WO2003081265A1 - Dispositif de detection de source de production d'ondes electromagnetiques - Google Patents

Dispositif de detection de source de production d'ondes electromagnetiques Download PDF

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Publication number
WO2003081265A1
WO2003081265A1 PCT/JP2002/011665 JP0211665W WO03081265A1 WO 2003081265 A1 WO2003081265 A1 WO 2003081265A1 JP 0211665 W JP0211665 W JP 0211665W WO 03081265 A1 WO03081265 A1 WO 03081265A1
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WO
WIPO (PCT)
Prior art keywords
magnetic field
probe
distribution
electromagnetic wave
current distribution
Prior art date
Application number
PCT/JP2002/011665
Other languages
English (en)
Japanese (ja)
Inventor
Koichi Uesaka
Takashi Suga
Original Assignee
Hitachi, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi, Ltd. filed Critical Hitachi, Ltd.
Publication of WO2003081265A1 publication Critical patent/WO2003081265A1/fr

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
    • G01R29/08—Measuring electromagnetic field characteristics
    • G01R29/10—Radiation diagrams of antennas
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
    • G01R29/08—Measuring electromagnetic field characteristics
    • G01R29/0864—Measuring electromagnetic field characteristics characterised by constructional or functional features
    • G01R29/0871—Complete apparatus or systems; circuits, e.g. receivers or amplifiers

Definitions

  • the present invention relates to an electromagnetic interference (EMI) measurement technology for measuring noise (unnecessary radiation: unnecessary electromagnetic energy radiation) of an electronic device that causes electromagnetic interference (EMI), and particularly in the vicinity of a child device.
  • EMI electromagnetic interference
  • the present invention relates to technology for measuring the magnetic field of an electronic device and searching for the source of electromagnetic waves generated from the electronic device from the distribution of the magnetic field.
  • JP-A-2000-346886 as a technique for measuring EMI. This publication describes a technique in which a magnetic field probe is moved in the X, Y, Z, and ⁇ directions, and the source of electromagnetic waves generated by an electronic device is searched (estimated) based on the magnetic field strength.
  • a predetermined surface of a probe cannot be kept at a fixed angle with respect to a housing of an electronic device to be measured, so that the magnetic field strength can be accurately measured. Did not. Therefore, the source of the electromagnetic wave generated by the electronic device could not be accurately searched (estimated).
  • an object of the present invention is to improve the search accuracy of an electromagnetic wave generation source.
  • One aspect of the present invention that solves this problem is a magnetic field probe for measuring a magnetic field distribution near a three-dimensional housing, and means for moving the probe in x, y, z, 0, and ⁇ directions.
  • an electromagnetic wave source search device provided with a means for obtaining a current distribution from a magnetic field distribution and a means for obtaining an electric field strength at a desired distance from the current distribution.
  • the probe moves (rotates) also in the ⁇ direction, the magnetic field distribution can be obtained more accurately, and the search accuracy of the electromagnetic wave source can be improved.
  • FIG. 1 is a diagram showing a configuration of an electromagnetic wave source detection device.
  • FIG. 2 is a diagram showing a configuration of the electromagnetic wave source searching device.
  • Figure 3 shows a display example of the results of near-field measurement, current distribution and far-field calculation results.
  • Fig. 4 shows an example of the far field calculation result display.
  • Figure 5 shows the observation points of the multi-planar measurement system for measuring the magnetic field distribution near the three-dimensional housing.
  • FIG. 6 is a diagram showing mathematical formulas used in the specification of the present application.
  • Figure 1 shows the configuration of the electromagnetic wave source detection device.
  • the electromagnetic wave source searching apparatus of this embodiment includes a three-dimensional housing base ⁇ , 102 on which the three-dimensional housing 111 to be measured is placed, a three-dimensional magnetic field probe 109, and a three-dimensional housing. Move the three-dimensional magnetic field probe 109 to the coordinates along the surface of the three-dimensional housing 1 17 placed on the body pedestal 102, or to the nearby magnetic field observation point according to the orthogonal, cylindrical, and polar coordinate systems Mechanism (X direction probe movement rail 104, y direction probe movement rail 103, probe z axis position expansion / contraction axis 106, probe ⁇ direction rotation axis 107, probe 0 direction rotation axis 100) 8), PC for control of probe movement and rotation 1 16, antenna switching circuit 1 15, high frequency amplifier 1 12, extraction probe 1 10, frequency divider 1 1 3, divider multiplier 1 1 It has four.
  • the magnetic field probe 109 of the present embodiment can not only move in the directions of the axis, y axis, and z axis and rotate in the 0 direction, but also rotate in the ⁇ direction, it has a curved surface in the z direction. Even in such a three-dimensional case, the magnetic field distribution can be measured with high accuracy. Therefore, the search accuracy of the electromagnetic wave generation source can be improved.
  • the three-dimensional housing 1 17 to be searched is fixed to the three-dimensional housing pedestal 102.
  • the antenna switching circuit 1 15 is controlled by the PC 1 16 to select the direction of the measurement surface of the probe.
  • the voltage induced in the selected probe is measured by a vector voltmeter through a high-frequency amplifier 112 (optional).
  • the phase reference at the measurement frequency is Measure the clock of the original chassis 117 using the reference clock extraction probe 110, and pass this signal through the frequency divider 113 and the multiplication circuit 114 to obtain the desired frequency clock. Is generated and used as a phase reference of a desired frequency.
  • the search accuracy can be improved.
  • Probe 0 direction rotation axis 108 is controlled by the control PC 116 to determine the position of the probe and the direction of the measurement surface, and measure the magnetic field. This series of measurements is performed for all points near the magnetic field observation points along the coordinate system along the surface of the three-dimensional housing 1 17 or along the orthogonal, P-cylinder, and polar coordinate systems.
  • the means for rotating in the ⁇ direction is provided, so that even if the three-dimensional housing 117 has a curved surface or irregularities in the z direction, it is possible to conduct a highly accurate search for the electromagnetic wave source. ing. 'In the apparatus shown in FIG. 1, measurement along the three-dimensional housing 117 is possible, but measurement on the lower surface of the three-dimensional housing 117 is not possible. Therefore, in order to measure the lower surface, the structure shown in FIG. 2 is provided below the three-dimensional housing pedestal 102 in FIG.
  • the 3D housing pedestal 102 is floated for lower surface measurement, and the magnetic field near the lower surface of the 3D housing 1 17 for measuring the lower surface of the 3D housing 1 17 under the 3D housing pedestal 102 Prepare a magnetic field probe 202 for measurement.
  • This surface is sufficiently cold for movement on the xy plane, but may be movable in each of the ⁇ , ⁇ , and 0 directions.
  • the magnetic field probe 202 for measuring the magnetic field near the bottom of the three-dimensional housing Attach it to the mounting unit 205 and use the control PC to control the X-direction probe moving rail 204 and the y-direction probe moving rail 203 to measure the magnetic field near the lower surface of the three-dimensional housing.
  • the lower surface of the three-dimensional housing 1 17 is measured by moving the magnetic field probe 202.
  • Fig. 2 enables measurement of all six surfaces of the three-dimensional housing 1 17.
  • Figure 3 shows an example of this measurement result.
  • the current distribution 3 02 on the three-dimensional housing 1 17 is obtained by calculation.
  • the magnetic field strength 303 at a desired distance from the three-dimensional housing 117 can be calculated by using the current distribution 302.
  • Fig. 3 it is obtained by dividing into three planes: the Xy plane far electric field calculation result 304, the Xz plane far electric field calculation result 300, and the yz plane far electric field calculation result 300.
  • the position of the observation point when performing this far-field calculation can be determined arbitrarily. For example, as shown in Fig. 4, it can be obtained as the result of remote electrolysis calculation 401 along the ⁇ direction of the cylindrical coordinate system.
  • the magnetic field distribution measurement near the three-dimensional housing 117 was measured over two planes.
  • the positional resolution (exploration accuracy) can be improved.
  • the calculation for obtaining the current distribution from the magnetic field distribution is as follows.
  • the equation for calculating the three-dimensional magnetic field distribution H from the three-dimensional current distribution I can be expressed by Equation 1 in Fig. 6 using the Green's function from Maxwell's equation, so the method for calculating the current distribution from the magnetic field distribution is the inverse of the Green's function f. From the matrix, the simultaneous equations of Equation 2 in Fig. 6 can be obtained.
  • the order of the distance function r can be extended to 3 by operating the magnetic field distribution measuring probe in the third order, and the position of the current Can be calculated three-dimensionally.
  • the current distribution can be calculated using the magnetic field distribution measured on a plurality of planes at different distances from each housing plane. Can be improved.
  • the means for rotating the probe in the ⁇ direction is provided, so that the accuracy of searching for the electromagnetic wave source can be improved.
  • EMI electromagnetic interference
  • the present invention relates to an electromagnetic interference (EMI) measurement technique for measuring noise (unwanted radiation: unnecessary electromagnetic energy radiation) of an electronic device that causes electromagnetic interference (EMI), and particularly to a magnetic field near the electronic device.
  • the technology relates to a technology for measuring the electromagnetic field and detecting the source of electromagnetic waves emitted from the electronic device from the distribution of the magnetic field.

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Measuring Magnetic Variables (AREA)

Abstract

Ce dispositif de détection de source de production d'ondes électromagnétiques est destiné à améliorer la précision de détection d'une source de production d'ondes électromagnétiques. Il comporte une sonde de champ magnétique mesurant la distribution du champ magnétique près d'un boîtier en trois dimensions, des moyens permettant de déplacer la sonde dans les directions x-, y-, z-, υ- et ζ-, des moyens permettant de déterminer la distribution de courant à partir de la distribution du champ magnétique et des moyens permettant de déterminer l'intensité du champ électrique à une distance désirée de la distribution de courant.
PCT/JP2002/011665 2002-03-26 2002-11-08 Dispositif de detection de source de production d'ondes electromagnetiques WO2003081265A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002084749A JP2003279611A (ja) 2002-03-26 2002-03-26 電磁波発生源探査装置
JP2002-084749 2002-03-26

Publications (1)

Publication Number Publication Date
WO2003081265A1 true WO2003081265A1 (fr) 2003-10-02

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PCT/JP2002/011665 WO2003081265A1 (fr) 2002-03-26 2002-11-08 Dispositif de detection de source de production d'ondes electromagnetiques

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JP (1) JP2003279611A (fr)
WO (1) WO2003081265A1 (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004014419A1 (de) * 2004-03-19 2004-12-30 Siemens Ag Verfahren zur Bereitstellung von Daten einer in ein Mobilfunkgerät eingelegten SIM-Karte für ein Mobilfunkmodul
US7315173B2 (en) 2004-09-29 2008-01-01 Hitachi, Ltd. Method of measuring electric field distribution and electric field distribution measuring instrument
CN103885007A (zh) * 2014-03-31 2014-06-25 哈尔滨工业大学深圳研究生院 并列阵列式交流磁场传感装置
US9804199B2 (en) 2013-11-19 2017-10-31 The United States of America as Represented by NASA Ephemeral electric potential and electric field sensor
DE102016111200A1 (de) * 2016-06-20 2017-12-21 Noris Automation Gmbh Verfahren und Vorrichtung zur berührungslosen funktionalen Überprüfung elektronischer Bauelemente in Schaltungsanordnungen mit örtlicher Fehlerlokalisierung
US10024900B2 (en) 2016-06-09 2018-07-17 United States Of America As Represented By The Administrator Of Nasa. Solid state ephemeral electric potential and electric field sensor

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5554463B2 (ja) * 2004-07-05 2014-07-23 株式会社Ｎｔｔドコモ 比吸収率測定装置
KR100653931B1 (ko) 2005-01-17 2006-12-05 주식회사 이엠에프 세이프티 극저주파 소형 3축 자계 측정 프로브
JP5017827B2 (ja) 2005-09-20 2012-09-05 株式会社日立製作所 電磁波発生源探査方法及びそれに用いる電流プローブ
JP5151032B2 (ja) 2006-01-13 2013-02-27 株式会社日立製作所 磁界プローブ装置及び磁界プローブ素子
US7511485B2 (en) 2006-01-31 2009-03-31 Hitachi, Ltd. Magnetic field measurement method and system
JP4801538B2 (ja) 2006-09-01 2011-10-26 株式会社日立製作所 不要電磁輻射抑制回路及び実装構造及びそれを実装した電子機器
JP5767886B2 (ja) 2011-07-29 2015-08-26 株式会社日立製作所 表面電流プローブ
JP2015222189A (ja) * 2014-05-22 2015-12-10 株式会社日本自動車部品総合研究所 電磁界計測装置
JP6375956B2 (ja) * 2015-01-15 2018-08-22 Tdk株式会社 等価電界強度推定方法および放射妨害波測定装置
CN107688159B (zh) * 2017-08-08 2020-09-01 广东小天才科技有限公司 一种磁通量检测设备和磁通量检测方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06300799A (ja) * 1993-04-14 1994-10-28 Mitsubishi Electric Corp 電磁界測定装置
JPH1062467A (ja) * 1996-06-12 1998-03-06 Mitsubishi Electric Corp 不要電磁波測定システム
JPH10221391A (ja) * 1996-12-04 1998-08-21 Mitsubishi Electric Corp 円筒面放射界測定装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06300799A (ja) * 1993-04-14 1994-10-28 Mitsubishi Electric Corp 電磁界測定装置
JPH1062467A (ja) * 1996-06-12 1998-03-06 Mitsubishi Electric Corp 不要電磁波測定システム
JPH10221391A (ja) * 1996-12-04 1998-08-21 Mitsubishi Electric Corp 円筒面放射界測定装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004014419A1 (de) * 2004-03-19 2004-12-30 Siemens Ag Verfahren zur Bereitstellung von Daten einer in ein Mobilfunkgerät eingelegten SIM-Karte für ein Mobilfunkmodul
US7315173B2 (en) 2004-09-29 2008-01-01 Hitachi, Ltd. Method of measuring electric field distribution and electric field distribution measuring instrument
US9804199B2 (en) 2013-11-19 2017-10-31 The United States of America as Represented by NASA Ephemeral electric potential and electric field sensor
CN103885007A (zh) * 2014-03-31 2014-06-25 哈尔滨工业大学深圳研究生院 并列阵列式交流磁场传感装置
US10024900B2 (en) 2016-06-09 2018-07-17 United States Of America As Represented By The Administrator Of Nasa. Solid state ephemeral electric potential and electric field sensor
DE102016111200A1 (de) * 2016-06-20 2017-12-21 Noris Automation Gmbh Verfahren und Vorrichtung zur berührungslosen funktionalen Überprüfung elektronischer Bauelemente in Schaltungsanordnungen mit örtlicher Fehlerlokalisierung

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