US8475644B2
(en)
|
2000-03-27 |
2013-07-02 |
Novellus Systems, Inc. |
Method and apparatus for electroplating
|
US20100044236A1
(en)
*
|
2000-03-27 |
2010-02-25 |
Novellus Systems, Inc. |
Method and apparatus for electroplating
|
US8623193B1
(en)
|
2004-06-16 |
2014-01-07 |
Novellus Systems, Inc. |
Method of electroplating using a high resistance ionic current source
|
US20100032310A1
(en)
*
|
2006-08-16 |
2010-02-11 |
Novellus Systems, Inc. |
Method and apparatus for electroplating
|
US8308931B2
(en)
|
2006-08-16 |
2012-11-13 |
Novellus Systems, Inc. |
Method and apparatus for electroplating
|
US8475636B2
(en)
|
2008-11-07 |
2013-07-02 |
Novellus Systems, Inc. |
Method and apparatus for electroplating
|
US20100116672A1
(en)
*
|
2008-11-07 |
2010-05-13 |
Novellus Systems, Inc. |
Method and apparatus for electroplating
|
US9309604B2
(en)
|
2008-11-07 |
2016-04-12 |
Novellus Systems, Inc. |
Method and apparatus for electroplating
|
US10378106B2
(en)
|
2008-11-14 |
2019-08-13 |
Asm Ip Holding B.V. |
Method of forming insulation film by modified PEALD
|
US9512538B2
(en)
|
2008-12-10 |
2016-12-06 |
Novellus Systems, Inc. |
Plating cup with contoured cup bottom
|
US8540857B1
(en)
|
2008-12-19 |
2013-09-24 |
Novellus Systems, Inc. |
Plating method and apparatus with multiple internally irrigated chambers
|
US10480072B2
(en)
|
2009-04-06 |
2019-11-19 |
Asm Ip Holding B.V. |
Semiconductor processing reactor and components thereof
|
US10844486B2
(en)
|
2009-04-06 |
2020-11-24 |
Asm Ip Holding B.V. |
Semiconductor processing reactor and components thereof
|
US9394608B2
(en)
|
2009-04-06 |
2016-07-19 |
Asm America, Inc. |
Semiconductor processing reactor and components thereof
|
US10804098B2
(en)
|
2009-08-14 |
2020-10-13 |
Asm Ip Holding B.V. |
Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
|
US10233556B2
(en)
|
2010-07-02 |
2019-03-19 |
Lam Research Corporation |
Dynamic modulation of cross flow manifold during electroplating
|
US10190230B2
(en)
|
2010-07-02 |
2019-01-29 |
Novellus Systems, Inc. |
Cross flow manifold for electroplating apparatus
|
US9464361B2
(en)
|
2010-07-02 |
2016-10-11 |
Novellus Systems, Inc. |
Control of electrolyte hydrodynamics for efficient mass transfer during electroplating
|
US9624592B2
(en)
|
2010-07-02 |
2017-04-18 |
Novellus Systems, Inc. |
Cross flow manifold for electroplating apparatus
|
US9394620B2
(en)
|
2010-07-02 |
2016-07-19 |
Novellus Systems, Inc. |
Control of electrolyte hydrodynamics for efficient mass transfer during electroplating
|
US8795480B2
(en)
|
2010-07-02 |
2014-08-05 |
Novellus Systems, Inc. |
Control of electrolyte hydrodynamics for efficient mass transfer during electroplating
|
US10707106B2
(en)
|
2011-06-06 |
2020-07-07 |
Asm Ip Holding B.V. |
High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules
|
US9793148B2
(en)
|
2011-06-22 |
2017-10-17 |
Asm Japan K.K. |
Method for positioning wafers in multiple wafer transport
|
US10364496B2
(en)
|
2011-06-27 |
2019-07-30 |
Asm Ip Holding B.V. |
Dual section module having shared and unshared mass flow controllers
|
US10854498B2
(en)
|
2011-07-15 |
2020-12-01 |
Asm Ip Holding B.V. |
Wafer-supporting device and method for producing same
|
US11725277B2
(en)
|
2011-07-20 |
2023-08-15 |
Asm Ip Holding B.V. |
Pressure transmitter for a semiconductor processing environment
|
US10053792B2
(en)
|
2011-09-12 |
2018-08-21 |
Novellus Systems, Inc. |
Plating cup with contoured cup bottom
|
US9341296B2
(en)
|
2011-10-27 |
2016-05-17 |
Asm America, Inc. |
Heater jacket for a fluid line
|
US9892908B2
(en)
|
2011-10-28 |
2018-02-13 |
Asm America, Inc. |
Process feed management for semiconductor substrate processing
|
US10832903B2
(en)
|
2011-10-28 |
2020-11-10 |
Asm Ip Holding B.V. |
Process feed management for semiconductor substrate processing
|
US9340874B2
(en)
|
2011-11-23 |
2016-05-17 |
Asm Ip Holding B.V. |
Chamber sealing member
|
US9167625B2
(en)
|
2011-11-23 |
2015-10-20 |
Asm Ip Holding B.V. |
Radiation shielding for a substrate holder
|
US9202727B2
(en)
|
2012-03-02 |
2015-12-01 |
ASM IP Holding |
Susceptor heater shim
|
US9384987B2
(en)
|
2012-04-04 |
2016-07-05 |
Asm Ip Holding B.V. |
Metal oxide protective layer for a semiconductor device
|
US9177784B2
(en)
|
2012-05-07 |
2015-11-03 |
Asm Ip Holdings B.V. |
Semiconductor device dielectric interface layer
|
US9299595B2
(en)
|
2012-06-27 |
2016-03-29 |
Asm Ip Holding B.V. |
Susceptor heater and method of heating a substrate
|
US9558931B2
(en)
|
2012-07-27 |
2017-01-31 |
Asm Ip Holding B.V. |
System and method for gas-phase sulfur passivation of a semiconductor surface
|
US9117866B2
(en)
|
2012-07-31 |
2015-08-25 |
Asm Ip Holding B.V. |
Apparatus and method for calculating a wafer position in a processing chamber under process conditions
|
US9659799B2
(en)
|
2012-08-28 |
2017-05-23 |
Asm Ip Holding B.V. |
Systems and methods for dynamic semiconductor process scheduling
|
US9169975B2
(en)
|
2012-08-28 |
2015-10-27 |
Asm Ip Holding B.V. |
Systems and methods for mass flow controller verification
|
US10566223B2
(en)
|
2012-08-28 |
2020-02-18 |
Asm Ip Holdings B.V. |
Systems and methods for dynamic semiconductor process scheduling
|
US9605342B2
(en)
|
2012-09-12 |
2017-03-28 |
Asm Ip Holding B.V. |
Process gas management for an inductively-coupled plasma deposition reactor
|
US10023960B2
(en)
|
2012-09-12 |
2018-07-17 |
Asm Ip Holdings B.V. |
Process gas management for an inductively-coupled plasma deposition reactor
|
US9324811B2
(en)
|
2012-09-26 |
2016-04-26 |
Asm Ip Holding B.V. |
Structures and devices including a tensile-stressed silicon arsenic layer and methods of forming same
|
US10714315B2
(en)
|
2012-10-12 |
2020-07-14 |
Asm Ip Holdings B.V. |
Semiconductor reaction chamber showerhead
|
US11501956B2
(en)
|
2012-10-12 |
2022-11-15 |
Asm Ip Holding B.V. |
Semiconductor reaction chamber showerhead
|
US9834852B2
(en)
|
2012-12-12 |
2017-12-05 |
Novellus Systems, Inc. |
Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating
|
US9523155B2
(en)
|
2012-12-12 |
2016-12-20 |
Novellus Systems, Inc. |
Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating
|
US10662545B2
(en)
|
2012-12-12 |
2020-05-26 |
Novellus Systems, Inc. |
Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating
|
US9640416B2
(en)
|
2012-12-26 |
2017-05-02 |
Asm Ip Holding B.V. |
Single-and dual-chamber module-attachable wafer-handling chamber
|
US9228259B2
(en)
|
2013-02-01 |
2016-01-05 |
Asm Ip Holding B.V. |
Method for treatment of deposition reactor
|
US11967488B2
(en)
|
2013-02-01 |
2024-04-23 |
Asm Ip Holding B.V. |
Method for treatment of deposition reactor
|
USD743357S1
(en)
*
|
2013-03-01 |
2015-11-17 |
Asm Ip Holding B.V. |
Susceptor
|
US10340125B2
(en)
|
2013-03-08 |
2019-07-02 |
Asm Ip Holding B.V. |
Pulsed remote plasma method and system
|
US9484191B2
(en)
|
2013-03-08 |
2016-11-01 |
Asm Ip Holding B.V. |
Pulsed remote plasma method and system
|
US10366864B2
(en)
|
2013-03-08 |
2019-07-30 |
Asm Ip Holding B.V. |
Method and system for in-situ formation of intermediate reactive species
|
US9589770B2
(en)
|
2013-03-08 |
2017-03-07 |
Asm Ip Holding B.V. |
Method and systems for in-situ formation of intermediate reactive species
|
US9670588B2
(en)
|
2013-05-01 |
2017-06-06 |
Lam Research Corporation |
Anisotropic high resistance ionic current source (AHRICS)
|
US10301739B2
(en)
|
2013-05-01 |
2019-05-28 |
Lam Research Corporation |
Anisotropic high resistance ionic current source (AHRICS)
|
US9899230B2
(en)
|
2013-05-29 |
2018-02-20 |
Novellus Systems, Inc. |
Apparatus for advanced packaging applications
|
US9449808B2
(en)
|
2013-05-29 |
2016-09-20 |
Novellus Systems, Inc. |
Apparatus for advanced packaging applications
|
US9790595B2
(en)
|
2013-07-12 |
2017-10-17 |
Asm Ip Holding B.V. |
Method and system to reduce outgassing in a reaction chamber
|
US9412564B2
(en)
|
2013-07-22 |
2016-08-09 |
Asm Ip Holding B.V. |
Semiconductor reaction chamber with plasma capabilities
|
US9396934B2
(en)
|
2013-08-14 |
2016-07-19 |
Asm Ip Holding B.V. |
Methods of forming films including germanium tin and structures and devices including the films
|
US9793115B2
(en)
|
2013-08-14 |
2017-10-17 |
Asm Ip Holding B.V. |
Structures and devices including germanium-tin films and methods of forming same
|
US9240412B2
(en)
|
2013-09-27 |
2016-01-19 |
Asm Ip Holding B.V. |
Semiconductor structure and device and methods of forming same using selective epitaxial process
|
US10361201B2
(en)
|
2013-09-27 |
2019-07-23 |
Asm Ip Holding B.V. |
Semiconductor structure and device formed using selective epitaxial process
|
US9556516B2
(en)
|
2013-10-09 |
2017-01-31 |
ASM IP Holding B.V |
Method for forming Ti-containing film by PEALD using TDMAT or TDEAT
|
US9605343B2
(en)
|
2013-11-13 |
2017-03-28 |
Asm Ip Holding B.V. |
Method for forming conformal carbon films, structures conformal carbon film, and system of forming same
|
US10179947B2
(en)
|
2013-11-26 |
2019-01-15 |
Asm Ip Holding B.V. |
Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition
|
US10683571B2
(en)
|
2014-02-25 |
2020-06-16 |
Asm Ip Holding B.V. |
Gas supply manifold and method of supplying gases to chamber using same
|
US10167557B2
(en)
|
2014-03-18 |
2019-01-01 |
Asm Ip Holding B.V. |
Gas distribution system, reactor including the system, and methods of using the same
|
US10604847B2
(en)
|
2014-03-18 |
2020-03-31 |
Asm Ip Holding B.V. |
Gas distribution system, reactor including the system, and methods of using the same
|
US9447498B2
(en)
|
2014-03-18 |
2016-09-20 |
Asm Ip Holding B.V. |
Method for performing uniform processing in gas system-sharing multiple reaction chambers
|
US11015245B2
(en)
|
2014-03-19 |
2021-05-25 |
Asm Ip Holding B.V. |
Gas-phase reactor and system having exhaust plenum and components thereof
|
US9404587B2
(en)
|
2014-04-24 |
2016-08-02 |
ASM IP Holding B.V |
Lockout tagout for semiconductor vacuum valve
|
US10858737B2
(en)
|
2014-07-28 |
2020-12-08 |
Asm Ip Holding B.V. |
Showerhead assembly and components thereof
|
US9543180B2
(en)
|
2014-08-01 |
2017-01-10 |
Asm Ip Holding B.V. |
Apparatus and method for transporting wafers between wafer carrier and process tool under vacuum
|
US10787741B2
(en)
|
2014-08-21 |
2020-09-29 |
Asm Ip Holding B.V. |
Method and system for in situ formation of gas-phase compounds
|
US9890456B2
(en)
|
2014-08-21 |
2018-02-13 |
Asm Ip Holding B.V. |
Method and system for in situ formation of gas-phase compounds
|
US11795545B2
(en)
|
2014-10-07 |
2023-10-24 |
Asm Ip Holding B.V. |
Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
|
US10561975B2
(en)
|
2014-10-07 |
2020-02-18 |
Asm Ip Holdings B.V. |
Variable conductance gas distribution apparatus and method
|
US9657845B2
(en)
|
2014-10-07 |
2017-05-23 |
Asm Ip Holding B.V. |
Variable conductance gas distribution apparatus and method
|
US10941490B2
(en)
|
2014-10-07 |
2021-03-09 |
Asm Ip Holding B.V. |
Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
|
US9891521B2
(en)
|
2014-11-19 |
2018-02-13 |
Asm Ip Holding B.V. |
Method for depositing thin film
|
US9899405B2
(en)
|
2014-12-22 |
2018-02-20 |
Asm Ip Holding B.V. |
Semiconductor device and manufacturing method thereof
|
US10438965B2
(en)
|
2014-12-22 |
2019-10-08 |
Asm Ip Holding B.V. |
Semiconductor device and manufacturing method thereof
|
US9478415B2
(en)
|
2015-02-13 |
2016-10-25 |
Asm Ip Holding B.V. |
Method for forming film having low resistance and shallow junction depth
|
US10529542B2
(en)
|
2015-03-11 |
2020-01-07 |
Asm Ip Holdings B.V. |
Cross-flow reactor and method
|
US10276355B2
(en)
|
2015-03-12 |
2019-04-30 |
Asm Ip Holding B.V. |
Multi-zone reactor, system including the reactor, and method of using the same
|
US11742189B2
(en)
|
2015-03-12 |
2023-08-29 |
Asm Ip Holding B.V. |
Multi-zone reactor, system including the reactor, and method of using the same
|
US9816194B2
(en)
|
2015-03-19 |
2017-11-14 |
Lam Research Corporation |
Control of electrolyte flow dynamics for uniform electroplating
|
USD852762S1
(en)
|
2015-03-27 |
2019-07-02 |
Veeco Instruments Inc. |
Wafer carrier with a 14-pocket configuration
|
USD793972S1
(en)
*
|
2015-03-27 |
2017-08-08 |
Veeco Instruments Inc. |
Wafer carrier with a 31-pocket configuration
|
USD793971S1
(en)
|
2015-03-27 |
2017-08-08 |
Veeco Instruments Inc. |
Wafer carrier with a 14-pocket configuration
|
USD806046S1
(en)
|
2015-04-16 |
2017-12-26 |
Veeco Instruments Inc. |
Wafer carrier with a multi-pocket configuration
|
US10014170B2
(en)
|
2015-05-14 |
2018-07-03 |
Lam Research Corporation |
Apparatus and method for electrodeposition of metals with the use of an ionically resistive ionically permeable element having spatially tailored resistivity
|
US10923340B2
(en)
|
2015-05-14 |
2021-02-16 |
Lam Research Corporation |
Apparatus and method for electrodeposition of metals with the use of an ionically resistive ionically permeable element having spatially tailored resistivity
|
US11242598B2
(en)
|
2015-06-26 |
2022-02-08 |
Asm Ip Holding B.V. |
Structures including metal carbide material, devices including the structures, and methods of forming same
|
US10458018B2
(en)
|
2015-06-26 |
2019-10-29 |
Asm Ip Holding B.V. |
Structures including metal carbide material, devices including the structures, and methods of forming same
|
US10600673B2
(en)
|
2015-07-07 |
2020-03-24 |
Asm Ip Holding B.V. |
Magnetic susceptor to baseplate seal
|
USD790489S1
(en)
*
|
2015-07-08 |
2017-06-27 |
Ebara Corporation |
Vacuum contact pad
|
US9899291B2
(en)
|
2015-07-13 |
2018-02-20 |
Asm Ip Holding B.V. |
Method for protecting layer by forming hydrocarbon-based extremely thin film
|
US10043661B2
(en)
|
2015-07-13 |
2018-08-07 |
Asm Ip Holding B.V. |
Method for protecting layer by forming hydrocarbon-based extremely thin film
|
US10083836B2
(en)
|
2015-07-24 |
2018-09-25 |
Asm Ip Holding B.V. |
Formation of boron-doped titanium metal films with high work function
|
US10087525B2
(en)
|
2015-08-04 |
2018-10-02 |
Asm Ip Holding B.V. |
Variable gap hard stop design
|
USD802472S1
(en)
*
|
2015-08-06 |
2017-11-14 |
Tokyo Electron Limited |
Electrostatic chuck for semiconductor manufacturing equipment
|
US9647114B2
(en)
|
2015-08-14 |
2017-05-09 |
Asm Ip Holding B.V. |
Methods of forming highly p-type doped germanium tin films and structures and devices including the films
|
USD795208S1
(en)
*
|
2015-08-18 |
2017-08-22 |
Tokyo Electron Limited |
Electrostatic chuck for semiconductor manufacturing equipment
|
USD803802S1
(en)
*
|
2015-08-18 |
2017-11-28 |
Tokyo Electron Limited |
Electrostatic chuck for semiconductor manufacturing equipment
|
US9711345B2
(en)
|
2015-08-25 |
2017-07-18 |
Asm Ip Holding B.V. |
Method for forming aluminum nitride-based film by PEALD
|
US10094034B2
(en)
|
2015-08-28 |
2018-10-09 |
Lam Research Corporation |
Edge flow element for electroplating apparatus
|
US9960072B2
(en)
|
2015-09-29 |
2018-05-01 |
Asm Ip Holding B.V. |
Variable adjustment for precise matching of multiple chamber cavity housings
|
US10312129B2
(en)
|
2015-09-29 |
2019-06-04 |
Asm Ip Holding B.V. |
Variable adjustment for precise matching of multiple chamber cavity housings
|
US9909214B2
(en)
|
2015-10-15 |
2018-03-06 |
Asm Ip Holding B.V. |
Method for depositing dielectric film in trenches by PEALD
|
US10211308B2
(en)
|
2015-10-21 |
2019-02-19 |
Asm Ip Holding B.V. |
NbMC layers
|
US11233133B2
(en)
|
2015-10-21 |
2022-01-25 |
Asm Ip Holding B.V. |
NbMC layers
|
US10322384B2
(en)
|
2015-11-09 |
2019-06-18 |
Asm Ip Holding B.V. |
Counter flow mixer for process chamber
|
US9455138B1
(en)
|
2015-11-10 |
2016-09-27 |
Asm Ip Holding B.V. |
Method for forming dielectric film in trenches by PEALD using H-containing gas
|
US9905420B2
(en)
|
2015-12-01 |
2018-02-27 |
Asm Ip Holding B.V. |
Methods of forming silicon germanium tin films and structures and devices including the films
|
US9607837B1
(en)
|
2015-12-21 |
2017-03-28 |
Asm Ip Holding B.V. |
Method for forming silicon oxide cap layer for solid state diffusion process
|
US9627221B1
(en)
|
2015-12-28 |
2017-04-18 |
Asm Ip Holding B.V. |
Continuous process incorporating atomic layer etching
|
US9735024B2
(en)
|
2015-12-28 |
2017-08-15 |
Asm Ip Holding B.V. |
Method of atomic layer etching using functional group-containing fluorocarbon
|
US11956977B2
(en)
|
2015-12-29 |
2024-04-09 |
Asm Ip Holding B.V. |
Atomic layer deposition of III-V compounds to form V-NAND devices
|
US11139308B2
(en)
|
2015-12-29 |
2021-10-05 |
Asm Ip Holding B.V. |
Atomic layer deposition of III-V compounds to form V-NAND devices
|
USD789888S1
(en)
*
|
2016-01-08 |
2017-06-20 |
Asm Ip Holding B.V. |
Electrode plate for semiconductor manufacturing apparatus
|
US9754779B1
(en)
|
2016-02-19 |
2017-09-05 |
Asm Ip Holding B.V. |
Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
|
US11676812B2
(en)
|
2016-02-19 |
2023-06-13 |
Asm Ip Holding B.V. |
Method for forming silicon nitride film selectively on top/bottom portions
|
US10529554B2
(en)
|
2016-02-19 |
2020-01-07 |
Asm Ip Holding B.V. |
Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
|
US10720322B2
(en)
|
2016-02-19 |
2020-07-21 |
Asm Ip Holding B.V. |
Method for forming silicon nitride film selectively on top surface
|
US10468251B2
(en)
|
2016-02-19 |
2019-11-05 |
Asm Ip Holding B.V. |
Method for forming spacers using silicon nitride film for spacer-defined multiple patterning
|
US10501866B2
(en)
|
2016-03-09 |
2019-12-10 |
Asm Ip Holding B.V. |
Gas distribution apparatus for improved film uniformity in an epitaxial system
|
US10343920B2
(en)
|
2016-03-18 |
2019-07-09 |
Asm Ip Holding B.V. |
Aligned carbon nanotubes
|
US10262859B2
(en)
|
2016-03-24 |
2019-04-16 |
Asm Ip Holding B.V. |
Process for forming a film on a substrate using multi-port injection assemblies
|
US10851456B2
(en)
|
2016-04-21 |
2020-12-01 |
Asm Ip Holding B.V. |
Deposition of metal borides
|
US10865475B2
(en)
|
2016-04-21 |
2020-12-15 |
Asm Ip Holding B.V. |
Deposition of metal borides and silicides
|
US10087522B2
(en)
|
2016-04-21 |
2018-10-02 |
Asm Ip Holding B.V. |
Deposition of metal borides
|
US10190213B2
(en)
|
2016-04-21 |
2019-01-29 |
Asm Ip Holding B.V. |
Deposition of metal borides
|
US10665452B2
(en)
|
2016-05-02 |
2020-05-26 |
Asm Ip Holdings B.V. |
Source/drain performance through conformal solid state doping
|
US11101370B2
(en)
|
2016-05-02 |
2021-08-24 |
Asm Ip Holding B.V. |
Method of forming a germanium oxynitride film
|
US10032628B2
(en)
|
2016-05-02 |
2018-07-24 |
Asm Ip Holding B.V. |
Source/drain performance through conformal solid state doping
|
US10367080B2
(en)
|
2016-05-02 |
2019-07-30 |
Asm Ip Holding B.V. |
Method of forming a germanium oxynitride film
|
US10249577B2
(en)
|
2016-05-17 |
2019-04-02 |
Asm Ip Holding B.V. |
Method of forming metal interconnection and method of fabricating semiconductor apparatus using the method
|
USD873782S1
(en)
*
|
2016-05-17 |
2020-01-28 |
Electro Scientific Industries, Inc |
Component carrier plate
|
US10364505B2
(en)
|
2016-05-24 |
2019-07-30 |
Lam Research Corporation |
Dynamic modulation of cross flow manifold during elecroplating
|
US11047059B2
(en)
|
2016-05-24 |
2021-06-29 |
Lam Research Corporation |
Dynamic modulation of cross flow manifold during elecroplating
|
US11453943B2
(en)
|
2016-05-25 |
2022-09-27 |
Asm Ip Holding B.V. |
Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor
|
US10388509B2
(en)
|
2016-06-28 |
2019-08-20 |
Asm Ip Holding B.V. |
Formation of epitaxial layers via dislocation filtering
|
US10541173B2
(en)
|
2016-07-08 |
2020-01-21 |
Asm Ip Holding B.V. |
Selective deposition method to form air gaps
|
US9859151B1
(en)
|
2016-07-08 |
2018-01-02 |
Asm Ip Holding B.V. |
Selective film deposition method to form air gaps
|
US11749562B2
(en)
|
2016-07-08 |
2023-09-05 |
Asm Ip Holding B.V. |
Selective deposition method to form air gaps
|
US11094582B2
(en)
|
2016-07-08 |
2021-08-17 |
Asm Ip Holding B.V. |
Selective deposition method to form air gaps
|
US10612137B2
(en)
|
2016-07-08 |
2020-04-07 |
Asm Ip Holdings B.V. |
Organic reactants for atomic layer deposition
|
US11649546B2
(en)
|
2016-07-08 |
2023-05-16 |
Asm Ip Holding B.V. |
Organic reactants for atomic layer deposition
|
US9793135B1
(en)
|
2016-07-14 |
2017-10-17 |
ASM IP Holding B.V |
Method of cyclic dry etching using etchant film
|
US10714385B2
(en)
|
2016-07-19 |
2020-07-14 |
Asm Ip Holding B.V. |
Selective deposition of tungsten
|
US10381226B2
(en)
|
2016-07-27 |
2019-08-13 |
Asm Ip Holding B.V. |
Method of processing substrate
|
US11694892B2
(en)
|
2016-07-28 |
2023-07-04 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
US11107676B2
(en)
|
2016-07-28 |
2021-08-31 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
US11610775B2
(en)
|
2016-07-28 |
2023-03-21 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
US10395919B2
(en)
|
2016-07-28 |
2019-08-27 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
US10177025B2
(en)
|
2016-07-28 |
2019-01-08 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
US9812320B1
(en)
|
2016-07-28 |
2017-11-07 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
US9887082B1
(en)
|
2016-07-28 |
2018-02-06 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
US11205585B2
(en)
|
2016-07-28 |
2021-12-21 |
Asm Ip Holding B.V. |
Substrate processing apparatus and method of operating the same
|
US10741385B2
(en)
|
2016-07-28 |
2020-08-11 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
US10090316B2
(en)
|
2016-09-01 |
2018-10-02 |
Asm Ip Holding B.V. |
3D stacked multilayer semiconductor memory using doped select transistor channel
|
US10410943B2
(en)
|
2016-10-13 |
2019-09-10 |
Asm Ip Holding B.V. |
Method for passivating a surface of a semiconductor and related systems
|
US10643826B2
(en)
|
2016-10-26 |
2020-05-05 |
Asm Ip Holdings B.V. |
Methods for thermally calibrating reaction chambers
|
US10943771B2
(en)
|
2016-10-26 |
2021-03-09 |
Asm Ip Holding B.V. |
Methods for thermally calibrating reaction chambers
|
US11532757B2
(en)
|
2016-10-27 |
2022-12-20 |
Asm Ip Holding B.V. |
Deposition of charge trapping layers
|
US11810788B2
(en)
|
2016-11-01 |
2023-11-07 |
Asm Ip Holding B.V. |
Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
|
US10435790B2
(en)
|
2016-11-01 |
2019-10-08 |
Asm Ip Holding B.V. |
Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap
|
US10643904B2
(en)
|
2016-11-01 |
2020-05-05 |
Asm Ip Holdings B.V. |
Methods for forming a semiconductor device and related semiconductor device structures
|
US10714350B2
(en)
|
2016-11-01 |
2020-07-14 |
ASM IP Holdings, B.V. |
Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
|
US10720331B2
(en)
|
2016-11-01 |
2020-07-21 |
ASM IP Holdings, B.V. |
Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
|
US10229833B2
(en)
|
2016-11-01 |
2019-03-12 |
Asm Ip Holding B.V. |
Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
|
US10622375B2
(en)
|
2016-11-07 |
2020-04-14 |
Asm Ip Holding B.V. |
Method of processing a substrate and a device manufactured by using the method
|
US10644025B2
(en)
|
2016-11-07 |
2020-05-05 |
Asm Ip Holding B.V. |
Method of processing a substrate and a device manufactured by using the method
|
US10134757B2
(en)
|
2016-11-07 |
2018-11-20 |
Asm Ip Holding B.V. |
Method of processing a substrate and a device manufactured by using the method
|
US10934619B2
(en)
|
2016-11-15 |
2021-03-02 |
Asm Ip Holding B.V. |
Gas supply unit and substrate processing apparatus including the gas supply unit
|
US11396702B2
(en)
|
2016-11-15 |
2022-07-26 |
Asm Ip Holding B.V. |
Gas supply unit and substrate processing apparatus including the gas supply unit
|
US10340135B2
(en)
|
2016-11-28 |
2019-07-02 |
Asm Ip Holding B.V. |
Method of topologically restricted plasma-enhanced cyclic deposition of silicon or metal nitride
|
US11222772B2
(en)
|
2016-12-14 |
2022-01-11 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
US11970766B2
(en)
|
2016-12-15 |
2024-04-30 |
Asm Ip Holding B.V. |
Sequential infiltration synthesis apparatus
|
US11581186B2
(en)
|
2016-12-15 |
2023-02-14 |
Asm Ip Holding B.V. |
Sequential infiltration synthesis apparatus
|
US9916980B1
(en)
|
2016-12-15 |
2018-03-13 |
Asm Ip Holding B.V. |
Method of forming a structure on a substrate
|
US12000042B2
(en)
|
2016-12-15 |
2024-06-04 |
Asm Ip Holding B.V. |
Sequential infiltration synthesis apparatus and a method of forming a patterned structure
|
US11447861B2
(en)
|
2016-12-15 |
2022-09-20 |
Asm Ip Holding B.V. |
Sequential infiltration synthesis apparatus and a method of forming a patterned structure
|
US11851755B2
(en)
|
2016-12-15 |
2023-12-26 |
Asm Ip Holding B.V. |
Sequential infiltration synthesis apparatus and a method of forming a patterned structure
|
US11001925B2
(en)
|
2016-12-19 |
2021-05-11 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
US10784102B2
(en)
|
2016-12-22 |
2020-09-22 |
Asm Ip Holding B.V. |
Method of forming a structure on a substrate
|
US10269558B2
(en)
|
2016-12-22 |
2019-04-23 |
Asm Ip Holding B.V. |
Method of forming a structure on a substrate
|
US11251035B2
(en)
|
2016-12-22 |
2022-02-15 |
Asm Ip Holding B.V. |
Method of forming a structure on a substrate
|
US10867788B2
(en)
|
2016-12-28 |
2020-12-15 |
Asm Ip Holding B.V. |
Method of forming a structure on a substrate
|
US12043899B2
(en)
|
2017-01-10 |
2024-07-23 |
Asm Ip Holding B.V. |
Reactor system and method to reduce residue buildup during a film deposition process
|
US11390950B2
(en)
|
2017-01-10 |
2022-07-19 |
Asm Ip Holding B.V. |
Reactor system and method to reduce residue buildup during a film deposition process
|
US10655221B2
(en)
|
2017-02-09 |
2020-05-19 |
Asm Ip Holding B.V. |
Method for depositing oxide film by thermal ALD and PEALD
|
US10468261B2
(en)
|
2017-02-15 |
2019-11-05 |
Asm Ip Holding B.V. |
Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
|
US10468262B2
(en)
|
2017-02-15 |
2019-11-05 |
Asm Ip Holding B.V. |
Methods for forming a metallic film on a substrate by a cyclical deposition and related semiconductor device structures
|
US11410851B2
(en)
|
2017-02-15 |
2022-08-09 |
Asm Ip Holding B.V. |
Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
|
US11658030B2
(en)
|
2017-03-29 |
2023-05-23 |
Asm Ip Holding B.V. |
Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
|
US10529563B2
(en)
|
2017-03-29 |
2020-01-07 |
Asm Ip Holdings B.V. |
Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
|
US10283353B2
(en)
|
2017-03-29 |
2019-05-07 |
Asm Ip Holding B.V. |
Method of reforming insulating film deposited on substrate with recess pattern
|
US10103040B1
(en)
|
2017-03-31 |
2018-10-16 |
Asm Ip Holding B.V. |
Apparatus and method for manufacturing a semiconductor device
|
USD859331S1
(en)
*
|
2017-03-31 |
2019-09-10 |
Ebara Corporation |
Vacuum contact pad
|
USD830981S1
(en)
|
2017-04-07 |
2018-10-16 |
Asm Ip Holding B.V. |
Susceptor for semiconductor substrate processing apparatus
|
US10714335B2
(en)
|
2017-04-25 |
2020-07-14 |
Asm Ip Holding B.V. |
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|
US10950432B2
(en)
|
2017-04-25 |
2021-03-16 |
Asm Ip Holding B.V. |
Method of depositing thin film and method of manufacturing semiconductor device
|
US10770286B2
(en)
|
2017-05-08 |
2020-09-08 |
Asm Ip Holdings B.V. |
Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
|
US11848200B2
(en)
|
2017-05-08 |
2023-12-19 |
Asm Ip Holding B.V. |
Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
|
US10446393B2
(en)
|
2017-05-08 |
2019-10-15 |
Asm Ip Holding B.V. |
Methods for forming silicon-containing epitaxial layers and related semiconductor device structures
|
US10892156B2
(en)
|
2017-05-08 |
2021-01-12 |
Asm Ip Holding B.V. |
Methods for forming a silicon nitride film on a substrate and related semiconductor device structures
|
US10504742B2
(en)
|
2017-05-31 |
2019-12-10 |
Asm Ip Holding B.V. |
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|
US10886123B2
(en)
|
2017-06-02 |
2021-01-05 |
Asm Ip Holding B.V. |
Methods for forming low temperature semiconductor layers and related semiconductor device structures
|
US12040200B2
(en)
|
2017-06-20 |
2024-07-16 |
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Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus
|
US11306395B2
(en)
|
2017-06-28 |
2022-04-19 |
Asm Ip Holding B.V. |
Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
|
US11976361B2
(en)
|
2017-06-28 |
2024-05-07 |
Asm Ip Holding B.V. |
Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
|
US10685834B2
(en)
|
2017-07-05 |
2020-06-16 |
Asm Ip Holdings B.V. |
Methods for forming a silicon germanium tin layer and related semiconductor device structures
|
US11164955B2
(en)
|
2017-07-18 |
2021-11-02 |
Asm Ip Holding B.V. |
Methods for forming a semiconductor device structure and related semiconductor device structures
|
US11695054B2
(en)
|
2017-07-18 |
2023-07-04 |
Asm Ip Holding B.V. |
Methods for forming a semiconductor device structure and related semiconductor device structures
|
US10734497B2
(en)
|
2017-07-18 |
2020-08-04 |
Asm Ip Holding B.V. |
Methods for forming a semiconductor device structure and related semiconductor device structures
|
US10541333B2
(en)
|
2017-07-19 |
2020-01-21 |
Asm Ip Holding B.V. |
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|
US11004977B2
(en)
|
2017-07-19 |
2021-05-11 |
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Method for depositing a group IV semiconductor and related semiconductor device structures
|
US11018002B2
(en)
|
2017-07-19 |
2021-05-25 |
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Method for selectively depositing a Group IV semiconductor and related semiconductor device structures
|
US11374112B2
(en)
|
2017-07-19 |
2022-06-28 |
Asm Ip Holding B.V. |
Method for depositing a group IV semiconductor and related semiconductor device structures
|
US10605530B2
(en)
|
2017-07-26 |
2020-03-31 |
Asm Ip Holding B.V. |
Assembly of a liner and a flange for a vertical furnace as well as the liner and the vertical furnace
|
US10590535B2
(en)
|
2017-07-26 |
2020-03-17 |
Asm Ip Holdings B.V. |
Chemical treatment, deposition and/or infiltration apparatus and method for using the same
|
US11802338B2
(en)
|
2017-07-26 |
2023-10-31 |
Asm Ip Holding B.V. |
Chemical treatment, deposition and/or infiltration apparatus and method for using the same
|
US10312055B2
(en)
|
2017-07-26 |
2019-06-04 |
Asm Ip Holding B.V. |
Method of depositing film by PEALD using negative bias
|
US11587821B2
(en)
|
2017-08-08 |
2023-02-21 |
Asm Ip Holding B.V. |
Substrate lift mechanism and reactor including same
|
US10770336B2
(en)
|
2017-08-08 |
2020-09-08 |
Asm Ip Holding B.V. |
Substrate lift mechanism and reactor including same
|
US10692741B2
(en)
|
2017-08-08 |
2020-06-23 |
Asm Ip Holdings B.V. |
Radiation shield
|
US11417545B2
(en)
|
2017-08-08 |
2022-08-16 |
Asm Ip Holding B.V. |
Radiation shield
|
US11139191B2
(en)
|
2017-08-09 |
2021-10-05 |
Asm Ip Holding B.V. |
Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
|
US10672636B2
(en)
|
2017-08-09 |
2020-06-02 |
Asm Ip Holding B.V. |
Cassette holder assembly for a substrate cassette and holding member for use in such assembly
|
US10249524B2
(en)
|
2017-08-09 |
2019-04-02 |
Asm Ip Holding B.V. |
Cassette holder assembly for a substrate cassette and holding member for use in such assembly
|
US11769682B2
(en)
|
2017-08-09 |
2023-09-26 |
Asm Ip Holding B.V. |
Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
|
US11001934B2
(en)
|
2017-08-21 |
2021-05-11 |
Lam Research Corporation |
Methods and apparatus for flow isolation and focusing during electroplating
|
US10236177B1
(en)
|
2017-08-22 |
2019-03-19 |
ASM IP Holding B.V.. |
Methods for depositing a doped germanium tin semiconductor and related semiconductor device structures
|
USD900036S1
(en)
|
2017-08-24 |
2020-10-27 |
Asm Ip Holding B.V. |
Heater electrical connector and adapter
|
US11830730B2
(en)
|
2017-08-29 |
2023-11-28 |
Asm Ip Holding B.V. |
Layer forming method and apparatus
|
US11581220B2
(en)
|
2017-08-30 |
2023-02-14 |
Asm Ip Holding B.V. |
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
|
US11056344B2
(en)
|
2017-08-30 |
2021-07-06 |
Asm Ip Holding B.V. |
Layer forming method
|
US11295980B2
(en)
|
2017-08-30 |
2022-04-05 |
Asm Ip Holding B.V. |
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
|
US11069510B2
(en)
|
2017-08-30 |
2021-07-20 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
US11993843B2
(en)
|
2017-08-31 |
2024-05-28 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
US10607895B2
(en)
|
2017-09-18 |
2020-03-31 |
Asm Ip Holdings B.V. |
Method for forming a semiconductor device structure comprising a gate fill metal
|
US10781527B2
(en)
|
2017-09-18 |
2020-09-22 |
Lam Research Corporation |
Methods and apparatus for controlling delivery of cross flowing and impinging electrolyte during electroplating
|
US10928731B2
(en)
|
2017-09-21 |
2021-02-23 |
Asm Ip Holding B.V. |
Method of sequential infiltration synthesis treatment of infiltrateable material and structures and devices formed using same
|
US10844484B2
(en)
|
2017-09-22 |
2020-11-24 |
Asm Ip Holding B.V. |
Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
|
US10658205B2
(en)
|
2017-09-28 |
2020-05-19 |
Asm Ip Holdings B.V. |
Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
|
US11387120B2
(en)
|
2017-09-28 |
2022-07-12 |
Asm Ip Holding B.V. |
Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
|
US11094546B2
(en)
|
2017-10-05 |
2021-08-17 |
Asm Ip Holding B.V. |
Method for selectively depositing a metallic film on a substrate
|
US10403504B2
(en)
|
2017-10-05 |
2019-09-03 |
Asm Ip Holding B.V. |
Method for selectively depositing a metallic film on a substrate
|
US12033861B2
(en)
|
2017-10-05 |
2024-07-09 |
Asm Ip Holding B.V. |
Method for selectively depositing a metallic film on a substrate
|
US10734223B2
(en)
|
2017-10-10 |
2020-08-04 |
Asm Ip Holding B.V. |
Method for depositing a metal chalcogenide on a substrate by cyclical deposition
|
US10319588B2
(en)
|
2017-10-10 |
2019-06-11 |
Asm Ip Holding B.V. |
Method for depositing a metal chalcogenide on a substrate by cyclical deposition
|
US10923344B2
(en)
|
2017-10-30 |
2021-02-16 |
Asm Ip Holding B.V. |
Methods for forming a semiconductor structure and related semiconductor structures
|
US12040184B2
(en)
|
2017-10-30 |
2024-07-16 |
Asm Ip Holding B.V. |
Methods for forming a semiconductor structure and related semiconductor structures
|
US10910262B2
(en)
|
2017-11-16 |
2021-02-02 |
Asm Ip Holding B.V. |
Method of selectively depositing a capping layer structure on a semiconductor device structure
|
US10734244B2
(en)
|
2017-11-16 |
2020-08-04 |
Asm Ip Holding B.V. |
Method of processing a substrate and a device manufactured by the same
|
US11022879B2
(en)
|
2017-11-24 |
2021-06-01 |
Asm Ip Holding B.V. |
Method of forming an enhanced unexposed photoresist layer
|
US11127617B2
(en)
|
2017-11-27 |
2021-09-21 |
Asm Ip Holding B.V. |
Storage device for storing wafer cassettes for use with a batch furnace
|
US11639811B2
(en)
|
2017-11-27 |
2023-05-02 |
Asm Ip Holding B.V. |
Apparatus including a clean mini environment
|
US11682572B2
(en)
|
2017-11-27 |
2023-06-20 |
Asm Ip Holdings B.V. |
Storage device for storing wafer cassettes for use with a batch furnace
|
US10290508B1
(en)
|
2017-12-05 |
2019-05-14 |
Asm Ip Holding B.V. |
Method for forming vertical spacers for spacer-defined patterning
|
US11501973B2
(en)
|
2018-01-16 |
2022-11-15 |
Asm Ip Holding B.V. |
Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
|
US10872771B2
(en)
|
2018-01-16 |
2020-12-22 |
Asm Ip Holding B. V. |
Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
|
US11482412B2
(en)
|
2018-01-19 |
2022-10-25 |
Asm Ip Holding B.V. |
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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2020-11-24 |
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
2018-09-11 |
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|
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|
2018-09-14 |
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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Susceptor for semiconductor substrate supporting apparatus
|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
|
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|
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|
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Cyclical deposition method including treatment step and apparatus for same
|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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Device for controlling a temperature of a gas supply unit
|
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Method of using a gas-phase reactor system including analyzing exhausted gas
|
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|
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|
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|
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|
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|
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|
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Showerhead vacuum transport
|
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|
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|
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|
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Temperature control assembly for substrate processing apparatus and method of using same
|
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Plasma device using coaxial waveguide, and substrate treatment method
|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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Radical assist ignition plasma system and method
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2019-07-18 |
2023-05-09 |
Asm Ip Holding B.V. |
Method of forming structures using a neutral beam
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2019-07-19 |
2022-03-22 |
Asm Ip Holding B.V. |
Method of forming topology-controlled amorphous carbon polymer film
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(en)
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2019-07-29 |
2023-01-17 |
Asm Ip Holding B.V. |
Methods for selective deposition utilizing n-type dopants and/or alternative dopants to achieve high dopant incorporation
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(en)
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2019-07-30 |
2022-08-30 |
Asm Ip Holding B.V. |
Substrate processing apparatus
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(en)
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2019-07-30 |
2022-09-13 |
Asm Ip Holding B.V. |
Substrate processing apparatus
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(en)
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2019-07-31 |
2023-02-21 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly
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(en)
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2019-07-31 |
2023-02-21 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly
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(en)
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2019-07-31 |
2022-01-18 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly
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(en)
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2019-07-31 |
2024-01-16 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly
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(en)
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2019-08-05 |
2023-06-20 |
Asm Ip Holding B.V. |
Liquid level sensor for a chemical source vessel
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USD965524S1
(en)
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2019-08-19 |
2022-10-04 |
Asm Ip Holding B.V. |
Susceptor support
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USD965044S1
(en)
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2019-08-19 |
2022-09-27 |
Asm Ip Holding B.V. |
Susceptor shaft
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(en)
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2019-08-21 |
2023-05-02 |
Asm Ip Holding B.V. |
Film-forming material mixed-gas forming device and film forming device
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USD979506S1
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2019-08-22 |
2023-02-28 |
Asm Ip Holding B.V. |
Insulator
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(en)
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2019-08-22 |
2023-02-28 |
Asm Ip Holding B.V. |
Method for forming a structure with a hole
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USD949319S1
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2019-08-22 |
2022-04-19 |
Asm Ip Holding B.V. |
Exhaust duct
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(en)
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2019-08-22 |
2024-07-16 |
Asm Ip Holding B.V. |
Method for forming a structure with a hole
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USD940837S1
(en)
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2019-08-22 |
2022-01-11 |
Asm Ip Holding B.V. |
Electrode
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USD930782S1
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2019-08-22 |
2021-09-14 |
Asm Ip Holding B.V. |
Gas distributor
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(en)
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2019-08-23 |
2022-12-13 |
Asm Ip Holding B.V. |
Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane
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2019-08-23 |
2022-03-29 |
Asm Ip Holding B.V. |
Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
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2019-08-23 |
2024-02-13 |
Asm Ip Holding B.V. |
Methods for forming a polycrystalline molybdenum film over a surface of a substrate and related structures including a polycrystalline molybdenum film
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2019-08-23 |
2023-11-28 |
Asm Ip Holding B.V. |
Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
|
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(en)
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2019-08-23 |
2024-07-09 |
Asm Ip Holding B.V. |
Method for depositing silicon oxide film having improved quality by PEALD using bis(diethylamino)silane
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(en)
|
2019-09-04 |
2022-11-08 |
Asm Ip Holding B.V. |
Methods for selective deposition using a sacrificial capping layer
|
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(en)
|
2019-09-05 |
2023-11-21 |
Asm Ip Holding B.V. |
Substrate processing apparatus
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(en)
|
2019-09-25 |
2023-01-24 |
Asm Ip Holding B.V. |
Substrate processing method
|
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(en)
|
2019-10-02 |
2023-03-21 |
Asm Ip Holding B.V. |
Methods for forming a topographically selective silicon oxide film by a cyclical plasma-enhanced deposition process
|
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|
2019-10-08 |
2024-06-11 |
Asm Ip Holding B.V. |
Reactor system including a gas distribution assembly for use with activated species and method of using same
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(en)
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2019-10-08 |
2022-05-24 |
Asm Ip Holding B.V. |
Substrate processing device having connection plates, substrate processing method
|
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(en)
|
2019-10-10 |
2023-08-22 |
Asm Ip Holding B.V. |
Method of forming a photoresist underlayer and structure including same
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(en)
|
2019-10-14 |
2024-06-11 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly with detector to detect cassette
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(en)
|
2019-10-16 |
2023-04-25 |
Asm Ip Holding B.V. |
Method of topology-selective film formation of silicon oxide
|
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|
2019-10-17 |
2023-04-25 |
Asm Ip Holding B.V. |
Methods for selective deposition of doped semiconductor material
|
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|
2019-10-21 |
2022-04-26 |
Asm Ip Holding B.V. |
Apparatus and methods for selectively etching films
|
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2019-10-25 |
2024-05-28 |
Asm Ip Holding B.V. |
Methods for filling a gap feature on a substrate surface and related semiconductor structures
|
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(en)
|
2019-10-29 |
2023-05-09 |
Asm Ip Holding B.V. |
Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
|
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(en)
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2019-11-05 |
2023-02-28 |
Asm Ip Holding B.V. |
Structures with doped semiconductor layers and methods and systems for forming same
|
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(en)
|
2019-11-15 |
2022-11-15 |
Asm Ip Holding B.V. |
Method for providing a semiconductor device with silicon filled gaps
|
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(en)
|
2019-11-20 |
2023-04-11 |
Asm Ip Holding B.V. |
Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure
|
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(en)
|
2019-11-26 |
2022-08-02 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
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(en)
|
2019-11-26 |
2024-02-27 |
Asm Ip Holding B.V. |
Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
|
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(en)
|
2019-11-29 |
2023-05-09 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
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(en)
|
2019-11-29 |
2024-03-05 |
Asm Ip Holding B.V. |
Substrate processing apparatus for minimizing the effect of a filling gas during substrate processing
|
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(en)
|
2019-12-02 |
2024-03-12 |
Asm Ip Holding B.V. |
Substrate processing apparatus having electrostatic chuck and substrate processing method
|
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(en)
|
2019-12-04 |
2023-12-12 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
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(en)
|
2019-12-17 |
2024-01-30 |
Asm Ip Holding B.V. |
Method of forming vanadium nitride layer and structure including the vanadium nitride layer
|
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(en)
|
2019-12-19 |
2022-12-13 |
Asm Ip Holding B.V. |
Methods for filling a gap feature on a substrate surface and related semiconductor structures
|
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(en)
|
2020-01-06 |
2024-07-09 |
Asm Ip Holding B.V. |
Channeled lift pin
|
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(en)
|
2020-01-06 |
2024-05-07 |
Asm Ip Holding B.V. |
Gas supply assembly, components thereof, and reactor system including same
|
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(en)
|
2020-01-08 |
2024-05-28 |
Asm Ip Holding B.V. |
Injector
|
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(en)
|
2020-01-20 |
2023-01-10 |
Asm Ip Holding B.V. |
Method of forming thin film and method of modifying surface of thin film
|
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(en)
|
2020-02-03 |
2022-12-06 |
Asm Ip Holding B.V. |
Method of forming structures including a vanadium or indium layer
|
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(en)
|
2020-02-04 |
2023-11-28 |
Asm Ip Holding B.V. |
Method and apparatus for transmittance measurements of large articles
|
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(en)
|
2020-02-07 |
2023-10-03 |
Asm Ip Holding B.V. |
Methods for depositing gap filling fluids and related systems and devices
|
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(en)
|
2020-02-17 |
2023-10-10 |
Asm Ip Holding B.V. |
Method for depositing low temperature phosphorous-doped silicon
|
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(en)
|
2020-02-28 |
2024-05-21 |
Asm Ip Holding B.V. |
System dedicated for parts cleaning
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(en)
|
2020-03-11 |
2022-11-01 |
Asm Ip Holding B.V. |
Substrate handling device with adjustable joints
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(en)
|
2020-03-11 |
2023-12-05 |
Asm Ip Holding B.V. |
Substrate handling device with adjustable joints
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(en)
|
2020-03-11 |
2024-01-16 |
Asm Ip Holding B.V. |
Lockout tagout assembly and system and method of using same
|
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(en)
|
2020-03-12 |
2024-04-16 |
Asm Ip Holding B.V. |
Method for fabricating layer structure having target topological profile
|
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(en)
|
2020-04-02 |
2023-11-21 |
Asm Ip Holding B.V. |
Thin film forming method
|
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(en)
|
2020-04-03 |
2023-11-28 |
Asm Ip Holding B.V. |
Method for forming barrier layer and method for manufacturing semiconductor device
|
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(en)
|
2020-04-08 |
2022-09-06 |
Asm Ip Holding B.V. |
Apparatus and methods for selectively etching silicon oxide films
|
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(en)
|
2020-04-15 |
2023-11-21 |
Asm Ip Holding B.V. |
Method for forming precoat film and method for forming silicon-containing film
|
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(en)
|
2020-04-16 |
2024-05-28 |
Asm Ip Holding B.V. |
Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods
|
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(en)
|
2020-04-24 |
2024-01-30 |
Asm Ip Holding B.V. |
Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element
|
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(en)
|
2020-04-24 |
2022-12-20 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly comprising a cooling gas supply
|
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(en)
|
2020-04-24 |
2024-02-13 |
Asm Ip Holding B.V. |
Method of forming vanadium nitride-containing layer
|
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(en)
|
2020-04-29 |
2024-04-16 |
Asm Ip Holding B.V. |
Solid source precursor vessel
|
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(en)
|
2020-05-01 |
2023-10-24 |
Asm Ip Holding B.V. |
Fast FOUP swapping with a FOUP handler
|
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(en)
|
2020-05-01 |
2022-11-29 |
Asm Ip Holding B.V. |
Fast FOUP swapping with a FOUP handler
|
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(en)
|
2020-05-13 |
2023-04-11 |
Asm Ip Holding B.V. |
Laser alignment fixture for a reactor system
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(en)
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2020-05-19 |
2023-10-31 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
USD947802S1
(en)
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2020-05-20 |
2022-04-05 |
Applied Materials, Inc. |
Replaceable substrate carrier interfacing film
|
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(en)
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2020-05-21 |
2023-07-18 |
Asm Ip Holding B.V. |
Structures including multiple carbon layers and methods of forming and using same
|
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(en)
|
2020-05-22 |
2024-05-21 |
Asm Ip Holding B.V. |
Apparatus for depositing thin films using hydrogen peroxide
|
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(en)
|
2020-05-29 |
2023-09-26 |
Asm Ip Holding B.V. |
Substrate processing device
|
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(en)
|
2020-06-24 |
2023-05-09 |
Asm Ip Holding B.V. |
Method for forming a layer provided with silicon
|
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(en)
|
2020-06-30 |
2023-05-23 |
Asm Ip Holding B.V. |
Substrate processing method
|
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(en)
|
2020-07-08 |
2024-06-25 |
Asm Ip Holding B.V. |
Substrate processing method
|
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(en)
|
2020-07-17 |
2023-05-09 |
Asm Ip Holding B.V. |
Structures and methods for use in photolithography
|
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(en)
|
2020-07-20 |
2023-06-13 |
Asm Ip Holding B.V. |
Method for depositing molybdenum layers using an underlayer
|
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(en)
|
2020-08-18 |
2024-07-16 |
Asm Ip Holding B.V. |
Methods for forming a laminate film by cyclical plasma-enhanced deposition processes
|
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(en)
|
2020-08-26 |
2023-08-15 |
Asm Ip Holding B.V. |
Method for forming metal silicon oxide and metal silicon oxynitride layers
|
USD990534S1
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|
2020-09-11 |
2023-06-27 |
Asm Ip Holding B.V. |
Weighted lift pin
|
USD1012873S1
(en)
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2020-09-24 |
2024-01-30 |
Asm Ip Holding B.V. |
Electrode for semiconductor processing apparatus
|
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(en)
|
2020-09-29 |
2024-06-11 |
Asm Ip Holding B.V. |
Apparatus and method for etching metal nitrides
|
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(en)
|
2020-10-14 |
2023-11-28 |
Asm Ip Holding B.V. |
Method of depositing material on stepped structure
|
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(en)
|
2020-10-22 |
2024-01-16 |
Asm Ip Holding B.V. |
Method of depositing vanadium metal
|
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(en)
|
2020-10-28 |
2024-02-13 |
Asm Ip Holding B.V. |
Method and device for depositing silicon onto substrates
|
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(en)
|
2020-11-24 |
2024-07-02 |
Asm Ip Holding B.V. |
Methods for filling a gap and related systems and devices
|
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(en)
|
2020-11-30 |
2024-02-06 |
Asm Ip Holding B.V. |
Injector configured for arrangement within a reaction chamber of a substrate processing apparatus
|
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(en)
|
2020-12-16 |
2024-04-02 |
Asm Ip Holding B.V. |
Runout and wobble measurement fixtures
|
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(en)
|
2020-12-22 |
2024-01-30 |
Asm Ip Holding B.V. |
Transition metal deposition method
|
USD984972S1
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|
2021-03-29 |
2023-05-02 |
Beijing Naura Microelectronics Equipment Co., Ltd. |
Electrostatic chuck for semiconductor manufacture
|
US12051602B2
(en)
|
2021-04-29 |
2024-07-30 |
Asm Ip Holding B.V. |
Substrate processing system for processing substrates with an electronics module located behind a door in a front wall of the substrate processing system
|
USD981973S1
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|
2021-05-11 |
2023-03-28 |
Asm Ip Holding B.V. |
Reactor wall for substrate processing apparatus
|
USD980813S1
(en)
|
2021-05-11 |
2023-03-14 |
Asm Ip Holding B.V. |
Gas flow control plate for substrate processing apparatus
|
USD1023959S1
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|
2021-05-11 |
2024-04-23 |
Asm Ip Holding B.V. |
Electrode for substrate processing apparatus
|
USD980814S1
(en)
|
2021-05-11 |
2023-03-14 |
Asm Ip Holding B.V. |
Gas distributor for substrate processing apparatus
|
USD990441S1
(en)
|
2021-09-07 |
2023-06-27 |
Asm Ip Holding B.V. |
Gas flow control plate
|
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(en)
|
2021-10-04 |
2024-07-30 |
Asm Ip Holding B.V. |
Gas supply unit and substrate processing apparatus including gas supply unit
|