WO2003010359A1 - Mecanisme d'elimination de corps etrangers, equipement de traitement en coulee et procede d'elimination de corps etrangers - Google Patents

Mecanisme d'elimination de corps etrangers, equipement de traitement en coulee et procede d'elimination de corps etrangers Download PDF

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Publication number
WO2003010359A1
WO2003010359A1 PCT/JP2002/007475 JP0207475W WO03010359A1 WO 2003010359 A1 WO2003010359 A1 WO 2003010359A1 JP 0207475 W JP0207475 W JP 0207475W WO 03010359 A1 WO03010359 A1 WO 03010359A1
Authority
WO
WIPO (PCT)
Prior art keywords
foreign matter
matter removing
processing equipment
partition plate
fluid flow
Prior art date
Application number
PCT/JP2002/007475
Other languages
English (en)
French (fr)
Inventor
Akio Shimoyama
Kazushi Kodama
Original Assignee
Sharp Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kabushiki Kaisha filed Critical Sharp Kabushiki Kaisha
Priority to KR1020047000790A priority Critical patent/KR100593492B1/ko
Priority to US10/484,631 priority patent/US7364664B2/en
Publication of WO2003010359A1 publication Critical patent/WO2003010359A1/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1617—Purification and regeneration of coating baths
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
PCT/JP2002/007475 2001-07-25 2002-07-24 Mecanisme d'elimination de corps etrangers, equipement de traitement en coulee et procede d'elimination de corps etrangers WO2003010359A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020047000790A KR100593492B1 (ko) 2001-07-25 2002-07-24 이물질 제거 기구, 액류처리 장치 및 이물질 제거 방법
US10/484,631 US7364664B2 (en) 2001-07-25 2002-07-24 Foreign matter removing mechanism, fluid flow processing equipment, and foreign matter removing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001-225126 2001-07-25
JP2001225126A JP4024497B2 (ja) 2001-07-25 2001-07-25 異物除去機構，液流処理装置および異物除去方法

Publications (1)

Publication Number Publication Date
WO2003010359A1 true WO2003010359A1 (fr) 2003-02-06

Family

ID=19058170

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/007475 WO2003010359A1 (fr) 2001-07-25 2002-07-24 Mecanisme d'elimination de corps etrangers, equipement de traitement en coulee et procede d'elimination de corps etrangers

Country Status (6)

Country Link
US (1) US7364664B2 (ja)
JP (1) JP4024497B2 (ja)
KR (1) KR100593492B1 (ja)
CN (1) CN100482865C (ja)
TW (1) TWI238859B (ja)
WO (1) WO2003010359A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7364664B2 (en) * 2001-07-25 2008-04-29 Sharp Kabushiki Kaisha Foreign matter removing mechanism, fluid flow processing equipment, and foreign matter removing method

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KR100830237B1 (ko) * 2007-02-28 2008-05-16 주식회사 테라세미콘 대면적 기판 처리 시스템의 서셉터 구조물
CN101302623B (zh) * 2008-06-09 2013-08-14 无锡市星亿涂装环保设备有限公司 一种电镀生产设备中塑料镀槽
JP2010274255A (ja) 2008-12-17 2010-12-09 Canon Inc 液体貯留容器、塗布液体供給システムおよびインクジェット記録装置
CN101962780B (zh) * 2010-09-26 2012-06-27 西安煤航印刷材料有限责任公司 一种用于ps版连续化生产的溶液槽及其脱脂方法
JP6117462B2 (ja) * 2011-07-04 2017-04-19 帝人株式会社 ポリエステル製造用触媒の製造方法
KR101114887B1 (ko) * 2011-10-11 2012-03-06 주식회사 삼원알텍 금속의 아노다이징 처리과정에서 발생되는 금속성 불순물 제거용 여과장치
CN104342722A (zh) * 2013-07-31 2015-02-11 南昌欧菲光科技有限公司 电铸设备
CN107385499A (zh) * 2017-08-03 2017-11-24 合肥锦和信息技术有限公司 一种硬铬轴用电镀槽装置
KR102050144B1 (ko) * 2017-12-29 2020-01-22 최경주 무전해도금 시스템
CN110448941B (zh) * 2019-05-27 2024-03-12 宁波国谱环保科技有限公司 一种原位微生物净化装置
CN112941600A (zh) * 2021-01-25 2021-06-11 沛县卓凡科技服务中心 一种精密仪器电镀设备
CN112941604A (zh) * 2021-01-25 2021-06-11 沛县卓凡科技服务中心 一种精密仪器电镀方法
CN113355719B (zh) * 2021-06-11 2024-03-01 利辛县富亚纱网有限公司 一种纱网电镀用翻转装置及其使用方法
CN113463167A (zh) * 2021-06-21 2021-10-01 江苏澳光电子有限公司 一种启闭式电镀液重置机构及其电镀液重置方法
CN115386891B (zh) * 2022-09-06 2023-06-13 道县三湘源电子科技有限公司 一种电子产品加工用工件酸洗装置
CN117265622B (zh) * 2023-11-23 2024-01-30 宁波甬禾电子有限公司 一种手动压板模镀银设备

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7364664B2 (en) * 2001-07-25 2008-04-29 Sharp Kabushiki Kaisha Foreign matter removing mechanism, fluid flow processing equipment, and foreign matter removing method

Also Published As

Publication number Publication date
US20040232091A1 (en) 2004-11-25
TWI238859B (en) 2005-09-01
JP2003034900A (ja) 2003-02-07
KR100593492B1 (ko) 2006-06-30
US7364664B2 (en) 2008-04-29
KR20040019337A (ko) 2004-03-05
CN100482865C (zh) 2009-04-29
CN1558964A (zh) 2004-12-29
JP4024497B2 (ja) 2007-12-19

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