ATE446666T1 - Gasentladungslampe - Google Patents
GasentladungslampeInfo
- Publication number
- ATE446666T1 ATE446666T1 AT03792583T AT03792583T ATE446666T1 AT E446666 T1 ATE446666 T1 AT E446666T1 AT 03792583 T AT03792583 T AT 03792583T AT 03792583 T AT03792583 T AT 03792583T AT E446666 T1 ATE446666 T1 AT E446666T1
- Authority
- AT
- Austria
- Prior art keywords
- discharge lamp
- gas discharge
- opening
- charge carriers
- external region
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/84—Lamps with discharge constricted by high pressure
- H01J61/86—Lamps with discharge constricted by high pressure with discharge additionally constricted by close spacing of electrodes, e.g. for optical projection
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
- H01J61/073—Main electrodes for high-pressure discharge lamps
- H01J61/0732—Main electrodes for high-pressure discharge lamps characterised by the construction of the electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
- H01J61/073—Main electrodes for high-pressure discharge lamps
- H01J61/0735—Main electrodes for high-pressure discharge lamps characterised by the material of the electrode
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
- Glass Compositions (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Incineration Of Waste (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10238096A DE10238096B3 (de) | 2002-08-21 | 2002-08-21 | Gasentladungslampe |
PCT/IB2003/003657 WO2004019662A1 (de) | 2002-08-21 | 2003-08-11 | Gasentladungslampe |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE446666T1 true ATE446666T1 (de) | 2009-11-15 |
Family
ID=30469797
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT03792583T ATE446666T1 (de) | 2002-08-21 | 2003-08-11 | Gasentladungslampe |
Country Status (9)
Country | Link |
---|---|
US (1) | US7323701B2 (de) |
EP (1) | EP1532848B1 (de) |
JP (1) | JP4563807B2 (de) |
KR (1) | KR100991995B1 (de) |
AT (1) | ATE446666T1 (de) |
AU (1) | AU2003255933A1 (de) |
DE (1) | DE10238096B3 (de) |
TW (1) | TWI339402B (de) |
WO (1) | WO2004019662A1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6770895B2 (en) | 2002-11-21 | 2004-08-03 | Asml Holding N.V. | Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
DE10256663B3 (de) * | 2002-12-04 | 2005-10-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe für EUV-Strahlung |
US6919573B2 (en) | 2003-03-20 | 2005-07-19 | Asml Holding N.V | Method and apparatus for recycling gases used in a lithography tool |
DE10359464A1 (de) * | 2003-12-17 | 2005-07-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung |
DE102005025624B4 (de) * | 2005-06-01 | 2010-03-18 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas |
EP1883281B1 (de) * | 2006-07-28 | 2012-09-05 | Sage Innovations, Inc. | Ein Verfahren zur Erzeugung eines Impuls-Strahles von energiereichen Teilchen, und Teilchenquelle dazu |
US8227771B2 (en) * | 2007-07-23 | 2012-07-24 | Asml Netherlands B.V. | Debris prevention system and lithographic apparatus |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4771447A (en) * | 1985-04-30 | 1988-09-13 | Nippon Telegraph And Telephone Corporation | X-ray source |
DE3927089C1 (de) * | 1989-08-17 | 1991-04-25 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | |
US5504795A (en) * | 1995-02-06 | 1996-04-02 | Plex Corporation | Plasma X-ray source |
JP2701775B2 (ja) * | 1995-03-17 | 1998-01-21 | 日本電気株式会社 | プラズマ処理装置 |
US6232613B1 (en) * | 1997-03-11 | 2001-05-15 | University Of Central Florida | Debris blocker/collector and emission enhancer for discharge sources |
US6016027A (en) * | 1997-05-19 | 2000-01-18 | The Board Of Trustees Of The University Of Illinois | Microdischarge lamp |
DE19753696A1 (de) * | 1997-12-03 | 1999-06-17 | Fraunhofer Ges Forschung | Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung |
US6700326B1 (en) * | 1999-06-14 | 2004-03-02 | Osram Sylvania Inc. | Edge sealing electrode for discharge lamp |
DE19962160C2 (de) * | 1999-06-29 | 2003-11-13 | Fraunhofer Ges Forschung | Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung |
TWI246872B (en) * | 1999-12-17 | 2006-01-01 | Asml Netherlands Bv | Radiation source for use in lithographic projection apparatus |
EP1300056A2 (de) * | 2000-07-04 | 2003-04-09 | Lambda Physik AG | Verfahren zur erzeugung von kurzwellen-strahlung aus einem gasentladungsplasma und zugehörige vorrichtung |
RU2206186C2 (ru) * | 2000-07-04 | 2003-06-10 | Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований | Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации |
DE10139677A1 (de) * | 2001-04-06 | 2002-10-17 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung |
DE10151080C1 (de) * | 2001-10-10 | 2002-12-05 | Xtreme Tech Gmbh | Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung |
DE10256663B3 (de) * | 2002-12-04 | 2005-10-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe für EUV-Strahlung |
DE102005041567B4 (de) * | 2005-08-30 | 2009-03-05 | Xtreme Technologies Gmbh | EUV-Strahlungsquelle mit hoher Strahlungsleistung auf Basis einer Gasentladung |
-
2002
- 2002-08-21 DE DE10238096A patent/DE10238096B3/de not_active Expired - Fee Related
-
2003
- 2003-08-11 KR KR1020057002732A patent/KR100991995B1/ko not_active IP Right Cessation
- 2003-08-11 US US10/525,136 patent/US7323701B2/en not_active Expired - Fee Related
- 2003-08-11 JP JP2004530462A patent/JP4563807B2/ja not_active Expired - Fee Related
- 2003-08-11 AU AU2003255933A patent/AU2003255933A1/en not_active Abandoned
- 2003-08-11 AT AT03792583T patent/ATE446666T1/de not_active IP Right Cessation
- 2003-08-11 WO PCT/IB2003/003657 patent/WO2004019662A1/de active Application Filing
- 2003-08-11 EP EP03792583A patent/EP1532848B1/de not_active Expired - Lifetime
- 2003-08-18 TW TW092122619A patent/TWI339402B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TWI339402B (en) | 2011-03-21 |
KR20050058347A (ko) | 2005-06-16 |
US20060113498A1 (en) | 2006-06-01 |
DE10238096B3 (de) | 2004-02-19 |
KR100991995B1 (ko) | 2010-11-04 |
WO2004019662A1 (de) | 2004-03-04 |
TW200419614A (en) | 2004-10-01 |
JP4563807B2 (ja) | 2010-10-13 |
EP1532848A1 (de) | 2005-05-25 |
AU2003255933A1 (en) | 2004-03-11 |
EP1532848B1 (de) | 2009-10-21 |
JP2005536844A (ja) | 2005-12-02 |
US7323701B2 (en) | 2008-01-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
REN | Ceased due to non-payment of the annual fee |