WO2005102972A1 - フルオロアルキルケトンの水和物の製造方法 - Google Patents
フルオロアルキルケトンの水和物の製造方法 Download PDFInfo
- Publication number
- WO2005102972A1 WO2005102972A1 PCT/JP2005/006905 JP2005006905W WO2005102972A1 WO 2005102972 A1 WO2005102972 A1 WO 2005102972A1 JP 2005006905 W JP2005006905 W JP 2005006905W WO 2005102972 A1 WO2005102972 A1 WO 2005102972A1
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- WO
- WIPO (PCT)
- Prior art keywords
- halogen
- reaction
- salt
- oxidizing agent
- general formula
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title abstract description 9
- -1 fluoroalkyl ketone Chemical class 0.000 title description 12
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 50
- 150000002367 halogens Chemical class 0.000 claims abstract description 50
- 150000003839 salts Chemical class 0.000 claims abstract description 32
- 239000007800 oxidant agent Substances 0.000 claims abstract description 25
- 150000001875 compounds Chemical class 0.000 claims abstract description 16
- 238000006243 chemical reaction Methods 0.000 claims description 65
- 238000000034 method Methods 0.000 claims description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000000460 chlorine Substances 0.000 claims description 14
- 229910052801 chlorine Inorganic materials 0.000 claims description 14
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical group Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 claims description 13
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 12
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 11
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 11
- 229910052794 bromium Inorganic materials 0.000 claims description 11
- 229910052731 fluorine Inorganic materials 0.000 claims description 9
- 239000011737 fluorine Substances 0.000 claims description 9
- JGJLWPGRMCADHB-UHFFFAOYSA-N hypobromite Chemical compound Br[O-] JGJLWPGRMCADHB-UHFFFAOYSA-N 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 8
- RPACBEVZENYWOL-XFULWGLBSA-M sodium;(2r)-2-[6-(4-chlorophenoxy)hexyl]oxirane-2-carboxylate Chemical compound [Na+].C=1C=C(Cl)C=CC=1OCCCCCC[C@]1(C(=O)[O-])CO1 RPACBEVZENYWOL-XFULWGLBSA-M 0.000 claims description 4
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 claims 2
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 claims 2
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 claims 2
- 230000001590 oxidative effect Effects 0.000 abstract description 4
- 125000000896 monocarboxylic acid group Chemical group 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 20
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 239000002994 raw material Substances 0.000 description 15
- 239000007789 gas Substances 0.000 description 12
- 239000007864 aqueous solution Substances 0.000 description 11
- 239000002253 acid Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000006114 decarboxylation reaction Methods 0.000 description 8
- HEBNOKIGWWEWCN-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-one;hydrate Chemical compound O.FC(F)(F)C(=O)C(F)(F)F HEBNOKIGWWEWCN-UHFFFAOYSA-N 0.000 description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 150000001768 cations Chemical class 0.000 description 6
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 150000007942 carboxylates Chemical class 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- VBZWSGALLODQNC-UHFFFAOYSA-N hexafluoroacetone Chemical compound FC(F)(F)C(=O)C(F)(F)F VBZWSGALLODQNC-UHFFFAOYSA-N 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 3
- 239000012266 salt solution Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- AQHKYFLVHBIQMS-UHFFFAOYSA-N 2-[difluoro(methoxy)methyl]-1,1,1,3,3,3-hexafluoropropane Chemical compound COC(F)(F)C(C(F)(F)F)C(F)(F)F AQHKYFLVHBIQMS-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 239000005708 Sodium hypochlorite Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 150000001734 carboxylic acid salts Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 238000007710 freezing Methods 0.000 description 2
- 230000008014 freezing Effects 0.000 description 2
- 230000026030 halogenation Effects 0.000 description 2
- 238000005658 halogenation reaction Methods 0.000 description 2
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical compound FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 2
- PGFXOWRDDHCDTE-UHFFFAOYSA-N hexafluoropropylene oxide Chemical compound FC(F)(F)C1(F)OC1(F)F PGFXOWRDDHCDTE-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- DAFIBNSJXIGBQB-UHFFFAOYSA-N perfluoroisobutene Chemical class FC(F)=C(C(F)(F)F)C(F)(F)F DAFIBNSJXIGBQB-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229960003975 potassium Drugs 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 235000011181 potassium carbonates Nutrition 0.000 description 2
- BWILYWWHXDGKQA-UHFFFAOYSA-M potassium propanoate Chemical compound [K+].CCC([O-])=O BWILYWWHXDGKQA-UHFFFAOYSA-M 0.000 description 2
- 235000010332 potassium propionate Nutrition 0.000 description 2
- 239000004331 potassium propionate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical compound FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- MSWVMWGCNZQPIA-UHFFFAOYSA-N 1-fluoropropan-2-one Chemical compound CC(=O)CF MSWVMWGCNZQPIA-UHFFFAOYSA-N 0.000 description 1
- ZYVYEJXMYBUCMN-UHFFFAOYSA-N 1-methoxy-2-methylpropane Chemical compound COCC(C)C ZYVYEJXMYBUCMN-UHFFFAOYSA-N 0.000 description 1
- QKKBOQYIHOYXKK-UHFFFAOYSA-N 2,2,4,4-tetrakis(trifluoromethyl)-1,3-dithietane Chemical compound FC(F)(F)C1(C(F)(F)F)SC(C(F)(F)F)(C(F)(F)F)S1 QKKBOQYIHOYXKK-UHFFFAOYSA-N 0.000 description 1
- QKNYBSVHEMOAJP-UHFFFAOYSA-N 2-amino-2-(hydroxymethyl)propane-1,3-diol;hydron;chloride Chemical compound Cl.OCC(N)(CO)CO QKNYBSVHEMOAJP-UHFFFAOYSA-N 0.000 description 1
- CTGJACFEVDCYMC-UHFFFAOYSA-N 3,3,3-trifluoro-2-hydroxy-2-methylpropanoic acid Chemical compound OC(=O)C(O)(C)C(F)(F)F CTGJACFEVDCYMC-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- ZKQDCIXGCQPQNV-UHFFFAOYSA-N Calcium hypochlorite Chemical compound [Ca+2].Cl[O-].Cl[O-] ZKQDCIXGCQPQNV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 1
- RJUFJBKOKNCXHH-UHFFFAOYSA-N Methyl propionate Chemical compound CCC(=O)OC RJUFJBKOKNCXHH-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229940035674 anesthetics Drugs 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- XVDWMONETMNKBK-UHFFFAOYSA-N calcium;dihypobromite Chemical compound [Ca+2].Br[O-].Br[O-] XVDWMONETMNKBK-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- IYRWEQXVUNLMAY-UHFFFAOYSA-N carbonyl fluoride Chemical compound FC(F)=O IYRWEQXVUNLMAY-UHFFFAOYSA-N 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000003193 general anesthetic agent Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000002440 industrial waste Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- LWXVCCOAQYNXNX-UHFFFAOYSA-N lithium hypochlorite Chemical compound [Li+].Cl[O-] LWXVCCOAQYNXNX-UHFFFAOYSA-N 0.000 description 1
- JOUZTPYNXDURHJ-UHFFFAOYSA-N lithium;hypobromite Chemical compound [Li+].Br[O-] JOUZTPYNXDURHJ-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- SATVIFGJTRRDQU-UHFFFAOYSA-N potassium hypochlorite Chemical compound [K+].Cl[O-] SATVIFGJTRRDQU-UHFFFAOYSA-N 0.000 description 1
- ORQYPOUSZINNCB-UHFFFAOYSA-N potassium;hypobromite Chemical compound [K+].Br[O-] ORQYPOUSZINNCB-UHFFFAOYSA-N 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229940071207 sesquicarbonate Drugs 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- CRWJEUDFKNYSBX-UHFFFAOYSA-N sodium;hypobromite Chemical compound [Na+].Br[O-] CRWJEUDFKNYSBX-UHFFFAOYSA-N 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical class OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C29/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
- C07C29/48—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by oxidation reactions with formation of hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C29/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/27—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation
- C07C45/30—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation with halogen containing compounds, e.g. hypohalogenation
Definitions
- the present invention relates to a method for producing a fluoroalkyl ketone, in particular, a hydrate of hexafluoroacetone (hereinafter sometimes abbreviated as “HFA”).
- HFA hexafluoroacetone
- the present invention relates to a method for producing a hydrate of HFA for the effective use of ropionic acid.
- HFA hydrate is useful as a synthetic intermediate for various fluorine compounds.
- HFA can be used as a rubber crosslinking agent or a fluorine-containing polyimide monomer by reacting with various aromatic compounds.
- HFA hydrate is reduced to hexafluoroisopropanol by a hydrogen reduction reaction and can be used as a raw material for anesthetics.
- Patent Documents 1 to 4 propose a method for isomerizing hexafluoropropylene oxide.
- Hexafluoropropylene oxide has a problem in that the yield of cisfluoridone, which is known to be obtained by oxygen oxidation of hexafluoropropene, is low and expensive.
- Patent Documents 5 to 8 and the like As another method, a method of oxidizing hexafluorothioacetone dimer (Patent Documents 5 to 8 and the like) is also known, but the yield is low and purification is difficult. There is a problem. Also known is a method of fluorinating hexaclotone acetone with HF. Power purification is not easy! There are problems of (1) and (2) (Patent Document 9).
- Patent Document 10 discloses a method for oxidizing oxygen with octafluoroisobutyl methyl ether in the presence of an activated carbon catalyst. Although it was possible to obtain oroacetone, it was apparent that the catalytic activity of activated carbon deteriorated significantly and was not industrially feasible. Besides this, Patent Documents 11 to 14, etc. disclose methods for producing octafluoroisobutyl methyl ether derivative hexafluoroacetone, but in any case, the yield is low and the cost is low. It is not satisfactory as a method for producing fluoroacetone.
- Non-Patent Document 1 reports the reaction of reacting a salt of a carboxylic acid with fluorine gas in an aqueous solution to react with fluorine gas, but such a decarboxylation reaction does not proceed with chlorine gas. Is described.
- Patent Document 1 U.S. Pat.
- Patent Document 2 JP-A-53-25512
- Patent Document 3 JP-A-58-62130
- Patent Document 4 WO 03/008366
- Patent Document 5 U.S. Pat.No. 4,337,361
- Patent Document 6 US Patent No. 4334099
- Patent Document 7 JP-A-57-158736
- Patent Document 8 JP-A-57-203026
- Patent Document 9 Japanese Patent Publication No. 40-27173
- Patent Document 10 JP-A-01-203339
- Patent Document 11 JP-A-61-277645
- Patent Document 12 JP-A 64-26527
- Patent Document 13 Japanese Patent Publication No. 9-509425
- Patent Document 14 Japanese Patent Application Laid-Open No. 2001-81056
- Non-Patent Document 1 J. Org. Chem. 34, 2446 (1969)
- An object of the present invention is to easily produce a hydrate of a fluoroalkyl ketone in a high yield.
- the present inventors have proposed that a salt of a fluoroalkylhydroxycarboxylic acid is halogen or halogen. It has been found that a hydrate of the corresponding ketone is formed when reacted with a system oxidizing agent.
- the present invention relates to the following method.
- n and m each represent 0 to 10; and reacting a salt of the compound represented by the general formula (2) with a compound of the formula (2):
- 2-hydroxyf. HFA hydrate which is a useful substance, can be obtained in high yield from the salt of ropionic acid.
- M represents a monovalent (M +), divalent ( 1/2 M 2+ ) or trivalent ( 1/3 M 3+ ) ion
- the present inventors have examined the conditions of halogenation in detail, and found that the carboxylic acid compound of the general formula (1) used hypochlorite Z hypobromite as a halogen-based oxidizing agent other than halogen alone. It was also found that hexafluoroacetone hydrate was formed. Hypochlorite generates chlorine in an acidic manner, so chlorine may be generated in the reaction system.However, this reaction proceeds even in alkaline conditions, and the reaction with hypochlorite occurs. It is not clear what kind of mechanism it is going on.
- a salt of the compound of the general formula (1) is represented by the following general formula (1A).
- M represents a monovalent (M +), divalent ( 1/2 M 2+ ) or trivalent ( 1/3 M 3+ ) ion, and is preferable.
- M + is a monovalent cation such as L ", K-cho, Na +, NH +, Ag +
- divalent cations such as l / 2Mg 2+ , l / 2Ca 2+ , l / 2Sr 2+ , l / 2Ba 2+ , l / 2Pb 2+ , l / 2Cu 2+ and 3 such as 1 / 3A1 3+ Shows a multivalent cation.
- Salts other than those specifically exemplified above can be easily obtained from the compound of the general formula (1) or the salt of the general formula (1A) according to a conventional method.
- HFA hydrate in which both n and m are 0 is a particularly useful compound, and 3,3,3-trifluoro-2-trifluoromethyl- 2-hydroxyf.
- a method for producing lopionic acid ester is disclosed in JP-A-61-286348, JP-A-2002-234860, and the like, as described in V, by reacting octafluoroisobutene with methanol. It is known that isobutyl methyl ether is reacted with an alkali metal hydroxide and dehydrofluorinated to give heptafluoroisobutyr methyl ether, which is obtained by oxidation. .
- the carboxylic acid salt of the raw material obtained by hydrolyzing the ester portion from the lopionate is a salt such as a salt of Li, K, Na, Mg, Ca, Sr, Ba, Pb, Cu, Al, NH or Ag.
- a salt of Li, K, Na, Mg, Ca, Sr, Ba, Pb, Cu, Al, NH or Ag is a salt such as Li, K, Na, Mg, Ca, Sr, Ba, Pb, Cu, Al, NH or Ag.
- Li salt, K salt, Na salt, Ca salt and Mg salt are preferable, and Na salt and K salt are more preferable.
- the raw material carboxylate can be used by purifying it by a conventional method such as extraction with a solvent. Hydrolysis of methyl ester with an alkali metal hydroxide such as KOH or NaOH The used solution may be used as it is. The excessively used hydroxide may be used after being neutralized with an acid such as hydrochloric acid or sulfuric acid in order to accelerate the decomposition of the halogen when reacting with the halogen.
- an alkali metal hydroxide such as KOH or NaOH
- the excessively used hydroxide may be used after being neutralized with an acid such as hydrochloric acid or sulfuric acid in order to accelerate the decomposition of the halogen when reacting with the halogen.
- the carboxylate uses a carboxylic acid as a raw material and forms a salt in the reaction solution.
- Water is preferred as the solvent for the nodogenation reaction, but 3,3,3-trifluoro-2-trifluoromethyl-2-hydroxyphenyl is contained in the aqueous solution.
- an organic solvent such as methanol, ethanol, acetate, dioxane, tetrahydrofuran, or acetonitrile, which is used when synthesizing a carboxylic acid salt from a ropionate, is contained.
- the reaction temperature is not particularly limited as long as it is equal to or higher than the freezing point of the solvent.
- the reaction can be usually carried out at about -20 to 100 ° C, but is preferably about -5 to 50 ° C.
- the reaction temperature is not particularly limited as long as the water does not solidify due to freezing point depression, and can be cooled to about 20 ° C, but is usually about -5 to 80 ° C, preferably 0 to 80 ° C. It is around 50 ° C. If the reaction temperature is too high, undesired side reactions occur. If the reaction temperature is too low, the loss of halogen or halogen-based oxidizing agent increases. The optimum temperature depends on the halogen or halogen-based oxidizing agent. When chlorine is used as the halogen or halogen-based oxidizing agent, the reaction temperature is preferably about 30-50 ° C.
- the raw material concentration in the reaction solution there is no particular limitation on the raw material concentration in the reaction solution, but it is preferable to carry out the reaction at 5 to 60 mass%. In a dilute solution, the reaction efficiency of halogen is worse and the loss increases. Therefore, a higher concentration is preferable. Even if the carboxylate is saturated and precipitated and the halogen is removed in a state where the carboxylate is saturated, the reaction proceeds without any particular problem.
- the halogen or the halogen-based oxidizing agent is not particularly limited, but fluorine, chlorine, and bromine are preferably used as the halogen.
- As the halogen-based oxidizing agent sodium hypochlorite, lithium hypochlorite, potassium hypochlorite, Hypochlorites such as calcium hypochlorite and hypobromite such as sodium hypobromite, lithium hypobromite, potassium hypobromite and calcium hypobromite are preferably used.
- Chlorine is particularly preferred due to its low cost. Although purified gas can be used as it is as chlorine, it is generated in the reaction system. It can be used for the reaction while growing.
- a method for generating chlorine in the reaction system for example, there is a method in which a chloride of an alkali metal or an alkaline earth metal is added to the reaction system, and this is electrolyzed. The same method can be applied to bromine.
- F gas is diluted with a gas that is inert to fluorine.
- the diluent gas can be selected from nitrogen, helium, air, or fluoralkane, perfluoroalkane, or perfluoroketone, but nitrogen is the most preferable in terms of cost.
- the concentration of F is 1 ⁇ 30mass%, preferably 4-20mass%.
- the F2 concentration is high, severe undesired side reactions such as combustion are likely to occur, which is dangerous. Although there is no particular problem in the case of a dilute gas, the entrainment loss of the target substance such as HFA hydrate by the diluent gas increases.
- the amount of halogen or halogen-based oxidizing agent used in the reaction is not particularly limited, but it is preferable to carry out the reaction in an amount of about 0.5 to about 10 molar equivalents. More preferably, from about 0.9 to about 2 molar equivalents. If the equivalent of the halogen used is increased, the transfer ratio of the raw material can be improved.
- the rate of addition of the halogen or halogen-based oxidizing agent is not particularly limited, but it is generally the case that one equivalent of the halogen is added over a period of about 0.5 to 50 hours, more preferably about 0.5 to 10 hours. It is a target.
- the flow rate is preferably 0.1 to 5 times the capacity of the reactor per minute.
- the flow rate can be in the range of 0.01 to 5 times, preferably 0.1 to 1 time, per minute of the capacity of the reactor.
- the flow rate can be in the range of 0.01 to 5 times, preferably 0.1 to 1 time, per minute of the capacity of the reactor.
- about 0.5 to about 10 molar equivalents of bromine (liquid) may be added to the reaction solution by dropping or the like.
- the reaction time is not particularly limited, and the reaction can be usually performed for about 0.5 to 50 hours.
- This reaction can be carried out continuously by supplying the carboxylic acid solution and the halogen as the raw materials to the reactor while extracting the reaction solution.
- the pH of the solution, particularly the aqueous solution or aqueous solution, used in the present reaction is preferably 3.0 to
- the alkali to be added is preferably an alkali metal or alkaline earth metal carbonate, hydrogencarbonate, sesquicarbonate, phosphate, hydroxide or the like.
- Carbonates and bicarbonates are particularly preferred because they do not decompose hydrates of halogen or fluoroalkyl ketone (particularly hexafluoroacetone hydrate).
- the addition amount of the alkaline conjugate is about 0.5 to 5.0 equivalents, preferably about 1.0 to 2.0 equivalents, to the halogen or the halogen-based oxidizing agent.
- a buffer may be used as water.
- Preferred buffers include organic or inorganic acids such as citrate, phosphate, succinate, Tris salt (eg, Tris hydrochloride), borate, acetate, lactate, propionate, and the like. And a mixture of the corresponding acid and the corresponding acid.
- the hydrate of a fluoroalkyl ketone which is the object of the present invention, can be prepared by a known method, for example, HFA hydrate as disclosed in JP-A-57-81433, salted calcium and the like.
- the salt can be extracted with an ethereal solvent such as diisopropyl ether or methyl tert-butyl ether, and then separated by distillation with an organic solvent.
- the potassium salt solution of 3,3,3-trifluoro-2--2-trifluoromethyl-2-hydroxypropionic acid prepared in Reference Example 1 and water were added to a 100 ml four-necked flask.
- the pH of the mixed solution was 13 due to excess KOH used during the hydrolysis.
- F2 diluted to 5.7 vol% with nitrogen was blown into the mixture under ice-cooling and stirring to carry out a reaction. After flowing a predetermined amount of F2, the reaction system was purged with nitrogen, and the reaction solution was analyzed.
- Example 9 A 100 ml PFA bottle is charged with 30.9 g (123.6 mmol) of potassium salt of 3,3,3-trifluoro-2-methyl-2-hydroxypropionate and 71.7 g of an aqueous solution containing 6 g (80 mmol) of KCl. A direct current of 1 A (8.0 to 8.2 V) was applied to this through a platinum electrode. After electrolysis for 9 hours, the reaction solution was quantified by NMR analysis. The conversion of the reaction was 90% and the selectivity was 99% or more. The reaction was performed at room temperature, but the internal temperature of the reaction solution was 39 to 41 ° C. What is the pH at the end of the reaction? Was ⁇ 8.
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Abstract
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Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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CN2005800116810A CN1942422B (zh) | 2004-04-19 | 2005-04-08 | 氟烷基酮的水合物的制造方法 |
US11/578,523 US7598425B2 (en) | 2004-04-19 | 2005-04-08 | Method for producing hydrate of fluoroalkyl ketone |
EP05728496A EP1757572A4 (en) | 2004-04-19 | 2005-04-08 | PROCESS FOR PREPARING A HYDRATE OF A FLUORO ALKYL KETONE |
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JP2004-123045 | 2004-04-19 | ||
JP2004123045A JP4396831B2 (ja) | 2004-04-19 | 2004-04-19 | フルオロアルキルケトンの水和物の製造方法 |
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WO2005102972A1 true WO2005102972A1 (ja) | 2005-11-03 |
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PCT/JP2005/006905 WO2005102972A1 (ja) | 2004-04-19 | 2005-04-08 | フルオロアルキルケトンの水和物の製造方法 |
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US (1) | US7598425B2 (ja) |
EP (1) | EP1757572A4 (ja) |
JP (1) | JP4396831B2 (ja) |
CN (1) | CN1942422B (ja) |
WO (1) | WO2005102972A1 (ja) |
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JP5315609B2 (ja) | 2006-06-05 | 2013-10-16 | ダイキン工業株式会社 | 新規カルボン酸化合物、その用途及びその製造方法 |
JP5114880B2 (ja) | 2006-07-06 | 2013-01-09 | ダイキン工業株式会社 | 新規α−フルオロメトキシカルボン酸エステル、該α−フルオロメトキシカルボン酸エステルの製造方法及びセボフルランの製造方法 |
JP2009149591A (ja) * | 2007-05-28 | 2009-07-09 | Daikin Ind Ltd | フルオロアルキルアルコールの製造方法 |
JP5163064B2 (ja) | 2007-11-13 | 2013-03-13 | ダイキン工業株式会社 | 新規カルボン酸エステル、その用途及びその製造方法 |
US9359277B2 (en) | 2011-03-22 | 2016-06-07 | Purdue Research Foundation | Compositions and processes of preparing and using the same |
CN107915581A (zh) * | 2017-12-08 | 2018-04-17 | 西安近代化学研究所 | 一种2,2,3,3,3‑五氟丙醇的制备方法 |
Citations (3)
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JPH08231448A (ja) * | 1994-12-06 | 1996-09-10 | Cerestar Holding Bv | キシリトールの生成方法 |
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US3321515A (en) | 1963-04-24 | 1967-05-23 | Du Pont | Method of making fluorinated carbonyl compounds |
JPS5325521A (en) | 1976-08-23 | 1978-03-09 | Dai Ichi Seiyaku Co Ltd | Preparation of pantethine |
US4334099A (en) | 1980-12-18 | 1982-06-08 | Allied Corporation | Preparation of hexafluoroacetone from hexafluorothioacetone dimer |
US4337361A (en) | 1981-02-27 | 1982-06-29 | Allied Corporation | Liquid phase synthesis of hexafluoroacetone |
US4337362A (en) | 1981-06-08 | 1982-06-29 | Allied Corporation | Conversion of hexafluorothioacetone dimer into hexafluoroacetone |
JPS5862130A (ja) | 1981-10-09 | 1983-04-13 | Asahi Glass Co Ltd | ヘキサフルオロアセトンの製法 |
JPS61277645A (ja) | 1985-06-03 | 1986-12-08 | Nippon Mektron Ltd | ヘキサフルオロアセトンの製造法 |
JPH0788594B2 (ja) * | 1986-07-31 | 1995-09-27 | 日本メクトロン株式会社 | ヘキサフルオロアセトン水和物の製造法 |
JPH085823B2 (ja) | 1988-02-05 | 1996-01-24 | 日本メクトロン株式会社 | ヘキサフルオロアセトンまたはその水和物の製造法 |
JPS6426527U (ja) | 1987-08-11 | 1989-02-15 | ||
DE69409733T2 (de) * | 1993-08-26 | 1998-11-19 | Kuraray Co | Verfahren zur Herstellung optisch aktiven 2-Norbornanons |
US5466879A (en) | 1994-02-28 | 1995-11-14 | Minnesota Mining And Manufacturing Company | Production of hexafluoroacetone and its oxime |
JP4534274B2 (ja) | 1999-09-13 | 2010-09-01 | ユニマテック株式会社 | ヘキサフルオロアセトンまたはその水和物の製造法 |
EP1415975B1 (en) | 2001-07-19 | 2006-11-15 | Daikin Industries, Ltd. | Processes for preparation of hexafluoroacetone and its hydrate |
-
2004
- 2004-04-19 JP JP2004123045A patent/JP4396831B2/ja not_active Expired - Fee Related
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2005
- 2005-04-08 EP EP05728496A patent/EP1757572A4/en not_active Withdrawn
- 2005-04-08 US US11/578,523 patent/US7598425B2/en not_active Expired - Fee Related
- 2005-04-08 WO PCT/JP2005/006905 patent/WO2005102972A1/ja active Application Filing
- 2005-04-08 CN CN2005800116810A patent/CN1942422B/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS6335537A (ja) * | 1986-07-31 | 1988-02-16 | Nippon Mektron Ltd | ヘキサフルオロアセトン水和物の製造法 |
JPH0769959A (ja) * | 1993-08-26 | 1995-03-14 | Kuraray Co Ltd | 2−ノルボルナノンの製造方法 |
JPH08231448A (ja) * | 1994-12-06 | 1996-09-10 | Cerestar Holding Bv | キシリトールの生成方法 |
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See also references of EP1757572A4 * |
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JP4396831B2 (ja) | 2010-01-13 |
CN1942422B (zh) | 2010-07-07 |
US20080262273A1 (en) | 2008-10-23 |
US7598425B2 (en) | 2009-10-06 |
EP1757572A1 (en) | 2007-02-28 |
CN1942422A (zh) | 2007-04-04 |
JP2005306747A (ja) | 2005-11-04 |
EP1757572A4 (en) | 2008-04-09 |
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