WO2000058044A1 - Alloy materials - Google Patents

Alloy materials Download PDF

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Publication number
WO2000058044A1
WO2000058044A1 PCT/US2000/002435 US0002435W WO0058044A1 WO 2000058044 A1 WO2000058044 A1 WO 2000058044A1 US 0002435 W US0002435 W US 0002435W WO 0058044 A1 WO0058044 A1 WO 0058044A1
Authority
WO
WIPO (PCT)
Prior art keywords
alloy
oxide
metal
substrate
atomic percent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2000/002435
Other languages
English (en)
French (fr)
Other versions
WO2000058044A9 (en
Inventor
Cornelis Leo Hans Thieme
D. Thompson. Elliott
Leslie G. Fritzemeier
Robert D. Cameron
Edward J. Siegal
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
American Superconductor Corp
Original Assignee
American Superconductor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Superconductor Corp filed Critical American Superconductor Corp
Priority to AU41659/00A priority Critical patent/AU764082B2/en
Priority to EP00921315A priority patent/EP1181122A4/en
Priority to JP2000607783A priority patent/JP2002540294A/ja
Priority to CA002365740A priority patent/CA2365740A1/en
Publication of WO2000058044A1 publication Critical patent/WO2000058044A1/en
Anticipated expiration legal-status Critical
Publication of WO2000058044A9 publication Critical patent/WO2000058044A9/en
Ceased legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/06Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
    • B22F7/08Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy
    • C22C1/05Mixtures of metal powder with non-metallic powder
    • C22C1/059Making alloys comprising less than 5% by weight of dispersed reinforcing phases
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C32/00Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
    • C22C32/001Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with only oxides
    • C22C32/0015Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with only oxides with only single oxides as main non-metallic constituents
    • C22C32/0021Matrix based on noble metals, Cu or alloys thereof
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/01Alloys based on copper with aluminium as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/06Alloys based on copper with nickel or cobalt as the next major constituent
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C2204/00End product comprising different layers, coatings or parts of cermet

Definitions

  • the substrate should have a low Curie temperature so that the substrate is not ferromagnetic below the superconductor's critical temperature. Furthermore, chemical species within the substrate should not be able to diffuse into the layer of superconductor material, and the coefficient of thermal expansion of the substrate should be about the same as the superconductor material . Moreover, if the substrate is used for an oxide superconductor, the substrate material should be relatively resistant to oxidation.
  • the invention features an article including an alloy and an oxide layer disposed on a surface of the alloy.
  • the alloy undergoes substantially no oxidation when the article is exposed to an atmosphere containing 1% oxygen at 900 °C for at least two hours .
  • the invention features an alloy with a biaxially textured surface.
  • the alloy includes copper and from about 25 atomic percent nickel to about 55 atomic percent nickel. At least about 65 volume percent of the alloy is formed of grains having a biaxial texture.
  • the alloy can be made by a process that includes rolling the alloy, and then annealing the alloy.
  • Fig. 2C illustrates a rolled foil as a core for a can.
  • Fig. 3 is a block diagram illustrating a powder metallurgy variant of the sheath and core approach for forming a biaxially textured alloy.
  • Examples of metals from which the first and second metals can be selected include copper (Cu) , nickel (Ni) , chromium (Cr) , vanadium (V) , aluminum (Al) , silver (Ag) , iron (Fe) , palladium (Pd) , molybdenum (Mo) , gold (Au) and zinc (Zn) .
  • the superconductor material can be applied by any of a variety of methods, including electroplating, non-vacuum solution deposition, chemical vapor deposition, physical vapor deposition techniques such as sputtering, laser ablation, thermal evaporation, electron beam evaporation, metallorganic and/or sol-gel solution precursor methods.
  • a preferred precursor approach uses a metallorganic triflouroacetate precursor solution. With this approach, high temperature superconductor films are spun or dip coated onto substrates and then reacted to form the superconducting YBCO phase.
  • the as-coated precursor includes an oxy-fluoride film containing BaF 2 . Heat treatment in a controlled atmosphere, such as that disclosed in U.S. Patent No.
  • the superconductor material can be deposited directly onto a surface of the alloy substrate, or onto a buffer layer that is disposed on a surface of the alloy substrate.
  • One or more buffer layers can be disposed between the alloy substrate and the superconductor material.
  • the buffer layer can be formed using any of the standard techniques, including epitaxial deposition (e.g., chemical vapor deposition or physical vapor deposition) , or by growing a native oxide (such as the native oxide discussed above) via exposure of the alloy to an environment containing sufficient oxygen. This native oxide can be grown epitaxially.
  • the native oxide can have a biaxially textured surface (e.g., a
  • the alloy article is deformed in an axially symmetric manner, such as, by extruding, swaging, drawing or rod rolling to a smaller size, which can be round, square, or rectangular (Step 106) .
  • the melt can be cast and rolled directly into a plate shape.
  • the plate can be further homogenized with a suitable heat treatment, rolled to a thinner size, and recrystallized to induce a desired fine grain size.
  • a recrystallization anneal in a protective atmosphere (e.g., high vacuum, low oxygen or reducing atmosphere) at elevated temperature (e.g., at temperatures from about 250°C to about less than about 95% of the melting temperature of the alloy, or from about 400°C to about 1200°C) produces the desired texture.
  • a protective atmosphere e.g., high vacuum, low oxygen or reducing atmosphere
  • elevated temperature e.g., at temperatures from about 250°C to about less than about 95% of the melting temperature of the alloy, or from about 400°C to about 1200°C
  • the article is positioned to provide oxidation resistance during subsequent uses, such as during deposition of superconductor or buffer layers.
  • the article may be annealed (Step 109) to form a protective epitaxial oxide layer.
  • the tapes can be rolled with various size rolls, including large diameter rolls (e.g., about 3.5" to about 8" or larger in diameter) or with small diameter rolls (e.g., about 0.75" to about 2" in diameter) which are preferably backed up by larger rolls, in a so-called four-high arrangement.
  • large diameter rolls e.g., about 3.5" to about 8" or larger in diameter
  • small diameter rolls e.g., about 0.75" to about 2" in diameter
  • An alternative to the four-high arrangement is the cluster rolling mill.
  • a planetary rolling mill can be used as well.
  • a core is made to fit inside the can using a melt process or one of the variations described below. (Step 202) .
  • the core contains the alloy.
  • individual foils 220a-220b of the first metal, the second metal and an oxide former or alloys thereof 220c can be stacked together and rolled into a bar 222, a so called “jelly roll", which can be used as a core material or a wrapping for a central core.
  • Aluminum is a particularly useful oxide former in making rolled foils, due to its deformability.
  • the rolled foil bar 222 is illustrated inside an outer layer of can 226 and is a wrap material for a core 228.
  • the rolled foil 222 is illustrated inside a can 226 process and is the core for the can.
  • a block diagram illustrates a process 400 for forming an alloy article with a biaxially textured surface or cube textured surface and improved oxidation resistance, and which uses a variation on the powder metallurgy embodiment or the rolled foil embodiment of the sheath and core process .
  • a powder or foil of the first metal, the second metal, or an alloy of the first and second metals is chosen that contains from about 0.2 weight percent to about 1 weight percent oxygen. The presence of oxygen can be used to assist in the internal oxidation of some of the oxide formers.
  • a block diagram illustrates a process 500 for forming an alloy with a biaxially textured surface or cube textured surface and an improved CTE (i.e., coefficient of thermal expansion) matches among the substrate, the buffer layer, and the superconductor layer.
  • the mismatch between the CTE of the primary substrate material and either the superconducting layer or the buffer layer can be reduced by incorporating into the alloy substrate another element with a much lower CTE, such as Nb, Mo, Ta, V, Cr, Zr, Pd, Sb, NbTi, an intermetallic such as NiAl or Ni 3 Al , or mixtures thereof .
  • the CTE-reducing material is preferably included as a rod embedded in the alloy.
  • the bar is drawn through round and rectangular drawing dies to a final dimension of 2.4 mm x 3.6 mm.
  • This rectangular product is subsequently rolled to a tape of 65 microns thick (97.3 % reduction) .
  • This tape is two-step annealed at

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Dispersion Chemistry (AREA)
  • Composite Materials (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
PCT/US2000/002435 1999-03-31 2000-01-31 Alloy materials Ceased WO2000058044A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU41659/00A AU764082B2 (en) 1999-03-31 2000-01-31 Alloy materials
EP00921315A EP1181122A4 (en) 1999-03-31 2000-01-31 ALLOY MATERIALS
JP2000607783A JP2002540294A (ja) 1999-03-31 2000-01-31 合金材料
CA002365740A CA2365740A1 (en) 1999-03-31 2000-01-31 Alloy materials

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/283,777 1999-03-31
US09/283,777 US6458223B1 (en) 1997-10-01 1999-03-31 Alloy materials

Publications (2)

Publication Number Publication Date
WO2000058044A1 true WO2000058044A1 (en) 2000-10-05
WO2000058044A9 WO2000058044A9 (en) 2001-10-11

Family

ID=23087507

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/002435 Ceased WO2000058044A1 (en) 1999-03-31 2000-01-31 Alloy materials

Country Status (6)

Country Link
US (1) US6458223B1 (enExample)
EP (1) EP1181122A4 (enExample)
JP (1) JP2002540294A (enExample)
AU (1) AU764082B2 (enExample)
CA (1) CA2365740A1 (enExample)
WO (1) WO2000058044A1 (enExample)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003060203A1 (de) * 2002-01-02 2003-07-24 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Metallband für epitaktische beschichtungen und verfahren zu dessen herstellung
JP2004515650A (ja) * 2000-12-07 2004-05-27 インスティトゥート フュア フェストケルパー− ウント ヴェルクシュトッフオルシュング ドレースデン エー ファウ エピタキシー被覆のための金属ストリップおよびその製造法
US6745059B2 (en) 2001-11-28 2004-06-01 American Superconductor Corporation Superconductor cables and magnetic devices
US6809066B2 (en) 2001-07-30 2004-10-26 The Regents Of The University Of California Ion texturing methods and articles
US6821338B2 (en) 2000-12-15 2004-11-23 The Regents Of The University Of California Particle beam biaxial orientation of a substrate for epitaxial crystal growth
WO2005023445A1 (de) * 2003-08-25 2005-03-17 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Verfahren zur herstellung von metallischen flachdrähten oder bändern mit würfeltextur
EP1165849A4 (en) * 1999-03-31 2005-09-07 American Superconductor Corp ALLOY MATERIALS
WO2007016492A2 (en) 2005-07-29 2007-02-08 American Superconductor Corporation Architecture for high temperature superconductor wire
US7463915B2 (en) 2004-08-20 2008-12-09 American Superconductor Corporation Stacked filamentary coated superconductors
US7496390B2 (en) 2004-08-20 2009-02-24 American Superconductor Corporation Low ac loss filamentary coated superconductors
US7582328B2 (en) 2004-08-20 2009-09-01 American Superconductor Corporation Dropwise deposition of a patterned oxide superconductor
US7622424B2 (en) 2004-10-01 2009-11-24 American Superconductor Corporation Thick superconductor films with improved performance
US7674751B2 (en) 2006-01-10 2010-03-09 American Superconductor Corporation Fabrication of sealed high temperature superconductor wires
US7763343B2 (en) 2005-03-31 2010-07-27 American Superconductor Corporation Mesh-type stabilizer for filamentary coated superconductors
US7893006B2 (en) 2007-03-23 2011-02-22 American Superconductor Corporation Systems and methods for solution-based deposition of metallic cap layers for high temperature superconductor wires
US7902120B2 (en) 2006-07-24 2011-03-08 American Superconductor Corporation High temperature superconductors having planar magnetic flux pinning centers and methods for making the same
US8030246B2 (en) 2006-07-21 2011-10-04 American Superconductor Corporation Low resistance splice for high temperature superconductor wires
US8195260B2 (en) 2008-07-23 2012-06-05 American Superconductor Corporation Two-sided splice for high temperature superconductor laminated wires
CN104404306A (zh) * 2014-09-03 2015-03-11 上海大学 涂层导体用高强度立方织构镍基合金基带及其制备方法

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US6331199B1 (en) 2000-05-15 2001-12-18 Ut-Battelle, Llc Biaxially textured articles formed by powder metallurgy
US6617283B2 (en) * 2001-06-22 2003-09-09 Ut-Battelle, Llc Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom
US6743531B2 (en) * 2001-06-22 2004-06-01 Fujikura Ltd. Oxide superconducting conductor and its production method
US6610414B2 (en) * 2001-08-16 2003-08-26 Ut-Battelle, Llc Biaxially textured articles formed by power metallurgy
EP1472745A1 (en) * 2002-01-29 2004-11-03 Jochen Dieter Prof. Dr. Mannhart Superconductor with optimized microstructure and method for making such a superconductor
US6645313B2 (en) * 2002-02-22 2003-11-11 Ut-Battelle, Llc Powder-in-tube and thick-film methods of fabricating high temperature superconductors having enhanced biaxial texture
JP2005056754A (ja) * 2003-08-06 2005-03-03 Sumitomo Electric Ind Ltd 超電導線材およびその製造方法
US7226894B2 (en) * 2003-10-22 2007-06-05 General Electric Company Superconducting wire, method of manufacture thereof and the articles derived therefrom
US20050092253A1 (en) * 2003-11-04 2005-05-05 Venkat Selvamanickam Tape-manufacturing system having extended operational capabilites
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US7261776B2 (en) * 2004-03-30 2007-08-28 American Superconductor Corporation Deposition of buffer layers on textured metal surfaces
US20050223984A1 (en) * 2004-04-08 2005-10-13 Hee-Gyoun Lee Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors
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US7794493B2 (en) * 2004-06-30 2010-09-14 Cordis Corporation Magnetic resonance imaging compatibility alloy for implantable medical devices
JP2006027958A (ja) * 2004-07-16 2006-02-02 Sumitomo Electric Ind Ltd 薄膜材料およびその製造方法
US7387811B2 (en) * 2004-09-21 2008-06-17 Superpower, Inc. Method for manufacturing high temperature superconducting conductors using chemical vapor deposition (CVD)
US7411303B2 (en) * 2004-11-09 2008-08-12 Texas Instruments Incorporated Semiconductor assembly having substrate with electroplated contact pads
DE102005013368B3 (de) * 2005-03-16 2006-04-13 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Verfahren zur Herstellung und Verwendung von Halbzeug auf Nickelbasis mit Rekristallisationswürfeltextur
CN100453257C (zh) * 2005-05-13 2009-01-21 北京工业大学 强化双轴织构Ag基复合基带的制备方法
KR100691061B1 (ko) * 2005-08-30 2007-03-09 엘에스전선 주식회사 초전도 선재용 기판 및 그 제조방법과 초전도 선재
JP2007200870A (ja) * 2006-01-26 2007-08-09 Ls Cable Ltd 超伝導ケーブル用基板の製造方法
US8114526B2 (en) * 2007-04-06 2012-02-14 American Superconductor Corporation Composite substrates for high temperature superconductors having improved properties
DE102007024166B4 (de) * 2007-05-24 2011-01-05 Zenergy Power Gmbh Verfahren zum Bearbeiten eines Metallsubstrats und Verwendung dessen für einen Hochtemperatur-Supraleiter
KR101677310B1 (ko) 2009-09-14 2016-11-17 엔지케이 인슐레이터 엘티디 구리 합금 선재 및 그 제조 방법
KR101677311B1 (ko) 2009-09-14 2016-11-17 엔지케이 인슐레이터 엘티디 구리 합금박, 그것을 이용한 플렉시블 프린트 기판 및 구리 합금박의 제조 방법
DE102018220222A1 (de) * 2018-11-26 2020-05-28 Thyssenkrupp Ag Verfahren zur Herstellung eines Werkstoffverbundes, Werkstoffverbund und seine Verwendung
CN109355519B (zh) * 2018-12-17 2020-06-12 河南师范大学 一种提高无铁磁性立方织构铜基合金基带强度的制备方法
EP4193006A1 (en) * 2020-08-06 2023-06-14 American Superconductor Corporation Electro-formed metal foils
RU2759146C1 (ru) * 2020-11-16 2021-11-09 Федеральное государственное бюджетное учреждение науки Институт физики металлов имени М.Н. Михеева Уральского отделения Российской академии наук (ИФМ УрО РАН) Способ изготовления биаксиально текстурированной подложки в виде ленты из тройного сплава на медно-никелевой основе для эпитаксиального нанесения на нее буферных и высокотемпературного сверхпроводящего слоев
CN117403096B (zh) * 2023-12-13 2024-03-12 宁波兴业盛泰集团有限公司 高强高导耐高温铜锆系合金材料及其制备方法

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JP2002540294A (ja) 2002-11-26
CA2365740A1 (en) 2000-10-05
US6458223B1 (en) 2002-10-01
AU764082B2 (en) 2003-08-07

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