WO2003083408A1 - Lentille de fizeau, dispositif et procede de mesure d'interference, procede de fabrication d'un systeme optique de projection, et dispositif d'exposition par projection - Google Patents

Lentille de fizeau, dispositif et procede de mesure d'interference, procede de fabrication d'un systeme optique de projection, et dispositif d'exposition par projection Download PDF

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Publication number
WO2003083408A1
WO2003083408A1 PCT/JP2003/004073 JP0304073W WO03083408A1 WO 2003083408 A1 WO2003083408 A1 WO 2003083408A1 JP 0304073 W JP0304073 W JP 0304073W WO 03083408 A1 WO03083408 A1 WO 03083408A1
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WO
WIPO (PCT)
Prior art keywords
lens
fizeau
interferometer
interference measurement
test
Prior art date
Application number
PCT/JP2003/004073
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English (en)
Japanese (ja)
Inventor
Takashi Gemma
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to AU2003221011A priority Critical patent/AU2003221011A1/en
Publication of WO2003083408A1 publication Critical patent/WO2003083408A1/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping

Definitions

  • Fizeau lens interference measurement device, interference measurement method
  • the present invention relates to a Fizeau lens applied to a Fizeau interferometer. Further, the present invention provides an interference measurement apparatus having the Fizeau lens, an interference measurement method using the Fizeau lens, a method of manufacturing a projection optical system to which the interference measurement method is applied, and a projection having the projection optical system. The present invention relates to an exposure apparatus. Background art
  • Interferometry is applied to measurement of the shape of a spherical surface such as a lens.
  • a Fizeau-type interferometer which is known for its high measurement accuracy, is suitable for measuring a spherical surface to be machined with high accuracy, such as a lens in a projection optical system.
  • FIG. 6 is a diagram illustrating a conventional Fizeau-type interferometer.
  • the surface shape interference measurement is performed by irradiating a measurement light beam L1 emitted from an interferometer (not shown) onto the test surface 62a and the reference surface 63a, and reflecting the test light reflected from the test surface 62a.
  • the light beam L2 is caused to interfere with the reference light beam L3 reflected on the reference surface 63a, and the generated interference fringes are detected by an interferometer.
  • the interference fringes represent the shape of the test surface 62a with reference to the reference surface 63a.
  • a Fizeau lens 63 with a semi-transparent spherical reference surface (hereinafter referred to as a Fizeau surface) 63 a as a final surface is used as an interferometer and a test surface.
  • the measurement light beam L1 that has been disposed between the light receiving surface 62a and the Fiso surface 63a is incident on the test surface 62a to obtain the test light beam L2.
  • the non-common optical path between the test light beam L2 and the reference light beam L3 is only the distance d1 from the Fizeau surface 63a to the test surface 62a.
  • the Fizeau lens 63 has a spherical Fizeau surface 63a and a plurality of optical surfaces (refractive surfaces) 633 that convert the measurement light beam L1 into a spherical wave having the same center of curvature as the Fizeau surface 63a. has b.
  • test surface 62 a is arranged so that the center of curvature thereof coincides with the center of curvature of the Fizeau surface 63 a of the Fizeau lens 63.
  • the exposure wavelength of the projection exposure apparatus has been shortened, and the requirements for the surface accuracy standard of the optical element and the accuracy of the surface shape measurement have been strict.
  • the main exposure wavelength was i-line (365 nm), but now it is 2488 nm, and in the near future it is 19.3 nm, and it is as short as 15.7 nm.
  • the wavelength has been increased.
  • the Fizeau lens of the present invention is a Fizeau lens to be arranged in the interferometer to face the surface to be measured, and a spherical wave generating lens unit for converting a measurement light beam emitted from the interferometer into a spherical wave;
  • An aplanatic lens having a reference surface and being disposed on the test surface side of the spherical wave generating lens, wherein at least the aplanatic lens has a distance between the reference surface and the test surface that is the reference surface.
  • the spherical wave generating lens portion is designed to be shorter than the distance between the back surface of the lens and the final surface of the spherical wave generating lens portion, and the spherical wave generating lens portion and the abranic lens are separable. Therefore, Regardless of the size of the radius of curvature of the surface to be measured, measurement can be performed under a non-common optical path that is shorter than before. Then, the influence of disturbance on the measurement result can be suppressed by the shortened non-common optical path.
  • At least the abranic lens is designed such that a distance between a reference surface of the aplanatic lens and the surface to be detected is 5 Omm or less.
  • the interval is 5 O mm or less, the influence of disturbance is more reliably suppressed.
  • the Fizen lens of the present invention is arranged between the interferometer and the surface to be measured. Therefore, measurement accuracy is improved.
  • a fixing means for fixing the aplanatic lens in the Fizeau lens to the surface to be inspected is provided. If they are fixed, even if vibration is applied from the outside, the surface to be measured and the ablative lens vibrate in substantially the same direction, so that the influence of the vibration on the measurement result is extremely small. Measurement accuracy is further improved.
  • the light source of the interferometer has a coherent distance that is 2 to 4 times a distance between the final surface of the abranic lens and the surface to be inspected.
  • the interferometer according to the present invention further includes a fringe scanning unit that changes a difference in optical distance between reference light reflected on the reference surface and test light reflected on the test surface. If the fringe scanning means is provided, it becomes possible to apply phase shift interferometry (fringe scan interferometry) to this interferometer.
  • the fringe scanning unit is a wavelength modulation unit that changes a light source wavelength of the interferometer. In order to mount this wavelength modulating means in an interference measuring apparatus, it is generally considered that a semiconductor laser having a variable wavelength is used as a light source. Although the semiconductor laser has a short coherence length, it is unsuitable for a conventional interference measuring device.
  • the interference measuring device of the present invention is suitable because the required coherence distance is short.
  • the Fizeau lens of the present invention is arranged between the interferometer and the surface to be measured, and the interference of the surface to be measured is measured. According to such an interference measurement, the measurement accuracy The degree increases.
  • the interference measurement of a plurality of types of test surfaces is performed while exchanging the aplanatic lens in the Fizeau lens according to the type of the test surface.
  • a plurality of types of test surfaces are each measured with high measurement accuracy.
  • the cost required for measuring a plurality of types of test surfaces can be suppressed.
  • the method for manufacturing a projection optical system according to the present invention includes a procedure for measuring the interference of any one of the test surfaces in the projection optical system by the interference measurement method according to the present invention. Therefore, a high-performance projection optical system is manufactured.
  • the projection exposure apparatus of the present invention has a projection optical system manufactured by the method of manufacturing a projection optical system of the present invention. Therefore, this projection exposure apparatus has high performance.
  • FIG. 1 is a configuration diagram of the interference measurement apparatus 10 of the first embodiment.
  • FIG. 2 is a diagram illustrating a Fizeau lens according to the first embodiment.
  • FIG. 3 is a diagram showing an example in which the test object 12 and the final lens 13-1 are fixed to each other, and the test object 12 can be finely moved.
  • FIG. 3A is a cross-sectional view around the test object 12
  • FIG. 3B is a perspective view around the test object 12.
  • FIG. 4 is a diagram illustrating a Fizeau lens according to the second embodiment.
  • FIG. 5 is a schematic configuration diagram of a projection exposure apparatus according to the third embodiment.
  • FIG. 6 is a diagram illustrating a conventional Fizeau-type interferometer. BEST MODE FOR CARRYING OUT THE INVENTION
  • the shape of a concave spherical surface (a spherical surface concave toward the air side) is measured by a Fizeau-type interferometer.
  • FIG. 1 is a configuration diagram of the interference measuring apparatus 10 of the present embodiment.
  • the interferometer 10 is provided with a Fizeau interferometer 15, a Fizeau lens 13, a control circuit 18, and the like.
  • the Fizeau lens 13 is disposed between the test object 12 (having the test surface 12 a on a concave spherical surface) and the interferometer 15 as in the related art.
  • the interferometer 15 includes a light source 11, a beam expander 14a, a beam splitter 14b, a beam diameter conversion optical system 14c, an image sensor 16 and the like, as in the conventional interferometer. .
  • the interferometer 15 makes the measurement light beam L1, which is a parallel light beam, incident on the Fizeau lens 13 and reflects the light beam (reference light beam) L3 on the Fizeau surface 13a of the Fizeau lens 13 and the test surface L1.
  • the reflected light beam (test light beam L 2) at 2a is caused to interfere, and the generated interference fringes are detected.
  • the interferometer 15 may be connected to an arithmetic device such as an external computer (via a control circuit 18 or the like).
  • FIG. 2 is a diagram illustrating the Fizeau lens of the present embodiment.
  • the Fizeau lens 13 of the present embodiment can be separated into a final lens 13-1 having a spherical Fizeau surface 13 a and a wavefront conversion lens 13-2 other than that.
  • the symbol HI 2 in FIG. 2 is a holder that supports the test object 12.
  • the center of curvature of the Fizeau surface 13a of the final lens 13-1 coincides with the center of curvature of the test surface 12a, similar to that of the conventional Fizeau surface 63a.
  • the system composed of the back surface 13a 'of the Fizeau surface 13a and the wavefront conversion lens 13-2 converts the measurement light beam L1 into a spherical wave having the same center of curvature as the Fizeau surface 13a. .
  • At least the last lens 13-1 in the Fizeau lens 13 is provided at an interval between the test surface 12 a, that is, a non-common optical path between the test light beam L 2 and the reference light beam L 3.
  • d 1 is the wavefront converting lens 1 3 - in the c present embodiment is designed to be shorter than the interval d 2 between the 2, test surface 1 2 a is so concave spherical surface, sufficiently short non-common path d 1 Therefore, the Fizeau surface 13a becomes a convex spherical surface.
  • the curve of the Regardless of the magnitude of the index radius, measurement can be performed under the non-common optical path d 1 that is shorter than before.
  • the non-common optical path d1 be 5 Omm or less, because the influence of disturbance can be more reliably suppressed.
  • the Fizeau surface 13a having a radius of curvature close to the radius of curvature of the test surface 12a must be prepared.
  • the wavefront conversion lens 13-2 is a versatile lens
  • the final lens 13_1 is a simple lens that is easy to manufacture.
  • the most suitable wavefront conversion lens 13-2 is a spherical wave generation lens that converts the measurement light beam L1, which is a parallel light beam, into a spherical wave (hereinafter, referred to as a converged spherical wave).
  • the spherical wave generating lens is highly versatile because it forms spherical waves with different radii of curvature at each position in the optical axis direction.
  • the spherical wave generating lens requires a plurality of optical elements (refractive lenses).
  • the design and assembly are easy, and the other optical elements (here, the final lens 13-1, It also facilitates alignment with the object 1 2).
  • the final lens 13-1 which can be used together with such a wavefront conversion lens 13-2, is an aplanatic lens.
  • An abranic lens converts a spherical wave having a center of curvature on the optical axis into another spherical wave without deteriorating aberration.
  • the shape of the Fizeau surface 13a of the final lens 13-1 (magnitude of curvature radius and positive / negative) is determined by the shape of the test surface 12a and the value of the non-common optical path d1 to be provided (for example, 5 O mm or less). Therefore, when the rear surface 13a of the Fizeau surface 13a, the lens thickness of the final lens 13-1, and the material are determined, Tick conditions are taken into account.
  • the final lens 13-1 is easily manufactured.
  • the final lens 13-1 and the test object 12 are inserted into the diverging portion of the spherical wave generated by the wavefront conversion lens 13-2, and the interference fringes observed by the interferometer 15 are almost one color. It is aligned to be.
  • FIG. 2 shows the state of the final lens 13-1 and the wavefront conversion lens 13-2 after the above-described alignment of the specimen 12 and the alignment.
  • the final lens 13 _ 1 converts a spherical wave incident from the wavefront conversion lens 13-2 into a spherical wave having the same center of curvature as the test surface 12 a. In this state, measurement is possible.
  • the final lens 13-1 may be changed to an aplanatic lens corresponding to the design shape of the test surface 12a.
  • the wavefront conversion lens 13_2 can be used without any change. Therefore, the cost for measuring a plurality of test surfaces is reduced.
  • test object 12 and the final lens 13-1 are fixed to each other at the time of measurement.
  • the non-common optical path d 1 is short, if these are fixed, even if vibration is applied from the outside, the test object 12 and the final lens 13-1 are in substantially the same direction. Due to the vibration, the influence of the vibration on the measurement result can be extremely small.
  • a moving mechanism pieo element for slightly moving the geometric distance between the test light beam L2 and the reference light beam L3. 17 may be provided.
  • control circuit 18 synchronously controls the moving mechanism 17 and a predetermined element (for example, the imaging element 16) in the interferometer 15.
  • the object of the fine movement is one or both of the final lens 13-1 and the test object 12.
  • FIG. 3 shows an example in which the test object 12 and the final lens 13-1 are fixed to each other, and the test object 12 is finely movable with respect to the final lens 13-1. It is.
  • Fig. 3 (a) is a cross-sectional view of the periphery of the test object 1 and 2; FIG.
  • each optical element in the interferometer has a stage (e.g., an XYZ stage that can be shifted and tilted) as shown in Fig. 3 (a) and (b) to fine-tune the attitude.
  • the stage needs to be supported by
  • reference numerals SI 2 and S 13-1 denote a stage that supports the object 12 (via the holder H 12), and a final lens 13-1 (the holder). (Via HI 3-1)
  • a piezo element (moving mechanism) 17 that expands and contracts by a small distance ⁇ in the optical axis direction is interposed.
  • the stage S 13-1 supporting the final lens 13-1 is fixed on a common base (not shown) to which the interferometer 15 and the wavefront conversion lens 13-2 are fixed. .
  • the conventional interferometer having a long non-common optical path d1 had to allow coherent noise.
  • the coherent distance required for the light source 11 becomes shorter because the non-common optical path d1 is shorter than before.
  • d 1 the distance between the Fizeau surface and the test surface.
  • the wavelength may be modulated instead of having the moving mechanism 17 (see FIGS. 1 and 3). That is, a semiconductor laser having a variable wavelength may be used as the light source 11.
  • the semiconductor laser Since the semiconductor laser has a short coherence distance instead of being able to change the wavelength, it has not been suitable for a conventional interferometer, but the interferometer 1.0 of the present embodiment is required. Since the interference distance is short, a semiconductor laser is also suitable.
  • control circuit 18 controls the semiconductor laser and a predetermined element (for example, the imaging device 16) in the interferometer 15 in synchronization.
  • a second embodiment of the present invention will be described with reference to FIG. Here, only differences from the first embodiment will be described.
  • the measurement target is a convex spherical surface (a spherical surface convex on the air side).
  • FIG. 4 is a diagram illustrating the Fizeau lens of the present embodiment.
  • the Fizeau lens 23 of the present embodiment also has a wavefront transforming lens 13-2, which is a spherical wave generating lens, and a final lens 23-1, which is an abranic lens, as described in the first embodiment. Is provided.
  • the same wavefront conversion lens 13-2 as that of the first embodiment can be used.
  • the shape of the Fizeau surface 23a of the final lens 23-1 is the design shape of the surface 2a to be measured (magnitude of radius of curvature and positive / negative).
  • the value of the non-common optical path d 1 to be provided for example, a predetermined value of 5 O mm or less).
  • the abrasive conditions are taken into consideration.
  • the Fizeau surface 23a is a concave spherical surface in order to sufficiently shorten the non-common optical path d1.
  • the final lens 2 3-1 and the test object 2 2 are converted into a wavefront conversion lens 1 3-2 Is inserted into the converging part of the spherical wave generated by, and the interference fringes observed by the interferometer 15 (see Fig. 1) are aligned so that they become almost one color.
  • Figure 4 shows the state of the test object 22, final lens 23-1, and wavefront conversion lens 13-2 after the alignment.
  • the final lens 23-1 converts the spherical wave incident from the wavefront conversion lens 13-2 into a spherical wave having the same center of curvature as the surface 2a to be measured.
  • the positions where the test object 22 and the final lens 23-1 are inserted are the same as those of the first embodiment.
  • the point that the spherical wave emitted from the wavefront conversion lens 13-2 is converted to a spherical wave having the same center of curvature as the surface to be measured 22a is different from the first embodiment. It is the same.
  • reference numerals H 2 2 and H 2 3 —] indicate a holder for the test object 22 and a holder for the final lens 23-1, respectively.
  • FIG. 5 is a schematic configuration diagram of the projection exposure apparatus according to the present embodiment.
  • At least one optical element constituting the projection optical system L mounted on the projection exposure apparatus has its surface shape measured at the time of manufacture by any of the interference measurements according to the above embodiments. Then, it is assumed that at least one surface of the projection optical system L has been processed or adjusted according to the measurement result.
  • the projection lens is manufactured with high accuracy even if the processing (and / or adjustment) method is the same as the conventional method.
  • the projection exposure apparatus includes at least a wafer stage 108, a light source unit 101 for supplying light, and a projection optical system L.
  • the wafer stage 108 can place a substrate (wafer) W coated with a photosensitive agent on the front surface 108a.
  • the stage control system 107 controls the position of the wafer stage 108.
  • the projection optical system L is disposed between an object plane P1 on which a reticle (mask) R is disposed and an image plane P2 which is matched with the surface of the wafer W.
  • the projection optical system L has an alignment optical system applied to a scan type projection exposure apparatus.
  • illumination optical system 102 includes an alignment optical system 103 for adjusting a relative position between reticle R and wafer W.
  • the reticle R is for projecting an image of the pattern of the reticle R onto the wafer W, and is provided on a reticle stage 105 that can move parallel to the surface 108 a of the wafer stage 108. Be placed.
  • the reticle exchange system 104 exchanges and transports the reticle R set on the reticle stage 105.
  • reticle exchange system 104 includes a stage driver (not shown) for moving reticle stage 105 in parallel to surface 108 a of wafer stage 108.
  • main control unit 109 controls a series of processes from alignment to exposure.
  • FIGS. 2 and 4 show a Fizeau lens including only a spherical refraction surface
  • the Fizeau lens of the present embodiment includes a spherical refraction surface, an aspheric refraction surface, a plane refraction surface, and a diffraction surface. Any optical surface such as a surface may be included.
  • the test surface is a concave or convex spherical surface.
  • the present invention can be applied to a case where the test surface is a concave or convex aspheric surface (rotationally symmetric aspheric surface).
  • the Fizeau surface may be made aspherical.
  • the light beam emitted from one surface of the Fizeau is substantially perpendicular to the surface to be detected and is incident at substantially the same phase
  • the light beam emitted from the back surface of the Fizeau surface is substantially perpendicular to the Fizeau surface and substantially at the same phase.
  • the final lens is configured by one lens, but may be configured by a plurality of lenses.
  • the lens is composed of the above lenses in order to reduce costs.
  • Figs. 2 and 4 show the case where positive power is applied to the wavefront conversion lens (generating a focused wave), but negative power (generating a divergent wave) is applied to the wavefront conversion lens. It may be.
  • the Fizeau lens which can suppress the influence of disturbance reliably, the interference measurement device with high measurement accuracy, the interference measurement method with high measurement accuracy, the manufacturing method of the high performance projection optical system, and the high performance A projection exposure apparatus is realized.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne un dispositif de mesure d'interférence permettant la suppression fiable des effets de perturbation sur la mesure d'interférence, comprenant une lentille de Fizeau dotée d'une partie de lentille produisant une onde sphérique en vue de convertir un flux lumineux de mesure expulsé d'un interféromètre en une onde sphérique et une lentille aplanétique dotée d'une surface de référence et placée sur le côté de la surface inspectée de la lentille produisant une onde sphérique, la lentille de Fizeau étant placée à l'opposé d'une surface inspectée au moins la lentille aplanétique conçue de manière que l'intervalle entre la surface de référence et la surface inspectée soit inférieure à une distance comprise entre la surface arrière de la surface de référence et la surface finale de la partie de lentille produisant une onde sphérique, cette partie étant détachable de la lentille aplanétique.
PCT/JP2003/004073 2002-04-01 2003-03-31 Lentille de fizeau, dispositif et procede de mesure d'interference, procede de fabrication d'un systeme optique de projection, et dispositif d'exposition par projection WO2003083408A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003221011A AU2003221011A1 (en) 2002-04-01 2003-03-31 Fizeau lens, interference measuring device, interference measuring method, method of manufacturing projective optical system, and projective exposure device

Applications Claiming Priority (2)

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JP2002098516A JP2003294410A (ja) 2002-04-01 2002-04-01 フィゾーレンズ、干渉測定装置、干渉測定方法、投影光学系の製造方法、及び投影露光装置
JP2002-098516 2002-04-01

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JP5618727B2 (ja) * 2010-09-21 2014-11-05 キヤノン株式会社 形状測定法及び形状計測装置
JP6131596B2 (ja) * 2012-12-28 2017-05-24 株式会社ニコン 光学系、および面形状測定装置
EP3739389A1 (fr) * 2019-05-17 2020-11-18 ASML Netherlands B.V. Outils de métrologie comprenant un singulet objectif aplanatique

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05340735A (ja) * 1992-06-10 1993-12-21 Nikon Corp 曲率半径測定装置
JPH06174451A (ja) * 1992-12-04 1994-06-24 Nikon Corp ニュートンゲージによる測定方法
US5768150A (en) * 1993-10-14 1998-06-16 Asahi Kogaku Kogyo Kabushiki Kaisha Device and method for measuring a characteristic of an optical element

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05340735A (ja) * 1992-06-10 1993-12-21 Nikon Corp 曲率半径測定装置
JPH06174451A (ja) * 1992-12-04 1994-06-24 Nikon Corp ニュートンゲージによる測定方法
US5768150A (en) * 1993-10-14 1998-06-16 Asahi Kogaku Kogyo Kabushiki Kaisha Device and method for measuring a characteristic of an optical element

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