WO2002084719A1 - Dispositif et procede d'exposition a un faisceau d'electrons - Google Patents
Dispositif et procede d'exposition a un faisceau d'electrons Download PDFInfo
- Publication number
- WO2002084719A1 WO2002084719A1 PCT/JP2002/002530 JP0202530W WO02084719A1 WO 2002084719 A1 WO2002084719 A1 WO 2002084719A1 JP 0202530 W JP0202530 W JP 0202530W WO 02084719 A1 WO02084719 A1 WO 02084719A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electron beam
- shot
- exposure region
- basis
- partial exposure
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001-109838 | 2001-04-09 | ||
JP2001109838A JP4251784B2 (ja) | 2001-04-09 | 2001-04-09 | 電子ビーム露光装置、照射位置算出方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2002084719A1 true WO2002084719A1 (fr) | 2002-10-24 |
Family
ID=18961723
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2002/002530 WO2002084719A1 (fr) | 2001-04-09 | 2002-03-18 | Dispositif et procede d'exposition a un faisceau d'electrons |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4251784B2 (ja) |
TW (1) | TW541590B (ja) |
WO (1) | WO2002084719A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10079206B2 (en) | 2016-10-27 | 2018-09-18 | Mapper Lithography Ip B.V. | Fabricating unique chips using a charged particle multi-beamlet lithography system |
US10522472B2 (en) | 2016-09-08 | 2019-12-31 | Asml Netherlands B.V. | Secure chips with serial numbers |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4434573B2 (ja) | 2002-11-29 | 2010-03-17 | 株式会社東芝 | ライセンス移動装置及びプログラム |
JP6147528B2 (ja) * | 2012-06-01 | 2017-06-14 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム描画方法及びマルチ荷電粒子ビーム描画装置 |
JP6215061B2 (ja) * | 2014-01-14 | 2017-10-18 | 株式会社アドバンテスト | 電子ビーム露光装置 |
JP2017063101A (ja) * | 2015-09-24 | 2017-03-30 | 株式会社アドバンテスト | 露光装置および露光方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4531191A (en) * | 1980-12-26 | 1985-07-23 | Tokyo Shibaura Denki Kabushiki Kaisha | Electron beam pattern generation system |
EP0220668A2 (en) * | 1985-10-25 | 1987-05-06 | Hitachi, Ltd. | Charged particle beam lithography system |
JPS6420619A (en) * | 1987-07-15 | 1989-01-24 | Toshiba Corp | Electron beam aligner |
JPH0529202A (ja) * | 1991-07-23 | 1993-02-05 | Hitachi Ltd | 電子線描画データ作成装置、及び電子線描画システム |
US6047116A (en) * | 1997-03-18 | 2000-04-04 | Kabushiki Kaisha Toshiba | Method for generating exposure data for lithographic apparatus |
US6057907A (en) * | 1995-09-07 | 2000-05-02 | Fujitsu Limited | Method of and system for exposing pattern on object by charged particle beam |
-
2001
- 2001-04-09 JP JP2001109838A patent/JP4251784B2/ja not_active Expired - Fee Related
-
2002
- 2002-03-18 WO PCT/JP2002/002530 patent/WO2002084719A1/ja unknown
- 2002-03-20 TW TW91105272A patent/TW541590B/zh active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4531191A (en) * | 1980-12-26 | 1985-07-23 | Tokyo Shibaura Denki Kabushiki Kaisha | Electron beam pattern generation system |
EP0220668A2 (en) * | 1985-10-25 | 1987-05-06 | Hitachi, Ltd. | Charged particle beam lithography system |
JPS6420619A (en) * | 1987-07-15 | 1989-01-24 | Toshiba Corp | Electron beam aligner |
JPH0529202A (ja) * | 1991-07-23 | 1993-02-05 | Hitachi Ltd | 電子線描画データ作成装置、及び電子線描画システム |
US6057907A (en) * | 1995-09-07 | 2000-05-02 | Fujitsu Limited | Method of and system for exposing pattern on object by charged particle beam |
US6047116A (en) * | 1997-03-18 | 2000-04-04 | Kabushiki Kaisha Toshiba | Method for generating exposure data for lithographic apparatus |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10522472B2 (en) | 2016-09-08 | 2019-12-31 | Asml Netherlands B.V. | Secure chips with serial numbers |
US10714427B2 (en) | 2016-09-08 | 2020-07-14 | Asml Netherlands B.V. | Secure chips with serial numbers |
US11004800B2 (en) | 2016-09-08 | 2021-05-11 | Asml Netherlands B.V. | Secure chips with serial numbers |
US11688694B2 (en) | 2016-09-08 | 2023-06-27 | Asml Netherlands B.V. | Secure chips with serial numbers |
US10079206B2 (en) | 2016-10-27 | 2018-09-18 | Mapper Lithography Ip B.V. | Fabricating unique chips using a charged particle multi-beamlet lithography system |
US10418324B2 (en) | 2016-10-27 | 2019-09-17 | Asml Netherlands B.V. | Fabricating unique chips using a charged particle multi-beamlet lithography system |
US10600733B2 (en) | 2016-10-27 | 2020-03-24 | Asml Netherlands B.V. | Fabricating unique chips using a charged particle multi-beamlet lithography system |
US11152302B2 (en) | 2016-10-27 | 2021-10-19 | Asml Netherlands B.V. | Fabricating unique chips using a charged particle multi-beamlet lithography system |
Also Published As
Publication number | Publication date |
---|---|
JP2002305141A (ja) | 2002-10-18 |
JP4251784B2 (ja) | 2009-04-08 |
TW541590B (en) | 2003-07-11 |
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