WO1996024158A1 - Composition pour le nettoyage de surfaces dures - Google Patents

Composition pour le nettoyage de surfaces dures Download PDF

Info

Publication number
WO1996024158A1
WO1996024158A1 PCT/RU1996/000030 RU9600030W WO9624158A1 WO 1996024158 A1 WO1996024158 A1 WO 1996024158A1 RU 9600030 W RU9600030 W RU 9600030W WO 9624158 A1 WO9624158 A1 WO 9624158A1
Authority
WO
WIPO (PCT)
Prior art keywords
water
compound
differing
anhydride
calculation
Prior art date
Application number
PCT/RU1996/000030
Other languages
English (en)
Russian (ru)
Inventor
Svetlana Alexeevna Panaeva
Viktor Nikolaevich Derjugin
Anatoly Alexandrovich Ezhov
Nina Vasilievna Komarova
Stanislav Konstantinovich Korovin
Viktor Vasilievich Kryachko
Olga Grigorievna Likhoded
Ivan Egorovich Lobov
Nikolai Nikolaevich Usov
Galina Gennadievna Ushkalova
Original Assignee
Aktsionernoe Obschestvo 'nauchno-Proizvodstvennoe Predpriyatie 'sapfir'
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aktsionernoe Obschestvo 'nauchno-Proizvodstvennoe Predpriyatie 'sapfir' filed Critical Aktsionernoe Obschestvo 'nauchno-Proizvodstvennoe Predpriyatie 'sapfir'
Publication of WO1996024158A1 publication Critical patent/WO1996024158A1/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/34—Organic compounds containing sulfur
    • C11D2111/22—

Definitions

  • ⁇ ed ⁇ s ⁇ a ⁇ m is ⁇ lzuem ⁇ g ⁇ s ⁇ s ⁇ ava yavlyae ⁇ sya eg ⁇ vys ⁇ - ⁇ aya ⁇ sichn ⁇ s ⁇ , ⁇ me ⁇ g ⁇ s ⁇ s ⁇ av s ⁇ li m ⁇ zhe ⁇ by ⁇ is ⁇ ch- ni ⁇ m zag ⁇ yazneniya ⁇ lu ⁇ v ⁇ dni ⁇ v ⁇ y ⁇ ve ⁇ n ⁇ s ⁇ i i ⁇ nami Me- ⁇ all ⁇ v, ch ⁇ in sv ⁇ yu ⁇ che ⁇ ed ⁇ itsa ⁇ eln ⁇ vliyae ⁇ on ele ⁇ i- ches ⁇ ie ⁇ a ⁇ ame ⁇ y ⁇ ib ⁇ v / I I.
  • Compounds containing circulatory compounds taken from the group texotoxysilane and dimethylsilane, as well as a mixture of 121, were also known. Its low cost
  • the task posed is achieved by the proposed composition, including sulfamic anhydride in the amount of active ingredient in the amount of 0.1-70.0 wt. % and the manufacturer - the rest.
  • the manufacturer uses either water or a fresh water source.
  • C ⁇ Sulfuric anhydride (C ⁇ ), which is an organic compound, is produced by the interaction of maleic anhydride with sulfur dioxide.
  • C ⁇ is a non-toxic compound.
  • Source materials for the plant are water (G ⁇ S ⁇ ).
  • the appliance provides a convenient, oily yellow liquid, non-toxic (4th class of safety), without safety.
  • the appliance is supplied with the following: the ingredients are weighted and then connected to the appliance and the appliance is attached to the food After this is ready for use.
  • the method of calculating solidity (General method) The finished product is poured into the bath and heated to a temperature of 60-80 ° C. The plates are placed in the cassette for chemical processing and with the help of the owner are released into the system for the payment of remittances.
  • the processing time of the plate is 10-15 minutes. At the end of this time, the cassette with the plates is removed from the bathtub, washed in disinfected water and the temperature - 4 -
  • a rinse-off wash 60-80 ° C for 5 minutes, and then in the bathtub, a rinse-off wash, a disinfectant water outlet, the output of water at the outlet of the bath reaches at least 10. For example, 1.
  • aqueous solution containing 2% ⁇ is poured into the bath and heated to a temperature of 70 ° ⁇ .
  • the plates are placed in the cassette for chemical processing and with the help of a distributor are released into the circuits for the payment of transfers.
  • the processing time of the plates is 15 minutes.
  • the plates are removed from the bathtub, washed out with deionized water at 70 ° C for 5 minutes with a subsequent cascade of cleaned waste water. The results are calculated in the table.
  • the proposed structure makes it possible to efficiently clean up the contaminants. With this, a significant decrease in the yield of active components and discharges may be caused by a non-efficient medium.
  • this product which is a matter of concern. For this reason, the devices themselves and the technology of their use are absolutely safe, the devices do not annoy the skin, slimy cases. Disposal from industrial equipment and the processing of metal, metal processing is neutral.
  • Unive ⁇ saln ⁇ s ⁇ ⁇ as ⁇ v ⁇ a dae ⁇ v ⁇ z- m ⁇ zhn ⁇ s ⁇ is ⁇ l ⁇ z ⁇ va ⁇ i ⁇ in lyuby ⁇ ⁇ aslya ⁇ ⁇ myshlenn ⁇ s ⁇ i (mashin ⁇ s ⁇ enii, medicine, and ⁇ adi ⁇ e ⁇ ni ⁇ e ⁇ .d.), where ⁇ dg ⁇ v ⁇ i chis ⁇ ⁇ ve ⁇ n ⁇ s ⁇ ey is ⁇ lzuyu ⁇ sya b ⁇ lshie ⁇ bemy mine ⁇ alny ⁇ ⁇ isl ⁇ .

Abstract

Cette invention concerne une nouvelle composition pour le nettoyage des surfaces dures, notamment les surfaces de plaques et de matériaux diélectriques et semi-conducteurs ayant subis une contamination ionique, les surfaces de métaux utilisés dans la production de divers types de composants semi-conducteurs, ainsi que les circuits intégrés. Cette composition se présente sous la forme d'une solution aqueuse d'anhydride sulfo-maléique ou d'une composition aqueuse contenant de l'alcool et une proportion d'anhydride sulfo-maléique variant entre 0,1 et 70, 0 % en poids.
PCT/RU1996/000030 1995-02-03 1996-02-02 Composition pour le nettoyage de surfaces dures WO1996024158A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
RU95101393 1995-02-03
RU9595101393A RU2052868C1 (ru) 1995-02-03 1995-02-03 Состав раствора для очистки поверхности (типа "полифункционал")

Publications (1)

Publication Number Publication Date
WO1996024158A1 true WO1996024158A1 (fr) 1996-08-08

Family

ID=20164422

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/RU1996/000030 WO1996024158A1 (fr) 1995-02-03 1996-02-02 Composition pour le nettoyage de surfaces dures

Country Status (2)

Country Link
RU (1) RU2052868C1 (fr)
WO (1) WO1996024158A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001031696A1 (fr) * 1999-10-29 2001-05-03 Tadeusz Bugalski Composition destinee a l'elimination chimique des ions metalliques et atomes adsorbes des surfaces

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4339340A (en) * 1975-11-26 1982-07-13 Tokyo Shibaura Electric Co., Ltd. Surface-treating agent adapted for intermediate products of a semiconductor device
DE3822350A1 (de) * 1988-07-01 1990-01-04 Siemens Ag Verfahren zum entfernen von metall-verunreinigungen auf halbleiterkristalloberflaechen
EP0501492A2 (fr) * 1991-02-27 1992-09-02 OKMETIC Oyj Méthode pour le nettoyage de produits semi-conducteurs
EP0561236A1 (fr) * 1992-03-06 1993-09-22 Nissan Chemical Industries Ltd. Composition aqueuse à base d'ammoniaque pour le nettoyage de substrats semi-conducteurs
EP0690483A2 (fr) * 1994-06-23 1996-01-03 MALLINCKRODT BAKER, Inc. Procédé de nettoyage de la contamination métallique de substrats conservant la planéité desdits substrats

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4339340A (en) * 1975-11-26 1982-07-13 Tokyo Shibaura Electric Co., Ltd. Surface-treating agent adapted for intermediate products of a semiconductor device
DE3822350A1 (de) * 1988-07-01 1990-01-04 Siemens Ag Verfahren zum entfernen von metall-verunreinigungen auf halbleiterkristalloberflaechen
EP0501492A2 (fr) * 1991-02-27 1992-09-02 OKMETIC Oyj Méthode pour le nettoyage de produits semi-conducteurs
EP0561236A1 (fr) * 1992-03-06 1993-09-22 Nissan Chemical Industries Ltd. Composition aqueuse à base d'ammoniaque pour le nettoyage de substrats semi-conducteurs
EP0690483A2 (fr) * 1994-06-23 1996-01-03 MALLINCKRODT BAKER, Inc. Procédé de nettoyage de la contamination métallique de substrats conservant la planéité desdits substrats

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001031696A1 (fr) * 1999-10-29 2001-05-03 Tadeusz Bugalski Composition destinee a l'elimination chimique des ions metalliques et atomes adsorbes des surfaces

Also Published As

Publication number Publication date
RU95101393A (ru) 1997-01-20
RU2052868C1 (ru) 1996-01-20

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