JP2007243060A - Gas-phase growth equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a gas-phase growth equipment where a failure of rotation caused by the thermal distortion of a susceptor is eliminated, and the maintenance and economy is improved. <P>SOLUTION: In the gas-phase growth equipment, a plurality of substrate holding members 21 are rotatably located on a susceptor 11 which is heated by a heating means and is rotated by a driving means, through a rotating member (balls 22) in the circumferential direction of the susceptor, the substrate holding member 21 is rotated with the rotation of the susceptor, a rotation/revolution structure rotates the substrate 12 held by the substrate holding member revolving around the rotating axis of the susceptor, and guide members 23 guide the rotating member located between the susceptor and rotating member. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a vapor phase growth apparatus, and more particularly to a vapor phase growth apparatus provided with a mechanism for rotating and revolving a substrate on a susceptor.

As a vapor phase growth apparatus for supplying a vapor phase raw material into the flow channel while the substrate held on the susceptor in the flow channel is heated to a predetermined temperature and depositing a thin film on the substrate surface, the thin film is uniformly formed on a plurality of substrates. In order to form the substrate, a vapor phase growth apparatus provided with a mechanism for rotating the susceptor and rotating the substrate holding member (substrate tray) holding the substrate along with the rotation of the susceptor to rotate the substrate during film formation. Is known (for example, see Patent Document 1). In such a self-revolving mechanism, a rolling member (bearing) is interposed between the susceptor and the substrate holding member so that the substrate holding member rotates smoothly.
JP 2002-17592 A

  However, since the rolling and revolving mechanism in the conventional vapor phase growth apparatus is directly held by the guide grooves provided in the susceptor and the substrate holding member, the heat generated when the susceptor is heated to a high temperature. In some cases, the rotation of the rolling member has a problem due to distortion caused by expansion. For example, the rolling surface such as a guide groove where the rolling member rolls is distorted and the rolling member does not roll smoothly on the rolling surface, the rotation of the substrate holding member is shaken, the rolling member comes off, The rotation of the substrate holding member may become heavy and the gear portion and the like may be damaged. In addition, in the conventional rotation mechanism, if a rotation abnormality occurs in the substrate holding member or susceptor, the entire susceptor must be taken out of the chamber for repair, requiring extensive maintenance such as opening the chamber. It took time and cost.

  SUMMARY OF THE INVENTION An object of the present invention is to provide a vapor phase growth apparatus that eliminates rotational problems caused by thermal distortion of a susceptor and can improve maintainability and economy.

  In order to achieve the above object, the vapor phase growth apparatus of the present invention rotates a plurality of substrate holding members in a circumferential direction of the susceptor via a rolling member on a susceptor heated by a heating unit and rotated by a driving unit. Vapor phase epitaxy provided with a self-revolving structure capable of rotating while rotating the substrate holding member as the susceptor rotates and rotating the substrate held by the substrate holding member with respect to the rotation axis of the susceptor. In the apparatus, a guide member for guiding the rolling member is provided between the susceptor and the rolling member.

  According to the vapor phase growth apparatus of the present invention, the rolling member is guided by the guide member having a small area and a small thermal strain as compared with a susceptor that has a large area and is likely to generate thermal strain. However, the rolling of the rolling member is not adversely affected, and the substrate holding member can be smoothly rotated even at high temperatures. Furthermore, when the maintenance of the electric member and the rolling surface is performed, it is only necessary to remove the substrate holding member and the guide member without removing the susceptor, so that the maintenance work can be performed easily and in a short time.

  1 is a sectional view showing an embodiment of the vapor phase growth apparatus of the present invention, FIG. 2 is a plan view of a susceptor, FIG. 3 is a sectional view taken along line III-III in FIG. 1, and FIG. It is sectional drawing of the principal part shown.

  The vapor phase growth apparatus shown in this embodiment is a multi-rotation type vapor phase growth apparatus in which six substrates 12 can be placed on the upper surface of a disk-shaped susceptor 11, and the susceptor 11 is made of quartz glass or the like. The cylindrical flow channel 13 is formed on the bottom surface of the flow channel 13 so as to be rotatable. A rotating shaft 14 is provided at the center of the lower surface of the susceptor 11, and a heater 15 and a thermometer 16 for heating the substrate 12 via the susceptor 11 are provided around the rotating shaft 14. Is covered with a reflector 17. In the center of the top plate of the flow channel 13, a vapor phase material inlet 18 is opened, and an exhaust port 19 is provided on the outer periphery of the bottom plate.

  The substrate 12 is held by a disk-like substrate holding member (substrate tray) 21 having a substrate holding recess 20 on the upper surface, and the substrate holding member 21 is a large number of balls that are rolling members made of carbon or ceramic. The guide members 23 are respectively supported by disk-shaped guide members 23 via 22, and are held in guide member holding recesses 24 provided at equal intervals in the circumferential direction of the susceptor 11. Further, an external gear 25 is provided at the lower outer periphery of the substrate holding member 21, and a ring-shaped fixing having an internal gear 26 that meshes with the external gear 25 of the substrate holding member 21 at the outer peripheral position of the susceptor 11. A gear member 27 is provided. Further, a cover member 28 that covers the fixed gear member 27, the internal gear 26 and the external gear 25, and the upper surface of the central portion of the susceptor 11 is provided. The upper surface of the cover member 28 and the substrate holding recess 20 are provided. The upper surface of the outer peripheral portion and the upper surface of the substrate 12 are flush with each other. On the lower surface of the substrate holding member 21 and the upper surface of the guide member 23, ring-shaped V grooves 29 and 30 centering on the axis of the substrate 12 are provided so as to face each other. 22 is held so that it can roll.

  When performing the vapor phase growth on the substrate 12, if the rotating shaft 14 is rotated at a predetermined speed, the susceptor 11 rotates integrally with the rotating shaft 14, and the fixed gear member 27 is removed along with the rotation of the susceptor 11. The member rotates, and the substrate 12 is rotated around the axis of the susceptor 11, that is, revolved. Then, when the external gear 25 meshes with the internal gear 26 of the fixed gear member 27, the substrate holding member 21 is rotated around the axis of the substrate holding member 21, that is, is rotated. Thereby, the substrate 12 on which the substrate holding member 21 is held revolves around the axis of the susceptor 11.

  In this way, the substrate 12 revolves and the substrate 12 is heated from the heater 15 through the susceptor 11 and the like to a predetermined temperature, for example, 1100 ° C. For example, a predetermined thin film can be uniformly deposited on the surfaces of the plurality of substrates 12 by introducing a mixed gas of trimethylgallium and ammonia into the flow channel 13 and discharging it from the exhaust port 19 on the outer periphery.

  When the substrate 12 is heated to a high temperature, the susceptor 11 having a large diameter (area) and a different thickness at the central portion and the peripheral portion generates a temperature distribution when heated by a heater 15 or a lamp. Although the substrate holding member 21 and the guide member 23 having a small diameter compared to the susceptor 11 tend to cause distortion due to a difference in expansion, the temperature distribution hardly occurs even when heated to a high temperature, and distortion due to a difference in thermal expansion occurs. In addition, since the distortion is extremely small even if distortion occurs, the relationship between the V-grooves 29 and 30 can be kept good, and the balls 22 can be smoothly rolled. It can rotate smoothly and at a constant speed. Thereby, a homogeneous thin film can be stably deposited on all the substrates 12.

  In addition, when the ball 22 and the V grooves 29 and 30 are inspected, cleaned, replaced, and the like for maintenance, the entire susceptor 11 including the susceptor 11 has conventionally been removed. However, in this embodiment, the susceptor 11 is removed. Since it is only necessary to remove the guide member 23, the inspection and the like can be performed efficiently in a short time. Furthermore, by providing the cover member 28 so as to cover the gear portion, it is possible to prevent the reaction products and the like from entering the gear portion, and to protect the gear portion for a long period of time. Thereby, production efficiency can be improved significantly.

  In the embodiment shown in FIG. 4, a V-groove 32 is provided on the lower peripheral surface of the substrate holding member 31, and the V-shaped guide member 33 having an inner diameter larger than the lower peripheral surface of the substrate holding member 31 is formed on the inner peripheral surface of the ring-shaped guide member 33. A V-groove 34 facing the groove 32 is provided, the same ball 35 is disposed between the V-grooves 32, 34, and the substrate holding member 31 and the guide member 33 are formed to be rotatable with respect to each other. A circular substrate holding member holding hole 37 provided on the outer periphery of the susceptor 36 is supported by a support piece 38 provided in a ring shape on the lower inner periphery.

  Even if it forms in this way, since the guide member 33 is very small compared with the susceptor 36, it can suppress that distortion generate | occur | produces by the thermal expansion difference by temperature distribution, and while the board | substrate 12 can be rotated smoothly, a susceptor Since removal from 36 is easy, maintenance can be improved.

  The present invention can also be applied to a vapor phase growth apparatus in which the thin film forming surface of the substrate faces downward. In addition, the shape of each part can be appropriately set according to various conditions such as the size of the susceptor and the substrate. For example, the shape of the rolling member is not limited to the ball, and the holding of the rolling member is also limited to the V groove. It is not a thing.

It is sectional drawing which shows one example of the vapor phase growth apparatus of this invention. It is a top view of a susceptor. FIG. 3 is a sectional view taken along line III-III in FIG. 1. It is sectional drawing of the principal part which shows the other example of a shape of a guide member.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 11 ... Susceptor, 12 ... Board | substrate, 13 ... Flow channel, 14 ... Rotating shaft, 15 ... Heater, 16 ... Thermometer, 17 ... Reflector, 18 ... Gas-phase raw material introduction port, 19 ... Exhaust port, 20 ... Substrate holding recessed part, 21 ... Substrate holding member, 22 ... Ball, 23 ... Guide member, 24 ... Guide member holding recess, 25 ... External gear, 26 ... Internal gear, 27 ... Fixed gear member, 28 ... Cover member, 29, 30 ... V-groove, 31 ... Substrate holding member, 32 ... V groove, 33 ... Guide member, 34 ... V groove, 35 ... Ball, 36 ... Susceptor, 37 ... Substrate holding member holding hole, 38 ... Supporting piece

Claims (1)

  A plurality of substrate holding members are rotatably provided in a circumferential direction of the susceptor via a rolling member on a susceptor that is heated by a heating unit and rotated by a driving unit, and the substrate holding member is provided along with the rotation of the susceptor. In a vapor phase growth apparatus having a self-revolving structure that rotates and revolves while revolving the substrate held by the substrate holding member with respect to the rotation axis of the susceptor, rolling between the susceptor and the rolling member. A vapor phase growth apparatus comprising a guide member for guiding a member.

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