WO2005065817A1 - エキシマランプ照射装置及びその使用方法 - Google Patents

エキシマランプ照射装置及びその使用方法 Download PDF

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Publication number
WO2005065817A1
WO2005065817A1 PCT/JP2004/019762 JP2004019762W WO2005065817A1 WO 2005065817 A1 WO2005065817 A1 WO 2005065817A1 JP 2004019762 W JP2004019762 W JP 2004019762W WO 2005065817 A1 WO2005065817 A1 WO 2005065817A1
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WO
WIPO (PCT)
Prior art keywords
excimer lamp
lamp
excimer
surface temperature
house
Prior art date
Application number
PCT/JP2004/019762
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
Koji Hosotani
Hiromi Sakamoto
Original Assignee
Japan Storage Battery Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Storage Battery Co., Ltd. filed Critical Japan Storage Battery Co., Ltd.
Publication of WO2005065817A1 publication Critical patent/WO2005065817A1/ja

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122Incoherent waves
    • B01J19/123Ultraviolet light
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel

Definitions

  • the present invention relates to, for example, an improvement of an excimer lamp irradiation apparatus using an excimer lamp that emits ultraviolet light that can be used for a photochemical reaction.
  • an ultraviolet irradiation device there is a device in which a discharge lamp having a substantially cylindrical outer shape is filled with nitrogen gas in a lamp house provided with a light extraction window and stored.
  • Japanese Patent No. 2,854,255 discloses an ultraviolet irradiation device using a dielectric barrier discharge lamp.
  • FIG. 5 is a diagram showing the configuration shown in Japanese Patent No. 28544255, in which cylindrical dielectric barrier discharge lamps 41 a, 41 b and 41 c are formed in a lamp house 2. Housed in one.
  • the lamp house 21 is provided with a light extraction window 20, and a space 26 between the dielectric barrier discharge lamps 41a, 41b, and 41c and the light extraction window 20 is nitrogen gas. Is filled with With such a configuration, a portion of the vacuum ultraviolet rays emitted from the dielectric barrier discharge lamps 41a, 41b, and 41c toward the adjacent dielectric barrier discharge lamp has a V-shaped light.
  • the light is reflected by the reflectors 43 and 45 and is reflected, the traveling direction of the light is changed downward, and the light is emitted from the light extraction window 20.
  • the vacuum ultraviolet light emitted from the dielectric barrier discharge lamps 41a, 41b and 41c is applied to the dielectric barrier discharge lamps 41a, 41b and 41c and the light extraction window 20. Pass through the space 26, which is not absorbed because it is filled with nitrogen gas. Therefore, from the light extraction window 20, the vacuum ultraviolet rays emitted from the dielectric barrier discharge lamps 41 a, 4 lb, and 41 c are directed directly to the portions toward the light reflectors 43 and 45 in the horizontal direction. The total of the portion directed toward the irradiation object is released, and the light extraction window 20 becomes a substantially planar vacuum ultraviolet light source.
  • the surface temperature of the glass window is relatively low (about 70 ° C), so that scattered objects generated from the irradiated object during irradiation are glass.
  • various chemicals such as organic solvents, acids, and alkalis are vaporized and atomized and float in the air where this equipment is installed, they may be exposed to ultraviolet rays and sulfuric acid.
  • white powder adheres to the window glass due to reaction products such as ammonia, etc. there were. If scattered matter or white powder adheres to the light extraction window, the intensity of ultraviolet light is reduced to prevent the transmission of excimer light, or the deposited scattered matter or white powder is peeled off, contaminating the illuminated object.
  • Japanese Patent Application Laid-Open No. H11-295550 discloses that the surface temperature of the light extraction window is set to 100 ° C. or higher. If this is done, the scattered matter and white powder will be decomposed by radiant heat and will not adhere to the light extraction window, even if they approach the glass window. According to Japanese Patent Application Laid-Open No. H11-295550, the temperature of the glass window is set at 100 ° C. or higher in order to heat the glass window to 100 ° C. or higher. Means are provided. Disclosure of the invention
  • the excimer lamp and the glass window are referred to as “glass window” in the present invention.
  • the excimer lamp emitted from the excimer lamp is partially blocked by the heating means, and the excimer light reaching the object to be irradiated is reduced.
  • the present invention has been made in view of such a problem.
  • the feature of the present invention is that the glass window itself, which causes high cost and is difficult to manufacture, is excluded from the excimer lamp irradiation device. Thus, no costs are required. Also, the difficulty of manufacturing large glass windows is no longer relevant for excimer lamp irradiation equipment. Furthermore, since the distance between the excimer lamp and the object can be reduced, the object to be irradiated can be more precisely cleaned.
  • the present invention is also characterized in that the surface temperature of the excimer lamp is 100 ° C. or higher.
  • the surface temperature of the excimer lamp is preferably at most 180 ° C.
  • the arc tube of an excimer lamp is made of transparent quartz, because the ultraviolet transmittance of the transparent quartz decreases.
  • the surface temperature of the excimer lamp is measured by attaching a thermocouple.
  • a thermocouple receives noise, it is possible to measure the temperature immediately after the excimer lamp is turned off. Even if the surface temperature was after the excimer lamp was turned off, the temperature measured at that time was almost equal to the temperature when the excimer lamp was in use, just after the excimer lamp was turned off.
  • the excimer lamp irradiation apparatus of the present invention is characterized in that a member for capturing organisms from an object to be irradiated is provided in a lamp house.
  • the surface of the excimer lamp does not adhere to the objects scattered from the object to be treated, but adheres to a location different from the surface of the excimer lamp. become.
  • This alternative location is often the interior of the lamp house. If the interior of the lamp house becomes dirty, it will take time to maintain the equipment. Therefore, by providing a member for catching flying objects in the lamp house, it becomes possible to maintain the device by replacing only that member. Therefore, equipment maintenance costs can be significantly reduced.
  • FIG. 1 is a sectional view showing an embodiment of an excimer lamp according to the present invention.
  • FIG. 2 is a sectional view showing a first embodiment of an excimer lamp irradiation apparatus according to the present invention.
  • FIG. 3 is a cross-sectional view showing a second embodiment of the excimer lamp irradiation device according to the present invention.
  • FIG. 4 is a cross-sectional view showing a third embodiment of the excimer lamp irradiation device according to the present invention.
  • FIG. 5 is a cross-sectional view showing a conventional excimer lamp irradiation device.
  • FIG. 6 is a graph showing the relationship between excimer lamp surface temperature and ultraviolet intensity.
  • 1 is an excimer lamp
  • 2 is an electrode
  • 2 ' is an electrode
  • 3 is an arc tube
  • 5 is a lamp house
  • 6 is a scattered matter catching plate
  • 7 is a lamp holder.
  • FIG. 1 is a sectional view showing an embodiment of an excimer lamp according to the present invention.
  • reference numeral 1 denotes an excimer lamp
  • the arc tube 3 is made of transparent quartz
  • the cross-sectional shape is a square
  • the thickness of the quartz is about 2 mm, which is a substantially rectangular parallelepiped.
  • an electrode 2 made of a nickel metal thin film is formed by vacuum evaporation.
  • chromium can be used in addition to nickel.
  • an electrode 2 'made of a metal thin film also made of nickel is formed on the surface opposite to the surface on which the electrode 2 made of the metal thin film is formed.
  • the electrode 2 ′ made of a metal thin film is formed in a mesh shape to extract ultraviolet rays, except for an end where a lead wire is attached.
  • FIG. 2 is a cross-sectional view showing a first embodiment of an excimer lamp irradiation apparatus according to the present invention.
  • the excimer lamp 1 is mounted on a lamp house 5 via a lamp holder 7.
  • the object to be processed is arranged at a distance of 2 to 3 mm from the excimer lamp 1.
  • the object to be irradiated is mainly washed with various chemicals such as an organic solvent, an acid, or an alkali. Therefore, these various chemicals may absorb excimer light and decompose, producing scattered matter.
  • various chemicals such as an organic solvent, an acid, or an alkali. Therefore, these various chemicals may absorb excimer light and decompose, producing scattered matter.
  • One example is triammonium hydrogen sulfide / ammonium sulfate.
  • the processing time required for dry cleaning and the like when the object to be treated is irradiated with ultraviolet light having a wavelength of 17 nm is hardly affected even if the intensity of the ultraviolet light is reduced to 85%. It was confirmed by experiments that the treatment time increased by about 30 mm when the temperature decreased. Therefore, in order to obtain an ultraviolet intensity that hardly affects the processing time, it is necessary to maintain at least a decrease rate of the ultraviolet intensity of 85% or more.
  • the present inventors have conducted various studies on a method for preventing the scattered matter from the object to be treated from attaching to the surface of the excimer lamp and reducing the intensity of the ultraviolet light.
  • the surface temperature of the excimer lamp was set to 100 ° C or more. You can do it. That is, if the temperature of the surface of the excimer lamp is set to 100 ° C. or higher, the rate of decrease in ultraviolet intensity does not decrease to 85% or less even after lighting for about 300 hours.
  • the excimer lamp surface temperature can be changed by adjusting the output of the excimer lamp.
  • the excimer lamp irradiation apparatus of the present invention does not require a glass window and does not require a means for heating the glass window. Therefore, it is possible to provide an excimer lamp irradiation apparatus that does not cost much.
  • the reason why the scattered matter does not adhere is considered as follows. If the temperature of the excimer lamp surface is set to 100 ° C or more, the scattered matter does not adhere to the excimer lamp surface and moves to a place lower in temperature than the lamp surface temperature, such as the inner surface of the lamp house 5. I do. Therefore, since the scattered matter does not adhere to the lamp surface, the UV intensity is not reduced to 85% or less.
  • the transmittance of the excimer light in the arc tube 3 is related to the temperature. When the temperature exceeds 180 ° C, the transmittance sharply decreases. However, when the temperature is 180 ° C or less, the transmittance is 85% or less. Can be prevented.
  • FIG. 3 is a sectional view showing a second embodiment of the excimer lamp irradiation apparatus according to the present invention.
  • reference numeral 1 denotes an excimer lamp, which is mounted on a lamp house 5 via a lamp holder 7.
  • a flying object catching mechanism 6 is provided between the excimer lamp 1 and the lamp house 5. As shown in FIG. 3, the flying object capturing mechanism 6 is configured to cover the entire inner surface including the upper surface and the side surface of the lamp house 5.
  • the scattered matter generated on the surface of the object to be processed is attached to the scattered matter capturing mechanism 6 and captured.
  • the removal of the scattered matter adhered to the scattered matter capturing mechanism 6 may be performed by removing the scattered matter capturing mechanism 6 from the lamp house 5 for cleaning or by replacing the scattered matter capturing mechanism 6 with a new one. Therefore, maintenance of the excimer lamp irradiation device becomes easy. Furthermore, if the lamp surface temperature is set to 100 ° C. or higher, there is an advantage that the rate of decrease in ultraviolet intensity does not decrease to 85% or less even after operating for about 300 hours.
  • FIG. 4 is a sectional view showing a third embodiment of the excimer lamp irradiation apparatus according to the present invention, which is a further improved version of the second embodiment.
  • an excimer lamp 1 is attached to a lamp house 5 via a lamp holder 7.
  • a scattered matter trapping mechanism 6 permeable to gas is installed between the excimer lamp 1 and the lamp house 5.
  • the flying object catching mechanism 6 may be, for example, a heat-resistant cloth made of perforated metal or glass fiber.
  • the scattered object trapping mechanism 6 has gas permeability and is connected to the side surface of the lamp house 5. With such a configuration, it is possible to completely prevent the scattered matter from entering from above the scattered matter capturing mechanism 6.
  • a gas inlet 9 is provided in the lamp house 5 to allow gas to flow between the excimer lamp 1 and the lamp house 5.
  • reference numeral 1 denotes an excimer lamp, which is composed of an arc tube 3 made of transparent quartz.
  • the cross-sectional shape of the arc tube 3 is a square shape, the outer dimension is about 35 mm on the long side and about 12 mm on the short side, and the length in the long axis direction and the thickness of quartz in the direction perpendicular to the paper are respectively They are about 135 mm and about 2 mm.
  • Both ends of the arc tube 3 in the major axis direction are closed and sealed, and the inside of the container 4 is filled with a xenon gas that generates excimer molecules during operation of the excimer lamp at a pressure of about 4 ⁇ 10 4 Pa. Have been.
  • an electrode 2 made of a nickel metal thin film having a thickness of about 0.25 mm is formed by vacuum evaporation. Further, on the surface opposite to the surface on which the electrode 2 made of the metal thin film is formed, an electrode 2 ′ also made of a nickel metal thin film having a thickness of about 0.25 mm is formed. However, the electrode 2 ′ made of a metal thin film is formed in a mesh shape with a line width of about 0.5 mm and a mesh size of about 2 mm except for the end where a lead wire is attached, in order to extract ultraviolet rays. I have.
  • the surface temperature of the lamp is represented by the outer surface temperature at the approximate center of the lower surface of the excimer lamp.
  • FIG. 6 is a graph showing the relationship between the surface temperature of the excimer lamp and the ultraviolet intensity in Table 1. As can be seen from Table 1 and FIG. 6, if the surface temperature of the excimer lamp is within the range of 100 to 180 ° C after about 300 hours of operation, there is no abnormality in the appearance of the excimer lamp. UV intensity is maintained at more than 88%. On the other hand, when the surface temperature of the excimer lamp is lower than 100 ° C., scattered matter adheres to the surface of the excimer lamp, discolors white, and the intensity of ultraviolet light rapidly decreases.
  • the intensity of ultraviolet light drops sharply. If the surface temperature of the excimer lamp exceeds 180 ° C, the UV intensity decreases because the surface temperature of the excimer lamp becomes too high and the UV transmittance of the quartz constituting the arc tube 3 decreases. it is conceivable that.
  • the type of gas to be filled in the excimer lamp can be changed.
  • the tests were performed with different lengths, but in any case, it was found that setting the surface temperature of the excimer lamp to 100 to 180 ° C could prevent the adhesion of flying objects.
  • the excimer lamp irradiator in which an excimer lamp is disposed in a lamp house having an opening for irradiating the object to be processed with excimer light, the excimer light emitted from the excimer lamp passes through the glass window.
  • the excimer lamp has a surface temperature of 100 ° C. or higher, the scattered matter generated from the irradiated object does not adhere to the surface of the excimer lamp.
  • the glass windows required for the conventional excimer lamp irradiation equipment are not required.
  • the industrial utility value of the excimer lamp irradiation device of the present invention is extremely large.

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Engineering & Computer Science (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
PCT/JP2004/019762 2003-12-26 2004-12-24 エキシマランプ照射装置及びその使用方法 WO2005065817A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003435750A JP2005193088A (ja) 2003-12-26 2003-12-26 エキシマランプ照射装置
JP2003-435750 2003-12-26

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WO2005065817A1 true WO2005065817A1 (ja) 2005-07-21

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JP (1) JP2005193088A (enrdf_load_stackoverflow)
KR (1) KR100641309B1 (enrdf_load_stackoverflow)
CN (1) CN100420512C (enrdf_load_stackoverflow)
TW (1) TWI259497B (enrdf_load_stackoverflow)
WO (1) WO2005065817A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3852130A4 (en) * 2019-10-07 2022-04-27 Ushio Denki Kabushiki Kaisha DEVICE FOR RADIATION WITH ULTRAVIOLET RAYS

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4501830B2 (ja) 2005-09-28 2010-07-14 ウシオ電機株式会社 エキシマランプ及び紫外線照射装置
JP5146061B2 (ja) * 2008-04-10 2013-02-20 ウシオ電機株式会社 エキシマランプおよびこれを備えたランプユニット
JP5195111B2 (ja) * 2008-07-17 2013-05-08 ウシオ電機株式会社 エキシマランプ装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000216128A (ja) * 1999-01-26 2000-08-04 Hitachi Electronics Eng Co Ltd 紫外線照射による基板処理装置
JP2002168999A (ja) * 2000-11-30 2002-06-14 Ushio Inc 誘電体バリヤ放電ランプを使った光照射装置。

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3653980B2 (ja) * 1998-04-09 2005-06-02 ウシオ電機株式会社 紫外線照射装置
JP2001185089A (ja) * 1999-12-28 2001-07-06 Quark Systems Co Ltd エキシマ照射装置
PL195794B1 (pl) * 1999-06-04 2007-10-31 Henry Kozlowski Zespół źródła promieniowania nadfioletowego do uzdatniania płynów
JP2001217216A (ja) * 1999-11-25 2001-08-10 Hoya Schott Kk 紫外線照射方法及び装置
JP2001319510A (ja) * 2000-05-11 2001-11-16 Ushio Inc 誘電体バリア放電ランプ装置
US6559460B1 (en) * 2000-10-31 2003-05-06 Nordson Corporation Ultraviolet lamp system and methods
JP4126892B2 (ja) * 2001-09-14 2008-07-30 ウシオ電機株式会社 光照射装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000216128A (ja) * 1999-01-26 2000-08-04 Hitachi Electronics Eng Co Ltd 紫外線照射による基板処理装置
JP2002168999A (ja) * 2000-11-30 2002-06-14 Ushio Inc 誘電体バリヤ放電ランプを使った光照射装置。

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3852130A4 (en) * 2019-10-07 2022-04-27 Ushio Denki Kabushiki Kaisha DEVICE FOR RADIATION WITH ULTRAVIOLET RAYS
EP4210087A1 (en) * 2019-10-07 2023-07-12 Ushio Denki Kabushiki Kaisha Ultraviolet irradiation device

Also Published As

Publication number Publication date
KR20060038900A (ko) 2006-05-04
TWI259497B (en) 2006-08-01
KR100641309B1 (ko) 2006-11-01
CN100420512C (zh) 2008-09-24
TW200522127A (en) 2005-07-01
CN1787875A (zh) 2006-06-14
JP2005193088A (ja) 2005-07-21

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