WO2004100142A1 - インプリント装置およびインプリント方法 - Google Patents
インプリント装置およびインプリント方法 Download PDFInfo
- Publication number
- WO2004100142A1 WO2004100142A1 PCT/JP2004/006217 JP2004006217W WO2004100142A1 WO 2004100142 A1 WO2004100142 A1 WO 2004100142A1 JP 2004006217 W JP2004006217 W JP 2004006217W WO 2004100142 A1 WO2004100142 A1 WO 2004100142A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- stamper
- suction
- resin layer
- peeling
- gradually
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/44—Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles
- B29C33/48—Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles with means for collapsing or disassembling
- B29C33/50—Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles with means for collapsing or disassembling elastic or flexible
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
- B29C37/0003—Discharging moulded articles from the mould
- B29C37/0007—Discharging moulded articles from the mould using means operable from outside the mould for moving between mould parts, e.g. robots
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
- B29C37/0003—Discharging moulded articles from the mould
- B29C37/0017—Discharging moulded articles from the mould by stripping articles from mould cores
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2017/00—Carriers for sound or information
- B29L2017/001—Carriers of records containing fine grooves or impressions, e.g. disc records for needle playback, cylinder records
- B29L2017/003—Records or discs
- B29L2017/005—CD''s, DVD''s
Definitions
- the present invention relates to an imprint apparatus and a method for imprinting a stamper in which the transfer of an uneven shape to a resin layer on a substrate is completed so that the stamper can be separated from the resin layer.
- a stamper (a mold plate: mold) having an uneven portion is pressed by a press machine or the like.
- An imprint lithography method (hereinafter, also referred to as an “imprint method”) in which an uneven shape is transferred by pressing the resin onto a resin layer by using a conventional method has been known.
- a resin layer for example, a layer in which a resist material is applied in a thin film shape
- a base material for example, a layer in which a resist material is applied in a thin film shape
- a stamper made of a metal material having an uneven portion formed on one surface thereof is set on a stamper holder and attached to a clamp of a press machine, and the base material of the press machine is placed with the resin layer forming surface facing upward.
- the press is operated to lower the clamp, and the concave and convex portions of the stamper are pressed against the resin layer.
- the protruding portions of the concavo-convex portions of the stamper are pressed into the resin layer, and the concavo-convex shape is transferred to the resin layer.
- the stamper is released from the resin layer by moving the clamp of the press machine upward. Thereby, the formation of the concavo-convex pattern is completed.
- a manufacturing apparatus (80) disclosed in Japanese Patent Application Laid-Open No. Hei 9-219041 includes a horizontal base (30) for adsorbing and holding a stamper (8), and a photo-curable resin (30). And (3) a peeling plate (60) for attracting and holding the substrate (1) on which the resin layer is formed (on which the resin layer is formed).
- the center of the horizontal base is attached to the peeling plate so that it can move up and down, and when it is moved upward, it engages with the edge of the center hole (1h) in the substrate and
- a center pin (40) for peeling the substrate (resin layer) from the stamper on the table is provided.
- a stamper is a mold for forming fine irregularities such as data recording pits and groups in a resin layer on a substrate.
- the stamper is formed of a magnetic metal in a thin film shape, and a center pin is provided at the center thereof.
- a central hole (8 h) is formed to allow communication.
- a resin layer is formed by applying a photocurable resin on the substrate.
- the substrate is held on the peeling plate with the surface of the resin layer facing downward, and the stamper is set on a horizontal base with the irregularities facing upward.
- the resin layer is pressed against a stamper on the horizontal base by lowering the peeling plate holding the substrate toward the horizontal base.
- a resin layer to which the uneven shape of the uneven portion of the stamper is transferred is formed on the substrate (between the substrate and the stamper).
- the substrate is adsorbed to the peeling plate by discharging air between the peeling plate and the substrate. Then, on the release plate By exhausting the air in the first hermetic space (51) from the exhaust port (91), the center pin is moved upward while the entire substrate is sucked to the peeling plate side and the center pin is moved upward. Push up near the edge of the hole (the center of the substrate) toward the peeling plate. At this time, since the stamper is attracted and held on the horizontal base by the magnetic force, the central portion of the substrate (resin layer) whose central portion is pushed up is separated from the stamper. Subsequently, the peeling plate that is holding the substrate is moved upward.
- the peeling range of the substrate (resin layer) with respect to the stamper gradually increases from the center where peeling from the stamper has already been completed to the outer edge. Thereby, the peeling of the stamper from the resin layer is completed.
- the peeling range air can smoothly enter between the stamper and the resin layer, thereby preventing the irregular pattern from breaking. Also, as compared with the method of stripping the entire stamper at once, by gradually expanding the stripping range, the stamper can be stripped from the resin layer with a relatively small force. Disclosure of the invention
- the inventors have found the following problems as a result of studying the above-described manufacturing apparatus. That is, in the conventional manufacturing apparatus, when the stamper is peeled off from the substrate (resin layer) on which the formation of the uneven pattern (transfer of the uneven shape) is completed, first, the center hole in the substrate is formed by the center pin. The center of the substrate is peeled off from the stamper by pushing up the edge (b) of the substrate. Therefore, in this manufacturing apparatus, it is necessary to form a center hole for passing the center pin in the center of the stamper. When a stamper having no center hole (non-perforated stamper) is used, the center hole is required. The board cannot be pushed up by the pins.
- the conventional manufacturing apparatus has a problem that the uneven shape cannot be transferred using a non-porous stamper.
- the present invention has been made in view of such a problem, and an imprint apparatus capable of easily peeling a non-porous stamper from a resin layer without causing breakage of an uneven pattern. It is a main object to provide a placement and imprint method.
- the unevenness is formed on one surface of the stamper, and the flexible stamper presses the unevenness against the resin layer on the base material to complete the transfer of the unevenness.
- a suction unit configured to be able to peel off the stamper from the resin layer, and to be able to peel off the part from the resin layer by sucking a predetermined part of the other surface of the stamper;
- the peeling completion range of the stamper can be gradually expanded from a state where the part is peeled off by the suction means.
- the imprint method according to the present invention is characterized in that the irregularities are formed by pressing the irregularities of the flexible stamper against the resin layer on the base material while forming the irregularities on one surface thereof.
- the stamper is peeled from the resin layer in a state where the stamper has been completed, a predetermined part of the other surface of the stamper is suctioned to remove the part from the resin layer, and then the peeling completion range of the stamper is gradually reduced. Expand to each.
- a predetermined part of the other surface of the stamper is suctioned by the suction means and the part is separated from the resin layer.
- the non-porous stamper can be easily peeled from the resin layer with a relatively small force.
- the stamper can be peeled without exerting an excessive force on the resin layer by gradually expanding the peeling completion range (suction range), it is possible to avoid the destruction of the concavo-convex pattern when the stamper is peeled. Can be. Therefore, for example, when the substrate is etched using this resin layer as a mask, one surface of the substrate to be protected by the mask (resin layer) can be reliably protected.
- the suction unit is configured to be capable of sucking the center of the other surface of the stamper as the predetermined part.
- the suction means is configured as possible. With this configuration, even if the bumper pattern has a very small breakage that does not pose a problem in use when the stamper is peeled off, the small breakage at the same radial distance from the center of the base material The state of occurrence of damage can be kept uniform. Therefore, a concavo-convex pattern suitable for manufacturing an information recording medium which is a rotating body such as a magnetic disk, an optical disk, and a magneto-optical disk can be formed.
- a box body having an opening on one side thereof, and a drawing mechanism having a plurality of diaphragm blades and being attached to the box body so as to close the above-mentioned one side of the box body, are provided.
- the central portion of the stamper is sucked by sucking gas between the stamper and each of the aperture blades through the opening of the aperture mechanism and positioned above the stamper.
- the suction means is configured so that the suction area can be gradually expanded toward the outer edge by sliding the aperture blade to gradually increase the diameter of the opening.
- the suction unit is configured to be able to suck at least a part of an outer edge portion of the other surface of the stamper as the predetermined part.
- the suction range is gradually expanded in multiple steps or steplessly toward the center of the stamper so that the peeling completed range can be gradually expanded toward the center. It is preferable to configure the suction means. With this configuration, even if the bumper pattern has a very small breakage that does not cause a problem in use when the stamper is peeled off, it can be used in a region where the radial distance from the center of the substrate is the same. The occurrence state of the small damage can be kept uniform. Therefore, it is possible to form a concavo-convex pattern suitable for manufacturing an information recording medium which is a rotating body such as a magnetic disk, an optical disk, a magneto-optical disk, and the like.
- the moving mechanism presses the suction cup against the other surface of the stamper to cause the suction cup to suck the part and peel off the part, and then moves the suction cup to the resin layer from that state. It is preferable that the peeling completion range of the stamper can be gradually enlarged by moving the stamper in a direction away from the stamper. With such a configuration, the imprint apparatus can be manufactured sufficiently inexpensively because the suction cup is inexpensive.
- FIG. 1 is a block diagram showing a configuration of an imprint apparatus 1 according to an embodiment of the present invention.
- FIG. 2 is a side sectional view showing the configuration of the imprint apparatus 1 according to the embodiment of the present invention.
- Fig. 3 corresponds to the sliding state of the aperture blades 6a, 6a ⁇ 'in the aperture mechanism 6 (the opening state of the aperture holes) and the sliding state of the aperture blades 6a, 6a ⁇ ' on the left side.
- FIG. 3 is a plan view showing a suction range A1 of a stamper 61.
- FIG. 4 is a side sectional view showing a state where the center of the stamper 61 is sucked by the suction unit 4.
- FIG. 5 is a cross-sectional view of the stamper 61, the resist layer 52, and the disk-shaped substrate 51 in the suction range A1.
- FIG. 6 is a cross-sectional view of the stamper 61, the resist layer 52, and the disk-shaped base material 51 in the non-suction range A2.
- FIG. 7 is a side sectional view showing a state where the suction range A1 of the stamper 61 by the suction unit 4 is enlarged from the state shown in FIG.
- FIG. 8 is a side sectional view showing a state where the suction range A1 of the stamper 61 by the suction unit 4 is further enlarged from the state shown in FIG.
- FIG. 9 is a side sectional view showing a state where the suction range A1 by the suction unit 4 is further enlarged and the entire area of the stamper 61 is sucked.
- FIG. 10 is a diagram showing inspection results and pass / fail judgment on the resist layer 52 from which the stamper 61 has been peeled off by various peeling methods.
- FIG. 11 is a block diagram showing a configuration of an imprint apparatus 1A according to another embodiment of the present invention.
- FIG. 12 is a side cross-sectional view showing a state where the outer edge of the stamper 61 is sucked by the suction cup 14 in the imprint apparatus 1A.
- FIG. 13 is a side cross-sectional view showing a state where the stamper 16 1 sucked by the suction cup 14 in the imprint apparatus 1 A is separated from the resist layer 52.
- the imprint apparatus 1 shown in FIG. 1 forms, for example, a fine uneven pattern of nanometer size on the surface of a disk-shaped substrate 51 for an information recording medium (for example, for a discrete track type recording medium).
- a mask for forming an uneven pattern for example, a mask made of a photoresist material
- the imprint apparatus 1 includes a press machine (not shown), and the stamper 61 is pressed (pressed) onto the resist layer 52 on the disk-shaped base material 51 by the press machine to press the resist layer 5. It is configured so that the uneven shape can be transferred (form an uneven pattern) to 2.
- the imprint apparatus 1 includes a substrate holder 2, a moving mechanism 3, a suction unit 4, an air pump 5, an aperture mechanism 6, and a control unit 7, and is pressed against the resist layer 52 on the disk-shaped substrate 51.
- the stamper 61 is configured to be peelable from the resist layer 52.
- the disk-shaped substrate 51 is, for example, composed of a glass disk having a diameter of 2.5 inches, and as shown in FIG. 2, a positive resist is applied to the surface by, for example, a spin coating method.
- a resist layer 52 (resin layer in the present invention) having a thickness of about 75 nm is formed.
- the thickness of the disk-shaped base material 51, the resist layer 52, and the like are exaggerated. Is shown.
- the stamper 61 for forming a concavo-convex pattern on the resist layer 52 has, as an example, a flexibility of about 300 / im having a concavo-convex portion on one surface (the lower surface in the figure).
- a non-porous nickel stamper having an uneven portion formed by an electron beam lithography method or the like such that the ratio of the width of the concave portion to the convex portion in the uneven portion is 1: 1 (in this case, pitch 150 nm as an example). Is formed.
- the stamper 61 presses the concave and convex portions on the resist layer 52 on the disk-shaped base material 51 by a press machine, thereby forming a concave and convex pattern on the resist layer 52 (the concave and convex portions of the concave portion are transferred). Is).
- the base material holder 2 is formed in a box having an upper surface opening, and is configured so that the disc-shaped base material 51 can be placed on the inner bottom surface thereof. Further, as shown in FIG. 1, the base material holder 2 includes a heater 2 a for heating the disk-shaped base material 51 under the control of the control unit 7. The moving mechanism 3 moves the suction unit 4 and the throttle mechanism 6 under the control of the control unit 7. As shown in FIG. 2, the suction unit 4 includes a box 4a having a bottom opening, and the bottom opening (one surface in the present invention) of the suction unit 4 is configured to close the bottom opening. The aperture mechanism 6 is attached.
- the suction part 4 is provided with air (gas) in a space SP formed by the box 4a and the throttle mechanism 6 (aperture blades 6a, 6a- 'described later and an upward movement restricting plate 6c). ) Is sucked by the air pump 5 so that the stamper 61 can be sucked and held (suction holding).
- the air pump 5 sucks the air in the suction unit 4 (in the space SP) under the control of the control unit 7.
- the throttle mechanism 6 includes a plurality of throttle blades 6a, 6a as shown in the left diagram of FIG. Under the control of the control unit 7, the aperture blades 6a, 6a The diameter is adjustable. As shown in FIG.
- the diaphragm mechanism 6 is formed of a porous material in the shape of a disk, and is disposed in a box 4a in parallel with the diaphragm blades 6a, 6a. Has 6c. In this case, the squeezing mechanism 6 is moved upward by the moving mechanism 3 together with the box 4a of the suction section 4 at the time of peeling of the 161.
- the air in the space SP is sucked by the air pump 5 while being moved above the stamper 6 1, the air between the diaphragm blades 6 a, 6 a Is sucked through the opening holes 6b and the countless holes of the upward movement restricting plate 6c, whereby the stamper 61 is peeled off from the resist layer 52 so as to be sucked up into the opening holes 6b and moved upward. It is drawn to the control plate 6c. At this time, the upward movement restricting plate 6c is arranged so that the sucked-in stamper 61 can be abutted, so that the stamper 61 becomes unnecessarily high. To avoid being sucked up to the wrong position.
- the aperture mechanism 6 sucks the stamper 61 as shown in the right diagram of FIG. 3 by sliding the aperture blades 6a, 6a,.
- the range (hereinafter, also referred to as “suction range A 1 J”) is gradually expanded to gradually expand the peeling completion range of the stamper 61 (in this case, the range that substantially matches the suction range A 1).
- the suction unit 4, the air pump 5, and the throttle mechanism 6 together constitute a suction unit in the present invention.
- the control unit 7 controls the heating of the disk-shaped substrate 51 by the heater 2a, and controls the operation of the moving mechanism 3 to move the suction unit 4 and the like.
- the controller 7 controls the suction of the air in the space SP by the air pump 5 and adjusts the suction range A1 by controlling the sliding state of the diaphragm blades 6a, 6a of the diaphragm mechanism 6. Control.
- the stamper 61 is set on the stamper holder (not shown) and attached to the clamp of the press machine, and the disc-shaped substrate 51 is placed on the substrate holder 2 with the resist layer 52 formed upward. Place the base material holder 2 on the bed of the press machine in the set state. At this time, the suction unit 4 has been moved to a predetermined retracted position by the moving mechanism 3.
- the controller 7 heats the disk-shaped substrate 51 with the heater 2a. At this time, as an example, the heater 2a heats the disc-shaped substrate 51 so that the resist layer 52 has a temperature of about 170 ° C. (a temperature equal to or higher than the glass transition point).
- the control unit 7 operates the press machine to lower the clamp, thereby pressing the concave and convex portions of the stamper 61 onto the resist layer 52.
- the stamper 61 is pressed against the resist layer 52 with a force of, for example, about 17 O kgf Z cm 2 by the pressing force of the press machine. This makes the stamper 6 1 concave
- the protruding portion of the protruding portion is pressed into the resist layer 52 ⁇ , and a concave portion is formed in the resist layer 52.
- the stamper 61 on which the protrusions have been pressed into the resist layer 52 is peeled off from the resist layer 52. Specifically, first, after the holding of the stamper 61 by the stamper holder is released, the clamp of the press machine is moved upward. At this time, the concave and convex portions of the stamper 61 are pushed into the resist layer 52 on the disk-shaped base material 51, and the stamper 61 is in close contact with the resist layer 52, so that the holding by the stamper holder is released. The stamper 61 is left on the substrate holder 2 together with the disk-shaped substrate 51 (resist layer 52). Next, as shown in FIG.
- the control unit 7 causes the moving mechanism 3 to move the suction unit 4 above the stamper 61.
- the aperture mechanism 6 has the aperture blades 6a, 6a-. Positioned such that the aperture 6b has the smallest diameter.
- the controller 7 lowers the degree of heating of the disk-shaped substrate 51 with respect to the heater 2a, and keeps the resist layer 52 at a temperature of about 50 ° C. as an example.
- the control unit 7 causes the air pump 5 to start sucking the air in the space SP # and causes the moving mechanism 3 to move the suction unit 4 downward toward the stamper 61.
- the air in the space SP is sucked by the air pump 5, so that the air between the diaphragm blades 6 a, 6 a-′ in the diaphragm mechanism 6 and the other surface of the stamper 6 1 is opened. Is sucked into the space SP.
- the diaphragm blades 6 a, 6 a... Approach the very close to the stamper 61 with the downward movement of the suction part 4, as shown in FIG.
- the central part of the stamper 61 (an example of the “predetermined part” in the present invention) is sucked (sucked) from the opening 6 b toward the space SP.
- the stamper 61 is sucked toward the space SP and detaches from the resist layer 52 (separation).
- the part detached from the resist layer 52 is attracted to the upward movement regulating plate 6c.
- the area that is not sucked into the space SP side (the area covered by the diaphragm blades 6a, 6a ⁇ ': hereinafter also referred to as the “non-suction area A2”)
- the non-suction area A2 There is a gap having a height H between the recess and the surface of the resist layer 52. Therefore, when the stamper 61 separates from the resist layer 52 in the suction range A1, the surrounding air passes through the gap between the stamper 61 and the resist layer 52 in the non-suction range A2. It flows smoothly between the stamper 61 and the resist layer 52 in A1. As a result, the stamper 61 can be peeled from the resist layer 52 with a relatively small force, thereby avoiding a situation in which the uneven pattern is destroyed in the suction range A1.
- the control section 7 slides the aperture blades 6a, 6a 1 ⁇ and ⁇ with respect to the aperture mechanism 6 to gradually increase the diameter of the opening 6b in a stepless manner.
- the diaphragm mechanism 6 slides the diaphragm blades 6a, 6a 'so that the diameter expansion rate of the opening hole 6b is about lmm / min, for example.
- the diameter expansion rate of the opening 6b is not limited to this.
- the suction range A1 for the stamper 61 gradually increases from the center of the stamper 61 toward the outer edge as shown in the right diagram of FIG. At this time, as shown in FIGS.
- the stamper 61 is gradually sucked into the space SP, and the completion area of the separation from the resist layer 52 gradually decreases. To expand. Also, the stamper 61 peeled off from the resist layer 52 is attracted to the upward movement regulating plate 6c in the space SP, and further upward movement is regulated. At this time, in a configuration in which the upward movement restricting plate 6c is not provided, the central part of the sucked stamper 61 may be deformed by being sucked into the space SP so as to protrude largely upward. In the imprint apparatus 1, the up-movement regulating plate 6c regulates a large up-movement of the stamper 61, thereby avoiding deformation of the stamper 61, thereby preventing the stamper 61 from breaking.
- the control section 7 causes the moving mechanism 3 to retract the suction section 4 from above the disk-shaped base material 51.
- the peeling of the stamper 61 from the resist layer 52 is completed, and a mask composed of the resist layer 52 is formed on the disk-shaped base material 51.
- the disk-shaped substrate 51 is subjected to an etching treatment using a mask formed on the disk-shaped substrate 51, thereby forming a fine uneven pattern of nanometer size on one surface of the disk-shaped substrate 51.
- the etching process is a well-known technique, a detailed description thereof will be omitted.
- the peeling method using the imprint apparatus 1 (the suction area A1 to the stamper 61 is gradually expanded by gradually expanding the diameter of the opening 6b, and the peeling is completed.
- the stamper 61 is peeled off from the resist layer 52 by the peeling method for enlarging the range, no rupture is observed in the resist layer 52 both in the visual inspection and the microscopic inspection.
- the stamper is lifted from the resist layer by the conventional peeling method, in which the clamp of the press machine is moved upward and the entire stamper is peeled off from the resin layer almost simultaneously, the resist layer is broken by visual inspection. Microscopic examination shows that the pattern of irregularities extending up to 110 points was observed within the predetermined inspection area.
- the air pump 5 sucks the air in the space SP, so that the center of the other surface of the stamper 6 1 is passed through the opening 6 b of the aperture mechanism 6.
- the peeling completion range of the stamper 61 is gradually increased.
- the stamper 61 can be peeled without exerting an excessive force on the resist layer 52, so that the stamper 61 can be peeled off at the time of peeling. Breakage of the uneven pattern can be avoided. Therefore, for example, when the disk-shaped substrate 51 is etched using the resist layer 52 as a mask, one surface of the disk-shaped substrate 51 to be protected by the mask (resist layer 52) is securely formed. Can be protected.
- the suction unit 4 is configured so that the center of the other surface of the stamper 61 can be suctioned as a predetermined part in the present invention, so that the information recording medium (rotary body)
- the information recording medium rotary body
- magnetic recording media such as discrete track type recording media, optical recording media such as CD-R, and various information recording media such as magneto-optical recording media such as MO, etc.
- small defects occurred at the center Even if the irregular pattern in the center of the disc-shaped base material 51 is slightly damaged in the initial stage of the stamper 61 peeling operation, various kinds of information can be stored. An information recording medium that can be accurately read and written can be manufactured.
- the suction range A1 can be gradually increased steplessly toward the outer edge of the stamper 61 in a state where the center is sucked, so that the stamper 6 Even if a very small breakage that does not cause a problem in use when peeling off occurs in the concave / convex pattern, the small breakage occurs in the area where the radial distance from the center of the disk-shaped substrate 51 is equal to the force.
- the condition can be kept uniform. Therefore, a concavo-convex pattern suitable for manufacturing an information recording medium that is a rotating body such as a magnetic disk, an optical disk, and a magneto-optical disk can be formed.
- the air between the stamper 61 and each of the diaphragm blades 6a, 6a is sucked by the air pump 5 from the opening hole 6 of the diaphragm mechanism 6, so that the stamper 6 Suction the central part of 1 and then gradually slide the aperture blades 6a and 6a to gradually increase the diameter of the opening 6b and gradually increase the suction range A1 toward the outer edge
- the stamper 6 Suction the central part of 1 and then gradually slide the aperture blades 6a and 6a to gradually increase the diameter of the opening 6b and gradually increase the suction range A1 toward the outer edge
- the imprint apparatus 1 including the suction unit 4, the air pump 5, and the throttle mechanism 6 and constituting the suction unit in the present invention has been described as an example.
- the present invention is not limited to this.
- an imprint apparatus 1A shown in FIG. Note that the same components as those of the imprint apparatus 1 are denoted by the same reference numerals, and description thereof will be omitted.
- a suction cup 14 is attached to the moving mechanism 3 instead of the suction section 4 in the imprint apparatus 1.
- the suction mechanism 14 is moved downward toward the outer edge of the other surface of the stamper 61 by the moving mechanism 3 ( It is moved in the direction approaching the resist layer 52) and pressed against the stamper 61.
- the outer edge of the stamper 61 (an example of a “predetermined part” in the present invention) is sucked upward by the suction force of the suction cup 14, so that the suction area A 1 Peel off from the resist layer 52.
- the control unit 7 moves the suction cup 14 upward with respect to the moving mechanism 3 (by moving the suction cup 14 in a direction away from the resist layer 52), so that the suction cup 14 is attracted by the suction cup 14.
- the stamper 61 is gradually peeled from the resist layer 52, and the peeling completion range is expanded. Thereby, as shown in FIG. 13, the peeling of the stamper 61 from the resist layer 52 is completed.
- the stamper 6 1 is separated by the imprint apparatus 1 A, the surrounding air flows smoothly between the stamper 6 1 and the resist layer 52 as the suction mechanism 14 moves upward by the moving mechanism 3. .
- the stamper 61 can be peeled from the resist layer 52 with a relatively small force. This makes it possible to peel off the stamper 61 without exerting an excessive force on the resist layer 52, thereby avoiding the destruction of the concavo-convex pattern when the stamper 61 is peeled off.
- the peeling method using the imprinter 1A with the sucker 14 sucking the outer edge of the stamper 61 without sucking the suction area A1 without expanding the suction area A1).
- the stamper 61 When the stamper 61 is peeled off from the resist layer 52 by a peeling method of expanding the peeling completion range by moving the resist layer 52 upward, no rupture is observed in the resist layer 52 by visual inspection. In the resist layer 52 from which the stamper 61 has been peeled off by the microscope, even when inspected by a microscope, rupture of the concavo-convex pattern is found only in one place within a predetermined inspection area. In the same manner as in 1, the stamper 61 can be peeled off with a small force, and the irregular pattern can be prevented from breaking when the stamper 61 is peeled off.
- the aperture blades 6a and 6a of the aperture mechanism 6 are not slid (the suction range A1 is not enlarged).
- the suction range A1 is not enlarged.
- the suction cup 14 is pressed against the center of the other surface of the stamper 6 1, and the suction force of the suction cup 14 peels off the center of the stamper 61. Move up You can also expand the peeling completion range gradually, even in this case, similar results have been confirmed.
- the diameter of the opening hole 6b is increased steplessly so that the stamper 6
- the suction range A1 with respect to 1 was gradually increased in a stepless manner.
- the aperture blades 6a, 6a An adjustment method in which the suction range A1 for the tamper 61 is gradually increased in multiple stages can also be adopted.
- the peeling method in which the suction range A1 is gradually enlarged from the center of the stamper 61 toward the outer edge is described as an example, but the present invention is not limited to this.
- the suction area A1 is gradually expanded toward the center when all or at least a part (for example, a ring-shaped area as a whole) of the outer edge of the stamper 61 is sucked. You can also. According to this configuration, the surrounding air can be smoothly flowed between the stamper 61 and the resist layer 52, so that the stamper 61 can be peeled with a smaller force, and the stamper 61 can be removed at the same time. In this way, it is possible to reliably avoid the destruction of the uneven pattern.
- the configuration in which the upper movement restricting plate 6c is disposed on the aperture mechanism 6 has been described.
- the upper moving restricting plate 6c is not necessarily required.
- a configuration in which the sucked stamper 61 abuts against the inner bottom surface of the box 4a can be adopted.
- the imprint apparatus 1, 1A can be used upside down. In this case, by disposing means for holding the disk-shaped substrate 51 (for example, a suction portion for sucking the disk-shaped substrate 51) in the substrate holder 2, it is possible to avoid dropping of the disk-shaped substrate 51. .
- the resin layer in the present invention is a layer made of a resist material.
- various resin materials can be formed by applying a thin film on a substrate.
- the disc-shaped base material 51 is not limited to a base material for an information recording medium, and the base material in the present invention includes a base material for manufacturing a semiconductor element.
- the resin layer for transferring the uneven shape is not limited to the mask-forming resin layer (the resist layer 52) described in the embodiment of the present invention, but may be a so-called lift.
- the resin layer in the present invention includes a resin layer (resist layer) for forming a base for turning off and a base for forming a nickel / restamper.
- the peeling completion range is gradually increased from a state where a predetermined part of the other surface of the stamper is sucked by the suction means and the part is separated from the resin layer.
- a non-porous stamper can be easily peeled off from the resin layer with a relatively small force.
- the stamper can be peeled off without exerting an excessive force on the resin layer. Can be.
- the substrate when the substrate is etched using this resin layer as a mask, one surface of the substrate to be protected by the mask (resin layer) can be reliably protected.
- This realizes an imprint apparatus capable of easily peeling the non-porous stamper from the resin layer without causing rupture of the concavo-convex pattern.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Robotics (AREA)
- Manufacturing & Machinery (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/556,052 US20070062396A1 (en) | 2003-05-09 | 2004-04-28 | Imprinting apparatus and imprinting method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003-131661 | 2003-05-09 | ||
JP2003131661A JP4185808B2 (ja) | 2003-05-09 | 2003-05-09 | インプリント装置およびインプリント方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004100142A1 true WO2004100142A1 (ja) | 2004-11-18 |
Family
ID=33432138
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/006217 WO2004100142A1 (ja) | 2003-05-09 | 2004-04-28 | インプリント装置およびインプリント方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20070062396A1 (ja) |
JP (1) | JP4185808B2 (ja) |
CN (1) | CN100373488C (ja) |
WO (1) | WO2004100142A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7500431B2 (en) | 2006-01-12 | 2009-03-10 | Tsai-Wei Wu | System, method, and apparatus for membrane, pad, and stamper architecture for uniform base layer and nanoimprinting pressure |
WO2020059854A1 (ja) * | 2018-09-20 | 2020-03-26 | 国立大学法人 長崎大学 | シート状物貼付デバイス |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7686606B2 (en) * | 2004-01-20 | 2010-03-30 | Wd Media, Inc. | Imprint embossing alignment system |
JP4596981B2 (ja) * | 2005-05-24 | 2010-12-15 | 株式会社日立ハイテクノロジーズ | インプリント装置、及び微細構造転写方法 |
US7906058B2 (en) * | 2005-12-01 | 2011-03-15 | Molecular Imprints, Inc. | Bifurcated contact printing technique |
US20090100677A1 (en) * | 2007-10-23 | 2009-04-23 | Tdk Corporation | Imprinting method, information recording medium manufacturing method, and imprinting system |
JP5416420B2 (ja) | 2009-01-22 | 2014-02-12 | 株式会社日立ハイテクノロジーズ | 微細構造転写装置 |
US9330685B1 (en) | 2009-11-06 | 2016-05-03 | WD Media, LLC | Press system for nano-imprinting of recording media with a two step pressing method |
US8496466B1 (en) | 2009-11-06 | 2013-07-30 | WD Media, LLC | Press system with interleaved embossing foil holders for nano-imprinting of recording media |
US8402638B1 (en) | 2009-11-06 | 2013-03-26 | Wd Media, Inc. | Press system with embossing foil free to expand for nano-imprinting of recording media |
KR101695289B1 (ko) * | 2010-04-30 | 2017-01-16 | 엘지디스플레이 주식회사 | 평판 표시 소자의 제조 장치 및 방법 |
JP5871324B2 (ja) * | 2010-06-11 | 2016-03-01 | Hoya株式会社 | 密着補助層付き基板、モールドの製造方法及びマスターモールドの製造方法 |
US9469083B2 (en) * | 2012-07-09 | 2016-10-18 | Massachusetts Institute Of Technology | Inverted nanocone structures for multifunctional surface and its fabrication process |
KR101955335B1 (ko) | 2012-11-14 | 2019-03-07 | 삼성전자주식회사 | 스탬프 구조체 및 이를 이용한 전사 방법 |
GB2528289A (en) | 2014-07-16 | 2016-01-20 | Kraft Foods R&D Inc | A die-cut lid and associated container and method |
CN108028053A (zh) * | 2015-09-18 | 2018-05-11 | 大日本印刷株式会社 | 用于制造信息记录介质的方法 |
JP6531052B2 (ja) * | 2016-03-07 | 2019-06-12 | 富士フイルム株式会社 | 反転モールドの製造方法及び機能性シートの製造方法並びに剥離装置 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0270412A (ja) * | 1988-09-07 | 1990-03-09 | Hitachi Ltd | 合成樹脂成形品の製造用スタンパ |
JPH02126434A (ja) * | 1988-11-05 | 1990-05-15 | Mitsubishi Electric Corp | 光デイスク基板成形方法 |
JPH02305612A (ja) * | 1989-03-13 | 1990-12-19 | Nippon Sheet Glass Co Ltd | 微細パターン付き基板の製造方法 |
JPH08106655A (ja) * | 1992-02-29 | 1996-04-23 | Takeda Giken Kogyo:Kk | ディスクの製造方法及びディスクプレス装置 |
JPH0944915A (ja) * | 1995-07-25 | 1997-02-14 | Sony Corp | 光ディスクの製造方法及び製造装置 |
JP2002269853A (ja) * | 2001-03-06 | 2002-09-20 | Sony Corp | 光ディスクの製造方法および光ディスクの製造装置 |
JP2002304773A (ja) * | 2001-04-10 | 2002-10-18 | Sony Corp | 加圧接合方法とその装置 |
JP2002367235A (ja) * | 2001-06-08 | 2002-12-20 | Hitachi Ltd | 多層構造ディスクの製造方法と製造装置 |
JP2003132594A (ja) * | 2001-10-25 | 2003-05-09 | Hitachi Ltd | 記録媒体とその製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04255927A (ja) * | 1991-02-07 | 1992-09-10 | Pioneer Electron Corp | 光記録ディスク及びその製造方法 |
JP3372258B2 (ja) * | 1995-08-04 | 2003-01-27 | インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン | リソグラフィ・プロセス用のスタンプ |
JP3294971B2 (ja) * | 1995-08-07 | 2002-06-24 | 株式会社名機製作所 | ディスク基板およびその成形用型 |
CN2447899Y (zh) * | 2000-09-29 | 2001-09-12 | 陈聪智 | 圆形碟片方位定置装置 |
JP2003001681A (ja) * | 2001-06-21 | 2003-01-08 | Pioneer Electronic Corp | ディスク基板剥離用ユニット、およびディスク製造方法 |
US7144539B2 (en) * | 2002-04-04 | 2006-12-05 | Obducat Ab | Imprint method and device |
JP2005038477A (ja) * | 2003-07-17 | 2005-02-10 | Tdk Corp | 磁気記録媒体用スタンパーの製造方法および磁気記録媒体用スタンパーの製造装置 |
JP2005339669A (ja) * | 2004-05-27 | 2005-12-08 | Tdk Corp | インプリント方法、情報記録媒体製造方法およびインプリント装置 |
-
2003
- 2003-05-09 JP JP2003131661A patent/JP4185808B2/ja not_active Expired - Fee Related
-
2004
- 2004-04-28 CN CNB2004800124225A patent/CN100373488C/zh not_active Expired - Fee Related
- 2004-04-28 WO PCT/JP2004/006217 patent/WO2004100142A1/ja active Application Filing
- 2004-04-28 US US10/556,052 patent/US20070062396A1/en not_active Abandoned
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0270412A (ja) * | 1988-09-07 | 1990-03-09 | Hitachi Ltd | 合成樹脂成形品の製造用スタンパ |
JPH02126434A (ja) * | 1988-11-05 | 1990-05-15 | Mitsubishi Electric Corp | 光デイスク基板成形方法 |
JPH02305612A (ja) * | 1989-03-13 | 1990-12-19 | Nippon Sheet Glass Co Ltd | 微細パターン付き基板の製造方法 |
JPH08106655A (ja) * | 1992-02-29 | 1996-04-23 | Takeda Giken Kogyo:Kk | ディスクの製造方法及びディスクプレス装置 |
JPH0944915A (ja) * | 1995-07-25 | 1997-02-14 | Sony Corp | 光ディスクの製造方法及び製造装置 |
JP2002269853A (ja) * | 2001-03-06 | 2002-09-20 | Sony Corp | 光ディスクの製造方法および光ディスクの製造装置 |
JP2002304773A (ja) * | 2001-04-10 | 2002-10-18 | Sony Corp | 加圧接合方法とその装置 |
JP2002367235A (ja) * | 2001-06-08 | 2002-12-20 | Hitachi Ltd | 多層構造ディスクの製造方法と製造装置 |
JP2003132594A (ja) * | 2001-10-25 | 2003-05-09 | Hitachi Ltd | 記録媒体とその製造方法 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7500431B2 (en) | 2006-01-12 | 2009-03-10 | Tsai-Wei Wu | System, method, and apparatus for membrane, pad, and stamper architecture for uniform base layer and nanoimprinting pressure |
US7617769B2 (en) | 2006-01-12 | 2009-11-17 | Hitachi Global Storage Technologies Netherlands B.V. | System, method, and apparatus for membrane, pad, and stamper architecture for uniform base layer and nanoimprinting pressure |
WO2020059854A1 (ja) * | 2018-09-20 | 2020-03-26 | 国立大学法人 長崎大学 | シート状物貼付デバイス |
JPWO2020059854A1 (ja) * | 2018-09-20 | 2021-08-30 | 国立大学法人 長崎大学 | シート状物貼付デバイス |
JP7190490B2 (ja) | 2018-09-20 | 2022-12-15 | 国立大学法人 長崎大学 | シート状物貼付デバイス |
Also Published As
Publication number | Publication date |
---|---|
US20070062396A1 (en) | 2007-03-22 |
CN1784728A (zh) | 2006-06-07 |
CN100373488C (zh) | 2008-03-05 |
JP4185808B2 (ja) | 2008-11-26 |
JP2004335012A (ja) | 2004-11-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2004100142A1 (ja) | インプリント装置およびインプリント方法 | |
JP4478164B2 (ja) | 微細構造転写装置、スタンパおよび微細構造の製造方法 | |
TWI573685B (zh) | 奈米壓印方法及使用其的奈米壓印裝置 | |
US8333583B2 (en) | Methods and apparatus for rapid imprint lithography | |
TWI392592B (zh) | 以中間印模進行圖案複製之裝置 | |
US7296514B2 (en) | Convex/concave pattern-forming stamp, convex/concave pattern-forming method and magnetic recording medium | |
US20050151300A1 (en) | Workpiece isothermal imprinting | |
US20090166930A1 (en) | Peeling apparatus, peeling method, and method of manufacturing information recording medium | |
JP4886400B2 (ja) | インプリント装置およびインプリント方法 | |
US20050150862A1 (en) | Workpiece alignment assembly | |
US20050285308A1 (en) | Stamper, imprinting method, and method of manufacturing an information recording medium | |
US20110217479A1 (en) | Method and apparatus for transcripting fine patterns | |
JPWO2007105474A1 (ja) | インプリント方法及びインプリント装置 | |
JP2008276920A (ja) | インプリント装置およびインプリント方法 | |
JP5416420B2 (ja) | 微細構造転写装置 | |
JP2005339669A (ja) | インプリント方法、情報記録媒体製造方法およびインプリント装置 | |
JP2004221465A (ja) | レジストパターン形成方法およびレジストパターン形成用モールド | |
JP4155511B2 (ja) | インプリント装置およびインプリント方法 | |
JP2010080010A (ja) | 情報記録媒体基板の製造方法 | |
US20100096775A1 (en) | Mold imprinting | |
JP4608028B2 (ja) | モールド及びその作製方法 | |
JP2004330680A (ja) | インプリント装置およびインプリント方法 | |
WO2004100143A1 (ja) | インプリント装置およびインプリント方法 | |
JP4756106B2 (ja) | 転写装置 | |
JP5052660B2 (ja) | モールド、モールドの製造方法、及びモールドによる転写方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2007062396 Country of ref document: US Ref document number: 20048124225 Country of ref document: CN Ref document number: 10556052 Country of ref document: US |
|
122 | Ep: pct application non-entry in european phase | ||
WWP | Wipo information: published in national office |
Ref document number: 10556052 Country of ref document: US |