WO2001023837A1 - Mikromechanischer drehratensensor - Google Patents

Mikromechanischer drehratensensor Download PDF

Info

Publication number
WO2001023837A1
WO2001023837A1 PCT/DE2000/002931 DE0002931W WO0123837A1 WO 2001023837 A1 WO2001023837 A1 WO 2001023837A1 DE 0002931 W DE0002931 W DE 0002931W WO 0123837 A1 WO0123837 A1 WO 0123837A1
Authority
WO
WIPO (PCT)
Prior art keywords
rate sensor
bridge
substrate
rotation rate
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2000/002931
Other languages
German (de)
English (en)
French (fr)
Inventor
Joerg Hauer
Michael Fehrenbach
Karsten Funk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Priority to DE50008537T priority Critical patent/DE50008537D1/de
Priority to EP00971236A priority patent/EP1218693B1/de
Priority to JP2001527175A priority patent/JP4605736B2/ja
Priority to US10/089,018 priority patent/US6776041B1/en
Publication of WO2001023837A1 publication Critical patent/WO2001023837A1/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5705Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis
    • G01C19/5712Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis the devices involving a micromechanical structure

Definitions

  • the present invention relates to a micromechanical rotation rate sensor with a substrate which has an anchoring device provided on the substrate, and with an annular flywheel which is connected via a spiral spring device to the anchoring device in such a way that the connection area with the anchoring device lies essentially in the ring center, so is that the annular flywheel mass a lying parallel to the substrate surface rotation axis Elage about an axis perpendicular to the sub stratoberflacne lying axis of rotation and at least elastically out of their R ⁇ deflectable.
  • 100 denotes a substrate in the form of a silicon wafer.
  • 10 Dezeicnnet an annular flywheel; 15, 15 ⁇ bending beam; 25 a bridge; 18, 18 ⁇ a respective beautiful spiral spring and 20, 20 ⁇ a base.
  • the latter parts are made of polysilicon over a silicon oxide layer, the silicon oxide layer being removed later in the process by under-etching in order to make the parts deflectable relative to the substrate 100. Only the two bases 20, 20 'are anchored to the substrate 100 via the silicon oxide layer and form fixed points of the sensor structure.
  • the function of the rotation rate sensor constructed in this way is based on the principle of the conservation of angular momentum of a rotating system.
  • M is the moment of deviation
  • J is the moment of inertia
  • d ⁇ / dt is the angular velocity of the torsional vibration
  • is the desired rate of rotation
  • the ring-shaped flywheel mass 10 rotating about the z-axis is moved by its y- Axis rotated, this evades by rotating around the x-axis.
  • This penetration around the x-axis, which is determined by the above M is caused, at a constant angular velocity around the z-axis, is directly proportional to the selected rotation rate ⁇ .
  • the problem underlying the present invention generally consists in the fact that the first ⁇ rei natural frequencies corresponding to the x-, y- and z-axes, which are indicated in the figure, do not have an optimal position or one that can be easily optimized in terms of process technology.
  • the anchoring device has two opposite bases which are firmly connected to the substrate and are connected to one another by a bridge.
  • a V-shaped spiral spring of the spiral spring device is attached in such a way that the apex is located on the bridge and the legs are spread out towards the flywheel at an opening angle.
  • the first natural frequency about the z-axis can be set in accordance with the working frequency in the forced mode of the sensor.
  • the detection resonance frequency of the sensor can thus be adjusted around the x and y axis from the substrate plane.
  • the ratio of the natural frequencies to each other largely determines the sensor properties, such as sensitivity, interference immunity and temperature stability.
  • micromechanical rotation rate sensor according to the invention with the features of claim 1 therefore has the particular advantage over the known approaches that the natural frequencies can be tuned easily and precisely and independently of one another via the opening angle or the width and length of the V-shaped spiral springs.
  • the opening angle for both V-shaped spiral springs of the spiral spring device is the same. This means that only one angle has to be optimized for the natural frequencies.
  • V-shaped spiral springs of the spiral spring device are such attached to the bridge so that they form an X-shape. This creates a symmetrical spiral spring shape.
  • the opening angle is selected such that the natural frequency around the axis of rotation lying perpendicular to the substrate surface is lower than each natural frequency around an axis of rotation lying parallel to the substrate surface. This enables extraordinarily positive detection behavior to be achieved.
  • the bases are wedge-shaped on the opposite sides.
  • the bridge connects the two wedge tips. This gives the sensor good deflection around the z-axis.
  • the bridge is suspended from the bases in a free-floating manner above the substrate.
  • FIG. 1 shows a schematic top view of an embodiment of the micromechanical device according to the invention
  • Fig. 2 is a schematic plan view of a known micromechanical rotation rate sensor.
  • FIG. 1 shows a schematic top view of an embodiment of the micromechanical rotation rate sensor according to the invention.
  • 30-33 bending spring legs of two V-shaped bending springs, 25 ' denote a bridge, 21, 21' base and 150 an electrical supply line.
  • the ring-shaped flywheel 10 is connected to the anchoring device 21, 21 ', 25 via a spiral spring device consisting of the two V-shaped spiral springs in such a way that the anchoring device 20 lies essentially in the ring center, so that the ring-shaped flywheel mass 10 can be deflected elastically out of its rest position about the z-axis lying perpendicular to the substrate surface and the x-axis and y-axis lying parallel to the substrate surface.
  • the anchoring device 21, 21 ', 25' has two opposing pedestals 21, 21 'which are fixedly connected to the substrate 100 and are wedge-shaped on the opposite sides, the bridge 25' connecting the two wedge tips to one another.
  • the bridge 25 ' is suspended in a free-floating manner above the substrate 100 on the bases 21, 21'.
  • the opening angle is the same for both V-shaped bending springs of the bending spring device, and the V-shaped bending
  • the bending spring means are attached to the bridge 25 'in such a way that they add up to a symmetrical X-shape.
  • the first natural frequency can be set around the z-axis.
  • the natural frequency for the rotation from the substrate plane about the x or y axis can be set.
  • the ratio of the natural frequencies to one another is determined in such a way that the sensor properties, e.g. Sensitivity, interference resistance and temperature stability, adopt an application-specific optimized value.
  • the opening angle is selected such that the natural frequency around the z-axis perpendicular to the substrate surface is lower than each natural frequency around an axis of rotation lying parallel to the substrate surface, i.e. the x or y axis.
  • the micromechanical rotation rate sensor according to this embodiment is preferably produced by silicon surface micromechanics.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Gyroscopes (AREA)
  • Micromachines (AREA)
PCT/DE2000/002931 1999-09-24 2000-08-26 Mikromechanischer drehratensensor Ceased WO2001023837A1 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE50008537T DE50008537D1 (de) 1999-09-24 2000-08-26 Mikromechanischer drehratensensor
EP00971236A EP1218693B1 (de) 1999-09-24 2000-08-26 Mikromechanischer drehratensensor
JP2001527175A JP4605736B2 (ja) 1999-09-24 2000-08-26 マイクロメカニズムの回転レートセンサー
US10/089,018 US6776041B1 (en) 1999-09-24 2000-08-26 Micromechanical rotation rate sensor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19945859.6 1999-09-24
DE19945859A DE19945859A1 (de) 1999-09-24 1999-09-24 Mikromechanischer Drehratensensor

Publications (1)

Publication Number Publication Date
WO2001023837A1 true WO2001023837A1 (de) 2001-04-05

Family

ID=7923206

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2000/002931 Ceased WO2001023837A1 (de) 1999-09-24 2000-08-26 Mikromechanischer drehratensensor

Country Status (5)

Country Link
US (1) US6776041B1 (enExample)
EP (1) EP1218693B1 (enExample)
JP (1) JP4605736B2 (enExample)
DE (2) DE19945859A1 (enExample)
WO (1) WO2001023837A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012004979A1 (ja) * 2010-07-05 2012-01-12 パイオニア株式会社 回転振動型ジャイロ
US8176782B2 (en) 2006-04-28 2012-05-15 Panasonic Electric Works Co., Ltd. Capacitive sensor

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6715352B2 (en) * 2001-06-26 2004-04-06 Microsensors, Inc. Method of designing a flexure system for tuning the modal response of a decoupled micromachined gyroscope and a gyroscoped designed according to the method
DE10238893A1 (de) * 2002-08-24 2004-03-04 Robert Bosch Gmbh Drehratensensor
DE102005032863A1 (de) * 2005-07-11 2007-01-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Mikroaktuator
JP4600344B2 (ja) * 2006-04-28 2010-12-15 パナソニック電工株式会社 静電容量式センサ
DE102007035806B4 (de) * 2007-07-31 2011-03-17 Sensordynamics Ag Mikromechanischer Drehratensensor
DE102007057044B4 (de) 2007-09-10 2021-08-05 Continental Teves Ag & Co. Ohg Mikromechanische Feder
US9932852B2 (en) 2011-08-08 2018-04-03 General Electric Company Sensor assembly for rotating devices and methods for fabricating
JP2021067624A (ja) * 2019-10-28 2021-04-30 セイコーエプソン株式会社 慣性計測装置、電子機器及び移動体

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19746127C1 (de) * 1997-10-18 1999-05-12 Bodenseewerk Geraetetech Sensor zur Messung von Drehraten und Verfahren zu seiner Herstellung
US5955668A (en) * 1997-01-28 1999-09-21 Irvine Sensors Corporation Multi-element micro gyro

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5650568A (en) * 1993-02-10 1997-07-22 The Charles Stark Draper Laboratory, Inc. Gimballed vibrating wheel gyroscope having strain relief features
DE19523895A1 (de) * 1995-06-30 1997-01-02 Bosch Gmbh Robert Beschleunigungssensor
GB2318184B (en) * 1996-10-08 2000-07-05 British Aerospace A rate sensor

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5955668A (en) * 1997-01-28 1999-09-21 Irvine Sensors Corporation Multi-element micro gyro
DE19746127C1 (de) * 1997-10-18 1999-05-12 Bodenseewerk Geraetetech Sensor zur Messung von Drehraten und Verfahren zu seiner Herstellung

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
LUTZ M ET AL: "A PRECISION YAW RATE SENSOR IN SILICON MICROMACHINING", CHICAGO, IL, JUNE 16 - 19, 1997. SESSIONS 3A1 - 4D3. PAPERS NO. 3A1.01 - 4D3.14P,NEW YORK, NY: IEEE,US, 1997, pages 847 - 850, XP000870349, ISBN: 0-7803-3829-4 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8176782B2 (en) 2006-04-28 2012-05-15 Panasonic Electric Works Co., Ltd. Capacitive sensor
WO2012004979A1 (ja) * 2010-07-05 2012-01-12 パイオニア株式会社 回転振動型ジャイロ

Also Published As

Publication number Publication date
JP2003510591A (ja) 2003-03-18
US6776041B1 (en) 2004-08-17
EP1218693A1 (de) 2002-07-03
DE19945859A1 (de) 2001-03-29
EP1218693B1 (de) 2004-11-03
JP4605736B2 (ja) 2011-01-05
DE50008537D1 (de) 2004-12-09

Similar Documents

Publication Publication Date Title
EP0906557B1 (de) Drehratensensor mit entkoppelten orthogonalen primär- und sekundärschwingungen
DE68911294T2 (de) Mikrobearbeiteter beschleunigungsmesser.
DE69318956T2 (de) Verfahren zur Herstellung von Beschleunigungsmessern mittels der "Silizium auf Isolator"-Technologie
DE69626110T2 (de) Kardanaufgehängtes gyroskop mit vibrierendem ring, das merkmale zum abbau von spannungen aufweist
DE69003339T2 (de) Beschleunigungsmesser mit koplanaren symmetrischen kraftübertragern.
DE69822756T2 (de) Mikromechanischer Schwingkreisel
DE69936590T2 (de) Vibrationskreisel und sein herstellungsverfahren
DE69628981T2 (de) Drehgeschwindigkeitssensor
DE60319528T2 (de) Monolithischer beschleunigungsaufnehmer aus silizium
DE69821005T2 (de) Aufhängungsanordnung für halbleiterbeschleunigungsmesser
DE19534947C2 (de) Schwingkreiselgerät
DE3509948A1 (de) Planarer traegheitssensor
DE3638390A1 (de) Vibrations-beschleunigungsmesser
DE3223987A1 (de) Beschleunigungsmesser
EP0275338B1 (de) Biegefedergelenk und Verfahren zu seiner Herstellung
DE10001361B4 (de) Verfahren zum Herstellen eines Mikroträgheitssensors
DE69736731T2 (de) Herstellungsverfahren eines Quartzvibrators
DE69306314T2 (de) Winkelgeschwindigkeitsmessaufnehmer sowie Methode zu seiner Herstellung
DE102010038809A1 (de) Inertialsensor und Verfahren zum Herstellen eines Inertialsensors
EP1218693A1 (de) Mikromechanischer drehratensensor
EP1198695B1 (de) Verfahren zur herstellung einer torsionsfeder
DE60318204T2 (de) Verfahren zur herstellung eines monolithischen silizium-beschleunigungsaufnehmers
EP0765464A1 (de) Beschleunigungssensor
DE102010038461B4 (de) Drehratensensor und Verfahren zur Herstellung eines Masseelements
DE69617890T2 (de) Beschleunigungsmessaufnehmer mit mitteln zur kompensation des gewichts und verfahren zu seiner herstellung

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): JP US

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 2000971236

Country of ref document: EP

ENP Entry into the national phase

Ref country code: JP

Ref document number: 2001 527175

Kind code of ref document: A

Format of ref document f/p: F

WWP Wipo information: published in national office

Ref document number: 2000971236

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 10089018

Country of ref document: US

WWG Wipo information: grant in national office

Ref document number: 2000971236

Country of ref document: EP