WO2006009162A1 - プラズマ放電パネル、及びプラズマ放電パネル製造用基板 - Google Patents
プラズマ放電パネル、及びプラズマ放電パネル製造用基板 Download PDFInfo
- Publication number
- WO2006009162A1 WO2006009162A1 PCT/JP2005/013296 JP2005013296W WO2006009162A1 WO 2006009162 A1 WO2006009162 A1 WO 2006009162A1 JP 2005013296 W JP2005013296 W JP 2005013296W WO 2006009162 A1 WO2006009162 A1 WO 2006009162A1
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- WIPO (PCT)
- Prior art keywords
- phosphor film
- substrate
- plasma discharge
- partition wall
- discharge panel
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/36—Spacers, barriers, ribs, partitions or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/10—AC-PDPs with at least one main electrode being out of contact with the plasma
- H01J11/12—AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
- H01J2211/20—Constructional details
- H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
- H01J2211/36—Spacers, barriers, ribs, partitions or the like
- H01J2211/361—Spacers, barriers, ribs, partitions or the like characterized by the shape
- H01J2211/363—Cross section of the spacers
Definitions
- the present invention relates to a technical field of a plasma discharge panel suitable for use in, for example, a plasma display device and a substrate for manufacturing a plasma discharge panel.
- Patent Document 1 Various types of such plasma discharge panels have been proposed (see, for example, Patent Document 1).
- Patent Document 1 According to the gas discharge panel proposed in Patent Document 1 (hereinafter referred to as “prior art”), a phosphor film having a shape in which the bottom film thickness is thicker than the side wall thickness of the barrier ribs is formed to make the discharge space as wide as possible. By doing so, it is said that a relatively high luminous efficiency can be obtained even if the cell structure is miniaturized.
- Patent Document 1 Japanese Unexamined Patent Publication No. 2000-231884
- the present invention has been made in view of the above-described problems, for example, and an object thereof is to provide a plasma discharge panel having high luminous efficiency and a substrate for manufacturing a plasma discharge panel according to the manufacture thereof. .
- a plasma discharge panel includes a first substrate including a first electrode and a second electrode facing the first electrode, and the distance from the first substrate is increased.
- a second substrate that is opposed to the first and second substrates, a partition wall that is disposed between the first and second substrates, and that defines a closed space together with the first and second substrates; the partition wall and the first substrate;
- a phosphor film formed on at least a part of a surface portion defining the sealed space, and a predetermined type of gas filled in a discharge space surrounded by the phosphor film in the sealed space;
- the surface portion defining the sealed space in the partition wall has a recessed portion that is recessed toward the outside of the sealed space, and the phosphor film is also formed in the recessed portion.
- the sealed space is defined by the first substrate, the second substrate, and the partition.
- a phosphor film is formed on at least a part of the surface portion defining the sealed space in the first substrate and the partition wall.
- the plasma discharge panel of the present invention during the operation, a predetermined type of gas filled in the discharge space surrounded by the phosphor film is discharged in the sealed space.
- the light in the ultraviolet region (hereinafter referred to as “ultraviolet light” as appropriate) generated by this gas discharge has, for example, wavelengths near 143 nm and 172 nm, and excites the phosphor film defined in the discharge space to make it visible region.
- Of light hereinafter referred to as “visible light” where appropriate).
- the visible light generated in this way is visible to the outside.
- a rare gas such as Ne, Xe, or Ar is enclosed as a single substance or a mixture.
- the “predetermined type of gas” means that the ultraviolet light necessary to excite the phosphor film, as represented by these chemically inert gases, can be generated. It is a concept that generically refers to gases that do not hinder the operation of the plasma discharge panel.
- the plasma discharge panel of the present invention can take various forms as long as the visible light is obtained by exciting the phosphor with ultraviolet light.
- a form called an AC surface discharge type the “first electrode” in the present invention is formed on the glass substrate by a technique such as photolithography, and the “first substrate” according to the present invention is formed.
- the first electrode is formed as a plurality of electrodes extending in the row direction and parallel in the column direction.
- the first electrode is formed by stacking, for example, three layers of CrZCuZCr, and is also referred to as “address electrode” or “data electrode”.
- the material and configuration of the first electrode may be freely determined within a range that does not hinder the operation of the plasma discharge panel of the present invention in view of adhesion to the substrate serving as a base, conductive characteristics, and the like.
- Ag or A1 may be used.
- the dielectric layer made of an insulating material may be formed by a technique such as sputtering. That is, in the present invention, the “first substrate” is not limited to a single substrate (here, a glass substrate) on which the first electrode is formed, but the dielectric layer as described above and various protective layers on the upper side. This is to the effect that a film, various functional films, or the like may be formed over one layer or multiple layers.
- the second substrate is provided to face the first substrate at a distance. Similar to the first substrate, the second substrate includes a glass substrate and a second electrode formed on the lower side (first substrate side) by photolithography or the like.
- the second substrate may be provided with a dielectric layer for the same purpose as the first substrate. Further, a protective layer having an MgO force, for example, may be provided below the dielectric layer. That is, the “second substrate” in the present invention is also a generic term for a substrate including a base material such as a glass substrate and further having a variety of functional films formed on the base material.
- the second electrode is formed as a plurality of electrodes that intersect with the first electrode in a plan view, preferably extend in an orthogonal direction (that is, the column direction) and are arranged in parallel in the row direction. Is done. That is, when the first and second substrates are viewed from above, the first electrode and the second electrode intersect like a mesh. In this case, the electrodes are opposed to each other at a portion corresponding to each intersection.
- Each of the second electrodes is a pair of electrodes extending in the column direction formed as a transparent conductive film such as ITO (Indium Tin Oxide), for example.
- the pair of electrodes is referred to as a “scanning electrode” and a “sustain electrode”, respectively.
- both electrodes may be referred to as “display electrodes”.
- the pair of electrodes is It is formed to be supplied with voltage from a metal electrode called a bus electrode! Also
- Each of the second electrodes does not necessarily form an electrode pair. In this case, a so-called “dual electrode type” is adopted.
- partition walls also referred to as "ribs” that define the above-described sealed space are disposed together with these substrates.
- the barrier rib generally has a stripe structure extending in the row direction and parallel in the column direction corresponding to the first electrode formed extending in the row direction.
- a stripe structure also referred to as a waffle structure
- partition walls having a stripe structure are further divided in the row direction may be provided.
- the barrier ribs having a stripe structure and the barrier ribs that divide the barrier ribs may be formed individually or integrally.
- the shape of the partition when the cross section is viewed in the row direction is either a shape perpendicular to the first substrate or a forward tapered shape (smaller toward the upper side). Super shape (larger toward the top!)! /
- the discharge space surrounded by the phosphor film is, for example, when the barrier ribs have a cross-beam structure, each of which is a plasma discharge panel.
- a cell that is a light-emitting unit is defined.
- one cell is defined in the column direction and the number of cells arranged in parallel by the number of second electrodes is defined in the row direction.
- Each of the cells thus defined can be a plasma discharge panel of the present invention.
- the discharge generated in the discharge space includes, for example, a selective discharge for selecting a cell and a display discharge for causing a cell selected by the selective discharge to emit light.
- the former is performed, for example, by applying a voltage to the address electrode to be selected while the voltage is applied to the scan electrode.
- the latter is performed by, for example, applying a voltage to the scan electrodes and the sustain electrodes after performing such cell selection for all the cells by sequentially scanning the scan electrodes.
- the display discharge may be performed using the address electrode.
- the manner of discharge can be freely determined as long as the desired discharge can be generated in the discharge space.
- the plasma discharge panel according to the present invention causes the cell to emit light by appropriately using the first and second electrodes. Therefore, the partition walls are preferably the first electrode and the second electrode described above. Spatial force corresponding to the intersection point in plan view with the discharge space.
- the arrangement location and shape of the barrier ribs may be freely determined.
- the bulkhead may be formed and arranged in a honeycomb shape, referred to as a meander structure.
- a phosphor film is formed on a surface portion defining the sealed space.
- this phosphor film is composed of three types of phosphor films corresponding to RGB, and each color is sequentially arranged in the column direction, and in the row direction. Regardless of the shape of the partition wall, the same color is formed.
- a pixel portion is composed of three cells that are continuous in the column direction and one cell in the row direction.
- the phosphor film formed in the sealed space is applied by, for example, a silk screen method.
- a phosphor ink composed of a phosphor, a resin material called a binder, and a solvent is applied to the surface portion of the discharge space, and the solvent and the binder are removed by drying and firing, respectively.
- a desired phosphor film is formed.
- the method of applying the phosphor film is not limited to the silk screen method, and may be any method as long as the phosphor film can be adhered and formed on the surface portion defining the sealed space.
- the piezo jet method is used. Also good.
- the surface area of the phosphor film formed on the surface portion defining the sealed space that is, the surface area of the phosphor film defining the discharge space greatly affects the luminous efficiency of visible light in cell units.
- the phosphor that hits the surface layer portion including the surface portion that defines the surface area of the phosphor film is most easily excited by ultraviolet light generated by discharge.
- One of the simplest ways to increase the surface area of the phosphor film is to increase the volume of the discharge space.
- high-definition (1980 x 1125 pixels) standards can be used.
- the cell pitch tends to be reduced, and accordingly, the volume of the cell, equivalently the volume of the discharge space, tends to decrease.
- cells that are severely reduced like this it is difficult to form the phosphor film with a desired film thickness.
- the surface portion that defines the sealed space in the partition wall has a recessed portion that is recessed toward the outside of the sealed space, and the phosphor film is the recessed portion. This problem is solved by being formed in the club.
- the partition wall has a depression, and the phosphor film is formed in the depression, thereby increasing the surface area of the phosphor film. Therefore, the amount of phosphor exposed to ultraviolet light increases, and high luminous efficiency can be obtained.
- increasing the surface area means that the surface area is larger or smaller than the case where the phosphor film is formed on the surface of the partition wall having no depression. Regardless of this, it means that the phosphor film force does not necessarily have to have a concave shape along the shape of the concave portion of the partition wall.
- the surface area of the phosphor film can be expanded by the recess provided in the partition wall.
- the amount of ultraviolet light generated by the discharge in units of cells increases, and the emission of the phosphor film is further promoted. That is, the surface area increase of the phosphor film and the volume expansion of the discharge space are in a complementary relationship, and an extremely good synergistic effect can be obtained.
- the luminous efficiency can be sufficiently improved only by increasing the surface area of the phosphor film.
- the "indentation” refers to the surface area of the surface portion that defines the discharge space in the phosphor film, regardless of its shape and size. It is a concept that broadly defines the physical shape that can be expanded somewhat as compared with the case where it is not provided. Therefore, even when the depression has a shape that is counted by the “number”, the number is not limited. Moreover, the formation location of a hollow part is not limited at all.
- the recess is located on the base side of the partition wall.
- the “root side” described here refers to, for example, the vicinity of the end portion on the first substrate side. Sealed sky Among the phosphor films formed between them, the site that contributes most to light emission is the phosphor film formed on the portion that defines the bottom of the discharge space, that is, the surface that defines the sealed space on the first substrate. Conceivable. In particular, in an embodiment called a reflective type in which visible light from a phosphor film is obtained through a facing substrate, there is nothing to block visible light from the bottom, so this partial power of visible light is the most emitted light. Affects efficiency. According to this aspect, since the recess is located on the base side of the partition wall, the area of the discharge space bottom can be expanded. Therefore, the luminous efficiency is greatly improved.
- the indented portion has a curved surface shape at least partially.
- the recess since the recess has a partially curved shape, the display quality is improved, in which the phosphor film is less likely to be damaged by the edge portion of the recess.
- the partition wall has a forward tapered portion in a portion excluding the recessed portion.
- the partition has the forward tapered portion.
- a forward tapered portion can be easily formed, and the manufacturing cost can be suppressed.
- the partition wall has a forward taper portion, the sealed space is generally relatively small, and thus the surface area of the phosphor film tends to be relatively small.
- the sealed space is expanded and the surface area of the phosphor film can be increased, which is very effective.
- the partition wall has a reverse tapered portion in a portion excluding the recessed portion.
- the partition has the inversely tapered portion.
- a reverse taper portion can make the sealed space relatively large due to its physical shape.
- the sealed space further expands due to the effect of the recessed portion, so that the surface area of the phosphor film is increased. Can be increased suitably, which is very effective.
- a substrate for manufacturing a plasma discharge panel has a first substrate having a first electrode, and a surface of the first substrate on the side where the first electrode is formed.
- a partition wall that defines an enclosed space together with the first substrate; and the partition wall.
- a phosphor film formed on at least a part of a surface portion defining the surrounding space on the wall and the first substrate, and a surface portion defining the surrounding space on the partition wall is a portion of the surrounding space.
- the phosphor film has a depression that is recessed toward the outside, and the phosphor film is also formed in the depression.
- the plasma discharge panel of the present invention as described above can be easily realized.
- the “enclosed space” described here refers to a space defined by the partition wall and the first substrate and having an opening in a part thereof. Accordingly, by disposing an object corresponding to the second substrate in the plasma discharge panel of the present invention at a position opposite to the first substrate in the enclosed space, at least a part of the enclosed space can be It can be a space equivalent to the sealed space in the invention.
- the plasma discharge panel of the present invention since the first substrate, the second substrate, the partition walls, the phosphor film, and the gas are provided, high luminous efficiency can be obtained. It is possible. According to the substrate for manufacturing a plasma discharge panel of the present invention, the plasma discharge panel of the present invention can be easily realized because it includes the first substrate, the partition walls, and the phosphor film.
- FIG. 1 is a schematic perspective view of a plasma discharge panel according to an embodiment of the present invention.
- FIG. 2 is a cross-sectional view in the column direction of cells in the plasma discharge panel of FIG. 1.
- FIG. 3 is a manufacturing process diagram of barrier ribs in the plasma discharge panel of FIG. 1.
- FIG. 4 is a schematic diagram of a phosphor film in the plasma discharge panel of FIG. 1.
- FIG. 5 is a schematic diagram of light emission in the plasma discharge panel of FIG. 1.
- FIG. 6 is a light emission schematic diagram of a plasma discharge panel according to a comparative example of the present invention.
- FIG. 7 is a schematic view of a partition wall according to a modification of the present invention.
- FIG. 1 is a schematic perspective view of the plasma discharge panel 100.
- FIG. 1 is a schematic perspective view of the plasma discharge panel 100.
- a plasma discharge panel 100 includes a back panel 10, a partition wall 20, a phosphor film 21, and a front panel 30.
- the back panel 10 is an example of the “first substrate” according to the present invention, and includes a glass substrate 11, address electrodes 12, and a dielectric layer 13.
- the glass substrate 11 is a glass substrate and is a base material of the back panel 10.
- the address electrode 12 is a strip-like electrode that extends in the row direction and is formed at equal intervals in the column direction, and is an example of the “first electrode” according to the present invention.
- the address electrode 12 is formed as a thin film of Cr, Cu, Cr in this order on the glass substrate 11 and then patterned by photolithography.
- the dielectric layer 13 is a thin film that physically and electrically protects the address electrodes 12 and shields a discharge space, which will be described later, from direct current.
- the dielectric layer 13 is made of aluminum oxide, titanium oxide, silicon dioxide or silicon.
- the partition wall 20 is an insulating wall member formed on the upper side of the back panel 10.
- the barrier ribs 20 are formed on the back panel 10 at portions corresponding to the address electrodes 12 adjacent to each other. Accordingly, the space formed by the partition walls 20 is a groove-like space extending in the row direction, like the address electrodes 12. The detailed configuration of the partition wall 20 will be described later.
- the phosphor film 21 is a phosphor thin film continuously formed on a surface portion that hits the inner wall of the partition wall 20 and a surface portion that hits the upper side of the dielectric layer 13.
- the phosphor film 21 is composed of three types of phosphor films: a phosphor film 21R corresponding to red, a phosphor film 21G corresponding to green, and a phosphor film 21B corresponding to blue. They are arranged in RGB order.
- the front panel 30 includes a glass substrate 31, a display electrode 32, a dielectric layer 33, and a protective film 34.
- the glass substrate 31 is a glass substrate and is a base material for the front panel 30.
- the display electrode 32 is made of ITO, extends in the column direction, and is arranged in parallel in the row direction.
- Each display electrode 32 includes a pair of a scan electrode 32a and a sustain electrode 32b.
- the dielectric layer 33 is provided to shield the front panel 30 from direct current and to protect the display electrode 32 physically and electrically.
- the protective film 34 is a protective film having a magnesium oxide force.
- barrier ribs 20, phosphor films 21, address electrodes 12, and display electrodes 32 define one cell which is a light emission unit of plasma discharge panel 100.
- FIG. 2 is a cross-sectional view in the column direction of one arbitrary cell in FIG.
- FIG. 2 the same parts as those in FIG.
- the partition wall 20 basically has a forward tapered shape in which the front panel 30 side force gradually widens toward the back panel 10 side.
- the wall surface of the partition wall 20 has a recessed portion that is recessed in a direction extending the space surrounded by the partition wall 20, the front panel 30, and the rear panel 10 near the end on the rear panel 10 side. . Therefore, the shape of the phosphor film 21 formed on the wall surface of the partition wall 20 also has a gentle taper slope near the recess due to the effect of the recess.
- a space surrounded by the wall surface of the partition wall 20, the phosphor film 21, and the protective film 34 is filled with, for example, a rare gas such as Ar or Xe, and discharge of these gases is performed. It is a space (that is, an example of the “discharge space” according to the present invention). That is, the surface portion of the barrier rib has a dent that is recessed toward the outside of the discharge space.
- FIG. 3 is a manufacturing process diagram of the partition wall 20.
- the same parts as those in FIG. 3 are identical to those in FIG. 3.
- a photosensitive resin material is first uniformly applied on the back panel 10 to form a photosensitive resin layer 22 (FIG. 3 (a)).
- Application methods include, for example, roll coating, As long as it is possible to apply a photosensitive resin material on the back panel 10 such as a coating method, a screen printing method, or a piezo jet method, it is free.
- this photosensitive resin layer 22 is masked with an exposure mask 23 (FIG. 3 (b)) so that the portion where the partition wall 20 is formed is shielded from the irradiation light (FIG. 3 (b)) and exposed (FIG. 3). (c)).
- the portion irradiated with light is cured.
- the irradiated light attenuates. Therefore, as shown in FIG.
- the surface force of the oil layer 22 also has a reverse taper shape that gradually narrows toward the back panel 10.
- the bottom of the cured portion of the photosensitive resin layer 22 is It sticks out and hardens.
- the scattered light from the dielectric layer 13 attenuates according to the distance from the dielectric layer 13, the protruding portion has a gentle spherical shape.
- the removed portion (that is, the female type) in the photosensitive resin layer 22 is made of a thermosetting resin by, for example, a roll coating method, a die coating method, a screen printing method, or a piezo jet method. Apply barrier rib material paste (Fig. 3 (e)).
- the cured portion of the photosensitive resin layer 22 is removed by baking, and after the removal, the partition wall material paste is cured by baking to complete the partition wall 20.
- the phosphor film 21 is formed, thereby completing an example of the “plasma discharge panel manufacturing substrate” according to the present invention.
- the manufacturing process of the partition wall 20 shown in FIG. 3 is an example, and the manufacturing process of the partition wall 20 is not limited to this.
- the photosensitive resin layer 22 may be divided into two layers. That is, a first photosensitive resin layer mixed with a scattering facilitating substance such as silicon dioxide, titanium oxide, or aluminum oxide is formed on the rear panel 10 side, and the second photosensitive resin layer as described above is formed on the upper side. A photosensitive resin layer is formed.
- the scattering facilitator is mixed Then, when the irradiation light reaches the first photosensitive resin layer at the time of exposure, light scattering similar to that described above occurs, and a recess can be easily formed in the partition wall 20.
- the material of the partition is not limited to thermosetting resin.
- photosensitive resin may be used.
- FIG. 4 is a schematic diagram of the phosphor film 21 formed on the partition wall 20. In the figure, the same parts as those in FIG.
- the phosphor film 21 is continuously formed in the surface portion of the cell that contacts the inner wall of the partition wall 20 and the surface portion of the dielectric layer 13.
- This phosphor film 21 is formed by, for example, applying a phosphor paste in which phosphor particles 2 la are dispersed in an organic binder and a solvent by screen printing or the like, removing the solvent by drying, and an organic binder by firing. It is formed through the removal of.
- the phosphor particles 21a are each excited by ultraviolet light during the operation described later.
- ultraviolet light does not reach the lower-layer phosphor particles 21a.
- the body film 21 need not be formed thicker than necessary. At this time, if the phosphor film 21 is formed too thick, the discharge space is reduced, which is not preferable. On the other hand, if the phosphor film 21 is too thin, it is not preferable because the amount of emitted light is reduced due to the gap formed between the phosphor particles 21a.
- the phosphor film 21 has a structure in which the phosphor particles 21a are stacked in a stone wall shape in a range of 3 to 5 steps. That is, for example, the phosphor film 21 is formed so as to have a thickness of about 3 to 5 times the average particle diameter of the phosphor particles 21a.
- the thickness of the phosphor film 21 may be determined including an appropriate margin according to the deviation of the particle diameter between the individual phosphor particles 21a. Good. Further, in the phosphor film 21, the particle diameter is large! / And the tendency of the phosphor particles to gather in the lower layer is strong. In this case, even if the phosphor film 21 is formed in consideration of such a tendency, Good.
- the viscosity of the phosphor paste, the weight ratio of the phosphor therein, the amount of the organic binder, the size of the phosphor particles, and the method for controlling the drying and firing profiles are experimental and empirical in advance. Alternatively, it may be determined so as to obtain the optimum phosphor film 21 by a technique such as simulation. ⁇ Operation of the embodiment>
- FIG. 5 is a schematic diagram of light emission in one cell of the plasma discharge panel 100
- FIG. 6 is a schematic diagram of light emission in the cell according to the comparative example of the present invention.
- the same reference numerals are assigned to the same parts as in FIG.
- the plasma discharge panel 100 applies a voltage to the address electrode 12 corresponding to a cell that emits light during a period in which a voltage is applied to one scan electrode 32a, and scans.
- the electrode 32a is sequentially scanned and the same operation is repeated to select a cell to emit light.
- a voltage is applied to scan electrode 32a and sustain electrode 32b, discharge occurs in the discharge space in the previously selected cell, and ultraviolet light is generated. Visible light is generated from the phosphor film 21 excited by the ultraviolet light and is visible on the front panel 30 side.
- FIG. 5 shows this light emission state.
- the plasma discharge panel 100 has a recess on the base side of the partition wall 20. Since the phosphor film 21 is also formed in this recess, the degree of inclination! / ⁇ is moderately weak at the bottom of the discharge space corresponding to the base side of the partition wall 20. Visible light is also generated from the portion of the phosphor film 21 corresponding to the depression of the partition wall 20. In the plasma discharge panel, the phosphor film that hits the bottom of the discharge space is considered to contribute the most to light emission. In the cell according to the plasma discharge panel 100, since the surface area of the phosphor film 21 is increased by the influence of the depression, the generation amount of visible light is effectively increased and good light emission is exhibited.
- FIG. 6 shows light emission of the cell according to the comparative example.
- This cell is different from the cell of the plasma discharge panel 100 in that a barrier 40 is provided instead of the barrier 20.
- the partition wall 40 has a so-called forward taper shape, and the force on the front panel 30 side linearly spreads toward the back panel 10 side.
- the phosphor film 21 is also formed along the shape of the partition wall 40, and the area of the phosphor film 21 at the bottom of the discharge space is significantly smaller than that of the cell according to the example. It is summer. Therefore, the amount of light emitted by the phosphor film 21 is clearly smaller than that of the cell according to the example.
- the discharge space is larger than that in the comparative example. Exciting phosphor film 21 by increasing discharge space As a result, the amount of ultraviolet light generated is increased, and excitation of the phosphor film 21 is further promoted. Therefore, the cell according to the embodiment increases the generation amount of visible light in a synergistic manner.
- the partition walls 20 in the individual cells have the recessed portions, so that the light emission efficiency can be significantly and easily increased.
- the recessed portion of the partition wall 20 may be provided on a side other than the root side as exemplified here. For example, it may be provided over the entire side wall surface of the partition wall 20 or partially.
- the shape of the recess may be any shape as long as the amount of visible light generated from the phosphor film 21 can be increased.
- the recess has a gentle spherical surface by the manufacturing process illustrated in FIG. 3, but it may be relatively sharply recessed, for example, a triangular pyramid.
- the basic shape of the partition wall 20 is not limited to the forward tapered shape as in the embodiment.
- the shape illustrated in FIG. FIG. 7 is a schematic diagram of a partition wall according to a modification of the present invention. In FIG. 7, parts that are the same as those in FIG. 2 are given the same reference numerals and explanation thereof is omitted.
- the partition may be a partition 20a having a vertically standing wall as illustrated in FIG. 7 (a).
- a partition wall 20b having a reverse taper shape gradually narrowing from the front panel (not shown) side toward the rear panel (not shown) side may be used. Regardless of the shape of the partition wall, the light emission efficiency of the cell can be easily improved by the effect of the recess according to the present invention.
- the plasma discharge panel and the substrate for manufacturing a plasma discharge panel according to the present invention can be used in technical fields such as a plasma display device.
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Cited By (1)
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JP2009023342A (ja) * | 2007-06-18 | 2009-02-05 | Canon Inc | 液体吐出ヘッドおよびその製造方法、構造体およびその製造方法 |
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JPH10188823A (ja) * | 1996-12-27 | 1998-07-21 | Kyocera Corp | プラズマディスプレイパネル用隔壁及びその製造方法 |
JPH10321147A (ja) * | 1997-05-20 | 1998-12-04 | Dainippon Printing Co Ltd | プラズマディスプレイパネル |
JPH11204041A (ja) * | 1998-01-13 | 1999-07-30 | Mitsubishi Electric Corp | 面放電型プラズマディスプレイパネル用基板及びその製造方法、並びに面放電型プラズマディスプレイパネル |
JP2000182523A (ja) * | 1998-12-10 | 2000-06-30 | Samsung Sdi Co Ltd | プラズマディスプレイパネル |
JP2001325886A (ja) * | 2000-05-17 | 2001-11-22 | Nec Corp | プラズマディスプレイパネル及びその製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2009023342A (ja) * | 2007-06-18 | 2009-02-05 | Canon Inc | 液体吐出ヘッドおよびその製造方法、構造体およびその製造方法 |
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