WO1994003919A1 - Procede de production de faisceaux de n'importe quels ions hautement charges, de faible energie cinetique et dispositif de mise en ×uvre dudit procede - Google Patents

Procede de production de faisceaux de n'importe quels ions hautement charges, de faible energie cinetique et dispositif de mise en ×uvre dudit procede Download PDF

Info

Publication number
WO1994003919A1
WO1994003919A1 PCT/EP1993/002047 EP9302047W WO9403919A1 WO 1994003919 A1 WO1994003919 A1 WO 1994003919A1 EP 9302047 W EP9302047 W EP 9302047W WO 9403919 A1 WO9403919 A1 WO 9403919A1
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
ion
ion beam
ion source
axis
Prior art date
Application number
PCT/EP1993/002047
Other languages
German (de)
English (en)
Inventor
Jürgen ANDRÄ
Original Assignee
Andrae Juergen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19924226299 external-priority patent/DE4226299A1/de
Application filed by Andrae Juergen filed Critical Andrae Juergen
Priority to AU47055/93A priority Critical patent/AU4705593A/en
Publication of WO1994003919A1 publication Critical patent/WO1994003919A1/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Definitions

  • the invention relates to a method for generating rays of any highly charged ions of low kinetic energy (approximately 1 to 200 eV) with good brilliance according to the preamble of claim 1.
  • EZR ion sources It is known to extract highly charged ion beams from EZR ion sources with high yield.
  • the design features of known EZR ion sources are known from patent documents (EP 138 642, 130 607, 142 414, 145 584, 238 397, 252 845 and French laid-open documents 24 75 798, 25 12 623, 25 92 518) and other scientific and technical publications .
  • a plasma is enclosed by two or more circular, not necessarily identical magnetic coils that are at a certain axial distance from one another. A maximum of the magnetic field strength arises at the location of the coils on the axis of symmetry of the enclosed plasma and a minimum between the coils.
  • This magnetic field structure can be realized with conventional or with superconducting coils with the same or opposite current direction. In more recent designs, this axial magnetic field structure is also used with permanent magnets without Ver using coils.
  • the radial plasma confinement is effected by magnetic multipole sensors, usually hexapoles, which are usually constructed with permanent magnets. However, superconducting coils or iron-reinforced copper coils can also be used.
  • a cylindrical plasma chamber made of metal is used in this magnetic field structure on the axis of symmetry, which essentially serves as a vacuum chamber.
  • a low pressure of 10 -1 to 10 -3 Pa of the gas or gas mixture to be ionized is maintained in the plasma chamber.
  • the gas inlet takes place directly into the plasma chamber or into the pump lines between the vacuum pumps and the plasma chamber, with very often not only the gas to be ionized but also a so-called support gas being let in.
  • the microwave energy is coupled into the plasma chamber radially or axially with high-frequency waveguides or with coaxial lines, possibly in combination with antennas, a microwave-permeable but vacuum-tight window ensuring the vacuum closure of the plasma chamber.
  • the plasma electrode is a pierced electrode through which the ions are extracted axially using a drawing field.
  • This plasma electrode is arranged in the area of one of the two axial magnetic field maxima, hereinafter referred to as the front one.
  • the drawing field is built up by the voltage difference between the plasma electrode and another, pierced electrode, the so-called extraction electrode.
  • the plasma electrode and the entire plasma are at a more positive potential than the extraction electrode.
  • the geometrical shape and the axial distance of the plasma and extraction electrodes as well as their position relative to the magnetic field maximum and plasma partly determine the brilliance of the extracted ion beam. It is known to optimize the brilliance by the electrode gap and the axial magnetic field maximum can be varied during operation until the best brilliance of a desired ion type is achieved.
  • the brilliance of an ion beam is defined as the ion current of a given emittance, i.e. H. per beam cross-sectional area and solid angle, which are filled by the ion beam.
  • the surface normal and the axis of symmetry of the solid angle lie on the beam axis.
  • the brilliance is the measure for the achievable ion current per unit area and solid angle on a target surface.
  • Elements that are solid at room temperature are either introduced into the plasma in the form of gaseous chemical compounds or evaporated into the plasma or evaporated from the plasma itself after the element in question has been introduced into a plasma chamber in solid form.
  • ions of all elements can be generated with such EZR ion sources.
  • EZR ion sources are their relatively poor emittance relative to other ion sources, especially to electron beam ion sources. Despite absolutely high ion currents, optimal brilliance is not achieved. In applications where low-energy, highly charged ions are required, the non-optimal brilliance is a very disturbing, limiting
  • the plasma emission area is defined through the opening in the plasma electrode. This must necessarily be large in order to obtain a good acceleration field penetration up to the charged ions in the front EZR zone on the axis of symmetry. This leads to strong space charge expansions, which irreversibly deteriorate the emittance even over short stretches of an extraction stream. In addition, the average charge state of the extracted ions is reduced, since the ions have to pass through an area of neutral gases with significant density from the front of the EZR ion source to the extraction electrode, where they lose charge due to so-called resonant electron capture.
  • electron beam ion sources are known for the production of ion currents from highly charged ions.
  • An intense electron beam of given energy generates a mixture of charge states of the gas element up to high charge states in a given density in the geometric range of the highest electron beam density.
  • These uploaded ions are extracted either radially or axially from the area of high electron beam density with an electric pull field. This is generated between a pair of electrodes. Radial extraction does not allow an increase in the electron beam density due to a magnetic field running axially to the electron beam and requires the charged ions to pass through zones of relatively high gas density.
  • EBIS and EBIT sources result in an intense, axial electron beam in an axial magnetic field.
  • the magnetic field ensures the radial confinement of the ions, while the axial ion confinement can be ensured by pierced, negative electrode disks at the entrance and exit of the electron beam.
  • the ions are stored in an axial, mostly superconducting magnetic field structure over a relatively long distance of a few decimeters and exposed to the axial electron beam over their entire length in order to generate higher charge states through successive ionization, whereby the electron beam compressed in the magnetic field together acts as an ion trap with the magnetic field.
  • the ions After a selectable storage time of the ions, they are extracted axially from the source in the form of an ion beam pulse by changing the potentials of the pierced electrodes.
  • the EBIS source can be used to generate higher charge states with smaller absolute ion currents, but with much better emittance than with EZR sources, so that the brilliance of the EBIS source is greater, especially for highly charged ions than for EZR sources.
  • medium charge states q m 1 ⁇ 2.
  • the absolute ion currents from the EBIS source are not sufficient to compete with the brilliance of the EZR source.
  • EBIS sources also require a very high technical effort, which practically excludes their industrial use. The introduction of elements into the EBIS source, which are present at room temperature, is also very difficult, but is possible with high financial and technical effort in the form of ion injection.
  • the compressed electron beam has an extremely small diameter of the order of a few tens of ⁇ m, the ions can be extracted with very good emittance, as with the EBIS source, so that the brilliance of the EBIT source can be expected to be attractive values for very high charge states.
  • EBIT sources also require a very high technical outlay, which practically excludes the industrial use of previously known embodiments. The introduction of elements into the EBIT source that are permanently available at room temperature also creates great difficulties.
  • Extraction energy per charge and E 2 mean the decelerated energy of the ions per charge, so that the extraction brilliance must be as high as possible in order to achieve satisfactory brilliance of the decelerated ion beams.
  • the first object is achieved in a method for operating an ion source device of the type mentioned at the outset, which is characterized in that the ion beam coming from the plasma chamber and passing through the extraction electrode opens up behind the extraction electrode front surface (viewed in the direction of the ion beam) and is generated by the existing magnetic field the axis converging electron beam is sent towards the other side, so that a space charge compensating electron extraction channel for the ions is thereby formed.
  • the same basic idea also characterizes an ion source device of the aforementioned type, as follows from the characterizing part of claim 2.
  • the basic principles of EZR and electron beam ion sources are quasi combined to form an electron beam EZR hybrid ion source with space charge-compensated extraction for the generation of any uploaded ion beams with good emittance.
  • the aforementioned electron beam EZR hybrid ion source then results in a space charge-compensated extraction, in that, viewed in the direction of the ion beam behind the extraction electrode front surface and preferably concentrically around the ion beam, an intensive electron emission of approximately 10 to 400 eV energy is generated in such a way that the electron velocity vectors are parallel or superimposed on the magnetic stray field lines of the ion source so that the electrons on spiral tracks can follow these magnetic field lines into the plasma chamber, from the extraction electrode are accelerated to the plasma electrode in the pull field of the ions.
  • the ion current accelerated from the plasma is compensated for by the electrons in the entire superimposition region.
  • the EZR plasma serves as a supplier of high currents of highly charged ions, which are further ionized by the electron beam and channeled into a good emittance, the electron beam simultaneously increasing the electron density in the EZR plasma, so that the gas density is reduced can be and the average state of charge in the plasma is increased.
  • all known embodiments of EZR ion sources can be combined with the electron beam.
  • the electrons in the immediate vicinity of this zero crossing must be generated with velocity vectors parallel to the magnetic field lines in such a way that they are directed towards the extraction electrode on the side of the zero crossing facing the extraction electrode and on the side facing away from the extraction electrode Side of the zero crossing are directed away from the extraction electrode. Since, in the case of a hybrid ion source, the actual plasma area continues to have an EZR character, in principle everyone can also use her known methods of introducing ionizing elements and support gases in EZR ion sources continue to be used and improved if necessary.
  • a metallic extraction electrode with an inner cylinder is preferably used, in which there is an inner channel, on the inner walls of which highly charged ions, which diverge outwards at the periphery of the ion beam, produce secondary electrons with high yield.
  • these compensate for the space charge in the ion beam by means of axial velocity components in the direction of the ion beam; on the other hand, they generate an intense electron beam between the extraction and plasma electrodes by passing through the extraction field, which electron beam is accelerated into the plasma with the potential difference between the plasma and extraction electrodes, so that the ion current accelerated from the plasma between the plasma and the extraction electrode is compensated for space charge.
  • the electron beam is compressed in the magnetic field of the EZR ion source, which converges axially in the direction of the plasma electrode, so that there is a very small-area extraction channel for highly charged ions from the EZR zone to the extraction electrode.
  • the uploaded ions in the area from the EZR zone to the plasma electrode are temporarily stored and further ionized.
  • the extraction electrode preferably has a cylindrical inner channel in which the inner diameter is about 2: 1 to 3: 1 in length.
  • the inner channel can also be designed slightly conical, with it narrowing or widening slightly in the direction of the ion beam. Combinations of straight cylinders, an expanding inner cone and a narrowing inner cone are also possible. These are supposed to are subsumed under the term "substantially cylindrical”.
  • the inner channel of the extraction electrode is advantageously preceded by a front surface surrounding the inlet bore to the inner channel and concave towards the plasma chamber.
  • the method can also be carried out in that, viewed in the direction of the ion beam, behind the extraction electrode front surface at the potential of the extraction electrode and concentrically around the ion beam, an intensive low-energy electron emission is directed parallel to the magnetic stray field lines there and concentrically towards the ion beam and axially towards the plasma electrode.
  • this compensates for the space charge in the ion beam behind the extraction electrode front surface and, on the other hand, an intense electron beam is generated between the extraction and the plasma electrode of an EZR ion source.
  • the electrons are advantageously generated by glow emission with a relatively high anode voltage and are re-opened if necessary slowed down low energy.
  • electrons are extracted in the desired direction of the magnetic stray lines by glow emission from heating wires arranged conically and about the axis through an anode grid likewise arranged conically. Between the anode grid and a likewise conically arranged braking or post-acceleration grid, they can be braked to a desired energy or post-accelerated. Overheating of the overall arrangement can be prevented by cooling the extraction electrode body.
  • the electrons can be generated by field emission from micropoint surfaces arranged conically around the axis, and if necessary they can be decelerated or post-accelerated between the anode surface of the micropoints and a conical braking or post-acceleration grid.
  • the cone geometry can be replaced by a non-rotationally symmetrical emission geometry for the generation of the electrons by glow emission as well as by field emission with microdots, as long as it is ensured that the electrons are guided onto the axis by the magnetic stray field lines or by an additional guide field in the direction of the plasma electrode. This guiding field should influence the ions as little as possible.
  • the electron beam from the extraction electrode into the plasma can be made so intense with active generation and so much energy can be introduced into the plasma that the coupled microwave power for maintaining the plasma can be reduced to low values, in the limit case even to zero, since the electron beam then the plasma itself is supported with magnetic confinement and, in the limit, even completely gets right.
  • a significant increase in brilliance and emittance can be achieved if the plasma electrode - even during operation - of the ion source can be moved mechanically, axially relative to the plasma chamber. Furthermore, it is advantageous if both the piasmal electrode, the extraction electrode and possibly also the electron generation can be moved axially independently of one another and with a different stroke relative to the magnetic field structure and to the plasma chamber of the ion source.
  • a further significant improvement in the principle of the invention can be achieved if special precautions are taken for the introduction of solid elements, in particular by improving the evaporation technique.
  • the material to be evaporated is usually locked in a metal cylinder with a small axial steam outlet opening. This cylinder is thermally insulated, inserted axially from the rear into the EZR source until it touches the rear EZR zone, whereby it is heated.
  • Evaporation cylinder is not to be understood specifically, but generally in the sense of a cylindrical shape.
  • the well thermally conductive arm, the z. B. is formed as a copper tube, is connected to a well-defined heat sink (cooling).
  • the evaporation cylinder can be equipped with thermocouples in the front, in the middle and in the back be equipped, which allow an accurate temperature measurement along its axis.
  • the measured temperature, ie the signal from the heat sensors, is used to regulate the axial feed of the cylinder, so that the desired temperature is set for the optimal evaporation rate of the material to be ionized.
  • the contact between the cylinder and the heat sink should be small for very high temperatures and large for low temperatures.
  • the evaporation cylinder can additionally be provided with a heating coil.
  • the evaporation cylinder can therefore also be placed up to a few decimeters behind the EZR zone on the axis, so that an axial atomic (molecular) steam jet is directed into the plasma chamber.
  • the evaporation cylinder can also be attached outside the axis of the ion source. This makes it possible to arrange several evaporation cylinders charged with different materials around the ion source axis, which allows the element to be ionized to be successively changed during operation of the ion source.
  • the evaporation container is preferably provided with a gas flow opening in the direction of the thermally conductive arm. This embodiment preferably applies to all designs of evaporation cylinders.
  • a two-stage ion source is also advantageously used, in which two plasma confinement zones are provided by a microwave-transparent, differential pump aperture axial hole for the plasma passage are separated from each other.
  • a pressure drop is thus formed between the two plasma confinement zones, so that the plasma diffuses from the first zone through the aperture hole into the second zone on the extraction side.
  • a soft iron support in the form of a coaxial disk lying in front of the coil with an outer diameter that exceeds that of the coil by about 5 cm and with a central bore for the extraction is selected, so that the magnetic field strength outside the iron structure drops as quickly as possible without suffering a zero crossing of the field sign.
  • the rear field maximum is generated either like the front field by a coil with iron support or by radially arranged permanent magnets supported by soft iron, whereby a zero crossing of the field sign may occur.
  • the soft iron in the latter The arrangement can consist of two concentric rings, the outer diameter of the outer coil exceeding that of the front coil by approximately 5 cm and the inner diameter of the inner one being adapted to the passage for the microwave and gas supply. A multiple of six radially magnetized permanent magnets is arranged between the two rings in such a way that the polygonal outer diameter of the inner ring is fully equipped with permanent magnets.
  • the permanent magnets can have the shape of cuboids or trapezoids, they can also be replaced by a radially magnetized ring. If the other dimensions vary accordingly, one of the two soft iron rings can be omitted.
  • the field strength of the maxima is thereby increased and the external stray fields of the overall arrangement are reduced in that a soft iron cylinder with the inner diameter of the outer diameter of the front coil and about 5 cm larger outer diameter effects the main magnetic connection from the front soft iron disc to the rear, outer soft iron ring.
  • a small part of the magnetic flux in this soft iron cylinder is deflected in the radial direction by appropriate shaping shortly behind the coil and in the same way in front of the rear, concentric soft iron rings by a relatively thin, coaxial soft iron disk with a large inner diameter. This creates magnetic shunts through which the field strength of the field minimum between the two maxima can be determined as desired.
  • the soft iron cylinder of the magnetic main circuit therefore has a smaller thickness in the middle than at both ends. The thickness difference for the river deflections in the radial direction changes into the thickness of the two soft iron disks.
  • the soft iron disks can be on their respective Front and rear sides are covered with current-carrying coils so that the field minimum can be varied electrically during operation of the ion source.
  • the radial field generated by these disks can be strengthened by radially magnetized permanent magnets which are inserted into the slides in a similar manner to that described for the rear, concentric rings.
  • the stray field should be significantly stronger than other interfering fields, e.g. the earth's magnetic field or the stray field of an ion-optical component.
  • the electrons For the space charge compensation of the ion beam on the side of the zero crossing facing away from the plasma, the electrons must be generated as just described, but on this side of the zero crossing.
  • a coaxial, as strong as possible multipole field made of permanent magnets was placed in direct contact with the outer wall of the plasma chamber, as was customary so far, in order to ensure the radial magnetic inclusion of the plasma.
  • This permanent magnet multipole field may only be supported by soft iron, i.e. be reinforced that the axial magnetic field described above is not disturbed or only in a well-controlled manner.
  • FIGS. 1a, 1b and 1c show a schematic structure of a first arrangement of an electron beam EZR hybrid ion source, with details in FIGS. 1a, 1b and 1c;
  • FIG. 2 shows a second embodiment, with details in
  • FIGS 3 and 4 further embodiments, each with details in Figures 3a, 3b and 3c and 4a;
  • Figure 5 shows a modified embodiment with two or more evaporation cylinders and with details in Figure 5a;
  • FIG. 6 shows an embodiment of an arrangement for compensating for the intrinsic rotation of the ion beam when braking.
  • Embodiment 1 (see FIGS. 1, 1a, 1b and 1c)
  • 1, 1a, 1b and 1c schematically show an ion source device for the generation and extraction of ion beams, which corresponds to the CAPRICE type, as is evident from the documents of the European patent 138 642.
  • a plasma is magnetically enclosed in a plasma zone 1.
  • the magnetic confinement of the plasma in the plasma zone 1 is in this case effected by two coaxial coils 2, which are located in a composite iron yoke 3 (3a to 3f), and a permanent multipole magnet (Quadru-, Hexa- or Octopol) 4.
  • coaxial discs 3a, 3b with central bores for the Ex are used as soft iron support for the coils traction or selected for the microwave inlet (tube 11) so that the magnetic field strength outside the iron structure drops as quickly as possible without suffering a zero crossing of the field sign.
  • a field strengthening is achieved at the microwave inlet by a soft iron ring 3f.
  • the field strength of the axial magnetic field 5 (represented schematically by the curve) is thereby increased and the external stray fields of the overall arrangement are reduced in that the outer soft iron cylinder 3c establishes the main magnetic connection between the soft iron disks 3a and 3b.
  • a small part of the magnetic flux in this soft iron cylinder is deflected in the radial direction by appropriate shaping on the inside of the coils by a relatively thin, coaxial soft iron disk 3d and 3e with a large inside diameter. This creates magnetic shunts through which the field strength of the field minimum 6 between the two maxima 7 and 8 can be determined as desired.
  • the outer soft iron cylinder 3c therefore has a smaller thickness in the middle than at its two ends. The difference in thickness for the flow deflections in the radial direction changes into the thickness of the two soft iron disks.
  • the plasma zone 1 is enclosed by a cylindrical plasma chamber 9 designed as a partial cylinder. High-temperature metals, ceramics or quartz are used for this.
  • a plasma chamber made of electrically conductive material is separated from the soft iron yoke 3 and the multipole magnet 4 by an insulation layer 10.
  • the microwave power is coupled into the plasma chamber 9 through the coaxial tube 11.
  • a pipe 22, preferably made of copper, is inserted concentrically to the pipe 11 and can be moved axially.
  • a cylindrical ver Steaming container 20 is fitted with the help of a casing 21 at the end of the tube 22, as can also be seen from FIGS. 1b and 1c.
  • the sheath 21 of the cylindrical evaporation container 20 and the support tube 22 assume the role of the inner conductor of a microwave coaxial line, the outer sheath of which forms the tube 11, ie the microwave power is thus coupled into the plasma chamber 9.
  • the plasma chamber 9 is closed off by a pierced plasma electrode 12. Furthermore, there is an extraction electrode 13 which has a hollow, cylindrical shape and the end 13 'of which is solid with a cylindrical inner channel 15.
  • the extraction electrode 13 lies opposite the plasma electrode 12 at a negative potential, so that a so-called pulling field is formed between these two electrodes, which extracts an ion beam 16 through the plasma electrode 12 from the plasma 1 created by the coupling of the microwave power, which then forms the inner channel 15 of the Extraction electrode 13 penetrates; the inner channel can therefore also be referred to as an extraction channel.
  • the extraction electrode 13 is axially movable relative to the plasma electrode 12. In order to achieve this mobility, a vacuum-tight bellows 14 is provided for the corresponding
  • Parts of the ion source device are arranged, as can be seen from FIG. 1.
  • FIG. 1 a shows the situation in an enlarged view.
  • the axially drilled inner channel 15, through which the ion beam 16 passes, is designed as an elongated cylinder jacket or as a weak, positive or negative cone, the length being centered behave like 2: 1 to 3: 1.
  • the front surface 17 of the extraction electrode 13 is made concave in the region up to approximately three times the bore diameter, the radius of curvature of the concavity corresponding approximately to three to five times the radius of the inner channel 15.
  • Parts of the diverging ion beam 16 hit the inner wall of the inner channel 15 and generate there a number of very low-energy secondary electrons, corresponding to approximately q 2 , which increases rapidly with the charge of the ions.
  • These secondary electrons have radial but also axial speed components.
  • Another part of the secondary electrons with velocity components in the direction of the ion beam 16 runs with the ion beam and compensates for its space charge in the area 19 up to the next ion-optical component.
  • This space charge compensation in region 19 largely prevents and prevents the Coulomb explosion of the very intense ion beam after the extraction thus also improving its emittance and brilliance.
  • FIG. 1b and 1c show examples of evaporation containers 20.
  • the cylinders are inserted axially into the plasma chamber 9 from behind. They are each supported by a jacket 21 and a heat-conducting tube 22 as an arm, which is connected at its rear end 23 to a heat sink (cooling) in order to generate a well-defined heat loss at the rear end of the evaporation container 20.
  • the heat-conducting tube 22 is preferably made of copper.
  • thermocouples 25 are attached along the evaporation container 20, which not only allow temperature reading, but also allow the axial, motorized feed of the evaporation container 20 to be controlled by means of an electronic control circuit in comparison with a setpoint temperature, as in FIG 1 schematically outlined.
  • a corresponding signal can be generated via a differential amplifier (not shown).
  • the evaporation container 20 is shown in FIG. 1b as a closed container (first embodiment) with a small opening 26 for the steam outlet in the direction of the plasma. In FIG. 1c (second embodiment), it also has a second opening 27 at the rear end, through which an additional gas can flow through the evaporation container from behind during operation.
  • Embodiment 2 see FIGS. 2 and 2a
  • FIG. 2 schematically shows a two-stage ion source device which doubles the principle of the CAPRICE type ion source according to FIG. 1.
  • a plasma chamber 9 two plasma zones 1 'and 1 "are formed with different pressures.
  • the rear zone 1" has the higher pressure and therefore has a plasma zone with a lower mean state of charge in the plasma, while the front zone 1' has the lower pressure and therefore has a higher mean state of charge of the plasma in the plasma zone 1 '.
  • the plasma chamber 9 is separated into the two areas by a differential pump aperture 30, which is partially transparent to the microwave. Pumping takes place on the (left) extraction side. The gas or vapor to be ionized is admitted from the rear (right).
  • this ion source is realized in comparison to that in FIG. 1 by an elongated soft iron yoke 31, by three coils 32 and by two multipole permanent magnets 33.
  • the cylindrical wall of the extraction electrode 13, which is movable in the axial direction, is broken through in such a way that a heat-resistant, electrically insulating body 35, which is shaped in this way, can be fastened in the interior of the extraction electrode 13 in a fixed position 34 relative to the soft iron yoke 31 of the ion source and is drilled to allow wires to be clamped onto three electrically separated cone surfaces 36, 37, and 38.
  • the wires can be clamped in a spiral or, as here, in planes parallel to the axes.
  • a potential protection 39 on the isolating body 35 ensures that they run through it de ion beam 16 is always exposed to the potential of the extraction electrode.
  • the wire of the cone surface 36 is heated and so this cone surface is used as a hot cathode grid for electron emission of the energy U K eV.
  • the wire on the cone surface 37 is charged to positive voltage U A , so that a conical anode grid for the increased extraction of the electrons from the hot cathode grid with an electron energy of e • (
  • the wire on the cone surface 38 is at the same potential U E as the extraction electrode 13 and thus forms a conical brake grid, so that the electrons pass through this grid with the final energy e ⁇ U K eV.
  • an intensive electron emission of about 10 to 400 eV energy can be generated actively, concentrically around the ion beam and perpendicular to the conical lattice surfaces in such a way that the electron velocity vectors are approximately parallel or antiparallel to the magnetic stray field lines of the ion source if the opening angles of the conical ones Grids are adapted to the local magnetic lines.
  • the electrons generated in this way follow the magnetic field lines into the plasma 1, where they converge on spiral paths around these magnetic field lines up to the maximum of the axial magnetic field to a minimum electron beam diameter and then diverge again and at the same time accelerate from the extraction electrode surface 17 to the plasma electrode 12 in the pulling field of the ions become.
  • the ion beam 16 accelerated from the plasma is offered in the entire superimposed area by the electron beam 18 an extraction channel which compensates for space charge and which increases its brilliance.
  • a cooling 28 of the extraction electrode 13 is provided in order to prevent the glu to dissipate heat developed.
  • the electron generation described in FIG. 2a is attached as close as possible to this component in FIG. arranged at a great distance from the plasma electrode 12, where the magnetic stray field components of the ion source just outweigh other stray fields and thus ensure a well-defined electron beam.
  • the concentric and rotationally symmetrical electron generation can be replaced by asymmetrical electron generation on one side of the axis if the magnetic guidance of the electrons ensures that the Electrons converge towards the axis of the ion source and, especially in the extraction area between the extraction electrode 13 and the plasma electrode 12 in the area near the axis, offer an extraction channel and a space charge compensation for the ions.
  • Embodiment 3 (see FIGS. 3, 3a, 3b and 3c)
  • FIG. 3 shows a magnetic field configuration and the resulting axial magnetic field component 40 on the axis, in which the left magnetic field maximum 41 is generated by a current-carrying coil 42 and the right magnetic field maximum 43 by permanent magnets 44 arranged radially over the entire circumference, with a zero crossing of the field sign takes place.
  • a multiple of six radially magnetized permanent magnets 44 is arranged between the two rings 45 and 46 such that the polygonal outer diameter of the inner ring is fully equipped with permanent magnets.
  • the permanent magnets 44 can have the shape of cuboids or trapezoids, they can also be replaced by a radially magnetized ring. With a corresponding variation of the other dimensions, one of the two soft iron rings 45 or 46 can be omitted.
  • the arrangement is completed by a permanent multipole magnet 53 for radial, magnetic confinement of the plasma.
  • micropoint arrangement 48 As can be seen from FIG. 3a, electrons can be actively generated in the interior of the extraction electrode 13 on a cone jacket analogous to embodiment 2. In contrast to embodiment 2, the electrons are not generated here by glow emission, but with a so-called micropoint arrangement 48, as shown enlarged in FIG. 3a.
  • Such a micropoint arrangement 48 consists of approximately 1 ⁇ m conical tips 49 at intervals of 10 ⁇ m, so that there are 10,000 micropoints per mm 2 .
  • Such a construction is known from the publications such as follows: CA Spindt, I. Brodie, L.
  • the electron generation described in FIG. 3a is placed as close as possible to this component, that is to say arranged at a great distance from the plasma electrode 12, so that the overlapping region of the ion beam 16 and electron beam 18 fills the entire space near the axis up to the first ion-optical component.
  • the opening angle of the Electron production cone is adapted to the direction of the magnetic stray field components in this area.
  • the evaporation container 20 in this example is actively heated by a heating coil 54, as is shown enlarged in FIG. 3c. You will z. B.
  • exemplary embodiment 1 carried by a cylindrical ceramic holder 55 with a furrow spiral 56. Otherwise, all the essential features of exemplary embodiment 1 are obtained, as were explained with reference to FIGS. 1b and 1c.
  • the current is supplied by a single supply line 57, because the return line is taken over by the conductive sheathing 21 of the ceramic cylinder 55 and by the heat-conducting carrier tube 22.
  • Embodiment 4 (see FIGS. 4 and 4a)
  • the exemplary embodiment according to FIG. 4 schematically shows an embodiment in which the front 60 (in the sketch on the left) and the rear magnetic field maximum 61 for the axial inclusion of the plasma 1 are generated by radially magnetized permanent magnets 62.
  • the radial permanent magnets are embedded in concentric soft iron rings 63 and 64 for the front maximum and 65 and 66 for the rear maximum so that the polygonal outer diameter of the inner rings and the polygonal inner diameter of the outer rings are fully equipped with permanent magnets.
  • the permanent magnets 62 can take the form of cuboids or
  • Trapezoids they can also be replaced by a radially magnetized ring. With a corresponding variation of the other radial dimensions, either the outer or the inner soft iron ring can be omitted.
  • a soft iron cylinder 3c serves as a mechanical spacer and as the main magnetic circuit of the overall arrangement.
  • a permanent multipole magnet 68 again ensures the magnetic radial confinement of the plasma 1.
  • the soft iron rings and their fitting with radial permanent magnets on the extraction side are significantly longer than on the back of the ion source, with a ratio of 1: 0.8 to 1: 1.2 between the inner diameter of the inner ring 63 and its axial length is desirable.
  • the resultant lower axial field gradient in the region of the zero crossing of the sign of the axial magnetic field component 69 is used profitably for the arrangement of an active electron production which is concentric about the axis and takes place on a cone surface with a suitable opening angle, as shown in FIG 4a is shown enlarged.
  • 3a of embodiment 3 is chosen in a double arrangement, mirror-symmetrical to the zero crossing, "once with the cone 70 opening towards the plasma and once with the cone 71 opening in the opposite direction.
  • the two microdot cones with respective anode and brake grids 51 are carried by a common carrier body 72 made of any heat-resistant material (preferably ceramic) and centered exactly on the zero crossing, for this purpose the carrier body is mechanically fixed to the soft iron structure via a metallic cylinder 73, via insulation elements 74 and via a holder 75 connected to the ion source, the carrier body 72 and the Zy Linder 73 are electrically connected to the brake grids 51 and the extraction electrode 13.
  • This arrangement of electron generation compensates for the space charge of the ion beam 16 in the region from the zero crossing to the plasma electrode 12 by the electron beam 18 and in the region from the zero crossing to the next ion-optical component by the electron beam 76.
  • the resulting improved brilliance of the ion source can be further optimized by varying the axial position of the plasma electrode 77 and independently of the extraction electrode 78. This is necessary because the electron generation and the magnetic field configuration are fixed in space and time by permanent magnets and therefore only these mechanical variations are available for optimization.
  • the microwave supply with its vacuum window 81 is schematically indicated here for longer microwave lengths with a Lecher line 82, the two conductors being shown next to one another in FIG. 4, but in reality are supposed to lie one behind the other.
  • Embodiment 5 (see FIGS. 5 and 5a)
  • the exemplary embodiment according to FIG. 5 schematically shows a magnetic field configuration equivalent to exemplary embodiment 4, as is evident from the similarity of the course of the FIG axial magnetic field component on the axis 90 with the course 69 shown in FIG. However, it differs significantly in that an iron-free design, which is only constructed with permanent magnets, is shown.
  • the radially magnetized permanent magnet rings embedded in soft iron in FIG. 4 are arranged here in direct contact with the outer wall (including insulation and possible cooling) of the plasma chamber 91 to 93.
  • the front ring which is attached in the area of the extraction, is in two rings 92 and 93 divided, wherein the ring 92 can have a larger inner diameter than the ring 93, which are separated by a space 94, so as to bring about a minimum of the positive slope of the axial magnetic field component 90 in the region of the electron generation 95.
  • additional, radially magnetized permanent magnet rings 96 and 97 have to be attached here, which reduce the field of the permanent magnet main rings 91 to 93 to the center in such a way that their strength and position reduce the depth of the magnetic field minimum 98, relative to the front maximum 110 and to the rear maximum 111 of the magnetic mirror field.
  • composition of the radially magnetized permanent magnet rings can be carried out as in exemplary embodiment 4 or using adhesive technology.
  • the axial magnetic structure is again supplemented by a permanent multipole magnet 99 for the radial confinement of the plasma 1.
  • FIGS. 4 and 4a The small axial field gradient caused by the gap 94 between the radially magnetized permanent magnet rings 92 and 93 at the zero crossing of the sign of the axial magnetic field component 90 (further simply called zero crossing) is analogous to FIGS. 4 and 4a is also used here profitably for the arrangement of active electron generation which is concentric about the axis and takes place on a cone surface with a suitable opening angle, as is shown enlarged in FIG. 5a.
  • Electron generation with glow emission according to FIG. 2a of embodiment 2 is selected here in a double arrangement, mirror-symmetrical to the zero crossing, one with opening of the
  • the two glow emission cones 102 with respective anode 103 and brake grids 104 are carried by a common carrier body 105 made of any high-temperature-resistant material (preferably ceramic) and centered exactly on the zero crossing.
  • the carrier body 105 is mechanically connected to the soft iron structure of the ion source via a metallic cylinder 106, via insulation elements 107 and via a holder 108, the carrier body 105 and the cylinder 106 being electrically connected to the brake grids 104 and the extraction electrode 13.
  • This arrangement of electron generation compensates for the space charge of the ion beam 16 in the region from the zero crossing to the plasma electrode 12 by the electron beam 18 and in the region from the zero crossing to the next ion-optical component by the electron beam 76.
  • the resulting improved brilliance of the ion source can be further optimized by varying the axial position of the plasma electrode 77 and independently of the extraction electrode 78.
  • FIG. 5 also schematically shows how at the same time a plurality of evaporation containers 20, actively heated by heating coils and charged with different substances, outside the actual ion source body with the steam direction into the plasma 1 and with steam jet valves len 109 can be attached. It is thus possible to change the vapor material and recharge the evaporation containers while the ion source device is operating.
  • Axis of the ion source device is and the coupling location can be freely selected between the permanent magnet rings 96 and 97.
  • the incident microwave power can be coupled out again on the opposite one, or can be reflected in a manner adapted in such a way by a rectangular waveguide piece 86 with a movable closing piston 87 that a standing wave with a field maximum arises on the axis of the plasma chamber.
  • the same standing microwave with a field maximum on the axis of the plasma chamber can also be achieved actively by symmetrically supplying two identical microwave powers with corresponding phase adaptation from above 84 and from below 86 in FIG.
  • the rectangular waveguide 88 and thus also the microwave coupling can take place at angles other than 90 degrees to the axis of the plasma chamber, so that the field maximum not only on the axis but also e.g. is forced near the front resonance zone 89.
  • microwave supply from three radial directions offset by 120 degrees with corresponding phase adjustments of 120 degrees each a maximum electrical field vector rotating about the ion source axis can be generated on the ion source axis.
  • Plasma chamber of approximately less than 0.59 of the wavelength of the microwave used.
  • microwave resonances in the plasma chamber and thus not only unstable functional areas of the ion source, but also the axial microwave power transport to cyclotron resonance areas outside the multipole magnet are reduced.
  • a standing microwave with an electric field maximum is almost achieved on the axis of the ion source by reflection on the opposite plasma chamber wall.
  • Embodiment 6 (see FIG. 6)
  • the exemplary embodiment 6 according to FIG. 6 shows schematically the braking of an ion beam 120 in a system of five pierced electrode disks 121 to 125, to which a magnetic field is superimposed with the aid of a coil 127 supported by a soft iron yoke 126.
  • the ion beam 120 which originally comes from the right with 20q keV beam energy, is focused at point 128 and then passes through the five electrodes which are on the in
  • Figure 6 potentials are, and will be braked to the final energy of 1q keV and focused at point 129.
  • q is the charge of the ions in the ion beam.
  • the shape and the axial position of the course of the axial magnetic field component 130 shown are chosen so that the still high-energy ion beam enters the magnetic field in such a way that it experiences a strong inherent rotation due to the radial components of the increasing magnetic field 130 which are necessarily present and which emerge from the Magnetic field with lower energy is only partially reversed. 6, a well-defined self-rotation of the ion beam about its own axis is generated, which depends on the shape and the axial position of the magnetic field and the deceleration factor depend..
  • the beam rotation generated in this way can be made the same in sign and strength in exactly the opposite direction as the beam's own rotation, as the ion beam 120 incident from the right has due to its acceleration of extraction from areas with radial magnetic field components of the ion source.
  • the net result after the deceleration of the ion beam is therefore an ion beam 131 without self-rotation and thus an ion beam with better emittance and brilliance.
  • the extraction electrode (13) has a substantially cylindrical inner channel (15), in which preferably the inner diameter is about 2: 1 to 3: 1 to the length;
  • the inner channel (15) of the extraction electrode is preceded by a front surface (17) surrounding the inlet bore to the inner channel and concave towards the plasma chamber, which preferably has a radius of curvature which corresponds to three to five times the inner diameter of the inner channel (15);
  • micropoint surfaces (48) suitable for field emission are arranged concentrically and conically around the axis of the extraction electrode, from which electrons can be extracted by means of a drawing voltage between the micropoints (49) and the associated anode hole matrix (50);
  • the evaporation container (20) consists of heat-resistant material, is provided with a steam outlet opening (26), and with the help of a jacket (21) at the end of a heat-conducting arm (22)
  • the other end (23) can be cooled and with which the evaporation container (20) with its casing (21) can be displaced in the vicinity of an EZR zone (24) located in the plasma chamber;
  • the arm is a thermally conductive tube (22), preferably of the same diameter as the casing (21) of the evaporation container (20);
  • a heating device preferably consisting of heating coil (s) (54);
  • That the evaporation tank (20) is an evaporation cylinder made of a ceramic carrier cylinder the (55) is surrounded, which in turn carries the heating coil (54), and that the current is supplied via a wire (57) and the current is discharged via the casing (21) and the support arm designed as a tube (22);
  • That the plasma chamber (9) of a two-stage ion source device is divided into two plasma areas (1 'and 1 ") by a perforated aperture that is as transparent as possible for microwaves and as tight as possible for gas, the plasma from the first area
  • Ion source device characterized in that the radially magnetized permanent magnets (62) packed between soft iron rings (63) and (64) are replaced by a radially magnetized permanent magnet ring with an outer soft iron ring, the inside diameter of the permanent magnet ring changing to its length as less than 1: 0. 6 behaves;
  • the soft iron support of the magnetic field generation in the interior is equipped with two soft iron disks (3d) or (3e) for the purpose of magnetic shunt, which are to be dimensioned so that the magnetic field minimum (6,52,67,98) the desired value relative to the magnetic field maxima (7.41.60.99) or (8.43.61.100);
  • Field vector perpendicular to the ion source axis is coupled into a plasma chamber, the metallic inner diameter of which is chosen to be less than 0.59 times the microwave length in a vacuum, so that the microwave is reflected on the cylinder wall opposite the coupling and thus a standing wave with maximum amplitude near the plasma chamber axis arises;
  • Partial waves are chosen so that a standing microwave with a field maximum is formed on the ion source axis in the plasma range;
  • Rectangular waveguides attached to the ion source axis are radially coupled into the plasma chamber between the poles of the permanent multipole magnet, the phase position of the N partial waves being selected so that a standing microwave with an electric field maximum is formed on the ion source axis in the plasma region, the electric field vector of which rotates with the microwave frequency around the ion source axis ;
  • the microwave power is coupled radially into the plasma chamber with rectangular waveguides between the poles of the permanent magnet dipole magnet, the axes of the rectangular waveguides taking an angle other than 90 degrees with respect to the axis of the ion source;
  • the plasma chamber is designed in the entire area of the magnetic structure as a continuous, metal-coated, microwave-transparent quartz or ceramic tube, which at the same time assumes the vacuum window function for the microwave supply;
  • isolation circuit 20 evaporation container - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - -
  • Magnetic field profile 50 Anode matrix 41 Magnetic field maximum 51 Brake grid 42 Coil 52 Magnetic field minimum 43 Magnetic field maximum 53 Multipole magnet 44 Radial permanent magnet. 54 Heating winding 45 Soft iron inner ring 55 Ceramic body 46 Soft iron outer ring 56 Furrow spiral 47 Auxiliary coils 57 Power supply 48 Electron generation 49 Micropoint cone - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - -

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

L'invention concerne une chambre à plasma (5) dans laquelle on fait le vide nécessaire pour pouvoir produire du plasma et dans laquelle les micro-ondes sont introduites, une électrode à plasma (10) et une électrode d'extraction (13) à travers lesquelles les ions produits sont extraits du plasma. Un champ d'extraction est généré entre l'électrode à plasma et l'électrode d'extraction, en raison de la différence de tension (environ 20 kV). La chambre à plasma (5) est munie d'un ou de plusieurs four(s) d'évaporation de matière (8) qui permettent de produire des plasmas et ainsi des ions de n'importe quels éléments. Un faisceau électronique (12) lancé de manière électrique ou magnétique, produit dans l'électrode d'extraction (13), est superposé au faisceau ionique (11) provenant de la chambre à plasma et traversant l'électrode à plasma et l'électrode d'extraction (10 et 13), de manière qu'il se forme un canal d'extraction avec compensation de charge d'espace pour les ions.
PCT/EP1993/002047 1992-08-08 1993-07-30 Procede de production de faisceaux de n'importe quels ions hautement charges, de faible energie cinetique et dispositif de mise en ×uvre dudit procede WO1994003919A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU47055/93A AU4705593A (en) 1992-08-08 1993-07-30 Process and device for generating beams of any highly charged ions having low kinetic energy

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE19924226299 DE4226299A1 (de) 1992-08-08 1992-08-08 Verfahren zur Erzeugung von Strahlen beliebiger, hochgeladener Ionen niedriger kinetischer Energie sowie Vorrichtung zur Durchführung des Verfahrens
DEP4226299.2 1992-08-08
DE9308049 1993-05-28
DEG9308049.2U 1993-05-28

Publications (1)

Publication Number Publication Date
WO1994003919A1 true WO1994003919A1 (fr) 1994-02-17

Family

ID=25917347

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP1993/002047 WO1994003919A1 (fr) 1992-08-08 1993-07-30 Procede de production de faisceaux de n'importe quels ions hautement charges, de faible energie cinetique et dispositif de mise en ×uvre dudit procede

Country Status (2)

Country Link
AU (1) AU4705593A (fr)
WO (1) WO1994003919A1 (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995019640A1 (fr) * 1994-01-13 1995-07-20 Ims Ionen Mikrofabrikations Systeme Gesellschaft M.B.H. Systeme projecteur de particules chargees
DE19933762A1 (de) * 1999-07-19 2001-02-01 Andrae Juergen Gepulste magnetische Öffnung von Elektronen-Zyklotron-Resonanz-Jonenquellen zur Erzeugung kurzer, stromstarker Pulse hoch geladener Ionen oder von Elektronen
FR2883410A1 (fr) * 2005-03-21 2006-09-22 Commissariat Energie Atomique Source de photons comprenant une source de plasma d'ions multicharges a la resonance cyclotron electronique.
CN102117727A (zh) * 2011-01-25 2011-07-06 北京大学 一种电子回旋共振离子源
DE102019111908A1 (de) * 2019-05-08 2020-11-12 Dreebit Gmbh ECR-Ionenquelle und Verfahren zum Betreiben einer ECR-Ionenquelle
CN112424901A (zh) * 2018-07-10 2021-02-26 能源环境和技术研究中心 用于回旋加速器的低腐蚀内部离子源

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB892344A (en) * 1959-03-18 1962-03-28 Nat Res Dev Ion source
JPS60243953A (ja) * 1984-05-18 1985-12-03 Hitachi Ltd 同軸型マイクロ波イオン源
EP0252845A1 (fr) * 1986-07-10 1988-01-13 Commissariat A L'energie Atomique Source d'ions à résonance cyclotronique électronique
EP0374011A1 (fr) * 1988-12-08 1990-06-20 Commissariat A L'energie Atomique Procédé et dispositif utilisant une source RCE pour la production d'ions lourds fortement chargés

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB892344A (en) * 1959-03-18 1962-03-28 Nat Res Dev Ion source
JPS60243953A (ja) * 1984-05-18 1985-12-03 Hitachi Ltd 同軸型マイクロ波イオン源
EP0252845A1 (fr) * 1986-07-10 1988-01-13 Commissariat A L'energie Atomique Source d'ions à résonance cyclotronique électronique
EP0374011A1 (fr) * 1988-12-08 1990-06-20 Commissariat A L'energie Atomique Procédé et dispositif utilisant une source RCE pour la production d'ions lourds fortement chargés

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
MORITO MATSUOKA ET AL.: "A NEW SPUTTERING-TYPE ELECTRON CYCLOTRON RESONANCE MICROWAVE PLASMA USING AN ELECTRIC MIRROR AND HIGH-RATE DEPOSITION", JOURNAL OF APPLIED PHYSICS., vol. 65, no. 11, 1 June 1989 (1989-06-01), NEW YORK US, pages 4403 - 4409, XP000140127, DOI: doi:10.1063/1.343279 *
PATENT ABSTRACTS OF JAPAN vol. 10, no. 104 (E - 397)<2161> 19 April 1986 (1986-04-19) *
STÖCKLI ET AL.: "THE STATUS OF THE ELECTRON BEAM ION SOURCES", ZEITSCHRIUFT FUR PHYSIK D (SUPPLEMENT), vol. 21, September 1991 (1991-09-01), pages S111 - S115 *

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995019640A1 (fr) * 1994-01-13 1995-07-20 Ims Ionen Mikrofabrikations Systeme Gesellschaft M.B.H. Systeme projecteur de particules chargees
DE19933762A1 (de) * 1999-07-19 2001-02-01 Andrae Juergen Gepulste magnetische Öffnung von Elektronen-Zyklotron-Resonanz-Jonenquellen zur Erzeugung kurzer, stromstarker Pulse hoch geladener Ionen oder von Elektronen
DE19933762C2 (de) * 1999-07-19 2002-10-17 Juergen Andrae Gepulste magnetische Öffnung von Elektronen-Zyklotron-Resonanz-Jonenquellen zur Erzeugung kurzer, stromstarker Pulse hoch geladener Ionen oder von Elektronen
FR2883410A1 (fr) * 2005-03-21 2006-09-22 Commissariat Energie Atomique Source de photons comprenant une source de plasma d'ions multicharges a la resonance cyclotron electronique.
WO2006100217A1 (fr) * 2005-03-21 2006-09-28 Commissariat A L'energie Atomique Source de photons comprenant une source de plasma ionique a charges multiples a resonance cyclotronique electronique
CN102117727A (zh) * 2011-01-25 2011-07-06 北京大学 一种电子回旋共振离子源
CN112424901A (zh) * 2018-07-10 2021-02-26 能源环境和技术研究中心 用于回旋加速器的低腐蚀内部离子源
CN112424901B (zh) * 2018-07-10 2024-02-13 能源环境和技术研究中心 用于回旋加速器的低腐蚀内部离子源
DE102019111908A1 (de) * 2019-05-08 2020-11-12 Dreebit Gmbh ECR-Ionenquelle und Verfahren zum Betreiben einer ECR-Ionenquelle
DE102019111908B4 (de) 2019-05-08 2021-08-12 Dreebit Gmbh ECR-Ionenquelle und Verfahren zum Betreiben einer ECR-Ionenquelle
US11094510B2 (en) 2019-05-08 2021-08-17 Dreebit Gmbh ECR ion source and method for operating an ECR ion source
EP3737214B1 (fr) * 2019-05-08 2022-08-10 Dreebit GmbH Source d'ions ecr et procédé de fonctionnement de cette source d'ions ecr

Also Published As

Publication number Publication date
AU4705593A (en) 1994-03-03

Similar Documents

Publication Publication Date Title
DE3803355C2 (fr)
DE69019741T2 (de) Ionenstrahlkanone.
DE69304336T2 (de) Plasmamotor geringer länge mit geschlossenem elektronendrift
Oks et al. Elevated ion charge states in vacuum arc plasmas in a magnetic field
DE3789618T2 (de) Ionenerzeugende apparatur, dünnschichtbildende vorrichtung unter verwendung der ionenerzeugenden apparatur und ionenquelle.
DE2039832A1 (de) Verfahren und Vorrichtung zum Beschleunigen von Teilchen
US5266146A (en) Microwave-powered plasma-generating apparatus and method
CH696972A5 (de) Vorrichtung zur Kathodenzerstäubung.
DE69112166T2 (de) Plasmaquellenvorrichtung für Ionenimplantierung.
DE3586176T2 (de) Mikrowellenelektronenkanone.
Sortais Recent progress in making highly charged ion beams
EP1222677B1 (fr) Source ionique a flux electronique
DE3424449A1 (de) Quelle fuer negative ionen
WO1994003919A1 (fr) Procede de production de faisceaux de n&#39;importe quels ions hautement charges, de faible energie cinetique et dispositif de mise en ×uvre dudit procede
US4757237A (en) Electron cyclotron resonance negative ion source
Friedman et al. Electron accelerators driven by modulated intense relativistic electron beams
DE69737461T2 (de) Magnetische vorrichtung, insbesondere fuer elektronzyklotronresonanzionenquellen, die die erzeugung geschlossener oberflaechen mit konstanter magnetfeldstaerke b und beliebiger groesse ermoeglichen
DE4226299A1 (de) Verfahren zur Erzeugung von Strahlen beliebiger, hochgeladener Ionen niedriger kinetischer Energie sowie Vorrichtung zur Durchführung des Verfahrens
DE1084390B (de) Ionenquelle mit einem Hochfrequenzfeld
DE4419970A1 (de) Vorrichtung zur Erzeugung von Strahlen hochgeladener Ionen
JP3039985B2 (ja) 多量体イオン発生用マイクロ波イオン源、及びこのイオン源を用いたイオンビーム照射装置
EP1450389B1 (fr) Source d&#39; ions multimode avec une structure du genre cathode creuse à pulvérisation à extraction ionique radiale.
DE2020998C3 (de) Verfahren und Vorrichtung zum Trennen von Isotopen durch Zentrifugieren
Okamura Laser ion source for high brightness heavy ion beam
DE3586239T2 (de) Hochfrequenzplasmagenerator.

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AU BB BG BR CA CZ FI HU JP KP KR LK MG MN MW NO PL RO RU SD SK US

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase

Ref country code: CA