WO2003100853A1 - Substrat a multiples couches avec une bobine integree, puce a semi-conducteurs, procedes de facturation - Google Patents
Substrat a multiples couches avec une bobine integree, puce a semi-conducteurs, procedes de facturation Download PDFInfo
- Publication number
- WO2003100853A1 WO2003100853A1 PCT/JP2003/006648 JP0306648W WO03100853A1 WO 2003100853 A1 WO2003100853 A1 WO 2003100853A1 JP 0306648 W JP0306648 W JP 0306648W WO 03100853 A1 WO03100853 A1 WO 03100853A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coil
- multilayer substrate
- multilayer
- forming
- built
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 289
- 238000000034 method Methods 0.000 title claims abstract description 80
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 44
- 239000004065 semiconductor Substances 0.000 title claims description 31
- 238000004804 winding Methods 0.000 claims abstract description 141
- 239000012212 insulator Substances 0.000 claims abstract description 18
- 239000000696 magnetic material Substances 0.000 claims description 17
- 230000008859 change Effects 0.000 claims description 11
- 230000000149 penetrating effect Effects 0.000 claims description 4
- 210000004709 eyebrow Anatomy 0.000 claims 1
- 239000010410 layer Substances 0.000 description 125
- 239000004020 conductor Substances 0.000 description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 16
- 239000011889 copper foil Substances 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000007747 plating Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 230000008569 process Effects 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 238000003475 lamination Methods 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 238000010030 laminating Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 238000004088 simulation Methods 0.000 description 5
- 239000003990 capacitor Substances 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000005553 drilling Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000032798 delamination Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- 239000013598 vector Substances 0.000 description 2
- 241000531908 Aramides Species 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- XUKUURHRXDUEBC-KAYWLYCHSA-N Atorvastatin Chemical compound C=1C=CC=CC=1C1=C(C=2C=CC(F)=CC=2)N(CC[C@@H](O)C[C@@H](O)CC(O)=O)C(C(C)C)=C1C(=O)NC1=CC=CC=C1 XUKUURHRXDUEBC-KAYWLYCHSA-N 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 241000288140 Gruiformes Species 0.000 description 1
- 206010067482 No adverse event Diseases 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 235000019583 umami taste Nutrition 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
- H01F17/0006—Printed inductances
- H01F17/0033—Printed inductances with the coil helically wound around a magnetic core
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/34—Special means for preventing or reducing unwanted electric or magnetic effects, e.g. no-load losses, reactive currents, harmonics, oscillations, leakage fields
- H01F27/36—Electric or magnetic shields or screens
- H01F27/363—Electric or magnetic shields or screens made of electrically conductive material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5227—Inductive arrangements or effects of, or between, wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/645—Inductive arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/34—Special means for preventing or reducing unwanted electric or magnetic effects, e.g. no-load losses, reactive currents, harmonics, oscillations, leakage fields
- H01F27/36—Electric or magnetic shields or screens
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
- H05K1/165—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed inductors
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003241820A AU2003241820A1 (en) | 2002-05-29 | 2003-05-28 | Multilayer substrate with built-in coil, semiconductor chip, methods for manufacturing them |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002156261A JP2005347286A (ja) | 2002-05-29 | 2002-05-29 | コイル内蔵多層基板、半導体チップ、及びそれらの製造方法 |
JP2002-156261 | 2002-05-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003100853A1 true WO2003100853A1 (fr) | 2003-12-04 |
Family
ID=29561465
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2003/006648 WO2003100853A1 (fr) | 2002-05-29 | 2003-05-28 | Substrat a multiples couches avec une bobine integree, puce a semi-conducteurs, procedes de facturation |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2005347286A (fr) |
AU (1) | AU2003241820A1 (fr) |
TW (1) | TW200410376A (fr) |
WO (1) | WO2003100853A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012521089A (ja) * | 2009-03-18 | 2012-09-10 | アギア システムズ インコーポレーテッド | 磁気結合が低減された集積回路インダクタ |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5433199B2 (ja) * | 2008-10-21 | 2014-03-05 | 学校法人慶應義塾 | 電子回路 |
US9113569B2 (en) * | 2011-03-25 | 2015-08-18 | Ibiden Co., Ltd. | Wiring board and method for manufacturing same |
US20120314389A1 (en) * | 2011-03-25 | 2012-12-13 | Ibiden Co., Ltd. | Wiring board and method for manufacturing same |
JP5767495B2 (ja) | 2011-03-29 | 2015-08-19 | パナソニック株式会社 | 可変インダクタ及びこれを用いた半導体装置 |
JP2013070035A (ja) * | 2011-09-22 | 2013-04-18 | Ibiden Co Ltd | 多層プリント配線板 |
US9275950B2 (en) * | 2012-05-29 | 2016-03-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Bead for 2.5D/3D chip packaging application |
JP6306288B2 (ja) | 2013-05-13 | 2018-04-04 | 日東電工株式会社 | コイルプリント配線基板、受電モジュール、電池ユニットおよび受電通信モジュール |
JP5907124B2 (ja) * | 2013-07-24 | 2016-04-20 | 株式会社村田製作所 | 高周波部品およびフィルタ部品 |
JP5970714B2 (ja) | 2013-10-30 | 2016-08-17 | 株式会社村田製作所 | 電子部品 |
JP6327639B2 (ja) * | 2014-04-18 | 2018-05-23 | 日本電信電話株式会社 | 直交型ソレノイドインダクタ |
JP6582401B2 (ja) * | 2014-12-01 | 2019-10-02 | 富士電機株式会社 | 信号伝達装置 |
JP6989465B2 (ja) | 2018-09-05 | 2022-01-05 | 株式会社東芝 | 磁気カプラ及び通信システム |
JP7219136B2 (ja) * | 2019-03-27 | 2023-02-07 | 本田技研工業株式会社 | 半導体装置 |
CN117957622A (zh) * | 2021-09-21 | 2024-04-30 | 罗姆股份有限公司 | 变压器芯片 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04237106A (ja) * | 1991-01-21 | 1992-08-25 | Nippon Telegr & Teleph Corp <Ntt> | 集積化インダクタンス素子及び集積化トランス |
JPH0555043A (ja) * | 1991-08-22 | 1993-03-05 | Fujitsu Ltd | 小型コイルとその製造方法,磁気ヘツドの製造方法及び磁気記憶装置 |
EP0588503A2 (fr) * | 1992-09-10 | 1994-03-23 | National Semiconductor Corporation | Circuit intégré d'élément de mémoire magnétique et sa méthode de fabrication |
JPH08250333A (ja) * | 1995-03-14 | 1996-09-27 | Taiyo Yuden Co Ltd | インダクタアレイ |
JPH0945866A (ja) * | 1995-08-02 | 1997-02-14 | Hitachi Ltd | マイクロ波集積回路 |
JPH10154795A (ja) * | 1996-11-19 | 1998-06-09 | Advanced Materials Eng Res Inc | 半導体チップにおけるインダクター及びその製造方法 |
-
2002
- 2002-05-29 JP JP2002156261A patent/JP2005347286A/ja active Pending
-
2003
- 2003-05-28 WO PCT/JP2003/006648 patent/WO2003100853A1/fr not_active Application Discontinuation
- 2003-05-28 AU AU2003241820A patent/AU2003241820A1/en not_active Abandoned
- 2003-05-29 TW TW092114602A patent/TW200410376A/zh unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04237106A (ja) * | 1991-01-21 | 1992-08-25 | Nippon Telegr & Teleph Corp <Ntt> | 集積化インダクタンス素子及び集積化トランス |
JPH0555043A (ja) * | 1991-08-22 | 1993-03-05 | Fujitsu Ltd | 小型コイルとその製造方法,磁気ヘツドの製造方法及び磁気記憶装置 |
EP0588503A2 (fr) * | 1992-09-10 | 1994-03-23 | National Semiconductor Corporation | Circuit intégré d'élément de mémoire magnétique et sa méthode de fabrication |
JPH08250333A (ja) * | 1995-03-14 | 1996-09-27 | Taiyo Yuden Co Ltd | インダクタアレイ |
JPH0945866A (ja) * | 1995-08-02 | 1997-02-14 | Hitachi Ltd | マイクロ波集積回路 |
JPH10154795A (ja) * | 1996-11-19 | 1998-06-09 | Advanced Materials Eng Res Inc | 半導体チップにおけるインダクター及びその製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012521089A (ja) * | 2009-03-18 | 2012-09-10 | アギア システムズ インコーポレーテッド | 磁気結合が低減された集積回路インダクタ |
Also Published As
Publication number | Publication date |
---|---|
TW200410376A (en) | 2004-06-16 |
AU2003241820A1 (en) | 2003-12-12 |
JP2005347286A (ja) | 2005-12-15 |
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