WO2002055261A1 - Polisseuse et procede de polissage - Google Patents
Polisseuse et procede de polissage Download PDFInfo
- Publication number
- WO2002055261A1 WO2002055261A1 PCT/JP2002/000002 JP0200002W WO02055261A1 WO 2002055261 A1 WO2002055261 A1 WO 2002055261A1 JP 0200002 W JP0200002 W JP 0200002W WO 02055261 A1 WO02055261 A1 WO 02055261A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- polisher
- polishing
- polishing pad
- polished
- pad
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/01—Specific tools, e.g. bowl-like; Production, dressing or fastening of these tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
- B24D13/14—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
- B24D13/147—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face comprising assemblies of felted or spongy material; comprising pads surrounded by a flexible material
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S451/00—Abrading
- Y10S451/921—Pad for lens shaping tool
Definitions
- the present invention relates to a polisher and a polishing method, and more particularly to a polisher and a polishing method suitable for smoothing or mirroring a curved surface of a lens or the like.
- a method of manufacturing a plastic spectacle lens has been disclosed in Japanese Patent Application Laid-Open No. 47-14776, which is thicker than a finished dimension and is generally called a semi-finished lens before polishing. This is done by polishing the eyeglass lens.
- the semi-finished lens is fixed to a holder for polishing using a low melting point alloy generally called alloy, and the eyeball-side (concave side) surface of the semi-finished lens fixed to the holder is worn.
- sanding and mirror polishing similar to rubbing are performed to precisely finish the optical surface of the lens.
- a hard polishing dish with a curved surface made of aluminum, hardened plastic, urethane foam or the like is used.
- different types of polishing pads are attached to the surface of a hard polishing dish according to the purpose of processing, and sanding and polishing are performed.
- the purpose of sanding is to smooth the roughened surface to a certain degree of surface roughness, and to remove the shape error generated during roughing to match the shape of the hard polishing dish. It is in.
- the processing is performed using silicon dioxide and aluminum oxide with a particle size of about 10 to 20 / ⁇ m.
- the purpose of the processing is to further smooth the sanded surface to the desired optical surface.
- a polishing pad made of non-woven fabric is attached to the polishing plate used in the sanding process or the same shape of the polishing plate surface, and a slurry in which abrasive grains are dispersed in the processing liquid is supplied. It is done while.
- FIG. 5 shows a mirror polishing method using a polishing dish.
- FIG. 5 (a) is a schematic side view showing a state in which the lens concave surface is polished using a polishing plate
- FIG. 5 (b) is a top view of the polishing plate as viewed from above.
- a petal-shaped polishing pad 100 is attached to the surface of the dome-shaped polishing dish 110 using an adhesive provided on the back surface thereof.
- Many of the polishing pads 100 commercially available for polishing plastic lens lenses have radial cutouts 101 formed in circular pads so as to conform to the curved shape of the dome-shaped polishing dish 110. It has a petal shape. As shown in the cross-sectional view of FIG.
- a commercially available polishing pad 100 is provided with a weakly tacky adhesive layer 105 via a primer layer 104 on one side of a nonwoven fabric 103. It has a structure.
- the polishing pad 100 is attached to the polishing dish 110 with the weak adhesive layer 105.
- the polishing pad 100 almost covers the surface of the polishing dish 110. Then, as shown in FIG. 5 (a), the convex surface of the lens 8 as the object to be polished is fixed to the mounting part 10 of the object to be polished via a bonding material 9 such as a low melting point alloy.
- the polishing plate 110 shown in FIG. 5 was changed to a curved elastic base material, and the elastic polisher in which the petal-shaped polishing pad 100 shown in FIG. 5 was attached to the elastic base material was used.
- the elastic polisher is pressed against the concave surface of the lens and rubbed with the above-mentioned slurry interposed therebetween to perform mirror finishing. Since the elastic base material can be rubbed while deforming following the shape of the concave surface, the free-form surface can be polished.
- Japanese Patent Application Laid-Open No. H08-209652 can be exemplified as a method of performing the polishing process in accordance with such a work shape.
- the size of the elastic substrate 2 is considerably larger than that of the polishing pad 100 having substantially the same diameter as the lens 8.
- Hard elastic polisher it is necessary to Ru to improve the polishing rate to improve the peripheral speed.
- the outer diameter of the polishing pad 100 is considerably smaller than that of the elastic substrate 2, and in order to cover the movement range 6 of the object 8 to be polished, the polishing pad 100 has a shape as shown in FIG. Then, the elastic substrate 2 is attached eccentrically from the center.
- polishing pad 100 for polishing conventional plastic spectacle lenses was attached to the surface of the elastic substrate 2.
- the polishing method using the elastic polisher has the following problems.
- This polishing pad 100 is generally of a so-called disposable type, which is replaced every time one work is processed.
- the adhesive strength is reduced in consideration of the workability when peeling it off because it is assumed that it will be used after attaching it to a hard polishing plate. In other words, it is sufficient that the adhesive has enough adhesive strength to withstand at least one polishing step. Therefore, when this type of polishing pad 100 is attached to the elastic substrate 2, the following problem occurs due to the low adhesive strength.
- the elastic substrate 2 Is pressed by the periphery of the lens 8 and deformed, and easily penetrates into the cutout 101 and the edge of the petal-shaped polishing pad 100 having a square peripheral force. For this reason, the periphery of the lens 8 easily enters between the polishing pad 100 and the elastic base material 2, and peels off the polishing pad 100. In addition, the polishing pad 100 is often peeled off due to a small adhesive force because it cannot follow the shape deformation of the elastic substrate 2.
- polishing pad 100 If the polishing pad 100 is peeled off even at a part, the polishing pad at the peeled part will fold and this will scratch the polished surface of the optical component, and in most cases it will not be possible to obtain the desired appearance quality And poor polishing. Therefore, it is difficult to stably perform polishing in such a state where the polishing durability is low.
- the present invention has been made in view of the above circumstances, and is intended to prevent a polishing pad that is adhered to an elastic substrate from being peeled off during polishing, and that does not cause poor polishing.
- the purpose is to provide Sha.
- Another object of the present invention is to provide a polishing method using a polisher that does not easily cause a polishing pad adhered to an elastic substrate to be peeled off during polishing and does not cause poor polishing. Disclosure of the invention
- the present inventor has conducted intensive studies to achieve the above object. Since the rigidity is relatively low compared to, the lens edge easily enters during polishing and the polishing pad peels off.
- the notch is necessary for polishing as a water passage groove having a function of discharging polishing waste, supplying a polishing liquid, and the like, so that the width of the water passage groove is narrower than before, specifically, 0.1 to 0.1. It was found that by setting the width to 5 mm, it is possible to effectively prevent penetration of the lens periphery and prevent peeling of the polishing pad.
- polishing pad In order to make the polishing pad with a narrow water passage groove, multiple pads are used to reduce the gap (water passage groove) between the pad and the curved elastic base material. Polishing, covering the surface. It is possible to use By making the pads polygonal, it is possible to make the sides close to each other and reduce the gap. It is also possible to arrange the pad so as to fill a wide cutout in the conventional petal-shaped polishing pad.
- the polishing pad is provided on the surface of the elastic base material at least when polishing the object to be polished, at least the polishing object is used. It has been found that it is preferable to cover the range of the joining movement. As a result, there is no edge around which the lens periphery or the lens enters, and the effect of preventing peeling is further enhanced.
- the polishing pad is adhered to the elastic substrate using a highly adhesive adhesive with a 180 degree peel strength of 100 g / 25 mm or more according to JISZ 0237 Separation due to the periphery of the lens can be effectively prevented.
- the strong adhesive may be provided on the primer layer and the weak adhesive layer provided on the conventional polishing pad.
- the elastic substrate By making the elastic substrate have a curved surface shape, it is possible to improve the ability to follow a polished surface having a curved surface shape. Furthermore, by configuring the elastic base material with an elastic sheet, it is possible to follow the surface to be polished having various shapes by controlling the internal pressure. As a polishing method, a method of using the polisher of the present invention and pressing a polishing pad provided on the surface of the elastic base material against the surface to be polished can be adopted. By using an elastic sheet as the elastic base material, it is possible to follow objects to be polished having various shapes by controlling the internal pressure for pressing the elastic sheet. BRIEF DESCRIPTION OF THE FIGURES
- FIG. 1 shows an embodiment of the polisher of the present invention, wherein FIG. 1 (a) is a sectional view and FIG. 1 (b) is a top view.
- FIG. 2 is an enlarged sectional view of one embodiment of the polisher of the present invention.
- FIG. 3 is a top view showing another embodiment of the polisher of the present invention.
- FIG. 4 is a sectional view showing a method for polishing a concave surface of a lens using one embodiment of the polisher of the present invention.
- FIG. 5 (a) is a schematic side view showing a state in which the lens concave surface is polished using a hard polishing plate
- FIG. 5 (b) is a top view of the polishing plate as viewed from above
- FIG. 6 is a sectional view showing the structure of a commercially available polishing pad.
- FIG. 7 is a top view seen from above showing a state in which a commercially available polishing pad is attached to an elastic base material.
- the object to be polished by the polisher and the polishing method of the present invention is not limited as long as it has a surface to be polished that requires smoothing or mirror polishing. It can be applied to polishing of flat, convex or concave surfaces. Among them, it is suitable for polishing a concave surface.
- optical lenses represented by camera lenses, telescope lenses, microscope lenses, condenser lenses for steppers, eyeglass lenses, etc.
- plastic eyeglass lenses will be described as examples.
- the concave surface of the plastic spectacle lens (also referred to as the eyeball side or inner surface) has a shape such as a spherical surface, a rotationally symmetric aspheric surface, a toric surface, a progressive surface, or a curved surface obtained by combining these.
- a spherical surface, a rotationally symmetric aspherical surface, a progressive surface, etc. are formed on one convex surface.
- the convex surface is formed by the transfer of the mold when the semi-finished lens is cast and polymerized.
- the shape of the concave surface is often formed by cutting or grinding by numerical control of a semi-finished lens. After shape creation processing, it is necessary to mirror-polish the desired optical surface.
- the polisher of the present invention can be applied to smooth or mirror-finish a curved polished surface having such a shape created.
- FIG. 1 shows the structure of an embodiment of the polisher of the present invention.
- FIG. 1 (a) is a sectional view
- FIG. 1 (b) is a top view.
- FIG. 2 is an enlarged cross-sectional view of the cross section of FIG. 1 (a).
- the polisher 1 has a structure in which a polishing pad 3 is adhered to an outer surface of an elastic base material 2 via a strongly tacky adhesive layer 4.
- the elastic base material 2 is formed of an elastic sheet, and is provided integrally with a dome-shaped portion 21 formed in a dome shape and a periphery of the dome-shaped portion 21. Ring-shaped flange protruding outward 2
- the polishing pad 3 is formed so as to cover the surface of the elastic substrate 2 by making a plurality of regular hexagonal pads 31 of the same size close to each other.
- the gap between the pads 31 is a water passage groove 5 where no pad is formed, and the pad 31 is attached so as to have a predetermined width W.
- the water passage groove 5 functions as a passage for supplying abrasive water and discharging abrasive dust.
- the water passage groove 5 of the polishing pad 3 has a structure in which the water passage groove 5 communicates from near the center to the edge.
- the area where the polishing pad 3 is formed on the elastic substrate 2 covers the movement range area 6 of the object to be polished indicated by the dot.
- the elastic substrate used in the polisher 1 of the present invention preferably has a curved surface conforming to the shape of the surface to be polished.
- the dome-shaped portion 21 may be formed by forming an elastic sheet into a dome shape and maintaining the dome shape by the internal pressure of the pressure fluid.
- a dome-shaped block formed of an elastic material, or a dome-shaped elastic sheet having a hollow portion filled with another elastic material may be used.
- the thickness of the elastic sheet is preferably from 0.1 to LO mm, particularly preferably from 0.2 to 5 mm.
- the material of the elastic sheet or elastic material is rubber such as natural rubber, nitrile rubber, chloroprene rubber, styrene-butadiene rubber (SBR), acrylonitrile rubber (NBR), silicon rubber, fluorine rubber, polyethylene, nylon, etc. And styrene-based and urethane-based thermoplastic resin elastomers.
- the diameter of the dome-shaped portion 21 of the elastic substrate 2 is desirably about 1.1 to 10 times, preferably about 1.5 to 5 times the diameter of the lens to be polished.
- polishing pad 3 examples include a sheet made of a porous material such as a filter made of a fabric such as a felt or a nonwoven fabric, a polyurethane, or a sheet made of a synthetic resin with short fibers planted therein.
- a commercially available polishing pad can be used. As shown in Fig. 6, a generally commercially available polishing pad 100 for a hard polishing dish has a primer layer 104 on one side of a nonwoven fabric 103, and a weak adhesive adhesive. It has a structure in which layers 105 are stacked. Although not shown in FIG. 2, when a commercially available polishing pad is used, the primer layer 104 shown in FIG.
- the tacky adhesive layer 105 is interposed.
- a polishing pad made of nonwoven fabric 103 having only primer layer 104 or only weakly adhesive layer 105 may be used.
- the primer layer 104 may be called a binder layer.
- the shape of the polishing pad can be attached to the dome-shaped part 21 Any width may be used, but the width W of the water passage groove 5 provided in the polishing pad 3 adhered on the elastic substrate 2 is 0.1 to 5 mm, preferably 0.2. It must be about 3 mm. Such a width W of the water passage groove 5 needs to be maintained over the entire polishing pad 3. By reducing the width W of the water channel 5 in this way, The deformation due to the relatively low rigidity of the elastic substrate 2 in the non-existent portion can be suppressed. As a result, while maintaining the function of the water passage groove 5, the possibility of peeling off by the periphery of the lens is eliminated, and occurrence of polishing failure due to peeling of the polishing pad 3 can be prevented. Since the water passage grooves 5 function as the above-mentioned passages, it is desirable that the water passage grooves 5 communicate with each other directly from the end of the polishing pad 3 to the center.
- the polishing pad is composed of a plurality of pads, and the water passage groove is formed between the gaps between these pads. Is valid.
- polygonal pad such as a triangle, a quadrangle, a pentagon, and a hexagon
- one or a combination of two or more of these polygons is formed into a densely arranged polishing pad so that their sides are close to each other.
- Polygonal pads can be manufactured, for example, by cutting and cutting out pads supplied in roll form.
- FIG. 1 (b) a plurality of regular hexagonal pads 3 of the same size are arranged so that the sides thereof are close to each other, and the polishing pad 3 is formed so as to cover the surface of the elastic substrate 2. It can be. It is also effective to combine a pentagon and a hexagon, like a soccer ball.
- a polishing pad 3b used for the polisher 1b shown in FIG. 3 can be exemplified.
- This polishing pad 3b has a wide width It is composed of a petal-shaped pad 33 having a notch 32 and an elongated pad 34 arranged so as to fill the notch 32, and is adhered to the outer surface of the dome-shaped portion 21.
- the water passage groove 5 is formed as a gap between a cutout portion 32 provided in the petal-shaped pad 33 and an elongated pad 34 arranged in the cutout portion 32.
- the pad is not limited to a pad that fills the notched portion of the polygonal pad, and a pad that fills a gap between the pads may be used.
- the petal-shaped polishing pad 100 shown in FIGS. 5 and 7 can be used if the width of the water passage groove 101 can be reduced.
- the polishing pad 3 is provided on the surface of the elastic substrate 2 as a region where at least the object to be polished slides when polishing the object. It is preferable to cover For example, the polishing pad 3 is provided on the elastic substrate 2 so that the surface to be polished of the object does not protrude from the polishing pad 3 even when the object to be polished is moved in motion. As a result, there is no room for turning the peripheral edge of the lens s and the edge of the polishing pad 3, and the peeling prevention effect is further enhanced.
- the highly adhesive layer 4 used in the polisher of the present invention has, for example, an adhesive strength of 180 ° peel strength according to JISZ 0 237 1100 g / 25 mm or more, preferably 12 mm or more. It is preferably at least 500 g / 25 mm, most preferably at least 150 g / 25 mm.
- an adhesive having a high adhesive strength the adhesive strength between the polishing pad 3 and the elastic base material 2 is increased, and it is difficult for the polishing pad 3 to peel off.
- the adhesive 105 used for the conventional polishing pad 110 for the hard polishing dish 110 is presumed to be used by sticking it to the hard polishing dish. Considering the rest, the adhesive strength is low, and it is weakly tacky, similar to a removable type. Adhesion strength is JISZ 0 2 3 7 The 180 degree peel strength is about 750 to 880 gZ25 mm.
- the approximate method of measuring the 180 degree peel strength according to JISZ 0237 is as follows: a test temperature of 23 ⁇ 2 ° (:, relative humidity of 65 ⁇ 596, width of 25 mm ⁇ length of about 250 mm, clean a test piece) Attach a half-length portion of the test piece to the stainless steel plate with a roller of 20000 ⁇ 50 g, turn it back at 180 °, peel off at a speed of 300 ⁇ 3 Omm / min. It reads the force.
- the strong adhesive layer 4 is desirably a double-sided adhesive tape in consideration of adhesiveness and workability.
- the base material of the double-sided adhesive tape include nonwoven fabric, Japanese paper, polyethylene foam, polypropylene film, and polyester film.
- the type of the adhesive is not limited as long as it has the above-mentioned adhesive strength.
- a natural rubber-based adhesive, an SBR-based adhesive, a recycled rubber-based adhesive, or an acrylic adhesive can be used.
- the polisher 1 is mounted on a mounting jig 7 and used as a polishing tool.
- the mounting jig 7 holds the polisher 1, forms the inner surface side of the polisher 1 in a sealed space, and functions as a flow path for introducing a pressure fluid into the polisher 1. Further, it has a function of mounting and fixing to a polishing device (not shown).
- the mounting jig 7 has a mounting jig body 71 and a ring-shaped pressing member 72.
- the mounting jig body 71 is formed in a direction orthogonal to the axis of the cylindrical portion 71 1 and the cylindrical portion 71 1 provided integrally with the outer peripheral portion of the upper end of the cylindrical portion 71 1.
- a flange-shaped port coaxial with the overhanging tubular part 71 1 And a reshaper mounting portion 7 12.
- the pressing member 72 has a flat lower surface and a ring shape having substantially the same outer circumference as the outer circumference of the polisher mounting portion 71.
- a tapered mounting portion 713 for mounting and fixing to the polishing device is provided so as to protrude outward.
- a dome-shaped sealed space 23 is formed between the inner surface of the dome-shaped portion 21 and the upper surface of the polisher mounting portion 712, and the sealed space 23 forms a gap of the cylindrical portion 711.
- a polished object attaching section 10 s is fixed by being attached to a chuck of a polishing apparatus through a bonding material 9 such as a low-melting metal box.
- the chuck of the polishing apparatus (not shown) is driven to rotate, and the workpiece 8 rotates at a predetermined rotation speed.
- the chuck is applied with air pressure, for example, so that the workpiece 8 can be pressed against the polisher 1 at a predetermined polishing pressure.
- the chuck of the polishing apparatus that supports the object 8 to be polished performs an oscillating motion in which the rotation axis of the object 8 reciprocates between the vicinity of the apex of the dome-shaped portion 21 and the end side.
- the polisher 1 is mounted on a turntable of a polishing device (not shown) via a mounting jig 7.
- a fluid such as water or compressed air at a predetermined pressure is sent to the sealed space 23 between the inner surface of the dome-shaped portion 21 and the polisher mounting portion 7 1 2 to maintain the sealed space 23 at a predetermined pressure, and the dome
- the inner surface of the shape part 21 is pressed with a pressure fluid to give tension.
- the cylinder of the mounting jig 7) 1 The dog part 7 1 1 is rotated about the central axis of the rotation axis.
- the elastic polisher 1 is pressed against the elastic polisher 1 at a predetermined polishing pressure while being rotated at a predetermined rotation speed while rotating at a predetermined rotation speed while giving tension to the elastic polisher 1 at an internal pressure of a predetermined pressure. Then, the object to be polished 8 is given a swinging motion, and polishing is performed while a slurry 13 containing an abrasive is supplied from the nozzle 12 to the surface of the elastic polisher 1.
- the polishing pad 3 is adhered to the elastic base material 2 via the highly adhesive adhesive layer, and the width of the water passage groove 5 provided in the polishing pad 3 is narrow. Since the polishing pad 3 covers the moving range area 6 of the object 8 to be polished, it is possible to effectively prevent the periphery of the lens 8 from biting between the polishing pad 3 and the elastic substrate 2. Therefore, it is difficult to peel off the polishing pad 3 from the monolithic substrate 2, and it is possible to suppress occurrence of polishing failure due to the peeling, and to perform polishing with a high yield.
- the policy of the present invention can also be applied to polishing of a flat surface or a convex surface.
- a desired semi-finished lens is formed through a plastic eyeglass lens forming step as in the conventional case.
- the molded semi-finished lens is adhered to the object-to-be-polished mounting portion 10 via the bonding material 9, and then the concave surface of the semi-finished lens is cut into a shape that satisfies the customer's prescription in the shape creation step.
- a semi-finished lens hereinafter, referred to as a work 8 formed into a spherical surface with a radius of curvature of 109.09 mm by cutting was attached to a polishing apparatus (not shown).
- Polishing equipment A polishing pad made of a nonwoven fabric having a primer layer and a weakly adhesive layer is supported on a surface of an elastic base material 2 made of an elastic sheet via a strongly adhesive layer 4. Polisher 1 is installed. Polishing pad, the polishing pad 3 b shown in FIG. 3, the workpiece 8 is the range 6 all Migaku Ken pad 3 13 months? Exists in contact with lapping motion during Migaku Ken machining.
- polishing pad 3b a non-woven type polishing pad manufactured by SLEEM Co., Ltd. ⁇ Product name: Blue pad, and as the strong adhesive layer, both sides manufactured by Sekisui Chemical Co., Ltd.
- Adhesive tape 'Model # 595 base washi paper with an acryl-based pressure-sensitive adhesive layer and adhesive strength of 1 000 g / 25 mm
- a compressed air of 0.6 Kg iZcm 2 was supplied to the inside of the elastic base material 2 to control the shape. Further, a working fluid 13 in which abrasive grains were dispersed was supplied from a nozzle 12 between the workpiece 8 and the polisher 1. Median particle size as the abrasive grains use the 1. 2 ⁇ A 1 2 0 3 of Paiiota 7
- polishing was performed for about 8 minutes by applying a polishing pressure of.
- the polisher of the present invention hardly peels off during polishing of the polishing pad adhered to the elastic substrate, does not cause polishing failure due to the peeling of the polishing pad, and can perform polishing at a high yield.
- polishing method of the present invention a polisher that is difficult to peel off during polishing of the polishing pad attached to the elastic substrate is used, so that polishing is performed at a high yield without causing poor polishing due to peeling of the polishing pad. be able to.
- the polisher of the present invention is particularly suitable for smoothing or mirror finishing a concave surface of a spectacle lens or the like after cutting.
- polishing method of the present invention is suitable for smoothing or mirror finishing a concave surface of an eyeglass lens or the like after cutting using the polisher.
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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DE60232497T DE60232497D1 (de) | 2001-01-05 | 2002-01-04 | Poliervorrichtung und -verfahren |
US10/451,381 US6929534B2 (en) | 2001-01-05 | 2002-01-04 | Polisher and polishing method |
EP02729510A EP1366858B1 (en) | 2001-01-05 | 2002-01-04 | Polisher and polishing method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2001000677 | 2001-01-05 | ||
JP2001-677 | 2001-01-05 |
Publications (1)
Publication Number | Publication Date |
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WO2002055261A1 true WO2002055261A1 (fr) | 2002-07-18 |
Family
ID=18869424
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/JP2002/000002 WO2002055261A1 (fr) | 2001-01-05 | 2002-01-04 | Polisseuse et procede de polissage |
Country Status (4)
Country | Link |
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US (1) | US6929534B2 (ja) |
EP (1) | EP1366858B1 (ja) |
DE (1) | DE60232497D1 (ja) |
WO (1) | WO2002055261A1 (ja) |
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EP1829645A1 (en) * | 2003-01-27 | 2007-09-05 | Seiko Epson Corporation | Lens edging method |
US8979262B2 (en) | 2010-12-21 | 2015-03-17 | Mitsui Chemicals, Inc. | Semi-finished blank for varifocal lens, varifocal lens, and varifocal eyeglasses |
CN114592401A (zh) * | 2021-05-31 | 2022-06-07 | 清华大学 | 冰面抛光方法及装置 |
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US7404988B2 (en) * | 2004-03-18 | 2008-07-29 | Terry Mitchell Kuta | Headlight lens resurfacing apparatus and method |
US7815491B2 (en) * | 2007-05-29 | 2010-10-19 | San Feng Chemical Industry Co., Ltd. | Polishing pad, the use thereof and the method for manufacturing the same |
JP4963515B1 (ja) | 2010-12-21 | 2012-06-27 | パナソニック株式会社 | 可変焦点レンズ用セミフィニッシュトブランク、このブランクから加工された可変焦点レンズおよびこのレンズを用いた可変焦点メガネ |
WO2014146620A1 (zh) * | 2013-03-19 | 2014-09-25 | 西安交通大学 | 一种光学元件的磨抛装置及方法 |
DE102013220973A1 (de) * | 2013-10-16 | 2015-04-16 | Carl Zeiss Vision International Gmbh | Werkzeug zur Polierbearbeitung von optischen Flächen |
DE112015002769T5 (de) * | 2014-06-10 | 2017-03-23 | Olympus Corporation | Polierwerkzeug, Polierverfahren und Poliervorrichtung |
CN104742012A (zh) * | 2014-08-18 | 2015-07-01 | 吴华林 | 一种橡胶软盘 |
FR3059921B1 (fr) * | 2016-12-09 | 2019-05-24 | Essilor International | Outil de surfacage a qualite optique |
DE102017111559B4 (de) | 2017-05-26 | 2023-10-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Schleifwerkzeug und dessen Verwendung zur automatisierten Nachbearbeitung gefräster Freiformflächen |
DE102017216033A1 (de) * | 2017-09-12 | 2019-03-14 | Carl Zeiss Smt Gmbh | Verfahren zum Bearbeiten eines Werkstücks bei der Herstellung eines optischen Elements |
GB2582639B (en) * | 2019-03-29 | 2023-10-18 | Zeeko Innovations Ltd | Shaping apparatus, method and tool |
TWI718584B (zh) * | 2019-07-11 | 2021-02-11 | 健信科技工業股份有限公司 | 以雷射雕刻處理輪圈表面之製備方法 |
CN110465883B (zh) * | 2019-07-23 | 2021-09-14 | 康佳集团股份有限公司 | 一种led芯片的研磨结构、研磨方法及led芯片 |
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US4086068A (en) * | 1977-04-08 | 1978-04-25 | Minnesota Mining And Manufacturing Company | Lens grinding and polishing lap cover and method of making same |
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US4733502A (en) * | 1986-09-04 | 1988-03-29 | Ferro Corporation | Method for grinding and polishing lenses on same machine |
JP2797333B2 (ja) * | 1988-09-16 | 1998-09-17 | セイコーエプソン株式会社 | コンタクトレンズの製造方法及び装置 |
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US5384988A (en) * | 1993-02-05 | 1995-01-31 | Practical Systems, Inc. | Lens surfacing assembly |
US5489233A (en) * | 1994-04-08 | 1996-02-06 | Rodel, Inc. | Polishing pads and methods for their use |
TW349896B (en) * | 1996-05-02 | 1999-01-11 | Applied Materials Inc | Apparatus and chemical mechanical polishing system for polishing a substrate |
JPH1029148A (ja) * | 1996-07-15 | 1998-02-03 | Seiko Epson Corp | 研磨方法及び研磨工具 |
US6071182A (en) * | 1997-01-23 | 2000-06-06 | Sanwa Kenma Kogyo Co., Ltd. | Grindstone and method of manufacturing the same |
US6527632B1 (en) * | 1999-12-01 | 2003-03-04 | Gerber Coburn Optical, Inc. | Lap having a layer conformable to curvatures of optical surfaces on lenses and a method for finishing optical surfaces |
US6500054B1 (en) * | 2000-06-08 | 2002-12-31 | International Business Machines Corporation | Chemical-mechanical polishing pad conditioner |
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2002
- 2002-01-04 WO PCT/JP2002/000002 patent/WO2002055261A1/ja active Application Filing
- 2002-01-04 EP EP02729510A patent/EP1366858B1/en not_active Expired - Lifetime
- 2002-01-04 DE DE60232497T patent/DE60232497D1/de not_active Expired - Lifetime
- 2002-01-04 US US10/451,381 patent/US6929534B2/en not_active Expired - Lifetime
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JPH05212669A (ja) * | 1991-07-09 | 1993-08-24 | Intel Corp | 半導体プロセスのための改良された複合研摩パッド |
JPH08216029A (ja) * | 1995-02-07 | 1996-08-27 | Daiki:Kk | 精密研磨シート |
JPH1177503A (ja) * | 1997-09-01 | 1999-03-23 | Seiko Epson Corp | 眼鏡レンズ研磨用研磨パッドおよびこれを用いた研磨方法 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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EP1829645A1 (en) * | 2003-01-27 | 2007-09-05 | Seiko Epson Corporation | Lens edging method |
US8979262B2 (en) | 2010-12-21 | 2015-03-17 | Mitsui Chemicals, Inc. | Semi-finished blank for varifocal lens, varifocal lens, and varifocal eyeglasses |
CN114592401A (zh) * | 2021-05-31 | 2022-06-07 | 清华大学 | 冰面抛光方法及装置 |
Also Published As
Publication number | Publication date |
---|---|
EP1366858A4 (en) | 2006-03-15 |
EP1366858B1 (en) | 2009-06-03 |
US20040043710A1 (en) | 2004-03-04 |
US6929534B2 (en) | 2005-08-16 |
DE60232497D1 (de) | 2009-07-16 |
EP1366858A1 (en) | 2003-12-03 |
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