WO2003050586A2 - Facette de miroir et miroir a facettes - Google Patents

Facette de miroir et miroir a facettes Download PDF

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Publication number
WO2003050586A2
WO2003050586A2 PCT/EP2002/012792 EP0212792W WO03050586A2 WO 2003050586 A2 WO2003050586 A2 WO 2003050586A2 EP 0212792 W EP0212792 W EP 0212792W WO 03050586 A2 WO03050586 A2 WO 03050586A2
Authority
WO
WIPO (PCT)
Prior art keywords
mirror
facet
carrier element
facets
facing away
Prior art date
Application number
PCT/EP2002/012792
Other languages
German (de)
English (en)
Other versions
WO2003050586A3 (fr
Inventor
Wolfgang Singer
Markus Weiss
Andreas Seifert
Frank Melzer
Heinz Mann
Andreas Heisler
Hubert Holderer
Original Assignee
Carl Zeiss Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Ag filed Critical Carl Zeiss Smt Ag
Priority to AU2002356606A priority Critical patent/AU2002356606A1/en
Publication of WO2003050586A2 publication Critical patent/WO2003050586A2/fr
Publication of WO2003050586A3 publication Critical patent/WO2003050586A3/fr
Priority to US10/841,846 priority patent/US7090362B2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1821—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors for rotating or oscillating mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1824—Manual alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/198—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the mirror relative to its support
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Definitions

  • the invention relates to a mirror facet for a facet mirror with a mirror surface. Furthermore, the invention relates to a facet mirror made up of several of these mirror facets. The invention also describes a method for aligning mirror facets and a method for fixing the position of mirror facets. Finally, the invention also relates to the use of a facet mirror made of mirror facets.
  • Mirror facets for several facet mirrors comprising several of these mirror facets are known from the general state of the art.
  • GB 2 255 195 A describes facet mirrors of this type with individual mirror facets and corresponding bearing elements for the facet mirrors, the purpose of which is to be found in particular in the field of solar energy technology.
  • Each of these mirror facets is designed so that it consists of a mirror surface, which is connected via a rod to a ball, which is fastened in corresponding bearing devices.
  • the accuracy of such arrangements with regard to the possibility of their adjustment or the like is extremely limited, since the mounting of the individual mirror facets is comparatively loose and misalignment can be carried out very easily and quickly.
  • EP 0 726 479 A1 describes a tilting mirror arrangement which has at least one tilting mirror similar to a mirror facet, a base body and at least one mirror bearing with an at least almost fixed pivot point between the tilting mirror and the base.
  • the overall size of the entire arrangement of the tilting mirror mounting and housing is arranged below the mirror surface in such a way that it does not protrude beyond the mirror plane in the projection of the mirror plane, or protrudes only marginally when the mirror is deflected.
  • Such tilting mirrors are used, for example, in the field of laser technology.
  • the adjustment is also carried out with mirrors of this type under lighting possible.
  • the structure is very complex, so that facet mirrors, which could be formed from these tilting mirrors, a very high cost in terms of space, adjustment elements, costs and the like can be expected.
  • EP 0 901 992 A1 which describes a soldering process for optical materials on metal frames and mounted assemblies.
  • the problem is solved with regard to the mirror facet for a facet mirror in that the side of the mirror facet facing away from the mirror surface is spherical.
  • the spherical back surface allows an ideal adjustment of each of the mirror facets, generally approx. 50 to 250 pieces, of a facet mirror constructed from them.
  • the spherical rear surface makes it possible to tilt the mirror surface, which can be designed, for example, as a spherical surface, as an aspherical surface, as a plane, toroidal or cylindrical surface, without moving the mirror facet itself out of its position.
  • the solution to the problem regarding the mirror facet for a facet mirror provides that the mirror surface of the mirror facet is spherical, the side of the mirror facet facing away from the mirror surface also being spherical, and the two spheres being different Have centers.
  • the two different centers of the - not necessarily - spherical mirror surface and the spherical rear surface of the mirror facet create a structure that allows the mirror surface to be aligned and shifted in an ideal manner.
  • the mirror moves laterally, it will pivot on its spherical rear surface by a corresponding radius. This pivoting movement takes place around the center of the sphere of the rear surface. Since the mirror surface has a different center point, this undergoes a different movement, so that the central axis of the mirror surface shifts and at the same time experiences a tilt.
  • the mirror facet can therefore be ideally aligned to the specified requirements.
  • the center of the spherical rear surface and the center of the spherical mirror surface, or in the case of a non-spherical mirror surface, the center of their radius of curvature of the apex do not coincide.
  • a mirror facet for a facet mirror is designed such that the side of the mirror facet facing away from the mirror surface is planar.
  • Such a mirror facet can be shifted accordingly on this flat rear surface in order to align its lateral position in the desired position. Tilting the axis of the mirror is not possible with this arrangement.
  • the side facing away from the mirror surface has a sphere, as has already been described above, which is arranged in a corresponding sphere of an intermediate element which is planar on its side facing away from the mirror facet is trained.
  • an alignment of the mirror surface with respect to the tilting of its central axis can be achieved in a particularly advantageous manner by moving the mirror facet on the intermediate element along its spherically designed rear side.
  • the intermediate element with its flat rear face can be aligned in the manner described above for the configuration of the second mirror facet.
  • the combination thus makes it possible to create a mirror facet that can be ideally aligned.
  • the mirror facet or possibly also the intermediate element has magnetic devices. It can thus be achieved that after alignment has been carried out by activating these magnetic devices, for example switching on electromagnets, the position of the mirror facet and possibly also of the intermediate element can be securely fixed.
  • a facet mirror which consists of several of the mirror facets according to the type described above, the mirror facets being placed on a common carrier element.
  • this support element can have a flat surface on which the mirror facets or intermediate elements are placed and on which they can be moved and aligned.
  • the side of the carrier element facing away from the mirror facets does not have to be flat.
  • this rear side has reinforcements in the form of struts or in the form of a honeycomb structure in order to be as rigid as possible with the simplest possible construction.
  • the alternative would be corresponding shape specifications in the carrier element, which would be suitable for receiving the mirror facets with their spherical rear surfaces.
  • holes or the like could be thought of which are smaller in diameter than the mirror facet itself and thus enable an annular support of the spherically designed rear surface of the mirror facet.
  • the carrier element in the area in which the respective mirror facet is placed on the carrier element each has an opening which extends from the side of the carrier element facing the mirror facet to that of the mirror facet side of the support element runs away.
  • one possibility would be to insert a pressure cushion between the carrier element and the mirror facet through the opening.
  • a comparatively small hole or the like can be provided as the opening, through which a fluid under pressure can be introduced between the mirror facet and the carrier element. The movement of the mirror facet, in particular for alignment, is thereby facilitated since the mirror facet then practically “floats” on a pressure cushion and the friction that is otherwise present is largely prevented.
  • Comparable can also be provided according to a very favorable development of the invention if the mirror facet is used together with the intermediate element. Then either the intermediate element could float on the pressure pad or it would also be conceivable that the intermediate element according to a ner very favorable further development of this idea also has an opening so that the mirror facet can be floatingly supported on the intermediate element via a pressure cushion or can be minimized for adjustment.
  • the holding mandrel should then have a diameter that is smaller than the diameter of the opening.
  • the holding facet can then be used to adjust the mirror facet and / or the intermediate element from the rear of the carrier element.
  • the holding mandrel allows the intermediate element and / or the mirror facet to be fastened on the carrier element.
  • the holding mandrel can also be secured using magnetic devices or made of a material that can be magnetized.
  • a magnetic force can then be exerted on the holding mandrel via electromagnetic devices or the like, or on the intermediate element and / or the mirror facet via the holding mandrel, which fixes them in their position.
  • the magnetic device could either remain on the holding mandrel or, if the holding mandrel is made of a material that can be permanently aggre- gated, the magnetic device could also be removed after the holding mandrel has been magnetized, and for example for the holding mandrel of the element arranged next to it Find facet mirror use.
  • the permanently magnetized holding mandrel and / or the permanent magnetized mirror facets and / or intermediate elements would then be fixed in their position by attractive forces relative to the carrier element, which must also be magnetically conductive.
  • the mirror facet and / or the intermediate element and / or the carrier element is at least partially provided with a solder, at least in the areas in which these components touch.
  • the solder which can be applied to the components as a coating, for example, or which can be stored in corresponding recesses in the components, can be melted by heating them up after the final alignment of the mirror facets, so that after cooling, a firm connection between the Mirror facets and / or the intermediate elements and / or the carrier elements are created which ideally secure the position of the mirror surface and which can also provide ideal heat dissipation.
  • the above-mentioned object is achieved by a method for aligning mirror facets according to one of the above-mentioned claims, in which the mirror facet is rotated on its sphere facing away from the mirror surface, if the rear surface is designed accordingly, and thus rotated around the center of this sphere is achieved, whereby a tilting of the optical axis and / or a lateral displacement of the optical axis is achieved.
  • This alignment is very inexpensive and simple, since only a single movement is required to align the mirror facet accordingly, as was already explained above in the description of the mirror facet itself.
  • the above-mentioned object of the invention is achieved by a method for fixing the position of a mirror facet according to the above-mentioned claims on a carrier element, in which the position is fixed by magnetic holding forces.
  • these holding forces can be applied by electromagnetic devices. This offers the advantage of very simple influencing of the magnetic holding forces and the possibility of being able to switch them on and off easily.
  • An alternative embodiment provides that the magnetic devices themselves are permanently magnetized, for example if they are made of a suitable material suitable for this and in which they are converted into permanent magnets by means of electromagnetic forces. This offers decisive advantages if, for reasons of space or for other reasons, no lines or currents are required in the area of the facet mirror that require would be loaned to maintain the electromagnetic devices with regard to their magnetic force.
  • a further alternative can provide that the mirror facets are soldered to the carrier element after alignment. This also offers a good attachment with a good heat-conducting connection, so that any energy absorbed in the form of heat can be dissipated very easily.
  • a further alternative could provide that the mirror facets are blasted onto the carrier element after alignment.
  • This measure which is common with optical elements polished to a very good surface quality, can be used very advantageously, for example in connection with the pressure cushion already described above, by introducing the pressure cushion as a variable pressure cushion between the parts to be blasted. After alignment or adjustment of the position by lowering the pressure, a slow and quasi-continuous starting can be achieved, so that no misalignment will take place by the starting process itself.
  • Figure 1 shows a section of an exemplary structure for a faceted mirror
  • Figure 2 shows a first possible structure for a mirror facet
  • FIG. 3 shows another possible structure for a mirror facet
  • Figure 4 shows a mirror facet in combination with an intermediate element
  • FIG. 5 shows a mirror facet in combination with an intermediate element which has magnetic devices
  • FIG. 6 shows a mirror facet in combination with an intermediate element which has magnetic devices in an alternative embodiment
  • FIG. 7 shows a mirror facet which has magnetic devices
  • FIG. 8 shows a mirror facet with an intermediate element, which has an opening for introducing a pressure cushion.
  • FIG. 1 shows a section of a facet mirror 1 consisting of a carrier element 2 and a plurality of mirror facets 3.
  • Each of the mirror facets 3 has a mirror surface 4 and a rear surface 5 which faces away from the mirror surface 4.
  • a facet mirror 1 which always comprises several of the mirror facets 3, generally approximately 50 to 250 pieces, the possible structure of the mirror facets 3 itself will be explained in more detail below using various embodiments. In this case, several, possibly also several differently designed mirror facets 3 should always be combined to form the facet mirror 1, which is indicated here in principle.
  • the special purpose of the facet mirror 1 is the use for lighting systems in microlithography.
  • Such facet mirrors 1 are particularly favorable when used with wavelengths in the range of extreme ultraviolet (EUV), since with such wavelengths over refractive optical elements no or far worse results with regard to the optical imaging quality can be achieved than with reflective elements, for example such Faceted mirror 1.
  • EUV extreme ultraviolet
  • FIG. 2 shows a first possible embodiment of the mirror facet 3.
  • the mirror facet 3 which can for example consist of a mirror substrate, has the mirror surface 4 already mentioned and a rear surface 5 '. Contrary to the rear surfaces 5 shown above, the rear surface 5 'of the mirror facet 3 shown in FIG. 2 is designated by the reference symbol 5', since this is a spherical rear surface 5 ', while the rear surfaces shown above in the context of FIG. 1 are planar rear surfaces 5 are formed. To make it easier to distinguish between these two types of back surfaces, the designation 5 for the flat back surface and the designation 5 1 for the spherical back surface are retained throughout.
  • the mirror surface 4 which is spherical here, which does not necessarily have to have one Mirror radius r on.
  • the spherical mirror surface 4 is thus a sphere around the center M, which corresponds correspondingly to the radius r and through which the optical axis 6 of the mirror facet 3 also runs.
  • a center point M ' which together with the associated radius r' forms the center point of the spherical rear surface 5 1 , does not lie on the center point M of the mirror surface 4. If the mirror facet 3 is now stored on the rear surface 5 ', with a lateral displacement of the mirror facet 3 result in sliding along the radius r 'of the rear surface 5'. The mirror facet 3 thus executes a pivoting movement around the center M '.
  • the mirror surface 4 simultaneously experiences a tilt of its optical axis 6 and a displacement thereof in the lateral direction.
  • FIG. 3 shows a mirror facet 3, which in principle fulfills the same requirements as the mirror facet 3 according to FIG. 2.
  • the only difference between the mirror facet 3 shown here is that it has a flat rear surface 5, so that the mirror facet 3 on the carrier element 2, which has a flat surface and is shown here for simplicity as a flat plate, by a lateral one Moving on the carrier element 2 in the plane perpendicular to its optical axis 6 can be aligned.
  • a mirror facet 3 can now be seen, which is designed analogously to the mirror facet 3 according to FIG. 2.
  • the mirror facet 3 has a spherical rear surface 5 '.
  • this spherical rear surface 5 ' is now not in direct contact with the carrier element 2, but an intermediate element 7 is arranged between the rear surface 5' and the carrier element 2.
  • the intermediate element 7 has on its side facing the mirror facet 3 a spherical surface 8 in which the corresponding spherical rear surface 5 'of the mirror facet 3 is located and in which the mirror facet 3 can be moved in accordance with the conditions described above.
  • the intermediate element 7 is formed flat on a rear surface 9 facing away from the mirror facet 3, so that this can be aligned on the carrier element 2 in the manner already described in the explanation of the mirror facet 3 according to FIG. 3.
  • an arrangement can be achieved which enables a very large adjustment path by displacing the intermediate element 7 on the carrier element 2, perpendicular to the optical axis 6 of the mirror facet 3 and which, by "sphering" the mirror facet 3 with its spherical rear surface 5 1 on the spherical surface 8 of the intermediate element 7, enables tilting and possibly also a slight displacement for readjustment.
  • the structure according to FIG. 4 thus offers the advantages of both systems described above.
  • Figures 5, 6 and 7 each show different versions of mirror facets 3, which can be fixed by means of magnetic holding forces.
  • materials which are necessary for the mirror facets 3 itself magnetically or magnetically conductive. Examples could be various steels, INVAR or the like. If such substrates are used for the mirror facets 3, after the mirror surface 4 has been prefabricated, they would have to be coated thereon with a polishable layer, such as a layer of NiP, which can be polished accordingly and coated as a mirror.
  • Figure 5 shows a structure in which the magnetic devices 10, which are designed here as a coil, are arranged in the intermediate element 7.
  • the magnetic devices 10 always remain in the area of the intermediate element. elements and fix the mirror facet 3, the intermediate element 7 and the carrier element 2 against each other by magnetic holding forces.
  • FIG. 6 shows a comparable arrangement in which the magnetic devices 10 can, however, be removed after the magnetization of a holding mandrel 11 connected to the intermediate element 7.
  • the holding mandrel 11 projects through an opening 12 in the carrier element 2.
  • an alignment of the intermediate element 7 and thus the position of the mirror facet 3 perpendicular to its optical axis 6 on the carrier element 2 can be very easily from the side facing away from the mirror facet 3 of the carrier element 2 from.
  • the stroke for the adjustment is limited depending on the diameter of the holding mandrel 11 and the opening 12, but is sufficient for most cases, especially when used in EUV lithography.
  • the magnetic device 10 which is designed here as an excitation coil, can be inserted over the holding mandrel 11.
  • the holding mandrel 11 or the intermediate element 7 itself can be permanently magnetized, so that after this process the magnetic device 10 can be removed from the holding mandrel 11 without the fixed position of the mirror facet 3 being released again.
  • the following procedure is used to adjust the mirror facet 3:
  • the mirror facet 3 is inserted into the intermediate element 7, the magnetic devices 10 not yet being magnetic. Then the mirror facet 3 is pre-adjusted.
  • the magnetic force is switched on slightly and the mirror facet 3 is readjusted. If the mirror facet 3 is adjusted precisely enough, the magnetic force is fully switched on and the mirror surface 4 is secured against tilting.
  • the mirror facet 3 is then fixed to the intermediate element 7 connected.
  • the intermediate element 7 is also firmly connected to the carrier element 2 by the magnetic forces.
  • Figure 7 shows an arrangement for mounting on a flat surface of the support element 2 for adjustment by lateral displacement.
  • the carrier element 2 must also consist of a magnetic material.
  • the magnetizing coil as a magnetic device 10, is located outside and can be removed.
  • the rear surface 5, 5 1 of the mirror facet 3 has an adhesive, soldering and oxidation protection layer (Cr, Ni, An) and the surface of the carrier element 2 also has such a layer package.
  • the solder is either applied to one or both carrier partners between the solderable layer and the oxidation protection layer, or is designed as a solder-filled chamber. Soldering itself and exemplary solders are described in EP 0 901 992 A2.
  • the adjustment procedure will be as described above.
  • the mirror facet 3 is again inserted into the intermediate element 7 or into the recesses provided for it in the plate serving as the carrier element 2 and, if necessary, adjusted in several steps. After all the mirror facets 3 of the facet mirror 2 have been completely adjusted, the respective joint or the two joining partners are heated until the solder melts and both parts are wetted. After the solder has cooled, the connection fertilized solid.
  • a cheap solution for introducing the necessary heat for the soldering can be done by heating with IR radiation through the substrate of the mirror facets 3.
  • the mirror surface 4 and the substrate must be transparent to the heat radiation.
  • the advantage of this flux-free solution is that no residues of the flux can arise.
  • the mirror facet 3 "floats" on a pressure pad p.
  • the pressure cushion p is introduced through the opening 12 in the carrier element 2 and, if an intermediate element 7 is present, through a bore 13 in the intermediate element 7 under the mirror facet 3. Only after the mirror facet 3 has been correctly aligned is the pressure cushion reduced in its pressure or a gas stream forming the pressure cushion is switched off. The mirror facet 3 then blows onto the intermediate element 7 virtually continuously, so that there is no fear of misalignment due to the wringing or bonding. It is advisable to use an oxygen-free gas stream as the gas stream, for example nitrogen or noble gas, in order to prevent oxidation processes in the area of the entire facet mirror 1 as far as possible.
  • an oxygen-free gas stream as the gas stream, for example nitrogen or noble gas

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

L'invention concerne une facette de miroir (3) conçue pour un miroir à facettes (1) et présentant une surface miroir (4). Dans un mode de réalisation préféré de l'invention, la surface miroir (4) de la facette de miroir (3) présente une forme sphérique, la face de la facette miroir (3) qui est opposée à la surface miroir (4) présente également une forme sphérique, et les deux sphères comportent des centres (M, M') différents. La facette de miroir (3) peut néanmoins être configurée de manière que la face qui est opposée à la surface miroir (4) présente une forme plane. Les facettes de miroir (3) peuvent être réunies pour constituer un miroir à facettes (1), les facettes de miroir (3) étant à cet effet posées sur un élément porteur commun (2).
PCT/EP2002/012792 2001-11-09 2002-11-15 Facette de miroir et miroir a facettes WO2003050586A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU2002356606A AU2002356606A1 (en) 2001-12-12 2002-11-15 Mirror facet and facetted mirror
US10/841,846 US7090362B2 (en) 2001-11-09 2004-05-07 Facet mirror having a number of mirror facets

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10160932 2001-12-12
DE10160932.9 2001-12-12

Related Child Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/011773 Continuation-In-Part WO2003040796A1 (fr) 2001-11-09 2002-10-22 Miroir inclinable

Publications (2)

Publication Number Publication Date
WO2003050586A2 true WO2003050586A2 (fr) 2003-06-19
WO2003050586A3 WO2003050586A3 (fr) 2003-12-18

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ID=7708871

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PCT/EP2002/012792 WO2003050586A2 (fr) 2001-11-09 2002-11-15 Facette de miroir et miroir a facettes

Country Status (2)

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AU (1) AU2002356606A1 (fr)
WO (1) WO2003050586A2 (fr)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004066010A1 (fr) * 2003-01-24 2004-08-05 Carl Zeiss Smt Ag Procede de fabrication d'un miroir a facettes
US7246909B2 (en) 2003-01-24 2007-07-24 Carl Zeiss Smt Ag Method for the production of a facetted mirror
DE102006031654A1 (de) * 2006-04-24 2007-10-25 Carl Zeiss Smt Ag Facettenspiegel mit einer Vielzahl von Spiegelsegmenten
EP1927892A1 (fr) 2006-11-28 2008-06-04 Carl Zeiss SMT AG Optique d'éclairage pour la microlithographie de projection EUV, installation d'exposition par projection microlithographique et procédé de fabrication d'un composant microstructuré
DE102007008448A1 (de) * 2007-02-19 2008-08-21 Carl Zeiss Smt Ag Verfahren zur Herstellung von Spiegelfacetten für einen Facettenspiegel
US8228485B2 (en) 2005-11-29 2012-07-24 Carl Zeiss Smt Gmbh Projection illumination system
DE102012202047A1 (de) * 2012-02-10 2013-01-17 Carl Zeiss Smt Gmbh Zerstörungsfreies stoffschlüssiges Verbinden von Komponenten zur Herstellung von optischen Elementen
DE102012223754A1 (de) * 2012-12-19 2014-05-15 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur automatisierten Montage von Facettenspiegeln und entsprechend hergestellte Facettenspiegel
DE102013212363A1 (de) * 2013-06-27 2014-07-31 Carl Zeiss Smt Gmbh Facettenspiegel, insbesondere für die EUV-Projektionslithografie
DE102013203035A1 (de) * 2013-02-25 2014-08-28 Carl Zeiss Smt Gmbh Optisches modul
WO2019086198A1 (fr) * 2017-10-30 2019-05-09 Asml Holding N.V. Ensemble destiné à être utilisé pour la photolithographie de semi-conducteurs et son procédé de fabrication
WO2022214290A1 (fr) * 2021-04-08 2022-10-13 Carl Zeiss Smt Gmbh Procédé de production d'un miroir d'un appareil d'exposition par projection microlithographique

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Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004066010A1 (fr) * 2003-01-24 2004-08-05 Carl Zeiss Smt Ag Procede de fabrication d'un miroir a facettes
US7246909B2 (en) 2003-01-24 2007-07-24 Carl Zeiss Smt Ag Method for the production of a facetted mirror
US7802891B2 (en) 2003-01-24 2010-09-28 Carl Zeiss Smt Ag Faceted mirror apparatus
US8228485B2 (en) 2005-11-29 2012-07-24 Carl Zeiss Smt Gmbh Projection illumination system
DE102006031654A1 (de) * 2006-04-24 2007-10-25 Carl Zeiss Smt Ag Facettenspiegel mit einer Vielzahl von Spiegelsegmenten
EP1927892A1 (fr) 2006-11-28 2008-06-04 Carl Zeiss SMT AG Optique d'éclairage pour la microlithographie de projection EUV, installation d'exposition par projection microlithographique et procédé de fabrication d'un composant microstructuré
DE102007008448A1 (de) * 2007-02-19 2008-08-21 Carl Zeiss Smt Ag Verfahren zur Herstellung von Spiegelfacetten für einen Facettenspiegel
WO2008101656A3 (fr) * 2007-02-19 2009-03-12 Zeiss Carl Smt Ag Procédé de production de miroirs à facettes et appareil d'exposition par projection
DE102012202047A1 (de) * 2012-02-10 2013-01-17 Carl Zeiss Smt Gmbh Zerstörungsfreies stoffschlüssiges Verbinden von Komponenten zur Herstellung von optischen Elementen
DE102012223754A1 (de) * 2012-12-19 2014-05-15 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur automatisierten Montage von Facettenspiegeln und entsprechend hergestellte Facettenspiegel
DE102013203035A1 (de) * 2013-02-25 2014-08-28 Carl Zeiss Smt Gmbh Optisches modul
US9599788B2 (en) 2013-02-25 2017-03-21 Carl Zeiss Smt Gmbh Optical module
DE102013212363A1 (de) * 2013-06-27 2014-07-31 Carl Zeiss Smt Gmbh Facettenspiegel, insbesondere für die EUV-Projektionslithografie
WO2019086198A1 (fr) * 2017-10-30 2019-05-09 Asml Holding N.V. Ensemble destiné à être utilisé pour la photolithographie de semi-conducteurs et son procédé de fabrication
CN111295623A (zh) * 2017-10-30 2020-06-16 Asml控股股份有限公司 用于半导体光刻术的组件及其制造方法
TWI704424B (zh) 2017-10-30 2020-09-11 荷蘭商Ａｓｍｌ控股公司 光學總成
US11415893B2 (en) 2017-10-30 2022-08-16 Asml Holding N. V. Assembly for use in semiconductor photolithography and method of manufacturing same
WO2022214290A1 (fr) * 2021-04-08 2022-10-13 Carl Zeiss Smt Gmbh Procédé de production d'un miroir d'un appareil d'exposition par projection microlithographique

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