WO2004114729A1 - プラズマ発生電極及びプラズマ発生装置、並びに排気ガス浄化装置 - Google Patents
プラズマ発生電極及びプラズマ発生装置、並びに排気ガス浄化装置 Download PDFInfo
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- WO2004114729A1 WO2004114729A1 PCT/JP2004/008618 JP2004008618W WO2004114729A1 WO 2004114729 A1 WO2004114729 A1 WO 2004114729A1 JP 2004008618 W JP2004008618 W JP 2004008618W WO 2004114729 A1 WO2004114729 A1 WO 2004114729A1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N13/00—Exhaust or silencing apparatus characterised by constructional features ; Exhaust or silencing apparatus, or parts thereof, having pertinent characteristics not provided for in, or of interest apart from, groups F01N1/00 - F01N5/00, F01N9/00, F01N11/00
- F01N13/009—Exhaust or silencing apparatus characterised by constructional features ; Exhaust or silencing apparatus, or parts thereof, having pertinent characteristics not provided for in, or of interest apart from, groups F01N1/00 - F01N5/00, F01N9/00, F01N11/00 having two or more separate purifying devices arranged in series
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
- F01N3/08—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
- F01N3/0892—Electric or magnetic treatment, e.g. dissociation of noxious components
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32816—Pressure
- H01J37/32834—Exhausting
- H01J37/32844—Treating effluent gases
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N2240/00—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being
- F01N2240/28—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being a plasma reactor
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
Definitions
- the present invention relates to a plasma generation electrode, a plasma generation device, and an exhaust gas purification device.
- the present invention relates to a plasma generating electrode, a plasma generating device, and an exhaust gas purifying device. More specifically, the present invention relates to a plasma generation electrode and a plasma generation device capable of simultaneously generating plasma in different states. Further, the present invention relates to an exhaust gas purifying device capable of purifying exhaust gas satisfactorily.
- Silent discharge is generated by placing a dielectric between two electrodes and applying a high-voltage alternating current or a periodic pulse voltage, and active species, radicals, and ions are generated in the resulting plasma field. It is known that it promotes the reaction and decomposition of gases, which can be used to remove harmful components contained in engine exhaust gas and various incinerator exhaust gases.
- the plasma is intended to process a predetermined substance.
- the generation electrode cannot process other substances, and when processing exhaust gas containing a plurality of substances, there is a problem that a plurality of plasma generation electrodes are required.
- high-intensity plasma must be generated, resulting in a problem of increased power consumption.
- the NO reduction catalyst used in exhaust gas purification equipment such as SCR that further processes the gas that has passed through the plasma generation electrode converts nitrogen dioxide (NO) into oxygen using the fuel (hydrocarbon) contained in the exhaust gas. Hydrocarbons are oxidized by high-intensity plasma. The Utame, the ability of vo chi reduction catalyst is lowered.
- the present invention has been made in view of the above-described problems, and provides a plasma generating electrode and a plasma generating apparatus capable of simultaneously generating plasma in different states. Further, the present invention provides an exhaust gas purifying apparatus which includes the above-described plasma generating device and a catalyst and is capable of purifying exhaust gas satisfactorily.
- the present invention provides the following plasma generating electrode, plasma generating device, and exhaust gas purifying device.
- a plasma generating electrode that includes at least a pair of electrodes disposed to face each other and is capable of generating plasma by applying a voltage between the electrodes, wherein at least one of the pair of electrodes is provided.
- One section is a plate-shaped ceramic body serving as a dielectric, and a cross section cut in a plane perpendicular to the film thickness direction and penetrated in the film thickness direction and provided in the ceramic body without overlapping each other.
- a plurality of conductive films in which a plurality of through-holes having a shape including a circular arc partially form a predetermined arrangement pattern, wherein at least one of the through-holes formed in the at least one conductive film is formed.
- the arrangement pattern is configured to be different from the arrangement pattern of the through holes formed in the other conductive films, and by applying a voltage between the pair of electrodes, the different through holes of the conductive film are different.
- a plasma generation electrode (hereinafter, referred to as a plasma generation electrode) that can simultaneously generate plasma in different states according to the array pattern
- a plasma generating electrode including at least a pair of electrodes arranged opposite to each other and capable of generating a plasma by applying a voltage between the electrodes, wherein at least one of the pair of electrodes is One has a plate-shaped ceramic body serving as a dielectric, and a cross-sectional shape cut in a plane provided inside the ceramic body and perpendicular to the film thickness direction and penetrated in the film thickness direction.
- a plasma generating electrode (hereinafter, may be referred to as a "second invention") capable of simultaneously generating plasma in different states according to the arrangement pattern of the through holes having different conductive films.
- the cross-sectional shape of the through hole cut along a plane perpendicular to the film thickness direction is circular.
- [5] At least one kind selected from the group consisting of S, tungsten, molybdenum, manganese, chromium, titanium, dinoreconium, nickel, iron, silver, copper, platinum, and palladium.
- the conductive film is screen-printed, calendered, sprayed on the ceramic body
- the plasma generation electrode according to any one of [1] to [5], wherein the plasma generation electrode is disposed by chemical vapor deposition or physical vapor deposition.
- a plasma generating apparatus including the plasma generating electrode according to any one of [1] to [6] (hereinafter, may be referred to as a "third invention").
- An exhaust gas purifying apparatus comprising: the plasma generator according to the above [7]; and a catalyst, wherein the plasma generator and the catalyst are disposed inside an exhaust system of an internal combustion engine.
- a fourth invention it may be referred to as a "fourth invention.”
- FIG. 1 is a perspective view schematically showing one embodiment of a plasma generating electrode of the present invention (first invention).
- FIG. 2 is a plan view schematically showing an example of a ceramic body and a conductive film constituting one electrode in one embodiment of the plasma generating electrode of the present invention (first invention). is there
- FIG. 3 is a perspective view schematically showing another embodiment of the plasma generating electrode of the present invention (first invention).
- FIG. 4 is a plan view schematically showing another example of a ceramic body and a conductive film constituting one electrode in one embodiment of the plasma generating electrode of the present invention (first invention). It is a figure.
- FIG. 5 is a plan view schematically showing another example of a ceramic body and a conductive film constituting one electrode in one embodiment of the plasma generating electrode of the present invention (first invention). It is a figure.
- FIG. 6 is a plan view schematically showing another example of a ceramic body and a conductive film constituting one electrode in one embodiment of the plasma generating electrode of the present invention (first invention). It is a figure.
- FIG. 7 is a plan view schematically showing another example of a ceramic body and a conductive film constituting one electrode in one embodiment of the plasma generating electrode of the present invention (first invention). It is a figure.
- FIG. 8 is a plan view schematically showing another example of a ceramic body and a conductive film constituting one electrode in one embodiment of the plasma generating electrode of the present invention (first invention). It is a figure.
- FIG. 9 is a perspective view schematically showing one embodiment of a plasma generating electrode of the present invention (second invention).
- FIG. 10 is a plan view schematically showing an example of a ceramic body and a conductive film constituting one electrode in one embodiment of the plasma generating electrode of the present invention (second invention). It is a figure.
- FIG. 11 (a) is a cross-sectional view of one embodiment of a plasma generator according to the present invention (third invention) cut along a plane including a flow direction of a fluid to be processed.
- FIG. 11 (b) is a cross-sectional view taken along line AA of FIG. 11 (a).
- FIG. 12 is an explanatory view schematically showing one embodiment of the exhaust gas purifying apparatus of the present invention (fourth invention).
- FIG. 1 is a perspective view schematically showing one embodiment of a plasma generating electrode of the present invention (first invention), and FIG. 2 is a diagram showing a ceramic constituting one of the plasma generating electrodes.
- FIG. 3 is a plan view schematically showing a body and a conductive film.
- the plasma generating electrode 1 of the present embodiment includes at least a pair of electrodes 5 that are opposed to each other, and can generate plasma by applying a voltage between the electrodes.
- a plasma generating electrode 1 in which at least one electrode 5a of a pair of electrodes 5 is a plate-shaped ceramic serving as a dielectric.
- 4 has a plurality of conductive films 3 formed so as to have a predetermined arrangement pattern, and the arrangement pattern of the through holes 4a formed in at least one conductive film 3a is different from that of another conductive film 3b.
- the arrangement pattern of the formed through-holes 4b is different from that of the formed through-holes 4b.
- the configuration of the other electrode 5b is not particularly limited. As shown in FIG. 1, a conventionally known metal electrode may be used, but as shown in FIG. It is preferable that the other electrode 5b constituting the generating electrode 1 has a plurality of conductive films in which through holes of different arrangement patterns are formed, similarly to the one electrode 5a. In the case of such a configuration, it is preferable that one electrode 5a and the other electrode 5b are formed so that the connection component force for supplying current to each of them is opposite to each other. Masire,
- the plasma generating electrode 1 shown in FIG. 1 a state is shown in which two electrodes 5 are arranged to face each other, but the number of electrodes 5 is not limited to this. Although omitted, three or more electrodes may be arranged so as to face each other in parallel, and adjacent mutual electrodes may be configured as a pair of electrodes, respectively.
- the portion may have a shape including an arc, for example, an elliptical shape, a shape in which vertices of a polygon are rounded in an arc shape, or the like.
- Plasma generating electrode 1 of the present embodiment has a plate-shaped ceramic body 2 serving as a dielectric, and a plurality of conductive films 3 arranged inside ceramic body 2 without overlapping each other. This is a barrier discharge electrode 5.
- the plasma generation electrode 1 is, for example, an exhaust gas processing device or a purification device that processes a fluid to be processed such as an exhaust gas into plasma generated between the pair of electrodes 5, or oxygen contained in air or the like. It can be suitably used for an ozonizer which purifies ozone by reacting.
- the through-holes 4 constituting the respective arrangement patterns have a shape partially including an arc. This allows the through-holes 4 to serve as a starting point of the discharge to generate a discharge evenly on the outer periphery of the through-holes 4, and also allows the plurality of through-holes 4 to form the entire conductive film 3 in a predetermined arrangement pattern. As a result, the electrode 5 can generate a stable and uniform plasma as a whole.
- the shape of the through hole 4 is a polygon or the like formed by a circle, discharge concentrates on a portion corresponding to the vertex of the polygon, and uniform plasma cannot be generated.
- the arrangement pattern of the through holes 4a formed in one conductive film 3a different from the arrangement pattern of the through holes 4b formed in the other conductive film 3b, one conductive film 3a and another conductive film 3a are formed. It is possible to make the capacitance different from that of the film 3b. Since the capacitances are different, discharges in different states occur in the conductive films 3a and 3b, respectively, and as a result, plasma in different states can be generated.
- the difference in the arrangement pattern in each conductive film 3 may mean that the perimeter of the through hole 4 per unit area of each conductive film 3 may be different, which may cause the discharge in each conductive film 3 to be different. Also.
- the arrangement pattern of through holes 4 formed in each conductive film 3 is configured to generate plasma having a predetermined intensity.
- the strength of the plasma generated between the electrodes 5 is determined by the material and capacitance of the conductive film 3, the voltage applied to the electrode 5, the distance between the electrodes 5a and 5b, and the like. By making the capacitance different depending on the arrangement pattern of the through holes 4, the intensity of plasma generated on each conductive film 3 can be adjusted.
- At least one conductive film 3a may be mainly composed of a metal different from other conductive films 3b.
- the capacitance of one conductive film 3a and the other conductive film 3b can be adjusted from the viewpoint of the material, and the conductive films 3a and 3b have a desired strength. Easy to generate plasma
- one conductive film 3a and another conductive film 3b may be supplied with electricity from the same power supply, or may be supplied with different power supplies. Electricity may be supplied from this.
- one electrode 5a has two conductive films 3a and 3b, and the through holes 4a and 4b having different diameters are formed so as to have different intervals.
- the arrangement pattern of the through-holes 4a and 4b is not limited to this. For example, as shown in FIG. 4, the diameters of the through-holes 4a and 4b are the same, and the distance between them is changed. Thus, the arrangement pattern may be different.
- each of the conductive films 3a and 3b and the number of the conductive films 3a and 3b are not limited.
- the through holes 4c, 4d, and 4e may be formed in 3d and 3e in a predetermined arrangement pattern.
- the plasma generating electrode 1 of the present embodiment since plasma in different states can be simultaneously generated between the pair of electrodes 5, for example, an internal combustion engine such as an automobile engine is used.
- an internal combustion engine such as an automobile engine is used.
- soot is oxidized by plasma generated by one conductive film 3a, and nitrogen monoxide (NO) is oxidized by plasma generated by another conductive film 3b. It can be processed.
- NO nitrogen monoxide
- a plasma generating electrode provided with one electrode 5a shown in FIG. 2 and FIG. 4 is used in an exhaust gas treatment device and the exhaust gas is passed in the direction of arrow A, the two conductive films 3a, The plasma in different states generated in 3b can be continuously passed, and a plurality of substances contained in the exhaust gas can be effectively treated.
- the electrode 5a shown in FIGS. 5 to 8 is particularly configured to be suitably used for treating exhaust gas containing soot.
- the conductive film 3d is oxidized so that soot can be effectively oxidized.
- a strong plasma is generated, while a plasma having a low oxidizing power is generated in the conductive film 3e to oxidize relatively easily oxidizable substances such as NO and C ⁇ other than soot.
- the exhaust gas is passed through the electrode 5a in the direction indicated by the arrow A, first, a relatively large amount of soot is attracted to the material to be treated by the plasma generated by the conductive film 3c. Thus, a soot bias is formed in the flow of the exhaust gas.
- the soot is collectively oxidized with the plasma generated in the conductive film 3d, and Outside NO and CO are oxidized by plasma generated in either the conductive film 3d or the conductive film 3e.
- this configuration it is possible to form a region composed of only plasma with weak oxidizing power between the pair of electrodes 5 (see FIG. 1) in a direction parallel to the flow direction of the exhaust gas. Therefore, it is possible to discharge the fuel (hydrocarbon) contained in the exhaust gas in a state where it is not completely oxidized, that is, in a state where the hydrocarbon is converted into aldehyde or the like. Therefore, when exhaust gas treatment is performed using an N ⁇ reduction catalyst or the like, the efficiency can be improved.
- a plasma generating electrode provided with the electrode 5a shown in FIGS. 7 and 8 When a plasma generating electrode provided with the electrode 5a shown in FIGS. 7 and 8 is used, first, for example, a swirling flow is generated in the exhaust gas before the plasma is passed, and centrifugal force is applied to the exhaust gas. This creates a soot bias in the exhaust gas stream. Then, a plasma having a strong oxidizing power is generated in a region through which the exhaust gas in which the soot is biased, that is, the conductive film 3c is generated, and a plasma having a weak oxidizing power is generated in the other region, that is, the conductive film 3d.
- the same operation and effect as in the case of using the electrode 5a shown in FIGS. 5 and 6 can be obtained.
- the conductive film 3 used in the present embodiment preferably has a thickness equivalent to 0.1 to 10% of the thickness of the ceramic body 2. With this configuration, a uniform discharge can be generated on the surface of the ceramic body 2 serving as a dielectric.
- the specific thickness of the conductive film 3 is 5-50 ⁇ for reasons such as miniaturization of the plasma generating electrode 1 and reduction of the resistance of the fluid to be processed such as exhaust gas passing between the pair of electrodes 5. It is preferred that it is about. If the thickness of the conductive film 3 is less than 5 ⁇ m, the reliability may be poor when the conductive film 3 is formed by printing or the like, and the resistance of the formed conductive film 3 may be high. Therefore, the efficiency of plasma generation may be reduced. If the thickness of the conductive film 3 exceeds 50 xm, the resistance of the conductive film 3 decreases, but it affects the unevenness of the surface of the ceramic body 2 and the surface must be processed so that the surface is flat. There is.
- conductive film 3 forming one electrode 5a is provided inside ceramic body 2 so that the distance from both surfaces of ceramic body 2 is substantially equal.
- conductive film 3 forming one electrode 5a is provided inside ceramic body 2 so that the distance from both surfaces of ceramic body 2 is substantially equal.
- plasma of the same intensity is generated between the P-contact electrodes. Can be generated. If the ceramic bodies 2 are arranged so that their distances from both surfaces are different, the capacitance of one electrode 5a on each surface changes, and the discharge characteristics on each surface may be different.
- the conductive film 3 used in the present embodiment preferably contains a metal having excellent conductivity as a main component.
- the main components of the conductive film 3 include tungsten, molybdenum, and manganese.
- Preferable examples include at least one metal selected from the group consisting of chromium, titanium, zirconium, nickel, iron, silver, copper, platinum, and palladium.
- the main component means a component that accounts for 60% by mass or more of the component.
- the conductive film 3 contains two or more metals from the above-described groups as main components, the conductive film 3 accounts for 60% by mass or more of the total force component of those metals.
- a method of disposing the conductive film 3 inside the ceramic body 2 for example, a method of burying and disposing the conductive film 3 such as a metal plate or a metal foil in a pressed compact formed by powder press molding is provided. And the like.
- the above-described metal is mainly used so that the distance (distance in the thickness direction) of the pressed body from each other surface is equal.
- a metal plate or metal foil as a component is provided. Since the deposited metal foil or the like may be deformed or cut due to shrinkage of the ceramics during firing, firing is preferably performed so as to suppress mass transfer in a planar direction. With this configuration, it is possible to perform sintering by applying a pressing pressure in the thickness direction of the press-formed body.
- the conductive film 3 may be provided by being applied to the ceramic body 2.
- the specific coating method include, for example, screen printing, calendar roll, dip coating, chemical vapor deposition, physical vapor deposition, and the like. According to such a method, it is possible to easily form the thin conductive film 3 having excellent smoothness of the surface after coating.
- chemical vapor deposition and physical vapor deposition may be somewhat expensive, but a thinner conductive film can be easily arranged, and a smaller diameter, and A through hole having a smaller distance between adjacent centers can be easily formed.
- a conductive paste is formed by mixing a metal powder mentioned as a main component of the conductive film 3, an organic binder, and a solvent such as terpineol. Then, it can be formed by coating the ceramic body 2 by the method described above. Further, an additive may be added to the above-mentioned conductor base as needed to improve the adhesion to the ceramic body 2 and the sinterability.
- the ceramic body 2 By adding the same component as the ceramic body 2 to the metal component of the conductive film 3, it becomes possible to improve the adhesion between the conductive film 3 and the ceramic body 2. Further, a glass component can be added to the ceramic component added to the metal component. By adding the glass component, the sinterability of the conductive film 3 is improved, and the denseness is improved in addition to the adhesion.
- the total of the components and / or glass components of the ceramic body 2 other than the metal components is preferably 30% by mass or less. If it exceeds 30% by mass, the resistance value may decrease, and the function as the conductive film 3 may not be obtained.
- the ceramic body 2 in the present embodiment has a function as a dielectric as described above, and is used in a state where the conductive film 3 is sandwiched between the ceramic bodies 2 so that the conductive body (3) Compared to the case of performing discharge alone, biased discharge such as spark is reduced, and small discharge can be generated at a plurality of locations. Such a plurality of small discharges can reduce power consumption because a smaller amount of current flows compared to a discharge such as a spark, and further, a current flowing between the electrodes 5 due to the presence of the dielectric. Is limited, and it is possible to generate non-thermal plasma with low energy consumption without temperature rise.
- the ceramic body 2 used in the present embodiment preferably contains a material having a high dielectric constant as a main component, for example, aluminum oxide, zirconium oxide, silicon oxide, titanium-barium oxide, magnesium.
- a material having a high dielectric constant for example, aluminum oxide, zirconium oxide, silicon oxide, titanium-barium oxide, magnesium.
- a monocalcium-titanium oxide, a cerium-titanium-zinc oxide, silicon nitride, aluminum nitride, or the like can be preferably used.
- a material excellent in thermal shock resistance as a main component, it becomes possible to operate the plasma generating electrode 1 even under high temperature conditions.
- the thickness of the ceramic body 2 is not particularly limited, but is preferably 0.1 to 3 mm. If the thickness of the ceramic body 2 is less than 0.1 mm, the electrical insulation of the electrode 5 may not be secured. Further, if the thickness of the ceramic body 2 exceeds 3 mm, it will hinder space saving as an exhaust gas purification system, and the load will increase due to an increase in the distance between the electrodes, which may lower efficiency. [0040] As the ceramic body 2 used in the present embodiment, a ceramic green sheet for a ceramic substrate can be suitably used.
- the ceramic green sheet is formed by molding a slurry or paste for producing a green sheet to a predetermined thickness according to a conventionally known method such as a doctor blade method, a calendar method, a printing method, a reverse roller coater method, or the like. S can do it.
- the ceramic green sheet formed in this way is subjected to processing such as cutting, cutting, punching, forming a communication hole, or the like, and is formed by laminating a plurality of green sheets by thermocompression bonding or the like. It may be used as a laminate.
- the above-mentioned slurry or paste for producing a green sheet is preferably prepared by mixing a predetermined ceramic powder with an appropriate binder, sintering aid, plasticizer, dispersant, organic solvent and the like.
- Suitable examples of the ceramic powder include powders of alumina, mullite, ceramic glass, zirconia, cordierite, silicon nitride, aluminum nitride, and glass.
- silicon oxide, magnesium oxide, calcium oxide, titanium oxide, dinoreconium oxide and the like can be mentioned as preferred examples.
- the sintering aid is preferably added in an amount of 3 to 10 parts by mass with respect to 100 parts by mass of the ceramic powder.
- the plasticizer, the dispersant and the organic solvent, the plasticizer, the dispersant and the organic solvent used in the conventionally known methods can be suitably used.
- a ceramic sheet produced by extrusion molding can be suitably used.
- a plate-shaped ceramic molded body extruded from a kneaded product prepared by adding the above-mentioned ceramic powder and a molding aid such as methylcellulose or a surfactant or the like through a predetermined mold can be used.
- the porosity of the ceramic body 2 is preferably 0.1 to 35%, and more preferably 0.110%. With such a configuration, it is possible to efficiently generate plasma between the electrode 5a provided with the ceramic body 2 and the other electrode 5b opposed to each other, thereby realizing energy saving.
- the distance between the pair of electrodes 5 is preferably set to a distance that can effectively generate plasma between the pair of electrodes 5, and a force that varies depending on a voltage or the like applied to the electrode is preferable. 5 mm is preferable.
- a method for manufacturing the plasma generating electrode of the present embodiment will be specifically described.
- a ceramic green sheet to be the above-mentioned ceramic body is formed.
- at least one material selected from the group consisting of alumina, mullite, ceramic glass, and glass may be added to the above-described sintering aid, a binder such as a petyral resin or a cellulose resin, a plasticizer such as DOP or DBP, and a toluene.
- Organic solvents such as butadiene and butadiene are kneaded and mixed well using an alumina pot and alumina cobblestone to prepare a slurry for green sheet production. Further, these materials may be manufactured by ball mill mixing using a monoball.
- the obtained slurry for producing a green sheet is stirred under reduced pressure to remove bubbles, and further adjusted to have a predetermined viscosity.
- the slurry for green sheet production adjusted in this manner is formed into a tape shape by a tape forming method such as a doctor blade method to form an unfired ceramic body.
- a conductor paste for forming a conductive film disposed on one surface of the obtained unfired ceramic body is formed.
- This conductor paste can be formed, for example, by mixing a solvent such as a binder and terpineol with silver powder and sufficiently mixing the mixture using a triroll mill.
- the conductive paste thus formed is printed on the surface of the unfired ceramic body using screen printing or the like to form a plurality of conductive films. At this time, a plurality of through holes are printed in the conductive film so as to have different arrangement patterns.
- each conductive film is formed of an unfired ceramic body so that electricity can be supplied to each conductive film from outside the electrode. It is preferable to print so that it extends to the outer periphery.
- each conductive film having a different through hole arrangement pattern may be simultaneously printed or formed separately. Even though.
- printing may be performed using different types of conductive paste so that the main components of one conductive film and another conductive film are different.
- the unfired ceramic body on which the conductive film is printed and another unfired ceramic body are laminated so as to cover the printed conductive film.
- the obtained laminated body is fired to form an electrode having a plate-shaped ceramic body serving as a dielectric and a conductive film provided without overlapping each other inside the ceramic body. can do.
- An electrode serving as a counter electrode is arranged on the electrode thus obtained, and the plasma generating electrode of the present embodiment is formed.
- the electrode serving as the counter electrode an electrode obtained by the above-described manufacturing method may be used, or an electrode having another conventionally known configuration may be used.
- the plasma generating electrode 21 of the present embodiment includes at least a pair of electrodes 25 arranged in opposite directions, and generates a plasma by applying a voltage between them. And at least one electrode 25a of a pair of electrodes 25 is disposed inside a plate-shaped ceramic body 22 serving as a dielectric and a ceramic body 22.
- a plurality of through holes having a cross-sectional shape cut in a plane perpendicular to the thickness direction penetrating in the film thickness direction and having a shape partially including an arc are formed so as to have two or more different distributed IJ patterns.
- the plasma generating electrode 21 of the present embodiment has a plurality of conductive patterns 23 in two or more different arrangement patterns on one conductive film 23, instead of one electrode having a plurality of conductive films.
- the through holes 24a and 24b are formed.
- the plasma generation electrode 21 of the present embodiment since plasma in different states can be simultaneously generated between one electrode 25, for example, exhaust gas discharged from an automobile engine is processed. At this time, the soot is oxidized by the plasma generated in the region where the through holes 24a are formed in one arrangement pattern, and the nitrogen is oxidized by the plasma generated in the region where the through holes 24b are formed in the other arrangement pattern.
- Objects, such as N ⁇ It is possible to perform the treatment, and it is possible to obtain the same operation and effect as the plasma generating electrode of the first invention.
- the conductive film 23 constituting the plasma generating electrode 21 of the present embodiment has a cross-section partially cut along a plane perpendicular to the film thickness direction that penetrates in the film thickness direction and partially includes an arc. Except for the configuration in which the plurality of through holes 24a and 24b having different shapes are formed so as to have two or more different arrangement patterns, the configuration is the same as that of the conductive film described in the first embodiment of the first invention. Can be suitably used. 9 and 10 show the through-holes 24a and 24b having a circular cross-section when cut along a plane perpendicular to the film thickness direction, but the present invention is not limited to this.
- the method of forming the through holes 24a and 24b is the same as that described in the first embodiment of the present invention, except that the through holes 24a and 24b are formed in two or more different arrangement patterns. Can be formed. Further, as the ceramic body 22 forming the plasma generating electrode 21 of the present embodiment, a ceramic body having the same structure as the ceramic body described in the first embodiment of the first invention can be suitably used.
- FIG. 10 shows two arrangement patterns in which the through holes 24a and 24b having different diameters are arranged at different intervals from each other.
- the illustration is not limited to such an arrangement pattern, the diameter of the through-holes may be the same, and the arrangement pattern may be changed by changing the interval between the through-holes.
- the number of arrangement patterns is not limited to two as long as it is two or more.
- a plasma generator 10 of the present embodiment is characterized by including the above-described plasma generation electrode of the first or second invention.
- the plasma generator 10 of the present embodiment is configured so that a fluid to be processed such as exhaust gas can pass between the plasma generation electrode 31 and a pair of electrodes 35 constituting the plasma generation electrode 10.
- a case body 11 housed therein.
- the case body 11 has an inflow port 12 into which the fluid to be processed flows, and a processing fluid in which the inflowing fluid passes between the electrodes 35 and is processed. And an outlet 13 for outflow.
- the plasma generation device 10 of the present embodiment includes the above-described plasma generation electrode 31 of the first or second invention, by applying a voltage between the pair of electrodes 35, the conductivity is increased. Different arrangements of through-holes in the membrane can generate plasma in different states simultaneously.
- FIGS. 11 (a) and 11 (b) in the plasma generating apparatus 10 of the present embodiment, a state in which a plurality of plasma generating electrodes 31 having a pair of electrodes 35 are stacked is shown.
- the case is preferably installed inside the body 11.
- 11 (a) and 11 (b) show a state in which five plasma generating electrodes 31 each composed of a pair of electrodes 5 are stacked for explanation. The number of layers is not limited to this.
- the plasma generating electrode 31 may have a configuration including a plurality of electrodes.
- the spacer 14 for forming a predetermined gap is provided between the pair of electrodes 35 constituting the plasma generating electrode 31 and between the respective plasma generating electrodes 31.
- the plasma generator 10 configured as described above can be used, for example, installed in an exhaust system of an automobile, and generates exhaust gas discharged from an engine or the like between the pair of electrodes 5. By passing through the plasma, harmful substances such as soot and nitrogen oxides contained in the exhaust gas can be reacted and discharged to the outside as harmless gas.
- the plasma generating electrodes 31 be configured so that plasma can be generated also between the stacked plasma generating electrodes 31.
- one electrode 35a of the electrode 35 constituting one plasma generation electrode 31a is connected to another adjacent plasma generation electrode 31b that not only generates a discharge between the electrode 35b and the electrode 35b disposed opposite to the electrode 35a.
- the plasma generator of the present embodiment may further include a power supply for applying a voltage to the plasma generation electrode.
- a power supply for applying a voltage to the plasma generation electrode.
- the power source a conventionally known power source can be used as long as it can supply electricity that can effectively generate plasma.
- the plasma generator of the present embodiment may have a configuration in which a current is supplied from an external power supply instead of the configuration including the power supply as described above.
- the current supplied to the plasma generation electrode used in the present embodiment can be appropriately selected and determined depending on the intensity of the plasma to be generated.
- the DC current supplied to the plasma generation electrode is lkV or more
- the peak voltage is lkV or more
- the number of pulses per second is 100.
- the pulse current is a pulse current of at least (100 Hz or more), an AC current of a peak voltage of at least lkV and a frequency power of at least (100 Hz), or a current obtained by superposing any two of these. With this configuration, plasma can be generated efficiently.
- FIG. 12 is an explanatory diagram schematically showing the exhaust gas purification device of the present embodiment.
- an exhaust gas purifying apparatus 41 of the present embodiment includes a plasma generator 10 according to the third embodiment of the present invention and a catalyst 44, and the plasma generator 10 and the catalyst Reference numeral 44 denotes an exhaust gas purifying device 41 provided inside the exhaust system of the internal combustion engine.
- the plasma generator 10 is disposed on the exhaust gas generation side (upstream side) of the exhaust system, and the catalyst 44 is disposed on the exhaust side (downstream side). Are connected via a pipe.
- the exhaust gas purification device 41 of the present embodiment is, for example, a device that purifies NO in exhaust gas under an oxygen-excess atmosphere.
- the plasma generated by the plasma generator reforms NO so that it can be easily purified by the downstream catalyst 44, or reforms HC (hide port carbon) in exhaust gas so that it easily reacts with NO.
- N ⁇ is purified by the catalyst 44.
- the plasma generator 10 used in the exhaust gas purifying apparatus 41 of the present embodiment is provided with a plasma generated in the exhaust gas by combustion in an oxygen-excess atmosphere such as lean burn, a gasoline direct injection engine, or a diesel engine. Is converted from NO to NO. Also,
- the plasma generator 10 generates active species from HC or the like in the exhaust gas, and a device configured similarly to the plasma generator 10 shown in FIG. [0070]
- the catalyst 44 is provided on the downstream side of the plasma generator 10 in the exhaust system as a catalyst unit 45 including a catalyst member including a support in which a plurality of pores through which exhaust gas flows are formed. Is established.
- the catalyst member has a support and a catalyst layer formed so as to cover an inner wall surface surrounding a plurality of pores of the support.
- the catalyst layer is generally produced by impregnating a support with a catalyst in the form of a slurry (catalyst slurry) as described later, and is therefore sometimes referred to as a "posh coat (layer)".
- the shape of the support is not particularly limited in the present invention as long as the support has a space through which the exhaust gas flows.
- a honeycomb-like one having a plurality of pores is used. ing.
- the support is preferably formed from a material having heat resistance.
- a material having heat resistance examples include porous (ceramic) such as cordierite, mullite, silicon carbide (SiC) and silicon nitride (SiN), and metal (eg, stainless steel).
- the catalyst layer is made of a porous carrier, and one or more selected from Pt, Pd, Rh, Au, Ag, Cu, Fe, Ni, Ir, Ga and the like supported on the surface of the porous carrier.
- the main part is the combination of A plurality of continuous pores continuous with the pores of the support are formed inside the catalyst layer.
- the porous carrier can be formed by appropriately selecting and using, for example, alumina, zeolite, silica, titania, zirconia, silica alumina, ceria, and the like.
- a catalyst that promotes the decomposition reaction of NO is used as the catalyst 44.
- a plasma generator having the configuration shown in Fig. 11 (a) was manufactured, and the exhaust gas was processed using this plasma generator.
- the soot, nitrogen monoxide (NO), And the amount of hydrocarbons (HC) and the presence of aldehydes were measured.
- the plasma generating electrode used in the plasma generating apparatus of this example was manufactured as follows. First, a tungsten paste was applied to an unfired alumina tape substrate with a thickness of 0.5 mm after firing, using a tungsten paste.
- the second conductive film was screen-printed so as to have a thickness of 10 ⁇ .
- the first conductive film was arranged in series with the exhaust gas inlet side, and the second conductive film was arranged in series with the exhaust gas outlet side.
- a plate-shaped ceramic body serving as a dielectric and first and second different types of two different wiring patterns disposed inside the ceramic body are provided.
- An electrode having the above conductive film was prepared. Ten pieces of these electrodes were produced, and they were stacked at 1 mm intervals so that each of them was sequentially arranged to face each other to produce a plasma generating electrode.
- the conductive films constituting each electrode were alternately connected, and one was connected to a pulse power supply using an SI thyristor, and the other was connected to the ground side.
- the conductive film having a wiring pattern having a diameter of 2 mm and an interval of 8 mm was 25 mJ
- the conductive film having a diameter of 5 mm and a distance of 6 mm was an energy force of 10 mJ per pulse. It was thrown in.
- the difference in input energy is considered to be the difference in capacitance due to the difference in the wiring pattern of the conductive film.
- the amount of energy input was different, and the power S was uniform and a good discharge state was obtained.
- the number of pulses of the first conductive film was 100 times / second, and the number of pulses of the second conductive film was 1000 times Z seconds. Then, the same measurement was performed by applying a pulse current of 5 kV. Table 1 shows the measurement results. (Example 3)
- a pulse current of 8 kV was applied to a plasma generator configured in the same manner as the plasma generator of Example 1 so that the number of pulses of the first conductive film was 100 times / second.
- the same measurement was performed by supplying a pulse current of 4 kV so that the number of pulses was 1000 times / second. Table 1 shows the measurement results.
- the plasma generating device configured in the same manner as the plasma generating device of Example 1 was used. The same measurement was performed by applying a pulse current of 8 kV so that the number of pulses was 100 times Z seconds. Table 1 shows the measurement results.
- the plasma generating device was configured in the same manner as the plasma generating device of Example 1 except that the electrode was used. The same measurement was performed by applying a pulse current of 4 kV so that the number of pulses was 1000 times / second. Table 1 shows the measurement results.
- An exhaust gas purifying device was manufactured by disposing a catalyst on the downstream side of the plasma generating device of Example 1, and its NO purifying performance was evaluated.
- the catalyst is a catalyst obtained by impregnating a commercially available ⁇ -A1 ⁇ with 5% by mass of Pt on a cordierite ceramic honeycomb.
- the honeycomb catalyst has a cylindrical shape with a diameter of 105.7 mm and a length of 11.3 mm, a thickness of 400 senoles, and a partition wall (rib thickness) of 4 mils (approximately 0.1 mm).
- the plasma generation conditions and gas conditions are the same as in Example 1.
- An exhaust gas purifying device was manufactured by disposing a catalyst similar to the catalyst used in Example 4 downstream of the plasma generating device of Comparative Example 1, and the NO purifying performance was evaluated.
- the plasma generation conditions and gas conditions are the same as in Comparative Example 1.
- the plasma generating electrode and the plasma generating apparatus of the present invention can simultaneously generate plasma in different states, they can be suitably used, for example, in a purifying apparatus for purifying exhaust gas containing a plurality of substances. Can be. Further, since the exhaust gas purifying apparatus of the present invention includes the above-described plasma generator and a catalyst, it can be suitably used, for example, as a purifying apparatus for purifying exhaust gas discharged from an engine of an automobile or the like. Can be.
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- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Analytical Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Exhaust Gas After Treatment (AREA)
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- Plasma Technology (AREA)
- Treating Waste Gases (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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US10/560,858 US7638103B2 (en) | 2003-06-20 | 2004-06-18 | Plasma generating electrode, plasma generation device, and exhaust gas purifying device |
EP04746120A EP1638377B1 (en) | 2003-06-20 | 2004-06-18 | Plasma generating electrode, plasma generation device, and exhaust gas purifying apparatus |
JP2005507240A JP4104627B2 (ja) | 2003-06-20 | 2004-06-18 | プラズマ発生電極及びプラズマ発生装置、並びに排気ガス浄化装置 |
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JP2003177233 | 2003-06-20 | ||
JP2003-177233 | 2003-06-20 |
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WO2004114729A1 true WO2004114729A1 (ja) | 2004-12-29 |
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PCT/JP2004/008618 WO2004114729A1 (ja) | 2003-06-20 | 2004-06-18 | プラズマ発生電極及びプラズマ発生装置、並びに排気ガス浄化装置 |
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US (1) | US7638103B2 (ja) |
EP (1) | EP1638377B1 (ja) |
JP (1) | JP4104627B2 (ja) |
WO (1) | WO2004114729A1 (ja) |
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JP2006278236A (ja) * | 2005-03-30 | 2006-10-12 | Ngk Insulators Ltd | プラズマ発生電極及びプラズマ反応器 |
JP2008117532A (ja) * | 2006-10-31 | 2008-05-22 | Kyocera Corp | プラズマ発生体、反応装置及び光源装置 |
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EP1647681B1 (en) * | 2003-06-27 | 2011-03-16 | NGK Insulators, Ltd. | Plasma generating electrode, plasma reactor, and exhaust gas purifying device |
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- 2004-06-18 WO PCT/JP2004/008618 patent/WO2004114729A1/ja active Application Filing
- 2004-06-18 EP EP04746120A patent/EP1638377B1/en not_active Expired - Lifetime
- 2004-06-18 US US10/560,858 patent/US7638103B2/en not_active Expired - Fee Related
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Cited By (13)
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JP2006261040A (ja) * | 2005-03-18 | 2006-09-28 | Ngk Insulators Ltd | プラズマ反応器 |
JP2006278236A (ja) * | 2005-03-30 | 2006-10-12 | Ngk Insulators Ltd | プラズマ発生電極及びプラズマ反応器 |
JP2008117532A (ja) * | 2006-10-31 | 2008-05-22 | Kyocera Corp | プラズマ発生体、反応装置及び光源装置 |
WO2008087944A1 (ja) * | 2007-01-15 | 2008-07-24 | Yamatake Corporation | ガス処理装置 |
JP2008194669A (ja) * | 2007-01-15 | 2008-08-28 | Yamatake Corp | ガス処理装置 |
JP2008194668A (ja) * | 2007-01-15 | 2008-08-28 | Yamatake Corp | ガス処理装置 |
WO2008123357A1 (ja) * | 2007-03-30 | 2008-10-16 | Kyocera Corporation | プラズマ発生体及び反応装置 |
JPWO2008123357A1 (ja) * | 2007-03-30 | 2010-07-15 | 京セラ株式会社 | プラズマ発生体及び反応装置 |
KR101117144B1 (ko) * | 2007-03-30 | 2012-05-31 | 쿄세라 코포레이션 | 플라즈마 발생체 및 반응 장치 |
US8349266B2 (en) | 2007-03-30 | 2013-01-08 | Kyocera Corporation | Plasma generator and reaction apparatus |
WO2017002902A1 (ja) * | 2015-06-30 | 2017-01-05 | ダイハツ工業株式会社 | プラズマ発生用電極、電極パネルおよびプラズマリアクタ |
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JP2017016814A (ja) * | 2015-06-30 | 2017-01-19 | ダイハツ工業株式会社 | プラズマ発生用電極、電極パネルおよびプラズマリアクタ |
Also Published As
Publication number | Publication date |
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EP1638377B1 (en) | 2013-04-03 |
JP4104627B2 (ja) | 2008-06-18 |
US7638103B2 (en) | 2009-12-29 |
EP1638377A4 (en) | 2008-04-02 |
JPWO2004114729A1 (ja) | 2006-08-03 |
US20060196762A1 (en) | 2006-09-07 |
EP1638377A1 (en) | 2006-03-22 |
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