JP1731789S - - Google Patents
Info
- Publication number
- JP1731789S JP1731789S JP2022004138F JP2022004138F JP1731789S JP 1731789 S JP1731789 S JP 1731789S JP 2022004138 F JP2022004138 F JP 2022004138F JP 2022004138 F JP2022004138 F JP 2022004138F JP 1731789 S JP1731789 S JP 1731789S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022004138F JP1731789S (enrdf_load_stackoverflow) | 2022-03-01 | 2022-03-01 | |
| TW111302867F TWD230584S (zh) | 2022-03-01 | 2022-06-15 | 反應管 |
| US29/843,558 USD1022907S1 (en) | 2022-03-01 | 2022-06-22 | Tubular reactor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022004138F JP1731789S (enrdf_load_stackoverflow) | 2022-03-01 | 2022-03-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1731789S true JP1731789S (enrdf_load_stackoverflow) | 2022-12-09 |
Family
ID=84322450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022004138F Active JP1731789S (enrdf_load_stackoverflow) | 2022-03-01 | 2022-03-01 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD1022907S1 (enrdf_load_stackoverflow) |
| JP (1) | JP1731789S (enrdf_load_stackoverflow) |
| TW (1) | TWD230584S (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP1713189S (enrdf_load_stackoverflow) * | 2021-09-15 | 2022-04-21 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD405429S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
| USD405431S (en) * | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
| JP3985899B2 (ja) * | 2002-03-28 | 2007-10-03 | 株式会社日立国際電気 | 基板処理装置 |
| TWD118408S1 (zh) * | 2006-02-20 | 2007-08-01 | 東京威力科創股份有限公司 | 半導體製造用加工處理管 |
| USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| TWD127410S1 (zh) * | 2007-04-20 | 2009-02-11 | 東京威力科創股份有限公司 | 半導體製造用製程管 |
| TWD125601S (zh) * | 2007-05-08 | 2008-10-21 | 東京威力科創股份有限公司 | 半導體製造用加工處理管 |
| TWD133943S1 (zh) | 2008-05-09 | 2010-03-21 | 日立國際電氣股份有限公司 | 反應管 |
| TWD166710S (zh) | 2013-07-08 | 2015-03-21 | 日立國際電氣股份有限公司 | 反應管 |
| USD742339S1 (en) | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
| JP1534828S (enrdf_load_stackoverflow) * | 2015-02-23 | 2015-10-13 | ||
| JP1535455S (enrdf_load_stackoverflow) * | 2015-02-25 | 2015-10-19 | ||
| JP1546345S (enrdf_load_stackoverflow) * | 2015-09-04 | 2016-03-22 | ||
| JP1546512S (enrdf_load_stackoverflow) * | 2015-09-04 | 2016-03-22 |
-
2022
- 2022-03-01 JP JP2022004138F patent/JP1731789S/ja active Active
- 2022-06-15 TW TW111302867F patent/TWD230584S/zh unknown
- 2022-06-22 US US29/843,558 patent/USD1022907S1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| USD1022907S1 (en) | 2024-04-16 |
| TWD230584S (zh) | 2024-04-01 |