WO2004019662A1 - Gasentladungslampe - Google Patents
Gasentladungslampe Download PDFInfo
- Publication number
- WO2004019662A1 WO2004019662A1 PCT/IB2003/003657 IB0303657W WO2004019662A1 WO 2004019662 A1 WO2004019662 A1 WO 2004019662A1 IB 0303657 W IB0303657 W IB 0303657W WO 2004019662 A1 WO2004019662 A1 WO 2004019662A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- opening
- gas discharge
- discharge lamp
- electrodes
- cathode
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/84—Lamps with discharge constricted by high pressure
- H01J61/86—Lamps with discharge constricted by high pressure with discharge additionally constricted by close spacing of electrodes, e.g. for optical projection
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
- H01J61/073—Main electrodes for high-pressure discharge lamps
- H01J61/0732—Main electrodes for high-pressure discharge lamps characterised by the construction of the electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
- H01J61/073—Main electrodes for high-pressure discharge lamps
- H01J61/0735—Main electrodes for high-pressure discharge lamps characterised by the material of the electrode
Definitions
- the invention relates to a gas discharge lamp for generating extreme ultraviolet and / or soft X-rays according to the preamble of claim 1.
- Preferred areas of application are those which require extreme ultraviolet (EUV) radiation or soft X-rays in the wavelength range from approximately 1-20 nm, especially around 13 nm, such as EUV lithography or X-ray microscopy.
- EUV extreme ultraviolet
- the gas discharge lamp typically consists of an electrode system with anode and cathode, which is connected to one
- a pulsed current with currents in the single-digit kiloampere range up to max. 100 kA and pulse durations in the range from 10 ns to a few 100 ns a so-called pinch plasma, which is caused by ohmic heating and
- Compression is brought by the pulse current to temperatures of some 10 eV and densities at which it emits characteristic radiation of the working gas used in the spectral range of interest.
- Suitable means for the preionization of a gas are required for this, for example a surface sliding spark trigger, a high dielectric trigger, a ferroelectric trigger or a glow discharge trigger.
- the electrode system consists of anode 1 and cathode 2 with each Opposing openings 3 and 4 and an electrical insulator 5 located between them.
- a plasma channel 8 is present in the discharge space 6 on the axis of symmetry 7 shown in broken lines.
- the plasma emits the radiation, which is indicated by the arrows.
- the cathode 2 also has a cavity 9 in which charge carriers, in particular electrons, are generated by suitable means for preionization.
- an operation can also be provided in which the starting electrons are created in the self-breakthrough.
- the self-breakthrough can be controlled by a trigger electrode in room 9, whereby the radiation pulses can be triggered precisely in time.
- the gas is first ionized along the field lines in the borehole area.
- This phase creates the conditions for the formation of a plasma in the hollow cathode, which is why it is referred to as a hollow cathode plasma.
- This plasma then leads to a low-resistance channel in the gap between the electrodes.
- a pulsed current which is generated by the discharge of electrically stored energy in a capacitor bank 10, is sent via this channel. The current leads to the compression and heating of the plasma, so that conditions for the efficient emission of characteristic radiation of the discharge gas used in the EUV range are achieved.
- Gas discharge lamps operating according to this functional principle are described, for example, in WO 99/29145 AI and WO 01/01736 AI.
- the last-mentioned publication also provides various measures to increase the efficiency in converting the electrical energy fed into radiation energy, including the choice of a non-continuous opening of the conical cut in the anode. This geometric configuration of the anode recess is intended to increase the radiation yield.
- WO 02/07484 A2 discloses a gas discharge lamp in which a pinch plasma is created on an axis of symmetry, which emits the radiation in the relevant spectral range.
- the document teaches to carry out a pre-ionization in an outer area by means of a pulsed sliding discharge, the charge carriers that are created being intended to reach the discharge area via an axial aperture in one of the electrodes. It is provided here that the pre-ionization area does not communicate optically with the axis of the pinch plasma channel.
- the invention is based on the technical problem of a gas discharge lamp with an EUV and / or soft
- the above-mentioned technical problem is solved by providing a gas discharge lamp in which the continuous electrode opening tapers towards the outside.
- the diameter of the electrode opening on the side facing the discharge space should be larger than on the side facing away from the discharge space.
- the exterior area is to be understood as the area in which charge carriers can be generated which can be transported into the discharge space via the continuous opening.
- the invention is based on the knowledge that an increase in the stability in the radiation emission, ie an improved consistency in the emission from pulse to pulse, is achieved in that the processes in the gas discharge space and in the outer area are largely decoupled.
- the pre-ionization processes in the outside area with the generation of charge carriers influence the discharge process in the intermediate space and lead to a destabilization of the radiation emission.
- the disadvantage of a discharge build-up in the discharge space between the anode and cathode before the desired holding voltage is reached that is to say the so-called self-breakdown, can be reduced by transferring fewer charge carriers from the outer region, for example from the hollow cathode, into the interelectrode space.
- the through opening in the electrode serves this purpose, be it the anode or the cathode, which tapers in the direction of the outer region.
- the improved dielectric strength of the electrode system in this way also allows an increase in the maximum repetition frequency or the maximum repetition rate.
- the gas discharge lamp according to the invention can either be used in self-breakthrough operation or, alternatively, additional means for pre-ionization can be provided. With such an ignition device it can be achieved that the radiation pulses are triggered precisely in time if the application requires it.
- the tapered cathode opening can have different geometries. This is shown in the preferred exemplary embodiments shown in FIGS. 2 to 7, which represent an enlargement of the dashed area shown in FIG. 1. The area shown enlarged is rotated counterclockwise by 90 ° in FIGS. 2 to 7 compared to FIG. 1.
- Electrode opening advantages in the erosion of the electrode surface When a pinch plasma is generated, pulse energies of typically a few joules to several 10 J are converted. A significant proportion of this energy is concentrated in the pinch plasma, which leads to thermal stress on the electrodes. The thermal load arises from the emission of radiation and hot particles such as ions. To illustrate this fact, it should be noted that the distance of the anode from the cathode is typically only a few Is millimeters, and the diameter of the electrode opening on the discharge side is typically between 8 mm and 20 mm.
- the cathode is preferably designed as a hollow cathode and has the continuous, tapering opening.
- the hollow space of the hollow cathode is connected to the discharge space in a gas-supplying manner. This enables the ignition of a hollow cathode plasma.
- Typical diameters for the opening of the two electrodes are in the range of a few millimeters to a few 10 millimeters. If, on the other hand, larger openings were selected, it would increasingly be impossible to generate pinch plasma which emits in the desired spectral range of the EUV and / or soft X-ray radiation, because the plasma temperature that can be achieved becomes smaller as the diameter increases.
- the anode opening should also be chosen to be as large as possible so that the radiation coupled out of the anode opening is optically accessible as well as possible from large observation angles to the pinch plasma.
- the cathode is made of a different material in the opening area than in the other areas of the cathode.
- the opening area can be made of a low-erosion material such as tungsten, molybdenum or other low-erosion alloys in order to achieve less erosion or erosion.
- the remaining areas of the cathode can then consist of a material with good thermal conductivity, such as copper.
- the anode opening has a smaller diameter than the cathode opening.
- this causes longer electric field lines because these field lines now extend into the opening, for example up to the step in the cathode opening according to FIG. 4.
- This allows the gas pressure in the Discharge space, which in turn enables an increase in the repetition frequency of the gas discharge lamp.
- the increase in the repetition frequency leads to a higher degree of radiation energy that can be coupled out.
- the use of a tapered cathode opening allows the gas discharge lamp to be operated more easily.
- the person skilled in the art has to select a total of two diameters, namely the diameter of the cathode opening on the side facing the discharge space and additionally the diameter on the side of the cathode opening facing the outer space.
- the specialist gains another when operating the system
- the opposite may be required in other experimental situations, i.e. it may be necessary to reduce the operating pressure.
- the maximum achievable repetition rate typically scales with the time with which the charge carriers of the plasma recombine.
- increasing the cathode diameter allows the selection of a lower operating pressure, and this enables a higher repetition rate.
- an easier adjustment of the operating parameters will be possible.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
- Glass Compositions (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Incineration Of Waste (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT03792583T ATE446666T1 (de) | 2002-08-21 | 2003-08-11 | Gasentladungslampe |
EP03792583A EP1532848B1 (de) | 2002-08-21 | 2003-08-11 | Gasentladungslampe |
JP2004530462A JP4563807B2 (ja) | 2002-08-21 | 2003-08-11 | ガス放電ランプ |
AU2003255933A AU2003255933A1 (en) | 2002-08-21 | 2003-08-11 | Gas discharge lamp |
US10/525,136 US7323701B2 (en) | 2002-08-21 | 2003-08-11 | Gas discharge lamp |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10238096.1 | 2002-08-21 | ||
DE10238096A DE10238096B3 (de) | 2002-08-21 | 2002-08-21 | Gasentladungslampe |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004019662A1 true WO2004019662A1 (de) | 2004-03-04 |
Family
ID=30469797
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IB2003/003657 WO2004019662A1 (de) | 2002-08-21 | 2003-08-11 | Gasentladungslampe |
Country Status (9)
Country | Link |
---|---|
US (1) | US7323701B2 (de) |
EP (1) | EP1532848B1 (de) |
JP (1) | JP4563807B2 (de) |
KR (1) | KR100991995B1 (de) |
AT (1) | ATE446666T1 (de) |
AU (1) | AU2003255933A1 (de) |
DE (1) | DE10238096B3 (de) |
TW (1) | TWI339402B (de) |
WO (1) | WO2004019662A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102005025624A1 (de) * | 2005-06-01 | 2006-12-07 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6770895B2 (en) | 2002-11-21 | 2004-08-03 | Asml Holding N.V. | Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
DE10256663B3 (de) * | 2002-12-04 | 2005-10-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe für EUV-Strahlung |
US6919573B2 (en) | 2003-03-20 | 2005-07-19 | Asml Holding N.V | Method and apparatus for recycling gases used in a lithography tool |
DE10359464A1 (de) * | 2003-12-17 | 2005-07-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung |
EP1883281B1 (de) * | 2006-07-28 | 2012-09-05 | Sage Innovations, Inc. | Ein Verfahren zur Erzeugung eines Impuls-Strahles von energiereichen Teilchen, und Teilchenquelle dazu |
US8227771B2 (en) * | 2007-07-23 | 2012-07-24 | Asml Netherlands B.V. | Debris prevention system and lithographic apparatus |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5504795A (en) * | 1995-02-06 | 1996-04-02 | Plex Corporation | Plasma X-ray source |
US6232613B1 (en) * | 1997-03-11 | 2001-05-15 | University Of Central Florida | Debris blocker/collector and emission enhancer for discharge sources |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4771447A (en) * | 1985-04-30 | 1988-09-13 | Nippon Telegraph And Telephone Corporation | X-ray source |
DE3927089C1 (de) * | 1989-08-17 | 1991-04-25 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | |
JP2701775B2 (ja) * | 1995-03-17 | 1998-01-21 | 日本電気株式会社 | プラズマ処理装置 |
US6016027A (en) * | 1997-05-19 | 2000-01-18 | The Board Of Trustees Of The University Of Illinois | Microdischarge lamp |
DE19753696A1 (de) * | 1997-12-03 | 1999-06-17 | Fraunhofer Ges Forschung | Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung |
US6700326B1 (en) * | 1999-06-14 | 2004-03-02 | Osram Sylvania Inc. | Edge sealing electrode for discharge lamp |
DE19962160C2 (de) * | 1999-06-29 | 2003-11-13 | Fraunhofer Ges Forschung | Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung |
TWI246872B (en) * | 1999-12-17 | 2006-01-01 | Asml Netherlands Bv | Radiation source for use in lithographic projection apparatus |
EP1300056A2 (de) * | 2000-07-04 | 2003-04-09 | Lambda Physik AG | Verfahren zur erzeugung von kurzwellen-strahlung aus einem gasentladungsplasma und zugehörige vorrichtung |
RU2206186C2 (ru) * | 2000-07-04 | 2003-06-10 | Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований | Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации |
DE10139677A1 (de) * | 2001-04-06 | 2002-10-17 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung |
DE10151080C1 (de) * | 2001-10-10 | 2002-12-05 | Xtreme Tech Gmbh | Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung |
DE10256663B3 (de) * | 2002-12-04 | 2005-10-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe für EUV-Strahlung |
DE102005041567B4 (de) * | 2005-08-30 | 2009-03-05 | Xtreme Technologies Gmbh | EUV-Strahlungsquelle mit hoher Strahlungsleistung auf Basis einer Gasentladung |
-
2002
- 2002-08-21 DE DE10238096A patent/DE10238096B3/de not_active Expired - Fee Related
-
2003
- 2003-08-11 KR KR1020057002732A patent/KR100991995B1/ko not_active IP Right Cessation
- 2003-08-11 US US10/525,136 patent/US7323701B2/en not_active Expired - Fee Related
- 2003-08-11 JP JP2004530462A patent/JP4563807B2/ja not_active Expired - Fee Related
- 2003-08-11 AU AU2003255933A patent/AU2003255933A1/en not_active Abandoned
- 2003-08-11 AT AT03792583T patent/ATE446666T1/de not_active IP Right Cessation
- 2003-08-11 WO PCT/IB2003/003657 patent/WO2004019662A1/de active Application Filing
- 2003-08-11 EP EP03792583A patent/EP1532848B1/de not_active Expired - Lifetime
- 2003-08-18 TW TW092122619A patent/TWI339402B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5504795A (en) * | 1995-02-06 | 1996-04-02 | Plex Corporation | Plasma X-ray source |
US6232613B1 (en) * | 1997-03-11 | 2001-05-15 | University Of Central Florida | Debris blocker/collector and emission enhancer for discharge sources |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102005025624A1 (de) * | 2005-06-01 | 2006-12-07 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas |
US7488962B2 (en) | 2005-06-01 | 2009-02-10 | Xtreme Technologies Gmbh | Arrangement for the generation of intensive short-wavelength radiation based on a gas discharge plasma |
DE102005025624B4 (de) * | 2005-06-01 | 2010-03-18 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas |
Also Published As
Publication number | Publication date |
---|---|
TWI339402B (en) | 2011-03-21 |
KR20050058347A (ko) | 2005-06-16 |
US20060113498A1 (en) | 2006-06-01 |
DE10238096B3 (de) | 2004-02-19 |
KR100991995B1 (ko) | 2010-11-04 |
TW200419614A (en) | 2004-10-01 |
JP4563807B2 (ja) | 2010-10-13 |
EP1532848A1 (de) | 2005-05-25 |
AU2003255933A1 (en) | 2004-03-11 |
EP1532848B1 (de) | 2009-10-21 |
JP2005536844A (ja) | 2005-12-02 |
US7323701B2 (en) | 2008-01-29 |
ATE446666T1 (de) | 2009-11-15 |
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