WO2003075098A3 - Vermeidung von kontamination auf optischen elementen und reinigung dieser elemente - Google Patents

Vermeidung von kontamination auf optischen elementen und reinigung dieser elemente Download PDF

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Publication number
WO2003075098A3
WO2003075098A3 PCT/EP2003/002372 EP0302372W WO03075098A3 WO 2003075098 A3 WO2003075098 A3 WO 2003075098A3 EP 0302372 W EP0302372 W EP 0302372W WO 03075098 A3 WO03075098 A3 WO 03075098A3
Authority
WO
WIPO (PCT)
Prior art keywords
contamination
elements
optical elements
cleaning
photocurrent
Prior art date
Application number
PCT/EP2003/002372
Other languages
English (en)
French (fr)
Other versions
WO2003075098A2 (de
Inventor
Marco Wedowski
Frank Stietz
Bas Mertens
Roman Klein
Original Assignee
Zeiss Carl Smt Ag
Marco Wedowski
Frank Stietz
Bas Mertens
Roman Klein
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Marco Wedowski, Frank Stietz, Bas Mertens, Roman Klein filed Critical Zeiss Carl Smt Ag
Priority to EP03711941A priority Critical patent/EP1481287A2/de
Priority to US10/506,555 priority patent/US7060993B2/en
Priority to KR10-2004-7013943A priority patent/KR20040102031A/ko
Priority to CN038055147A priority patent/CN1639643B/zh
Priority to AU2003218706A priority patent/AU2003218706A1/en
Priority to JP2003573498A priority patent/JP2005519333A/ja
Publication of WO2003075098A2 publication Critical patent/WO2003075098A2/de
Publication of WO2003075098A3 publication Critical patent/WO2003075098A3/de
Priority to US11/375,267 priority patent/US7462842B2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

Es wird ein Verfahren zur Vermeidung von Kontamination auf Oberflächen optischer, ein Vielschichtsystem aufweisender Elemente während ihrer Bestrahlung mit EUV-Strahlung bei Betriebswellenlängen in einem evakuierten, eine Restgasatmosphäre aufweisenden geschlossenen System beschrieben, bei dem der durch Photoemission aus der bestrahlten Oberfläche des Vielschichtsystems erzeugte Photostrom gemessen wird. Der Photostrom wird zur Regelung der Gaszusammensetzung des Restgases eingesetzt, wobei die Gaszusammensetzung in Abhängigkeit von mindestens einem unteren und einem oberen Schwellenwert des Photostroms verändert wird. Es wird auch eine Vorrichtung zur Regelung der Kontamination auf der Oberfläche mindestens eines optischen Elementes während der Bestrahlung sowie eine EUV-Lithographievorrichtung und ein Verfahren zur Reinigung von mit Kohlenstoff kontaminierten Oberflächen von optischen Elementen beschrieben.
PCT/EP2003/002372 2002-03-07 2003-03-07 Vermeidung von kontamination auf optischen elementen und reinigung dieser elemente WO2003075098A2 (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
EP03711941A EP1481287A2 (de) 2002-03-07 2003-03-07 Vorrichtung, euv-lithographiegerät und verfahren zur vermeidung und reinigung von kontamination auf optischen elementen
US10/506,555 US7060993B2 (en) 2002-03-07 2003-03-07 Device, EUV-lithographic device and method for preventing and cleaning contamination on optical elements
KR10-2004-7013943A KR20040102031A (ko) 2002-03-07 2003-03-07 장치, ｅｕｖ-리소그래픽 장치 및 광학요소의 오염 방지및 정제 방법
CN038055147A CN1639643B (zh) 2002-03-07 2003-03-07 用于避免和清洁光学元件上污染物的装置,euv石版印刷设备和方法
AU2003218706A AU2003218706A1 (en) 2002-03-07 2003-03-07 Prevention of contamination of optical elements and cleaning said elements
JP2003573498A JP2005519333A (ja) 2002-03-07 2003-03-07 光学要素上の汚染を防止し、クリーニングするためのデバイス、ｅｕｖリソグラフィーデバイスおよび方法
US11/375,267 US7462842B2 (en) 2002-03-07 2006-03-14 Device, EUV lithographic device and method for preventing and cleaning contamination on optical elements

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10209493A DE10209493B4 (de) 2002-03-07 2002-03-07 Verfahren zur Vermeidung von Kontamination auf optischen Elementen, Vorrichtung zur Regelung von Kontamination auf optischen Elementen und EUV-Lithographievorrichtung
DE10209493.4 2002-03-07

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US10506555 A-371-Of-International 2003-03-07
US11/375,267 Continuation US7462842B2 (en) 2002-03-07 2006-03-14 Device, EUV lithographic device and method for preventing and cleaning contamination on optical elements

Publications (2)

Publication Number Publication Date
WO2003075098A2 WO2003075098A2 (de) 2003-09-12
WO2003075098A3 true WO2003075098A3 (de) 2004-02-19

Family

ID=27770969

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/002372 WO2003075098A2 (de) 2002-03-07 2003-03-07 Vermeidung von kontamination auf optischen elementen und reinigung dieser elemente

Country Status (8)

Country Link
US (2) US7060993B2 (de)
EP (1) EP1481287A2 (de)
JP (1) JP2005519333A (de)
KR (1) KR20040102031A (de)
CN (1) CN1639643B (de)
AU (1) AU2003218706A1 (de)
DE (1) DE10209493B4 (de)
WO (1) WO2003075098A2 (de)

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US8158959B2 (en) 2009-02-12 2012-04-17 Gigaphoton Inc. Extreme ultraviolet light source apparatus

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Publication number Priority date Publication date Assignee Title
US8158959B2 (en) 2009-02-12 2012-04-17 Gigaphoton Inc. Extreme ultraviolet light source apparatus
US8586954B2 (en) 2009-02-12 2013-11-19 Gigaphoton Inc. Extreme ultraviolet light source apparatus

Also Published As

Publication number Publication date
AU2003218706A1 (en) 2003-09-16
CN1639643A (zh) 2005-07-13
WO2003075098A2 (de) 2003-09-12
KR20040102031A (ko) 2004-12-03
DE10209493B4 (de) 2007-03-22
DE10209493A1 (de) 2003-10-02
JP2005519333A (ja) 2005-06-30
US7060993B2 (en) 2006-06-13
CN1639643B (zh) 2011-08-03
US20060192158A1 (en) 2006-08-31
EP1481287A2 (de) 2004-12-01
US7462842B2 (en) 2008-12-09
US20050104015A1 (en) 2005-05-19
AU2003218706A8 (en) 2003-09-16

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