WO2006085597A1 - Film brillant à motifs multiples, del brillante à motifs multiples et produit brillant à motifs multiples les utilisant - Google Patents

Film brillant à motifs multiples, del brillante à motifs multiples et produit brillant à motifs multiples les utilisant Download PDF

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Publication number
WO2006085597A1
WO2006085597A1 PCT/JP2006/302276 JP2006302276W WO2006085597A1 WO 2006085597 A1 WO2006085597 A1 WO 2006085597A1 JP 2006302276 W JP2006302276 W JP 2006302276W WO 2006085597 A1 WO2006085597 A1 WO 2006085597A1
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WO
WIPO (PCT)
Prior art keywords
layer
glitter
relief
pattern
relief forming
Prior art date
Application number
PCT/JP2006/302276
Other languages
English (en)
Japanese (ja)
Inventor
Makoto Aoyagi
Norikazu Saito
Tetsuya Matsuyama
Original Assignee
Dai Nippon Printing Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co., Ltd. filed Critical Dai Nippon Printing Co., Ltd.
Publication of WO2006085597A1 publication Critical patent/WO2006085597A1/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G03H1/0011—Adaptation of holography to specific applications for security or authentication
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2270/00—Substrate bearing the hologram
    • G03H2270/52—Integrated surface relief hologram without forming layer

Definitions

  • Multi-design glitter film, multi-design glitter thread and glitter multi-pattern formation using them are Multi-design glitter film, multi-design glitter thread and glitter multi-pattern formation using them.
  • the present invention relates to a multi-design glitter film or thread, and more specifically, a multi-design glitter film having a plurality of glitter designs, a unique design, and Z or security.
  • the present invention relates to a thread and a glittering multi-patterned product using them.
  • ratio “part”, “%” and the like indicating the composition are based on mass unless otherwise specified, and the “z” mark indicates that they are integrally laminated.
  • “brilliance” is a micro-order relief shape in which the relief shape is a hairline pattern, a line pattern, a mat pattern, a hologram, and a z or diffraction grating. It means the effect of having a unique optical design.
  • first base material 11A and second base material 11B are collectively referred to as “base material 11", and the same applies to the other layers.
  • a sheet is a thin and generally a flat product whose thickness is small relative to the length and width, and a film is a length and width.
  • This is a thin, flat product, usually supplied in the form of a roll, with a maximum thickness that is extremely small compared to the thickness. Therefore, it can be said that the film is particularly thin in the thickness of the sheet. Since the boundary between the sheet and the film is not clear, it is difficult to clearly distinguish between the sheet and the film. ".
  • the multi-design glitter film or thread of the present invention Using the multi-design glitter film or thread of the present invention and the multi-design glitter film or thread, at least a part of the multi-design glitter film is transferred to the transfer object by sticking or squeezing.
  • main uses of the glittered multi-pattern formation For example, banknotes, stock certificates, securities, certificates, gift certificates, checks, bills, hall tickets, passbooks, gift certificates, boarding tickets, car horse tickets, stamps, stamps, appreciation tickets, entrance certificates, passports, tickets, etc.
  • Cards such as cash cards, credit cards, ID cards, prepaid cards, members cards, IC cards, optical cards, greeting cards, postcards, business cards, driver's licenses, sports certificates, etc.
  • Packaging materials such as cartons, cases, flexible packaging materials, bags, forms, envelopes, tags, transparencies, slide films, bookmarks, books, magazines, calendars, posters, brochures, print clubs (registered trademark) , Menus, passports, POP supplies, coasters, displays, nameplates, keyboards, cosmetics, wrist watches, lighters, accessories, sentences Stationery such as furniture, underlay, report paper, building materials, panels, emblems, keys, cloth, clothing, footwear, radio, television, calculator, office equipment, various sample books, albums, and computer graphics Output and medical image output.
  • Stationery such as furniture, underlay, report paper, building materials, panels, emblems, keys, cloth, clothing, footwear, radio, television, calculator, office equipment, various sample books, albums, and computer graphics Output and medical image output.
  • there is no particular limitation as long as it is a use that requires a unique design with glitter and Z or security.
  • vouchers, cards, and various certificates have qualifications and certain economic values and effects, so they are constantly counterfeited, altered, and illegally used. In particular, it has facilitated the forgery of various media that are markedly improved by color copying machines.
  • Transfer foil with relief especially holograms and diffraction gratings
  • Transfer foil with relief has a design that can express unique decorative images and three-dimensional images, and these holograms and diffraction gratings require advanced manufacturing technology and are easily manufactured. Since it cannot be used, it is used to improve security to prevent forgery.
  • the transfer foil having a relief forming layer of the two layers are known to one side (e.g., see Patent Document 3.) While 0 tooth force, the two-layer relief-forming layer is transparent holo metal Two hologram reconstructed images are observed from one side for the combination of horo.
  • the present applicant also discloses an exposed portion and a covered portion that intermittently expose the glittering thread from the base paper.
  • the transfer foil having a relief forming layer of the two layers on one side is known (e.g., see Patent Document 3.) 0 with teeth force, the transfer foil embossing twice with different patterns on the same surface It is a patent relating to a manufacturing method, and there is no description regarding the double-sided glitter.
  • the present applicant has also disclosed a forgery prevention paper provided with an exposed portion and a covering portion that intermittently expose the glittering thread from the base paper (see, for example, Patent Document 4).
  • a forgery prevention paper provided with an exposed portion and a covering portion that intermittently expose the glittering thread from the base paper (see, for example, Patent Document 4).
  • Na husk even without looking at the end surface of the paper can determine whether the counterfeit is for hard to peel off simultaneously glitter Suretsu de groups paper strength.
  • embossing may be a double-sided embossing that is sufficient with single-sided embossing (see, for example, Patent Document 5).
  • double-sided embossing there is no further explanation about double-sided embossing, and there is no suggestion about the embossed pattern.
  • the clear meaning of double-sided embossing is not described, and it is not clear whether a relief pattern is formed on both sides. None of the prior art describes or suggests that the front and back surfaces have different brilliant designs. In addition, the total thickness was too thick to lack a sense of unity as anti-counterfeit paper.
  • Patent Document 1 JP 2001-172897
  • Patent Document 2 Japanese Patent Laid-Open No. 06-257028
  • Patent Document 3 Japanese Patent Application Laid-Open No. 07-199781
  • Patent Document 4 Japanese Patent Laid-Open No. 10-71759
  • Patent Document 5 JP 2001-31729 A
  • the present invention has been made to solve the above-described problems of the prior art.
  • the first aspect of the present invention provides a unique glitter design such as a hologram and a diffraction grating and an optical effect by providing two different glitter patterns and / or patterns, and is easy to manufacture.
  • the present invention is directed to providing a multi-design glitter film having low cost and a multi-design glitter composition using the same.
  • the second aspect of the present invention provides a unique glitter design such as a hologram or a diffraction grating, an optical effect, and Z or security by providing two different glitter patterns and Z or patterns.
  • the present invention is directed to providing a multi-pattern glitter thread that is excellent in unity with paper, easy to manufacture, and low in cost.
  • all of the plurality of patterns are peeled off of the grease, so-called “plate removal”.
  • the present invention is directed to providing a brilliant film excellent in bodily sensation, and a brilliant pattern formation using the same.
  • the multi-design glitter film according to the present invention has at least the first design of glitter and the second design of glitter, and the first design and the second design of the second design. The design is different.
  • the multi-design glitter film according to the present invention is such that the design of the first design and the second design is a hairline design, a line design, a mat design, a hologram and Z or a diffraction grating. It is.
  • the multi-pattern glitter film according to the present invention includes a first glitter film having at least a first relief formation layer and a first reflection layer, at least a second relief formation layer, and a first relief film.
  • a second glittering film having two reflective layers is formed by laminating the first reflective layer surface and the second reflective layer surface via an adhesive layer, and the first relief forming layer and the second relief forming layer. The relief shape is different so that it is formed.
  • the multi-pattern glitter film according to the present invention includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate. And a second glittering film having a second relief forming layer and a second reflecting layer, the first reflecting layer surface and the second reflecting layer surface being laminated via an adhesive layer, and the first relief forming layer. And the relief shapes formed in the second relief forming layer are different from each other.
  • the multi-pattern glitter film according to the present invention according to still another aspect includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate. A second glittering film having a second relief forming layer and a second reflective layer, the first substrate surface and the second substrate surface being bonded via an adhesive layer, the first The relief forming layer and the second relief forming layer are formed in different relief shapes.
  • the multi-pattern glitter film according to the present invention includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate.
  • a second glittering film having a second relief forming layer and a second reflective layer, the first reflective surface and the second substrate surface being bonded via an adhesive layer, and the first relief Formed on the forming layer and the second relief forming layer, the relief shapes are different from each other.
  • the multi-pattern glittering film according to the present invention has a first base material and at least a first relief forming layer and a first reflective layer on one surface of the first base material. And the other surface has at least a second relief forming layer and a second reflective layer, and is formed in the first relief forming layer and the second relief forming layer! It is like that.
  • the multi-pattern glittering film according to the present invention according to still another aspect has a first base material and at least a first relief forming layer and a first reflective layer on one surface of the first base material. Further, at least the second relief forming layer and the second reflecting layer are provided on the first reflecting layer surface, and the relief shapes formed in the first relief forming layer and the second relief forming layer are different. As you can see.
  • the relief shape in which the first relief forming layer and the second relief forming layer are formed has a hairline pattern, a line pattern, a mat pattern, A micro-order relief shape such as a hologram and a Z or diffraction grating.
  • a multi-pattern glittering film according to the present invention according to yet another aspect is such that the first reflective layer and Z or the second reflective layer are a metal layer and Z or a transparent reflective layer.
  • the multi-pattern glitter film according to the present invention according to yet another aspect is the multi-pattern glitter film according to any one of the above, wherein at least the interlayer and the Z or the surface have a substrate
  • the glitter multi-pattern formed product according to the present invention according to another embodiment is provided with a plurality of glitter multi-patterns in at least one part using any one of the above-described multi-design glitter films. That's what it did.
  • the multi-design glittering thread according to the second aspect of the present invention is formed by cutting a multi-design glitter film having at least the first design of glitter and the second design of glitter having a design different from the first design into a narrow width. It is characterized by having become.
  • a multi-design glitter thread includes a first glitter film having at least a first base material, a first relief forming layer, and a first reflective layer, and at least a second base material.
  • a second glittering film having a second relief forming layer and a second reflecting layer, the first reflecting layer surface and the second reflecting layer surface being laminated via an adhesive layer, and the first relief forming layer and A plurality of design glitter films having different relief shapes formed on the second relief forming layer are cut into narrow widths.
  • the multi-pattern glitter thread according to the present invention includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate.
  • a second glittering film having a second relief forming layer and a second reflective layer, the first substrate surface and the second substrate surface being laminated via an adhesive layer, and the first relief forming layer.
  • a plurality of design glitter films having different relief shapes formed in the second relief forming layer are cut into narrow widths.
  • the multi-pattern glitter thread according to the present invention includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate. And a second glittering film having a second relief forming layer and a second reflecting layer, the first reflecting layer surface and the second base material surface being laminated via an adhesive layer, and the first relief forming layer. It is formed on the second relief forming layer !, and the relief shape is different. It is characterized in that the film is cut into narrow widths.
  • a multi-pattern glittering thread according to the present invention has a first base material and at least a first relief forming layer and a first reflective layer on one surface of the first base material. And the other surface has at least a second relief forming layer and a second reflective layer, and the plurality of designs having different relief shapes formed on the first relief forming layer and the second relief forming layer. This is characterized in that the glittering film is cut into a narrow width.
  • the multi-pattern glittering thread according to the present invention according to still another aspect has a first base material and at least a first relief forming layer and a first reflective layer on one surface of the first base material. Further, at least a second relief forming layer and a second reflecting layer are provided on the first reflecting layer surface, and the relief shapes formed in the first relief forming layer and the second relief forming layer are different.
  • the multi-pattern glittering film is cut into narrow widths.
  • the design of the first design and the second design is a hairline design, a line design, a mat design, a hologram and Z or a diffraction grating. It is what you did.
  • the multi-design glittering thread according to the present invention according to yet another aspect is such that the overall thickness is 4 to 40 ⁇ m.
  • a glittering multi-pattern formed product according to the present invention uses the multi-design glittering thread according to any one of the above, and the multi-design glittering thread is used at least on the base paper. It is made to be formed on the surface of one side.
  • the glitter film according to the third invention has a relief forming layer and a metal thin film layer as one set of glitter pattern layers, and has two or more groups of glitter pattern layers via an interlayer primer layer. As described above, this is a feature.
  • the glitter film of the present invention has at least two kinds of glitter patterns.
  • the glitter film of the present invention is such that the glitter pattern is a hairline pattern, a line pattern, a hologram, Z, or a diffraction grating.
  • the glitter film of the present invention according to still another embodiment has at least a first metal thin film layer, a first relief forming layer having a first glitter pattern, an interlayer primer layer, and a second glitter pattern. The relief forming layer and the second metal thin film layer force are formed.
  • the glitter film of the present invention according to another embodiment is such that at least two glitter patterns can be visually recognized from the front side and the back side, respectively.
  • the glittering film of the present invention is such that the glass transition temperature of the interlayer primer layer is 130 ° C or lower.
  • the glitter film of the present invention according to another embodiment has an overall thickness of 5 to 20 ⁇ m.
  • the glitter film of the present invention is one in which a glitter pattern is provided on at least a part using any one of the glitter films described above.
  • a multi-design glittering film having a unique design and high security, and a multi-splitter design having the same can be observed. Things are provided.
  • a multi-design glittering thread having a plurality of glitter designs, and a glitter multi-pattern formation provided with the same.
  • each of the plurality of patterns has a plurality of glittering patterns without causing detachment of the grease, so-called "printing (pattern removal)".
  • a glittering film that is excellent in unity with the transfer material and the paper to be transferred, which has a single material and is resource-saving and has a very thin total thickness, and a glittering multiple-patterned product provided with this Is provided.
  • FIG. 1 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 2 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 3 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 4 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 5 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 6 is a cross-sectional view of a glitter film showing one example of the present invention.
  • [7] A cross-sectional view of a glitter film showing one embodiment of the present invention.
  • FIG. 10 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 13 A cross-sectional view of a glittering film showing one embodiment of the present invention.
  • FIG. 14 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 15 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 16 is a cross-sectional view of a glitter film showing an example of the present invention.
  • ⁇ 17 A cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 19 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 20 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 24 is an explanatory view showing a visual recognition state of the design of the glitter film showing one embodiment of the present invention.
  • ⁇ 25] An explanatory view showing the visual recognition state of the design of the glitter film showing one embodiment of the present invention.
  • ⁇ 26] A plan view and a cross-sectional view of a glitter pattern formation showing one embodiment of the present invention.
  • Multi-pattern glitter film double-side glitter film
  • 317A, 317B, 317C, 317D l to n reflective layers (metal thin film layers)
  • 321B, 321D Interlayer primer layer
  • Figs. 1 to 8 are cross-sectional views of a multi-pattern glitter film showing one embodiment of the present invention.
  • the basic structure of the multi-pattern glitter film 10 of the present invention includes at least the first relief forming layer 15A (having the first relief shape 16A), the Z first reflection layer 17A, and the second reflection layer 17BZ It is sufficient that the two relief forming layers 15B (having the second relief shape 16B) are provided and the first relief shape 16A and the second relief shape 16B are different.
  • the 1st relief shape 16A shows the 1st design
  • the 2nd relief shape 16B shows the 2nd design
  • the glitter design of the 1st design and Z or the 2nd design is not particularly limited as long as it is a glitter, 1 part, The entire surface or a combination of multiple symbols may be used.
  • the relief shape 16 is provided on the surface of the reflective layer 17.
  • the configuration of the first and Z or second glitter patterns is not particularly limited.
  • the first relief forming layer 15A (having the first relief shape 16A) Z the first reflecting layer 1 7AZ adhesive layer 19Z second reflective layer 17BZ second relief forming layer 15B (having second relief shape 16B).
  • the first glittering film 10A (first substrate 11AZ first primer layer 13A (if necessary) Z first relief forming layer 15A (first relief shape 16A Z) first reflective layer 17A) and second glittering film 10B (second reflective layer 17BZ second relief forming layer 15B (having second relief shape 16B) Z second primer layer 13B (if necessary) )
  • a layer structure in which the first reflective layer 17A surface and the second reflective layer 17B surface are laminated with an adhesive layer 19 with the Z second base material 11B) may be used.
  • the first glittering film 10A and the second glittering film 10B may have a layer structure in which the first substrate 11A surface and the second substrate 11B surface are laminated with an adhesive layer 19. ,.
  • the first glittering film 10A (first base material 11AZ first relief forming layer 15A (having the first relief shape 16A) Z first reflecting layer 17A), the second First reflection with glitter film 1 OB (second base material 11BZ second relief forming layer 15B (having second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary))
  • first base material 11AZ first relief forming layer 15A having the first relief shape 16A
  • second First reflection with glitter film 1 OB second base material 11BZ second relief forming layer 15B (having second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary)
  • a layer structure in which the layer 17A surface and the second base material 11B surface are laminated with an adhesive layer 19 may be used.
  • the first relief forming layer 15A (having the first relief shape 16A) on one side of the first base material 11A Z the first reflective layer 17AZ the first protective layer 25A (if necessary) )
  • the second relief forming layer 15B (having the second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary) may be provided on the other surface!
  • FIG. 3 shows printing 27, first protective layer 25A and second protective layer 25B, FIG. 4 shows second protective layer 25B, and FIG. 5 shows first protective layer 25A and second protective layer 25B.
  • the position where the layer on which the printing, protective layer, other substrate, and Z or other layer may be provided may be one or more of the interlayer and Z or the surface. .
  • a first relief forming layer 15A (having a first relief shape 16A) Z first reflective layer 17A is provided on the first base material 11A, and a second second layer is further formed on the surface of the first reflective layer 17A.
  • Relief formation A layer 15B (having the second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary) may be provided.
  • an adhesive label or transfer foil that may be provided with a second adhesive layer 21B and a second support substrate 30B can do.
  • the first base material 11A and the second base material 11B base material 11 together
  • the first relief forming layer 15A and the second relief forming layer 15B (together relief forming layer 15)
  • first reflective layer 17A and second reflective layer 17B (together reflective layer 17)
  • first protective layer 25A and second protective layer 25B (together protective layer 25), adhesive layer 19, 21 B and 23
  • adhesive layer 19, 21 B and 23 may be the same material, forming method and different thickness.
  • the description is omitted, but the same applies to the third relief forming layer 15C, the fourth relief forming layer 15D, the third reflecting layer 17C, and the fourth reflecting layer 17D.
  • polyester resin such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene terephthalate-isophthalate copolymer, or terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer, nylon (product Name) 6, Nylon (trade name) 66, Nylon (trade name) 610, Nylon (trade name) 12, etc.
  • Polyamide resin Polyolefin, Polypropylene, Polybutene or Polymethyl pentene, etc.
  • (Meth) acrylic resins such as cyclic polyolefins such as polynorbornene, burs such as polysalts and burs, poly acrylate, polymeta acrylate, or polymethyl meta acrylate, polyimide, polyamide imide Or Polyer Imido resins such as imide, polyarylate, polysulfone, polyethersulfone, polyphenylene ether, polyphenylene sulfide (PPS), polyaramid, polyetherketone, polyether nitrile, polyetheretherketone, or polyethersulfur Engineered resin such as Fight, polystyrene, high impact polystyrene, AS resin, or styrene-based resin such as ABS resin, polybulu alcohol resin, or ethylene butyl alcohol copolymer Polybula alcohol-based resin such as ethylene tetrafluoroethylene, tetrafluoroethylene, tetrafluoroethylene perfluoroalkyl butyl ether
  • the substrate 11 may be a copolymerized resin mainly composed of these resins, a mixture (including alloy), or a laminate composed of a plurality of layers.
  • the substrate 11 may be a stretched film or an unstretched film, but a film stretched in a uniaxial direction or a biaxial direction is preferable for the purpose of improving the strength.
  • the substrate 11 is used as a film, sheet, or board formed of at least one layer of these resins.
  • the thickness of the substrate 11 is not particularly limited, and may be appropriately selected according to the usage.
  • polyethylene terephthalate and polyethylene naphthalate having good heat resistance and mechanical strength are suitable.
  • a material such as polypropylene or polyvinyl chloride is preferable.
  • a paper base material can also be used.
  • the base material 11 has a primer layer 13 or a corona discharge treatment, a plasma treatment, an ozone gas treatment, a flame treatment, a pre-treatment, if necessary, in order to improve the adhesion between the layers on the surface on which the layer is formed. Easy adhesion treatment such as heat treatment, dust removal treatment or alkali treatment may be performed.
  • the primer layer 13 includes, for example, a polyurethane-based resin, a polyester-based resin, a polyamide-based resin, an epoxy-based resin, a phenol-based resin, a polysalt-bulb-based resin, and a poly-acetic acid-based resin.
  • One or more of the above-mentioned rosins or monomers, oligomers, or prepolymers thereof are the main components. If necessary, for example, various stabilizers, fillers, reaction initiators, curing agents, One or a plurality of additives such as a cross-linking agent can be optionally added, or a main component and a curing agent can be combined to use either a one-component curable type or a two-component curable type. These waxes are appropriately dissolved or dispersed in a solvent, and sufficiently kneaded as necessary to prepare a coating agent composition (ink, coating solution), which is applied to the substrate 11 by a known coating method.
  • a coating agent composition ink, coating solution
  • the primer layer 13 is made to react by the drying force or the aging treatment after drying or drying.
  • the primer layer 13 has a thickness of about 0.05 to 10 m, preferably 0.1 to 5 ⁇ m, and more preferably 0.2 to 1 ⁇ m.
  • the coating method include coating methods such as a roll coating method, a gravure coating method, a spray coating method, an air knife coating method, a kiss coating method, and others.
  • the primer layer 13A and the primer layer 13B may be the same material and thickness, or may be different.
  • the relief shape 16 is shaped (also referred to as replication) on the relief forming layer 15 surface.
  • shaping method “hot pressing method” and “EC method” called by those skilled in the art can be applied.
  • the materials used depend on the shaping method, and will be described separately.
  • a stamper metal plate or resin plate
  • thermocompression-bonded on the surface of the relief forming layer 15 thermocompression-bonded on the surface of the relief forming layer 15 (so-called “so-called”).
  • This is a method in which the stamper is peeled after embossing) and shaping the relief to the relief forming layer 15 and replicating.
  • the heating temperature and pressure are adjusted as appropriate.
  • the material of the relief forming layer 15 used for the hot pressing method is thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Polyester (meth) acrylate, urea Cures thermosetting resins such as tan (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate, melamine (meth) acrylate, triazine acrylate
  • thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Polyester (meth) acrylate, urea Cures thermosetting resins such as tan (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate,
  • thermosetting resins excellent in durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams.
  • Sarakuko is preferably a material having excellent heat resistance and pressure resistance. That is, in the inventions of claims 3 to 6, a relief forming material that can withstand heat and pressure when the first glittering film and the second glittering film are bonded together is preferable.
  • the second relief forming layer is formed on the opposite surface of 11A of the first base material or on the same surface.
  • the material of the relief forming layer is preferably a material that can withstand the heat and pressure when the relief is formed on the second relief forming layer.
  • ionizing radiation curable resins having such characteristics include those obtained by curing ionizing radiation curable resins such as epoxy-modified acrylate resins, urethane-modified acrylate resins, and acrylic-modified polyesters. Preferably, it is urethane-modified attalylate resin.
  • a preferable one of the relief forming layer 15 is a cured product of an uncured ionizing radiation curable resin composition mainly composed of a urethane-modified talyl resin represented by the general formula (a).
  • an uncured ionizing radiation curable resin composition mainly composed of a urethane-modified talyl resin represented by the general formula (a).
  • the photocurable resin composition disclosed by the present applicant in Japanese Patent Application Laid-Open No. 2000-273129 can be applied, and the photocurable resin composition A described in the above specification can be applied to the present specification. It is also used in the examples in the manual and is described as “ionizing radiation curable resin composition A”.
  • 1 2 represents a hydrocarbon group having 1 to 20 carbon atoms.
  • X and Y represent a linear or branched alkylene group
  • Z represents a group for modifying a urethane-modified acryl resin, and preferably represents a group having a bulky cyclic structure.
  • Another preferred relief forming layer 15 is a reaction product of an isocyanate compound having a melting point of 40 ° C. or higher and a (meth) acrylic compound capable of reacting with an isocyanate group, and has a soft point. This is a resin containing 40 ° C or higher.
  • the isocyanate compound has an isocyanate group bonded to a non-aromatic hydrocarbon ring, a trimer of isophorone diisocyanate, or an isophorone diisocyanate and an active hydrogen-containing compound. It is a reaction product. Furthermore, (meth) acrylic compound strength (meth) acrylic acid, (meth) acrylate having a hydroxyl group Preferably there is.
  • the photocurable resin disclosed in Japanese Patent Application Laid-Open No. 2001-329031 can be applied, and in the examples of this specification, it is expressed as “ionizing radiation curable resin composition B”.
  • an ionizing radiation curable resin of urethane-modified acrylic resin for example, an ionizing radiation curable resin of urethane-modified acrylic resin, a photopolymerization initiator, a photosensitizer, a photosensitizer can be used.
  • the solvent is not used, but the non-solvent relief forming layer 15 composition (ink) is used.
  • the relief forming layer 15 composition (ink) may be applied by, for example, a mouth coat method, a gravure coat method, other known coating methods or printing methods, and dried if necessary.
  • the thickness of the relief forming layer 15 is usually about 0.1 to about LO / zm, preferably 0.2 to 5 / ⁇ ⁇ , and more preferably 0.5 to 2 / ⁇ ⁇ . If it is less than 0.5 m, the brightness (brightness) is remarkably reduced, and if it exceeds 2 m, the brightness is sufficient. This is disadvantageous in terms of cost.
  • the relief shape 16 is a concavo-convex shape and is not particularly limited, but preferably has a fine concavo-convex shape and expresses functions such as light diffusion, light scattering, light reflection, and light diffraction, such as Fourier transform and A lenticular lens, a light diffraction pattern, and a moth eye are formed. Further, although it does not have a light diffraction function, it may be a hairline pattern, a mat pattern, a line pattern, an interference pattern or the like that expresses a unique glitter.
  • a hologram or diffraction grating in which interference fringes due to the interference of light between the object light and the reference light are recorded as a concavo-convex pattern can be applied.
  • Holograms include laser reproduction holograms such as Fresnel holograms, white light reproduction holograms such as rainbow holograms, color holograms utilizing these principles, computer-generated holograms (CGH), holographic diffraction gratings, etc. There is.
  • the design described in this specification refers to a design formed by combining one or more of these various concavo-convex patterns, for example, text patterns such as "abc" and "Security".
  • the above-mentioned holograms and diffraction gratings are created by combining patterns such as geometric patterns called screens, snakes and polka dots, and painting patterns created by simulating flowers and birds. This is a picture visualized by a combination of powerful diffraction patterns.
  • “multiple symbols” refers to symbols that cannot be formed by using these symbols once and once, and usually refers to symbols that are created using two or more symbols multiple times.
  • Examples of the diffraction grating include a holographic diffraction grating using a hologram recording means.
  • a diffraction grating is mechanically created using an electron beam drawing apparatus or the like, so that any diffraction can be performed based on calculation.
  • a diffraction grating from which light can be obtained can also be mentioned.
  • a mechanical cutting method may be used.
  • These holograms and Z or diffraction gratings may be recorded in a single or multiple manner, or in combination.
  • These masters can be prepared by known materials and methods. Usually, a laser beam interference method using a glass plate coated with a photosensitive material, an electron beam drawing method on a glass plate coated with an electron beam resist material, Machine cutting method can be applied.
  • the relief shape 16 is shaped (also referred to as replication) on the surface of the relief forming layer 15.
  • a stamper metal plate or resin plate
  • emboss pressure-bonded
  • the stamper is peeled off.
  • the relief is duplicated by irradiating ionizing radiation during embossing and then removing the stamper.
  • Commercial duplication can be carried out in a long form, allowing continuous duplication work.
  • the relief can be replicated more commercially by using a cylindrical stamper that is manufactured by attaching a stamper to the cylinder or by cutting a relief directly into the cylinder.
  • the ionizing radiation curable resin When ionizing radiation curable resin is used as the relief forming layer 15, the ionizing radiation curable resin is hardened by irradiating ionizing radiation during embossing or after embossing with a stamper. Make it. When the ionizing radiation curable resin is cured (reacted) by irradiation with ionizing radiation after the relief is formed, the ionizing radiation curable resin (relief forming layer 15) is formed. Ionizing radiation may be classified according to the quantum energy of electromagnetic waves, but in this specification, all ultraviolet rays (UV—A, UV—B, UV—C), visible light, gamma rays, X-rays, It is defined as including an electron beam.
  • UV—A, UV—B, UV—C ultraviolet rays
  • visible light gamma rays
  • X-rays X-rays
  • UV ultraviolet rays
  • visible rays visible rays
  • gamma rays X-rays
  • electron rays having a wavelength of 300 to 400 nm are most suitable.
  • An ionizing radiation curable resin that is cured by ionizing radiation adds a photopolymerization initiator and Z or a photopolymerization accelerator in the case of ultraviolet curing, and does not add it in the case of high energy electron beam curing. It can also be cured with thermal energy if an appropriate catalyst is present.
  • a thermosetting resin is used as the relief forming layer 15, it may be cured by aging in a temperature and humidity environment according to the curing conditions of the thermosetting resin to be used.
  • the EC method is a so-called method called “etrusion coating (EC)” by those skilled in the art.
  • EC etrusion coating
  • the extruded resin is heated and melted, expanded and stretched in the required width direction with a T-die, and extruded into a curtain shape.
  • the molten resin layer is allowed to flow down onto the base material 11 and is sandwiched between a rubber roll and a cooled metal roll, whereby the formation of the extruded resin layer, the attachment to the base material 11 and the lamination are performed simultaneously.
  • the relief shape 16 is transferred to the surface of the molten resin layer by sticking a stamper (metal plate or resin plate) having a relief formed on the surface of the metal roll.
  • the extruded resin layer is cooled and the relief shape 16 is fixed, and a relief can be formed on the surface.
  • the extruded resin layer at this time becomes the relief forming layer 15.
  • the relief shape and stamper are the same as in the hot press method.
  • Examples of the relief forming layer 15 (extruded resin layer) of the EC method include low density polyethylene (LDPE), medium density polyethylene (MDPE), high density polyethylene (HDPE), and linear (linear) low density polyethylene.
  • LLDPE low density polyethylene
  • MDPE medium density polyethylene
  • HDPE high density polyethylene
  • LLDPE linear low density polyethylene
  • PP polypropylene
  • EVA ethylene acetate copolymer
  • EAA ethylene acrylic acid copolymer
  • EAA ethylene acrylate copolymer
  • EAA ethylene-methacrylic acid copolymer Coalescence
  • EMMA Ethylene-methyl methacrylate copolymer
  • EP ethylene-propylene copolymer
  • cyclic polyolefins such as polymethylpentene, polybutene, and polynorbornene
  • polyolefin resins such as polyethylene or polypropylene are treated with acrylic acid, methacrylic acid.
  • Acid-modified polyolefin resins modified with unsaturated carboxylic acids such as acid, maleic acid, maleic anhydride, fumaric acid, and itaconic acid, and polyvinyl acetate-based resins can be used. These resins can be used singly or in combination, and if necessary, additives may be added appropriately.
  • the thickness of the relief forming layer 15 (extruded resin layer) of the EC method is usually about 5 to 300 / ⁇ ⁇ , preferably 10 to L00m. When the thickness is less than 10 m, the formability is reduced, and when the thickness is more than 100 m, the material is wasted.
  • a paper base material can be used in addition to the synthetic resin film.
  • a paper substrate for example, a paper substrate such as a strong sized bleached or unbleached paper, a pure white roll paper, kraft paper, paperboard, processed paper, or the like can be used. . Also, it is possible to use a paper substrate in which various resin films or sheets are bonded.
  • Reflective layer 17A and reflective layer 17B enhance the reflection and Z or diffraction effect of the relief by providing reflective layer 17 on the relief surface of relief forming layer 15 with a predetermined relief structure. Therefore, it is not particularly limited as long as it is higher than the reflectance of the relief forming layer 15, and for example, a metal or a transparent metal compound having a difference in refractive index can be applied.
  • the reflective layer 17 can be formed on the relief forming layer 15 before providing the relief structure. That is, a relief can be formed after forming the reflective layer 17 by appropriately selecting the material and stamper of each layer.
  • the metal used for the reflective layer 17 is a metal element thin film that has a metallic luster and reflects light, such as Cr, Ni, Ag, Au, Al, and its oxides and sulfides.
  • a thin film of nitride or the like may be used alone or in combination.
  • the above light-reflective metal thin films are all formed to a thickness of about 10 to 2000 nm, preferably 20 to: a vacuum such as a vacuum deposition method, a sputtering method, or an ion plating method so as to have a thickness of LOOOnm.
  • the power obtained by the thin film method It can also be formed by a key. If the thickness of the reflective layer 17 is less than this range, the light is transmitted to some extent and the effect is reduced, and if it is more than that, the reflective effect is not changed, so that the cost is useless.
  • the reflective layer 17 a metal compound having an almost colorless and transparent hue and an optical refractive index different from that of the relief forming layer is used, so that a hologram such as a hologram can be used even though there is no metallic luster. Since the glitter is visible, a glitter film such as a transparent hologram can be produced.
  • Examples of the transparent metal or metal compound include a thin film having a higher refractive index than that of the relief forming layer 15 and a thin film having a lower refractive index.
  • Examples of the former include ZnS, TiO, Al
  • examples of the latter include LiF, MgF, A1F.
  • 2 3 2 3 2 3 2 2 3 Preferably, it is a metal oxide or nitride, specifically, Be, Mg, Ca, Cr, Mn, Cu, Ag, Al, Sn, In, Te, Fe, Co, Zn, Ge, Pb, Cd Bi, Se, Ga, Rb, Sb, Pb, Ni, Sr, Ba, La, Ce, Au, etc. .
  • general light-reflective metal thin films such as aluminum can be used with transparency when the thickness force is S200A or less.
  • the transparent metal compound is formed on the relief surface of the relief forming layer 15 in the same manner as the metal thin film by vapor deposition, sputtering, ion plating, CVD so as to have a thickness of about 10 to 2000 nm, preferably 20 to LOOOnm.
  • a vacuum thin film method may be used.
  • the refractive index of the adhesive layer 19, 21B or the protective layer 25 material and the relief forming layer 15 material may be sufficiently different from the relief forming layer 15 which may use a transparent synthetic resin having a different light refractive index.
  • the adhesive layers 19 and 21B and the protective layer 25 can also serve as the reflective layer 17.
  • the glitter films 10A and 10B are obtained.
  • the multi-pattern glittering film 10 of the present invention having a plurality of designs is obtained by repeating the steps of producing the relief forming layer 15, the relief shape 16 and the reflective layer 17 according to the layer configuration.
  • a multi-design glitter film having a plurality of designs is produced by repeating the process of producing the relief forming layer 15, the relief shape 16 and the reflective layer 17 on one base material. In this case, it is necessary not to destroy the relief shape 16 produced earlier in the step of producing the relief shape 16 in the relief forming layer later.
  • the glass transition temperature of the first relief forming material formed earlier is Tgl (u)
  • the glass transition temperature after hardening of this material is Tgl (h)
  • the second relief formed later is formed.
  • the glass transition temperature of the material from which the layer is made is Tg2 (u)
  • the glass transition temperature of this material after curing is Tg2 (h)
  • the relief of the second relief forming layer is added to the first relief forming layer. It is preferable that the resin is cured before being molded and has a relationship of Tgl (h)> Tg2 (u).
  • Tg4 (u) Tg4
  • the temperature at which the relief is formed in the second relief forming layer is sufficiently lowered, and the resin is converted to Tg2 ( Curing up to h) is preferable because the durability of the product can be sufficiently increased.
  • a relief can be produced.
  • ionizing radiation curable resin is particularly preferable as the relief forming material. The same applies when having multiple designs of three or more layers.
  • the glass transition temperature described above is the temperature at which the loss tangent (tan ⁇ ) in the dynamic viscoelasticity measurement has the maximum value, as the glass transition temperature of the resin.
  • the measurement method of viscoelasticity is ARES manufactured by Rheometrics as a measuring instrument. The measurement conditions are parallel plate 10 ⁇ ⁇ , strain 1%, amplitude 1 ⁇ , heating rate 2 ° CZmin. The temperature is raised from 30 ° C to 200 ° C.
  • the storage elastic modulus G ′ is an elastic component, which is generated by the generation of a structure such as a coil vibration or an aggregate structure in a high molecule
  • the loss elastic modulus G g is a viscous component, which is a static component. It is equivalent to shear stress.
  • tan ⁇ is determined by G "/ G 'and is an index of how much energy is absorbed when the material is deformed.
  • the two glitter films 1OA and 10B, the reflective layer 17A and the reflective layer 17B surface, the base material 11A and the base material 11B surface, or the reflective layer 17A And the substrate 11B surface may be laminated.
  • the laminating method is not particularly limited as long as it can be bonded.
  • a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method can be applied.
  • the 19 materials may be appropriately selected according to the bonding method.
  • the hot pressing molding method and the EC molding method may be combined, for example, first, on the first base material 11A
  • the first relief forming layer 15A is molded by the thermo-pressure molding method, and the first reflective layer 17A is not formed or formed, and the first substrate 11A surface or the first reflective layer 17A surface is EC molded. Then mold the second relief forming layer 15B.
  • the first glitter film and the second glitter film are bonded together, and then the substrate 11A and the substrate 1 IB are peeled off, respectively. It is possible to make it.
  • a film having the layer structure shown in FIG. 1 can be produced. If the adhesive strength between the substrate and the relief forming layer is too strong, By using a primer layer material that lowers the adhesive strength instead of the primer layer used to increase the adhesive strength, after bonding the first and second glitter films, By peeling, a film having the layer structure shown in FIG. 1 can be produced.
  • a protective layer, a colored layer, and a layer may be provided between the layers and Z or the surface of the layer structure, as long as the glitter pattern can be observed by some means.
  • Magnetic printing layers and other layers such as Z or resin layers, and Z or printing, primer layers, etc. may be provided.
  • thermoplastic resin such as acryl resin, unsaturated polyester, melamine, epoxy urethane (meth) atari Curing ultraviolet curable resin such as a composition obtained by curing a thermosetting resin such as a rate, a composition in which an unsaturated ethylene monomer and an unsaturated ethylene oligomer are appropriately mixed, and a sensitizer added.
  • a mixture of the thermoplastic resin and the thermosetting resin, or a thermoformable substance having a radically polymerizable unsaturated group can be used.
  • thermosetting resins with excellent durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams are preferred!
  • Another base material layer may be further provided on the multi-pattern glittering film of the present invention obtained as described above.
  • the metal surface can be protected by providing a support substrate 30B on the surface of the reflective layer 17B via an adhesive layer 21B.
  • the materials described for the substrate 11 are used.
  • These synthetic resin films and paper base materials may be laminated by a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method. Further, by using a support substrate that has been subjected to a release treatment as the support substrate, it is possible to obtain an adhesive label that is excellent in design and security.
  • the above-described conventionally known laminating method is used.
  • the materials may be selected as appropriate.
  • an adhesive that is cured by ionizing radiation such as heat or ultraviolet rays' electron beam can be applied.
  • Thermosetting adhesives include two- component curable urethane adhesives, polyester urethane adhesives, polyether urethane adhesives, acrylic adhesives, polyester adhesives, polyamide adhesives, and polyvinyl acetate adhesives.
  • Adhesives, epoxy adhesives, rubber adhesives, etc. can be applied. Among these, a two-component curable urethane adhesive is preferable.
  • an adhesive dispersed or dissolved in a solvent When an adhesive dispersed or dissolved in a solvent is applied and dried, two glitter films are stacked and laminated, and then the adhesive is cured by aging at 30 to 120 ° C for several hours to several days. Good.
  • An adhesive that can be cured at the lowest possible temperature so as not to destroy the already formed relief shape preferably an adhesive that can be cured at a temperature lower than the glass transition temperature Tg (h) of the shaped relief forming layer material, More preferably, an adhesive that can be cured at a lower temperature than Tg (u) is particularly preferably used.
  • the thickness of the adhesive layer is about 0.1 to 20; about ⁇ ⁇ (dry state), preferably 1.0 to 5. O / zm.
  • the glitter multi-pattern formed article 100 of the present invention is obtained by applying the multi-pattern glitter film 10 of the present invention to other supporting bases by various sticking methods.
  • the sticking method is not particularly limited.
  • a method using an adhesive or a pressure-sensitive adhesive, a thermocompression bonding method, a paper making method using paper making, a label or a transfer foil may be used.
  • the glitter multi-pattern formation has at least the first and second glitter designs having different designs, and has a unique design and security.
  • FIG. 8 shows an example of the glitter multi-patterned product of the present invention.
  • the first glitter film 10A (first substrate 11AZ first primer layer 13A (if necessary) Z first release Forming layer 15A (having first relief shape 16A) Z first reflecting layer 17A) and second glittering film 10B (second reflecting layer 17BZ second relief forming layer 15B (having second relief shape 16B) Z 2nd primer layer 13B (optional) Z 2nd base material 11B), multi-pattern luminosity consisting of a layer structure in which first reflective layer 17A surface and second reflective layer 17B surface are laminated with adhesive layer 19
  • the adhesive film 10 and the base paper 101 can be attached so that the second base material 11B of the multi-pattern glitter film 10 and the base paper 101 are in contact with each other through the adhesive layer 23.
  • the illustrated one uses a base paper as the supporting substrate, but is not limited to this, and is not limited to a synthetic resin film, card, glass, or the like. You can change it.
  • FIGS. 9 to 15 are cross-sectional views of a multi-design glitter thread showing one embodiment of the second invention
  • FIG. 16 is a diagram of a glitter multi-pattern formation showing one embodiment of the invention. It is a top view and AA sectional drawing.
  • the basic structure of the multi-pattern glittering thread 10 of the present invention includes at least the first relief forming layer 15A (having the first relief shape 16A), the Z first reflecting layer 17A, and the second reflecting layer 17BZ It is sufficient that the two relief forming layers 15B (having the second relief shape 16B) are provided and the first relief shape 16A and the second relief shape 16B are different.
  • the 1st relief shape 16A shows the 1st design
  • the 2nd relief shape 16B shows the 2nd design
  • the glitter design of the 1st design and Z or the 2nd design is not particularly limited as long as it is a glitter, 1 part, The entire surface or a combination of multiple symbols may be used.
  • the relief shape is provided on the surface of the reflective layer 17.
  • the force mainly described for two glitter designs.
  • the two or more patterns include, for example, the third relief forming layer 15CZ third reflecting layer 17CZ first relief forming layer 15 AZ first reflecting layer 17AZ adhesive layer 19Z second reflecting layer 17B Z second relief forming layer 15B, 3rd relief forming layer 15CZ 3rd reflective layer 17CZ 1st relief forming layer 15AZ 1st reflective layer 17AZ adhesive layer 19Z 2nd reflective layer 17BZ 2nd relief forming layer 15BZ 4th reflective layer 17DZ 4th relief forming layer 15D layer
  • the third reflective layer 17C and the fourth reflective layer 17D are transparent reflective layers, it is possible to obtain a glittering thread having a rich design. Also, it should be intentionally made translucent and opaque to improve security.
  • the first and Z or the second layer structure is not particularly limited.
  • the first relief forming layer 15A (having the first relief shape 16A) Z the first reflective layer 17AZ adhesion Layer 19Z is a layer structure of second reflective layer 17BZ second relief forming layer 15B (having second relief shape 16B).
  • the first glittering film 10A (first base material 11AZ first primer layer 13A (if necessary) Z first relief forming layer 15A (first relief shape 16A Z) first reflective layer 17A) and second glittering film 10B (second reflective layer 17BZ second relief forming layer 15B (having second relief shape 16B) Z second primer layer 13B (if necessary) )
  • first reflective layer 17A surface and the second reflective layer 17B surface are laminated with an adhesive layer 19 with the Z second base material 11B) is preferable.
  • the substrate may be removed, the first substrate 11AZ first relief forming layer 15A (having the first relief shape 16A) Z first reflective layer 17AZ adhesive layer 19Z second
  • the layer structure of the reflective layer 17B Z second relief forming layer 15B (having the second relief shape 16B) may be used.
  • the structure shown in FIG. 1 is obtained.
  • the substrate can be removed by removing one side of the paper, or removing the other after the paper making. Instead of paper making, it may be appropriately bonded by using an adhesive or the like.
  • the first glittering film 10A and the second glittering film 10B may have a layer structure in which the first substrate 11A surface and the second substrate 11B surface are laminated with an adhesive layer 19. ,.
  • the first glittering film 10A (first base material 11AZ first relief forming layer 15A (having the first relief shape 16A) Z first reflecting layer 17A), the second First reflection with glitter film 1 OB (second base material 11BZ second relief forming layer 15B (having second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary))
  • first glittering film 10A first base material 11AZ first relief forming layer 15A (having the first relief shape 16A) Z first reflecting layer 17A
  • the second First reflection with glitter film 1 OB (second base material 11BZ second relief forming layer 15B (having second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary))
  • a layer structure in which the layer 17A surface and the second base material 11B surface are laminated with an adhesive layer 19 may be used.
  • the first relief forming layer 15A (having the first relief shape 16A) on one side of the first base material 11A Z the first reflective layer 17AZ the first protective layer 25A (if necessary) And the second relief forming layer 15B and the second relief shape 16B are provided on the other surface.)
  • a Z second reflective layer 17 BZ second protective layer 25B (if necessary) may be provided.
  • FIG. 3 shows printing 27, first protective layer 25A, second protective layer 25B, and FIG. 4 shows second protective layer 2 5B and FIG. 5 illustrate the first protective layer 25A and the second protective layer 25B, but the printing, protective layer, other base material, and Z or other layers may be provided.
  • the location of the can be one or more of the interlayer and Z or surface.
  • a first relief forming layer 15A (having a first relief shape 16A) Z first reflective layer 17A is provided on the first base material 11A, and the first reflective layer 17A surface is further provided with a first relief layer 17A.
  • a two-relief layer 15B (having a second relief shape 16B) Z a second reflective layer 17BZ a second protective layer 25B (if necessary) may be provided.
  • an adhesive layer 21B can be provided and the second support base material 30B can be laminated.
  • the second support base material acts as a protective layer, and the durability of the reflective layer can be further improved.
  • the first base material 11A and the second base material 11B base material 11 together
  • the first relief forming layer 15A and the second relief forming layer 15B (together relief forming layer 15)
  • first reflective layer 17A and second reflective layer 17B (together reflective layer 17)
  • first protective layer 25A and second protective layer 25B (together protective layer 25), adhesive layer 19, 21 B
  • the same is applied to the third relief forming layer 15C, the fourth relief forming layer 15D, the third reflecting layer 17C, and the fourth reflecting layer 17D that are not described.
  • polyester resin such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene terephthalate-isophthalate copolymer, or terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer, nylon (product Name) 6, Nylon (trade name) 66, Nylon (trade name) 610, Nylon (trade name) 12, etc.
  • Polyamide resin Polyolefin, Polypropylene, Polybutene or Polymethyl pentene, etc.
  • cyclic polyolefin resin such as polynorbornene, poly salt (Meth) acrylic resin such as bulle resin, polyacrylate, polymetaacrylate, or polymethylmetaacrylate, polyimide resin such as polyimide, polyamideimide, or polyetherimide, polyarylate, Engineered ring resins such as polysulfone, polyethersulfone, polyphenylene ether, polyphenylene sulfide (PPS), polyaramid, polyetherketone, polyether nitrile, polyetheretherketone, or polyethersulfite, polystyrene, high Polystyrene alcohol such as impact polystyrene, AS resin, or ABS resin, polybulal alcohol resin, or polybutyl alcohol copolymer such as ethylene polyalcohol copolymer, ethylene tetrafluoroethylene copolymer , Ethylene trifluoride, tetrafluoroethylene Chemical Tylene Perfluoroalkyl buty
  • the substrate 11 may be a copolymerized resin containing these resins as a main component, a mixture (including alloy), or a laminate composed of a plurality of layers.
  • the substrate 11 may be a stretched film or an unstretched film, but a film stretched in a uniaxial direction or a biaxial direction is preferable for the purpose of improving the strength.
  • the substrate 11 is used as a film, sheet, or board formed of at least one layer of these resins.
  • the total thickness of the multi-pattern glittering thread 10 of the present invention is cut into a thin width and further cut into a paper base material. It is necessary to make it thin, and it is about 4 to 40 ⁇ m, preferably 8 to 30 ⁇ m, more preferably 10 to 24 ⁇ m. If it is less than 4 ⁇ m, the mechanical strength is insufficient, threads are cut during cutting and paper making, and the yield and productivity are low. At 40 / zm or more, the papermaking machine has good suitability for paper making.Since paper is uneven, the paper base is easily peeled off, and there is no sense of unity as paper. There is a drawback that it is easy to forge, such as attaching another glittering material to another paper.
  • the thickness of the base material 11 Most of the total thickness of the multi-pattern glitter thread 10 is the thickness of the base material 11, and the thicknesses of the first base material 11A and the second base material 11B may be the same or different. Although the thickness may be sufficient, the same thickness is preferable from the viewpoint of reducing curling when laminated.
  • the thickness of the single base material 11 must be extremely thin.
  • the thickness of the substrate 11 is about 2 to 20 / ⁇ ⁇ , preferably 4 to 15 / ⁇ ⁇ , and more preferably 5 to 12 m.
  • Polyethylene terephthalate and polyethylene naphthalate are suitable because they are thin but have good mechanical strength and heat resistance.
  • the base material 11 has a primer layer 13 or a corona discharge treatment, a plasma treatment, an ozone gas treatment, a flame treatment, a pre-treatment, if necessary, in order to improve the adhesion between the layers on the surface on which the layer is formed. Easy adhesion treatment such as heat treatment, dust removal treatment or alkali treatment may be performed.
  • the primer layer 13 includes, for example, a polyurethane-based resin, a polyester-based resin, a polyamide-based resin, an epoxy-based resin, a phenol-based resin, a polysalt-bulb-based resin, and a poly-acetic acid-based resin.
  • the main component is one or more of the above-mentioned rosins or monomers, oligomers, or prepolymers thereof. If necessary, for example, various stabilizers, fillers, reaction initiators, curing agents, One or a plurality of additives such as a cross-linking agent can be arbitrarily added, or a main component and a curing agent can be combined to use either a one-component curable type or a two-component curable type. These waxes are appropriately dissolved or dispersed in a solvent, and kneaded thoroughly as necessary to prepare a coating agent composition (ink, coating solution), which is applied to the substrate 11 by a known coating method.
  • a coating agent composition (ink, coating solution), which is applied to the substrate 11 by a known coating method.
  • the primer layer 13 is obtained by reacting with a drying force, aging treatment after drying or drying.
  • the primer layer 13 has a thickness of about 0.05 to 10 m, preferably 0.1 to 5 / ⁇ ⁇ , and more preferably 0.2 to m.
  • the coating method include coating methods such as a roll coating method, a gravure coating method, a spray coating method, an air knife coating method, a kiss coating method, and others.
  • Primer layer 13A and primer layer 13 B may be the same material and thickness, or may be different.
  • the relief shape 16 is shaped (also referred to as replication) on the relief forming layer 15 surface.
  • a “hot pressing method” called by those skilled in the art can be applied.
  • a stano metal plate or resin plate
  • embossing the surface of the relief forming layer 15
  • the relief is shaped into the relief forming layer 15 and replicated, and then the stamper is peeled off.
  • the material of the relief forming layer 15 used for the hot pressing method is thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, poly (meth) acrylate, melamine (meth) acrylate, triazine acrylate
  • thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, poly (meth) acrylate, melamine (meth) acrylate, triazine acrylate
  • thermosetting resins excellent in durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams.
  • Sarakuko is preferably a material having excellent heat resistance and pressure resistance. That is, in the inventions of claims 14 to 16, a relief forming material that can withstand heat and pressure when the first glittering film and the second glittering film are bonded together is preferable. In the inventions of claims 17 to 18, after the first relief forming layer is formed, the second relief forming layer is further formed on the opposite surface or the same surface of 11A of the first base material.
  • the material of the layer is preferably a material that can withstand the heat and pressure when the relief is formed on the second relief forming layer.
  • the ionizing radiation curable resin having such characteristics for example, those obtained by curing an ionizing radiation curable resin such as epoxy-modified acrylate resin, urethane-modified acrylate resin, and acrylic-modified polyester can be applied.
  • it is urethane-modified attalylate resin.
  • the relief forming layer 15 is a urethane-modified attali represented by the general formula (a).
  • This is a cured product obtained by curing an uncured ionizing radiation curable resin composition mainly composed of a ruby resin.
  • the photocurable resin composition disclosed by the present applicant in Japanese Patent Application Laid-Open No. 2000-273129 can be applied, and the photocurable resin composition A described in the above specification can be applied to the present specification. Used in the examples in the certificate, and is labeled as “ionizing radiation curable resin composition A”
  • R's each independently represent a hydrogen atom or a methyl group
  • 1 2 represents a hydrocarbon group having 1 to 20 carbon atoms.
  • X and Y represent a linear or branched alkylene group
  • Z represents a group for modifying a urethane-modified acryl resin, and preferably represents a group having a bulky cyclic structure.
  • Another preferred relief forming layer 15 is a reaction product of an isocyanate compound having a melting point of 40 ° C. or higher and a (meth) acrylic compound capable of reacting with an isocyanate group, and has a soft point. This is a resin containing 40 ° C or higher.
  • a reaction between an isocyanate compound having a melting point of 40 ° C. or higher and a (meth) acrylic compound having a (meth) atallyloyl group and capable of reacting with an isocyanate group A product that has a soft melting point of 40 ° C or higher, (2) an isocyanate compound having a melting point of 40 ° C or higher, a (meth) atallyloyl group, and an isocyanate group Can react with (meta)
  • An ionizing radiation curable product containing a reaction product of an acrylic compound and a compound that does not have a (meth) attalyloyl group and can react with an isocyanate group and has a soft spot of 40 ° C or higher.
  • the isocyanate compound has an isocyanate group bonded to a non-aromatic hydrocarbon ring, a trimer of isophorone diisocyanate, or an isophorone diisocyanate and an active hydrogen-containing compound. It is a reaction product, and (meth) acrylic compound strength (meth) acrylic acid and (meth) acrylate having a hydroxyl group are preferred.
  • the photocurable resin disclosed in Japanese Patent Application Laid-Open No. 2001-329031 can be applied, and in the examples of this specification, it is expressed as “ionizing radiation curable resin composition B”.
  • an ionizing radiation curable resin of urethane-modified acrylic resin for example, an ionizing radiation curable resin of urethane-modified acrylic resin, a photopolymerization initiator, a photosensitizer, a photosensitizer can be used.
  • the solvent is not used, but the non-solvent relief forming layer 15 composition (ink) is used.
  • the relief forming layer 15 composition (ink) may be applied by, for example, a roll coating method, a gravure coating method, other known coating methods or printing methods, and dried as necessary.
  • the thickness of the relief forming layer 15 is usually about 0.1 to about LO / zm, preferably 0.2 to 5 / ⁇ ⁇ , and more preferably 0.5 to 2 / ⁇ ⁇ . If it is less than 0.5 m, the brightness (brightness) is remarkably reduced, and if it exceeds 2 m, the brightness is sufficient. This is disadvantageous in terms of cost.
  • the relief shape 16 is a concavo-convex shape and is not particularly limited, but preferably has a fine concavo-convex shape and expresses functions such as light diffusion, light scattering, light reflection, and light diffraction, such as Fourier transform and A lenticular lens, a light diffraction pattern, and a moth eye are formed. Further, although it does not have a light diffraction function, it may be a hairline pattern, a mat pattern, a line pattern, an interference pattern or the like that expresses a unique glitter.
  • Holograms include laser reproduction holograms such as Fresnel holograms and white light reproduction holograms such as rainbow holograms, color holograms utilizing these principles, computer-generated holograms (CGH), holographic diffraction gratings, etc. There is.
  • the pattern described in this specification refers to a pattern formed by combining one or more of these various concavo-convex patterns.
  • text patterns such as "abc” and "Security” Patterns formed from combinations of geometric patterns called patterns, polka dots, and painting patterns created by simulating flowers and birds, etc.
  • patterns polka dots
  • multiple symbols refers to symbols that cannot be formed by using these symbols once and once, and usually refers to symbols that are created using two or more symbols multiple times.
  • the present invention can also be used when both the front and back sides can observe “Securit y ” by bonding the vapor-deposited surfaces of the glitter film with the design of “Security” observed from the substrate surface.
  • This is a multi-designed glitter thread.
  • Examples of the diffraction grating include a holographic diffraction grating using a hologram recording means.
  • a diffraction grating is mechanically created by using an electron beam drawing apparatus or the like, so that arbitrary diffraction can be performed based on calculation.
  • a diffraction grating from which light can be obtained can also be mentioned.
  • a mechanical cutting method may be used.
  • These holograms and Z or diffraction gratings may be recorded in a single or multiple manner, or in combination.
  • These masters can be prepared by known materials and methods. Usually, a laser beam interference method using a glass plate coated with a photosensitive material, an electron beam drawing method on a glass plate coated with an electron beam resist material, Machine cutting method can be applied.
  • the relief shape 16 is shaped (also referred to as replication) on the surface of the relief forming layer 15.
  • a stamper metal plate or resin plate
  • emboss pressure-bonded
  • the stamper is peeled off.
  • a reflective layer 17 on the surface of the relief forming layer 15 and then mold it by pressing a stamper on the surface. is there.
  • the relief is replicated by irradiating ionizing radiation during embossing and then removing the stamper.
  • Commercial duplication can be done in a continuous form, allowing continuous duplication work.
  • the relief can be replicated more commercially by using a cylindrical stamper that is manufactured by attaching a stamper to the cylinder or by directly engraving the relief on the cylinder.
  • ionizing radiation curable resin When ionizing radiation curable resin is used as the relief forming layer 15, ionizing radiation is irradiated during or after embossing with a stamper to harden the ionizing radiation curable resin. When the ionizing radiation curable resin is cured (reacted) by irradiation with ionizing radiation after the relief is formed, the ionizing radiation curable resin (relief forming layer 15) is formed.
  • Ionizing radiation may be classified according to the quantum energy of electromagnetic waves, but in this specification, all ultraviolet rays (UV—A, UV—B, UV—C), visible light, gamma rays, X-rays, It is defined as including an electron beam.
  • UV ultraviolet rays
  • visible rays visible rays
  • gamma rays X-rays
  • electron rays having a wavelength of 300 to 400 nm are most suitable.
  • An ionizing radiation curable resin that is cured by ionizing radiation adds a photopolymerization initiator and Z or a photopolymerization accelerator in the case of ultraviolet curing, and does not add it in the case of high energy electron beam curing. It can also be cured with thermal energy if an appropriate catalyst is present.
  • a thermosetting resin is used as the relief forming layer 15, it may be cured by aging in a temperature and humidity environment according to the curing conditions of the thermosetting resin to be used.
  • Reflective layer 17A and reflective layer 17B enhance the reflection and Z or diffraction effect of the relief by providing reflective layer 17 on the relief surface of relief forming layer 15 with a predetermined relief structure. Therefore, it is not particularly limited as long as it is higher than the reflectance of the relief forming layer 15, and for example, a metal or a transparent metal compound having a difference in refractive index can be applied.
  • the reflective layer 17 can be formed on the relief forming layer 15 before providing the relief structure. That is, a relief can be formed after forming the reflective layer 17 by appropriately selecting the material and stamper of each layer.
  • the metal used for the reflective layer 17 is a metal element thin film that has a metallic luster and reflects light, such as Cr, Ni, Ag, Au, and Al, and its oxides and sulfides.
  • a thin film of nitride or the like may be used alone or in combination.
  • the above light-reflective metal thin films are all formed to a thickness of about 10 to 2000 nm, preferably 20 to: a vacuum such as a vacuum deposition method, a sputtering method, or an ion plating method so as to have a thickness of LOOOnm. It can also be formed by the force obtained by the thin film method and other methods. If the thickness of the reflective layer 17 is less than this range, the light is transmitted to some extent and the effect is reduced, and if it is more than that, the reflective effect is not changed, so that the cost is useless.
  • the reflective layer 17 a metal compound having an almost colorless and transparent hue and an optical refractive index different from that of the relief forming layer is used. Since the glitter is visible, a glitter film such as a transparent hologram can be produced.
  • Examples of the transparent metal or metal compound include a thin film having a higher refractive index than the relief forming layer 15 and a thin film having a lower refractive index.
  • Examples of the former include ZnS, TiO, Al
  • examples of the latter include LiF, MgF, A1F.
  • 2 3 2 3 2 3 2 2 3 Preferably, it is a metal oxide or nitride, specifically, Be, Mg, Ca, Cr, Mn, Cu, Ag, Al, Sn, In, Te, Fe, Co, Zn, Ge, Pb, Cd Bi, Se, Ga, Rb, Sb, Pb, Ni, Sr, Ba, La, Ce, Au, etc. .
  • general light-reflective metal thin films such as aluminum can be used with transparency when the thickness force is S200A or less.
  • the transparent metal compound is formed on the relief surface of the relief forming layer 15 in the same manner as the metal thin film by vapor deposition, sputtering, ion plating, CVD so as to have a thickness of about 10 to 2000 nm, preferably 20 to LOOOnm.
  • a vacuum thin film method may be used.
  • the refractive index of the adhesive layer 19, 21B or the protective layer 25 material and the relief forming layer 15 material may be sufficiently different from the relief forming layer 15 which may use a transparent synthetic resin having a different light refractive index.
  • the adhesive layers 19 and 21B and the protective layer 25 can also serve as the reflective layer 17.
  • the glitter films 10A and 10B are obtained.
  • inventions of claims 5-6 According to the structure of the layer, by repeating the process of producing the relief forming layer 15, the relief shape 16 and the reflective layer 17, a multi-design glitter film having a plurality of designs is produced, and this multi-design glitter film is appropriately used. By slitting, the multi-design glitter thread 10 of the present invention can be obtained.
  • the glass transition temperature of the first relief forming material formed earlier is Tgl (u)
  • the glass transition temperature after curing of this material is Tgl (h)
  • the second relief formed later is formed.
  • the glass transition temperature of the material from which the layer is made is Tg2 (u)
  • the glass transition temperature of this material after curing is Tg2 (h)
  • the relief of the second relief forming layer is added to the first relief forming layer. It is preferable that the resin is cured before being molded and has a relationship of Tgl (h)> Tg2 (u).
  • Tg4 (u) Tg4
  • Tgl> Tg2 it is not particularly preferable that the relationship of (Tgl> Tg2) is satisfied when a curable resin is used. If a curable resin is used as the resin to be relief formed first, even if the Tgl (u) before curing is low, this resin is cured after the relief is formed, so that the relief is later applied to the second relief forming layer. This is preferable because it is easy to make Tgl (h) sufficiently high at the time of molding. On the contrary, if curable resin is used as the resin to be relief formed later, the temperature at which the relief is formed on the second relief forming layer is sufficiently lowered, and the resin is converted to Tg2 after the second relief is formed.
  • Curing to (h) is preferable because the durability of the product can be sufficiently increased.
  • Tgl (h)> Tg2 (u) can be established, and a relief formed later can be produced without destroying the shape of the relief formed earlier.
  • ionizing radiation curable resin is particularly preferable as the relief forming material. The same applies when having multiple designs of 3 layers or more.
  • the glass transition temperature described above is the temperature at which the loss tangent (tan ⁇ ) in the dynamic viscoelasticity measurement has the maximum value, as the glass transition temperature of the resin.
  • the measurement method of viscoelasticity is ARES manufactured by Rheometrics as a measuring instrument. The measurement conditions are parallel plate 10 ⁇ ⁇ , strain 1%, amplitude 1 ⁇ , heating rate 2 ° CZmin. The temperature is raised from 30 ° C to 200 ° C.
  • the storage elastic modulus G ′ is an elastic component, which is generated by the generation of a structure such as a coil vibration or an aggregate structure in a high molecule
  • the loss elastic modulus G g is a viscous component, which is a static component. It is equivalent to shear stress.
  • tan ⁇ is determined by G "/ G 'and is an index of how much energy is absorbed when the material is deformed.
  • two or more glitter films having different designs are prepared, and the reflective layer 17A of the two glitter films 10A and 10B is prepared. And a reflecting layer 17B surface, a base material 11 18 and a base material 11 7 surface, or a reflective layer 17A and a base material 11B surface are laminated, and a plurality of design glitter films are obtained by appropriately slitting.
  • the multi-design glitter thread 10 of the invention can be obtained.
  • the laminating method is not particularly limited as long as it can be bonded. For example, a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method can be applied. The material should be selected appropriately according to the bonding method. The dry lamination method is preferred.
  • the first glitter film and the second glitter film are bonded together, and then the substrate 11A and the substrate 1 IB are peeled off, respectively. It is possible to make it.
  • the layer structure shown in Fig. 9 is achieved by adjusting the adhesion between the base material and the relief forming material. Thread can be made. If the adhesive strength between the substrate and the relief forming layer is too strong, the first glittering film can be obtained by using a primer layer material that reduces the adhesive strength instead of the primer layer that is usually used to increase the adhesive strength. After laminating the second glittering film, the respective base materials are peeled off to produce a thread having a layer structure shown in FIG.
  • a protective layer a colored layer, magnetic printing, and Z are provided on the interlayer and Z or the surface of the layer structure as necessary, as long as the glitter pattern can be observed.
  • other layers such as a resin layer, and Z or printing, a primer layer, etc. may be provided.
  • thermoplastic resin such as acryl resin, unsaturated polyester, melamine, epoxy urethane
  • Ultraviolet curable molds such as those obtained by curing thermosetting resin such as (meth) arylate, compositions obtained by appropriately adding unsaturated ethylene monomers and unsaturated ethylene oligomers, and adding sensitizers
  • a product obtained by curing fat, a mixture of the above-mentioned thermoplastic resin and thermosetting resin, or a thermoformable substance having a radical polymerizable unsaturated group can be used.
  • thermosetting resins with excellent durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams are preferred!
  • Another base material layer may be further provided on the multi-pattern glittering film of the present invention obtained as described above.
  • Another substrate is not particularly limited, and examples thereof include the materials described for the substrate 11.
  • These synthetic resin films may be laminated by a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method.
  • the metal surface can be protected by providing the second supporting substrate 30B on the surface of the reflective layer 17B via the adhesive layer 21B.
  • a material may be appropriately selected in accordance with the above-described conventionally known lamination method.
  • an adhesive that is cured by ionizing radiation such as heat or ultraviolet rays' electron beam can be applied.
  • Thermosetting Adhesive adhesives include two-component curable urethane adhesives, polyester urethane adhesives, polyether urethane adhesives, acrylic adhesives, polyester adhesives, polyamide adhesives, and polyvinyl acetate adhesives. Epoxy adhesives and rubber adhesives can be applied. Among these, a two-component curable urethane adhesive is preferable.
  • the adhesive dispersed or dissolved in a solvent is applied and dried, and two glitter films are stacked and laminated, and then the adhesive is cured by aging at 30 to 120 ° C for several hours to several days. It is good to let them.
  • An adhesive that can be cured at the lowest possible temperature so as not to destroy the already formed relief shape preferably an adhesive that can be cured at a temperature lower than the glass transition temperature Tg (h) of the shaped relief-forming layer material. More preferably, an adhesive that can be cured at a temperature lower than Tg (u) is particularly preferably used.
  • the thickness of the adhesive layer is about 0.1 to 20; about ⁇ ⁇ (dry state), preferably 1.0 to 5.0 m.
  • a surface easy-adhesion layer that improves adhesion to the paper substrate may be provided on at least one surface of the multi-pattern glitter thread 10.
  • polyvinyl alcohol resin, acrylic resin, and cellulose resin are preferable.
  • the total thickness of the whole is about 4 to 40 ⁇ m, preferably 8 to 30 ⁇ m, more preferably 10 to 24 ⁇ m. To do.
  • a surface easy-adhesion layer that improves adhesion to the film substrate may be provided on at least one surface of the multiple-pattern glittering thread 10. Good.
  • the material for the surface easy-adhesion layer the same material as the primer layer can be preferably used.
  • the glitter multi-pattern formed article 100 of the present invention can be produced by a papermaking method by embedding the multi-pattern glitter thread 10 of the present invention, and has at least the first pattern of glitter and the second pattern of glitter having different patterns. It has a unique design and security.
  • FIG. 8 as an example of the glitter multi-pattern formed product 100 of the present invention, a multi-pattern glitter thread 10 formed by slitting the multi-pattern glitter film of the present invention in a narrow width is provided with less base paper.
  • a multi-pattern glitter thread 10 formed by slitting the multi-pattern glitter film of the present invention in a narrow width is provided with less base paper.
  • an example of a gift certificate using paper forged on one side to produce a forgery-preventing paper is shown.
  • One or more threads may be used for the anti-counterfeit paper. Also
  • the multi-pattern glitter film is slit into a narrow width of about 0.5 to 30 mm, preferably 1 to 10 mm, and the slit multi-pattern glitter thread is incorporated into the base paper 101.
  • the base paper 101 of the anti-counterfeit paper is not particularly limited as long as it has excellent surface smoothness and heat resistance and has an appropriate strength and thickness. Paper such as card paper can be applied. High-quality paper and coated paper having a basis weight of 100 to 200 gZm 2 and excellent printability and transferability are preferred.
  • the base paper 101 is manufactured by embedding a thread having a width of about 0.5 to 30 mm, preferably 1 to LOmm, slit into a narrow width.
  • a thread having a width of about 0.5 to 30 mm, preferably 1 to LOmm, slit into a narrow width.
  • NNKP softwood bleached kraft pulp
  • LKP hardwood bleached kraft pulp
  • NBSP softwood bleached sulfite pulp
  • TMP thermomechanical pulp
  • the paper stock is manufactured by using a known paper machine such as a long paper machine or a circular paper machine while feeding a narrow-width thread, and if necessary, a machine calendar, a super calendar Process.
  • the multi-design glittering thread 10 of the present invention may be provided with a printed pattern in addition to the above configuration.
  • the thread may be embedded in the base paper, or it may be half-embedded or on the surface if it is sufficiently adhered. Further, it may be partially exposed on the surface of the base paper. Further, the base paper may be partially thinned and embedded. In particular, in the partially embedded or partially thin base paper 101, the glitter on both sides of the multi-pattern glitter thread 10 of the present invention is used. The design is fully visible. Further, in the case of burying or half-embedding, at least one of the glittering patterns is too strong or difficult to see, but if necessary, it can be observed by peeling and observing, so that it is within the scope of the present invention.
  • the manufacturing of the multi-pattern glittering thread 10 of the present invention can be performed easily and at low cost because any process can use existing equipment and technology.
  • both the manufacturing process of the glittering multi-pattern formation product 100 of the present invention can use existing equipment and technology, it can be manufactured easily and at low cost.
  • FIGS. 17 to 21 are cross-sectional views of the glitter film showing one embodiment of the present invention
  • FIGS. 22 to 25 show the state of visual recognition of the pattern of the glitter film showing one embodiment of the present invention.
  • FIG. 26 is a plan view and a cross-sectional view of the glitter pattern forming product showing one embodiment of the present invention.
  • the glitter pattern layer 320 includes a relief forming layer 315 and a metal thin film layer 317 provided in contact with the relief surface on which the relief forming layer 315 is formed, and the relief is combined with the metal thin film layer 317 with fine irregularities. Brings out glitter by diffracting, diffusing light, and Z or diffuse reflection.
  • the height of the projections and depressions and the interval between the projections and projections are extremely fine, usually about 0.005 mm or less. Both require advanced technology. That is, when multiple patterns are forcibly formed on a single substrate 311, the first first glittering pattern layer 320A is excellent in the relief formation of the relief, “relief layer formation phenomenon where the resin is photographed on the plate”, Although there is no occurrence of so-called “plate removal (pattern removal)”, since the second glitter pattern layer 320B is subjected to heat embossing again at the time of shaping, the first metal thin film layer 317A and the second relief are formed.
  • the relief layer forming resin is taken on the plate between the first metal thin film layer 317A and the second relief forming layer 315B.
  • ⁇ Phenomenon '',, ⁇ Plate removed (pattern missing) '' I will be born. Therefore, only one design with inferior design was obtained.
  • the present inventors have further advanced research, and even if they have a plurality of glittering patterns, all of the plurality of patterns are peeled off of the grease, so-called "printing (pattern removal).
  • an interlayer primer layer is provided between the first glitter pattern layer and the second glitter pattern layer, so that the resin is peeled off, so-called “plate”.
  • “Small (pattern removal)” has been solved, and the transferred material is excellent in unity with the paper-making paper, and moreover, only one base material is required, thus saving resources.
  • the first glittering film 310A of the first glittering pattern layer 320A, the second glittering film 310B of the second glittering pattern layer 320B, and two different kinds of glittering films 310 were produced.
  • an interlayer primer layer 321 is provided between the first glitter pattern layer 320A and the second glitter pattern layer 320B, and the glass transition temperature (Tg) of the interlayer primer layer 321 is formed as a relief.
  • Layer 3 By setting the temperature to 130 ° C or lower, which is lower than the Tg of 15A, the adhesive action of the interlayer primer layer 321 does not cause ⁇ plate removal (pattern removal) '' even in the embossing process, and the glitter is maintained.
  • the total thickness can be made extremely thin, for example, 5 to 20 / ⁇ ⁇ . If the total thickness is extremely thin, there is no sense of incongruity and excellent unity even if it is applied as a thread to the base paper.
  • the glitter film 310 of the present invention comprises a first glitter pattern layer 320 ⁇ comprising a first relief forming layer 315 A and a first metal thin film layer 317, a second relief forming layer 315 B and a second metal thin film layer 317 B.
  • the second glittering design layer 320B may be laminated via the interlayer primer layer 321B.
  • the first glittering design layer 320A composed of the first relief forming layer 315A and the first metal thin film layer 317A is disposed on one surface of the substrate 311 via the interlayer primer layer 321B.
  • the second glitter pattern layer 320B composed of the second relief forming layer 315B and the second metal thin film layer 317B and the base material are laminated on the same surface.
  • the example of FIG. 12 is obtained.
  • the fourth glitter design layer 320D may be provided in the lower part of the written display of the example of FIG. 12, the example shown in FIG. 13 is obtained.
  • the third bright design layer 320C and the fourth bright design layer 320D are in contact with each other, it is preferable to provide an interlayer primer layer 321D between them.
  • the first glittering pattern layer 320A composed of the first relief forming layer 315A and the first metal thin film layer 317A is disposed on one surface of the substrate 311 via the interlayer primer layer 321B.
  • the second glitter pattern layer 320B composed of the second relief forming layer 315B and the second metal thin film layer 317B and the protective layer 325 are laminated on the same surface.
  • an adhesive label or a transfer foil may be provided in which an adhesive layer 321 may be provided on the first metal thin film layer 317B having the configuration of FIG. 11A.
  • the inner glitter pattern is hidden by the outer glitter pattern metal thin film layer.
  • a film layer may be used.
  • the outer brilliant design is a brilliant design in which at least one of the brilliant designs has no other brilliant design, and the inner brilliant design is the brilliant design. It is a glitter design where there are two or more pairs of other glitter designs on both sides.
  • All the metal thin film layers may be transparent metal thin film layers. Conversely, it is also possible to make a thread with unique security that allows the inner glittering pattern to be confirmed only when it is broken by making the outer metal thin film layer opaque.
  • the symbols of the 1st to n-th glitter design layers 320 may be the same or different.
  • the first glitter pattern and the second glitter pattern are the same, the same image can be viewed from the front side and the back side.
  • the first metal thin film layer and the third metal thin film layer are opaque metal thin film layers
  • the second metal thin film layer and the fourth metal thin film layer are transparent metal thin film layers. Each of them can visually recognize 2 designs, a total of 4 designs, so that a very unique design and Z or security can be obtained.
  • the materials and the forming method are the same, and it should be read as l to n.
  • the first to nth relief forming layers and the metal thin film layer layers may be the same material, forming method and different thickness.
  • polyester resin such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene terephthalate-isophthalate copolymer, or terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer, nylon (trade name) ) 6, nylon (trade name) 66, nylon (trade name) 610, or nylon (trade name) 12, etc.
  • polyamide resin polyethylene, polypropylene, polybutene, or polyolefin resin such as polymethylpentene
  • Cyclic polyolefin resins such as polynorbornene, bur resins such as polyvinyl chloride, (meth) acrylic resins such as polyacrylate, polymetaacrylate, or polymethylmetaacrylate, polystyrene, high-impact polystyrene AS oil, Is a styrene resin such as ABS resin, a polyvinyl alcohol resin, or a polybutyl alcohol resin such as an ethylene vinyl alcohol copolymer, a polycarbonate resin, a saponified product of an ethylene-vinyl acetate copolymer, or a polyvinyl plastic.
  • the base material 311 may be a copolymer resin containing these resins as a main component, a mixture (including alloy), or a laminate including a plurality of layers.
  • the substrate 311 may be a stretched film or an unstretched film, but a film stretched in a uniaxial direction or a biaxial direction is preferable for the purpose of improving the strength.
  • the base material 311 is used as a film, sheet, or board that has at least one layer strength of these resins.
  • the total thickness of the entire glittering film 310 of the present invention is not particularly limited.
  • the thickness can be about 1 to 200 / ⁇ ⁇ .
  • the thickness of the base material 311 Most of the total thickness of the glitter film 310 is the thickness of the base material 311. Conventionally, in the case of forming a plurality of glitter patterns, it is usually necessary to use two base materials. I got it. For this reason, in order to reduce the total thickness, it is necessary to use a very thin base material, and in the layer formation process by coating and the relief shaping process, high-precision equipment, delicate operations, and loss of caulking are also lost. There were many low yields and cost. In the present invention, since only one base material 311 is sufficient, it is possible to use a general-purpose base material that is suitable for good processing and inexpensive. Polyethylene terephthalate and polyethylene naphthalate having good mechanical strength and good heat resistance are suitable.
  • a substrate having a thickness of about 1 to 200 / ⁇ ⁇ can be used.
  • the base material with a thickness of 2-38 m Preferably 4-18 m can be used.
  • the base material When the base material is used, it can be easily manufactured by conventional equipment and normal operation, and the force is low.
  • the base material 311 has a primer layer 313 or a corona discharge treatment, a plasma treatment, an ozone gas treatment, a flame treatment as necessary to improve the adhesion between the layers on the surface side on which the relief layer is formed. Further, easy adhesion treatment such as pre-heat treatment, dust removal treatment and alkali treatment may be performed. Particularly preferably, by providing a primer layer (not shown), the adhesiveness between the base material 311 and the relief layer can be improved, and the plate-cutting during the running of replication can be further suppressed.
  • the primer layer is flexible even when heat and / or pressure is applied in synergy with the base material 311, and its cushioning action reduces the load on the relief forming layer 315 and has already been molded. As a result, the relief of the already formed relief is retained.
  • the primer layer 313 includes, for example, polyurethane-based resin, polyester-based resin, polyamide-based resin, epoxy-based resin, phenol-based resin, polyvinyl chloride-based resin, polyvinyl acetate-based resin, and salt vinyl.
  • a Kuryl resin polyvinyl alcohol resin, polyvinyl acetal resin, polybutadiene resin, rubber compound, petroleum resin, alkyl titanate compound, polyethyleneimine compound, isocyanate compound, starch, casein Further, gum arabic, cellulose derivatives, waxes and the like can be used.
  • Relief forming layer 315 Relief shape is formed on the surface (also called replication).
  • a “hot pressing method” called by those skilled in the art can be applied.
  • a stamper metal plate or resin plate
  • embossing the stamper is peeled off after the relief is shaped and copied to the relief forming layer 315.
  • the relief shaping is the same in the material and the formation method except that the layers are different.
  • the first to nth reliefs may be the same or different.
  • the material of the relief forming layer 315 used in the hot pressing method is a thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Hardened thermosetting resin such as urethane, polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate, A product obtained by curing ionizing radiation curable resin such as melamine (meth) acrylate or triazine acrylate, or a mixture of the above thermoplastic resin and thermosetting resin or ionizing radiation curable resin. It can be used.
  • a thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Hardened thermosetting resin such as
  • thermosetting resins excellent in durability such as chemical resistance, light resistance and weather resistance, and curable resins cured by ionizing radiation such as ultraviolet rays and electron beams.
  • Sarakuko is preferably a material with excellent heat resistance and pressure resistance. That is, in the inventions of claims 3 to 6, a relief forming material that can withstand heat and pressure when the first glitter film and the second glitter film are bonded together is preferable.
  • the second relief forming layer is further formed on the opposite surface or the same surface of 11A of the first substrate.
  • the heat and pressure when the relief is formed on the second relief forming layer Materials that can withstand are preferred.
  • ionizing radiation curable resins having such characteristics ionizing radiation curable resins such as polyester (meth) acrylate, urethane (meth) acrylate and epoxy (meth) acrylate are preferably cured. Can be applied, particularly preferably urethane-modified
  • One relief forming layer is a cured product obtained by curing an uncured ionizing radiation curable resin composition mainly composed of the urethane-modified acryl resin represented by the general formula (a).
  • an uncured ionizing radiation curable resin composition mainly composed of the urethane-modified acryl resin represented by the general formula (a).
  • the photocurable resin composition disclosed by the present applicant in Japanese Patent Application Laid-Open No. 2000-273129 can be applied, and the photocurable resin composition S described in the above specification can be applied to the present specification. Used in the examples in the manual and is labeled as "ionizing radiation curable resin composition A"
  • Rl's each independently represent a hydrogen atom or a methyl group
  • R2 represents a hydrocarbon group having 1 to 20 carbon atoms.
  • the sum of 1, m, n, o and p is 100 is an integer from 1 to 20 to 90, mi to 0 to 80, ⁇ to 0 to 50, ⁇ + ⁇ to 10 to 80, pi to 0 to 40.
  • X and Y are linear or Represents a branched alkylene group
  • Z represents a group for modifying a urethane-modified acryl resin, and preferably represents a group having a bulky cyclic structure.
  • Other preferable one of the relief forming layer 315 Is a reaction product of an isocyanate compound having a melting point of 40 ° C or higher and a (meth) acrylic compound capable of reacting with an isocyanate group. In other words, it is a resin containing a soft low point of 40 ° C or higher.
  • the isocyanate compound has an isocyanate group bonded to a non-aromatic hydrocarbon ring, a trimer of isophorone diisocyanate, or an isophorone diisocyanate and an active hydrogen-containing compound. It is a reaction product, and (meth) acrylic compound strength (meth) acrylic acid and (meth) acrylate having a hydroxyl group are preferred. Specifically, a photocurable resin disclosed in JP 2001-329031 A can be applied. (As ionizing radiation curable composition B, details are separately described in actual examples.)
  • ionizing radiation curable resin of urethane-modified acryl-based resin for example, ionizing radiation curable resin of urethane-modified acryl-based resin, a photopolymerization initiator, a photosensitizer, and a photopolymerization acceleration may be used as necessary.
  • the solvent is not used, but the non-solvent relief forming layer 15 composition (ink) is used.
  • the relief forming layer 15 composition (ink) may be applied by, for example, a mouth coat method, a gravure coat method, other known coating methods or printing methods, and dried if necessary. .
  • the thickness of the relief forming layer 15 is usually about 0.1 to about LO / zm, preferably 0.2 to 5 / ⁇ ⁇ , and more preferably 0.5 to 2 / ⁇ ⁇ . If it is less than 0.5 m, the brightness (brightness) is remarkably lowered, and if it exceeds 2 m, the brightness is sufficient, which is disadvantageous in terms of cost.
  • the relief shape is uneven and is not particularly limited.
  • those that exhibit functions such as light diffusion, light scattering, light reflection, and light diffraction are preferably formed by Fourier transform, lenticular lens, light diffraction pattern, and moth eye.
  • a hairline pattern, a mat pattern, a line pattern, an interference pattern, or the like that expresses a unique glitter may be used.
  • a hologram or diffraction grating in which interference fringes due to interference of light between the object light and the reference light are recorded in a concavo-convex pattern can be applied.
  • Holograms include laser reproduction holograms such as Fresnel holograms, white light reproduction holograms such as rainbow holograms, color holograms utilizing these principles, computer-generated holograms (CGH), holographic diffraction gratings, etc. There is.
  • the pattern described in this specification refers to a pattern formed by combining one or more of these various concavo-convex patterns.
  • text patterns such as "abc” and "Security” Patterns formed from combinations of geometric patterns called patterns, polka dots, and painting patterns created by simulating flowers and birds, etc.
  • patterns polka dots
  • multiple symbols refers to symbols that cannot be formed by using these symbols once and once, and usually refers to symbols that are created using two or more symbols multiple times.
  • Examples of the diffraction grating include a holographic diffraction grating using a hologram recording means.
  • a diffraction grating is mechanically created by using an electron beam drawing apparatus or the like, so that arbitrary diffraction can be performed based on calculation.
  • a diffraction grating from which light can be obtained can also be mentioned.
  • a mechanical cutting method may be used.
  • These holograms and Z or diffraction gratings may be recorded in a single or multiple manner, or in combination.
  • These masters can be prepared by known materials and methods. Usually, a laser beam interference method using a glass plate coated with a photosensitive material, an electron beam drawing method on a glass plate coated with an electron beam resist material, Machine cutting method can be applied.
  • the relief shape 16 is shaped (also referred to as replication) on the surface of the relief forming layer 315.
  • a stamper metal plate or resin plate
  • embossing pressure-bonded (so-called embossing) to the surface of the relief forming layer 315, and the relief is applied to the relief forming layer 315.
  • the stamper is peeled off. It is also possible to form a reflective layer 117 on the surface of the relief forming layer 115 and then mold it by pressing a stamper on this surface.
  • the relief is replicated by irradiating ionizing radiation during embossing and then removing the stamper.
  • Commercial duplication can be carried out continuously by making it long.
  • the relief can be replicated more commercially by using a cylindrical stamper prepared by attaching a stamper to the cylinder, or by directly engraving the relief on the cylinder.
  • This interlayer primer layer was also effective in the roll-type continuous replication method.
  • ionizing radiation curable resin When ionizing radiation curable resin is used as the relief forming layer 315, ionizing radiation curable resin is cured by irradiation with ionizing radiation during or after embossing with a stamper. When the ionizing radiation curable resin is cured (reacted) by irradiation with ionizing radiation after the relief is formed, the ionizing radiation curable resin (relief forming layer 315) is formed.
  • Ionizing radiation may be classified by the quantum energy of electromagnetic waves, but in this specification, all ultraviolet rays (UV-A, UV-B, UV-C), visible light, gamma rays, X-rays, electrons It is defined as including a line.
  • UV ultraviolet rays
  • visible rays visible rays
  • gamma rays X-rays
  • electron rays having a wavelength of 300 to 400 nm are most suitable.
  • An ionizing radiation curable resin that is cured by ionizing radiation adds a photopolymerization initiator and Z or a photopolymerization accelerator in the case of ultraviolet curing, and does not add it in the case of high energy electron beam curing. It can also be cured with thermal energy if an appropriate catalyst is present.
  • a thermosetting resin is used as the relief forming layer 315, it should be aged and cured in a temperature and humidity environment according to the curing conditions of the thermosetting resin used.
  • the reflective layer 317A and the reflective layer 317B are provided with a relief having a predetermined relief structure.
  • the reflective layer 317 is provided on the relief surface of the surface forming layer 315 to enhance the reflection and Z or diffraction effect of the relief, so that it is not particularly limited as long as it is higher than the reflectance of the relief forming layer 315.
  • a transparent metal compound having a difference in refractive index can be applied.
  • the reflective layer 317 can be formed on the relief forming layer 315 before providing the relief structure. That is, a relief can be formed after forming the reflective layer 317 by appropriately selecting the material and stamper of each layer.
  • the metal used for the reflective layer 317 is a thin metal element film having a metallic luster and reflecting light, such as Cr, Ni, Ag, Au, and Al, and their oxides and sulfides.
  • a thin film such as an oxide or nitride may be used alone or in combination.
  • the above light-reflective metal thin film is formed by a vacuum thin film method such as a vacuum deposition method, a sputtering method, an ion plating method or the like so as to have a thickness of about 10 to 2000 nm, preferably 20 to: LOOOnm. It can also be formed by the obtained force and other factors. If the thickness of the reflective layer 317 is less than this range, light is transmitted to some extent and the effect is reduced, and if it is more than that, the reflective effect does not change, which is wasteful in cost.
  • the reflective layer 317 a metallic compound having an almost colorless and transparent hue and an optical refractive index different from that of the relief forming layer is used.
  • the glitter such as a hologram can be visually recognized, a glitter film such as a transparent hologram can be produced.
  • Examples of the transparent metal or metal compound include a thin film having a higher refractive index than the relief forming layer 15 and a thin film having a lower refractive index.
  • Examples of the former include ZnS, TiO, Al
  • examples of the latter include LiF, MgF, A1F.
  • 2 3 2 3 2 3 2 2 3 Preferably, it is a metal oxide or nitride, specifically, Be, Mg, Ca, Cr, Mn, Cu, Ag, Al, Sn, In, Te, Fe, Co, Zn, Ge, Pb, Cd Bi, Se, Ga, Rb, Sb, Pb, Ni, Sr, Ba, La, Ce, Au, etc. .
  • general light-reflective metal thin films such as aluminum can be used with transparency when the thickness force is S200A or less.
  • the transparent metal compound is formed on the relief surface of the relief forming layer 315 on the relief surface of the relief forming layer 315 by vapor deposition, sputtering, ion plating, CVD to a thickness of about 10 to 2000 nm, preferably 20 to LOOOnm. It may be provided by a vacuum thin film method or the like. Furthermore, if the refractive index of the adhesive layer 321 or the protective layer 325 material and the relief forming layer 315 material are sufficiently different from each other, it is possible to use a transparent synthetic resin having a refractive index different from that of the relief forming layer 315. In addition, the adhesive layer 321 and the protective layer 325 can also serve as the reflective layer 317.
  • the material of the interlayer primer layer 321B is preferably a material that improves the adhesion between the reflective layer (metal thin film layer) forming material and the relief material, and is lower than the Tg of the relief forming layer 315A.
  • the material of the interlayer primer layer 321B is preferably higher than room temperature in consideration of the necessity of removing and storing the interlayer primer coating.
  • interlayer primer layers may be used, such as an interlayer primer layer having excellent adhesion to the reflective layer forming material and an interlayer primer layer having excellent adhesion to the relief layer material.
  • the interlayer primer layer 321B is flexible because it is lower than the Tg of the relief forming layer 315 even when heat and Z or pressure are applied, and its cushioning action reduces the load on the relief forming layer 315. Thus, deterioration of the already shaped relief shape is prevented, and as a result, the glitter of the already shaped relief is maintained.
  • the material of the interlayer primer layer 321B includes, for example, polyurethane-based resins, polyester-based resins, polyamide-based resins, epoxy-based resins, phenol-based resins, and polysalt-vinyl-based resins.
  • Polyvinyl acetate resin Polyvinyl acetate resin, salt vinyl acetate copolymer, acid-modified polyolefin resin, copolymer of ethylene and butyl acetate or acrylic acid, (meth) acrylic resin, polyvinyl alcohol Resin, polyvinylacetal resin, polybutadiene resin, rubber compound, petroleum resin, alkyl titanate compound, polyethyleneimine system Compounds, isocyanate compounds, starch, casein, gum arabic, cellulose derivatives, waxes and the like can be used.
  • ABS acrylonitrile monobutagen-styrene
  • AS acrylonitrile-styrene
  • cellulose acetate resin acrylonitrile-styrene
  • ionomer resin polyacrylonitrile resin, one or more of these resins Can be used in combination.
  • a cross-linking agent such as isocyanate may be added as appropriate to improve the adhesion.
  • the adhesion between the substrate and the relief layer may be increased by surface treatment such as corona discharge treatment or plasma treatment.
  • surface treatment such as corona discharge treatment or plasma treatment.
  • corona discharge treatment, plasma treatment, ozone gas treatment, flame treatment, pre-heat treatment, dust removal treatment, alkali treatment, etc. as necessary to improve the adhesion between the layers on the surface where the relief layer is formed.
  • Easy adhesion treatment may be performed.
  • the interlayer primer layer 321B may be applied as a melt or a solution by a known method, or may be formed into a film and bonded by force.
  • the glittering film 310 of the present invention is obtained by repeating the formation and shaping of each layer described above.
  • the first relief forming layer 315A is formed on one surface of the base material 311, the first glitter pattern is shaped, and the first reflection is performed.
  • the layer 317A is formed, and further, the interlayer primer layer 321B is formed on the surface of the first reflective layer 317A, the second relief forming layer 315B is formed, the second glitter pattern is formed, and the second reflective layer 317B is formed. Should be formed
  • the third relief forming layer 315C is further formed on the surface opposite to the first reflective layer 317A and the base material 311 of the glitter film 310 of the present invention shown in FIG.
  • the characteristic pattern is formed and the third reflective layer 317C is formed, the glittering film 310 shown in FIG. 20 is obtained and has three glittering patterns.
  • an interlayer primer layer 321D is further formed, a fourth relief forming layer 315D is formed, and a fourth glitter pattern is imparted. Then, when the transparent fourth reflective layer 317D is formed, the glitter film 310 shown in FIG. 21 is obtained and has four glitter patterns.
  • Further description of the above-described plurality of patterns i will give the glitter films 310A and 310B as described above. Further, in the present invention, by repeating the steps of producing the relief forming layer 315, the relief shape 316, and the reflective layer 317 according to the layer configuration, a multi-design glitter film having a plurality of designs is produced. By appropriately slitting the film, the multi-design glittering thread 310 of the present invention can be obtained.
  • Tgl (u) is the glass transition temperature of the first relief forming material formed earlier
  • Tgl (h) is the glass transition temperature after hardening of this material
  • the second relief formation is formed later.
  • Tg2 (u) glass transition temperature of the material from which the layer is made
  • Tg2 (h) glass transition temperature of this material after curing
  • the relief of the second relief forming layer is added to the first relief forming layer. It is preferable that the resin is cured before being molded and has a relationship of Tgl (h)> Tg2 (u).
  • Tg4 (u) Tg4
  • Tgl> Tg2 the relationship (Tgl> Tg2) is established. If a curable resin is used as the resin to be relief formed first, even if the Tgl (u) before curing is low, this resin is cured after the relief is formed, so that the relief is later applied to the second relief forming layer. This is preferable because it is easy to make Tgl (h) sufficiently high at the time of molding. On the contrary, if curable resin is used as the resin to be relief formed later, the temperature at which the relief is formed on the second relief forming layer is sufficiently lowered, and the resin is converted to Tg2 after the second relief is formed.
  • Curing to (h) is preferable because the durability of the product can be sufficiently increased.
  • the relief formed later can be produced without destroying the shape of the relief formed earlier.
  • ionizing radiation curable resin is particularly preferable as the relief forming material. The same applies when having multiple designs of 3 layers or more.
  • the glass transition temperature mentioned above is the temperature at which the loss tangent (tan ⁇ ) in the dynamic viscoelasticity measurement has the maximum value is defined as the glass transition temperature of the resin.
  • the measurement method of viscoelasticity is ARES manufactured by Rheometrics as a measuring instrument. The measurement conditions are parallel plate 10 ⁇ ⁇ , strain 1%, amplitude 1 ⁇ , heating rate 2 ° CZmin. The temperature is raised from 30 ° C to 200 ° C.
  • the storage elastic modulus G ′ is an elastic component, which is generated by the generation of a coil vibration or aggregate structure in a high molecule, and the loss elastic modulus G is a viscous component. It is equivalent to stress.
  • tan ⁇ is determined by G "/ G 'and is an index of how much energy is absorbed when the material is deformed.
  • the glitter film 310 of the present invention has a plurality of glitter designs, all of which have excellent glitter properties, a single substrate is sufficient, resource saving, and the total thickness is extremely high. Can be thin.
  • the glittering film 310 is excellent in a sense of unity with the transfer material or paper. Costs can be reduced.
  • the glittering film 310 of the present invention has a protective layer, a colored layer, magnetic printing, and Z or resin on the interlayer and Z or the surface of the layer structure as necessary, as long as the glittering pattern can be observed.
  • Other layers, such as layers, as well as Z or printing, primer layers, etc. may be provided.
  • an easy primer layer may be provided on at least one surface of the glittering film 310.
  • the primer layer is made of a hydrophilic material such as a polybutyl alcohol-based resin, a resin. Krill oil and cellulosic oil are preferred.
  • thermoplastic resin such as acryl resin, unsaturated polyester, melamine, epoxy urethane (meth) atariate.
  • Curing ultraviolet curable resin such as a composition obtained by curing a thermosetting resin such as a rate, a composition in which an unsaturated ethylene monomer and an unsaturated ethylene oligomer are appropriately mixed, and a sensitizer added.
  • a mixture of the thermoplastic resin and the thermosetting resin, or a thermoformable substance having a radically polymerizable unsaturated group can be used.
  • thermosetting resins with excellent durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams are preferred!
  • the glitter pattern formation product 300 of the present invention uses the glitter film 310 of the present invention to transfer at least a part of the glitter pattern to the transfer target body by adhering, bonding, or punching. It can be produced by a papermaking method by embedding and has a plurality of designs with excellent glitter, and can have special design and security.
  • FIG. 26 shows, as an example of the glitter pattern formation 300 of the present invention, a thread formed by slitting the glitter film 310 of the present invention on a surface of at least one surface of a base paper.
  • the total thickness of the threads is extremely thin, and the transferred material is excellent in unity with the paper-making paper. In addition, it is resource-saving and easy to manufacture.
  • One or more threads may be used for the anti-counterfeit paper.
  • Fig. 26 (B) is an example of only one side when it is provided on the same side as the securities printing section, and Fig. 26 (C) is provided on the opposite side of the securities printing section. Also good.
  • the glitter film 310 of the present invention has a narrow stripe shape, those skilled in the papermaking industry call it a thread.
  • the glitter film 310 of the present invention is slit to a width of SO. 5 to 30 mm, preferably 1 to a narrow width of LO mm, and the thread is incorporated into the base paper 301.
  • the anti-counterfeit base paper 301 is excellent in surface smoothness and heat resistance and has an appropriate strength. There is no particular limitation as long as it has a thickness and thickness, but paper such as fine paper such as fine paper, thin paperboard, and card paper can be applied. High-quality paper and coated paper having a basis weight of 100 to 200 gZm2 and excellent printability and transferability are preferred.
  • the base paper 301 is manufactured by embedding a thread having a width of about 0.5 to 30 mm, preferably 1 to LOmm, slit into a narrow width. In other words, softwood bleached kraft pulp (NBKP), hardwood bleached kraft pulp (LBKP), softwood bleached sulfite pulp (NBSP), thermomechanical pulp (TMP), etc.
  • the paper stock is manufactured by using a known paper machine such as a long paper machine or a circular paper machine while feeding a narrow-width thread, and if necessary, a machine calendar, a super calendar Process.
  • Another base material layer may be further provided on the multi-pattern glittering film of the present invention obtained as described above.
  • the metal surface can be protected by providing a support substrate 301 on the surface of the reflective layer 317B with an adhesive layer 321 interposed therebetween.
  • the materials described for the substrate 301 are used.
  • These synthetic resin films and paper base materials may be laminated by a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method. Further, by using a support substrate that has been subjected to a release treatment as the support substrate, an adhesive label having excellent design and security can be obtained.
  • an appropriate material may be selected in accordance with the above-described conventionally known lamination method.
  • an adhesive that is cured by ionizing radiation such as heat or ultraviolet rays' electron beam
  • Thermosetting adhesives include two-component curable urethane adhesives, polyester urethane adhesives, polyether urethane adhesives, acrylic adhesives, polyester adhesives, polyamide adhesives, and polyvinyl acetate adhesives.
  • Adhesives, epoxy adhesives, rubber adhesives, etc. can be applied .
  • a two-component curable urethane adhesive is preferable.
  • the adhesive dispersed or dissolved in a solvent is applied and dried, and two glitter films are stacked and laminated, and then the adhesive is cured by aging at 30 to 120 ° C for several hours to several days. Good.
  • Adhesives, more preferably adhesives that can be cured at temperatures below Tg (u), are particularly preferably used.
  • the thickness of the adhesive layer is 0.1 to 20; about ⁇ ⁇ (dry state), preferably 1.0 to 5. O / zm.
  • the glitter film 310 of the present invention may be provided with a printed pattern or the like in addition to the above configuration.
  • the thread may be embedded in the base paper, or it may be half-embedded or on the surface if it is sufficiently adhered. Further, it may be partially exposed on the surface of the base paper. Further, the base paper may be partially thinned and embedded, in particular, half-embedded or partially thin V. With the base paper 301, the glitter pattern on both sides of the glitter film 310 of the present invention can be fully observed. . Further, in the case of embedding or partial embedding, at least one of the glittering patterns cannot be visually recognized or is difficult to visually recognize, but can be observed by peeling and observing as necessary, and thus is within the scope of the present invention.
  • the production of the glitter film 310 of the present invention can be carried out easily and at a low cost because existing processes and techniques can be used in any process.
  • both the production of the glitter pattern formation 300 of the present invention and the existing equipment and technology can be used in both processes, the production is easy and can be produced at low cost.
  • Lumirror 6CF53 product name: Torayen clay, PET film product name
  • the above-mentioned ionizing radiation curable resin composition A is applied to one surface of the substrate 11A with a gravure reverse coater and dried at 100 ° C. to form a relief forming layer 15A having a thickness of 1 ⁇ m. Formed.
  • a stamper duplicated by the 2P method from the rainbow hologram by the two-beam method is applied to the relief forming layer surface, and is applied to the embossing roller of the duplicating apparatus, and is heated and pressed (embossed) with the opposite roller. A relief with a fine patterning power was formed.
  • Lumirror 6CF53 manufactured by Torayen clay, trade name of PET film having a thickness of 6 ⁇ m was used as the base material 11B.
  • the above-mentioned ionizing radiation curable resin composition A is applied to one surface of the substrate 11B with a gravure reverse coater and dried at 100 ° C to form a relief forming layer 15B having a thickness of 1 ⁇ m. did.
  • a stamper replicated from the diffraction grating by the 2P method on the relief forming layer surface is attached to an embossing roller of a replication apparatus, and heated and pressed (enbossed) with an opposing roller to form a fine uneven pattern. A powerful relief was shaped.
  • the reflective layer 17A of the first glitter film and the reflective layer 17B of the second glitter film are bonded together by a known dry lamination method. Apply a two-part curable polyurethane adhesive to the reflective layer 17A surface of the first glitter film by gravure coating so that the thickness after drying is 1.5 m, and after drying, apply the second glitter.
  • the reflective layer 17B surface of the conductive film was overlaid and pressurized, and then allowed to stand at 40 ° C. for 3 days to obtain a multi-pattern glitter film 10 of Example 1.
  • the multi-pattern glittering film 10 has an overall thickness of approximately 15 ⁇ m, and one surface has a hologram, and the other surface has a separate glittering pattern formed by a diffraction grating.
  • a multi-pattern glittering film 10 was obtained in the same manner as in Example A1 except that a titanium oxide thin film having a thickness of 1 OOnm was used for forming the reflective layer 17A by sputtering.
  • the multi-pattern glitter film 10 has an overall thickness of approximately 15 m, one surface having a glitter pattern and a hologram pattern by a diffraction grating, and the other surface having a separate transparent glitter pattern by the diffraction grating. I could observe brightly.
  • Example A1 Except using PET film with thickness 6 / ⁇ ⁇ as substrate 11A, 12 / zm thickness as substrate 11B, and using ionizing radiation curable resin composition B as a relief forming layer coating liquid in the same manner as in Example A1, a multi-pattern glitter film 10 was obtained.
  • the multi-pattern glitter film 10 had an overall thickness of approximately 21 ⁇ m, and a bright surface with a separate glitter pattern on one side of the hologram and a diffraction grating on the other side could be observed brightly.
  • Polyester resin is applied with a gravure reverse coater on the surface of the base material 11A and the base material 11B where the relief forming layer 15 is formed, dried at 100 ° C, and a primer layer having a thickness of 0.5 ⁇ m 1 3A and A multi-pattern glitter film 10 was obtained in the same manner as in Example A1 except that 13B was formed.
  • the multi-pattern glitter film 10 has an overall thickness of approximately 15 / zm, one surface is a hologram, and the other surface is brightly observed with a separate transparent glitter pattern by a diffraction grating.
  • the interlayers are firmly bonded, the durability that peeling hardly occurs is good.
  • a multi-pattern glittering film 10 was obtained in the same manner as in Example A1, except that a PET film having a thickness of 16 m was used as the base materials 11A and 11B.
  • the multi-pattern glitter film 10 had an overall thickness of approximately 35 m, and a bright and distinct glitter pattern with a diffraction grating on one surface could be observed brightly.
  • Example A A PET film having a thickness of 50 ⁇ m is used as the base material 11A and 11B, the thickness of the primer layers 13A and 13B is 1 ⁇ m, and the thickness of the relief forming layers 15A and 15B is 2 m.
  • a multi-pattern glitter film 10 was obtained.
  • the multi-pattern glitter film 10 had an overall thickness of approximately 110 / zm, and one surface could be brightly observed with a hologram and another surface with a separate glitter pattern with a diffraction grating.
  • the first substrate 11A of the first glitter film and the second substrate 11B of the second glitter film are bonded by a known dry lamination method.
  • the second substrate 11B side of the glittering film 2 was pressed and pressed, and then allowed to stand at 40 ° C for 3 days to obtain a multi-pattern glittering film 10.
  • the multi-pattern glitter film 10 has an overall thickness of approximately 15 m, and one surface has a hologram, and the other surface has a separate glitter pattern by a diffraction grating.
  • Example A1 After producing in Example A1, the first substrate 11A of the first glitter film and the second substrate 11B of the second glitter film are bonded by a known dry lamination method. After applying and drying the two-component curable polyurethane adhesive on the first substrate 11A surface of the first glittering film by gravure coating method so that the thickness after drying becomes 1.5 / zm, The reflective layer 17B surface of the glitter film 2 was overlaid and pressurized, and then allowed to stand at 40 ° C for 3 days to obtain a multi-pattern glitter film 10.
  • the multi-pattern glittering film 10 had an overall thickness of approximately 15 m, and a bright surface with a separate glittering pattern formed by a diffraction grating on one surface could be observed brightly.
  • the above-mentioned ionizing radiation curable resin composition A was applied to the reflective layer 17A surface of the glitter film with a gravure reverse coater. Then, it was dried at 100 ° C. to form a relief forming layer 15B having a thickness of 1 ⁇ m.
  • a stamper duplicated by the diffraction grating cover 2P method is attached to the relief forming layer surface to an embossing roller of a duplicating apparatus, and is heated and pressed (embossed) with an opposing roller. Relief that has an uneven pattern power was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • the multi-design glitter film 10 had an overall thickness of approximately 8 m, and one surface could be brightly observed with a hologram on one surface and a separate glitter pattern on the other surface with a diffraction grating.
  • the above-mentioned ionizing radiation curable resin composition A was applied to the first substrate 11A surface of the glittering film with a gravure reverse coater. It was applied and dried at 100 ° C. to form a relief forming layer 15B having a thickness of 1 m.
  • a stamper duplicated by 2P method on the surface of the relief forming layer is attached to the embossing roller of the duplicating apparatus, and heated and pressed (embossed) with the opposing roller to make fine Relief that has uneven pattern force was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • the multi-pattern glittering film 10 had an overall thickness of about 8 m, and a bright surface with a separate glittering pattern formed by a diffraction grating on one surface could be observed brightly.
  • the ionizing radiation curable resin composition A described above was applied on the reflective layer 17B of the first glittering film prepared in Example A1 and the second glittering film prepared in Example A1, the ionizing radiation curable resin composition A described above was applied. Coating with a gravure reverse coater and drying at 100 ° C to form a protective layer 25 having a thickness of 0.5 ⁇ m, and using these, the reflective layer 17A of the first glittering film and the first Bonding is performed by a known dry lamination method so that the second substrate 11B of the glitter film 2 is opposed.
  • 2nd glitter film After applying a two-component curable polyurethane adhesive to the reflective layer 17A surface of the first glittering film by the gravure coating method so that the thickness after drying is 1.5 / zm, and drying it, 2nd glitter film (2) Substrate (1) The IB surface was superposed and pressurized, and then allowed to stand at 40 ° C for 3 days to obtain a multi-pattern glitter film 10.
  • the multi-pattern glitter film 10 had an overall thickness of approximately 15 m, and a bright surface with a separate glitter pattern on one side of the hologram and a diffraction grating on the other side could be observed brightly. Note that the glittering film produced in Example 11 was covered with the protective layer 25 without the reflective layer 17B being exposed on the surface, and the durability was further improved.
  • the second substrate 11B of the multi-pattern glitter film 10 having an overall thickness of approximately 35 ⁇ m produced in Example A5 is opposed to one surface of the 100 / zm PET film used as the base paper 101. Bonding is performed by a known dry lamination method. After applying and drying a two-component curable polyurethane adhesive on the second substrate 11B surface of the multi-pattern glitter film 10 by gravure coating method to a thickness of 5 ⁇ m after drying, 100 / zm The PET film was overlaid and pressurized, and then allowed to stand at 40 ° C for 3 days to obtain a glittering multi-graphical material 100.
  • the glittering multiple-pattern formed product 100 had an overall thickness of approximately 140 m, and a bright surface with a separate glittering pattern formed by a diffraction grating on one surface could be observed brightly.
  • Lumirror 6CF53 manufactured by Torayen clay, trade name of PET film having a thickness of 6 ⁇ m was used as the substrate 111A.
  • the above-mentioned ionizing radiation curable resin composition B is applied to one surface of the substrate 111 A with a Daravia reverse coater and dried at 100 ° C. to form a relief forming layer 115 A having a thickness of 1 ⁇ m. Formed.
  • a stamper duplicated by the 2P method from a rainbow hologram by the two-beam method is applied to the relief forming layer surface, and is applied to the embossing roller of the duplicating apparatus, and is heated and pressed (embossed) with one opposing roller.
  • Relief with a strong uneven pattern force was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 115A by a vacuum deposition method to obtain a reflective layer 117A.
  • Lumirror 6CF53 product name: PET film trade name, manufactured by Torayne soil
  • the ionizing radiation curable resin composition B described above is applied to one surface of the substrate 111B with a Daravia reverse coater and dried at 100 ° C. to form a relief forming layer 115 B having a thickness of 1 ⁇ m. Formed.
  • a stamper duplicated from the diffraction grating by the 2P method is stuck on the relief forming layer surface to the embossing roller of the duplicating apparatus, and is heated and pressed (embossed) with the opposing roller, so that the fine uneven pattern force is also reduced.
  • a relief was formed.
  • it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 115B by a vacuum deposition method to obtain a reflective layer 117B.
  • the reflective layer 117A of the first glitter film and the reflective layer 117B of the second glitter film are bonded together by a known dry lamination method. Apply a two-component curable polyurethane adhesive to the reflective layer 117A surface of the first glittering film by the gravure coating method so that the thickness after drying is 1.5 m.
  • the reflective layer 117B surface of the glitter film of 2 is overlaid and pressurized, and then left to stand at 40 ° C for 3 days, then slit with a precision micro slitter machine to a width of 1.5 mm, as a narrow thread,
  • the multi-design glitter thread 110 of Example B1 was obtained.
  • the multi-design glitter thread 110 has an overall thickness of approximately 15 ⁇ m, and one face can be a hologram, and the other face can be brightly observed with a distinct glitter pattern by a diffraction grating.
  • the glitter pattern could be observed and identified by anyone at a glance even in the dark.
  • the holograms and the copy of the thread with the unique brightness of the hologram were completely different, and the authenticity could be judged at a glance.
  • a multi-pattern glittering thread 110 was obtained in the same manner as in Example B1 except that a PET film having a thickness of 4.5 m was used as the base material 111A and the base material 111B.
  • the multi-design glitter thread 110 has an overall thickness of approximately 12 / zm, and one surface is a hologram, and the other surface is brightly observable with a separate glitter pattern by a diffraction grating.
  • a PET film having a thickness of 4.5 m was used as the base material 111A and the base material 111B.
  • the multi-design glitter thread 110 has an overall thickness of approximately 12 / zm, and one surface is a hologram, and the other surface is brightly observable with a separate glitter pattern by a diffraction grating.
  • a multi-pattern glittering thread 110 was obtained in the same manner as in Example B1, except that a PET film having a thickness of 9 ⁇ m was used as the base material 111A and the base material 11 IB.
  • the multi-design glitter thread 110 has an overall thickness of approximately 21 m, and one surface can be observed as a hologram, and the other surface can be brightly observed as a separate glitter pattern using a diffraction grating. But even in the dark, I could observe and identify it at a glance. Furthermore, when copied with a color copier, the hologram's unique brightness was completely different from the hologram and copy of the thread, and the authenticity could be judged at a glance.
  • a 6 ⁇ m thick PET film was used as substrate 111A, and substrate 111B was used.
  • a multi-pattern glittering thread 110 was obtained in the same manner as in Example B1.
  • the multi-design glitter thread 110 has an overall thickness of approximately 21 m, a hologram on one surface, and a separate glitter pattern with a diffraction grating can be brightly observed on the other surface. Moreover, even in the dark, it was possible to observe and identify with a glance. Furthermore, when copying with a color copier, there was no hologram-specific brightness, and the hologram and copy of the thread were completely different, and authenticity could be judged at a glance.
  • a multi-pattern glitter thread was obtained in the same manner as in Example B1, except that a PET film having a thickness of 16 ⁇ m was used as the base material 111A and the base material 111B.
  • the multi-design glitter thread 110 had an overall thickness of approximately 35 m, and one surface could be a hologram, and the other surface could be brightly observed with another glitter pattern made of a diffraction grating.
  • a multi-pattern glitter thread was obtained in the same manner as in Example B1 except that a PET film having a thickness of 25 ⁇ m was used as the base material 111A and the base material 111B.
  • a multi-pattern glittering thread 110 was obtained in the same manner as in Example B1, except that a sputtering method was used to form a titanium oxide thin film having a thickness of lOOnm as the reflective layer 117A.
  • the multi-pattern glitter thread 110 has an overall thickness of approximately 15 m, and one surface is formed by a diffraction grating. A bright and holographic pattern was observed, and the other surface was brightly observed with a separate transparent glitter pattern with a diffraction grating. Furthermore, when copying with a color copier, one of the holograms and copies of the thread with the unique brightness of one program was completely different, and the other side of the grating with the unique brightness of the other grating could be judged at a glance. .
  • a plurality of design glitter threads 110 was obtained in the same manner as in Example B1, except that the ionizing radiation-curable resin composition A was used as the coating liquid for the relief forming layers 115A and 115B.
  • the multi-design glitter thread 110 had an overall thickness of approximately 15 / z m, and a bright glitter pattern could be observed brightly on one side and a diffraction grating on the other side.
  • Polyester resin is applied to the surface on which the relief forming layer 115 of the base material 111A and the base material 111B is to be formed with a gravure reverse coater, and dried at 100 ° C, and an interlayer primer layer 113A having a thickness of 0.5 ⁇ m. And 113B were formed in the same manner as in Example B1 to obtain a multi-design glittering thread 110.
  • the multi-design glitter thread 110 has an overall thickness of approximately 16 m, a hologram on one surface, and a separate transparent glitter pattern with a diffraction grating can be clearly observed on the other surface, and In addition, since the interlayers are firmly bonded, the durability that peeling hardly occurs is good.
  • Polyester resin is applied to the surface on which the relief forming layer 115 of the base material 111A and the base material 111B is to be formed with a gravure reverse coater, and dried at 100 ° C, and an interlayer primer layer 113A having a thickness of 0.5 ⁇ m. And 113B were formed in the same manner as in Example B2 to obtain a multi-design glitter thread 110.
  • the multi-design glitter thread 110 has an overall thickness of approximately 13 m, a hologram on one surface, and a separate transparent glitter pattern with a diffraction grating can be clearly observed on the other surface, and In addition, since the interlayers are firmly bonded, the durability that peeling hardly occurs is good.
  • Example B1 After producing in Example B1, the first substrate 111A of the first glittering film and the second substrate 111B of the second glittering film are bonded by a known dry lamination method.
  • 1st glitter film After applying a two-component curable polyurethane adhesive to the surface of the first substrate 111A using a gravure coating method to a thickness of 1.5 / zm after drying, the second glittering film The second substrate 111B surface was overlaid and pressurized, then left at 40 ° C for 3 days, then slit with a precision micro slitter machine to a width of 1.5 mm to form a narrow thread. A glittering thread 110 was obtained.
  • the multi-design glitter thread 110 has an overall thickness of approximately 15 / zm, and one surface has a hologram and the other surface can be brightly observed with a separate glitter pattern by a diffraction grating.
  • a diffraction grating a diffraction grating
  • the above-mentioned ionizing radiation curable resin composition A was applied on the reflective layer 17B of the first glittering film prepared in Example B1 and the second glittering film prepared in Example B1, the above-mentioned ionizing radiation curable resin composition A was applied. Coating with a gravure reverse coater and drying at 100 ° C to form a protective layer 25 having a thickness of 0.5 ⁇ m, and using these, the reflective layer 17A of the first glittering film and the first Bonding is performed by a known dry lamination method so that the second substrate 11B of the glitter film 2 is opposed.
  • the multi-design glitter thread 10 of Example 11 was obtained.
  • the multi-design glitter thread 10 had an overall thickness of approximately 15 m, and a bright glitter pattern on one side of the hologram and a bright grating on the other side could be observed.
  • the above-mentioned ionizing radiation curable resin composition A was applied to the surface of the first substrate 111A of the glittering film with a gravure reverse coater. Then, it was dried at 100 ° C. to form a relief forming layer 115B having a thickness of 1 m.
  • a stamper copied by the diffraction grating mirror 2P method is applied to the surface of the relief forming layer. It was attached to an embossing roller and heated and pressed (embossed) with an opposing roller to form a relief with a fine uneven pattern force. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • a 500 nm thick aluminum thin film is formed on the relief surface of the relief forming layer 115B by vacuum deposition to produce a multi-pattern glitter film as the reflective layer 117B, and slit to a width of 1.5 mm with a precision micro slitter machine.
  • a multi-pattern glittering thread 110 of Example B12 was obtained as a narrow thread.
  • the multi-design glitter thread 110 had an overall thickness of approximately 8 ⁇ m, and a bright glitter pattern with a diffraction grating on one surface could be observed brightly on one surface.
  • the ionizing radiation curable resin composition A was applied to the reflective layer 117A surface of the glittering film with a gravure reverse coater. Then, it was dried at 100 ° C. to form a relief forming layer 115B having a thickness of 1 m.
  • a stamper duplicated by 2P method on the surface of the relief forming layer is attached to the embossing roller of the duplicating apparatus, and heated and pressed (embossed) with the opposing roller to make fine Relief that has uneven pattern force was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • a 500 nm thick aluminum thin film is formed on the relief surface of the relief forming layer 115B by vacuum deposition to produce a multi-pattern glitter film as the reflective layer 117B, and slit to a width of 1.5 mm with a precision micro slitter machine.
  • a multi-design glittering thread 10 of Example B13 was obtained as a narrow thread.
  • the multi-design glitter thread 110 had an overall thickness of about 8 / zm, and one surface could be a bright image with one surface being a hologram and the other surface being a diffraction grating.
  • Example B13 Using the multi-pattern glitter thread produced in Example B13, apply a two-component curable polyurethane adhesive to the reflective layer 117B surface by the dry via coating method so that the thickness after drying is 1.5 m. After drying, using Lumirror 6CF53 (product name: PET film product), 6 ⁇ m thick as the protective substrate 30, the protective substrate 30 and the adhesive layer of the urethane adhesive are overlapped. After pressurizing and leaving at 40 ° C for 3 days, slitting to a width of 1.5 mm with a precision micro slitter machine, and making it a narrow thread, the multiple design glittering thread of Example B 14 Red 110 was obtained.
  • Lumirror 6CF53 product name: PET film product
  • the multi-design glitter thread 110 had an overall thickness of approximately 8 m, and a bright glitter pattern could be observed brightly on one side of the hologram and on the other side of the diffraction grating. Further, this thread has good durability because the second support base material acts as a protective base material and the reflective layer 117B is coated.
  • the multi-design glittering thread 110 obtained in Examples Bl to 14 is incorporated into the stock.
  • NBK P20 parts by mass and LBKP80 parts by mass were beaten, and 10 parts by mass of white clay, 0.3 part by mass of paper strength enhancer, 1.0 part by mass of sizing agent, and an appropriate amount of sulfuric acid band were added to prepare a stock.
  • two layers are combined with a two-tank circular paper machine at a papermaking speed of 50 mZ. At this time, the thread produced as described above was flowed to a predetermined position with the hologram surface as the surface.
  • the wet paper was dehydrated according to a known general method and dried with a dryer, so that the thread was attached to the base paper 101, and the anti-counterfeit paper which is the glittering multi-pattern formation 100 of the present invention was manufactured. .
  • the obtained anti-counterfeit paper had a thread embedded in the base paper layer in the paper flow direction with the thread surface exposed! Holograms can be seen on the thread surface of the anti-counterfeit paper, and when the thread is forcibly peeled off, the diffraction grating is visually recognized on the back surface of the multi-pattern glitter thread 110 produced in Examples B1 to B14. It was possible to clearly observe different glitter patterns on both sides. In addition, when copying with a color copier, the hologram and copy of the thread that has the unique brightness of one hologram are completely different, and the other diffraction grating also has a unique brightness and both sides can be judged at a glance. It was.
  • the reflective layer 117B was not exposed on the surface but was covered with the protective layer 125, and the durability was further improved.
  • this thread has good durability because the second support base material acts as a protective base material.
  • Example B1 Incorporate the multi-design glitter thread 110 obtained in Example B1 into the stock, except that the surface of the thread is exposed and the stock on the back of the thread is shaded in the flow direction.
  • anti-counterfeit paper which is a glittering multiple-pattern formation 100, was produced.
  • the obtained anti-counterfeit paper has a hologram on the thread surface, and a thin part of the material on the back with a glittering diffraction grating. I was able to observe exactly.
  • the anti-counterfeit paper which is a multi-design glittering product, was produced using the multi-design glitter thread obtained in Reference Example B1 in the same manner as in Example B10.
  • the thread portion has a hump shape, and the hump force is generated.
  • the thread portion swelled and lacked a sense of unity as anti-counterfeit paper.
  • the reactive organism (A) was produced by the following procedure.
  • 0.38 g of hydroquinone monomethyl ether, 249.3 g of pentaerythritol tritalylate (product of Osaka Organic Chemical Industry Co., Ltd., Biscoat 300) and 0.38 g of dibutyltin dilaurate were charged.
  • An ionizing radiation-curable resin composition B was prepared by adding the reaction product (A), a film-forming resin, a photopolymerization initiator, and a solvent in the following composition.
  • Reactive organism (A) 24 parts by weight
  • Film-forming resin (methacrylic resin: Kuraray product Norapet GF) 6 parts by weight Photopolymerization initiator (Irgacure 184) 0.9 parts by weight
  • Lumirror 6CF53 manufactured by Torayen clay, trade name of PET film having a thickness of 6 ⁇ m was used as the base material 311.
  • the above-mentioned ionizing radiation curable resin composition M was applied to one surface of the substrate 311 with a gravure reverse coater and dried at 100 ° C. to form a relief forming layer 315A having a thickness of 1 m. .
  • a stamper duplicated by the 2P method from the rainbow hologram (pattern 1: repeated pattern of the character string “abc”) by the two-beam method is attached to the relief forming layer surface to the emboss roller of the duplicating apparatus, and the opposite roller.
  • a relief with a fine concavo-convex pattern was formed by hot pressing (embossing). Immediately after shaping, it was cured by irradiating ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 315A by a vacuum deposition method to obtain a metal thin film layer 317A.
  • Byron 200 (polyester resin product name, manufactured by Toyobo Co., Ltd.) was applied to the 317A surface of the metal thin film layer with a gravure reverse coater and dried at 100 ° C to a thickness of 0.5 ⁇ m.
  • the interlaminar primer layer 321B is formed, and the surface of the interlayer primer layer 321B is further coated with the above-mentioned ionizing radiation curable resin composition M with a gravure reverse coater and dried at 100 ° C to obtain a thickness.
  • m relief forming layer 315B was formed.
  • a stamper duplicated by the 2P method from the rainbow hologram (pattern 2: repeated pattern of the character string “xyz”) by the two-beam method is attached to the relief forming layer surface to the embossing roller of the duplicating device and opposed.
  • Heat relief was performed between the rollers to form a relief with a fine uneven pattern force.
  • it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • An aluminum thin film (metal thin film layer 317B) having a thickness of 500 nm was formed on the relief surface of the relief forming layer 315B by vacuum deposition.
  • the glittering film 310 of Example C1 was obtained.
  • a glittering film 310 was obtained in the same manner as in Example C1, except that a 12-m PET film was used as the substrate.
  • a glittering film 310 was obtained in the same manner as in Example C1, except that a 16 m PET film was used as the substrate. [0276] (Example C4)
  • a glittering film 310 was obtained in the same manner as in Example C1, except that the ionizing radiation curable resin composition A was used as the ionizing radiation curable resin composition.
  • a glittering film 310 was obtained in the same manner as in Example C4, except that a 12 m PET film was used as the substrate.
  • a glittering film 310 was obtained in the same manner as in Example C4, except that a 16 m PET film was used as the substrate.
  • Example C 1 Metallic thin film layer 310 of the glittering film 310
  • the above-mentioned ionizing radiation curable resin composition A was applied to the 317B surface with a gravure reverse coater, dried at 100 ° C, and a thickness of 0.5 ⁇ m.
  • m protective layer 325 was formed.
  • Example C 1 After coating and drying a two-component curable polyurethane adhesive on the 317B surface with a gravure coat method so that the thickness after drying is 1.5 m. , Using Lumirror 6CF53 (product name: PET film product made by Torayen clay) with a thickness of 6 m as the base material 301, the base material 301 and the polyurethane adhesive were overlapped and pressurized, and then at 40 ° C for 3 days This was allowed to stand to obtain a glittering film of Example C8.
  • Lumirror 6CF53 product name: PET film product made by Torayen clay
  • Lumirror 6CF53 manufactured by Torayen clay, trade name of PET film having a thickness of 6 ⁇ m was used as the base material 311.
  • the ionizing radiation curable resin composition B described above is applied to one surface of the substrate 311 with a gravure reverse coater and dried at 100 ° C. to form a relief forming layer 315A having a thickness of 1 m. Formed.
  • a stamper duplicated by the 2P method from the rainbow hologram (pattern 1: repeated pattern of the character string “abc”) by the two-beam method is attached to the relief forming layer surface to the emboss roller of the duplicating apparatus, and the opposite roller.
  • a relief with a fine concavo-convex pattern was formed by hot pressing (embossing). Immediately after shaping, it was cured by irradiating ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 315A by a vacuum deposition method to obtain a metal thin film layer 317A.
  • Byron 200 (polyester resin product name, manufactured by Toyobo Co., Ltd.) was applied to the 317A surface of the metal thin film layer with a gravure reverse coater and dried at 100 ° C to a thickness of 0.5 ⁇ m.
  • m-layer primer layer 321B was formed, and the surface of the interlayer primer layer 321B was further coated with ionizing radiation curable resin composition A with a gravure reverse coater and dried at 100 ° C to obtain a thickness of 1 m.
  • a relief forming layer 315B was formed.
  • the rainbow hologram (pattern 2: repeated pattern of character string “xyz”) force by the two-beam method is applied to the relief forming layer surface, and the stamp duplicated by the 2P method is attached to the embossing roller of the duplicating apparatus and opposed.
  • a relief (positive pattern) with a fine uneven pattern force was formed by heating (embossing) between the rollers.
  • it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • a 300 nm thick titanium oxide thin film was formed on the relief surface of the relief forming layer 315B by vacuum deposition to form a metal thin film layer 317B.
  • the glittering film 310 of Example C9 was obtained.
  • Example C9 When the glitter film 310 of Example C9 was observed through the base material (PET), a repeated pattern (positive pattern) of the character string “abc” was observed as shown in FIG. When observed from the opposite side, a repetitive pattern (negative pattern) of the character string “abc” was observed over a repetitive pattern (positive pattern) of the character string “xyz”. Two patterns on the front and one pattern on the back were observed, and the hologram was extremely high in design. A good reproduction that could not be taken off was obtained.
  • the above-mentioned ionizing radiation curable resin composition B was applied to the PET surface opposite to the first metal thin film layer 317A using a gravure river coater. It was applied and dried at 100 ° C. to form a third relief forming layer 315C having a thickness of 1 ⁇ m. Next, a rainbow hologram (pattern 3: text) by the two-beam method is applied to the relief forming layer surface.
  • a stamper duplicated by the 2P method is attached to the embossing roller of the duplicating machine, and is heated and pressed (embossed) with the opposite roller to provide a relief with fine concave and convex pattern force.
  • a metal thin film layer 317C was formed by forming a 500 nm thick aluminum thin film on the relief surface of the third relief forming layer 315C by vacuum deposition.
  • Example C10 When the glitter film 310 of Example C10 was observed from the third relief forming layer 315C side, a repeated pattern of the character string “ghi” was observed as shown in FIG. When observed from the opposite side, a repetitive pattern (negative pattern) of the character string “abc” was observed over a repetitive pattern (positive pattern) of the character string “xyz”. A good reproduction that could not be removed was obtained.
  • Byron 200 (manufactured by Toyobo Co., Ltd., trade name for polyester resin) was applied to the third metal thin film layer 317C of the glittering film 310 of Example C8 and dried at 100 ° C using a gravure reverse coater. Then, a second interlayer primer layer 321D having a thickness of 0.5 m was formed, and the above-mentioned ionizing radiation curable resin composition M was further applied to the second interlayer primer layer 321D surface with a gravure river scooter. Then, it was dried at 100 ° C. to form a fourth relief forming layer 315D having a thickness of 1 ⁇ m.
  • a stamper copied by the 2P method from a rainbow hologram (pattern 4: repetitive pattern of the pattern “star”) by the two-beam method is attached to the relief forming layer surface to the embossing roller of the copying apparatus, and the opposite roller
  • a relief with a fine concave / convex pattern force was formed by hot pressing (embossing).
  • it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • a fourth titanium thin film layer 317D was formed by forming a 300 nm thick transparent titanium oxide thin film on the relief surface of the fourth relief forming layer 315D by vacuum deposition.
  • Example C11 When the glittering film 310 of Example C11 is observed from the fourth relief forming layer 315D side, the repeated pattern of the character string “ghi” is observed over the repeated pattern of the pattern “star” as shown in FIG. It was done. When observed from the opposite side, the repeated pattern (negative pattern) of the character string “abc” is observed over the repeated pattern (positive pattern) of the character string “xyz”. It was. A good reproduction that could not be taken off was obtained.
  • the glitter film 310 obtained in Examples C1 to C11 is incorporated into a paper stock.
  • NBKP20 parts by mass and LBKP80 parts by mass were beaten, and a stock was prepared by adding 10 parts by mass of white clay, 0.3 parts by mass of paper strength enhancer, 1.0 part by mass of sizing agent, and a sulfuric acid band.
  • two layers are combined with a two-tank type circular paper machine at a papermaking speed of 50 mZ.
  • the thread produced as described above was flowed to a predetermined position with the hologram surface as the surface.
  • the wet paper was dehydrated according to a known general method and dried with a drier, so that the thread adhered to the base paper 301, and the anti-counterfeit paper, which is the glitter pattern formation 300 of the present invention, was produced.
  • the obtained anti-counterfeit paper had the thread surface exposed, and the thread was embedded in the base paper layer in the paper flow direction!
  • the glitter surface of the anti-counterfeit paper was clearly observed with different glittering patterns on both sides described in each example.
  • the hologram and copy of the thread that has the unique brightness of one of the holograms was completely different, and the authenticity of both sides could be judged at a glance.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Security & Cryptography (AREA)
  • Credit Cards Or The Like (AREA)
  • Laminated Bodies (AREA)

Abstract

La présente invention décrit un film brillant à motifs multiples capable de produire un motif brillant et un effet optique spéciaux tels qu'un hologramme et un réseau de diffraction en disposant deux motifs brillants différents. On peut facilement fabriquer le film à un faible coût. Le film possède au moins un premier motif brillant et un second motif brillant qui est différent du premier motif brillant.
PCT/JP2006/302276 2005-02-09 2006-02-09 Film brillant à motifs multiples, del brillante à motifs multiples et produit brillant à motifs multiples les utilisant WO2006085597A1 (fr)

Applications Claiming Priority (6)

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JP2005-033399 2005-02-09
JP2005-033398 2005-02-09
JP2005033399 2005-02-09
JP2005033398 2005-02-09
JP2005-103891 2005-03-31
JP2005103891 2005-03-31

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Cited By (9)

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JP2008077042A (ja) * 2006-08-22 2008-04-03 Dainippon Printing Co Ltd 立体模様が表現された回折格子記録媒体の作成方法
JP2008119910A (ja) * 2006-11-10 2008-05-29 Dainippon Printing Co Ltd 偽造防止材及びこれを備えた印刷基材
JP2009125966A (ja) * 2007-11-20 2009-06-11 Toppan Printing Co Ltd 偽造防止用転写箔及び偽造防止媒体
JP2009262384A (ja) * 2008-04-24 2009-11-12 Toppan Printing Co Ltd セキュリティフィルム
JP2010054920A (ja) * 2008-08-29 2010-03-11 Toppan Printing Co Ltd 表示体及び光学効果機能の発現方法
JP2011164554A (ja) * 2010-02-15 2011-08-25 Sony Corp ホログラム記録媒体
JP2012093781A (ja) * 2006-08-22 2012-05-17 Dainippon Printing Co Ltd 立体模様が表現された回折格子記録媒体の作成方法
JP2013033263A (ja) * 2012-09-13 2013-02-14 Dainippon Printing Co Ltd 偽造防止材及びこれを備えた印刷基材
CN111064712A (zh) * 2019-11-29 2020-04-24 珠海金山网络游戏科技有限公司 一种游戏资源打包方法及系统

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JPH10323930A (ja) * 1997-05-23 1998-12-08 Pilot Ink Co Ltd 光輝性熱変色性積層体
JP2002323846A (ja) * 2001-04-25 2002-11-08 Toppan Forms Co Ltd ホログラムシートの製造方法

Patent Citations (2)

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JPH10323930A (ja) * 1997-05-23 1998-12-08 Pilot Ink Co Ltd 光輝性熱変色性積層体
JP2002323846A (ja) * 2001-04-25 2002-11-08 Toppan Forms Co Ltd ホログラムシートの製造方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008077042A (ja) * 2006-08-22 2008-04-03 Dainippon Printing Co Ltd 立体模様が表現された回折格子記録媒体の作成方法
JP2012093781A (ja) * 2006-08-22 2012-05-17 Dainippon Printing Co Ltd 立体模様が表現された回折格子記録媒体の作成方法
JP2008119910A (ja) * 2006-11-10 2008-05-29 Dainippon Printing Co Ltd 偽造防止材及びこれを備えた印刷基材
JP2009125966A (ja) * 2007-11-20 2009-06-11 Toppan Printing Co Ltd 偽造防止用転写箔及び偽造防止媒体
JP2009262384A (ja) * 2008-04-24 2009-11-12 Toppan Printing Co Ltd セキュリティフィルム
JP2010054920A (ja) * 2008-08-29 2010-03-11 Toppan Printing Co Ltd 表示体及び光学効果機能の発現方法
JP2011164554A (ja) * 2010-02-15 2011-08-25 Sony Corp ホログラム記録媒体
JP2013033263A (ja) * 2012-09-13 2013-02-14 Dainippon Printing Co Ltd 偽造防止材及びこれを備えた印刷基材
CN111064712A (zh) * 2019-11-29 2020-04-24 珠海金山网络游戏科技有限公司 一种游戏资源打包方法及系统
CN111064712B (zh) * 2019-11-29 2022-03-18 珠海金山网络游戏科技有限公司 一种游戏资源打包方法及系统

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