WO1993013110A1 - Jodoniumsalze und verfahren zu deren herstellung - Google Patents
Jodoniumsalze und verfahren zu deren herstellung Download PDFInfo
- Publication number
- WO1993013110A1 WO1993013110A1 PCT/EP1992/002932 EP9202932W WO9313110A1 WO 1993013110 A1 WO1993013110 A1 WO 1993013110A1 EP 9202932 W EP9202932 W EP 9202932W WO 9313110 A1 WO9313110 A1 WO 9313110A1
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- WO
- WIPO (PCT)
- Prior art keywords
- radical
- formula
- carbon atoms
- atoms per
- oxygen atom
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
Definitions
- the invention relates to new iodonium salts and a process for their preparation.
- Photoactive diaryl iodonium salts are disclosed in US-A 4,264,703, US-A 4,279,717, US-A 4,399,071, US-A 4,617,238 and
- EP-A 334 056 are used as photoinitiators for the polymerization of cationically polymerizable organic substances, e.g. Epoxides, vinyl ethers, organopolysiloxanes containing epoxy groups, organopolysiloxanes containing vinyloxy groups and olefins are used.
- cationically polymerizable substances are non-polar to slightly polar, especially if the polymerizable groups in
- the object was to provide photoactive iodonium salts which can be used as photoinitiators for the polymerization of cationically polymerizable organic substances and which are soluble in these substances.
- the object is achieved by the invention.
- the invention relates to iodonium salts of the general formula
- E is a radical of the formula -OR 2 ,
- y 0 or 1, preferably 1,
- R is a divalent hydrocarbon radical with 1 to 18 carbon atoms per radical, which is optionally interrupted by at least one oxygen atom and / or a sulfur atom and / or a carboxyl group,
- R 1 is a monovalent hydrocarbon radical with 1 to 18 carbon atoms per radical, which is optionally interrupted by at least one oxygen atom,
- R 2 is a monovalent hydrocarbon radical having 1 to 18 carbon atoms per radical, which is optionally interrupted by at least one oxygen atom, and
- R 3 denotes a monovalent hydrocarbon radical with 1 to 10 carbon atoms per radical, which is optionally interrupted by at least one oxygen atom and / or one sulfur atom,
- E and F each represent a radical bonded to the benzene ring in the 2-, 3-, 4-, 5- or 6-position, and the radicals E and F have the meaning given above for this, d 0, 1 or 2
- X- a tosylate anion or a weakly nucleophilic or non-nucleophilic anion Y- selected from the group of
- aromatic hydrocarbon radicals C are the phenyl, naphthyl and anthryl radical.
- aromatic hydrocarbon radicals C containing at least one oxygen and / or sulfur atom are the 2-furyl, 3-furyl, 2-thienyl and 3-thienyl radicals.
- the radical A is preferably a radical of the formula
- D, E and F each represent a radical bonded to the benzene ring in the 2-, 3-, 4-, 5- or 6-position
- divalent hydrocarbon radical R examples include -CH 2 -, - (CH 2 ) 2 -, -C (H 2 ) 3 -, - (CH 2 ) 4 - and - (CH 2 ) 6 -.
- divalent hydrocarbon radical R which is interrupted by at least one oxygen atom and / or sulfur atom and / or a carboxyl group are
- hydrocarbon radicals R 1 are alkyl radicals, such as the methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso-butyl, tert-butyl, n-pentyl, iso-pentyl -, neo-pentyl, tert-pentyl; Hexyl radicals, such as the n-hexyl radical; Heptyl residues, such as the n-heptyl residue; Octyl radicals, such as the n-octyl radical and iso-octyl radicals, such as the 2,2,4-trimethylpentyl radical;
- Nonyl radicals such as the n-nonyl radical; Decyl residues like that
- n-decyl radical n-decyl radical
- Dodecyl radicals such as the n-dodecyl radical and octa-decyl radicals, such as the n-octadecyl radical.
- hydrocarbon radicals R 1 interrupted by at least one oxygen atom are alkoxyalkyl radicals, such as -CH 2 CH 2 OCH 3 , -CH 2 CH 2 OCH 2 CH 3 and -CH 2 CH 2 OCH 2 CH 2 CH 2 CH 3 .
- All three radicals R 1 bonded to the Si atom preferably contain 3 to 25 aliphatic carbon atoms,
- radicals R 1 apply in full to the radicals R 2 .
- hydrocarbon radicals R 3 are alkyl radicals, such as the methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso-butyl, tert-butyl, n-pentyl, iso-pentyl -, neo-pentyl, tert-pentyl; Hexyl radicals, such as the n-hexyl radical; Heptyl residues, such as the n-heptyl residue; Octyl radicals, such as the n-octyl radical and iso-octyl radicals, such as the 2,2,4-trimethylpentyl radical;
- Nonyl radicals such as the n-nonyl radical and decyl radicals such as the n-decyl radical; Aryl radicals, such as the phenyl radical.
- hydrocarbon radicals R 3 interrupted by at least one oxygen atom and / or sulfur atom are -CH 2 CH 2 OCH 3 , -CH 2 CH 2 OCH 2 CH 3 and -CH 2 CH 2 SCH 2 CH 3 .
- radicals E are the methoxy radical, ethoxy radical and n-butoxy radical.
- radicals F are the methyl, ethyl, propyl, 2-methylpropyl and the n-butyl radical.
- residues A are (CH 2 ) 3 SiMe 2 Et (CH 2 ) 3 SiMeBu 2 CH 2 ) 3 SiMeOCt 2
- Me means methyl radical, ethyl radical, Bu n-butyl radical and Oct n-octyl radical.
- radicals B are the phenyl, 4-methylphenyl, 3-methoxyphenyl and 4-methoxyphenyl radical.
- Preferred examples of anions Y- are PF 6 -, AsF 6 - and SbF 6 -, with SbF 6 - being particularly preferred.
- Preferred iodonium salts are those of the formula
- the iodonium salt of the formula is particularly preferred C (CH 2 ) 2 0 (CH 2 ) 3 SiMe0ct 2 SbFe-.
- the solubility of the iodonium salts according to the invention in nonpolar media, such as n-alkanes, is substantially greater than that of the comparable (same number of carbon atoms in the substituent of the phenyl radical) iodonium salts according to EP-A 334 056 mentioned at the outset.
- the iodonium salt is of the formula
- the invention further relates to a process for the preparation of the iodonium salts, characterized in that in a first stage
- TsO-J-B where TsO is a tosyloxy radical and B has the meaning given above,
- TsO- is a tosylate anion
- A is a residue of the formula
- Y- a weakly nucleophilic or non-nucleophilic anion selected from the group of
- silanes used in the process according to the invention are (CH 2 ) 3 SiMe 2 Et
- Oct means n-octyl radical
- silanes are optionally substituted on the benzene ring with [hydroxy- (tosyloxy) iodine] -benzene ("Koser's reagent") by the method of Neiland and Karele, Journal of
- Temperature of preferably 20 to 60 ° C and preferably implemented at the pressure of the surrounding atmosphere.
- acids are carboxylic acids such as formic acid, glacial acetic acid and propionic acid, glacial acetic acid being preferred.
- Acid is used in amounts of preferably 1 to 200
- polar solvents examples include acetonitrile,
- Polar solvent is used in amounts of preferably 50 to 500 parts by weight per 100 parts by weight of silane.
- EP-A 334 056 The silanes used in the process according to the invention, such as tetraalkylsilanes, are by known processes
- Phenylallyl ether obtainable by the method described in DE-A 39 35 775, is used on hydrogenchlorosilanes in
- hydrosilylation catalysts such as platinum catalysts
- the phenoxyalkylchlorosilanes thus obtained are alkylated with organometallic reagents, such as alkyl lithium or alkyl Grignard compounds.
- organometallic reagents such as alkyl lithium or alkyl Grignard compounds.
- those with at least 15 aliphatic carbon atoms are undistillable, mostly thin oils. They are largely chemically inert, but because of the phenyloxy group they have a very good reactivity towards electrophiles, such as the iodine cation in [hydroxy (tosyloxy) iodine] benzene.
- the reaction time in the 1st stage of the process according to the invention is preferably 2 to 4 hours.
- Silane preferably in amounts of 1.1 to 1.4 moles per mole of silane used.
- the iodonium tosylates obtained in the 1st stage are mostly yellow to light orange, highly viscous liquids that dissolve very easily in most organic solvents.
- the tosylate anion of the iodonium tosylates can be in one
- Process stage can be exchanged for an anion of a strong acid.
- M + Na + , K + and Li + .
- alkali metal salts M + Y- are Preferred examples of alkali metal salts M + Y-.
- NaPF 6 NaAsF 6 and NaSbF 6 , with NaSbF 6 being particularly preferred.
- the alkali metal salt is preferably used in amounts of 1.1 to 1.5, preferably 1.1 to 1.2 mol, per mol of the iodonium tosylate obtained in the 1st stage of the process according to the invention.
- the anion exchange is preferably carried out in the presence of an organic solvent.
- the organic solvent used is preferably one in which the iodonium tosylate and the alkali metal salt M + Y- are readily soluble, but the alkali metal tosylate is poorly soluble.
- organic Solvents are ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and esters such as ethyl acetate, butyl acetate and ethyl butyrate.
- reaction optionally carried out in the second stage is preferably carried out by mixing solutions of the
- Iodonium tosylate and the alkali metal salt M + Y- in organic solvent are preferably done at room temperature and the pressure of the surrounding atmosphere. However, higher or lower temperatures can also be used.
- the alkali metal tosylate such as sodium tosylate, formed during the salting-out precipitates after mixing and can be filtered off.
- alkali metal salt such as sodium hexafluoroantimonate
- the organic solvent can be removed or the pure iodonium salts can preferably be left in a 30 to 60% solution for better handling.
- the process according to the invention can be carried out batchwise, semi-continuously or fully continuously.
- the iodonium salts are sensitive to light and decompose, for example, when irradiated with ultraviolet light, according to a multi-stage mechanism, which is described in the book "UV-Curing: Science &Technology" by P. Pappas on page 34.
- the resulting Bronsted acid for example HPF 5 , HASF 5 or HSbF 5 , is regarded as the active end product of this photolysis, which in turn starts the polymerization of cationically polymerizable substances such as epoxides or vinyl ethers.
- the iodonium salts according to the invention are suitable as photoinitiators for the polymerization of cationically polymerizable organic substances, such as epoxides, vinyl ethers, organopolysiloxanes containing epoxy groups, alkenyloxy groups, such as vinyloxy groups or propenyloxy groups, containing organopolysiloxanes and olefins.
- cationically polymerizable organic substances such as epoxides, vinyl ethers, organopolysiloxanes containing epoxy groups, alkenyloxy groups, such as vinyloxy groups or propenyloxy groups, containing organopolysiloxanes and olefins.
- Example 1 a) 88.5 g (0.66 mol) of allylphenyl ether are added under
- Hexachloroplatinic acid is added and the mixture is heated to 80 ° C. 125 g of dimethylchlorosilane are metered into the mixture over the course of two hours, the bottom temperature falling below 50.degree. The mixture is stirred under gentle reflux for a further six hours
- Example 1 of the aforementioned EP-A 334 056 was prepared.
- the solubility of this iodonium tosylate in toluene is compared with that of the iodonium tosylate according to the invention from example 1 c) (the atomic number of the two compounds being the same).
- the results are summarized in Table 1.
- Example 2 a) 690 g of 2-phenoxyethanol together with 470 g
- Example 3 a) 3 mg of platinum in the form of a divinyltetramethyldisiloxane platinum complex are dissolved in 178 g (1.0 mol) of 2-allyloxyethylphenyl ether, the preparation of which is described in Example 2 under a), and in a nitrogen atmosphere at 60 to 70 ° C.
- Example 4 a) 148 g (1.0 mol) of 2-allylanisole are mixed with 8 mg of hexachloroplatinic acid under a nitrogen atmosphere and heated to 70.degree. 114 g (1.2 mol) of dimethylchlorosilane are metered into the mixture over the course of two hours, and the mixture is stirred at 70 ° C. for a further four hours. Excess dimethylchlorosilane is then removed in vacuo and 2-propenylanisole formed by isomerization is passed through a short Vigreux column severed. 204 g of 3- (2-anisyl) propyldimethylchlorosilane are obtained as a clear liquid with an acid number of 227.
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP93901697A EP0618919B1 (de) | 1991-12-20 | 1992-12-17 | Jodoniumsalze und verfahren zu deren herstellung |
US08/244,920 US5468890A (en) | 1991-12-20 | 1992-12-17 | Iodonium salts and process for the preparation thereof |
DE59205526T DE59205526D1 (de) | 1991-12-20 | 1992-12-17 | Jodoniumsalze und verfahren zu deren herstellung |
JP5511410A JPH06511010A (ja) | 1991-12-20 | 1992-12-17 | ヨードニウム塩およびその製造方法 |
FI942897A FI942897A0 (fi) | 1991-12-20 | 1994-06-17 | Jodiniumsuolat ja näiden valmistusmenetelmä |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4142327A DE4142327A1 (de) | 1991-12-20 | 1991-12-20 | Jodoniumsalze und verfahren zu deren herstellung |
DEP4142327.5 | 1991-12-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1993013110A1 true WO1993013110A1 (de) | 1993-07-08 |
Family
ID=6447727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP1992/002932 WO1993013110A1 (de) | 1991-12-20 | 1992-12-17 | Jodoniumsalze und verfahren zu deren herstellung |
Country Status (10)
Country | Link |
---|---|
US (1) | US5468890A (de) |
EP (1) | EP0618919B1 (de) |
JP (1) | JPH06511010A (de) |
AT (1) | ATE134636T1 (de) |
CA (1) | CA2125774C (de) |
DE (2) | DE4142327A1 (de) |
ES (1) | ES2084484T3 (de) |
FI (1) | FI942897A0 (de) |
MX (1) | MX9207399A (de) |
WO (1) | WO1993013110A1 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1035105A1 (de) * | 1999-03-11 | 2000-09-13 | Goldschmidt AG | Estergruppen enthaltende Iodoniumsalze und ihre Verwendung zur Strahlenhärtung kationisch härtender Massen |
EP1088813A2 (de) * | 1999-09-21 | 2001-04-04 | Goldschmidt AG | Urethangruppen enthaltende Photoinitiatoren zur kationischen Härtung |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4215030A1 (de) * | 1992-05-07 | 1993-11-11 | Wacker Chemie Gmbh | Vinyloxygruppen aufweisende Siloxancopolymere, deren Herstellung und Verwendung |
US5866666A (en) * | 1992-05-07 | 1999-02-02 | Wacker-Chemie Gmbh | Siloxane copolymers containing vinyloxy groups, their preparation and their use |
US5594042A (en) | 1993-05-18 | 1997-01-14 | Dow Corning Corporation | Radiation curable compositions containing vinyl ether functional polyorganosiloxanes |
US5426222A (en) * | 1994-08-17 | 1995-06-20 | Dow Corning Corporation | Method for the preparation of iodonium salts |
US6608228B1 (en) * | 1997-11-07 | 2003-08-19 | California Institute Of Technology | Two-photon or higher-order absorbing optical materials for generation of reactive species |
DE19731961A1 (de) * | 1997-07-24 | 1999-01-28 | Wacker Chemie Gmbh | 1-Alkenyloxygruppen aufweisende Organosiliciumverbindungen, deren Herstellung und Verwendung |
JP4518594B2 (ja) * | 1998-07-17 | 2010-08-04 | 日本化薬株式会社 | オニウム塩型化合物、これを含有するエネルギー線硬化性組成物及びその硬化物 |
JP2000119308A (ja) * | 1998-07-17 | 2000-04-25 | Nippon Kayaku Co Ltd | オニウム塩型化合物、これを含有するエネルギ―線硬化性組成物及びその硬化物 |
DE59912389D1 (de) * | 1999-01-16 | 2005-09-15 | Goldschmidt Gmbh | Photoinitiatoren zur kationischen Härtung |
WO2001096958A2 (en) | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Process for producing microfluidic articles |
AU2001266905A1 (en) | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Microfabrication of organic optical elements |
DE60139620D1 (de) | 2000-06-15 | 2009-10-01 | 3M Innovative Properties Co | Methode und gerät zur erzielung wiederholter multiphotonabsorption |
US7026103B2 (en) | 2000-06-15 | 2006-04-11 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
US7790353B2 (en) | 2000-06-15 | 2010-09-07 | 3M Innovative Properties Company | Multidirectional photoreactive absorption method |
US6852766B1 (en) | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
AU2001268465A1 (en) | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Multiphoton curing to provide encapsulated optical elements |
EP2236488A1 (de) | 2001-03-30 | 2010-10-06 | The Arizona Board of Regents on behalf of the University of Arizona | Materialien, Verfahren und Verwendungen zur fotochemischen Erzeugung von Säuren und/oder Radikalenspezies |
US7074727B2 (en) * | 2003-07-09 | 2006-07-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Process for improving dielectric properties in low-k organosilicate dielectric material |
DE10341137A1 (de) * | 2003-09-06 | 2005-03-31 | Goldschmidt Ag | Verwendung von hydroxyfunktionellen Polyalkylorganosiloxanen als Lösungsmittel für kationische Photoinitiatoren für die Verwendung in strahlenhärtbaren Siliconen |
US7223704B2 (en) * | 2004-08-27 | 2007-05-29 | Infineon Technologies Ag | Repair of carbon depletion in low-k dielectric films |
DE102006027339A1 (de) * | 2006-06-13 | 2007-12-20 | Goldschmidt Gmbh | Kationisch strahlenhärtende Controlled Release Beschichtungsmassen |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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EP0136679A2 (de) * | 1983-09-30 | 1985-04-10 | Kabushiki Kaisha Toshiba | Photopolymerisierbare Epoxyharzzusammensetzung |
US4513137A (en) * | 1981-04-09 | 1985-04-23 | The University Of Akron | Iodonium salts |
EP0334056A2 (de) * | 1988-03-21 | 1989-09-27 | General Electric Company | Nichttoxische aromatische Oniumsalze, UV-härtbare Beschichtungszusammensetzungen und die Verwendung zum Verpacken von Nahrungsmitteln |
Family Cites Families (6)
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US4264703A (en) * | 1974-05-02 | 1981-04-28 | General Electric Company | Cationically polymerizable compositions containing photodecomposable aromatic iodonium salts |
US4279717A (en) * | 1979-08-03 | 1981-07-21 | General Electric Company | Ultraviolet curable epoxy silicone coating compositions |
US4399071A (en) * | 1982-03-12 | 1983-08-16 | General Electric Company | Method for making diaryliodonium salts |
US4617238A (en) * | 1982-04-01 | 1986-10-14 | General Electric Company | Vinyloxy-functional organopolysiloxane compositions |
DE3935775A1 (de) * | 1989-10-27 | 1991-05-02 | Wacker Chemie Gmbh | Alkenylgruppen aufweisende organosiliciumverbindungen, verfahren zu ihrer herstellung und verwendung dieser organosiliciumverbindungen |
US5073643A (en) * | 1990-08-30 | 1991-12-17 | Polyset Corporation | High yield synthesis of hydroxyl-containing cationic photoinitiators |
-
1991
- 1991-12-20 DE DE4142327A patent/DE4142327A1/de not_active Withdrawn
-
1992
- 1992-12-17 CA CA002125774A patent/CA2125774C/en not_active Expired - Fee Related
- 1992-12-17 MX MX9207399A patent/MX9207399A/es unknown
- 1992-12-17 WO PCT/EP1992/002932 patent/WO1993013110A1/de active IP Right Grant
- 1992-12-17 EP EP93901697A patent/EP0618919B1/de not_active Expired - Lifetime
- 1992-12-17 JP JP5511410A patent/JPH06511010A/ja active Pending
- 1992-12-17 ES ES93901697T patent/ES2084484T3/es not_active Expired - Lifetime
- 1992-12-17 AT AT93901697T patent/ATE134636T1/de not_active IP Right Cessation
- 1992-12-17 US US08/244,920 patent/US5468890A/en not_active Expired - Fee Related
- 1992-12-17 DE DE59205526T patent/DE59205526D1/de not_active Expired - Fee Related
-
1994
- 1994-06-17 FI FI942897A patent/FI942897A0/fi unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4513137A (en) * | 1981-04-09 | 1985-04-23 | The University Of Akron | Iodonium salts |
EP0136679A2 (de) * | 1983-09-30 | 1985-04-10 | Kabushiki Kaisha Toshiba | Photopolymerisierbare Epoxyharzzusammensetzung |
EP0334056A2 (de) * | 1988-03-21 | 1989-09-27 | General Electric Company | Nichttoxische aromatische Oniumsalze, UV-härtbare Beschichtungszusammensetzungen und die Verwendung zum Verpacken von Nahrungsmitteln |
Non-Patent Citations (2)
Title |
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TETRAHEDRON Bd. 44, Nr. 13, 1988, Seiten 4095 - 4012 OCHIAI, M. ET AL. * |
THE JOURNAL OF ORGANIC CHEMISTRY Bd. 45, Nr. 8, 1980, Seiten 1543 - 1544 KOSER, G.F. ET AL. * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1035105A1 (de) * | 1999-03-11 | 2000-09-13 | Goldschmidt AG | Estergruppen enthaltende Iodoniumsalze und ihre Verwendung zur Strahlenhärtung kationisch härtender Massen |
EP1088813A2 (de) * | 1999-09-21 | 2001-04-04 | Goldschmidt AG | Urethangruppen enthaltende Photoinitiatoren zur kationischen Härtung |
EP1088813A3 (de) * | 1999-09-21 | 2003-01-15 | Goldschmidt AG | Urethangruppen enthaltende Photoinitiatoren zur kationischen Härtung |
Also Published As
Publication number | Publication date |
---|---|
US5468890A (en) | 1995-11-21 |
MX9207399A (es) | 1993-06-01 |
EP0618919B1 (de) | 1996-02-28 |
CA2125774A1 (en) | 1993-07-08 |
FI942897A (fi) | 1994-06-17 |
DE4142327A1 (de) | 1993-06-24 |
DE59205526D1 (de) | 1996-04-04 |
EP0618919A1 (de) | 1994-10-12 |
ES2084484T3 (es) | 1996-05-01 |
ATE134636T1 (de) | 1996-03-15 |
JPH06511010A (ja) | 1994-12-08 |
FI942897A0 (fi) | 1994-06-17 |
CA2125774C (en) | 1997-11-25 |
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