WO2004055089A1 - 二液硬化型発泡砥石用ポリオール組成物、二液硬化型発泡砥石用組成物、発泡砥石、及び発泡砥石の製造法 - Google Patents
二液硬化型発泡砥石用ポリオール組成物、二液硬化型発泡砥石用組成物、発泡砥石、及び発泡砥石の製造法 Download PDFInfo
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- WO2004055089A1 WO2004055089A1 PCT/JP2003/016099 JP0316099W WO2004055089A1 WO 2004055089 A1 WO2004055089 A1 WO 2004055089A1 JP 0316099 W JP0316099 W JP 0316099W WO 2004055089 A1 WO2004055089 A1 WO 2004055089A1
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- foam
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/65—Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
- C08G18/66—Compounds of groups C08G18/42, C08G18/48, or C08G18/52
- C08G18/6666—Compounds of group C08G18/48 or C08G18/52
- C08G18/667—Compounds of group C08G18/48 or C08G18/52 with compounds of group C08G18/32 or polyamines of C08G18/38
- C08G18/6681—Compounds of group C08G18/48 or C08G18/52 with compounds of group C08G18/32 or polyamines of C08G18/38 with compounds of group C08G18/32 or C08G18/3271 and/or polyamines of C08G18/38
- C08G18/6685—Compounds of group C08G18/48 or C08G18/52 with compounds of group C08G18/32 or polyamines of C08G18/38 with compounds of group C08G18/32 or C08G18/3271 and/or polyamines of C08G18/38 with compounds of group C08G18/3225 or polyamines of C08G18/38
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/30—Low-molecular-weight compounds
- C08G18/32—Polyhydroxy compounds; Polyamines; Hydroxyamines
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/28—Resins or natural or synthetic macromolecular compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/30—Low-molecular-weight compounds
- C08G18/38—Low-molecular-weight compounds having heteroatoms other than oxygen
- C08G18/3802—Low-molecular-weight compounds having heteroatoms other than oxygen having halogens
- C08G18/3814—Polyamines
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/65—Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
- C08G18/66—Compounds of groups C08G18/42, C08G18/48, or C08G18/52
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2110/00—Foam properties
- C08G2110/0083—Foam properties prepared using water as the sole blowing agent
Definitions
- Polyol composition for two-component curable foaming wheel composition for two-component curable foaming wheel, composition for two-component curable foaming wheel, foaming wheel, and method for producing foaming wheel
- the present invention relates to a polyol composition for a two-component curable foaming whetstone excellent in dissolution stability, a composition for a two-component curable foaming whetstone, a foaming whetstone, and a method for producing a foaming whetstone.
- the polishing pad disclosed in Japanese Patent Application Laid-Open No. 232173/1990 is prepared by adding toluene diisocyanate (TDI) -based urethane prepolymer-7X (foaming agent) and epoxy resin powder, adding a catalyst and silicone oil, 4, diamino-1,3'-dichlorophenylphenylmethane (hereinafter also referred to as MBOCA). Add and mix, cast and foam in a mold with a casting machine to obtain a block-like molded product, and then mold. It is manufactured by slicing products.
- TDI toluene diisocyanate
- FC-7X fluoride-based urethane prepolymer-7X
- MBOCA diamino-1,3'-dichlorophenylphenylmethane
- microparticles treated with a silicone-based surfactant are mixed with an isocyanate group-terminated prepolymer, and MB OCA is added. They are mixed and poured into a mold to obtain a molded body.
- MB OCA isocyanate group-terminated prepolymer
- An object of the present invention is to provide a foaming whetstone that can stably produce a molded product for a foaming whetstone using a two-liquid mixing casting machine, and has excellent mechanical properties as a foaming whetstone, and has a melting stability that enables production of a urethane foam whetstone having a uniform density distribution.
- each X independently represents a chlorine atom or a hydrogen atom.
- tetranuclear polyaminochloro phenylmethane compound represented by the following formula (hereinafter referred to as tetranuclear).
- a polyol composition for a two-component curable foaming whetstone characterized in that the weight ratio of (A) / ( ⁇ ) is 30/70 to 60/40.
- An object of the present invention is to provide a two-component curable foaming whetstone composition, a foaming whetstone, and a method for producing a foaming whetstone.
- the component (II) used in the present invention is a binuclear polyaminochloro phenylmethane compound represented by the above formula 1, preferably 4,4,1-diamino-3,3,1-dichlorodiphenylmethane (hereinafter referred to as MBOCA). Say) 50-70 weight.
- MBOCA 4,4,1-diamino-3,3,1-dichlorodiphenylmethane
- mixture (Alpha) Poriaminokuro port phenylmethane mixed compound composed of
- a mixture out of the composition range of the mixture (A) is not preferred because the polyaminochlorophenylphenylmethane mixture (A) dissolved in the polyol (B) is precipitated during long-term storage, resulting in poor dissolution stability. Also, if such a material is used, it is not possible to obtain a polyurethane foamed wheel having sufficient physical properties and a uniform density distribution.
- the polyol (B) used in the present invention is preferably a polyol having a molecular weight of 100 to 150, more preferably a polyol having an ether bond in the main chain having a molecular weight of 500 to 1200 and / or It is a polyol having a methyl group on the side chain having a molecular weight of 50 to 500.
- These polyols have two or more, preferably two or three, hydroxyl groups at the terminals, are compatible with the mixture (A), and are liquid at room temperature (25 ° C) or room temperature (25 ° C). (° C) even if it is solid, it has a melting point of 60 ° C or less. Particularly, those which are heated and compatible with the mixture (A) are preferable.
- polyols having an ether bond in the main chain examples include polyethylene glycol, polypropylene glycol, polyethylene propylene dali cone, polytetramethylene glycol, diethylene glycol, triethylene glycol, dipropylene glycol, and tripropylene. Glycol and the like. More preferably, it is at least one selected from polytetramethylene glycol and polypropylene glycol. These may be used in combination.
- polyol having a methyl group in the side chain examples include 2-methyl-1,3-propanediole, 3-methyl-1,5-pentanediol and polyester polyols obtained from these glycols and adipic acid Is mentioned. These may be used in combination.
- the polyol (B) that dissolves the mixture (A) is selected from the above, but is particularly determined in the case of producing a grindstone containing abrasive grains in accordance with the blending amount of the cannonball. This is because the viscosity of the composition for a two-component curable foaming whetstone becomes too high due to the mixing of the abrasive grains, so that molding cannot be performed with a normal two-component mixing casting machine.
- the viscosity of the polyol (B) is preferably from 50 to: L0000 voids (25 ° C).
- the weight ratio of the mixture (A) and the polyol (B) is (A)
- the polyol composition of the present invention is preferably in a liquid state at 25 ° C., and its viscosity is preferably 300 to 300,000 boise (25 ° C.).
- ⁇ 2 ⁇ OH equivalent of the polyol composition of the present invention is preferably 50 to 300, more preferably 100 to 250.
- the mixture (A) melted by heating preferably to 100 to 120 ° C is mixed with the polyol (B) preferably heated to 80 to 110 ° C. ) At the above weight ratio. At that time, it is preferably obtained by heating to 100 to 110 ° C. and dehydrating while reducing the pressure to 5-1 OmmHg, preferably for 30 minutes to 2 hours.
- the water (3) used in the present invention is used as a foaming agent, and can be used without any particular problem as long as it is free from dirt and turbidity, and tap water, but is preferably ion-exchanged water or pure water. .
- the amount of water (3) is preferably 0.01 to 5% by weight, more preferably 0.05 to 5% by weight, based on the polyol composition comprising the components (A) and (B). ⁇ 2% by weight.
- the polyisocyanate (2) used in the composition for a two-part curable foaming whetstone of the present invention is obtained by previously reacting a polyisocyanate compound (2-1) and a polyol (2-2). Also, urethane prepolymers having terminal isocyanate groups are preferably used.
- polyisocyanate compound (2-1) examples include, for example, 2,4- or 2,61-tonoleenedisocyanate, 1,4-tetramethylene diisocyanate, 1,6-hexamethylene Diisocyanate, 1,12-dodecamethylene diisocyanate, cyclohexane-1,3- or 1,4-diisocyanate, 1-isocyanato 3-isocyanatomethyl-3,5,5-trimethylcyclohexane (Also known as isophorone diisocyanate; hereinafter referred to as IPDI), Bis (4 Hexyl) methane (hereinafter referred to as hydrogenated MDI), 2- or 4-isocyanatocyclohexyl 2'-isocyanatocyclohexyl methane, 1, 3- or 1 , 4-bis- (isocyanatomethyl) -cyclohexane, bis- (4-isocyanato-3-methylcyclohexyl) methane,
- the polyol (2-2) preferably has a molecular weight of 500 to 3000, and includes, for example, polyethylene glycol, polypropylene glycol, polyethylene propylene glycol, polytetramethylene glycol, 2-methyl-1,1,3-propane adipate, Examples thereof include 3-methyl-1,5 pentane adipate and polycarbonate polyol.
- glycols having a molecular weight of 50 to 300 may be used in combination. More preferably, it is a polytetramethylene glycol or a polypropylene glycol having a molecular weight of 500 to 1200.
- More preferred polyisocyanate (2) used in the composition for a two-part curable foaming whetstone of the present invention is a toluenedi-succinate-based urethane prepolymer containing a terminal isocyanate group.
- the isocyanate group equivalent is preferably from 300 to 580 from the viewpoint of mechanical strength and the like, and is obtained by reacting a polyol with 2,41- or 2,6-toluenediisocyanate as a polyisocyanate. Things.
- other polyisocyanate compounds described above can be used in combination.
- glycol having a molecular weight of 50 to 300 examples include ethylene glycol, propylene glycol, 1,3-propanediol, 1,3-butanediol, 1,4-butanediol, and 1,4-pentanitol.
- the amount ratio of the polyol composition (1) composed of the polyisocyanate (2), the mixture (A), the polyol (B) and the water (3) is determined.
- the OH group and the NH 2 group are preferably blended in an amount of 0.6 to 1 equivalent, more preferably 0.7 to 0.95 equivalent, with respect to 1 equivalent of the isocyanate group.
- 1 mole of water is calculated as 2 equivalents in terms of OH group.
- the polyol composition for a two-part curable foaming whetstone of the present invention further comprises a urethane-forming catalyst, abrasive grains, a foam stabilizer, a filler, a pigment, a thickener, an antioxidant, an ultraviolet absorber, and a surfactant.
- a flame retardant, a plasticizer, and the like can be appropriately added.
- Examples of the urethanization catalyst include various nitrogen-containing compounds such as triethylamine, triethylenediamine, or N-methylmorpholine, various metal salts such as potassium acetate, zinc stearate, or tin otacylate; Various organic metal compounds such as a rate are exemplified.
- Examples of the foam stabilizer include silicone surfactants such as Toraysilicon SH-193, SH-192, and SH-190 (products of Toray Dow Koung Silicone Co., Ltd.). . The addition amount is preferably 0.01 to 5% by weight based on the polyol composition.
- As the abrasive grains cerium oxide, zirconium oxide, silicon carbide, alumina and the like are preferable.
- a foam molded product obtained by blending them is useful as a material for cutting out a urethane foaming whetstone.
- the average particle size of the abrasive grains used in cerium oxide and zirconium oxide is not particularly specified, but is preferably 0.1 ⁇ m to 200 ⁇ m for polishing purposes. Average grain size of abrasive grains is greater than 200 ⁇ m If so, it is easy to settle in the tank of the two-component mixing casting machine, and it may cause clogging of the head nozzle, which is not preferable. The larger the average grain size of the abrasive grains, the more easily the abrasive grains settle. Therefore, it is necessary to consider the structure and rotation speed of the stirring blades in the tank of the two-component mixing casting machine.
- Such granules are preferably used in the range of 100 to 200 parts by weight of abrasive grains based on 100 parts by weight of the total of the mixture (A) and the polyol).
- the method for producing a foaming whetstone using the composition for a two-component curable foaming whetstone of the present invention has a good compatibility between the mixture (A) and the polyol (B), and a polyol composition comprising (A) and (B). It is better to use a material that is liquid at 25 ° C. or a material that becomes a stable and uniform liquid mixture by heating the polyol composition to preferably 40 to 70 ° C.
- the polyol composition (1) to which water (3) is added and the polyisocyanate (preferably a urethane prepolymer having terminal isocyanate groups) (2) are transferred to the respective tanks of a two-part mixing casting machine.
- the polyol composition (1) is preferably heated to 40 to 70 ° C
- the polyisocyanate (2) is preferably heated to 40 to 90 ° C.
- the mixed liquid mixed by the mixing casting machine is poured into a mold preferably at 80 to: L 20 ° C, more preferably at 90 to 110 ° C, reacted smoothly, and cured simultaneously with foaming.
- a molded product for a foamed whetstone is obtained with such a composition as to produce the following.
- the molded article is taken out, and preferably at 100 to 120 ° C and 8 to 17 ° C.
- the molded product is preferably cut out to a thickness of 0.5 to 3 mm with a slicer to obtain a sheet-like foamed whetstone.
- the premixing of the abrasive grains may be either a polyol yarn (1) or a polyisocyanate (2). However, it is more preferable to mix the polyol composition (1) with the polyol composition (1) in view of the stability of the mixed solution. In order to pre-blend the abrasive grains, it is easy to uniformly disperse the mixture by mixing the abrasive (A) and the polyol composition (B) in a stirrer capable of high-speed stirring with the abrasive grains while stirring.
- the high-speed stirring makes it easy to wet the surface of the abrasive grains and eliminates the accumulation of the abrasive grains by air.
- the air from the abrasive grains is released, and the wetness of the abrasive grains is improved.
- the bond between the tin resin and the abrasive grains is strengthened, and the abrasive grains are less likely to fall off during polishing.
- a stone without blending the abrasive grains can be used.
- the two-part curable foaming whetstone of the present invention preferably does not contain abrasive grains, and the specific gravity in the case is preferably 0.3 to 1.0, and the specific gravity when containing abrasive grains is 0.3 to 1.0. .2 is preferred. If the specific gravity is too low, the strength will be insufficient and wear will be severe. If the specific gravity is too high, the porous space will be small and the polishing effect will be low.
- the polyol composition of the present invention is preferably liquid at room temperature, which facilitates the addition and mixing of water, a foam stabilizer, and a catalyst. Can be set in a wide range.
- the polyol composition of the present invention enables molding with a two-component mixing casting machine and eliminates water evaporation and scattering, so that a urethane foam for a foaming whetstone having a uniform density distribution and excellent mechanical properties can be obtained. It can be manufactured easily. If the density distribution is non-uniform, the polishing performance will be non-uniform, so that it cannot be used as a foamed talc for polishing precision products such as silicon for semiconductor production and glass for lenses.
- Example 1 Example 1
- Example 1 mixing preparation of mixture (A) and polyol (B))
- Example 1 Polytetramethylene glycol (PTMG1000, a product of Mitsubishi Chemical Corporation) 500 parts of diethylene glycol (a product of Mitsubishi Chemical Corporation) 34. 1 part of a polyol mixture (B) is added to a flask, and the mixture is placed at 100 ° C. To hold. The mixture (A) used in Example 1 was dissolved at 120 ° C in 70%, 60%, 50%, and 40% of this mixture (B), and then 30%, 40%, Pour at a weight ratio of 50% and 60%, mix by dissolution, and dehydrate at 100 ° C; L at 5 ° C under reduced pressure of 5-10 mmHg for 1 hour. After cooling, it was taken out to obtain a liquid polyol composition. Comparative Example 3
- Polytetramethylene glycol (PTMG1000, Mitsubishi Chemical Corporation: fcM product) Add 500 parts of diethylene glycol (Mitsubishi Chemical Corporation) 34.1 parts to a polyol mixture and place in a flask and hold at 100 ° C . After dissolving the Pandex E used in Comparative Example 2 at 120 ° C in 70%, 60%, 50%, and 40% of this mixture, 30%, 40%, 50%, And 60% by weight, dissolve and mix, 100-105. C. Dehydrate for 1 hour under reduced pressure of 5-10 Hg. After cooling, it was taken out to obtain a liquid polyol composition. '' Each mixture of Examples 1 and 2 and Comparative Examples 1, 2, and 3 was left at 25 ° C for 1 day, 1 week, 3 months, and 6 months, and the appearance was observed to determine the dissolution stability of each. Was.
- Coronate T-100 toluene diisocyanate, manufactured by Nippon Polyurethane Co., Ltd.
- PTMG1000 polytetramethyllendyl alcohol, manufactured by Mitsubishi Chemical Corporation
- DEG jetile
- Preparation 2 polyol, 100 parts of composition, 100 parts of ion-exchanged water, 0.5 part of antifoaming agent Toray Silicone SH-193 (Toray 'Dowco Silicone Co., Ltd.') 0.3 part, catalyst Toyocat ⁇ ( ⁇ , ⁇ -dimethylaminoethyl ether, ⁇ OYOCAT_ET, Tosoh Corporation, product: 0.3 part) were mixed and stirred well, and then placed in the polyol tank of a two-component mixing casting machine and the temperature was adjusted to 60 ° C.
- Toray Silicone SH-193 Toray 'Dowco Silicone Co., Ltd.'
- catalyst Toyocat ⁇ ⁇ , ⁇ -dimethylaminoethyl ether, ⁇ OYOCAT_ET, Tosoh Corporation, product: 0.3 part
- the urethane prepolymer ⁇ obtained in Preparation 1 above was put into a tank for prepolymerization of a two-component mixing casting machine and the temperature was adjusted to 80 ° C.
- the urethane prepolymer 1 (2) Z polyol composition (1) was added to a mold (12 OmmX 28 OmmX 15mm) heated to 110 ° C at a weight ratio of 260 / 101.1. About 260 g was injected.
- the mold was left in a mold at 110 ° C. for 1 hour, after which the foamed molded product was taken out, and the foamed molded product was subjected to aftercare at 110 ° C. for 16 hours.
- the molded product was cut into a thickness of about 2 mm with a slicer, a sheet-like foamed whetstone with uniform density distribution and excellent physical properties was obtained.
- the urethane prepolymer ⁇ obtained in Preparation 1 above was placed in a pre-polymer tank of a two-component mixing casting machine, and the temperature was adjusted to 80 ° C.
- the weight ratio of ⁇ retan prepolymer1 (2) / polyol (1) is 270 / 180.6, and it is applied to a mold heated to 110 ° C (12 OmmX 280 X 15 ram). 260 g were injected.
- a mold heated to 110 ° C (12 OmmX 280 X 15 ram). 260 g were injected.
- leave it in a mold at 110 ° C for 1 hour then take out the foamed product, and after-cure the foamed product at 110 ° C for 16 hours.
- the molded product was cut into a thickness of about 2 mm with a slicer, a sheet-like foamed whetstone with uniform density distribution and excellent physical properties was obtained. Comparative Example 4
- Pandettas E product of Dainippon Ink and Chemicals, Inc., containing 98% or more MBOCA
- Pandettas E product of Dainippon Ink and Chemicals, Inc., containing 98% or more MBOCA
- 7 parts of ion-exchanged water 0.5 part, foam stabilizer Toray Silicone SH-193 (Toray 'Dowko Jung' Silicone Co., Ltd.) Product) 0.3 parts, Catalyst Toyocat ET (N, N-dimethylaminoethyl ether, Tosoh Corporation: h $ 3 ⁇ 4 product) 0.3 parts, mix well at 120 ° C, mix well, then mix and cast two liquids The temperature was adjusted to 120 ° C in the polyol tank of the machine.
- the urethane prepolymer ⁇ obtained in Preparation 1 above was placed in a pre-polymer tank of a two-component mixing casting machine, and the temperature was adjusted to 80 ° C.
- Pandex E (MBOC A, a product of Dainippon Ink and Chemicals, Inc.) was placed in a polyol tank, and the temperature was adjusted to 120 ° C so that MBOC A did not solidify.
- a molded product was produced using a two-liquid mixing casting machine.However, urethane prepolymer and water reacted, and the prevolomer tank was solidified, and molding could not be performed. .
- the hardness (Shore A), tensile strength, tensile stress, elongation at break, and tear strength of the 2 mm-thick sheet-like foamed whetstones obtained in Examples 3 and 4 were measured by the following methods. Table 2 shows the results. All of them exhibited sufficient performance as foamed whetstones.
- the polyol composition of the present invention has excellent compatibility, excellent dissolution stability, and exhibits liquid properties by being composed of a specific amount of the mixture (A) of the specific polyaminochloromethane compound and the polyol (B). Therefore, it is possible to form a foamed product for stone and stone using a simple two-component mixing casting machine. Furthermore, according to the present invention, water as a foaming agent can be added to the polyol composition containing MBOCA, and the temperature of the two-component curable foaming wheel composition can be adjusted to a boiling point of water or lower, so that molding can be performed.
- the present invention provides a foamed whetstone having uniform density distribution and excellent mechanical properties because water is not sometimes scattered, and a foamed whetstone useful by adding abrasive grains, and a method for producing the same. be able to.
- the foaming whetstone of the present invention is useful for polishing precision products such as glass and silicon for semiconductors.
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Polyurethanes Or Polyureas (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
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Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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US10/538,873 US7964653B2 (en) | 2002-12-17 | 2003-12-16 | Polyol composition for two-component curable abrasive foam, composition for two-component curable abrasive foam, abrasive foam, and method for producing abrasive foam |
KR1020057010894A KR100659684B1 (ko) | 2002-12-17 | 2003-12-16 | 2성분계 경화형 발포 지석용 폴리올 조성물, 2성분계 경화형 발포 지석용 조성물, 발포 지석 및 발포 지석의 제조 방법 |
CNB2003801062024A CN100351282C (zh) | 2002-12-17 | 2003-12-16 | 两组分可固化耐磨泡沫体用多元醇组合物,耐磨泡沫体及制备耐磨泡沫体的方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2002365094 | 2002-12-17 | ||
JP2002-365094 | 2002-12-17 |
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WO2004055089A1 true WO2004055089A1 (ja) | 2004-07-01 |
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US (1) | US7964653B2 (ja) |
JP (1) | JP3637568B2 (ja) |
KR (1) | KR100659684B1 (ja) |
CN (1) | CN100351282C (ja) |
TW (1) | TWI313693B (ja) |
WO (1) | WO2004055089A1 (ja) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8094456B2 (en) | 2006-01-10 | 2012-01-10 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
US8148441B2 (en) | 2005-03-08 | 2012-04-03 | Toyo Tire & Rubber Co., Ltd. | Polishing pad and manufacturing method thereof |
CN101530988B (zh) * | 2005-05-17 | 2012-09-05 | 东洋橡胶工业株式会社 | 一种研磨垫、研磨垫制造方法及一种半导体器件制造方法 |
US8304467B2 (en) | 2005-05-17 | 2012-11-06 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
US8303372B2 (en) | 2006-08-31 | 2012-11-06 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
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US8865785B2 (en) | 2007-03-28 | 2014-10-21 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
US8993648B2 (en) | 2006-08-28 | 2015-03-31 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
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JP5037014B2 (ja) * | 2005-03-08 | 2012-09-26 | 東洋ゴム工業株式会社 | 研磨パッドの製造方法、及び研磨パッド |
JP2006320982A (ja) * | 2005-05-17 | 2006-11-30 | Toyo Tire & Rubber Co Ltd | 研磨パッド |
JP4979200B2 (ja) * | 2005-05-17 | 2012-07-18 | 東洋ゴム工業株式会社 | 研磨パッド |
JP5072442B2 (ja) * | 2007-06-07 | 2012-11-14 | 富士紡ホールディングス株式会社 | 研磨パッドの製造方法および研磨パッド |
JP4897082B2 (ja) * | 2008-04-25 | 2012-03-14 | トーヨーポリマー株式会社 | ポリウレタン発泡体及び研磨パッド |
US8545292B2 (en) | 2009-06-29 | 2013-10-01 | Dic Corporation | Two-component urethane resin composition for polishing pad, polyurethane polishing pad, and method for producing polyurethane polishing pad |
JP5661130B2 (ja) * | 2013-01-31 | 2015-01-28 | 東洋ゴム工業株式会社 | 研磨パッド |
JP6498498B2 (ja) * | 2015-04-03 | 2019-04-10 | 富士紡ホールディングス株式会社 | 研磨パッド |
JP6765204B2 (ja) * | 2016-04-01 | 2020-10-07 | 富士紡ホールディングス株式会社 | 研磨方法 |
US10010996B2 (en) * | 2016-04-20 | 2018-07-03 | Seagate Technology Llc | Lapping plate and method of making |
US10105813B2 (en) * | 2016-04-20 | 2018-10-23 | Seagate Technology Llc | Lapping plate and method of making |
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- 2003-12-15 TW TW092135333A patent/TWI313693B/zh not_active IP Right Cessation
- 2003-12-16 WO PCT/JP2003/016099 patent/WO2004055089A1/ja active Application Filing
- 2003-12-16 CN CNB2003801062024A patent/CN100351282C/zh not_active Expired - Lifetime
- 2003-12-16 KR KR1020057010894A patent/KR100659684B1/ko active IP Right Grant
- 2003-12-16 US US10/538,873 patent/US7964653B2/en active Active
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8148441B2 (en) | 2005-03-08 | 2012-04-03 | Toyo Tire & Rubber Co., Ltd. | Polishing pad and manufacturing method thereof |
CN101530988B (zh) * | 2005-05-17 | 2012-09-05 | 东洋橡胶工业株式会社 | 一种研磨垫、研磨垫制造方法及一种半导体器件制造方法 |
US8304467B2 (en) | 2005-05-17 | 2012-11-06 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
US8530535B2 (en) | 2005-05-17 | 2013-09-10 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
US8779020B2 (en) | 2005-05-17 | 2014-07-15 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
US8309466B2 (en) | 2005-08-30 | 2012-11-13 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
US8094456B2 (en) | 2006-01-10 | 2012-01-10 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
US8993648B2 (en) | 2006-08-28 | 2015-03-31 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
US9358661B2 (en) | 2006-08-28 | 2016-06-07 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Polishing pad |
US8303372B2 (en) | 2006-08-31 | 2012-11-06 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
US8865785B2 (en) | 2007-03-28 | 2014-10-21 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
Also Published As
Publication number | Publication date |
---|---|
US20060122287A1 (en) | 2006-06-08 |
US7964653B2 (en) | 2011-06-21 |
CN1726240A (zh) | 2006-01-25 |
CN100351282C (zh) | 2007-11-28 |
JP3637568B2 (ja) | 2005-04-13 |
KR20050085653A (ko) | 2005-08-29 |
JP2004211076A (ja) | 2004-07-29 |
TWI313693B (en) | 2009-08-21 |
KR100659684B1 (ko) | 2006-12-21 |
TW200420594A (en) | 2004-10-16 |
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