器 |
JP2015095606A (ja) * | 2013-11-13 | 2015-05-18 | セイコーエプソン株式会社 | 半導体装置 |
US9880285B2 (en) | 2013-11-13 | 2018-01-30 | Seiko Epson Corporation | Semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
US20080094132A1 (en) | 2008-04-24 |
EP1890328A1 (en) | 2008-02-20 |
EP1890328A4 (en) | 2009-06-24 |
KR20080009191A (ko) | 2008-01-25 |
JPWO2006132007A1 (ja) | 2009-01-08 |
CN101019224A (zh) | 2007-08-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4301401B2 (ja) | フロントエンドモジュール及び通信端末 | |
JP5768375B2 (ja) | 半導体装置 | |
US8212323B2 (en) | Seal ring structure for integrated circuits | |
US7667302B1 (en) | Integrated circuit chip with seal ring structure | |
US8242586B2 (en) | Integrated circuit chip with seal ring structure | |
US7095999B2 (en) | Signal processing semiconductor integrated circuit device | |
KR19980023927A (ko) | 반도체 장치 | |
JP2007059676A (ja) | 半導体装置 | |
TW201843791A (zh) | 半導體晶片 | |
US7881679B1 (en) | Method and apparatus for integrating power amplifiers with phase locked loop in a single chip transceiver | |
WO2006132007A1 (ja) | 半導体集積回路 | |
JP2005183696A (ja) | 半導体装置 | |
US7355219B2 (en) | Integrated circuit with reduced coupling noise | |
US20060043425A1 (en) | Semiconductor integrated circuit device which restricts an increase in the area of a chip, an increase in the number of lead terminals of a package, and can reduce parasitic inductance | |
US6677781B2 (en) | Semiconductor integrated circuit device | |
JP4583233B2 (ja) | 半導体装置 | |
US5864168A (en) | Apparatus and method for reduced substrate noise coupling | |
JP2007096170A (ja) | 半導体装置 | |
KR102217746B1 (ko) | 탄성파 장치, 고주파 프론트 엔드 회로 및 통신 장치 | |
JP2004146674A (ja) | 半導体集積回路 | |
US20090085229A1 (en) | Audio power amplifier package | |
WO2022149474A1 (ja) | 電子回路装置 | |
JP2005019482A (ja) | 半導体集積装置 | |
WO2022215200A1 (ja) | ドハティ増幅器 | |
US20100295601A1 (en) | Semiconductor device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ENP | Entry into the national phase |
Ref document number: 2006536975 Country of ref document: JP Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020077000989 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2006713662 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 11660315 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 200680000755.5 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWP | Wipo information: published in national office |
Ref document number: 2006713662 Country of ref document: EP |