USD984972S1 - Electrostatic chuck for semiconductor manufacture - Google Patents
Electrostatic chuck for semiconductor manufacture Download PDFInfo
- Publication number
- USD984972S1 USD984972S1 US35/355,138 US35513844F USD984972S US D984972 S1 USD984972 S1 US D984972S1 US 35513844 F US35513844 F US 35513844F US D984972 S USD984972 S US D984972S
- Authority
- US
- United States
- Prior art keywords
- electrostatic chuck
- semiconductor manufacture
- view
- manufacture
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202130170686.X | 2021-03-29 | ||
CN202130170686 | 2021-03-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD984972S1 true USD984972S1 (en) | 2023-05-02 |
Family
ID=83059681
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US35/355,138 Active USD984972S1 (en) | 2021-03-29 | 2021-09-17 | Electrostatic chuck for semiconductor manufacture |
Country Status (3)
Country | Link |
---|---|
US (1) | USD984972S1 (zh) |
JP (1) | JP1723603S (zh) |
TW (1) | TWD223375S (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1007449S1 (en) * | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
Citations (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4502094A (en) * | 1981-09-14 | 1985-02-26 | U.S. Philips Corporation | Electrostatic chuck |
US4645218A (en) * | 1984-07-31 | 1987-02-24 | Kabushiki Kaisha Tokuda Seisakusho | Electrostatic chuck |
US4665463A (en) * | 1983-09-30 | 1987-05-12 | U.S. Philips Corporation | Electrostatic chuck |
US5151845A (en) * | 1988-09-19 | 1992-09-29 | Toto Ltd. | Electrostatic chuck |
USD363464S (en) * | 1992-08-27 | 1995-10-24 | Tokyo Electron Yamanashi Limited | Electrode for a semiconductor processing apparatus |
US6028762A (en) * | 1996-01-31 | 2000-02-22 | Kyocera Corporation | Electrostatic chuck |
USD425919S (en) * | 1997-11-14 | 2000-05-30 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
US20020027762A1 (en) * | 1998-09-29 | 2002-03-07 | Shinji Yamaguchi | Electrostatic chuck |
US20020159217A1 (en) * | 2001-01-29 | 2002-10-31 | Ngk Insulators, Ltd. | Electrostatic chuck and substrate processing apparatus |
US6721162B2 (en) * | 1996-04-26 | 2004-04-13 | Applied Materials Inc. | Electrostatic chuck having composite dielectric layer and method of manufacture |
US6731496B2 (en) * | 2000-05-10 | 2004-05-04 | Ibiden Co., Ltd. | Electrostatic chuck |
USD489739S1 (en) * | 2002-12-20 | 2004-05-11 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
USD490094S1 (en) * | 2002-12-20 | 2004-05-18 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
USD490093S1 (en) * | 2002-12-20 | 2004-05-18 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
USD490096S1 (en) * | 2002-12-20 | 2004-05-18 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
USD490827S1 (en) * | 2002-12-20 | 2004-06-01 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
US20040179323A1 (en) * | 2003-03-11 | 2004-09-16 | Alon Litman | Electrostatic chuck for wafer metrology and inspection equipment |
US20040218339A1 (en) * | 2003-01-29 | 2004-11-04 | Kyocera Corporation | Electrostatic chuck |
US6815352B1 (en) * | 1999-11-09 | 2004-11-09 | Shin-Etsu Chemical Co., Ltd. | Silicon focus ring and method for producing the same |
US6863281B2 (en) * | 2001-09-13 | 2005-03-08 | Sumitomo Osaka Cement Co., Ltd. | Chucking apparatus and production method for the same |
US20060002053A1 (en) * | 2004-03-31 | 2006-01-05 | Applied Materials, Inc. | Detachable electrostatic chuck for supporting a substrate in a process chamber |
US20060221539A1 (en) * | 2005-03-31 | 2006-10-05 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
US20070146961A1 (en) * | 2005-12-22 | 2007-06-28 | Ngk Insulators, Ltd. | Electrostatic chuck |
USD546784S1 (en) * | 2005-09-29 | 2007-07-17 | Tokyo Electron Limited | Attracting disc for an electrostatic chuck for semiconductor production |
USD548200S1 (en) * | 2005-09-29 | 2007-08-07 | Tokyo Electron Limited | Attracting disc for an electrostatic chuck for semiconductor production |
USD548705S1 (en) * | 2005-09-29 | 2007-08-14 | Tokyo Electron Limited | Attracting disc for an electrostatic chuck for semiconductor production |
USD552565S1 (en) * | 2005-09-08 | 2007-10-09 | Tokyo Ohka Kogyo Co., Ltd. | Supporting plate |
USD553104S1 (en) * | 2004-04-21 | 2007-10-16 | Tokyo Electron Limited | Absorption board for an electric chuck used in semiconductor manufacture |
US20080037194A1 (en) * | 2004-06-28 | 2008-02-14 | Kyocera Corporation | Electrostatic Chuck |
US20080144251A1 (en) * | 2006-12-19 | 2008-06-19 | Axcelis Technologies, Inc. | Annulus clamping and backside gas cooled electrostatic chuck |
USD587222S1 (en) * | 2006-08-01 | 2009-02-24 | Tokyo Electron Limited | Attracting plate of an electrostatic chuck for semiconductor manufacturing |
US7619870B2 (en) * | 2006-08-10 | 2009-11-17 | Tokyo Electron Limited | Electrostatic chuck |
USD609655S1 (en) * | 2008-10-03 | 2010-02-09 | Ngk Insulators, Ltd. | Electrostatic chuck |
USD614593S1 (en) * | 2008-07-21 | 2010-04-27 | Asm Genitech Korea Ltd | Substrate support for a semiconductor deposition apparatus |
US8690135B2 (en) * | 2006-12-18 | 2014-04-08 | Camtek Ltd. | Chuck and a method for supporting an object |
USD716742S1 (en) * | 2013-09-13 | 2014-11-04 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
USD723077S1 (en) * | 2013-12-03 | 2015-02-24 | Applied Materials, Inc. | Chuck carrier film |
USD724553S1 (en) * | 2013-09-13 | 2015-03-17 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
US9494875B2 (en) * | 2011-10-06 | 2016-11-15 | Asml Netherlands B.V. | Chuck, a chuck control system, a lithography apparatus and a method of using a chuck |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP1651623S (zh) | 2019-07-18 | 2020-01-27 |
-
2021
- 2021-09-14 TW TW110304948F patent/TWD223375S/zh unknown
- 2021-09-17 JP JP2021502987F patent/JP1723603S/ja active Active
- 2021-09-17 US US35/355,138 patent/USD984972S1/en active Active
Patent Citations (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4502094A (en) * | 1981-09-14 | 1985-02-26 | U.S. Philips Corporation | Electrostatic chuck |
US4665463A (en) * | 1983-09-30 | 1987-05-12 | U.S. Philips Corporation | Electrostatic chuck |
US4645218A (en) * | 1984-07-31 | 1987-02-24 | Kabushiki Kaisha Tokuda Seisakusho | Electrostatic chuck |
US5151845A (en) * | 1988-09-19 | 1992-09-29 | Toto Ltd. | Electrostatic chuck |
USD363464S (en) * | 1992-08-27 | 1995-10-24 | Tokyo Electron Yamanashi Limited | Electrode for a semiconductor processing apparatus |
US6028762A (en) * | 1996-01-31 | 2000-02-22 | Kyocera Corporation | Electrostatic chuck |
US6721162B2 (en) * | 1996-04-26 | 2004-04-13 | Applied Materials Inc. | Electrostatic chuck having composite dielectric layer and method of manufacture |
USD425919S (en) * | 1997-11-14 | 2000-05-30 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
US20020027762A1 (en) * | 1998-09-29 | 2002-03-07 | Shinji Yamaguchi | Electrostatic chuck |
US6815352B1 (en) * | 1999-11-09 | 2004-11-09 | Shin-Etsu Chemical Co., Ltd. | Silicon focus ring and method for producing the same |
US6731496B2 (en) * | 2000-05-10 | 2004-05-04 | Ibiden Co., Ltd. | Electrostatic chuck |
US20020159217A1 (en) * | 2001-01-29 | 2002-10-31 | Ngk Insulators, Ltd. | Electrostatic chuck and substrate processing apparatus |
US6863281B2 (en) * | 2001-09-13 | 2005-03-08 | Sumitomo Osaka Cement Co., Ltd. | Chucking apparatus and production method for the same |
USD490093S1 (en) * | 2002-12-20 | 2004-05-18 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
USD490096S1 (en) * | 2002-12-20 | 2004-05-18 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
USD490827S1 (en) * | 2002-12-20 | 2004-06-01 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
USD490094S1 (en) * | 2002-12-20 | 2004-05-18 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
USD489739S1 (en) * | 2002-12-20 | 2004-05-11 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
US20040218339A1 (en) * | 2003-01-29 | 2004-11-04 | Kyocera Corporation | Electrostatic chuck |
US20040179323A1 (en) * | 2003-03-11 | 2004-09-16 | Alon Litman | Electrostatic chuck for wafer metrology and inspection equipment |
US20060002053A1 (en) * | 2004-03-31 | 2006-01-05 | Applied Materials, Inc. | Detachable electrostatic chuck for supporting a substrate in a process chamber |
USD553104S1 (en) * | 2004-04-21 | 2007-10-16 | Tokyo Electron Limited | Absorption board for an electric chuck used in semiconductor manufacture |
US20080037194A1 (en) * | 2004-06-28 | 2008-02-14 | Kyocera Corporation | Electrostatic Chuck |
US20060221539A1 (en) * | 2005-03-31 | 2006-10-05 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
USD552565S1 (en) * | 2005-09-08 | 2007-10-09 | Tokyo Ohka Kogyo Co., Ltd. | Supporting plate |
USD548200S1 (en) * | 2005-09-29 | 2007-08-07 | Tokyo Electron Limited | Attracting disc for an electrostatic chuck for semiconductor production |
USD546784S1 (en) * | 2005-09-29 | 2007-07-17 | Tokyo Electron Limited | Attracting disc for an electrostatic chuck for semiconductor production |
USD548705S1 (en) * | 2005-09-29 | 2007-08-14 | Tokyo Electron Limited | Attracting disc for an electrostatic chuck for semiconductor production |
US20070146961A1 (en) * | 2005-12-22 | 2007-06-28 | Ngk Insulators, Ltd. | Electrostatic chuck |
USD587222S1 (en) * | 2006-08-01 | 2009-02-24 | Tokyo Electron Limited | Attracting plate of an electrostatic chuck for semiconductor manufacturing |
US7619870B2 (en) * | 2006-08-10 | 2009-11-17 | Tokyo Electron Limited | Electrostatic chuck |
US8690135B2 (en) * | 2006-12-18 | 2014-04-08 | Camtek Ltd. | Chuck and a method for supporting an object |
US20080144251A1 (en) * | 2006-12-19 | 2008-06-19 | Axcelis Technologies, Inc. | Annulus clamping and backside gas cooled electrostatic chuck |
USD614593S1 (en) * | 2008-07-21 | 2010-04-27 | Asm Genitech Korea Ltd | Substrate support for a semiconductor deposition apparatus |
USD609655S1 (en) * | 2008-10-03 | 2010-02-09 | Ngk Insulators, Ltd. | Electrostatic chuck |
US9494875B2 (en) * | 2011-10-06 | 2016-11-15 | Asml Netherlands B.V. | Chuck, a chuck control system, a lithography apparatus and a method of using a chuck |
USD716742S1 (en) * | 2013-09-13 | 2014-11-04 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
USD724553S1 (en) * | 2013-09-13 | 2015-03-17 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
USD723077S1 (en) * | 2013-12-03 | 2015-02-24 | Applied Materials, Inc. | Chuck carrier film |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1007449S1 (en) * | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
Also Published As
Publication number | Publication date |
---|---|
TWD223375S (zh) | 2023-02-01 |
JP1723603S (ja) | 2022-08-31 |
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Legal Events
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FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |