USD1022907S1 - Tubular reactor - Google Patents

Tubular reactor Download PDF

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Publication number
USD1022907S1
USD1022907S1 US29/843,558 US202229843558F USD1022907S US D1022907 S1 USD1022907 S1 US D1022907S1 US 202229843558 F US202229843558 F US 202229843558F US D1022907 S USD1022907 S US D1022907S
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US
United States
Prior art keywords
tubular reactor
view
elevational view
reactor
tubular
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Active
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US29/843,558
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English (en)
Inventor
Yusaku OKAJIMA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
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Kokusai Electric Corp
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Assigned to Kokusai Electric Corporation reassignment Kokusai Electric Corporation ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: OKAJIMA, YUSAKU
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US29/843,558 2022-03-01 2022-06-22 Tubular reactor Active USD1022907S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022004138F JP1731789S (enrdf_load_stackoverflow) 2022-03-01 2022-03-01
JP2022-004138D 2022-03-01

Publications (1)

Publication Number Publication Date
USD1022907S1 true USD1022907S1 (en) 2024-04-16

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ID=84322450

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/843,558 Active USD1022907S1 (en) 2022-03-01 2022-06-22 Tubular reactor

Country Status (3)

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US (1) USD1022907S1 (enrdf_load_stackoverflow)
JP (1) JP1731789S (enrdf_load_stackoverflow)
TW (1) TWD230584S (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1713189S (enrdf_load_stackoverflow) * 2021-09-15 2022-04-21

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
US20030221779A1 (en) * 2002-03-28 2003-12-04 Kazuyuki Okuda Substrate processing apparatus
USD590359S1 (en) * 2006-02-20 2009-04-14 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers or the like
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD618638S1 (en) 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD742339S1 (en) 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
USD778457S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD166710S (zh) 2013-07-08 2015-03-21 日立國際電氣股份有限公司 反應管

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
US20030221779A1 (en) * 2002-03-28 2003-12-04 Kazuyuki Okuda Substrate processing apparatus
USD590359S1 (en) * 2006-02-20 2009-04-14 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers or the like
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD618638S1 (en) 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD742339S1 (en) 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
USD778457S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube

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Publication number Publication date
JP1731789S (enrdf_load_stackoverflow) 2022-12-09
TWD230584S (zh) 2024-04-01

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