AU2002356606A1 - Mirror facet and facetted mirror - Google Patents
Mirror facet and facetted mirrorInfo
- Publication number
- AU2002356606A1 AU2002356606A1 AU2002356606A AU2002356606A AU2002356606A1 AU 2002356606 A1 AU2002356606 A1 AU 2002356606A1 AU 2002356606 A AU2002356606 A AU 2002356606A AU 2002356606 A AU2002356606 A AU 2002356606A AU 2002356606 A1 AU2002356606 A1 AU 2002356606A1
- Authority
- AU
- Australia
- Prior art keywords
- mirror
- facetted
- facet
- mirror facet
- facetted mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/1821—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors for rotating or oscillating mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
- G02B7/1824—Manual alignment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/198—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the mirror relative to its support
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10160932 | 2001-12-12 | ||
DE10160932.9 | 2001-12-12 | ||
PCT/EP2002/012792 WO2003050586A2 (en) | 2001-12-12 | 2002-11-15 | Mirror facet and facetted mirror |
Publications (2)
Publication Number | Publication Date |
---|---|
AU2002356606A8 AU2002356606A8 (en) | 2003-06-23 |
AU2002356606A1 true AU2002356606A1 (en) | 2003-06-23 |
Family
ID=7708871
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002356606A Abandoned AU2002356606A1 (en) | 2001-12-12 | 2002-11-15 | Mirror facet and facetted mirror |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU2002356606A1 (en) |
WO (1) | WO2003050586A2 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10302664A1 (en) * | 2003-01-24 | 2004-07-29 | Carl Zeiss Smt Ag | Facetted mirror and holder and production process for a microlithographic projection unit in extreme ultraviolet determines and corrects deviations in mounting |
US7246909B2 (en) | 2003-01-24 | 2007-07-24 | Carl Zeiss Smt Ag | Method for the production of a facetted mirror |
DE102005056914A1 (en) | 2005-11-29 | 2007-05-31 | Carl Zeiss Smt Ag | Projection illumination system for use with production of e.g. integrated circuit, has interferometer arrangement examining optical components by measuring radiation that strikes on optical surface at specific angle of incidence |
DE102006031654A1 (en) * | 2006-04-24 | 2007-10-25 | Carl Zeiss Smt Ag | Facet mirror e.g. field facet mirror, for projection illumination system, has mirror segments provided with reflective surfaces, arranged on mirror carrier, and formed with individually formed angle of inclination in two different planes |
DE102006056035A1 (en) | 2006-11-28 | 2008-05-29 | Carl Zeiss Smt Ag | Illumination optics for EUV projection microlithography, illumination system with such illumination optics, projection exposure apparatus with such an illumination system, method for producing a microstructured component and microstructured component produced by the method |
DE102007008448A1 (en) * | 2007-02-19 | 2008-08-21 | Carl Zeiss Smt Ag | Method of producing mirror facets for a facet mirror |
DE102012202047A1 (en) * | 2012-02-10 | 2013-01-17 | Carl Zeiss Smt Gmbh | Method for manufacturing e.g. facet mirror, for extreme UV projection exposure system for microlithography, involves pressing optical functional body by applying pneumatic pressure on base body during reaction of reactive multi-layers |
DE102012223754A1 (en) * | 2012-12-19 | 2014-05-15 | Carl Zeiss Smt Gmbh | Method for manufacturing facet mirror for projection exposure system, involves arranging facet mirror elements on facet mirror base by robot, where each facet mirror element is provided with unique identification code |
DE102013203035A1 (en) * | 2013-02-25 | 2014-08-28 | Carl Zeiss Smt Gmbh | OPTICAL MODULE |
DE102013212363A1 (en) * | 2013-06-27 | 2014-07-31 | Carl Zeiss Smt Gmbh | Facet mirror for illumination optics of optical system of lighting system in projection exposure system for EUV projection lithography at lighting field, has facet main assembly plane arranged in facet mirror surfaces of reflecting facets |
CN111295623B (en) * | 2017-10-30 | 2022-05-24 | Asml控股股份有限公司 | Assembly for semiconductor lithography and method of manufacturing the same |
DE102021203475A1 (en) * | 2021-04-08 | 2022-10-13 | Carl Zeiss Smt Gmbh | Process for producing a mirror of a projection exposure system for microlithography |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6254210A (en) * | 1985-09-03 | 1987-03-09 | Canon Inc | Angle adjusting device |
JPH07199038A (en) * | 1994-01-10 | 1995-08-04 | Sumitomo Heavy Ind Ltd | Flapping adjusting device for concave mirror |
JPH0996757A (en) * | 1995-10-02 | 1997-04-08 | Olympus Optical Co Ltd | Optical path deflection device |
DE29617111U1 (en) * | 1996-10-01 | 1996-12-05 | O'Hara-Smith, Stephen C., Celbridge, Co. Kildare | Adjustable reflector |
EP0916984A1 (en) * | 1997-11-15 | 1999-05-19 | Canon Kabushiki Kaisha | Light deflection device and array thereof |
JP2000167683A (en) * | 1998-12-03 | 2000-06-20 | Mitsubishi Electric Corp | Device for adjusting optical path by reflection mirror |
-
2002
- 2002-11-15 AU AU2002356606A patent/AU2002356606A1/en not_active Abandoned
- 2002-11-15 WO PCT/EP2002/012792 patent/WO2003050586A2/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
AU2002356606A8 (en) | 2003-06-23 |
WO2003050586A2 (en) | 2003-06-19 |
WO2003050586A3 (en) | 2003-12-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |