WO2006001095A1 - Substrate dome rotating mechanism - Google Patents
Substrate dome rotating mechanism Download PDFInfo
- Publication number
- WO2006001095A1 WO2006001095A1 PCT/JP2005/000851 JP2005000851W WO2006001095A1 WO 2006001095 A1 WO2006001095 A1 WO 2006001095A1 JP 2005000851 W JP2005000851 W JP 2005000851W WO 2006001095 A1 WO2006001095 A1 WO 2006001095A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- dome
- substrate
- side gear
- vacuum
- base
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
Definitions
- the present invention relates to a rotating mechanism for a substrate dome mounted on a vacuum apparatus.
- the vacuum vapor deposition method is a film forming method in which a vapor deposition material is evaporated in a state where a vacuum chamber is evacuated in advance to a high vacuum region, and a vapor deposition material is deposited on a substrate surface.
- a vapor deposition material is evaporated in a state where a vacuum chamber is evacuated in advance to a high vacuum region, and a vapor deposition material is deposited on a substrate surface.
- the evaporation distribution of the evaporation material in the vacuum chamber is not uniform, so a dome shape called a substrate dome is maintained.
- the present invention relates to a rotation mechanism of a rotation drive type substrate dome connected to a drive source with the center of the dome as a rotation axis.
- FIG. 5 shows a schematic configuration diagram of an optical thin film vacuum deposition apparatus as an example of a vacuum apparatus equipped with a rotation drive type substrate dome.
- the vacuum chamber body 40 is filled with the substrate 11, the substrate dome 12 on which the substrate 11 is mounted, the substrate dome rotating mechanism 42, the substrate heating heater 47 for heating the substrate 11, the deposition material 43, and the deposition material.
- a crucible 44, an electron gun 45 that heats the vapor deposition material 43 to the evaporation temperature, a shutter 46 that closes when the vapor deposition is completed and shields the vapor deposition material are arranged.
- the substrate 11 is set on the substrate dome 12, and the vapor deposition material 43 is placed in the crucible 44 .
- the substrate dome 12 is rotated by the substrate dome rotating mechanism 42, and the substrate 11 is heated using the substrate heating heater 47.
- the electron gun 45 irradiates the deposition material 43 with an electron beam, and raises the deposition material 43 to the evaporation temperature.
- the shutter 46 is opened, the vapor deposition material 43 scatters in the vacuum chamber 40 and deposits on the substrate 11 to form a thin film.
- FIG. 5 A conventional substrate dome rotating mechanism will be described with reference to FIGS. 5 and 6.
- FIG. 5 A conventional substrate dome rotating mechanism will be described with reference to FIGS. 5 and 6.
- the substrate dome rotation mechanism 42 is connected to the dome side gear 2, the rotation shaft 6 fixed to the dome side gear 2, the thrust bearing mechanism 51 that is connected to the dome side gear 2 and receives a load in the load direction, and the rotation shaft 6 It consists of a radial bearing mechanism 52 that receives a load in the circumferential direction, a thrust bearing mechanism 51, a bearing 53 that supports the radial bearing mechanism 52, and a dome catcher 10 that is fixed to the dome side gear 2 by the Bonoleto 55.
- the rotating mechanism 42 is configured to rotate when 2 is rotated by receiving transmission from the driving source side gear 15 connected to the driving source 41.
- the substrate dome 12 is connected to the rotation mechanism 42 by being fixed to the dome catcher 10 with bolts 56, and rotates at a predetermined rotational speed together with the dome side gear 2. Since the rotating shaft 6, the dome catcher 10, and the substrate dome 12 are attached to the dome side gear 2, a vertical thrust load is applied.
- a thrust bearing mechanism 51 is arranged to receive the load in the thrust direction. Further, a radial bearing mechanism 52 is disposed to receive a lateral load during rotation.
- FIG. 7 a shows a schematic diagram of the thrust bearing mechanism 51.
- the thrust bearing mechanism includes a steel ball 20, a lubricant 21, a plurality of steel balls 20, and an annular groove 22 that accommodates the lubricant 21.
- FIG. 7 b is a schematic sectional view of the steel ball 20, and FIG.
- the 7 c is a schematic sectional view of the lubricant 21.
- the steel ball 20 is made of, for example, iron, and the lubricant 21 is made of, for example, tungsten disulfide. The material may be selected as appropriate.
- the thrust bearing mechanism 51 has been described above for illustration, but the components are the same even if the radial bearing mechanism 52 is used.
- the bearing 53 serves as a receiver for the thrust bearing mechanism 51 and the radial bearing mechanism 52, and rotatably supports the dome side gear 2, the substrate dome 12, and the like inside the vacuum chamber 40.
- the bearing 53 is fitted into the upper force of the base 50 and is fixed by the bolt 54 from the opposite direction to the substrate dome 12.
- the substrate dome 12 is removed downward from the dome catcher 10, and then the film thickness (not shown) disposed above the rotating mechanism 42 is disposed.
- Remove peripheral mechanisms such as the monitor mechanism and heater, 50, and the rotating mechanism 42 as a whole was removed from above the base 50.
- the rotating mechanism 42 was attached from above the base 50 before the peripheral mechanism was attached, and the substrate dome 12 was attached below the base 50.
- Patent Document 1 JP 2001-73136 A
- FIG. 8 shows a state when the thrust bearing mechanism 51 shown in FIG. 7 is consumed by rotation.
- Lubricant 21 has the effect of forming a lubrication film on the surface of steel ball 20 and annular groove 22 and rotating steel ball 20 smoothly. It may cause the occurrence and the life of the bearing. Further, when the lubricant 21 is consumed due to rotation, there is a problem that the consumed lubricant 21 becomes dust 60 and accumulates in the annular groove 22.
- the dust 60 includes not only the lubricant 21 but also iron scraps due to the wear of the steel ball 20, and if such dust 60 accumulates in the annular groove 22, the steel ball 20 does not rotate smoothly and hinders rotation. Let's do it.
- the bearing mechanism Since the same problem occurs in the radial bearing mechanism 52, the bearing mechanism requires maintenance work such as periodic replacement of lubricant and cleaning of rotating parts.
- the conventional rotating mechanism has the disadvantage that the bearing cannot be removed without removing the peripheral mechanism. This is because a plurality of mechanisms that need to be placed close to the substrate dome, such as a film thickness monitoring mechanism and heater, are placed in a limited space above the substrate dome, and a space for maintenance cannot be secured. .
- the substrate heater is disposed above the bearing. For this reason, there was a problem that the consumption of the lubricant was accelerated by heating.
- the dome side gear and the board dome are fixed by bolting, but there is a problem that the board dome cannot be accurately positioned by bolting. If the center of the dome side gear and the center of the substrate dome do not coincide, the substrate dome itself swings left and right during rotation. When film formation was performed in this state, the vapor deposition material did not adhere uniformly to the substrate mounted on the substrate dome, leading to deterioration of the film thickness distribution.
- the conventional rotating mechanism has a problem with respect to its height.
- a film thickness monitor mechanism for measuring the film thickness is generally placed above the substrate dome rotation mechanism, but the substrate dome is rotated so that the monitor does not shade the evaporation source. It was necessary to make the height of the mechanism as thin as possible.
- a first aspect of the present invention includes a vacuum chamber, a base fixed inside the vacuum chamber, a rotation mechanism attached to the base, and a substrate on which a film formation substrate is mounted and rotated horizontally by the rotation mechanism.
- This is a vacuum device composed of a dome, in which the rotation mechanism is configured to be removable from the base toward the bottom of the vacuum chamber.
- the rotation mechanism is arranged so as to have at least the same rotation center as the rotation center of the dome substrate, and the dome side gear and base that are rotated horizontally by the power from the drive source provided outside the rotation mechanism.
- the support means comprises support means for supporting the dome side gear and holding means for attaching the substrate dome to the dome side gear so that the outer diameter of the dome side gear is smaller than the inner diameter of the base.
- the support means is attached to the lower end of the base.
- the support means comprises at least a rotating shaft fixed to the dome side gear concentrically with the dome side gear, and a bearing disposed concentrically with the dome side gear and attached to the base. Is configured to be attached to the lower end of the base.
- the supporting means is a concentric circle disposed with the dome side gear, supported by the bearing to support the dome side gear, and a radial bearing disposed concentrically with the dome side gear and in contact with the rotating shaft. It was set as the composition which consists of.
- the second aspect of the present invention includes a vacuum chamber, a base fixed inside the vacuum chamber, and a base attached to the base. And a vacuum device comprising a substrate dome mounted with a film formation substrate and rotated horizontally by the rotation mechanism so that the rotation mechanism has at least the same center of rotation as the rotation center of the dome substrate.
- a dome-side gear that is arranged and rotated horizontally by power from a drive source provided outside the rotation mechanism, a support means for supporting the dome-side gear with respect to the base, and a substrate dome is attached to the dome-side gear
- the support means is arranged concentrically with the dome side gear and is supported by the bearing to support the dome side gear, and the support means is arranged concentrically with the dome side gear and contacts the rotating shaft. It is a vacuum device consisting of radial bearings.
- the thrust bearing and the radial bearing are arranged on substantially the same plane.
- the configuration is such that the width in the height direction of the surface cut by the thrust bearing overlaps the width in the height direction of the surface cut by the radial bearing.
- a third aspect of the present invention includes a vacuum chamber, a base fixed inside the vacuum chamber, a rotation mechanism attached to the base, and a substrate drain mounted with a film formation substrate and rotated horizontally by the rotation mechanism.
- a vacuum device having a rotating mechanism comprising a plurality of balls housed in an annular groove and a bearing made of lubricating oil, and a dust receiver covering at least a part of the substrate dome is disposed above the substrate dome. It is a vacuum device.
- a dome heater for heating the deposition substrate was used as a dust receiver.
- a dome heater for heating the deposition substrate is fixed to the base.
- the rotating mechanism further includes a rotating shaft fixed to the dome side gear concentrically with the dome side gear, and a bearing arranged concentrically with the dome side gear and attached to the base. It has a protrusion extending in the direction, and the dust receiver is composed of a groove provided in the protrusion.
- a dish screw is used in at least one place of the holding means.
- a fourth aspect of the present invention is arranged in a vacuum chamber, a substrate dome on which a film formation substrate is mounted, a rotation mechanism that is disposed immediately above the substrate dome and rotates the substrate dome, and a top plate of the vacuum chamber. It is a method of assembling and disassembling a vacuum apparatus comprising a base that attaches at least a rotating mechanism to the inside of the vacuum chamber, and is a method of attaching and detaching at least the rotating mechanism to the bottom surface of the vacuum chamber. Further In a vacuum apparatus further comprising a fixture for fixing the rotation mechanism and the substrate dome, at least one of the fixture and the rotation mechanism or between the fixture and the substrate dome is fixed with a countersunk screw, and the substrate dome is positioned. I did it.
- a fifth aspect of the present invention includes a vacuum chamber, an evaporation source for filling a film forming material, a substrate dome on which the film forming substrate is mounted and disposed opposite to the film forming material, and disposed immediately above the substrate dome.
- Film formation with the substrate dome rotated in a vacuum mechanism consisting of a rotation mechanism that rotates the substrate dome and a rotation mechanism or rotation mechanism and a base that is mounted on the top plate of the vacuum chamber and attaches the substrate dome to the inside of the vacuum chamber
- the present invention it is possible to efficiently assemble and disassemble the rotating mechanism even in a limited space, so that it is possible to improve maintainability and workability. In addition, it can contribute to the improvement of film formation accuracy by preventing the core dome from running out, preventing contamination by dust generated by the bearing force, and reducing the thickness of the rotating mechanism.
- FIG. 1 Schematic sectional view of the rotation mechanism of the present invention
- FIG. 2 is a schematic plan view of the rotation mechanism of the present invention.
- Thrust bearing mechanism Radial bearing mechanism Bearing 54 volts
- FIGS. 1 to 4 An embodiment of the substrate dome rotation mechanism according to the present invention will be described with reference to FIGS. 1 to 4. However, the same reference numerals are given to the same parts as in the prior art, and the description will be omitted.
- the rotating mechanism shown in FIGS. 1 to 4 is mounted on a vacuum apparatus as shown in FIG. 5, for example. However, the operation related to vacuum film formation is the same as the conventional one, and the description thereof is omitted.
- FIG. 1 shows a dome side gear 2, a rotating shaft 6, a dome catcher 10, a thrust bearing mechanism 3, a radial bearing mechanism 4, a rotating mechanism 14 constituted by a bearing 5, a base 1 for fixing the rotating mechanism 14,
- a schematic sectional view of a drive source side gear 15 for driving the rotating mechanism 14, a substrate dome 12, a film forming substrate 11 mounted on the substrate dome 12, and a heater dome 13 for heating the substrate is shown.
- FIG. 2 is a schematic plan view of the rotating mechanism shown in FIG. 1 as viewed from above.
- the rotating mechanism 14 shown in FIGS. 1 and 2 is designed so that the inner diameter of the base 1 fixedly arranged in the vacuum chamber is larger than the outer diameter of the dome side gear 2, and the bearing 5 is located with respect to the base 1.
- the direction force of the board dome 12 is fitted, and the base 1 and the bearing 5 are fixed by the bolt 7 with the direction force of the board dome 12 as well.
- the bearing 5 fixes the thrust bearing mechanism 3 and the radial bearing mechanism 4 and supports the dome side gear 2 and the rotating shaft 6 so that the rotating mechanism 14 can be removed downward by removing the bolt 7. It becomes.
- the rotating mechanism 14 can be assembled and disassembled without removing the peripheral mechanism, and the workability during maintenance and the like can be significantly improved.
- the force base 1 using the disk-shaped base 1 whose inner diameter is larger than the outer diameter of the dome side gear 2 has any shape as long as it has a space for fitting the dome side gear 2. It doesn't matter.
- FIG. 3 shows a schematic diagram of the thrust bearing mechanism 3 and the radial bearing mechanism 4.
- the thrust bearing mechanism 3 and the radial bearing mechanism 4 are arranged concentrically in the same plane, and are constituted by a steel ball 20 and a lubricant 21 accommodated in an annular groove 22. By using the lubricant 21, rotation can be performed smoothly.
- Lubricant 2 1 does not need to be used if it is a bearing mechanism that does not have a large load, such as
- the thrust bearing mechanism 3 and the radial bearing mechanism 4 in the same plane, the height of the rotating mechanism 14 is reduced, and the film thickness monitoring mechanism and the film forming film disposed above the rotating mechanism 14 are formed. The distance from the substrate can be reduced.
- the total weight of the rotating mechanism 14 can be reduced by reducing the height of the dome catcher 10, for example, by reducing the height of the dome catcher 10, and the rotating mechanism 14 can be removed downward or attached from below. It is possible to reduce labor and improve safety.
- the heater dome 13 is disposed immediately below the rotation mechanism 14 in the embodiment.
- the heater dome 13 may be fixed to the base 1.
- the heater dome 13 that catches the substrate dome from the outer peripheral direction of the rotating mechanism 14 is received, so that it is possible to prevent dust from adhering to the substrate 11 during film formation.
- the heater dome 13 is directly above the rotating mechanism, there is a problem that the heater dome 13 heats the lubricant and expedites wear. There is also an effect of extending the life of the lubricant 21.
- the heater dome 13 for heating the substrate necessary for film formation is also used as a backing plate for dust countermeasures, it is possible to take dust countermeasures without adding any component parts. You may arrange a countermeasure plate separately.
- FIG. 4 shows a detailed view of a portion 60 surrounded by a broken-line circle in FIG.
- the bearing 5 is provided with a stopper 30 for preventing the dome side gear 2 from being pulled upward.
- the stopper 30 is provided with a groove 31 to receive dust generated from the steel ball 20 and the lubricant 21.
- the structure is as follows. As a result, contamination of the substrate 11 can be further prevented.
- the rotating shaft 6 and the dome catcher 10 are fixed to the dome side gear 2, the thrust bearing mechanism 3 and the radial bearing mechanism 4 are assembled on the bearing 5, and the dome side gear 2 is assembled to the thrust bearing mechanism 3 and the radial bearing mechanism.
- the bearing 5 is fixed to the base 1 with the bolt 7.
- countersunk screws 8 are used to fix dome side gear 2 and dome catcher 10.
- the board dome 12 with the board 11 mounted is removed. Attach to the track catcher 10 and fix it with countersunk screws 9 to align the core.
- the dome side gear 2 is rotated at a predetermined rotation speed by the motor of the driving source.
- the dome catcher 10 and the substrate dome 12 are unfixed, and the bolt 7 of the bearing 5 is removed, so that the rotating mechanism 14 can be removed downward. Since the rotating mechanism 14 can be disassembled without removing other components, particularly peripheral mechanisms (not shown) above the rotating mechanism, workability during maintenance can be significantly improved.
- the film forming method capable of implementing the apparatus and method of the present invention is not limited to the vapor deposition method, and the sputtering method and the ion plating method. And so on.
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2005800131933A CN1946873B (en) | 2004-06-25 | 2005-01-24 | Substrate dome rotating mechanism |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004-187285 | 2004-06-25 | ||
JP2004187285A JP4002959B2 (en) | 2004-06-25 | 2004-06-25 | Substrate dome rotation mechanism |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2006001095A1 true WO2006001095A1 (en) | 2006-01-05 |
Family
ID=35776645
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2005/000851 WO2006001095A1 (en) | 2004-06-25 | 2005-01-24 | Substrate dome rotating mechanism |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4002959B2 (en) |
KR (1) | KR100855174B1 (en) |
CN (1) | CN1946873B (en) |
WO (1) | WO2006001095A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008138276A (en) * | 2006-12-05 | 2008-06-19 | Tsukishima Kikai Co Ltd | Vacuum film deposition system |
CN104651795B (en) * | 2015-03-10 | 2017-01-11 | 丹阳市鼎新机械设备有限公司 | Turntable for vacuum lens coating machine |
JP6019310B1 (en) * | 2015-04-16 | 2016-11-02 | ナルックス株式会社 | Vapor deposition apparatus and manufacturing method including film forming process by vapor deposition apparatus |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0429654U (en) * | 1990-06-27 | 1992-03-10 | ||
JPH0835065A (en) * | 1994-07-22 | 1996-02-06 | Murata Mfg Co Ltd | Vacuum film forming device |
JP2001073136A (en) * | 1999-09-08 | 2001-03-21 | Showa Shinku:Kk | Optical thin film producing system |
US6294025B1 (en) * | 1996-11-01 | 2001-09-25 | THEVA DüNNSCHICHTTECHNIK GMBH | Device for producing oxidic thin films |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2853267B2 (en) * | 1990-05-25 | 1999-02-03 | 本田技研工業株式会社 | Integrated planetary gear transmission using three sets of planetary gear trains |
KR960013625B1 (en) * | 1992-12-22 | 1996-10-10 | 재단법인 한국전자통신연구소 | Vacuum heat deposition device |
-
2004
- 2004-06-25 JP JP2004187285A patent/JP4002959B2/en not_active Expired - Fee Related
-
2005
- 2005-01-24 WO PCT/JP2005/000851 patent/WO2006001095A1/en active Application Filing
- 2005-01-24 CN CN2005800131933A patent/CN1946873B/en not_active Expired - Fee Related
- 2005-01-24 KR KR1020067022026A patent/KR100855174B1/en not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0429654U (en) * | 1990-06-27 | 1992-03-10 | ||
JPH0835065A (en) * | 1994-07-22 | 1996-02-06 | Murata Mfg Co Ltd | Vacuum film forming device |
US6294025B1 (en) * | 1996-11-01 | 2001-09-25 | THEVA DüNNSCHICHTTECHNIK GMBH | Device for producing oxidic thin films |
JP2001073136A (en) * | 1999-09-08 | 2001-03-21 | Showa Shinku:Kk | Optical thin film producing system |
Also Published As
Publication number | Publication date |
---|---|
CN1946873A (en) | 2007-04-11 |
CN1946873B (en) | 2010-09-29 |
JP2006009082A (en) | 2006-01-12 |
KR20070024518A (en) | 2007-03-02 |
JP4002959B2 (en) | 2007-11-07 |
KR100855174B1 (en) | 2008-08-29 |
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