WO2002058095A1 - Plasma display panel and its manufacturing method - Google Patents
Plasma display panel and its manufacturing method Download PDFInfo
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- WO2002058095A1 WO2002058095A1 PCT/JP2002/000170 JP0200170W WO02058095A1 WO 2002058095 A1 WO2002058095 A1 WO 2002058095A1 JP 0200170 W JP0200170 W JP 0200170W WO 02058095 A1 WO02058095 A1 WO 02058095A1
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- phosphor
- plasma display
- display panel
- film
- phosphor film
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/10—AC-PDPs with at least one main electrode being out of contact with the plasma
- H01J11/12—AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/42—Fluorescent layers
Definitions
- Plasma display panel and method of manufacturing the same
- the present invention relates to a plasma display panel and a method for manufacturing the same.
- Plasma display panels can be broadly divided into direct current (DC) and alternating current (AC) types.
- DC direct current
- AC alternating current
- the AC type which is suitable for upsizing, is the mainstream.
- FIG. 16 is a perspective view (partially sectional view) showing an example of an AC type PDP.
- a plurality of display electrodes 62 are arranged in a stripe shape.
- a dielectric layer 63 is formed so as to cover the entire surface. Further, a dielectric protection film 64 is formed on the surface of the dielectric layer 63.
- a plurality of address electrodes 72 are arranged in a stripe shape.
- the arrangement direction of the address electrode 72 is a direction intersecting the display electrode 62 when the front glass substrate 61 and the rear glass substrate 71 are arranged to face each other.
- a dielectric layer 73 is formed so as to cover the entire surface. Further, on the surface of the dielectric layer 73, a plurality of partition walls 75 are protruded in parallel with the address electrodes 72 and toward the front glass substrate 61.
- a phosphor layer 76 is provided on a side surface of a groove formed by the adjacent partition wall 75, the partition wall 75, and the dielectric layer 73.
- a red phosphor layer 76R, a green phosphor layer 76G, and a blue phosphor layer 76B are provided for each groove portion partitioned by the partition wall 75.
- the phosphor layer 76 is a layer composed of a group of phosphor particles formed by a thick film forming method such as a screen printing method, a jet-jet method, or a photoresist film method.
- the AC PDP having the above structure basically has the same light emission principle as a fluorescent lamp, and the ultraviolet light emitted from the discharge gas accompanying the discharge inside the discharge space 77 excites the phosphor layer 76. It emits light and is converted into visible light.
- the phosphor layers 76 R, 76 G, and 76 B of the respective colors used in the AC type PDP use phosphor materials having different conversion efficiencies into visible light. Therefore, when displaying an image on the panel, the color balance is generally adjusted by adjusting the luminance of each of the phosphor layers 76R, 76G, and 76B. Specifically, the luminance of the other phosphor layers is reduced at a ratio determined for each color, based on the phosphor layer of the color with the lowest luminance.
- the cell size in PDPs is also required.
- the radiation efficiency of ultraviolet rays decreases as the volume of the discharge space 77 decreases. It is necessary to improve the luminous efficiency of the device.
- a number of cells 64 0 X 480 is 43mmx l. 2 9 mm, 1 cell equivalent Rino area 0.
- cell pitch is 40-inch class .0. In 5 5 mm 2 luminance of about It is 250 cd / m 2 (for example, Functional Materials February 1996 V 0 1.16, No. 2, page 7).
- the number of pixels is 1920 x 1125, and the cell pitch in the 42-inch class is 0.15 mm x 0.48 mm, which is The area is 0.02 2m m 2 .
- the present invention has been made to solve the above problems, and provides a plasma display panel which can be operated with high luminous efficiency even when having a fine cell structure, and a method for manufacturing the same. Its purpose is to:
- the present invention provides a PDP in which a plurality of light emitting cells are formed in a gap between a front panel and a rear panel which are arranged to face each other. It is characterized by having a phosphor film.
- the crystalline phosphor film is superior in the visible light conversion ratio to the phosphor layer composed of the phosphor particle group, it can operate with high luminous efficiency.
- the region where the crystalline phosphor film is formed is desirably at least a portion corresponding to a light emitting cell in the front panel.
- a crystalline phosphor film composed of a thin-film crystal is formed at least in a part of the front panel corresponding to the light emitting cells, and therefore, a part of the ultraviolet light generated in the light emitting cells is reduced. Instead of being absorbed by the front panel, it is converted to visible light and emitted outside the panel.
- the phosphor layer composed of the conventional phosphor particles has a low visible light transmittance
- forming the phosphor layer on the front panel side blocks much of the visible light generated in the light emitting cell.
- the crystalline phosphor film is formed of a thin film crystal having a high visible light transmittance, even if it is formed on the front panel side, the visible light generated in the light emitting cell is hardly blocked. . Therefore, the above PDP has excellent luminous efficiency as compared with the conventional PDP, and is suitable for employing a fine cell structure.
- the thin film crystal referred to here is a thin film of a single solid solution, whose crystal lattice image can be confirmed by transmission electron microscope (TEM) and measured by X-ray diffraction method. Refers to a crystalline thin film from which a sharp peak can be obtained.
- TEM transmission electron microscope
- the visible light transmittance of the crystalline phosphor film is at least 85%. This is because even if a crystalline phosphor film is formed on the front panel, if the visible light transmittance is less than 85%, the visible light blocked by the crystalline phosphor film becomes large. This is because the overall luminous efficiency of the panel is reduced.
- the visible light transmittance refers to the visible light transmittance of the phosphor film formed of the thin film crystal formed on the front panel. Specifically, it is the transmittance at the emission wavelength of the phosphor itself. In addition, it refers to the transmittance of the phosphor itself, and does not include the transmittance of other substrates or dielectric layers.
- the present invention relates to a method for forming a crystalline phosphor film on one or two light emitting cell groups of red, green, and blue light emitting cell groups, specifically, a blue light emitting cell group and a green light emitting cell group.
- a sufficient effect can be obtained if it is formed in at least one of the corresponding portions.
- it is effective to form a crystalline phosphor film at a corresponding portion of the blue light emitting cell group.
- the effect can also be obtained by selecting and forming a light emitting cell group of a specific color, or by limiting the region to be formed according to the luminance of the light emitting cell group.
- the phosphor material used to form the crystalline phosphor film and the phosphor material used to form the phosphor layer composed of the phosphor particle group may be the same or different materials. May be.
- display electrode The inter-discharge occurs near the surface of the front panel, and is within a few meters. Here, a large amount of ionized gas is present, and the front panel surface is subject to many bombardment of electrons and ions.
- a phosphor layer is formed only on the back panel away from the discharge region, and therefore, an ultraviolet-excited phosphor material has been used.
- the portion of the front panel on which the crystalline phosphor film is formed may be on the surface of the protective film or may be between the dielectric layer and the protective film.
- the crystalline phosphor film is formed on the surface of the protective film, it is desirable to provide a notch in a corresponding portion of the display electrode.
- the property of the protective film having a high secondary electron emission coefficient can be effectively used in the discharge during panel driving.
- the notch is formed in the phosphor film provided on the surface of the protective film.
- the discharge voltage is slightly increased because the discharge is hindered by the phosphor film. To prevent this, it is effective to form the phosphor film formed on the front panel between the dielectric layer and the protective film. In this way, the discharge is not hindered and the surface area of the phosphor film can be increased, so that a PDP with higher luminance can be obtained.
- the crystalline phosphor film does not directly face the discharge space, it is necessary to use the same ultraviolet-excited phosphor material as before.
- At least one of the back panel and the partition may be provided with a phosphor layer composed of phosphor particles.
- the PDP has an excellent luminous efficiency as compared with a conventional PDP. If the phosphor layer is not formed on the back panel, use the dielectric layer on the back panel. It is desirable to form a region having a function of reflecting visible light to the front panel side from the viewpoint of improving luminous efficiency.
- the crystalline phosphor film and the phosphor layer composed of the phosphor particle group are formed of phosphor materials having different compositions.
- the crystalline phosphor film is formed from a collision excitation type phosphor material.
- the number of steps in manufacturing can be reduced, and the cost is excellent.
- the back panel is formed by forming a plurality of electrodes and a dielectric layer on a back substrate, and the dielectric layer is a phosphor layer comprising a crystalline phosphor film or a phosphor particle group therebetween. It may face the internal space of the light emitting cell without any of the above.
- the surface may face the inner space of the light emitting cell, or a phosphor layer made of a phosphor particle group may be formed on a portion of the partition wall corresponding to the light emitting cell.
- a phosphor film made of a thin film crystal may be formed.
- the back panel has a region having a visible light reflectance of at least 85% or more.
- the location where the region having the visible light reflectance in the rear panel is formed may be on the surface of the dielectric layer or may be within the layer.
- the PDP has an address electrode on the front panel and a display electrode on the back panel.
- the present invention relates to a PDP in which a plurality of light emitting cells are formed in a gap between a front panel and a rear panel which are arranged to face each other, wherein the rear panel has an electrode, and the rear panel has an electrode. And a crystal phosphor film made of a thin film crystal is provided through a region having a function of reflecting visible light to the front panel side.
- the crystalline phosphor film made of the thin film crystal is formed on the surface of the region having the function of reflecting visible light on the rear panel, the luminous efficiency is further improved.
- the area having the function of reflecting the visible light is used.
- the unevenness is provided on the side of the crystalline phosphor film to be formed, the effective surface area of the crystalline phosphor film can be increased, which is effective. It is preferable that the unevenness has, for example, a stepped surface and a structure having a plurality of protrusions.
- the effective surface area due to the unevenness is more preferably at least 5 times the area of the smooth surface.
- the present invention relates to a method of manufacturing a PDP having a phosphor film forming step of forming a phosphor film made of a thin film crystal on at least one of a front panel and a back panel. It is characterized in that a vacuum film forming process under a reduced pressure atmosphere is used for forming the film.
- a phosphor film composed of a thin-film crystal can be easily formed on at least one of the front panel and the rear panel, so that a PDP having a higher luminous efficiency than a conventional PDP can be manufactured. You can do it.
- Specific examples of the vacuum film forming process include a vapor deposition method typified by a vacuum evaporation method, a sputtering method, and a CVD method. It is desirable that oxygen is injected into the reduced-pressure atmosphere in the vacuum film-forming process or that the material has a reducing property, depending on the material composition of the phosphor to be formed.
- the step of forming the front panel includes the step of forming the front panel, the step of forming the front panel includes the substep of forming a protective film, and the substep of forming the protective film and the phosphor film forming step.
- the process be performed continuously without intervening other processes between the steps.
- both films can be formed integrally without lowering the temperature of the substrate, the crystallinity of the film on the outermost surface side facing the discharge space can be improved.
- the phosphor film forming step it is desirable to heat a region of the substrate where the phosphor film is to be formed. This is the essence of the vacuum deposition process. This is because, if the degree of hum of the substrate is increased by heating, the crystallinity of the thin film crystal of the phosphor film can be increased.
- the present invention relates to a method for manufacturing a PDP, comprising: a first step of forming a first phosphor layer on a front panel; and a second step of forming a second phosphor layer on a back panel.
- One of the first step and the second step is a step of forming a crystalline phosphor film composed of a thin film crystal, and the other step is a step of forming a phosphor layer composed of a phosphor particle group. It is characterized by being a step.
- the present invention also includes a PDP manufactured using the above-described manufacturing method and a PDP display device including a PDP having a driving circuit for driving the PDP.
- FIG. 1 is a perspective view (partially sectional view) showing an AC-type PDP according to the first embodiment.
- FIG. 2 is a sectional view taken along the line X--X in FIG.
- FIG. 3 is a configuration diagram showing a PDP display device including the PDP of FIG. 1 and a drive circuit.
- FIG. 4 is a configuration diagram showing an EB vapor deposition apparatus for forming a first phosphor film.
- FIG. 5 is a configuration diagram showing the electron gun in FIG.
- FIG. 6 is a graph showing the relationship between substrate temperature and diffraction intensity by X-ray diffraction.
- Figure 7 Shows the path of ultraviolet light incident on the phosphor layer composed of phosphor particles It is a schematic diagram.
- FIG. 8 is a schematic diagram showing the path of ultraviolet light incident on the phosphor film of the thin film crystal.
- FIG. 9 is a schematic view showing a sample for phosphor evaluation.
- FIG. 10 is a graph showing the relationship between the thickness of a phosphor film made of a thin film crystal and luminance.
- FIG. 11 is a sectional view taken along the line Y--Y in FIG.
- Fig. 12 Relationship between film thickness and relative luminance.
- FIG. 13 is a cross-sectional view showing a part of an AC-type PDP according to Embodiment 2.
- FIG. 14 is a cross-sectional view showing a front panel in which a first phosphor film is provided between a dielectric layer and a dielectric protection film.
- FIG. 15 is a sectional view showing a part of the AC PDP according to the third embodiment.
- Fig. 16 is a perspective view (partial sectional view) showing a conventional AC type PDP. BEST MODE FOR CARRYING OUT THE INVENTION
- FIG. 1 is a diagram showing a part of the AC PDP 1 extracted.
- a front panel 10 and a rear panel 20 are arranged to face each other with a space therebetween, and the space between the panels is divided into a plurality of discharge spaces 40 by partition walls 30. It has a partitioned structure.
- the front panel 10 has a plurality of display electrodes 12 arranged in a stripe shape on one main surface (the lower side in the figure) of the front glass substrate 11, and a first dielectric layer 13 on the surface. And a dielectric protection film 14 which is sequentially laminated.
- the rear panel 20 has a plurality of address electrodes 22 arranged in a stripe shape on the surface of the rear glass substrate 21 on the side facing the front panel 10, and a second electrode is provided so as to cover the surface.
- the dielectric layer 23 is formed.
- the partition wall 30 is actually provided so as to protrude above the second dielectric layer 23 of the rear panel 20, and is arranged in parallel with the address electrode 22 and adjacent to the address electrode 22. It is arranged in an area between the address electrode 22 and the address electrode 22.
- the front panel 10 and the rear panel 20 are arranged so that the display electrode 12 and the address electrode 22 provided respectively intersect and face each other, and the periphery of the panel is sealed with an airtight seal layer. Have been.
- the discharge space 40 is filled with a discharge gas (eg, a Ne—Xe-based gas, a He—Xe-based gas).
- a discharge gas eg, a Ne—Xe-based gas, a He—Xe-based gas.
- each portion where the display electrode 12 and the address electrode 22 intersect between the two glass substrates 11 and 21 corresponds to a light emitting cell.
- a first phosphor film 31 is formed on a corresponding portion of the light emitting cell on the surface of the dielectric protection film 14, and a first phosphor film 31 is formed on the surface of the partition wall 30 and the second dielectric layer 23.
- the second phosphor layer 32 is formed.
- the second phosphor layer 32 is a phosphor layer formed by using a screen printing method, and is a thick film composed of a single crystal powder phosphor particle group. It is a phosphor layer. This layer has a thickness of about 10 layers of phosphor particles.
- the first phosphor film 31 formed on the front panel 10 is a phosphor film made of a thin film crystal formed by using an electron beam (hereinafter referred to as “EB”) vapor deposition method described later. is there.
- a thin film may include one composed of a group of amorphous particles.
- TEM transmission electron microscope
- X-ray diffraction A crystalline thin film consisting of a single solid solution, which gives a sharp peak (peak with a half-value width of several degrees or less by the -2 method) measured by the method.
- the thickness of the first phosphor film 31 is such that when the first phosphor film 31 is irradiated with ultraviolet light, sufficient emission luminance can be obtained and visible light transmittance is ensured. It is set to the possible range. Specifically, the film thickness is in the range of 1 to 6 m, and preferably around 2 m. This will be explained later.
- composition of the phosphor material constituting the second phosphor layer 32 is an ultraviolet excitation type as described below.
- the phosphor material constituting the first phosphor film 31 is of a collision excitation type, for example, as shown below.
- FIG. 2 is a cross-sectional view taken along the line XX in FIG.
- the first phosphor film 31 is not formed on the entire surface between the partition walls 30 on the surface of the dielectric protection film 14. In a region corresponding to the display electrode 12 on the surface of the dielectric protective film 14, the first phosphor film 31 is cut out.
- the cutout portion (notch portion 31a) is provided to expose the dielectric protection film 14 in the region where the display electrode 12 is formed to the discharge space 40. In the discharge during tunnel driving, the property of the dielectric protective film 14 having a high secondary electron emission coefficient can be effectively used.
- the AC type PDP 1 is connected with drivers 141, 142, 143 and a drive circuit 140.
- scanning electrode 12a half of every other electrode (hereinafter referred to as “scanning electrode 12a”) are connected to the scan driver 141. I have.
- the remaining display electrodes 1 2 not connected to the scan driver 141 (hereinafter, referred to as “sustain electrodes 12 b”) are connected to the sustain driver 142.
- All the address electrodes 22 are connected to the data dryno 143.
- the drive circuit 140 is connected to the three drivers 141, 142, and 143.
- a PDP display device including the AC type PDP 1 is configured.
- a voltage is applied between the scanning electrode 12a corresponding to the cell to be turned on and the address electrode 22, thereby causing an address discharge.
- a sustain discharge is generated by applying a pulse voltage between the scan electrode 12a and the sustain electrode 12b.
- Ultraviolet rays are emitted from the discharge gas with the discharge, and the emitted ultraviolet rays are converted into visible light by the first phosphor film 31 and the second phosphor layer 32. In this way, in the AC PDP 1, the cell is turned on, and an image is displayed.
- the display electrode 12 is formed by applying an electrode paste containing Ag on the main surface of the front glass substrate 11 using a screen printing method and sintering the paste.
- the formation pattern of the display electrodes 12 is a stripe shape parallel to each other.
- the first dielectric layer 13 is formed by screen printing a paste containing dielectric glass particles over the entire surface of the front glass substrate 11 on which the display electrodes 12 are formed. It is formed by coating and sintering. The thickness of the first dielectric layer 13 is about 20 ⁇ m.
- the dielectric protection film 14 is formed by covering the surface of the first dielectric layer 13 with a thin film of MgO using a sputtering method or the like.
- the first phosphor film 31 is formed by using the EB vapor deposition method, and a detailed forming method will be described later.
- the method of forming the address electrode 22 and the second dielectric layer 23 on the back panel 20 is basically the same as that of the front panel 10 described above.
- the partition wall 30 is formed by applying a glass paste for the partition wall on the surface of the second dielectric layer 23 by a screen printing method, and then firing it.
- Each phosphor paste having the above composition is applied by a screen printing method to a groove portion formed by the partition wall 30 and the second dielectric layer 23, and is fired to form the second phosphor layer. 32 are formed.
- the formation region of the second phosphor layer 32 is formed not only on the bottom surface of the groove, that is, on the surface of the second dielectric layer 23, but also on the wall surface of the partition wall 30.
- the front panel 10 and the rear panel 20 manufactured as described above are formed by applying sealing glass (frit glass) to a portion to be joined and calcining to form a sealing glass layer. Thereafter, the display electrodes 12 and the address electrodes 22 are overlapped so as to face each other at right angles, and both panels 10 and 20 are heated to soften the sealing glass layer, thereby performing sealing.
- sealing glass fluor glass
- a discharge gas is sealed at a predetermined pressure.
- the AC gas PDP 1 is completed by closing the discharge gas filling hole.
- a method for forming the first phosphor film 31, which is a characteristic part of the AC PDP 1, will be described with reference to FIGS.
- an EB vapor deposition apparatus as shown in FIG. 4 is used.
- the EB vapor deposition apparatus 90 emits a hearth 93 containing a vapor deposition raw material 92 and an electron beam 94 in a vacuum chamber 91 that evacuates the inside.
- a transport path for transporting the glass substrate 98 on which the first phosphor film 31 is to be formed is provided above these main components ⁇ , and is fixed in the direction of the arrow in the figure. It has a structure in which a thin-film phosphor is deposited on the lower surface of a glass substrate 98 passing at a high speed. Further, a heater (not shown) is attached above the transport path, so that the glass substrate 98 can be heated by this heat radiation.
- the electron gun 95 has a structure as shown in FIG.
- the electron gun 95 includes a filament 101 as a heat generation source, and a cathode 102 and an anode 103 as a pair of electrodes.
- the electron beam 94 is emitted from the heated filament 101, accelerated by the force source 102 and the anode 103, and emitted toward the focusing coil 96.
- an anti-adhesion plate 100 is provided in the apparatus so that the vapor 99 of the phosphor material 92 does not adhere to the devices in the transport path.
- the first phosphor film 31 is formed using the above-described vapor deposition apparatus 90 as follows.
- the phosphor material 92 having the above composition of the color to be formed is set on the heart 93.
- the phosphor material is previously processed into a pellet.
- the hearth 93 is irradiated with an electron beam 94, and the phosphor material 92 is heated to about 2000 ° C. and evaporated.
- the steam 99 rising from the hearth 93 rises above the apparatus, and the glass substrate 9 in the transport path 9 8. Apply to the exposed surface.
- a mask is provided in advance in a region where the first phosphor film 31 is not formed.
- the intensity of the electron beam 94 to be irradiated and the transport speed of the glass substrate 98 are set such that the growth rate of the first phosphor film 31 is about 2.0 (nm / s).
- the intensity of the electron beam 94 is set by the current value while keeping the voltage value between the force source 102 and the anode 103 constant.
- the first phosphor film 31 In forming the first phosphor film 31, an EB vapor deposition method is used, but a vapor phase growth method such as a vacuum vapor deposition method, a sputtering method, or a CVD method may be used. However, when forming the first phosphor film 31 on the surface of the dielectric protective film 14, the front panel 10 is not exposed to the air after the dielectric protective film 14 is formed. It is desirable to form a phosphor film while maintaining the above conditions. Furthermore, if the dielectric protective film 14 and the first phosphor film 31 are formed while maintaining the temperature of the glass substrate, the first phosphor film 31 having good crystallinity can be obtained. Can be formed.
- the reason why the collision excitation type phosphor material is used for forming the first phosphor film 31 is that the phosphor film is formed on the outermost surface of the front panel 10 near the discharge region as described above.
- the conventional phosphor emits light due to the characteristic of emitting light by the energy of the collision of electrons and ions. This is because it is more suitable than the excitation type phosphor material.
- an ultraviolet excitation type phosphor material may be used. 4-5. Substrate temperature and crystallinity of phosphor film
- FIG. 6 is a graph showing the relationship between the temperature of the glass substrate when forming the first phosphor film 31 and the peak intensity of the (111) orientation by X-ray diffraction.
- the diffraction intensity increases as the substrate temperature increases. This indicates that when the phosphor is formed, the higher the temperature of the substrate, the higher the crystallinity of the obtained phosphor film. Therefore, in order to form a phosphor film with high crystallinity, it is desirable to heat the glass substrate within a range that does not adversely affect the glass substrate and the components formed thereon. 5. Consideration on the first phosphor film 3 1
- FIG. 7 is a diagram showing a traveling path of ultraviolet light incident on the surface of a phosphor layer composed of a group of phosphor particles formed by using a thick film forming method.
- FIG. 4 is a diagram showing a traveling path of ultraviolet light incident on the surface of a phosphor film made of a thin film crystal.
- a dead layer is formed on the outermost surface of the phosphor particles.
- the efficiency of transmitting the energy to the emission center is low. Therefore, the conversion efficiency to visible light is low. Above all, ultraviolet light incident on the thick part of the dead layer hardly contributes to light emission.
- the first phosphor film 31 made of a thin film crystal although a dead layer may be formed in the initial growth layer, it is formed on the outermost surface of the film. It is hard to be done.
- the first phosphor film 31 made of a thin film crystal has a higher conversion efficiency to visible light than the second phosphor layer 32 made of the phosphor particle group. Further, the thin-film crystal is a single solid solution and is hardly scattered, and therefore has a very high visible light transmittance.
- FIG. 9 shows an evaluation sample prepared for examining the relationship between the thickness of the first phosphor film 31 and the emission luminance.
- FIG. 10 shows an excimer of 147 nm in this sample.
- 4 is a graph showing the results of measuring the emission luminance obtained when irradiating a lamp.
- the relative luminance referred to here is a relative value assuming that the emission luminance of a phosphor layer composed of a conventional phosphor particle group is 100.
- the sample used had a visible light reflecting layer 112 formed on the surface of a glass substrate 113, and a phosphor film 111 formed of a thin film crystal formed thereon. is there.
- the relative luminance of the phosphor film 111 increases in proportion to the film thickness up to a thickness of 2 m, but becomes saturated when the thickness is 2 or more.
- the relative luminance of the phosphor layer 111 in the saturated state is about 120, which indicates that the luminance is about 20% better than that of the phosphor layer composed of the phosphor particles.
- the thickness of the phosphor film 11 1 can be compatible with obtaining sufficient light emission luminance and securing visible light transmittance when the first phosphor film 31 is irradiated with ultraviolet light.
- Around 2 m is optimal.
- the visible light transmittance is as high as 97% when the film thickness is 2 m.
- the ultraviolet light emitted from the discharge gas travels in all directions of the discharge space 40.
- the arrow U 1 pointing toward the first phosphor film 31 and the arrow pointing to the second phosphor layer 3 2 The one that moves towards is indicated by the arrow U2.
- the arrow V 1 indicates visible light that is converted from the ultraviolet light of the arrow U 1 by the first phosphor film 31 and passes through the front panel 10, and the arrow V 2 indicates the second fluorescent light.
- the ultraviolet light indicated by the arrow U 2 is converted by the body layer 32 to show visible light passing through the front panel 10.
- the visible light indicated by the arrows V1 and V2 actually contributes to the luminous efficiency of the AC PDP1.
- the ultraviolet light indicated by arrow U1 is absorbed by the front panel without being converted into visible light by the phosphor layer.
- the ultraviolet light indicated by the arrow U1 is converted into visible light indicated by the arrow V1 by the first phosphor film 31 and then emitted to the outside of the panel.
- the first phosphor film 31 has a high visible light transmittance as described above, it is possible to efficiently emit the light emitted by the ultraviolet light of the arrow U2 as the arrow V2 to the outside, thereby achieving high luminous efficiency. Have.
- the AC type PDP 1 by forming the first phosphor film 31 on the front panel 10, the ultraviolet light generated by the discharge can be efficiently converted into visible light, and the converted visible light can be efficiently converted. Can be efficiently released to the outside. Therefore, the AC PDP 1 has higher luminous efficiency than the conventional AC PDP.
- FIG. 12 is a graph showing the relationship between the thickness of the first phosphor film 31 formed on the front panel and the relative luminance of the panel in the blue phosphor film.
- the relative luminance is a relative value when the luminance of a conventional AC PDP having a phosphor layer composed of phosphor particle groups only on the back panel is 100.
- the visible light transmittance of the front panel decreases as the film thickness increases.
- the visible light transmittance of about 97% at a film thickness of 2 m is about 97% at a film thickness of 6 m. Down to 85%.
- the relative luminance of the entire panel calculated from the visible light transmittance and the relative luminance of the first phosphor film is indicated by a circle in the figure.
- the relative luminance of the entire panel has a peak value when the film thickness is about 2 m, and gradually decreases as the film thickness increases.
- the relative luminance when the film thickness is 2 m is as follows.
- the visible light emission rate is the ratio of visible light that is actually emitted from the front panel to the outside of the visible light that can be converted from ultraviolet light.
- the AC type PDP 1 having the first phosphor film 31 with a thickness of 2 m on the front panel 10 has a visible light emission rate about 40% higher than that of the conventional AC type PDP.
- the luminous efficiency is also about 40% higher.
- the first phosphor film 31 is provided on the front panel 10 in all the red, green, and blue cells.
- the first phosphor film 3 is not necessarily provided for all the color cells. It is not necessary to form one.
- the AC type PDP 1 by providing the first phosphor film 31 on the front panel 10 side of the light emitting cell of a specific color, the luminance of the color is improved and the panel is displayed in white. The color temperature at the time can be increased.
- the first phosphor film 31 on the front panel may be generally formed only of a blue cell using a phosphor having a low visible light conversion rate.
- the present inventor confirmed that the color temperature of white when the light emitting cells of each color were turned on under the same conditions on the AC PDP was confirmed. Oh, it was 1000 OK. This is 6000 K in the conventional AC PDP, which was lit under the same conditions, but it is close to the optimal color temperature of 11,000 K as the panel characteristics, and it is possible to suppress the decrease in brightness due to color temperature correction. It became.
- the composition and characteristics of the phosphor used for the phosphor film of each color are taken into consideration so that the panel brightness and the overall color temperature become appropriate. It is necessary to set.
- FIG. 13 is a cross-sectional view of the AC type PDP 2 showing only a portion corresponding to one light emitting cell.
- the only phosphor film (layer) formed in the AC type PDP 2 is the first phosphor film 31 formed on the surface of the front panel 10. That is, no phosphor film (layer) is formed on the back panel 20 and the partition 30.
- the AC PDP 2 has the same structure as the AC PDP 1, and is manufactured using the same method.
- the first phosphor film 31 has the notch 31a in the same manner as the AC type PDP 1.
- the AC type PDP 2 can obtain sufficiently high luminance without forming a phosphor layer composed of a conventional phosphor particle group on the surface of the back panel 20 or the partition 30. This can be realized because, as described above, the phosphor film made of the thin film crystal has a higher luminous efficiency than the phosphor layer made of the phosphor particles.
- this AC type PDP 2 can manufacture a panel without applying or firing a phosphor on the rear panel 20 after the partition wall 30 is provided on the surface. It has an advantage in manufacturing cost.
- the first phosphor film 31 is formed on the outermost surface of the front panel 10, that is, on the surface of the dielectric protection film 14 facing the discharge space 40, as shown in FIG. As described above, the first phosphor film 31 may be provided between the first dielectric layer 13 and the dielectric protection film 14.
- the dielectric protective film 14 having excellent secondary electron emission characteristics is exposed to the discharge space 40, so that the first phosphor film 31 has a notch at a portion corresponding to the display electrode 12. The discharge is not hindered even if 31a is not formed.
- the visible light reflectance (the ratio of visible light reflected to the visible light input to the rear panel) is 85% or more.
- the AC type PDP 3 is similar to the AC type PDP 2 in that the first phosphor film 31 is formed only on the front panel 10. 0, an address electrode 22 and a second dielectric layer 23 are formed, and a display electrode 12, a first dielectric layer 13, and a dielectric protection film 14 are formed on a rear panel 20. .
- the address electrode 22 and the second dielectric layer 23 are formed of a material having high visible light transmittance so as not to hinder transmission of visible light. Specifically, a transparent electrode such as ITO (Indium Tin Oxide) or SnO 2 is used for the address electrode 22, and the second dielectric layer 23 mainly contains lead oxide. Lead glass is used.
- the address electrode 22 is formed in the short side direction of the panel, and a smaller current flows than the display electrode 12. Therefore, even if the electric resistance is large, the data driver 1 is not used. 43 The voltage drop at the end of the electrode opposite to the side connected to 3 is small. Therefore, even if the address electrode 22 is formed only of ITO, the address discharge is not substantially affected, and the first electrode formed on the surface of the second dielectric layer 23 is not affected. Since the phosphor film 31 does not have the display electrode 12 inside the front panel 10, the notch 31a as described above is not formed. That is, the first phosphor film 31 is formed over the entire area where visible light is transmitted.
- the display electrode 12 formed on the front panel 10 has a bus electrode made of a metal material provided on a transparent electrode in order to reduce electric resistance. As a result, part of the visible light generated in the light emitting cell was blocked.
- the AC type PDP 3 since the display electrode 12 is formed on the rear panel 20, visible light exiting from the front panel to the outside of the panel is not blocked by the display electrode 12. Therefore, the AC type PDP 3 is advantageous for improving brightness and luminous efficiency.
- the display electrode 12 and the dielectric protection film 14 are formed on a glass substrate different from the first phosphor film 31, the first phosphor film 31 There is no need to provide a notch, so a large surface area can be secured.
- the dielectric protection film 14 is formed so as to directly face the discharge space 40, the discharge characteristics are not sacrificed and the brightness is maintained. Is high. For example, in a 4-inch class NTSC panel, the display electrodes occupy nearly 70% of the total cell area.
- the AC type PD When the structure of P3 is adopted, the light emission luminance is about three times as large as that of the AC type PDPs 1 and 2 because there is no notch compared to the case where the display electrode is formed on the front panel. Will be.
- the first phosphor film 31 of the front panel 10 is formed between the first dielectric layer 13 and the dielectric protection film 14, and the cutout portion 31a is formed.
- the AC PDP according to the present embodiment is advantageous because the front panel 10 is not provided with an electrode made of a metal material that blocks visible light.
- the luminous efficiency of the entire panel can be improved, and high luminous brightness can be secured as described above.
- the rear panel 20 Neither the first phosphor film 31 nor the second phosphor layer 32 was formed on the surface of the substrate and on the surface of the partition wall 30. It is effective to form a phosphor. However, in the case where the first phosphor film 31 or the second phosphor layer 32 is formed on the back panel 20 in the third embodiment, it is desirable to form the notch 31a.
- the AC PDP 4 according to the fourth embodiment will be described.
- the difference between the AC PDP 4 and the conventional AC PDP is that the back panel, on which a phosphor layer composed of a group of phosphor particles is conventionally formed, is formed of a thin-film phosphor film.
- the area where the phosphor film having high luminous efficiency is formed is wider than the AC-type PDPs 2 and 3, so that the luminous efficiency of the panel is excellent.
- the effective surface area of the first phosphor film 31 can be increased. So effective.
- the visible light reflecting layer is the same as that of the second embodiment.
- the visible light reflectance (the ratio of the reflected visible light to the visible light input to the rear panel) is 85% 1 ⁇ higher.
- the unevenness can be made larger than the area of the smooth surface by, for example, making the surface of the visible light reflecting layer step-like or forming a plurality of protrusions.
- the AC PDP obtained by combining the rear panel 20 of the AC PDP 4 and the front panel 10 of the AC PDP 1 has further improved luminance and exhibits excellent panel characteristics.
- the formation location of the display electrode 12 is not limited to the front panel 10 alone, and may be formed on the rear panel 20 side as in the third embodiment.
- an AC-type PDP has been described as an example.
- similar effects can be obtained when the above-described structure is applied to not only the AC-type PDP but also the DC-type PDP. Can be done. Industrial applicability
- the PDP and the method of manufacturing the same according to the present invention are effective for realizing a display device such as a computer and a television, particularly, a display device with high detail and high brightness.
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02732189A EP1361593A4 (en) | 2001-01-17 | 2002-01-15 | PLASMA DISPLAY PANEL AND METHOD FOR THE PRODUCTION THEREOF |
KR1020037009357A KR100884152B1 (ko) | 2001-01-17 | 2002-01-15 | 플라즈마 디스플레이 패널 및 그 제조방법 |
US10/451,546 US7329991B2 (en) | 2001-01-17 | 2002-01-15 | Plasma display panel provided with thinned crystal phosphor material and its corresponding method of manufacturing |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001008478 | 2001-01-17 | ||
JP2001-8478 | 2001-01-17 |
Publications (1)
Publication Number | Publication Date |
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WO2002058095A1 true WO2002058095A1 (en) | 2002-07-25 |
Family
ID=18876092
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2002/000170 WO2002058095A1 (en) | 2001-01-17 | 2002-01-15 | Plasma display panel and its manufacturing method |
Country Status (6)
Country | Link |
---|---|
US (1) | US7329991B2 (ja) |
EP (1) | EP1361593A4 (ja) |
KR (1) | KR100884152B1 (ja) |
CN (1) | CN100372042C (ja) |
TW (1) | TW591680B (ja) |
WO (1) | WO2002058095A1 (ja) |
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US7747002B1 (en) * | 2000-03-15 | 2010-06-29 | Broadcom Corporation | Method and system for stereo echo cancellation for VoIP communication systems |
KR100637456B1 (ko) * | 2004-02-05 | 2006-10-20 | 삼성에스디아이 주식회사 | 플라즈마 디스플레이 패널 |
KR20050112787A (ko) * | 2004-05-28 | 2005-12-01 | 삼성에스디아이 주식회사 | 플라즈마 디스플레이 패널 |
KR20060042293A (ko) * | 2004-11-09 | 2006-05-12 | 삼성에스디아이 주식회사 | 플라즈마 디스플레이 패널 |
US20060125398A1 (en) * | 2004-11-23 | 2006-06-15 | Lg Electronics Inc. | Plasma display panel |
KR100670291B1 (ko) * | 2005-02-21 | 2007-01-16 | 삼성에스디아이 주식회사 | 플라즈마 디스플레이 패널 |
KR100670467B1 (ko) * | 2005-05-04 | 2007-01-16 | 삼성에스디아이 주식회사 | 플라즈마 디스플레이 장치 |
KR100696544B1 (ko) * | 2005-11-08 | 2007-03-19 | 삼성에스디아이 주식회사 | 플라즈마 디스플레이 패널 |
EP2297377B1 (en) * | 2008-05-30 | 2017-12-27 | Colorado State University Research Foundation | Plasma-based chemical source device and method of use thereof |
US8994270B2 (en) | 2008-05-30 | 2015-03-31 | Colorado State University Research Foundation | System and methods for plasma application |
EP2552340A4 (en) | 2010-03-31 | 2015-10-14 | Univ Colorado State Res Found | PLASMA DEVICE WITH LIQUID GAS INTERFACE |
JP2013529352A (ja) | 2010-03-31 | 2013-07-18 | コロラド ステート ユニバーシティー リサーチ ファウンデーション | 液体−気体界面プラズマデバイス |
CN102376512B (zh) * | 2010-09-30 | 2014-03-12 | 四川虹欧显示器件有限公司 | 等离子屏及其制备方法 |
JP5746553B2 (ja) * | 2011-04-28 | 2015-07-08 | 株式会社東芝 | 基板加工システム、および基板加工プログラム |
US9532826B2 (en) | 2013-03-06 | 2017-01-03 | Covidien Lp | System and method for sinus surgery |
US9555145B2 (en) | 2013-03-13 | 2017-01-31 | Covidien Lp | System and method for biofilm remediation |
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Also Published As
Publication number | Publication date |
---|---|
TW591680B (en) | 2004-06-11 |
CN100372042C (zh) | 2008-02-27 |
KR100884152B1 (ko) | 2009-02-17 |
CN1496575A (zh) | 2004-05-12 |
US20040075375A1 (en) | 2004-04-22 |
KR20030091965A (ko) | 2003-12-03 |
US7329991B2 (en) | 2008-02-12 |
EP1361593A1 (en) | 2003-11-12 |
EP1361593A4 (en) | 2008-06-04 |
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